CN104808448A - Cooling device and photoetching machine with cooling device - Google Patents
Cooling device and photoetching machine with cooling device Download PDFInfo
- Publication number
- CN104808448A CN104808448A CN201410043850.XA CN201410043850A CN104808448A CN 104808448 A CN104808448 A CN 104808448A CN 201410043850 A CN201410043850 A CN 201410043850A CN 104808448 A CN104808448 A CN 104808448A
- Authority
- CN
- China
- Prior art keywords
- pipe
- water
- cooling device
- shunting
- water pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
The invention discloses a cooling device and a photoetching machine with the cooling device. The cooling device comprises at least one water jacket, a cooling object is arranged in the water jacket, the water jacket comprises a water jacket body and a water pipe, the water pipe comprises an inner pipe and an outer pipe, one end of the water pipe is provided with a first joint for realizing water flow revolution, the cooling device also comprises at least one temperature sensor nearby the cooling object, the at least one temperature sensor is used for monitoring a temperature of the cooling object, the cooling device also comprises a shunting-connection plate communicated with the water pipe by shunting-connection pipes, the shunting-connection pipes are provided with regulating valves, and the cooling device also comprises a circulating water control unit communicated with the shunting-connection plate by transmission pipes and a temperature control unit used for receiving a sensed value of the temperature sensor. Through the inner pipe and the outer pipe, the disturbance forces produced by fluid power are balanced and inhibited with each other in the pipe so that the cooling water pipe force to the cooling object is reduced, and the original force to the cooling object is transformed into interacting internal forces.
Description
Technical field
The present invention relates to IC manufacturing field, particularly a kind of cooling device and apply the litho machine of this cooling device.
Background technology
Lithographic equipment a kind of is applied on substrate by required pattern, the machine on the target part of normally substrate.Such as, lithographic equipment can be used in the manufacture process of integrated circuit (IC).In this case, the patterning device of mask or mask can be used for the circuit pattern of the individual layer generating described IC.Pattern imaging is undertaken by pattern being imaged onto in the radiation sensitive material layer (resist) that is provided on substrate.Usually, independent substrate will comprise by the network of the adjacent target portions of continuous exposure.Conventional lithographic equipment comprises: stepper, in described stepper, by whole pattern being exposed to successively each target part of radiation on described target part; And scanning machine: in described scanning machine, scan described pattern by radiation beam along assigned direction (" scanning " direction), carry out each target part of radiation along substrate described in parallel with this direction or antiparallel scanning direction simultaneously.Certainly, also can by pattern be formed into substrate from patterning device by the mode of imprint patterns to substrate.And high precision and high resolving power are as the target of the current aiming of photoetching technique, need mutually accurately to locate between each parts of lithographic equipment, such as, keep the substrate table of the mask bed of patterning device (such as mask), optical projection system and maintenance substrate.Except the location of mask bed and substrate table, optical projection system also faces this needs.Optical projection system in current device comprises bearing structure, such as lens mounting (situation of transmitted light) or mirror frame (situation of reflected light), and comprises multiple optical element, such as lens element, catoptron etc.
The requirement of litho machine to projection objective internal environment is high, especially the stability of temperature and uniformity requirement.Owing to carrying out laser explosure for a long time, projection objective internal temperature changed with the time shutter.The change of lens objectives internal temperature can cause focal plane to drift about, and causes the distortion of exposure lines and astigmatism, the serious quality reducing exposure lines.
At present, there is a kind of attemperating unit of projection lens of lithography machine, water inlet pipe and rising pipe are welded on lens barrel outer wall by this device respectively, then pass into chilled water and carry out when object lens expose cooling and temperature control.Its stressed mechanical model as shown in Figure 1, water inlet pipe is connected with cooling object 1 with linking springs 2 welding of rising pipe respectively by a kind of high rigidity, after passing into chilled water, the fluctuation of external refrigeration water pressure and flow produces the disturbing force F of fluid, is acted on respectively on cooling object 1 by water inlet pipe and rising pipe.Although water inlet pipe and rising pipe layout adjacent to one another and arrangement, in fact, without cancelling out each other and the effect and function of disturbance suppression power.Again because object lens, silicon chip (being placed on workpiece platform micro-motion platform) and mask (being placed on mask platform micropositioner) in prior art are the three large subsystems affecting photoetching resolution and alignment, it is all the Inner-world being placed in litho machine, said method is adopted to cool, litho machine Inner-world is directly impacted in disturbance, cause the vibrational perturbation of object lens, workpiece platform micro-motion platform and mask platform micropositioner comparatively large at high frequency (in the frequency range of more than 200Hz), affect the lithographic results of litho machine.
Summary of the invention
The invention provides a kind of cooling device and apply the litho machine of this cooling device, with the problem that the attemperating unit solving projection lens of lithography machine in prior art is larger to Optical Coatings for Photolithography internal disturbance.
For solving the problems of the technologies described above, the invention provides a kind of cooling device, comprising:
At least one water jacket, cooling object is arranged in this water jacket, and described water jacket comprises water jacket body and is wrapped in the water pipe of the external wall of described water jacket, and described water pipe comprises interior pipe and is set in the outer tube on described interior pipe, one end of described water pipe is provided with the first joint, for realizing the revolution of current;
At least one temperature sensor be arranged near cooling object, described temperature sensor is for monitoring the temperature of described cooling object;
By shunting torrent pipe and the shunting torrent plate of cross current, this shunting torrent plate provides recirculated water by this shunting torrent pipe to water pipe and receives the recirculation water in this water pipe, and this shunting torrent pipe is provided with variable valve;
By the recirculated water control module that transfer tube is communicated with this shunting torrent plate, for the temperature of controlled circulation water, and provide recirculated water by this transfer tube to this shunting torrent plate;
For receiving the temperature control unit of described temperature sensor senses value, described temperature control unit adjusts according to the temperature value of cooling object the temperature of recirculated water and the opening degree of variable valve that this recirculated water control module provides.
As preferably, in described cooling device, described cooling device comprises two water jackets, be respectively the first water jacket and the second water jacket, first, second water jacket described includes a water jacket body and is wrapped in a water pipe of the external wall of described water jacket, and described shunting torrent plate provides recirculated water respectively to the water pipe of first, second water jacket.
As preferably, in described cooling device, the cross section of described water pipe is circular or oval.
As preferably, in described cooling device, the interior pipe of described water pipe is flexible hose, and outer tube is metal tube.
As preferably, in described cooling device, described interior pipe is provided with 3 ~ 4 fins, the axis being parallel of described fin and water pipe or with helix shape.
As preferably, in described cooling device, the external diameter of described fin is less than the internal diameter of described outer tube.
As preferably, in described cooling device, the current circulation area in described inner and outer tubes is equal.
As preferably, in described cooling device, described first joint adopts top by the Klein bottle joint pruned, and it comprises: pipe and the first outer tube in first, in described first, pipe is communicated with interior pipe, and described first outer tube is communicated with outer tube.
As preferably, in described cooling device, described water pipe is connected with water inlet pipe and return pipe respectively by the second joint.
As preferably, in described cooling device, described second joint be top and bottom all by the Klein bottle joint pruned, it comprises pipe and the second outer tube in second, and in described second, one end of pipe is connected with the interior pipe of water pipe, and the other end is connected with return pipe; Described one end of second outer tube is connected with the outer tube of water pipe, and the other end is connected with water inlet pipe.
As preferably, in described cooling device, described water pipe is welded on described cooling object by a linking springs.
As preferably, in described cooling device, described cooling object is object lens, and these object lens comprise multiple eyeglass, and described water pipe is uneven distribution on described water jacket body, and described water pipe is density distribution according to the heat radiation power of described multiple eyeglass.
The present invention also provides a kind of litho machine, and the projection objective of described litho machine is provided with described cooling device.
As preferably, in described litho machine, the mask motion platform of described litho machine and the micropositioner of silicon chip sports platform are provided with described cooling device.
Compared with prior art, the present invention has the following advantages: the water pipe of cooling is divided into inside and outside two-layer by the present invention, outer tube is as water inlet pipe, interior pipe is as return pipe, utilize the character that inner and outer tubes flow, pressure are substantially equal, disturbing force hydrodynamic force produced is balance and suppression mutually in pipe, reduces cooling water pipe to cooling object with this, by originally acting on the power of cooling object respectively, changed the power interacted in inside into.
Accompanying drawing explanation
Fig. 1 is cooling device mechanical model schematic diagram in prior art;
Fig. 2 is the structural representation of litho machine in the embodiment of the invention;
Fig. 3 is the structural representation of cooling device in the embodiment of the invention;
Fig. 4 is the mechanical model schematic diagram of cooling device in the embodiment of the invention;
Fig. 5 is structural representation when cooling device is applied to object lens in the embodiment of the invention;
Fig. 6 a ~ 6d is the schematic cross-section of water pipe in cooling device in the embodiment of the invention;
Fig. 7 ~ 9 are respectively the structural representation of water pipe in cooling device in the embodiment of the invention.
In Fig. 1: 1-cools object, 2-linking springs.
In Fig. 2 ~ 9: 10-irradiation system, 20-optical projection system, 30-mask motion platform, 40-silicon chip sports platform, 50-alignment device, 60-cooling device, 70-linking springs.
100-cools object, 110-first eyeglass, 120-second eyeglass, 150-the 3rd eyeglass;
Pipe, 232-outer tube, 233-fin, 240-first joint in 200-water jacket, 210-first water jacket, 220-second water jacket, 230-water pipe, 231-;
300-temperature sensor, 400-shunt torrent pipe, 410-variable valve, 420-second joint, 500-shunting torrent plate, 600-recirculated water control module, 700-temperature control unit.
Embodiment
For enabling above-mentioned purpose of the present invention, feature and advantage become apparent more, are described in detail the specific embodiment of the present invention below in conjunction with accompanying drawing.It should be noted that, accompanying drawing of the present invention all adopts the form of simplification and all uses non-ratio accurately, only in order to object that is convenient, the aid illustration embodiment of the present invention lucidly.
As shown in Figure 2, it mainly comprises litho machine of the present invention:
Irradiation system 10, for launching and regulating radiation beam; It adopts electromagnetic radiation as radiation source, and radiation mode comprises UV radiation, far ultraviolet radiation and particle-beam radiation.Wherein, UV radiation can adopt wavelength be the ultraviolet light of 365nm, 248nm, 193nm, 157nm or 126nm as light source, also can adopt wavelength be the extreme ultraviolet light of 5-20nm as light source, ion beam or electron beam can certainly be adopted.
Optical projection system 20 is one or more in refracting optical system, reflection optical system, catadioptric type optical system, magnetic type optical system, electromagnetic type optical system and electrostatic optical systems.
Mask, i.e. patterning device, can give radiation beam by pattern to form any device of pattern on the target part of substrate on the xsect of radiation beam.Usually, pattern comprises phase shift characteristics or supplemental characteristic.That is, the pattern of radiation beam is endowed by corresponding with the specific functional layer in the device formed on target part.
Further, described patterning device can be transmission-type or reflective.Patterning device comprises mask, array of programmable mirrors and liquid crystal display able to programme (LCD) panel.Described mask adopt in binary mask type, Alternating phase-shift mask type, attenuated phase shift mask type one or more.Wherein, the principle of work of described array of programmable mirrors is: the matrix arrangements adopting small reflector, and can tilt each small reflector independently, to reflect incident radiation beam along different directions.The catoptron of described inclination is imparted to pattern the radiation beam reflected by reflection mirror array.
Mask motion platform 30, comprises supporting construction, and this supporting construction keeps patterning device in the mode depending on the orientation of patterning device, the design of lithographic equipment and patterning device and whether remain on vacuum environment other conditions medium.Described supporting construction can adopt machinery, vacuum or other clamping technique to keep patterning device.Certainly, supporting construction can be framework or platform, and such as, described bracing or strutting arrangement can become fixing or moveable as required.Supporting construction can guarantee that patterning device is positioned on desired position.
Silicon chip sports platform 40(or title work stage), the function of silicon chip sports platform 40 is carried silicon chip and moves to the operation that corresponding operation is carried out in the position (station place) of specifying.Described litho machine can be have two (dual stage) or more silicon chip sports platform 40, uses additional silicon chip sports platform 40 and/or supporting construction concurrently.
Alignment device 50, its function is aimed at the horizontal level of silicon chip and mask.Radiation beam incides mask and is patterned.After mask, radiation beam by optical projection system 20, described optical projection system 20 by radiation beam on the target part of substrate.By the help of locating device and position transducer such as interferometric device, linear encoder or capacitive transducer, accurately travelling workpiece platform, to be positioned different target part in the path of described radiation beam.
Further, litho machine also comprises a micro environment control system, for controlling the environmental pressure (vacuum tightness) in projection exposure region, temperature and pollutant.It mainly comprises cooling device 60, and this cooling device 60 not only may be used for the object lens in optical projection system, and may be used in the micropositioner of main substrate and mask motion platform 30 and silicon chip sports platform 40.
Please refer to Fig. 3, and composition graphs 4 ~ 9, the cooling device 60 in the present embodiment comprises:
At least one water jacket 200, cooling object 100 is arranged in this water jacket 200, described water jacket 200 comprises water jacket body and is wrapped in the water pipe 230 of the external wall of described water jacket, the outer tube 232 that described water pipe 230 comprises interior pipe 231 and is set on described interior pipe 231, one end of described water pipe 230 is provided with the first joint 240, for realizing the revolution of current;
Be arranged at least one temperature sensor 300 near cooling object 100, described temperature sensor 300 is for monitoring the temperature of described cooling object 100;
By the shunting torrent plate 500 that shunting torrent pipe 400 is communicated with water pipe 230, this shunting torrent plate 500 provides recirculated water by this shunting torrent pipe 400 to water pipe 230 and receives the recirculation water in this water pipe 230, and this shunting torrent pipe 400 is provided with variable valve 410;
By the recirculated water control module 600 that transfer tube is communicated with this shunting torrent plate 500, for the temperature of controlled circulation water, and provide recirculated water by this transfer tube to this shunting torrent plate 500;
For receiving the temperature control unit 700 of described temperature sensor 300 sensing value, described temperature control unit 700 adjusts the temperature of the recirculated water that this recirculated water control module 600 provides and the opening degree of variable valve 410 according to the temperature value of cooling object 100.
In the present embodiment, using the projection objective in optical projection system 20 as cooling object 100, continue referring to Fig. 3, further, described cooling device 60 comprises the first water jacket 210 and the second water jacket 220, first, second water jacket 210,220 described includes a water jacket body and is wrapped in the water pipe 230 of the external wall of described water jacket, and described shunting torrent plate 500 provides recirculated water respectively to the water pipe 230 of first, second water jacket 210,220.
Particularly, the outer tube 232 of water pipe 230 is a kind of metal rigidity water pipe, and in it, pipe 231 is a kind of flexible water conduit.Described first joint 240 adopts top by the Klein bottle joint pruned, and it comprises: pipe and the first outer tube in first, in described first, pipe is communicated with interior pipe 231, and described first outer tube is communicated with outer tube 232.When the water in water pipe 230 flows to cooling object 100 end, the water in outer tube 232 enters into the first joint 240, successively by after pipe in the first outer tube and first, is back in interior pipe 231.
Described water pipe 230 is connected with water inlet pipe and return pipe respectively by the second joint 420, and is also connected by the second joint 420 between water pipe 230 with shunting torrent pipe 400.Particularly, described second joint 420 be top and bottom all by the Klein bottle joint pruned, be breeches joint, it comprises pipe and the second outer tube in second, and in described second, one end of pipe is connected with the interior pipe 231 of water pipe 230, and the other end is connected with return pipe; One end of described second outer tube is connected with the outer tube 232 of water pipe 230, and the other end is connected with water inlet pipe.
In first water jacket 210 and the second water jacket 220, entrance and the outlet of water pipe 230 are distributed in the side of its ring flange of contiguous projection objective of water jacket body separately.For the first water jacket 210, shunting torrent plate 500 provides recirculated water by shunting torrent pipe 400 to the water pipe 230 of this first water jacket 210, thus cools the projection objective of this first water jacket 210 inside.Receive the recirculation water of the backflow water pipe of this water pipe 230 simultaneously.This shunting torrent pipe 400 is provided with variable valve 410, for regulating the flow the recirculated water in overflow pipe of this water pipe 230, thus regulates the heat interchange value of this first water jacket 210 and this projection objective, and then regulate the cooling effect to this projection objective.
As shown in Figure 5, be the distribution schematic diagram of water pipe 230 on water jacket body of the cooling device 60 on projection objective.Because this first water jacket 210 is similar with the arrangement mode of the second water jacket 220 upper hose 230, for the distribution mode of water pipe 230 on the first water jacket 210, the distribution mode of water pipe 230 is described.Because usual projection objective comprises multiple eyeglass, the first eyeglass 110, second eyeglass 120 as shown in Figure 5, the 3rd eyeglass 150.
In exposure process, eyeglass is understood the heat of absorbing laser and generates heat, but during laser light air, heat dissipation capacity is very little, so the thermal source of this projection objective inside is mainly from eyeglass.In order to adjust the optical parametric of this projection objective, the position distribution of eyeglass in this projection objective is uneven, and makes the heat absorption capacity of different eyeglass different due to the focusing power difference of eyeglass, and therefore, the eyeglass heating of this projection objective inside is uneven.In Fig. 5, the heat radiation power of this first eyeglass 110 is maximum, and the heat radiation power of this second eyeglass 120 takes second place,
The heat radiation power of the 3rd eyeglass 150 is minimum, and this water pipe 230 is density distribution according to the heat radiation power of this first, second, third eyeglass 110,120,150.Concrete, the distribution density of the water pipe 230 relative with this first eyeglass 110 is maximum, and the gap between this part water pipe 230 is l
1; The distribution density of the water pipe 230 relative with this second eyeglass 120 is taken second place, and the gap between this part water pipe 230 is l
2; The distribution density of the water pipe 230 relative with the 3rd eyeglass 150 is minimum, and the gap between this part water pipe 230 is l
3.Gap l between this water pipe 230
1, l
2, l
3value increases successively.The cooling device 60 of projection objective of the present invention carries out density layout according to the difference of the heat dissipation capacity of eyeglass to water pipe 230, in the region that this projection objective heat dissipation capacity is larger, water pipe is wound around comparatively dense, and in the less region of this projection objective heat dissipation capacity, water pipe 230 is wound around more sparse, water jacket 200 can be made like this to take away more heat in this projection objective large region of dispelling the heat, and take away less heat in this projection objective little region of dispelling the heat, be easier to the overall homogeneity ensureing this projection objective internal temperature.
As shown in Fig. 6 a ~ 6d, described water pipe 230 has double-layer structure, and outside is a kind of metal rigidity water pipe, and inside is a kind of flexible water conduit, and water pipe 230 cross sectional shape can be round or oval, or other applicable fluid-cooled shape.For circle, as shown in Figure 6 a, outer tube 232 cross section of fluid channel is an annular, and interior pipe cross section of fluid channel is a circle, in both it, pipe 231 sectional area A is substantially equal with outer tube 232 sectional area B, to ensure that fluid has identical circulation path and continuous print flow runs through.In addition, as shown in figs. 6 c and 6d, can also comprise at a kind of 3 and arrange or 4 layouts, that is, interior pipe 231 arranges fin 233 in the profile of interior pipe 231, described fin 233 is that a kind of radial compliance of interior pipe 231 supports.The fin 233 of this water conservancy diversion can the layout that parallels of coaxial cable, also can be helix shape.Further, fin 233 and interior pipe 231 are consubstantiality flexible material, and the external diameter of fin 233 is less than outer tube 232 internal diameter, and make there is certain gap between the two.
Please emphasis with reference to Fig. 4, further, described water pipe 230 is fixed on cooling object 100 by a linking springs 70.Particularly, owing to carrying fluid mass in water inlet pipe and outer tube 232, can be considered a mass body, be connected with cooling object 100 by welding or assembling bottom it.Have a flexible pipe in outer tube 232, flexible pipe possesses certain heat conduction and the character of conduction, and inside hose is connected with backwater, and this backwater has certain mass.Simultaneously flexible pipe due to self flexibility and have certain connection (fin 233) with outer tube, having fluid and pressure inside and outside it, self is preferably spring and damping system.When pressure and the flow generation disturbance of outer pipe fluid, the fluid of interior pipe flows through interior pipe with contrary direction, the pressure of its fluid and flow are also in generation disturbance, and both balance mutually, mutually suppress, and reduce integral cooling device to the disturbing force of cooling object and vibration values with this.
As shown in figs. 7-9, the layout of inside and outside double-deck cooling water pipe of the present invention and connected mode have multiple.Water pipe 230 linear state, snakelike or spiral status are arranged on cooling object 100.Particularly, its by upper under successively, this can be divided into three ends.Top is the first joint 240; Stage casing is water pipe 230, and bottom is the second joint 420.Certainly, the end of water pipe 230 is connected with the first joint 240.Described first joint 240 first in pipe be connected with interior pipe 231, further, manage in first and be connected with the sealing adaptor that can adopt rapid-acting coupling between interior pipe 231 or there is rotatable function.Similarly, the first outer tube of the first joint 240 is connected with adopting rapid-acting coupling or tool spirality cone seal joint between outer tube 232.The other end of water pipe 230 is connected with the second joint 420, and particularly, one end of the second outer tube is connected with outer tube 231, and the other end of the second outer tube connects with water inlet pipe; In second, one end of pipe is connected with interior pipe 231, and the other end connects with rising pipe.Wherein, it is identical manage connected mode between interior pipe 231 and the first outer tube and outer tube 232 and the first interior connected mode of managing between interior pipe 231 in the second outer tube and outer tube 232, second, repeats no more herein.
It should be noted that, in the present invention, inner and outer pipe 231,232 is as water pipe 230, the first joint 240 and the second joint 420 two kinds of Klein bottle joints are adopted to carry out flow cavitation result, the internal and external flow field of its composition is not confined to straight line, snakelike and spirality state, it can bending and be combined into various state and shape, comprises one or more in S type, ellipse, planar spiral or stadium track type.
To sum up, cooling device 60 of the present invention and apply the litho machine of this cooling device 60, this cooling device 60 comprises: at least one water jacket 200, cooling object 100 is arranged in this water jacket 200, described water jacket 200 comprises water jacket body and is wrapped in the water pipe 230 of the external wall of described water jacket, the outer tube 232 that described water pipe 230 comprises interior pipe 231 and is set on described interior pipe 231, one end of described water pipe 230 is provided with the first joint 240, for realizing the revolution of current; Be arranged at least one temperature sensor 300 near cooling object 100, described temperature sensor 300 is for monitoring the temperature of described cooling object 100; By the shunting torrent plate 500 that shunting torrent pipe 400 is communicated with water pipe 230, this shunting torrent plate 500 provides recirculated water by this shunting torrent pipe 400 to water pipe 230 and receives the recirculation water in this water pipe 230, and this shunting torrent pipe 400 is provided with variable valve 410; By the recirculated water control module 600 that transfer tube is communicated with this shunting torrent plate 500, for the temperature of controlled circulation water, and provide recirculated water by this transfer tube to this shunting torrent plate 500; For receiving the temperature control unit 700 of described temperature sensor 300 sensing value, described temperature control unit 700 adjusts the temperature of the recirculated water that this recirculated water control module 600 provides and the opening degree of variable valve 410 according to the temperature value of cooling object 100.The water pipe 230 of cooling is divided into inside and outside two-layer by the present invention, outer tube 232 as water inlet pipe, interior pipe 231 as return pipe, pipe 231 and outer tube 232 flow in utilizing, the character that pressure is substantially equal,
Disturbing force hydrodynamic force produced is balance and suppression mutually in pipe, reduces cooling water pipe 230 to cooling object 100(as the disturbance of object lens, micropositioner with this), by originally acting on the power of cooling object 100 respectively, changed the power interacted in inside into.
Obviously, those skilled in the art can carry out various change and modification to invention and not depart from the spirit and scope of the present invention.Like this, if these amendments of the present invention and modification belong within the scope of the claims in the present invention and equivalent technologies thereof, then the present invention is also intended to comprise these change and modification.
Claims (14)
1. a cooling device, comprising:
At least one water jacket, cooling object is arranged in this water jacket, and described water jacket comprises water jacket body and is wrapped in the water pipe of the external wall of described water jacket, and described water pipe comprises interior pipe and is set in the outer tube on described interior pipe, one end of described water pipe is provided with the first joint, for realizing the revolution of current;
At least one temperature sensor be arranged near described cooling object, described temperature sensor is for monitoring the temperature of described cooling object;
By shunting torrent pipe and the shunting torrent plate of described cross current, this shunting torrent plate provides recirculated water by this shunting torrent pipe to described water pipe and receives the recirculation water in this water pipe, and this shunting torrent pipe is provided with variable valve;
By the recirculated water control module that transfer tube is communicated with this shunting torrent plate, for the temperature of controlled circulation water, and provide recirculated water by this transfer tube to this shunting torrent plate;
For receiving the temperature control unit of described temperature sensor senses value, described temperature control unit adjusts according to the temperature value of cooling object the temperature of recirculated water and the opening degree of variable valve that this recirculated water control module provides.
2. cooling device as claimed in claim 1, it is characterized in that, described cooling device comprises two water jackets, be respectively the first water jacket and the second water jacket, first, second water jacket described includes a water jacket body and is wrapped in a water pipe of the external wall of described water jacket, and described shunting torrent plate provides recirculated water respectively to the water pipe of first, second water jacket described.
3. cooling device as claimed in claim 1, is characterized in that, the cross section of described water pipe is circular or oval.
4. cooling device as claimed in claim 1, it is characterized in that, the interior pipe of described water pipe is flexible hose, and outer tube is metal tube.
5. cooling device as claimed in claim 4, is characterized in that, described interior pipe is provided with 3 ~ 4 fins, the axis being parallel of described fin and water pipe or with helix shape.
6. cooling device as claimed in claim 5, it is characterized in that, the external diameter of described fin is less than the internal diameter of described outer tube.
7. cooling device as claimed in claim 4, it is characterized in that, the current circulation area in described inner and outer tubes is equal.
8. cooling device as claimed in claim 1, is characterized in that, described first joint adopts top by the Klein bottle joint pruned, and it comprises: pipe and the first outer tube in first, in described first, pipe is communicated with interior pipe, and described first outer tube is communicated with outer tube.
9. cooling device as claimed in claim 1, is characterized in that, described water pipe is connected with water inlet pipe and return pipe respectively by the second joint.
10. cooling device as claimed in claim 9, it is characterized in that, described second joint be top and bottom all by the Klein bottle joint pruned, it comprises pipe and the second outer tube in second, in described second, one end of pipe is connected with the interior pipe of water pipe, and the other end is connected with return pipe; Described one end of second outer tube is connected with the outer tube of water pipe, and the other end is connected with water inlet pipe.
11. cooling devices as claimed in claim 1, it is characterized in that, described water pipe is welded on described cooling object by a linking springs.
12. cooling device as claimed in claim 1, it is characterized in that, described cooling object is object lens, and these object lens comprise multiple eyeglass, and described water pipe is uneven distribution on described water jacket body, and described water pipe is density distribution according to the heat radiation power of described multiple eyeglass.
13. 1 kinds of litho machines, is characterized in that, the projection objective of described litho machine is provided with the cooling device according to any one of claim 1 ~ 12.
14. litho machines as claimed in claim 13, is characterized in that, the mask motion platform of described litho machine and the micropositioner of silicon chip sports platform are provided with described cooling device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410043850.XA CN104808448B (en) | 2014-01-29 | 2014-01-29 | The litho machine of cooling device and the application cooling device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410043850.XA CN104808448B (en) | 2014-01-29 | 2014-01-29 | The litho machine of cooling device and the application cooling device |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104808448A true CN104808448A (en) | 2015-07-29 |
CN104808448B CN104808448B (en) | 2017-08-29 |
Family
ID=53693400
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201410043850.XA Active CN104808448B (en) | 2014-01-29 | 2014-01-29 | The litho machine of cooling device and the application cooling device |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN104808448B (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106933048A (en) * | 2015-12-30 | 2017-07-07 | 上海微电子装备有限公司 | A kind of photo-etching machine objective lens cooling device |
CN112987508A (en) * | 2021-03-04 | 2021-06-18 | 长鑫存储技术有限公司 | Vibration damping structure and exposure apparatus |
CN116859683A (en) * | 2023-08-31 | 2023-10-10 | 光科芯图(北京)科技有限公司 | Device and method for controlling thermal stability of microscope objective lens |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002310575A (en) * | 2001-04-12 | 2002-10-23 | Shimizu Reiki:Kk | Heat exchanger for cooling brine |
CN200953342Y (en) * | 2006-09-27 | 2007-09-26 | 联萌科技股份有限公司 | Improved semiconductor machine |
CN101609262A (en) * | 2009-07-14 | 2009-12-23 | 上海微电子装备有限公司 | The temperature control equipment of projection lens of lithography machine |
CN202501786U (en) * | 2012-03-22 | 2012-10-24 | 重庆昌进制冷设备有限责任公司 | Internal and external tooth cooling tube |
US20130087306A1 (en) * | 2011-10-09 | 2013-04-11 | Bernard Meredith Winn, JR. | Forced Insertion Concentric Ground-Coupled Heat Exchanger for Ground Source Heat Pumps |
-
2014
- 2014-01-29 CN CN201410043850.XA patent/CN104808448B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002310575A (en) * | 2001-04-12 | 2002-10-23 | Shimizu Reiki:Kk | Heat exchanger for cooling brine |
CN200953342Y (en) * | 2006-09-27 | 2007-09-26 | 联萌科技股份有限公司 | Improved semiconductor machine |
CN101609262A (en) * | 2009-07-14 | 2009-12-23 | 上海微电子装备有限公司 | The temperature control equipment of projection lens of lithography machine |
US20130087306A1 (en) * | 2011-10-09 | 2013-04-11 | Bernard Meredith Winn, JR. | Forced Insertion Concentric Ground-Coupled Heat Exchanger for Ground Source Heat Pumps |
CN202501786U (en) * | 2012-03-22 | 2012-10-24 | 重庆昌进制冷设备有限责任公司 | Internal and external tooth cooling tube |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106933048A (en) * | 2015-12-30 | 2017-07-07 | 上海微电子装备有限公司 | A kind of photo-etching machine objective lens cooling device |
CN112987508A (en) * | 2021-03-04 | 2021-06-18 | 长鑫存储技术有限公司 | Vibration damping structure and exposure apparatus |
CN116859683A (en) * | 2023-08-31 | 2023-10-10 | 光科芯图(北京)科技有限公司 | Device and method for controlling thermal stability of microscope objective lens |
CN116859683B (en) * | 2023-08-31 | 2023-11-28 | 光科芯图(北京)科技有限公司 | Device and method for controlling thermal stability of microscope objective lens |
Also Published As
Publication number | Publication date |
---|---|
CN104808448B (en) | 2017-08-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101030042B (en) | Lithographic apparatus and device manufacturing method | |
CN101950131B (en) | Photomask processor and device producing method | |
CN101226341B (en) | Substrate support and lithographic process | |
EP1653283B1 (en) | Lithographic apparatus and device manufacturing method | |
CN102132209B (en) | Euv reticle substrates with high thermal conductivity | |
JP6240714B2 (en) | Thermal conditioning unit and lithographic apparatus | |
US20070018118A1 (en) | Lithographic apparatus, contaminant trap, and device manufacturing method | |
US9618859B2 (en) | Lithographic apparatus and device manufacturing method | |
US9417519B2 (en) | Lithographic apparatus, device manufacturing method, and method of correcting a mask | |
CN1614513B (en) | Lithographic apparatus and device manufacturing method | |
CN102955375A (en) | Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method | |
CN104321702A (en) | Sensor, lithographic apparatus and device manufacturing method | |
CN101196695B (en) | Lithographic apparatus, device manufacturing method and computer program product | |
CN102540760B (en) | Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus | |
CN101968608B (en) | Lithographic apparatus and device manufacturing method | |
US20120026474A1 (en) | Reticle Cooling in a Lithographic Apparatus | |
US9684249B2 (en) | Lithographic apparatus with a metrology system for measuring a position of a substrate table | |
CN104808448A (en) | Cooling device and photoetching machine with cooling device | |
CN101923291A (en) | Lithographic equipment, the method for controlling this equipment and use lithographic equipment are made the method for device | |
CN102681353A (en) | Projection system, lithographic apparatus and device manufacturing method | |
CN101075097B (en) | Photo-etching equipment and method for manufacturing device | |
US11740562B2 (en) | Sealing device, component and lithography apparatus | |
CN101819383A (en) | Lithographic apparatus and positioning apparatus | |
US10095128B2 (en) | Thermal conditioning method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
EXSB | Decision made by sipo to initiate substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB02 | Change of applicant information |
Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Applicant after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Applicant before: Shanghai Micro Electronics Equipment Co., Ltd. |
|
CB02 | Change of applicant information | ||
GR01 | Patent grant | ||
GR01 | Patent grant |