CN104795403B - 一种柔性基板及其制作方法、显示装置 - Google Patents

一种柔性基板及其制作方法、显示装置 Download PDF

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CN104795403B
CN104795403B CN201510181051.3A CN201510181051A CN104795403B CN 104795403 B CN104795403 B CN 104795403B CN 201510181051 A CN201510181051 A CN 201510181051A CN 104795403 B CN104795403 B CN 104795403B
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蔡鹏�
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BOE Technology Group Co Ltd
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Abstract

本发明涉及显示技术领域,公开了一种柔性基板及其制作方法、以及含有该柔性基板的显示装置,其中,上述柔性基板包括:柔性基底;形成于所述柔性基底上的多层绝缘层;其中,至少一层所述绝缘层中形成有过孔,且所述过孔中填充有机材料。该柔性基板中,绝缘层的过孔内填充的有机材料可以吸收应力,从而可以减小柔性基板在弯曲过程中产生的应力,避免绝缘层受力过大而发生断裂,因此,该柔性基板的可靠性较高、弯曲性较好。

Description

一种柔性基板及其制作方法、显示装置
技术领域
本发明涉及显示技术领域,特别是涉及一种柔性基板及其制作方法、以及含有上述柔性基板的显示装置。
背景技术
柔性显示装置是一种基于柔性基底材料形成的显示装置。由于柔性显示装置具有可卷曲、宽视角、便于携带等特点,因此,在便携产品、多数显示应用领域,柔性显示装置具有广阔的应用前景以及良好的市场潜力。
现有技术中的柔性显示装置的阵列基板通常要用到绝缘层,例如,无机缓冲层,栅绝缘层,层间绝缘层以及钝化层等。上述的绝缘层通常由SiNx或SiOx物质制作,韧性较差,因此柔性显示装置在弯曲时易造成绝缘层的断裂,从而使柔性显示装置中阵列基板上的薄膜晶体管和存储电容可靠性变差甚至发生损坏,因此导致显示装置的可靠性较差。
发明内容
本发明实施例提供了一种柔性基板及其制作方法,以及含有上述柔性基板的显示装置,其中,该柔性基板在弯曲时其中的绝缘层不易发生断裂,因此,该柔性基板的可靠性较高、弯曲性较好。
本发明实施例提供的一种柔性基板,包括:
柔性基底;
形成于所述柔性基底上的多层绝缘层;其中,
至少一层所述绝缘层中形成有过孔,且所述过孔中填充有机材料。
上述柔性基板中,在绝缘层中,至少一层绝缘层设有贯穿其厚度方向的过孔,且在过孔内填充有机材料,因此,在柔性基板弯曲过程中,通过过孔中的有机材料可以吸收应力,从而可以减小绝缘层在弯曲过程中形成的应力,避免绝缘层受力过大而发生断裂,因此,上述柔性基板的可靠性较高、弯曲性较好。
优选地,所述柔性基板还包括:层叠在形成有所述过孔的所述绝缘层上的有机材料层,所述过孔由所述有机材料层填充。
优选地,所述柔性基板还包括:形成于所述柔性基底上的功能单元,所述功能单元包括薄膜晶体管以及与所述薄膜晶体管电连接的存储电容;
位于所述功能单元周围的所述多层绝缘层中设有所述过孔。
优选地,所述薄膜晶体管与所述存储电容之间的所述多层绝缘层中设有所述过孔。
优选地,所述多层绝缘层至少包括依次层叠形成的无机缓冲层、栅极绝缘层、以及钝化层,其中,所述钝化层为所述多层绝缘层中距离所述柔性基底最远的一层。
优选地,所述功能单元周围设有的过孔以及所述薄膜晶体管和存储电容之间设有的过孔为贯穿所述多层绝缘层中的每一层绝缘层的第一过孔。
优选地,所述功能单元上形成有所述钝化层,所述钝化层对应所述功能单元的部分设有贯穿所述钝化层厚度方向的第二过孔。
优选地,所述柔性基板还包括形成于所述钝化层上的平坦层;所述第一过孔、第二过孔通过所述平坦层填充。
优选地,所述柔性基板还包括形成于所述平坦层上的像素界定层以及发光单元;所述发光单元包括依次层叠形成的阳极层、发光层以及阴极层,所述像素界定层位于所述阳极层和所述发光层的周围;其中,所述发光层包括至少一个有机发光元件。
优选地,与所述阳极层对应的区域以外的区域设有至少贯穿所述平坦层的第三过孔,所述像素界定层填充所述第三过孔。
优选地,所述功能单元和所述第一过孔位于与所述阳极层对应的区域。
优选地,所述多层绝缘层还包括位于所述栅极绝缘层以及所述钝化层之间的层间绝缘层。
优选地,所述柔性基板还包括形成于所述发光单元上、由无机层和有机层交替形成的封装层。
优选地,所述柔性基板还包括位于所述柔性基底和所述多层绝缘层之间的有机缓冲层。
优选地,所述过孔的横截面的形状为圆形、椭圆形或者多边形。
优选地,所述柔性基底由聚酰亚胺、聚碳酸酯、聚丙烯酸酯、聚醚酰亚胺、聚醚砜、聚对苯二甲酸乙二醇酯和聚萘二甲酸乙二醇酯中的一种或多种材料制成。
一种如上述任一技术方案中所述的柔性基板的制作方法,包括:
在柔性基底上形成多层绝缘层;
在至少一层所述绝缘层中形成过孔,且在所述过孔中填充有机材料。
一种显示装置,包括上述任一种技术方案中所述的柔性基板。
附图说明
图1为本发明实施例提供的一种柔性基板的结构示意图;
图2为本发明实施例提供的另一种柔性基板的结构示意图;
图3为本发明实施例提供的另一种柔性基板的结构示意图;
图4为本发明实施例提供的一种柔性基板的制作方法。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
如图1、图2和图3所示,本发明实施例提供的一种柔性基板,包括:
柔性基底1;
形成于柔性基底1上的多层绝缘层8;其中,
至少在一层绝缘层中形成有过孔,且过孔中填充有机材料。
上述柔性基板中,在多层绝缘层8结构中,至少有一层绝缘层设有贯穿其厚度方向的过孔,且在过孔内填充有弹性的有机材料,则在柔性基板弯曲的过程中,过孔中的有机材料可以吸收应力,从而可以减小柔性基板在弯曲过程中形成的应力,避免绝缘层受力过大而发生断裂,因此,上述柔性基板的可靠性较高、弯曲性较好。
一种具体的实施例中,上述柔性基板还可以包括:层叠在形成有过孔的绝缘层上的有机材料层,且过孔可以由绝缘层上形成的有机材料层填充。
如图1、图2和图3所示,一种具体的实施例中,上述柔性基板可以包括:
形成于柔性基底1上的功能单元,功能单元可以包括薄膜晶体管3以及与薄膜晶体管3电连接的存储电容4;优选地,位于功能单元周围的多层绝缘层8中可以设有上述过孔。
如图1、图2和图3所示,在上述实施例的基础上,一种优选的实施例中,薄膜晶体管3与存储电容4之间的多层绝缘层8中也可以设有上述过孔。
如图1、图2和图3所示,在上述实施例的基础上,一种具体的实施例中,多层绝缘层8可以包括形成于柔性基底1上的无机缓冲层81;薄膜晶体管3和存储电容4形成于无机缓冲层81上;薄膜晶体管3可以为底栅型结构也可以为顶栅型结构,而多层绝缘层8的具体结构与薄膜晶体管3的结构类型有关,具体地,
当薄膜晶体管3为底栅型结构时,除了包括无机缓冲层81外,多层绝缘层8还可以包括形成于薄膜晶体管3的栅极31和有源层32之间的栅绝缘层82,同时,栅绝缘层82还可以位于存储电容4的两个电极之间以作为存储电容4的介质层;另外,多层绝缘层8还可以包括形成于薄膜晶体管3和存储电容4上的钝化层84;
如图1、图2和图3所示,当薄膜晶体管3为顶栅型结构时,除了包括无机缓冲层81、栅绝缘层82、以及钝化层84外,多层绝缘层8还可以包括形成于薄膜晶体管3的栅极31与源漏电极33之间的层间绝缘层83。
在上述实施例的基础上,一种具体的实施例中,功能单元周围的多层绝缘层8中设有的过孔、以及薄膜晶体管3和存储电容4之间的多层绝缘层8中设有的过孔可以为贯穿多层绝缘层8中的每一层绝缘层的第一过孔91。
以柔性基板中薄膜晶体管3为顶栅型结构时为例,如图1和图2所示,在薄膜晶体管3周围的区域以及薄膜晶体管3和存储电容4之间的区域,无机缓冲层81、栅绝缘层82、层间绝缘层83以及钝化层84中形成贯穿上述每一层的第一过孔91,且第一过孔91中填充有机材料。上述第一过孔91可以在形成多层绝缘层8中最上层的钝化层84后经过一次刻蚀工艺形成,同时,可以通过一次填充将上述第一过孔91中填充满有弹性的有机材料;上述第一过孔91中填充的有机材料可以起到在柔性基板弯曲的过程中吸收应力的作用,从而可以避免柔性基板中的绝缘层受应力过大而断裂,使柔性基板的弯曲性更好,可靠性更高。
如图2所示,在上述各实施例的基础上,一种具体的实施例中,钝化层84位于功能单元上的部分可以设有贯穿钝化层84厚度方向的第二过孔92;由于第二过孔92位于薄膜晶体管3和存储电容4上,则第二过孔92内填充的有机材料可以吸收应力以缓解薄膜晶体管3和存储电容4在弯曲过程中受到的应力。优选地,无机缓冲层81位于薄膜晶体管3和存储电容4下面的部分也可以设有过孔;当薄膜晶体管3和存储电容4上面区域的钝化层84和下面区域的无机缓冲层81中都设有过孔,且过孔内都填充有机材料时,柔性基板在弯曲过程中,薄膜晶体管3和存储电容4的上面区域和下面区域中的有机材料可以吸收应力,以减小薄膜晶体管3和存储电容4受到的应力,并可以避免无机缓冲层81和钝化层84受力过大而发生断裂,因此,可以使上述柔性基板的可靠性较高、弯曲性较好。
如图1和图2所示,在上述实施例的基础上,一种优选的实施例中,上述柔性基板还可以包括形成于钝化层84上的平坦层5;第一过孔91、第二过孔92可以通过平坦层填充。平坦层5的材料可以为有弹性的有机材料,则可以用平坦层的材料填充第一过孔91和第二过孔92以用来吸收应力;因此在制备柔性基板的过程中,可以在形成多层绝缘层8之后通过一次曝光工艺形成第一过孔91和第二过孔92,并可以在形成平坦层5的时候将第一过孔91和第二过孔92填充满,从而简化形成以及填充第一过孔91和第二过孔92的步骤。
如图3所示,在上述实施例的基础上,一种具体的实施例中,柔性基板还可以包括形成于平坦层5上的像素界定层6以及发光单元7;发光单元7可以包括依次层叠形成的阳极层71、发光层72以及阴极层73,像素界定层6位于阳极层71和发光层72的周围;其中,发光层72可以包括至少一个有机发光元件。
如图3所示,在上述实施例的基础上,一种优选的实施例中,在与阳极层71对应的区域以外的区域可以设有至少贯穿平坦层5厚度方向的第三过孔93,且可以通过像素界定层6填充第三过孔93。优选地,功能单元和第一过孔91可以位于与阳极层71对应的区域,第三过孔93可以贯穿平坦层5以及平坦层5下面的多层绝缘层8,像素界定层6的材料可以为有弹性的有机材料,且可以用像素界定层6的材料填充第三过孔93;则在柔性基板弯曲过程中,第三过孔93中的像素界定层6材料可以吸收应力,以减小柔性基板弯曲过程中阳极层71对应的区域以外的区域产生的应力,从而提高上述柔性基板的可靠性和弯曲性能。
在上述各实施例的基础上,上述所有过孔的横截面的形状可以为圆形、椭圆形或者多边形。具体地,上述第一过孔91、第二过孔92、第三过孔93的横截面的形状可以为圆形、椭圆形或者多边形中的任意一种形状。当然,上述过孔的横截面形状并不限于上述种类,其形状还可以是其他任何形状。
如图1、图2和图3所示,在上述各实施例的基础上,一种具体的实施例中,柔性基板还可以包括位于柔性基底1和多层绝缘层8之间的有机缓冲层2。该有机缓冲层2也可以在柔性基板弯曲的过程中吸收应力,从而可以使柔性基板的弯曲性较好。
如图1、图2和图3所示,在上述各实施例的基础上,一种具体的实施例中,柔性基板还可以包括形成于发光单元7上的封装层10,封装层10可以由至少一层无机层和至少一层有机层交替沉积形成。在显示面板弯曲过程中,与无机层交替沉积的有机层可以吸收应力以避免封装层10中的无机层受力过大而断裂。
在上述各实施例的基础上,一种优选的实施例中,柔性基底1可以由聚酰亚胺、聚碳酸酯、聚丙烯酸酯、聚醚酰亚胺、聚醚砜、聚对苯二甲酸乙二醇酯和聚萘二甲酸乙二醇酯中的一种或多种材料制成。
如图4所示,本发明实施例还提供一种柔性基板的制作方法,该制作方法可以包括以下步骤:
步骤S101,在柔性基底1上形成多层绝缘层8;
步骤S102,在至少一层上述绝缘层中形成过孔,且在过孔中填充有机材料。
上述柔性基板的制作方法中,步骤S102,多层绝缘层中,至少一层绝缘层设有贯穿其厚度方向的过孔,且在过孔内填充有机材料,因此,在柔性基板弯曲过程中绝缘层中的有机材料可以吸收应力,从而可以减小柔性基板在弯曲过程中形成的应力,避免绝缘层受力过大而发生断裂,因此,采用上述制备方法得到的柔性基板可靠性较高、弯曲性较好。
本发明还提供一种显示装置,该显示装置包括上述任意一个实施例中的柔性基板。由于上诉实施例中的柔性基板的可靠性较高、弯曲性较好,因此,该显示装置的可靠性较高,弯曲性较好。
显然,本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样,倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内,则本发明也意图包含这些改动和变型在内。

Claims (12)

1.一种柔性基板,其特征在于,包括:
柔性基底;
形成于所述柔性基底上的多层绝缘层;其中,
至少一层所述绝缘层中形成有过孔,且所述过孔中填充有机材料;
层叠在形成有过孔的所述绝缘层上的有机材料层,所述过孔由所述有机材料层填充;
所述柔性基板还包括:
形成于所述柔性基底上的功能单元,所述功能单元包括薄膜晶体管以及与所述薄膜晶体管电连接的存储电容;
位于所述功能单元周围的所述多层绝缘层中设有所述过孔;
所述薄膜晶体管与所述存储电容之间的所述多层绝缘层中设有所述过孔;
所述多层绝缘层至少包括依次层叠形成的无机缓冲层、栅极绝缘层、以及钝化层,其中,所述钝化层为所述多层绝缘层中距离所述柔性基底最远的一层;
所述功能单元周围设有的过孔以及所述薄膜晶体管和存储电容之间设有的过孔为贯穿所述多层绝缘层中的每一层绝缘层的第一过孔;
所述功能单元上形成有所述钝化层,所述钝化层对应所述功能单元的部分设有贯穿所述钝化层厚度方向的第二过孔。
2.如权利要求1所述的柔性基板,其特征在于,还包括形成于所述钝化层上的平坦层;
所述第一过孔、第二过孔通过所述平坦层填充。
3.如权利要求2所述的柔性基板,其特征在于,还包括形成于所述平坦层上的像素界定层以及发光单元;所述发光单元包括依次层叠形成的阳极层、发光层以及阴极层,所述像素界定层位于所述阳极层和所述发光层的周围;其中,所述发光层包括至少一个有机发光元件。
4.如权利要求3所述的柔性基板,其特征在于,与所述阳极层对应的区域以外的区域设有至少贯穿所述平坦层的第三过孔,所述像素界定层填充所述第三过孔。
5.如权利要求4所述的柔性基板,其特征在于,所述功能单元和所述第一过孔位于与所述阳极层对应的区域。
6.如权利要求1~5任一项所述的柔性基板,其特征在于,所述多层绝缘层还包括位于所述栅极绝缘层以及所述钝化层之间的层间绝缘层。
7.如权利要求3~5任一项所述的柔性基板,其特征在于,还包括形成于所述发光单元上、由无机层和有机层交替形成的封装层。
8.如权利要求1~5任一项所述的柔性基板,其特征在于,还包括位于所述柔性基底和所述多层绝缘层之间的有机缓冲层。
9.如权利要求1~5任一项所述的柔性基板,其特征在于,过孔的横截面的形状为圆形、椭圆形或者多边形。
10.如权利要求1~5任一项所述的柔性基板,其特征在于,所述柔性基底由聚酰亚胺、聚碳酸酯、聚丙烯酸酯、聚醚酰亚胺、聚醚砜、聚对苯二甲酸乙二醇酯和聚萘二甲酸乙二醇酯中的一种或多种材料制成。
11.一种如权利要求1~10任一项所述的柔性基板的制作方法,其特征在于,包括:
在柔性基底上形成至少一层绝缘层;
在至少一层所述绝缘层中形成过孔,且在所述过孔中形成应力吸收结构。
12.一种显示装置,其特征在于,包括如权利要求1~10任一项所述的柔性基板。
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