CN104808448B - The litho machine of cooling device and the application cooling device - Google Patents
The litho machine of cooling device and the application cooling device Download PDFInfo
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- CN104808448B CN104808448B CN201410043850.XA CN201410043850A CN104808448B CN 104808448 B CN104808448 B CN 104808448B CN 201410043850 A CN201410043850 A CN 201410043850A CN 104808448 B CN104808448 B CN 104808448B
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Abstract
The invention discloses the litho machine of a kind of cooling device and the application cooling device, the cooling device includes:An at least water jacket, cooling object is arranged in the water jacket, and the water jacket includes water jacket body and water pipe, and the water pipe includes inner and outer tubes, and one end of the water pipe is provided with the first joint, the revolution for realizing current;At least temperature sensor near cooling object is arranged at, the temperature for monitoring the cooling object;By shunting the shunting torrent plate that torrent pipe is connected with water pipe, regulating valve is provided with the shunting torrent pipe;The circulation water control unit connected by transfer tube with the shunting torrent plate and the temperature control unit for receiving the temperature sensor sensing value.The present invention utilizes inner and outer tubes to set, perturbed force mutual balance and the suppression in pipe for producing fluid dynamic, reduces cooling water pipe to cooling object with this, the power of cooling object, the power for being changed to interact internally will be respectively acting on originally.
Description
Technical field
The present invention relates to IC manufacturing field, the photoetching of more particularly to a kind of cooling device and the application cooling device
Machine.
Background technology
Lithographic equipment is that required pattern is applied on substrate by one kind, typically the machine on the target part of substrate.Example
Such as, lithographic equipment can be used in integrated circuit(IC)Manufacturing process in.In such a case, it is possible to by mask or mask
Patterning device be used for generate the IC individual layer circuit pattern.Pattern imaging is arrived by the way that pattern is imaged onto offer
Radiation sensitive material layer on substrate(Resist)Upper progress.Generally, single substrate will be adjacent comprising what is be successively exposed
The network of target part.Conventional lithographic equipment includes:Stepper, in the stepper, by the way that whole patterns are exposed successively
Light is to radiating each target part on the target part;And scanning machine:In the scanning machine, pass through radiation beam edge
Assigned direction(" scanning " direction)Scan the pattern, while being served as a contrast along described in the scanning direction parallel or antiparallel with the direction
Bottom radiates each target part.It is of course also possible to will from patterning device by way of by imprint patterns to substrate
Pattern is formed onto substrate.And high accuracy and the target that is currently aimed at as photoetching technique of high-resolution are, it is necessary to lithographic equipment
Mutually it is accurately positioned between each part, for example, keeps patterning device(Such as mask)Reticle stage, optical projection system and guarantor
Hold the substrate table of substrate.In addition to the positioning of reticle stage and substrate table, optical projection system also faces this needs.In current device
In optical projection system include bearing structure, such as lens mounting(The situation of transmitted light)Or mirror frame(The feelings of reflected light
Shape), and including multiple optical elements, such as lens element, speculum.
Requirement of the litho machine to projection objective internal environment is high, especially the stability and uniformity requirement of temperature.By
Laser explosure is carried out in long-time, projection objective internal temperature changes with the time for exposure.The change of lens objectives internal temperature
Focal plane can be caused to drift about, cause the distortion of exposure lines and astigmatism, the quality of serious reduction exposure lines.
A kind of temperature control device of projection lens of lithography machine is currently, there are, water inlet pipe and outlet pipe are respectively welded the device
On lens barrel outer wall, then pass to cooling water and cooled down when object lens expose and temperature control.The mechanical model of its stress is such as
Shown in Fig. 1, water inlet pipe and outlet pipe are connected by a kind of welding of connecting spring 2 of high rigidity with cooling object 1 respectively, when logical
Enter after cooling water, the fluctuation of outside cooling water pressure and flow produces the perturbed force F of fluid, passes through water inlet pipe and outlet pipe point
Do not act on cooling object 1.Although water inlet pipe and outlet pipe arrangement adjacent to one another and placement, substantially, nothing is cancelled out each other
With the effect and function of disturbance suppression power.Again due to object lens, silicon chip in the prior art(It is placed on workpiece platform micro-motion platform)And mask
(It is placed on mask platform micropositioner)It is to influence three big subsystems of photoetching resolution and alignment, is all placed in the inside generation of litho machine
Boundary, is cooled down using the above method, and litho machine Inner-world is directly impacted in disturbance, in high frequency(More than 200Hz frequency range
In)Cause the vibrational perturbation to object lens, workpiece platform micro-motion platform and mask platform micropositioner larger, influence the lithographic results of litho machine.
The content of the invention
The present invention provides the litho machine of a kind of cooling device and the application cooling device, to solve litho machine in the prior art
The problem of temperature control device of projection objective is larger to Optical Coatings for Photolithography internal disturbance.
In order to solve the above technical problems, the present invention provides a kind of cooling device, including:
An at least water jacket, cooling object is arranged in the water jacket, and the water jacket includes water jacket body and is wrapped in the water jacket
The water pipe of external wall, the water pipe includes inner tube and the outer tube being set in said inner tube, and one end of the water pipe is provided with the
One joint, the revolution for realizing current;
At least one is arranged at the temperature sensor near cooling object, and the temperature sensor is used to monitor the cooling pair
The temperature of elephant;
By shunting the shunting torrent plate that torrent pipe is connected with water pipe, the shunting torrent plate passes through shunting torrent Guan Xiangshui
Pipe provides recirculated water and received is provided with regulating valve on the recirculation water in the water pipe, the shunting torrent pipe;
The circulation water control unit connected by transfer tube with the shunting torrent plate, the temperature for controlling recirculated water, and
By the transfer tube recirculated water is provided to the shunting torrent plate;
Temperature control unit for receiving the temperature sensor sensing value, the temperature control unit is according to cooling pair
The temperature value of elephant adjusts the temperature and the opening degree of regulating valve of the recirculated water of circulation water control unit offer.
Preferably, in described cooling device, the cooling device includes two water jackets, respectively the first water jacket and
Second water jacket, first, second water jacket includes a water jacket body and is wrapped in a water pipe of the external wall of the water jacket, described point
Flow torrent plate and provide recirculated water to the water pipe of first, second water jacket respectively.
Preferably, in described cooling device, the section of the water pipe is circular or ellipse.
Preferably, in described cooling device, the inner tube of the water pipe is flexible hose, and outer tube is metal tube.
Preferably, 3~4 fins are provided with described cooling device, in said inner tube, the fin and water pipe
Diameter parallel or with helix shape.
Preferably, in described cooling device, the external diameter of the fin is less than the internal diameter of the outer tube.
Preferably, in described cooling device, the current circulation area in said inner tube and outer tube is equal.
Preferably, in described cooling device, first joint uses the Klein bottle joint that top is shaved,
It includes:First inner tube and the first outer tube, first inner tube are connected with inner tube, and first outer tube is connected with outer tube.
Preferably, in described cooling device, the water pipe by the second joint respectively with water inlet pipe and return pipe
Connection.
Preferably, in described cooling device, second joint is the Klein Gordon equation that top and bottom are shaved
Bottle joint, it includes the second inner tube and the second outer tube, and one end of second inner tube and the inner tube of water pipe are connected, and the other end is with returning
Water pipe is connected;One end of second outer tube and the outer tube of water pipe are connected, and the other end is connected with water inlet pipe.
Preferably, in described cooling device, the water pipe is welded on the cooling object by a connecting spring
On.
Preferably, in described cooling device, the cooling object is object lens, and the object lens include multiple eyeglasses, institute
State water pipe uneven distribution on the water jacket body, the water pipe according to the multiple eyeglass heat radiation power and density is distributed.
The present invention also provides a kind of litho machine, and the projection objective of the litho machine is provided with described cooling device.
Preferably, in described litho machine, the mask motion platform of the litho machine and the micropositioner of silicon chip sports platform
On be provided with the cooling device.
Compared with prior art, the present invention has advantages below:The water pipe of cooling is divided into inside and outside two layers by the present invention, outside
Pipe is as water inlet pipe, and inner tube is as return pipe, using the of substantially equal property of inner and outer tubes flow, pressure, by fluid dynamic
The perturbed force of generation is mutually balanced and suppressed in pipe, is reduced cooling water pipe to cooling object with this, will be respectively acting on originally
Cool down the power of object, the power for being changed to interact internally.
Brief description of the drawings
Fig. 1 is cooling device mechanical model schematic diagram in the prior art;
Fig. 2 is the structural representation of litho machine in the embodiment of the invention;
Fig. 3 is the structural representation of cooling device in the embodiment of the invention;
Fig. 4 is the mechanical model schematic diagram of cooling device in the embodiment of the invention;
Fig. 5 is applied to structural representation during object lens for cooling device in the embodiment of the invention;
Fig. 6 a~6d is the schematic cross-section of water pipe in cooling device in the embodiment of the invention;
Fig. 7~9 are respectively the structural representation of water pipe in cooling device in the embodiment of the invention.
In Fig. 1:1- coolings object, 2- connecting springs.
In Fig. 2~9:10- irradiation systems, 20- optical projection systems, 30- mask motions platform, 40- silicon chips sports platform, 50- alignments
Device, 60- cooling devices, 70- connecting springs.
100- coolings object, the eyeglasses of 110- first, the eyeglasses of 120- second, the eyeglasses of 150- the 3rd;
200- water jackets, the water jackets of 210- first, the water jackets of 220- second, 230- water pipes, 231- inner tubes, 232- outer tubes, 233- wings
Piece, the joints of 240- first;
300- temperature sensors, 400- shuntings torrent pipe, 410- regulating valves, the joints of 420- second, 500- shunting torrent plate,
600- circulations water control unit, 700- temperature control units.
Embodiment
In order to facilitate the understanding of the purposes, features and advantages of the present invention, below in conjunction with the accompanying drawings to the present invention
Embodiment be described in detail.It should be noted that, accompanying drawing of the present invention uses simplified form and uses non-essence
Accurate ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
The litho machine of the present invention is as shown in Fig. 2 it mainly includes:
Irradiation system 10, for launching and adjusting radiation beam;It uses electromagnetic radiation as radiation source, and radiation mode includes
Ultraviolet radioactive, far ultraviolet radiation and particle-beam radiation.Wherein, ultraviolet radioactive can use wavelength for 365nm, 248nm, 193nm,
157nm or 126nm ultraviolet light is used as light source, it would however also be possible to employ wavelength for 5-20nm extreme ultraviolet light as light source, certainly
Ion beam or electron beam can also be used.
Optical projection system 20, is refracting optical system, reflection optical system, catadioptric type optical system, magnetic type
One or more in optical system, electromagnetic type optical system and electrostatic optical systems.
Mask, i.e. patterning device, can assign on the cross section of radiation beam pattern radiation beam, so as in substrate
Target part on formed pattern any device.Generally, pattern includes phase shift characteristics or supplemental characteristic.That is, being assigned
Give the pattern of radiation beam will be corresponding with the specific functional layer in the device formed on target part.
Further, the patterning device can be transmission-type or reflective.Patterning device include mask, can
Program reflection mirror array and programmable liquid crystal display (LCD) panel.The mask uses binary mask type, alternate type phase shift
One or more in mask-type, attenuated phase shift mask type.Wherein, the operation principle of the array of programmable mirrors
For:Using the matrix arrangements of small reflector, each small reflector can be individually tilted, to reflect incident along different directions
Radiation beam.The inclined speculum is imparted to pattern the radiation beam reflected by reflection mirror array.
Mask motion platform 30, including supporting construction, the supporting construction are set with the orientation dependent on patterning device, photoetching
The mode whether standby design and patterning device are maintained at the medium other conditions of vacuum environment keeps patterning device.
The supporting construction can keep patterning device using machinery, vacuum or other clamping techniques.Certainly, supporting construction can
To be framework or platform, for example, the support meanss can turn into fixed or moveable as needed.Supporting construction can be true
Patterning device is protected to be located on desired position.
Silicon chip sports platform 40(Or work stage), the function of silicon chip sports platform 40 is to carry silicon chip and move to the position specified
Put(At station)Carry out the operation of corresponding process.The litho machine can have two(Dual stage) or more silicon chip sports platform
40, concurrently using additional silicon chip sports platform 40 and/or supporting construction.
Alignment device 50, its function is to complete to be directed at the horizontal level of silicon chip and mask.Radiation beam incides mask simultaneously
It is patterned.Through after mask, radiation beam is by optical projection system 20, and the optical projection system 20 is by the mesh of radiation beam to substrate
Mark on part.By the help of positioner and position sensor such as interferometric device, linear encoder or capacitance sensor,
Accurately travelling workpiece platform, so as to which different target parts is positioned in the path of the radiation beam.
Further, litho machine also includes a micro environment control system, the environmental pressure for controlling projection exposure region
(Vacuum), temperature and pollutant.It mainly includes cooling device 60, and the cooling device 60 not only can be only used for optical projection system
In object lens, and can be used in the micropositioner of main substrate and mask motion platform 30 and silicon chip sports platform 40.
Fig. 3 is refer to, and the cooling device 60 combined in Fig. 4~9, the present embodiment includes:
An at least water jacket 200, cooling object 100 is arranged in the water jacket 200, and the water jacket 200 includes water jacket body and twined
The water pipe 230 of the external wall of the water jacket is wound on, the water pipe 230 includes inner tube 231 and the outer tube being set in said inner tube 231
232, one end of the water pipe 230 is provided with the first joint 240, the revolution for realizing current;
At least temperature sensor 300 near cooling object 100 is arranged at, the temperature sensor 300 is used to monitor
The temperature of the cooling object 100;
By shunting the shunting torrent plate 500 that torrent pipe 400 is connected with water pipe 230, the shunting torrent plate 500 passes through this point
Stream torrent pipe 400 provides recirculated water and received and set on the recirculation water in the water pipe 230, the shunting torrent pipe 400 to water pipe 230
There is regulating valve 410;
The circulation water control unit 600 connected by transfer tube with the shunting torrent plate 500, the temperature for controlling recirculated water
Degree, and provide recirculated water to the shunting torrent plate 500 by the transfer tube;
Temperature control unit 700 for receiving the sensing value of temperature sensor 300, the temperature control unit 700
The temperature and regulating valve 410 of the recirculated water of the circulation water control unit 600 offer are provided according to the temperature value of cooling object 100
Opening degree.
In the present embodiment, using the projection objective in optical projection system 20 as cooling object 100, Fig. 3 is continued referring to, enters one
Step, the cooling device 60 includes the first water jacket 210 and the second water jacket 220, and first, second water jacket 210,220 is wrapped
Include a water jacket body and be wrapped in the water pipe 230 of the external wall of the water jacket, the shunting torrent plate 500 is respectively to first, second water
The water pipe 230 of set 210,220 provides recirculated water.
Specifically, the outer tube 232 of water pipe 230 is a kind of metal rigidity water pipe, and its inner tube 231 is a kind of flexible water conduit.Institute
The Klein bottle joint that the first joint 240 is shaved using top is stated, it includes:First inner tube and the first outer tube, described first
Inner tube is connected with inner tube 231, and first outer tube is connected with outer tube 232.When the water in water pipe 230 flows to the end of cooling object 100
During end, the water in outer tube 232 is entered in the first joint 240, is passed sequentially through after the first outer tube and the first inner tube, is back to inner tube
In 231.
The water pipe 230 is connected with water inlet pipe and return pipe respectively by the second joint 420, and water pipe 230 and shunting are anxious
Connected between flow tube 400 also by the second joint 420.Specifically, second joint 420 is what top and bottom were shaved
Klein bottle joint, is breeches joint, and it includes the second inner tube and the second outer tube, one end and the water pipe 230 of second inner tube
Inner tube 231 is connected, and the other end is connected with return pipe;One end of second outer tube is connected with the outer tube 232 of water pipe 230, another
End is connected with water inlet pipe.
In first water jacket 210 and the second water jacket 220, entrance and the outlet of water pipe 230 be distributed in its each water jacket body it is neighbouring
The side of the ring flange of projection objective.By taking the first water jacket 210 as an example, shunting torrent plate 500 by shunt torrent pipe 400 to this
The water pipe 230 of one water jacket 210 provides recirculated water, so as to cool down the projection objective inside first water jacket 210.Receive the water simultaneously
The recirculation water of the backflow water pipe of pipe 230.Regulating valve 410 is provided with the shunting torrent pipe 400, for adjusting the water pipe 230
The flow of the recirculated water gone out in overflow pipe, so as to adjust the heat exchange value of first water jacket 210 and the projection objective, and then is adjusted
To the cooling effect of the projection objective.
As shown in figure 5, being distribution schematic diagram of the water pipe 230 on water jacket body of the cooling device 60 on projection objective.By
It is similar with the arrangement mode of the upper hose 230 of the second water jacket 220 in first water jacket 210, with water pipe 230 on the first water jacket 210
Distribution mode exemplified by, illustrate the distribution mode of water pipe 230.Because usual projection objective includes multiple eyeglasses, as shown in Figure 5
First eyeglass 110, the second eyeglass 120, the 3rd eyeglass 150.
In exposure process, eyeglass can absorb the heat of laser and generate heat, but heat dissipation capacity is very small during laser light air,
So the thermal source inside the projection objective is essentially from eyeglass.In order to adjust the optical parametric of the projection objective, eyeglass is in the throwing
Position distribution in shadow object lens is uneven, and because the focusing power difference of eyeglass make it that the heat absorption capacity of different eyeglasses is different,
Therefore, the eyeglass heating inside the projection objective is uneven.In Fig. 5, the heat radiation power of first eyeglass 110 is maximum, should
The heat radiation power of second eyeglass 120 takes second place,
The heat radiation power of 3rd eyeglass 150 is minimum, the water pipe 230 according to first, second, third eyeglass 110,120,
150 heat radiation power and density is distributed.Specifically, the distribution density of the water pipe 230 relative with first eyeglass 110 is maximum, this
Gap between part water pipe 230 is l1;The distribution density of the water pipe 230 relative with second eyeglass 120 is taken second place, this part water
Gap between pipe 230 is l2;The distribution density of the water pipe 230 relative with the 3rd eyeglass 150 is minimum, this part water pipe 230
Between gap be l3.Gap l between the water pipe 2301、l2、l3Value increases successively.The cooling dress of the projection objective of the present invention
Put 60 and density layout is carried out to water pipe 230 according to the different of the heat dissipation capacity of eyeglass, in the region that the projection objective heat dissipation capacity is larger,
Water pipe winds comparatively dense, and in the less region of projection objective heat dissipation capacity, water pipe 230 winds sparse, can so make water
Set 200 takes away more heats in radiate big region of the projection objective, and the projection objective radiate small region take away compared with
Few heat, it is easier to ensure the overall uniformity of the projection objective internal temperature.
As shown in Fig. 6 a~6d, the water pipe 230 has double-layer structure, and outside is a kind of metal rigidity water pipe, and inside is one
Kind of flexible water conduit, the cross sectional shape of water pipe 230 can be round or ellipse, or other suitable fluid-cooled shapes.With circle
Exemplified by shape, as shown in Figure 6 a, the cross section of fluid channel of outer tube 232 is in an annular, and inner tube cross section of fluid channel is one circular, both inner tubes
231 sectional area A are of substantially equal with the sectional area B of outer tube 232, to ensure that there is fluid identical circulation path and continuous flow to pass through
Wear.In addition, as shown in figs. 6 c and 6d, a kind of 3 points arrangements or 4 points of arrangements can also be included in the profile of inner tube 231, i.e.
Fin 233 is set in inner tube 231, and the fin 233 supports for a kind of radial compliance of inner tube 231.The fin of this water conservancy diversion
233 can be with coaxial line parallel arrangement or helix shape.Further, fin 233 and inner tube 231 are consubstantiality
Flexible material, and the external diameter of fin 233 is less than the internal diameter of outer tube 232, and make have certain gap between the two.
Please emphasis reference picture 4, further, the water pipe 230 by a connecting spring 70 be fixed on cooling object 100
On.Specifically, because water inlet pipe is to carry fluid mass in outer tube 232, can be considered a mass body, its bottom by welding or
Assembling is connected with cooling object 100.There is a flexible pipe in outer tube 232, flexible pipe possesses the property of certain heat conduction and conduction, flexible pipe
Inside is connected with backwater, and the backwater has certain mass.Flexible pipe due to the flexible of itself and has certain connection with outer tube simultaneously
(Fin 233), have fluid and pressure inside and outside it, itself be preferably spring and damping system.When outer pipe fluid pressure and
When flow is disturbed, the fluid of inner tube flows through inner tube in a reverse direction, and the pressure and flow of its fluid are also being disturbed,
Both mutually balance, mutually suppress, with this reduce integral cooling device to cool down object perturbed force and vibration values.
As shown in figs. 7-9, the arrangement and connected mode of inside and outside double-deck cooling water pipe of the invention have a variety of.Water pipe 230 is in
Linear state, snakelike or spiral status are arranged on cooling object 100.Specifically, its by it is upper under successively, can be divided into this
Three ends.Top is the first joint 240;Stage casing is water pipe 230, and bottom is the second joint 420.Certainly, the end of water pipe 230 and the
One joint 240 is connected.First inner tube of first joint 240 is connected, further, the first inner tube and inner tube with inner tube 231
Snap joint or the seal nipple connection with rotatable function can be used between 231.Similarly, first joint 240
Using snap joint or the joint connection of tool spiral shape cone seal between first outer tube and outer tube 232.The other end of water pipe 230 with
Second joint 420 is connected, specifically, and one end of the second outer tube is connected with outer tube 231, and the other end of the second outer tube connects with water inlet pipe
Connect;One end of second inner tube is connected with inner tube 231, and the other end is connected with outlet pipe.Wherein, the second outer tube and outer tube 232, second
The connection between connected mode and the first outer tube and the inner tube of outer tube 232 and first and inner tube 231 between inner tube and inner tube 231
Mode is identical, and here is omitted.
It should be noted that inner and outer pipe 231,232 is as water pipe 230 in the present invention, using the first joint 240 and second
420 two kinds of Klein bottle joints of joint carry out flow cavitation result, and its internal and external flow field constituted is not limited in straight line, snakelike and spiral
Shape state, it with bending and can be combined into various states and shape, including S types, ellipse, planar spiral or stadium runway
One or more in shape.
To sum up, the litho machine of cooling device 60 of the invention and the application cooling device 60, the cooling device 60 includes:Extremely
A few water jacket 200, cooling object 100 is arranged in the water jacket 200, and the water jacket 200 includes water jacket body and is wrapped in the water
The water pipe 230 of body outer wall, the water pipe 230 includes inner tube 231 and the outer tube 232 being set in said inner tube 231, the water
One end of pipe 230 is provided with the first joint 240, the revolution for realizing current;It is arranged at least one near cooling object 100
Temperature sensor 300, the temperature sensor 300 is used for the temperature for monitoring the cooling object 100;By shunting torrent pipe
The 400 shunting torrent plates 500 connected with water pipe 230, the shunting torrent plate 500 is carried by the shunting torrent pipe 400 to water pipe 230
For recirculated water and the recirculation water in the water pipe 230 is received, regulating valve 410 is provided with the shunting torrent pipe 400;Pass through transfer tube
The circulation water control unit 600 connected with the shunting torrent plate 500, the temperature for controlling recirculated water, and pass through the transfer tube
Recirculated water is provided to the shunting torrent plate 500;Temperature control unit 700 for receiving the sensing value of temperature sensor 300,
The temperature control unit 700 adjusts the recirculated water of the circulation water control unit 600 offer according to the temperature value of cooling object 100
Temperature and regulating valve 410 opening degree.230 points of the water pipe of cooling is inside and outside two layers by the present invention, and outer tube 232 is used as
Water pipe, inner tube 231 is as return pipe, using inner tube 231 and the of substantially equal property of the flow of outer tube 232, pressure,
The perturbed force that fluid dynamic is produced mutually is balanced and suppressed in pipe, and 230 pairs of coolings of cooling water pipe are reduced with this
Object 100(Such as object lens, the disturbance of micropositioner), the power of cooling object 100 will be respectively acting on originally, be changed to including interaction
The power in portion.
Obviously, those skilled in the art can carry out the spirit of various changes and modification without departing from the present invention to invention
And scope.So, if these modifications and variations of the present invention belong to the claims in the present invention and its equivalent technologies scope it
Interior, then the present invention is also intended to including these changes and modification.
Claims (12)
1. a kind of cooling device, including:
An at least water jacket, cooling object is arranged in the water jacket, and the water jacket includes water jacket body and to be wrapped in the water jacket external
The water pipe of wall, the water pipe includes being provided with 3~4 fins in inner tube and the outer tube being set in said inner tube, said inner tube,
The diameter parallel of the fin and water pipe is made, institute with helix shape, said inner tube and the fin using flexible material
Outer tube is stated for metal tube, one end of the water pipe is provided with the first joint, the revolution for realizing current;
At least one is arranged at the temperature sensor near the cooling object, and the temperature sensor is used to monitor the cooling pair
The temperature of elephant;
By shunting the shunting torrent plate that torrent pipe is connected with the water pipe, the shunting torrent plate is by the shunting torrent pipe to institute
Water pipe offer recirculated water is provided and received and is provided with regulating valve on the recirculation water in the water pipe, the shunting torrent pipe;
The circulation water control unit connected by transfer tube with the shunting torrent plate, for controlling the temperature of recirculated water, and passes through
The transfer tube provides recirculated water to the shunting torrent plate;
Temperature control unit for receiving the temperature sensor sensing value, the temperature control unit is according to cooling object
Temperature value adjusts the temperature and the opening degree of regulating valve of the recirculated water of circulation water control unit offer.
2. cooling device as claimed in claim 1, it is characterised in that the cooling device includes two water jackets, respectively the
One water jacket and the second water jacket, first, second water jacket include a water jacket body and are wrapped in a water of the external wall of the water jacket
Pipe, the shunting torrent plate provides recirculated water to the water pipe of first, second water jacket respectively.
3. cooling device as claimed in claim 1, it is characterised in that the section of the water pipe is circular or ellipse.
4. cooling device as claimed in claim 1, it is characterised in that the external diameter of the fin is less than the internal diameter of the outer tube.
5. cooling device as claimed in claim 1, it is characterised in that the current circulation area phase in said inner tube and outer tube
Deng.
6. cooling device as claimed in claim 1, it is characterised in that first joint uses the Klein Gordon equation that top is shaved
Bottle joint, it includes:First inner tube and the first outer tube, first inner tube are connected with inner tube, and first outer tube connects with outer tube
It is logical.
7. cooling device as claimed in claim 1, it is characterised in that the water pipe by the second joint respectively with water inlet pipe and
Return pipe is connected.
8. cooling device as claimed in claim 7, it is characterised in that second joint is what top and bottom were shaved
Klein bottle joint, it includes the second inner tube and the second outer tube, and one end of second inner tube and the inner tube of water pipe are connected, another
End is connected with return pipe;One end of second outer tube and the outer tube of water pipe are connected, and the other end is connected with water inlet pipe.
9. cooling device as claimed in claim 1, it is characterised in that the water pipe is welded on described cold by a connecting spring
But on object.
10. cooling device as claimed in claim 1, it is characterised in that the cooling object is object lens, the object lens include multiple
Eyeglass, water pipe uneven distribution on the water jacket body, the water pipe is dredged according to the heat radiation power of the multiple eyeglass
Close distribution.
11. a kind of litho machine, it is characterised in that the projection objective of the litho machine is provided with any one of claim 1~10
Described cooling device.
12. litho machine as claimed in claim 11, it is characterised in that the mask motion platform and silicon chip sports platform of the litho machine
Micropositioner on be provided with the cooling device.
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CN201410043850.XA CN104808448B (en) | 2014-01-29 | 2014-01-29 | The litho machine of cooling device and the application cooling device |
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CN106933048A (en) * | 2015-12-30 | 2017-07-07 | 上海微电子装备有限公司 | A kind of photo-etching machine objective lens cooling device |
CN112987508B (en) * | 2021-03-04 | 2022-09-30 | 长鑫存储技术有限公司 | Vibration damping structure and exposure apparatus |
CN116859683B (en) * | 2023-08-31 | 2023-11-28 | 光科芯图(北京)科技有限公司 | Device and method for controlling thermal stability of microscope objective lens |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002310575A (en) * | 2001-04-12 | 2002-10-23 | Shimizu Reiki:Kk | Heat exchanger for cooling brine |
CN200953342Y (en) * | 2006-09-27 | 2007-09-26 | 联萌科技股份有限公司 | Improved semiconductor machine |
CN101609262A (en) * | 2009-07-14 | 2009-12-23 | 上海微电子装备有限公司 | The temperature control equipment of projection lens of lithography machine |
CN202501786U (en) * | 2012-03-22 | 2012-10-24 | 重庆昌进制冷设备有限责任公司 | Internal and external tooth cooling tube |
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---|---|---|---|---|
US20130087306A1 (en) * | 2011-10-09 | 2013-04-11 | Bernard Meredith Winn, JR. | Forced Insertion Concentric Ground-Coupled Heat Exchanger for Ground Source Heat Pumps |
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2014
- 2014-01-29 CN CN201410043850.XA patent/CN104808448B/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002310575A (en) * | 2001-04-12 | 2002-10-23 | Shimizu Reiki:Kk | Heat exchanger for cooling brine |
CN200953342Y (en) * | 2006-09-27 | 2007-09-26 | 联萌科技股份有限公司 | Improved semiconductor machine |
CN101609262A (en) * | 2009-07-14 | 2009-12-23 | 上海微电子装备有限公司 | The temperature control equipment of projection lens of lithography machine |
CN202501786U (en) * | 2012-03-22 | 2012-10-24 | 重庆昌进制冷设备有限责任公司 | Internal and external tooth cooling tube |
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