CN105018979A - Application of sorbitan palmitate - Google Patents

Application of sorbitan palmitate Download PDF

Info

Publication number
CN105018979A
CN105018979A CN201510521496.1A CN201510521496A CN105018979A CN 105018979 A CN105018979 A CN 105018979A CN 201510521496 A CN201510521496 A CN 201510521496A CN 105018979 A CN105018979 A CN 105018979A
Authority
CN
China
Prior art keywords
agent
copper plating
additive
sorbitol anhydride
traditional
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510521496.1A
Other languages
Chinese (zh)
Inventor
马涛
陈晨
朱自方
董培培
张芸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SUZHOU XINHAO NEW MATERIAL TECHNOLOGY Co Ltd
Original Assignee
SUZHOU XINHAO NEW MATERIAL TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SUZHOU XINHAO NEW MATERIAL TECHNOLOGY Co Ltd filed Critical SUZHOU XINHAO NEW MATERIAL TECHNOLOGY Co Ltd
Priority to CN201510521496.1A priority Critical patent/CN105018979A/en
Publication of CN105018979A publication Critical patent/CN105018979A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electroplating And Plating Baths Therefor (AREA)

Abstract

The invention discloses an application of sorbitan palmitate. The sorbitan palmitate is applied to an acid copper plating process to replace one or two of a wetting agent, a leveling agent and a brightening agent used in a traditional process. Traditional additives in the acid copper plating process are subjected to structure-activity analysis, so that sorbitan palmitate molecules, additive molecules with multiple performance, are sought out, the sorbitan palmitate molecules have the characteristics of the three traditional additives simultaneously but do not belong to any one of the wetting agent, the leveling agent and the brightening agent as proved through electrochemical analysis and electroplating experiments. The novel additive molecules can replace components, with higher costs or unstable relative performance, in a traditional bright copper plating system or can constitute a two-agent bright copper plating system, so that use and maintenance costs of a customer can be effectively reduced, the development of a non-dye system bright copper plating process is promoted, and wider potential space is developed for establishment of a new theory mode of the process.

Description

A kind of application of sorbitol anhydride cetylate
Technical field
The invention belongs to the advanced function electronic chemical product field in semiconductor chip process, be specifically related to a kind of application of sorbitol anhydride cetylate.
Background technology
Along with semiconductor chip process is to the future development of high-density, high function, high integrated and low cost, while semi-conductor chip reduces, electroplate technology is had higher requirement.Plating that is highlighted, high-flatness needs the additive with specific function and benefit, and to the usefulness of additive, stability and purity have high-quality requirement.In addition, the high request of each side also will certainly promote the operation and maintenance cost of electroplating additive.Current industry member conventional additive used can be classified as wetting agent, leveling agent and brightening agent.Need above-mentioned three kinds of additives in general plating system all simultaneously, thus play different functions.The resource input of starting material use and the complexity of Additive analysis not of the same race are not only increased to the demand of multiple different additive, and due to different additive consumption be in use different, this just adds the difficulty that electroplating additive system is safeguarded virtually.The additive types used is more, also can be higher to the cost of the maintenance of plating system and environment maintenance.
If can find a kind of multi-functional additive, can play multiple action, and be not limited only to wetting agent in electroplating process, the one in leveling agent and brightening agent, just likely high degree simplifies electroplating technology, reduces costs.
Summary of the invention
In order to solve the problem, the invention provides a kind of application of sorbitol anhydride cetylate, be intended to the operation and maintenance cost that effectively can reduce client, promote the development of non-dye system bright copper plating technique and open up more wide possibility space for the foundation of its new theory pattern.
For realizing above-mentioned technical purpose, reach above-mentioned technique effect, the present invention is achieved through the following technical solutions:
An application for sorbitol anhydride cetylate, the chemical formula of described sorbitol anhydride cetylate is C 22h 42o 6, described sorbitol anhydride cetylate as additive application in acid copper-plating technique, one or both to replace in the wetting agent S24, leveling agent L26 and the brightening agent A28 that use in traditional technology.
Sorbitol anhydride cetylate (S113) possesses the characteristic of multiple conventional additive simultaneously, the any one in traditional wetting agent S24, leveling agent L26 and brightening agent A28 can be replaced in acid copper-plating technique, with other two kinds of described conventional additive with the use of, form the additive system of three doses.Under certain conditions, also can replace the conventional additive described in two kinds, and coordinate with conventional additive described in another, composition only has the additive system of two doses.
The kind of sorbitol anhydride cetylate (S113) of the present invention is not limited only to itself, but all molecules with sorbitol anhydride cetylate (S113) similar of acute pyogenic infection of finger tip.
The invention has the beneficial effects as follows:
The present invention analyzes by carrying out structure effect to the conventional additive in acid copper-plating technique, seek the additive molecule that this class of sorbitol anhydride cetylate (S113) molecule has multiple performance, it is simultaneously with the characteristic of above-mentioned three kinds of conventional additive (wetting agent S24, leveling agent L26 and brightening agent A28), but prove through electrochemical analysis and electroplating experiments, it can not range again any one in wetting agent, leveling agent or brightening agent.This new additive agent molecule can replace the composition that in traditional bright copper plating system, cost is higher or relative performance is unstable, or two doses of bright copper plating systems can be constructed, effectively can reduce the operation and maintenance cost of client like this, promote the development of non-dye system bright copper plating technique and open up more wide possibility space for the foundation of its new theory pattern.
Above-mentioned explanation is only the general introduction of technical solution of the present invention, in order to better understand technique means of the present invention, and can be implemented according to the content of specification sheets, coordinates accompanying drawing to describe in detail below with preferred embodiment of the present invention.The specific embodiment of the present invention is provided in detail by following examples and accompanying drawing thereof.
Accompanying drawing explanation
Accompanying drawing described herein is used to provide a further understanding of the present invention, and form a application's part, schematic description and description of the present invention, for explaining the present invention, does not form inappropriate limitation of the present invention.In the accompanying drawings:
In mother liquor, the electroplating effect figure of leveling agent L26 and brightening agent A28 is only added when Fig. 1 is plating;
Fig. 2 for adding the electroplating effect figure of sorbitol anhydride cetylate (S113), leveling agent L26 and brightening agent A28 in mother liquor during plating;
In mother liquor, the electroplating effect figure of wetting agent S24 and brightening agent A28 is only added when Fig. 3 is plating;
Fig. 4 for adding the electroplating effect figure of sorbitol anhydride cetylate (S113), wetting agent S24 and brightening agent A28 in mother liquor during plating;
In mother liquor, the electroplating effect figure of wetting agent S24 and leveling agent L26 is only added when Fig. 5 is plating;
Fig. 6 for adding the electroplating effect figure of sorbitol anhydride cetylate (S113), wetting agent S24 and leveling agent L26 in mother liquor during plating;
Fig. 7 adds sorbitol anhydride cetylate (S113) for during plating in mother liquor, then adds a kind of electroplating effect figure in wetting agent S24, leveling agent L26 or brightening agent A28.
Embodiment
Below with reference to the accompanying drawings and in conjunction with the embodiments, describe the present invention in detail.
An application for sorbitol anhydride cetylate, the chemical formula of described sorbitol anhydride cetylate is C 22h 42o 6, described sorbitol anhydride cetylate as additive application in acid copper-plating technique, one or both to replace in the wetting agent S24, leveling agent L26 and the brightening agent A28 that use in traditional technology.
Sorbitol anhydride cetylate (S113) possesses the characteristic of multiple conventional additive simultaneously, the any one in traditional wetting agent S24, leveling agent L26 and brightening agent A28 can be replaced in acid copper-plating technique, with other two kinds of described conventional additive with the use of, form the additive system of three doses.Under certain conditions, also can replace the conventional additive described in two kinds, and coordinate with conventional additive described in another, composition only has the additive system of two doses.
The present invention passes through great many of experiments, explore sorbitol anhydride cetylate (S113) and be applied in the feasibility in acid copper-plating technique as new additive agent, have studied its in sour copper plating system with other conventional additive (as wetting agent S24, leveling agent L26 or brightening agent A28) with the use of the impact on quality of coating.Its specific experiment flow process is as follows:
1, the preparation of electroplating chemical solution system;
(1) the mother liquor 500ml needed for plating is prepared:
A. concentration is the CuSO of 200g/L 45H 2o solution;
B. concentration is the H of 100g/L 2sO 4solution;
C. concentration is the Cl of 50ppm -solution;
By the CuSO of calculated amount 45H 2o deionized water and stirring is fully dissolved, and slowly adds the H of calculated amount 2sO 4and HCl, be diluted to 1L after filtration, get in 500ml to beaker for subsequent use.
(2) additive needed for plating is prepared:
Concentration is the sorbitol anhydride cetylate (S113) of 5mL/L.
Concentration is traditional wetting agent S24 of 10mL/L;
Concentration is traditional leveling agent L26 of 10mL/L;
Concentration is traditional brightening agent A28 of 10mL/L;
Additive solids powder deionized water dissolving is diluted in 50ml volumetric flask for subsequent use.
2, plating conditions and method;
(1) anode: phosphorus-copper anode;
(2) negative electrode: sheet brass, containing 0.1% sodium laurylsulfonate (SDS) the 0.2N NaOH aqueous solution in soaking and washing 3min, clean with deionized water rinsing, in 10% dilute sulphuric acid, immerse 5s take out, by washed with de-ionized water, then for plating;
(3) size of current and the time: 5A, 1min;
(4) alr mode: pneumatic stirring.
(5) electro-plating method: S24, L26, A28 and/or S113 aqueous solution of taking calculated amount adds in the Hull groove at mother liquor place successively, and makes full use of more than pneumatic blending 10min.
3, electroplating experimental results contrast;
(1) using sorbitol anhydride cetylate (S113) as wetting agent;
Contrast experiment 1: in mother liquor, only add leveling agent L26 and brightening agent A28;
Contrast experiment 2: in mother liquor, add sorbitol anhydride cetylate (S113), leveling agent L26 and brightening agent A28;
Shown in Fig. 1 and Fig. 2, Fig. 1 represents the electroplating effect figure of contrast experiment 1, and Fig. 2 represents the electroplating effect figure of contrast experiment 2.
(2) using sorbitol anhydride cetylate (S113) as leveling agent;
Contrast experiment 3: in mother liquor, only add wetting agent S24 and brightening agent A28;
Contrast experiment 4: in mother liquor, add sorbitol anhydride cetylate (S113), wetting agent S24 and brightening agent A28;
Shown in Fig. 3 and Fig. 4, Fig. 3 represents the electroplating effect figure of contrast experiment 3, and Fig. 4 represents the electroplating effect figure of contrast experiment 4.
(3) using sorbitol anhydride cetylate (S113) as brightening agent;
Contrast experiment 5: in mother liquor, only add wetting agent S24 and leveling agent L26;
Contrast experiment 6: in mother liquor, add sorbitol anhydride cetylate (S113), wetting agent S24 and leveling agent L26;
Shown in Fig. 5 and Fig. 6, Fig. 5 represents the electroplating effect figure of contrast experiment 5, and Fig. 6 represents the electroplating effect figure of contrast experiment 6.
(4) sorbitol anhydride cetylate (S113) is replaced two kinds in wetting agent S24, leveling agent L26 or brightening agent A28;
Contrast experiment 7: in mother liquor, add sorbitol anhydride cetylate (S113), then add the one in wetting agent S24, leveling agent L26 or brightening agent A28.
Shown in Figure 7, Fig. 7 represents the electroplating effect figure of contrast experiment 7.
The kind of sorbitol anhydride cetylate (S113) of the present invention is not limited only to itself, but all molecules with sorbitol anhydride cetylate (S113) similar of acute pyogenic infection of finger tip.
As can be seen from above-mentioned data: use sorbitol anhydride cetylate (S113) Series Molecules, it has multi-functional in sour copper plating system, can coordinate to reach with conventional additive and make copper coating light, smooth object, also may be used for two agent addition agent systems simultaneously, obtain homogeneous, smooth, bright copper electrolytic coating equally.Up to now, the application example of this molecule in electroplating additive field is not also found.
Above-described embodiment, just in order to technical conceive of the present invention and feature are described, its objective is and is one of ordinary skilled in the art can be understood content of the present invention and implement according to this, can not limit the scope of the invention with this.The change of every equivalence done by the essence of content of the present invention or modification, all should be encompassed in protection scope of the present invention.

Claims (1)

1. an application for sorbitol anhydride cetylate, the chemical formula of described sorbitol anhydride cetylate is C 22h 42o 6, it is characterized in that, described sorbitol anhydride cetylate as additive application in acid copper-plating technique, one or both to replace in the wetting agent S24, leveling agent L26 and the brightening agent A28 that use in traditional technology.
CN201510521496.1A 2015-08-24 2015-08-24 Application of sorbitan palmitate Pending CN105018979A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510521496.1A CN105018979A (en) 2015-08-24 2015-08-24 Application of sorbitan palmitate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510521496.1A CN105018979A (en) 2015-08-24 2015-08-24 Application of sorbitan palmitate

Publications (1)

Publication Number Publication Date
CN105018979A true CN105018979A (en) 2015-11-04

Family

ID=54409266

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510521496.1A Pending CN105018979A (en) 2015-08-24 2015-08-24 Application of sorbitan palmitate

Country Status (1)

Country Link
CN (1) CN105018979A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038161A (en) * 1976-03-05 1977-07-26 R. O. Hull & Company, Inc. Acid copper plating and additive composition therefor
US4990224A (en) * 1988-12-21 1991-02-05 International Business Machines Corporation Copper plating bath and process for difficult to plate metals
CN103687983A (en) * 2011-05-19 2014-03-26 安科有限两合公司 Wetting agent for electrolytic applications and use thereof
CN103924268A (en) * 2013-12-26 2014-07-16 苏州昕皓新材料科技有限公司 Application of acid copper leveling agent

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038161A (en) * 1976-03-05 1977-07-26 R. O. Hull & Company, Inc. Acid copper plating and additive composition therefor
US4990224A (en) * 1988-12-21 1991-02-05 International Business Machines Corporation Copper plating bath and process for difficult to plate metals
CN103687983A (en) * 2011-05-19 2014-03-26 安科有限两合公司 Wetting agent for electrolytic applications and use thereof
CN103924268A (en) * 2013-12-26 2014-07-16 苏州昕皓新材料科技有限公司 Application of acid copper leveling agent

Similar Documents

Publication Publication Date Title
CN103472107B (en) A kind of solid inferior sulfate radical electrode based on silver/silver sulfite and preparation method thereof
KR101361555B1 (en) Tin electroplating bath, tin-plated coating film, tin electroplating method, and electronic device component
CN108118341A (en) A kind of environment-friendly type tin copper coating decoating liquid and its strip method
CN109554730A (en) Tin plating electrolyte and its preparation method and application
CN102828226B (en) Recyclable environment friendly electrolytic stripping solution, preparation method and usage method
CN103252243A (en) Carbon nano tube film load cuprum and palladium bimetallic catalyst, preparation method and application
CN103481583B (en) A kind of surface has the preparation method processing Copper Foil of loose structure
CN111809182A (en) Etching liquid for copper/molybdenum (niobium)/IGZO film layer and preparation method and application thereof
KR20100023986A (en) Gold plating and silver plating method for electroconductive fabric
CN103924269A (en) Application of non-pigmentary leveling agent
KR101657460B1 (en) 2 2-22 - Tin silver plating bath using 2 or 2-22
CN107385487B (en) Tetra- oxa- -3,9- of 2,4,8,10-, two phospha spiro-compound is in the application of HDI plate copper plating rapidly pretreatment solution and its pre-treating technology
CN105088290B (en) Method for preparing layered tin coatings in electrolytic deposition manner
CN104357812B (en) Low-phosphorous chemical nickel-plating concentrated solution and plating process
CN105018979A (en) Application of sorbitan palmitate
CN108998779B (en) Chemical plating solution and environment-friendly alloy surface autocatalytic treatment method
CN101812719B (en) Low-alkalinity electrolytic deburring solution, preparation method and use method thereof
CN111364076A (en) Blind hole filling copper electroplating solution and application thereof
CN105239111A (en) Trivalent chromium electroplate liquid and preparing method thereof
CN105332016B (en) Plating solution for electro-coppering on the carbon nanotubes
CN108517516A (en) A kind of chemical plating liquid and preparation method thereof
CN104120428A (en) Recyclable micro etching chemical treatment agent on surface of copper/copper alloy
CN109234767A (en) A kind of preparation method of spherical ultrafine copper powder
CN105513955B (en) A kind of semiconductor element etching solution and preparation method thereof
CN104928724B (en) A kind of method of the electrolytic preparation dendroid fine copper powder in ethanedioic acid

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20151104

WD01 Invention patent application deemed withdrawn after publication