CN105022225B - A method of improving miniature high resolution display picture quality - Google Patents
A method of improving miniature high resolution display picture quality Download PDFInfo
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- CN105022225B CN105022225B CN201510465930.9A CN201510465930A CN105022225B CN 105022225 B CN105022225 B CN 105022225B CN 201510465930 A CN201510465930 A CN 201510465930A CN 105022225 B CN105022225 B CN 105022225B
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- high resolution
- miniature high
- picture quality
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- display picture
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Abstract
The invention discloses a kind of method for improving miniature high resolution display picture quality, includes the steps that nano impression makes lenticule panel: (1) making metallic mold for nano-imprint；(2) the spin coating polymethyl methacrylate coating on display barrier layer；(3) heating baking；(4) the nanometer compacting tool set in step (1) aligned with the semi-finished product edge after heated baking in step (3), be bonded compression, obtain the composite construction of nanometer compacting tool set and semi-finished product；(5) cooling demoulding, obtains nano impression lenticule panel.By the way that the anti-shape pattern dimension on metallic mold for nano-imprint is designed as 100nm magnitude, to make lenslet diameter obtained be reduced to 100nm magnitude, this can make a pixel while 10 corresponding or more lens, finally assemble the outgoing light energy across lens more, the resolution ratio of display significantly improves, and image quality is substantially improved.
Description
Technical field
The invention belongs to semiconductor display fields, relate in particular to a kind of miniature high resolution display image matter of raising
The method of amount.
Background technique
It less than 1 inch, light emitting pixel quantity is more than 800 × 600 × 3 that miniature high resolution display, which is a kind of diagonal line,
Display.Miniature high resolution display pixel density is very big, and display information content is high.This display passes through nearly mesh optical system
Unite into now several inches to tens inches virtual images.The nearly mesh optical system of miniature high resolution display.Miniature high-resolution
The light that display issues reaches people's the structure of the eye to lens projects.The system is generally added by lens group or free surface lens outer
Shell is constituted, and configuration is mounted on the space between the front of human eye and display.Nanometer embossing breaches conventional lithography and exists
Problem during characteristic size reduction, suitable for the template prepared in miniature high resolution display.
Theoretically each sub-pixel (R, G, B) of display needs to respectively correspond a lenticule, so that outgoing luminous energy
Measure more dense, but the Pixel Dimensions of high-resolution miniscope reach micron order, are difficult to when suppressing lenticule accurate
Contraposition compacting, this results in light energy to reduce, and monitor resolution is unable to reach requirement, and display image quality is bad.Overcome
Existing miniature high resolution display lenticule and pixel are difficult to exactitude position compacting, cause to be emitted light energy deficiency, display
Resolution ratio and display image quality are bad, provide a kind of method for improving miniature high resolution display picture quality, are mesh
Very urgent thing in the preceding field.
Summary of the invention
For this purpose, technical problem to be solved by the present invention lies in existing miniature high resolution display lenticule and pixel are difficult
It is suppressed in exactitude position, causes insufficient outgoing light energy, monitor resolution and display image quality bad, to propose one
The method that kind improves miniature high resolution display picture quality.
In order to solve the above technical problems, the present invention provides a kind of sides for improving miniature high resolution display picture quality
Method, described method includes following steps:
(1) make metallic mold for nano-imprint, the metallic mold for nano-imprint include substrate compatible with display barrier layer with
And the anti-shape pattern of several lenticules of formation is etched on the substrate, the diameter of each lenticule is 50-100nm；
(2) polymethyl methacrylate coating, the poly- methyl-prop are obtained with spin-coating method on the display barrier layer
E pioic acid methyl ester coating layer thickness is greater than two times of the anti-shape pattern center thickness of the lenticule；
(3) heating baking: the semi-finished product that step (2) is obtained heated baking under vacuum conditions；
(4) the nanometer compacting tool set in step (1) is aligned with the semi-finished product edge after heated baking in step (3), patch
It is compressed after conjunction and obtains the composite construction of nanometer compacting tool set and semi-finished product；
(5) cooling demoulding: the composite construction that step (4) is obtained cools down, and removes the nanometer compacting tool set, obtains
To nano impression lenticule panel.
Preferably, the method for the miniature high resolution display picture quality of raising, the step (1) include such as
Lower step:
Substrate is provided, if the area of the substrate is equal to the area of the stem substrate；Substrate described in planarization process；Electricity consumption
Beamlet etches the anti-shape image of the lenticule；And the substrate is cut into several substrates.
Preferably, the method for the miniature high resolution display picture quality of raising, each pixel of display
Corresponding 10 or 10 lenticules described above.
Preferably, the substrate is Si3N4Or SiO2。
Preferably, the vacuum degree of vacuum environment described in the step (3) is 1-10Pa.
Preferably, heating rate is 5 DEG C/min in the step (3), final temperature is 110 ± 5 DEG C, reach final
After temperature, holding baking time is 1min.
Preferably, pressure size is 2.5 ± 0.15N/inch in the step (4)2。
Preferably, rate of temperature fall is 15 DEG C/min in the step (5), final temperature is 12 DEG C.
Described in any item methods process miniature high resolution display for making.
The above technical solution of the present invention has the following advantages over the prior art, of the present invention to improve miniature high score
The method of resolution display image quality includes the steps that nano impression makes lenticule panel, by will be on metallic mold for nano-imprint
Anti- shape pattern dimension be designed as 100nm magnitude, so that lenslet diameter obtained be made to be reduced to 100nm magnitude, this can make
One pixel lens 10 corresponding or more simultaneously, assemble the outgoing light energy across lens more, point of display
Resolution significantly improves, and image quality is substantially improved；And a pixel corresponds to multiple lens and also eliminates in traditional pressing process
The step of exactitude position is suppressed, improves production efficiency.The polymethyl methacrylate film of spin coating is that synthesis is saturating so far
Quality is most excellent in bright material, and price can form film layer in homogeneous thickness by spin coating again than convenient material, has good
Good dielectric properties do not need after the completion of compacting since polymethyl methacrylate has high light transmittance and carry out each diversity
Etching removes the residue around lenticule, further improves production efficiency, has saved production cost.
Detailed description of the invention
In order to make the content of the present invention more clearly understood, it below according to specific embodiments of the present invention and combines
Attached drawing, the present invention is described in further detail, wherein
Fig. 1 is the flow chart of the method for the present invention for improving miniature high resolution display picture quality；
Fig. 2 is the process schematic of nano impression production lenticule panel of the present invention.
Appended drawing reference indicates in figure are as follows: 1- metallic mold for nano-imprint；2- polymethyl methacrylate coating；The barrier of 3- display
Layer；4- lenticule panel.
Specific embodiment
Embodiment 1
As shown in Figs. 1-2, a kind of method for improving miniature high resolution display picture quality is present embodiments provided, is wrapped
Hold following steps:
(1) metallic mold for nano-imprint 1: planarization process Si is made3N4Substrate, and the substrate is gone out by electron beam lithography
The anti-shape pattern of lenticule, the diameter of the anti-shape pattern are 100nm, and the lenslet diameter obtained from is 100nm, make to show
The substrate, is then cut into the rectangle of multiple display area sizes by corresponding 10 lenticules described above of each pixel of device
Piece to get arrive metallic mold for nano-imprint 1；
(2) polymethyl methacrylate film, the polymethyl methacrylate coating are prepared on display barrier layer 3
2 thickness are greater than two times of the anti-shape pattern center thickness of the lenticule, press to wear to avoid the metallic mold for nano-imprint 1 described
Polymethyl methacrylate coating 2；
(3) heating baking: the semi-finished product that step (2) is obtained are in the case where vacuum degree is the vacuum environment of 1Pa with 5 DEG C/min's
Heating rate rises to 110 DEG C, and heated baking 10min；
(4) the nanometer compacting tool set 1 in step (1) is aligned with the semi-finished product edge after heated baking in step (3), patch
Slowly apply 2.5N/inch after conjunction2Pressure, compress the Nano imprint mold 1, obtain nanometer compacting tool set 1 and described half
The composite construction of finished product；
(5) cooling demoulding: being down to 12 DEG C for the composite construction that step (4) obtains with the rate of temperature fall of 15 DEG C/min,
And the nanometer compacting tool set 1 is removed, obtain nano impression lenticule panel 4.
Method of the present invention can be used for making miniature high resolution display, by will be on metallic mold for nano-imprint
Anti- shape pattern dimension is designed as 100nm magnitude, so that lenslet diameter obtained be made to be reduced to 100nm magnitude, this can make one
A pixel lens 10 corresponding or more simultaneously, assemble the outgoing light energy across lens more, the resolution of display
Rate significantly improves, and image quality is substantially improved.
Obviously, the above embodiments are merely examples for clarifying the description, and does not limit the embodiments.It is right
For those of ordinary skill in the art, can also make on the basis of the above description it is other it is various forms of variation or
It changes.There is no necessity and possibility to exhaust all the enbodiments.And it is extended from this it is obvious variation or
It changes still within the protection scope of the invention.
Claims (8)
1. a kind of method for improving miniature high resolution display picture quality, it is characterised in that:
(1) make metallic mold for nano-imprint, the metallic mold for nano-imprint include substrate compatible with display barrier layer and
The anti-shape pattern of several lenticules of formation is etched on the substrate, the diameter of each lenticule is 50-100nm；It is described aobvious
Show corresponding 10 or 10 lenticules described above of each pixel of device；
(2) polymethyl methacrylate coating, the polymethylacrylic acid are obtained with spin-coating method on the display barrier layer
Methyl esters coating layer thickness is greater than two times of the anti-shape pattern center thickness of the lenticule；
(3) heating baking: the semi-finished product that step (2) is obtained heated baking under vacuum conditions；
(4) after the nanometer compacting tool set in step (1) being aligned, is bonded with the semi-finished product edge after heated baking in step (3)
Compression obtains the composite construction of nanometer compacting tool set and semi-finished product；
(5) cooling demoulding: the composite construction that step (4) is obtained cools down, and removes the nanometer compacting tool set, is received
Rice coining lenticule panel.
2. improving the method for miniature high resolution display picture quality as described in claim 1, it is characterised in that: the step
Suddenly (1) includes the following steps:
Substrate is provided, if the area of the substrate is equal to the area of the stem substrate；Substrate described in planarization process；Use electron beam
Etch the anti-shape image of the lenticule；And the substrate is cut into several substrates.
3. the method according to claim 2 for improving miniature high resolution display picture quality, which is characterized in that described
Substrate is Si3N4Or SiO2。
4. the method according to claim 3 for improving miniature high resolution display picture quality, which is characterized in that described
The vacuum degree of vacuum environment described in step (3) is 1-10Pa.
5. the method according to claim 4 for improving miniature high resolution display picture quality, which is characterized in that described
Heating rate is 5 DEG C/min in step (3), and final temperature is 110 ± 5 DEG C, and holding baking time is after reaching final temperature
1min。
6. the method according to claim 5 for improving miniature high resolution display picture quality, which is characterized in that described
Pressure size is 2.5 ± 0.15N/inch in step (4)2。
7. the method according to claim 6 for improving miniature high resolution display picture quality, which is characterized in that described
Rate of temperature fall is 15 DEG C/min in step (5), and final temperature is 12 DEG C.
8. the method according to claim 1 to 7, which is characterized in that the method processes miniature high-resolution for making
Rate display.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510465930.9A CN105022225B (en) | 2015-07-31 | 2015-07-31 | A method of improving miniature high resolution display picture quality |
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| CN201510465930.9A CN105022225B (en) | 2015-07-31 | 2015-07-31 | A method of improving miniature high resolution display picture quality |
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| CN105022225A CN105022225A (en) | 2015-11-04 |
| CN105022225B true CN105022225B (en) | 2019-08-16 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107422546A (en) * | 2017-04-21 | 2017-12-01 | 深圳市华星光电技术有限公司 | The preparation method and substrate of Graphene electrodes, display |
| CN114842810A (en) * | 2022-03-29 | 2022-08-02 | 河南经贸职业学院 | Image processing technology for processing high-quality image by embedded low-resolution display |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2005106538A1 (en) * | 2004-04-28 | 2005-11-10 | Omron Corporation | Microlens |
| CN1967340A (en) * | 2005-11-18 | 2007-05-23 | 鸿富锦精密工业（深圳）有限公司 | Manufacturing method of light conducting board and light conducting board stamper and manufacturing processing of light conducting board |
| CN101795839A (en) * | 2007-08-27 | 2010-08-04 | 3M创新有限公司 | Silicone mold and use thereof |
| CN102576505A (en) * | 2009-10-07 | 2012-07-11 | 奥林巴斯株式会社 | Display method, display device, optical unit, method for manufacturing display device, and electronic apparatus |
| CN103579467A (en) * | 2013-11-19 | 2014-02-12 | 中国科学院半导体研究所 | Wafer class micro-lens coining forming method |
-
2015
- 2015-07-31 CN CN201510465930.9A patent/CN105022225B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005106538A1 (en) * | 2004-04-28 | 2005-11-10 | Omron Corporation | Microlens |
| CN1967340A (en) * | 2005-11-18 | 2007-05-23 | 鸿富锦精密工业（深圳）有限公司 | Manufacturing method of light conducting board and light conducting board stamper and manufacturing processing of light conducting board |
| CN101795839A (en) * | 2007-08-27 | 2010-08-04 | 3M创新有限公司 | Silicone mold and use thereof |
| CN102576505A (en) * | 2009-10-07 | 2012-07-11 | 奥林巴斯株式会社 | Display method, display device, optical unit, method for manufacturing display device, and electronic apparatus |
| CN103579467A (en) * | 2013-11-19 | 2014-02-12 | 中国科学院半导体研究所 | Wafer class micro-lens coining forming method |
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Effective date of registration: 20160913 Address after: 518131 Guangdong Province, Shenzhen city Longhua District streets Minzhi Avenue Tao technology exhibition building block A room 1703 Applicant after: Shenzhen Zhonghe Technology Co., Ltd. Address before: 518000, Shenzhen Yantian District, Guangdong Province, Sha Tau Kok Street Industrial Street East, Yantian International Creative port 2 5E Applicant before: SHENZHEN XINGHUO HUIHUANG SYSTEM ENGINEERING CO., LTD. |
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Effective date of registration: 20191211 Address after: 5 / F South-2, building B20, Hengfeng Industrial City, 739 Zhoushi Road, Hezhou community, Hangcheng street, Bao'an District, Shenzhen City, Guangdong Province Patentee after: Shenzhen Xiangyang Amperex Technology Limited Address before: 518131 Guangdong Province, Shenzhen city Longhua District streets Minzhi Avenue Tao technology exhibition building block A room 1703 Patentee before: Shenzhen Wanzhong He Technology Co., Ltd. |
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