CN104793370B - The preparation method of colored optical filtering substrates - Google Patents
The preparation method of colored optical filtering substrates Download PDFInfo
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- CN104793370B CN104793370B CN201510222055.1A CN201510222055A CN104793370B CN 104793370 B CN104793370 B CN 104793370B CN 201510222055 A CN201510222055 A CN 201510222055A CN 104793370 B CN104793370 B CN 104793370B
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- glass substrate
- black matrix
- photoresist
- optical filtering
- colored optical
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133302—Rigid substrates, e.g. inorganic substrates
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Optical Filters (AREA)
Abstract
The invention discloses a kind of preparation method of colored optical filtering substrates, wherein, this method specifically includes step：S1, a glass substrate is provided, the glass substrate is cleaned using cleaning agent；S2, using atmospheric plasma surface processing device the glass substrate after cleaning is dried；S3, using forming black matrix" on light shield technique glass substrate after the drying；S4, using light shield technique chromatic photoresist is formed on the glass substrate with black matrix".The glass substrate after cleaning is dried by using atmospheric plasma surface processing device for this method, reach the water droplet for the superfine for removing glass baseplate surface and washmarking will not be remained, so that in the colored optical filtering substrates being finally prepared, there is higher adherence between black matrix" and glass substrate.
Description
Technical field
The present invention relates to LCD Technology field, more particularly to a kind of preparation method of colored optical filtering substrates.
Background technology
Liquid crystal display (Liquid Crystal Display, LCD), it is the display device of planar ultra-thin, it is by certain
Colour or the monochrome pixels composition of quantity, are positioned in front of light source or reflecting surface.Liquid crystal display power consumption is very low, and has
High image quality, small volume, it is in light weight the characteristics of, therefore favored by everybody, turn into the main flow of display.Liquid crystal display is at present
Based on thin film transistor (TFT) (Thin Film Transistor, TFT) liquid crystal display, liquid crystal panel is the master of liquid crystal display
Want component.
Liquid crystal panel is generally made up of thin-film transistor array base-plate, colored optical filtering substrates and liquid crystal layer.Colorized optical filtering base
The effect of plate is that the white light by liquid crystal layer is filtered into the light beam of different colours, and the light beam of variant color converges to be formed again
Image frame.Colored optical filtering substrates generally include glass substrate and formed on the glass substrate by light shield technique (MASK)
Black matrix" and chromatic photoresist.In recent years, the resolution requirement more and more higher of liquid crystal panel, what its corresponding per inch was possessed
Number of pixels (Pixels Per Inch, PPI) value is higher, and especially for the liquid crystal panel of reduced size, this requires glass
Black matrix" on substrate has thinner line width.Subtract when the line width of black matrix" is thinner, such as from traditional more than 10 μm
Small to 4~5 μm, thus the adherence requirement between black matrix" and glass substrate is also higher.
During colored optical filtering substrates are prepared, the cleaning of glass substrate is between black matrix" and glass substrate
Adherence there is important influence.In existing cleaning, generally first cleaned using cleaning agent (such as deionized water)
Glass substrate, then dry glass substrate by the way of infrared facility dries up or spontaneously dries.This drying mode is difficult
To reach the residual moisture for removing Fine scintilla degree, the water droplet (tens " μ " degree) of superfine it is possible to be attached to again
Glass baseplate surface, cause the film layer that the apparatus for coating in subsequent handling is coated contact with glass substrate incomplete, after coating
Contact angle it is big, the final wide figure layer of fine rule can be fallen off.
The content of the invention
In view of the shortcomings of the prior art, the invention provides a kind of preparation method of colored optical filtering substrates, this method
By the cleaning and the improvement of drying process to glass substrate, reach the water droplet and not for the superfine for removing glass baseplate surface
Washmarking can be remained so that have in the colored optical filtering substrates being finally prepared, between black matrix" and glass substrate higher
Adherence.
To achieve these goals, present invention employs following technical scheme：
A kind of preparation method of colored optical filtering substrates, including the step of cleaning and dry glass substrate, wherein, using normal pressure
Surface Treatment with Plasma this method specifically includes step：
S1, a glass substrate is provided, the glass substrate is cleaned using cleaning agent；
S2, using atmospheric plasma surface processing device the glass substrate after cleaning is dried；
S3, using forming black matrix" on light shield technique glass substrate after the drying；
S4, using light shield technique chromatic photoresist is formed on the glass substrate with black matrix".
Specifically, the black matrix" has multiple opening portions, and the chromatic photoresist is formed in the opening portion.
Specifically, the line width of the black matrix" is 4~5 μm.
Specifically, the step S3 is specifically included：
One layer of black matrix film is formed on glass substrate after the drying；
Photoresist is coated in the black matrix film, and black matrix" is retained by the exposure to photoresist, development
The photoresist of graphics field；
Etch away the black matrix film exposed and peel off remaining photoresist, form the black matrix".
Specifically, the step S4 is specifically included：
One layer of chromatic photoresist film is formed on the glass substrate with black matrix"；
Photoresist is coated on the chromatic photoresist film, and chromatic photoresist is retained by the exposure to photoresist, development
The photoresist of graphics field；
Etch away the chromatic photoresist film exposed and peel off remaining photoresist, form the chromatic photoresist.
Specifically, the chromatic photoresist includes red photoresistance, green photoresistance and blue light resistance；Repeat step S4 is prepared respectively
Obtain the red photoresistance, green photoresistance and blue light resistance.
Compared to prior art, the preparation method of colored optical filtering substrates provided in an embodiment of the present invention, this method is by adopting
The glass substrate after cleaning is dried with AP plasma devices (atmospheric plasma surface processing device), reaches removal glass
The water droplet of the superfine of glass substrate surface and washmarking will not be remained so that black in the colored optical filtering substrates being finally prepared
There is higher adherence between colour moment battle array and glass substrate.
Brief description of the drawings
Fig. 1 is the process chart of the preparation method of colored optical filtering substrates provided in an embodiment of the present invention.
Fig. 2 is the process chart that black matrix" is prepared in the embodiment of the present invention.
Fig. 3 is the process chart that red photoresistance is prepared in the embodiment of the present invention.
Embodiment
Below in conjunction with accompanying drawing and specific embodiment, the technical scheme in the embodiment of the present invention is retouched in detail
State, it is clear that described embodiment only a part of example of the present invention, rather than whole embodiments.Based in the present invention
Embodiment, the every other embodiment that those of ordinary skill in the art are obtained on the premise of creative work is not made,
Belong to the scope of the present invention.
As shown in figure 1, a kind of preparation method for colored optical filtering substrates that the present embodiment provides, it specifically includes step：
S1, a glass substrate is provided, the glass substrate is cleaned using cleaning agent.Specifically, cleaning agent used can be
Deionized water, when containing some oily dirts on glass substrate, cleaning agent can select the cleaning agent containing surfactant.
S2, using atmospheric plasma surface processing device the glass substrate after cleaning is dried.Atmospheric plasma table
Face processing unit, i.e. AP (Atmospheric pressure) plasma devices.The device is using nitrogen as predominant gas, high-frequency electrical
Source is by N2Free radical is dissociated into, by the hydrone H on glass substrate2O carries out atom cut-out, and hydrogen atom combines once in hydrone
It is cut off, easily departs from from surface, and easily combined with other molecules.If aerobic presence around it, the vestige that hydrogen atom leaves
Oxygen atom can be replaced with.Thus, water H is divided on glass substrate2O can decomposition gas H2And O2, depart from from glass baseplate surface,
Reach the water droplet for the superfine for removing glass baseplate surface and the purpose of washmarking will not be remained.
S3, using forming black matrix" on light shield technique glass substrate after the drying.Specifically, refering to Fig. 2, the step
Specifically include：
One layer of black matrix film is formed on S31, glass substrate after the drying.
S32, photoresist is coated in the black matrix film, and black is retained by the exposure to photoresist, development
The photoresist in Matrix Pattern region.
S33, etch away the black matrix film exposed and peel off remaining photoresist, form the black matrix".Tool
Body, preparation-obtained black matrix" has multiple opening portions, and the line width of black matrix" is 4~5 μm.
S4, using light shield technique chromatic photoresist is formed on the glass substrate with black matrix".Wherein, the colourama
Resistance includes red photoresistance, green photoresistance and blue light resistance.Specifically, exemplified by preparing red photoresistance, refering to Fig. 3, step tool
Body includes：
S41, one layer of red photoresistance film is formed on the glass substrate with black matrix".
S42, photoresist is coated on the chromatic photoresist film, and red is retained by the exposure to photoresist, development
The photoresist of photoresistance graphics field.
S43, etch away the red photoresistance film exposed and peel off remaining photoresist, form the red photoresistance.
According to step S41~S43, green photoresistance and blue light resistance, each of which colourama are further prepared respectively
Resistance (red photoresistance, green photoresistance or blue light resistance) is respectively formed in one of opening portion of foregoing black matrix".
Further, in some other embodiments, the glass substrate of chromatic photoresist can also be obtained produced above
On be sequentially prepared flatness layer and common electrode layer.
In summary, compared to prior art, the preparation method of colored optical filtering substrates provided in an embodiment of the present invention, the party
The glass substrate after cleaning is dried by using AP plasma devices (atmospheric plasma surface processing device) for method, reaches
To remove glass baseplate surface superfine water droplet and washmarking will not be remained so that the colorized optical filtering base being finally prepared
In plate, there is higher adherence between black matrix" and glass substrate.Especially in the liquid crystal panel of reduced size, liquid crystal
The PPI of panel requires higher, when the line width that black matrix" has is thinner, the colored optical filtering substrates that prepare in the method, and black
Matrix is not easy to come off from glass substrate.
It should be noted that herein, such as first and second or the like relational terms are used merely to a reality
Body or operation make a distinction with another entity or operation, and not necessarily require or imply and deposited between these entities or operation
In any this actual relation or order.Moreover, term " comprising ", "comprising" or its any other variant are intended to
Nonexcludability includes, so that process, method, article or equipment including a series of elements not only will including those
Element, but also the other element including being not expressly set out, or it is this process, method, article or equipment also to include
Intrinsic key element.In the absence of more restrictions, the key element limited by sentence "including a ...", it is not excluded that
Other identical element also be present in process, method, article or equipment including the key element.
Described above is only the embodiment of the application, it is noted that for the ordinary skill people of the art
For member, on the premise of the application principle is not departed from, some improvements and modifications can also be made, these improvements and modifications also should
It is considered as the protection domain of the application.
Claims (6)
1. a kind of preparation method of colored optical filtering substrates, it is characterised in that this method specifically includes step：
S1, a glass substrate is provided, the glass substrate is cleaned using cleaning agent；
S2, using atmospheric plasma surface processing device the glass substrate after cleaning is dried；Wherein, described normal pressure etc. from
Sub- surface processing device is with N2For predominant gas, high frequency electric source is by N2Free radical is dissociated into, by the H on glass substrate2O molecules enter
Row atom is cut off, and is decomposed into gas H2And O2Depart from from glass baseplate surface, reach the water for the superfine for removing glass baseplate surface
Drip and do not remain washmarking；
S3, using forming black matrix" on light shield technique glass substrate after the drying；
S4, using light shield technique chromatic photoresist is formed on the glass substrate with black matrix".
2. the preparation method of colored optical filtering substrates according to claim 1, it is characterised in that the black matrix" has more
Individual opening portion, the chromatic photoresist are formed in the opening portion.
3. the preparation method of colored optical filtering substrates according to claim 1 or 2, it is characterised in that the black matrix"
Line width is 4~5 μm.
4. the preparation method of colored optical filtering substrates according to claim 1, it is characterised in that the step S3 is specifically wrapped
Include：
One layer of black matrix film is formed on glass substrate after the drying；
Photoresist is coated in the black matrix film, and black matrix" figure is retained by the exposure to photoresist, development
The photoresist in region；
Etch away the black matrix film exposed and peel off remaining photoresist, form the black matrix".
5. the preparation method of colored optical filtering substrates according to claim 1, it is characterised in that the step S4 is specifically wrapped
Include：
One layer of chromatic photoresist film is formed on the glass substrate with black matrix"；
Photoresist is coated on the chromatic photoresist film, and color light resistance pattern is retained by the exposure to photoresist, development
The photoresist in region；
Etch away the chromatic photoresist film exposed and peel off remaining photoresist, form the chromatic photoresist.
6. the preparation method of colored optical filtering substrates according to claim 5, it is characterised in that the chromatic photoresist includes red
Coloured light resistance, green photoresistance and blue light resistance；Repeat step S4 prepares the red photoresistance, green photoresistance and blue light respectively
Resistance.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510222055.1A CN104793370B (en) | 2015-04-30 | 2015-04-30 | The preparation method of colored optical filtering substrates |
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| CN201510222055.1A CN104793370B (en) | 2015-04-30 | 2015-04-30 | The preparation method of colored optical filtering substrates |
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| CN104793370B true CN104793370B (en) | 2018-02-13 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002282807A (en) * | 2001-03-28 | 2002-10-02 | Toray Ind Inc | Method and device for cleaning substrate |
| CN1840242A (en) * | 2005-03-29 | 2006-10-04 | 精工爱普生株式会社 | Liquid droplet ejection apparatus, method for forming structure, and method for manufacturing electro-optic device |
| CN101439342A (en) * | 2007-11-22 | 2009-05-27 | 精工爱普生株式会社 | Method for surface treating substrate and plasma treatment apparatus |
| JP2009125671A (en) * | 2007-11-22 | 2009-06-11 | Panasonic Corp | Substrate cleaning device and cleaning method |
| CN101840099A (en) * | 2009-03-18 | 2010-09-22 | 北京京东方光电科技有限公司 | Liquid crystal display panel and manufacture method thereof |
-
2015
- 2015-04-30 CN CN201510222055.1A patent/CN104793370B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002282807A (en) * | 2001-03-28 | 2002-10-02 | Toray Ind Inc | Method and device for cleaning substrate |
| CN1840242A (en) * | 2005-03-29 | 2006-10-04 | 精工爱普生株式会社 | Liquid droplet ejection apparatus, method for forming structure, and method for manufacturing electro-optic device |
| CN101439342A (en) * | 2007-11-22 | 2009-05-27 | 精工爱普生株式会社 | Method for surface treating substrate and plasma treatment apparatus |
| JP2009125671A (en) * | 2007-11-22 | 2009-06-11 | Panasonic Corp | Substrate cleaning device and cleaning method |
| CN101840099A (en) * | 2009-03-18 | 2010-09-22 | 北京京东方光电科技有限公司 | Liquid crystal display panel and manufacture method thereof |
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| CN104793370A (en) | 2015-07-22 |
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