CN1047457C - Medium- and low-temp. sintered combined characteristic thermosensitive resistor material composition and preparing method - Google Patents

Medium- and low-temp. sintered combined characteristic thermosensitive resistor material composition and preparing method Download PDF

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CN1047457C
CN1047457C CN97100777A CN97100777A CN1047457C CN 1047457 C CN1047457 C CN 1047457C CN 97100777 A CN97100777 A CN 97100777A CN 97100777 A CN97100777 A CN 97100777A CN 1047457 C CN1047457 C CN 1047457C
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CN1160273A (en
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李龙土
王德君
桂治轮
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Tsinghua University
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Abstract

The present invention relates to a thermistor material with an NTC-PTC compound characteristic, which is sintered at middle-low temperature. The thermistor material comprises the following main components: (Sr<1-x-y>BayPbx)TizO3+wPbmSinO<2n+m>, wherein x is equal to 0.1 to 0.9; y is equal to 0 to 0.9; z is equal to 0.8 to 1.2; w is equal to 0.001 to 1; m/n is equal to 0.1 to 10. The formula of the thermistor material also contains a trace quantity of semi-conductive elements and a small quantity of secondary additive agents. The preparation technology for preparing the thermistor material comprises a solid phase synthesis technology or a chemical synthesis technology. The compound thermistor material with good performance can be obtained by using the formula and the technology of the present invention. The material has the advantages of low sintering temperature, adjustable performance, good stability and good reproducibility.

Description

Low temperature sintering combined characteristic thermosensitive resistor material and preparation method thereof
The present invention relates to a kind of low temperature sintering combined characteristic thermosensitive resistor material and preparation method thereof, the combined characteristic thermosensitive resistor material here refers in particular to NTC-PTC composite thermistor material or is called the V-shaped ptc material, belongs to material science.
Traditional posistor material (abbreviation ptc material) mainly refers to BaTiO 3Pottery, pure BaTiO 3Be good insulating body, and when the rare earth element (such as La, Nb, Sb, Ta etc.) of the trace that mixes therein, the resistivity of element can drop to 10 2Below the Ω cm, and near 120 ℃, has positive temperature coefficient (PTC) characteristic.Traditional ptc material also has (Ba, Pb) TiO 3, (Sr, Ba) TiO 3Etc. system.
Traditional negative temperature coefficient heat-sensitive resistance material (being called for short the NTC material) mainly is made up of the composite oxides of transition metals such as Mn, Ni, Co, Fe, Cu and Cr.
The technology of traditional preparation thermistor material generally is to pass through solid-phase synthesis.Processing step comprises: weighing-batch mixing-pre-burning-pulverizing (secondary adds simultaneously)-screening-granulation-moulding-sintering etc.Shortcomings such as there is the component skewness in this technology, is subject to contaminating impurity, reproducibility difference.And sintering temperature is generally all more than 1300 ℃, and the energy consumption height is unfavorable for technology controlling and process.
When the thermal resistor of making of thermistor material uses as the discrete component simple function, there is following shortcoming: for the NTC material, under overvoltage, because self-heating causes resistance to descend gradually, have the possibility of puncture; For ptc material, because resistance is littler under the normal temperature, so the energising self-heating is during as heater, because dash current affects greatly its stability and service life.If realize that the NTC-PTC function is compound, the element of making had both had high temperature limit (self-shield) function, had inhibition impulse current (self-regulation) function again, therefore can realize multi-functionals such as adjustment and overcurrent protection.
At BaTiO 3Be to add Yb in the ptc material 2O 3, WO 3Etc. component, burn till in 1350 ℃, can obtain NTC-PTC composite thermistor material (with reference to day the disclosure special permission clear 54-27555 of communique and a 54-29234), this material sintering temperature very high (1350 ℃).
Japan Patent (with reference to day clear 63-280401 of disclosure special permission communique) and Chinese patent (ZL-92112906.8) utilize the ptc material process for solid phase synthesis, with (Sr, Pb) TiO 3Be matrix material, add a small amount of secondary additive and prepare NTC-PTC composite thermistor material.But there is the difficult control of component in this technology, is subject to problems such as contaminating impurity, process reproducibility difference.
The objective of the invention is to prepare a kind of NTC-PTC composite thermistor material with low temperature sintering of novel composition.Solve or improve the problems referred to above that exist in the traditional handicraft, reduce sintering temperature and the resistivity of material, improve the performance repeatability.
The present invention goes into glassy phase with preparation NTC-PTC composite thermistor material by compound in ceramic material.The NTC-PTC composite thermistor material of the present invention's development refers to contain PbSiO 3(Sr, Pb) TiO 3, (Ba, Pb) TiO 3Or (Sr, Ba) TiO 3In the glass-ceramic composite material, the general expression of system principal component is:
(Sr 1-x-yBa yPb x) Ti zO 3+ wPb mSi mO 2n+mX=0.1~0.9 wherein; Y=0~0.9; Z=0.8~1.2; W=0.001~1; M/n=0.1~10
Prescription contains metal element Ti in the principal component, also contains Sr, Ba, and three kinds of metallic elements of Pb or wherein any two kinds, the oxide of above-mentioned metallic element forms ceramic phase, i.e. (Sr 1-x-yBa yPb x) Ti zO 3, its total amount accounts for 50~99.9mol% of total amount of material; Prescription also contains elements such as Si in the principal component, forms glassy phase, i.e. Pb with Pb etc. mSi nO 2n+m, its total amount accounts for 0.1~30mol% of total amount of material.
In order to make ceramic phase (Sr 1-x-yBa yPb x) Ti zO 3Semiconducting contains a kind of trace element at least in the prescription, as Y, Yb, La, Sb, Nd, Dy, Bi, Ce, Nb etc., its content accounts for 0.01~5mol% of total amount of material.
Sintering temperature and enhancing PTC effect in order to reduce material also are added with a small amount of secondary additive, such as AST (1/3Al in the prescription 2O 33/4SiO 21/4TiO 2), BaPbO 3, Si 3N 4, in BN and the compounds such as Mn, Fe, Li one or more, its content accounts for 0.001~15mol% of total amount of material.Technology:
Technology 1 and technology 2 adopt solid phase synthesis process, and technology 3 and technology 4 adopt chemical synthesis process.
Technology 1 and technology 2 initial feed are selected from TiO 2, SrCO 3, Sr (NO 3) 2, PbO, Pb 3O 4, PbCO 3, Pb (NO 3) 2, BaCO 3, Ba (NO 3) 2, SiO 2And Si (OC 2H 5) 4In the oxide or salt etc. required element, semiconducting element initial feed is selected from Y 2O 3, Y (NO 3) 3, Yb 2O 3, Yb (NO 3) 3, La 2O 3, La (NO 3) 3, Sb 2O 3, Nd 2O 3, Nd (NO 3) 3, Dy 2O 3, Bi 2O 3, Bi (NO 3) 3, Nb 2O 5, CeO 2And Ce (NO 3) 3In the oxide or salt etc. required element, additive is generally selected the higher synthetic product of purity, such as AST, BaPbO 3, Si 3N 4, BN and Mn (NO 3) 2, Fe (NO 3) 2, Li 2CO 3Deng.
Technology 1: cancelled the screening step of commonly using in the traditional handicraft, in the secondary adding technology, introduced chemical treatment method, namely carried out secondary by chemical means and add.The concrete processing step of preparation is as follows: 1. initial feed and semiconducting element are pressed the formulation ratio weighing; 2. mixing and ball milling (48 hours, alcohol-water blending agent, granularity is less than 1 μ m); 3. oven dry (100~150 ℃, 10~30 hours); 4. pre-burning (800~1000 ℃, 1~2 hour); 5. pulverize (granularity is less than 1 μ m), and add additive simultaneously in proportion; 6. dry (100~150 ℃, 10~30 hours), granulation, moulding (moulding pressure 100~500MPa); 7. sintering (1000~1300 ℃, 5~180 minutes) is the composite thermistor material that the present invention develops.
Technology 2: the characteristics ceramic phase (sr in the principal component that is to fill a prescription 1-xPb x) Ti yO 3Synthetic separately, glassy phase Pb mSi nO 2n+mAdd simultaneously with additive.Its body technology step of preparation is as follows: 1. initial feed and semiconducting element are pressed the formulation ratio weighing; 2. mixing and ball milling (48 hours, alcohol-water blending agent, granularity is less than 1 μ m); 3. oven dry (100~150 ℃, 10~30 hours); 4. pre-burning (800~1000 ℃, 1~2 hour), i.e. synthesize ceramic phase (Sr 1-xPb x) Ti yO 35. pulverize ceramic phase (granularity is less than 1 μ m), and additive and glassy phase raw material are pressed formulation ratio and ceramic phase (Sr 1-xPb x) Ti yO 3Powder body material evenly mixes; 6. dry (100~150 ℃, 10~30 hours), granulation, moulding (moulding pressure 100~500MPa); 7. sintering (1000~1300 ℃, 5~180 minutes) is the composite thermistor material that the present invention develops.
Technology 3 and technology 4 initial feed are selected from TiCl 4, Ti (OC 4H 9) 4, SrCO 3, Sr (NO 3) 2, PbCO 3, Pb (NO 3) 2, BaCO 3, Ba (NO 3) 2And Si (OC 2H 5) 4In the oxide or salt etc. required element, semiconducting element initial feed is selected from Y 2O 3, Y (NO 3) 3, Yb 2O 3, Yb (NO 3) 3, La 2O 3, La (NO 3) 3, Sb 2O 3, Nd 2O 3, Nd (NO 3) 3, Dy 2O 3, Bi 2O 3, Bi (NO 3) 3, Nb 2O 5, CeO 2, Ce (NO 3) 3In the oxide or salt etc. required element, additive is generally selected the higher synthetic product of purity, such as AST, BaPbO 3, Si 3N 4, BN and Mn (NO 3) 2, Fe (NO 3) 2, Li 2CO 3Deng.
Technology 3: be to adopt chemical method to prepare NTC-PTC composite thermistor material.The concrete processing step of preparation is as follows: 1. initial feed and semiconducting element are pressed the formulation ratio weighing; 2. with the initial feed and the semiconducting element of weighing form mixed solution (the Ti ion concentration is between 0.01~10M in the solution) jointly; 3. be that precipitation reagent carries out co-precipitation (10~80 ℃ of precipitation temperatures) with oxalic acid (or oxalic acid ammonia); 4. with sediment washing (ethanol dehydration is more than three times after the washed several times with water), dispersion (dispersant is a n-butanol), oven dry (100~150 ℃, 10~30 hours); 5. calcine 600~800 ℃, be incubated 0.5~1.5 hour, obtain the main formula powder body material; 6. the secondary additive is evenly mixed with the main formula powder body material; 7. dry (100~150 ℃, 10~30 hours), moulding (moulding pressure 100~500MPa); 8. sintering (1000~1300 ℃, 5~180 minutes) is the composite thermistor material that the present invention develops.
Technology 4: the characteristics ceramic phase (Sr in the principal component that is to fill a prescription 1-xPb x) Ti yO 3Synthetic separately, glassy phase Pb mSi nO 2n+mAdd simultaneously with additive.The concrete processing step of preparation is as follows: 1. initial feed and semiconducting element are pressed the formulation ratio weighing; 2. with the initial feed and the semiconducting element of weighing form mixed solution (the Ti ion concentration is between 0.01~10M in the solution) jointly; 3. be that precipitation reagent carries out co-precipitation (10~80 ℃ of precipitation temperatures) with oxalic acid (or oxalic acid ammonia); 4. with sediment washing (ethanol dehydration is more than three times after the washed several times with water), dispersion (dispersant is a n-butanol), oven dry (100~150 ℃, 10~30 hours); 5. calcine 600~800 ℃, be incubated 0.5~1.5 hour, obtain ceramic phase (Sr 1-xPb x) Ti yO 3Powder body material; 6. additive and glassy phase raw material are pressed formulation ratio and ceramic phase (Sr 1-xPb x) Ti yO 3Powder body material evenly mixes; 7. dry (100~150 ℃, 10~30 hours), moulding (moulding pressure 100~500MPa); 8. sintering (1000~1300 ℃, 5~180 minutes) is the composite thermistor material that the present invention develops.
The present invention has designed a kind of glass-ceramic composite material, has prepared the compound thermistor material of NTC-PTC, and the minimum specific resistance of material is low, and it has strong and adjustable NTC effect and bigger PTC lift-drag ratio.
Because adopt new additives, new synthesizing mean and chemical treatment method, the sintering temperature of material reduces greatly.Sintering temperature of the present invention can be reduced to about 1100 ℃.Simultaneously, by means such as special elements doping and secondary mix, effectively suppress the Pb volatilization, improved stability.
Description of drawings Fig. 1~Fig. 8 is the resistivity-temperature characteristic curve corresponding to each sample of embodiment 1~8.The initial measurement temperature of data is 0 ℃ in the curve.The meaning of each parameter representative is as follows in table 1~table 8: P 25 ℃-room temperature resistivity; ρ Min-minimum specific resistance; α -50 ℃-negative temperature coefficient, α + 50 ℃-positive temperature coefficient,
Figure C9710077700081
The PTCjump-PTC lift-drag ratio; The resistance ratio falls in NTC drop-NTC.
Exemplify below embodiments of the invention
Example 1. is doped to example (seeing Table 1), fixedly additive (MnO with Y element 2) amount be 0.01mol%, the principal component composition formula is (Sr 0.45Pb 0.51) TiO 3+ 4%PbSiO 3Experiment adopting process 4 is got initial feed Ti (OC 4H 9) 4300ml (concentration 1.17M), Sr (NO 3) 233.43 gram, Pb (NO 3) 263.95 gram is respectively with the Y (NO of 0.093M 3) 3Solution 1.88ml, 3.75ml, 7.50ml, 15.00ml, 30.00ml, 60.00ml, 120.00ml form 1500ml mixed solution (counting 7 groups), in seven groups of mixed solutions, drip respectively oxalic acid solution (respectively containing about 115 grams of oxalic acid), the gained precipitation by the washing of technology 4 conditions, dry, calcining, is obtained powder body material.Si (the OC that in powder body material (about 50 grams), adds 0.40M 2H 5) 4Solution 20.00ml, the Mn (NO of 0.256%M 3) 2(raw material of Mn) solution 5.00ml, and so that their even mixing, dry after in 140MPa pressure compacted under, in 1160 ℃ of sintering 60 minutes (20 ℃ of heating rates/min).The performance parameter of the sample that obtains sees Table 1, and what Fig. 1 curve provided is the resistivity-temperature characteristic curve of sample.
Example 2. principal component composition formulas are (Sr 0.45Pb 0.55-u) TiO 3+ uPbSiO 3, fixedly semiconducting element (being Y element in this example) and additive (FeO 3/2) amount be respectively 0.8mol% and 0.01mol%, change glassy phase principal component SiO 2Content u=0.3%, 10%, 2.0%, 4.0%, 12.0% (seeing Table 2).Experiment adopting process 4 is got initial feed Ti (OC 4H 9) 4300ml (concentration 1.17M), Sr (NO 3) 233.43 gram, Pb (NO 3) 263.95 gram, the Y (NO of 0.093M 3) 3Five groups of each five parts compositions of solution 60.00ml, every group forms respectively the 1500ml mixed solution, in five groups of mixed solutions, drip respectively oxalic acid solution (respectively containing about 115 grams of oxalic acid), the gained precipitation by the washing of technology 4 conditions, dry, calcining, is obtained powder body material.Si (the OC that in five groups of powder body materials (each about 50 gram), adds respectively 0.40M 2H 5) 4Solution 1.50ml, 5.00ml, 10.00ml, 20.00ml, the Fe (NO of 60.00ml and 0.256%M 3) 2(raw material of Fe) solution 5.00ml, and so that their even mixing, dry after in 140MPa pressure compacted under, in 1160 ℃ of sintering 60 minutes (20 ℃ of heating rates/min).The performance parameter of the sample that obtains sees Table 2, and what Fig. 2 curve provided is the resistivity-temperature characteristic curve of sample.
Example 3. is selected Li 2CO 3As additive, fixing prescription is (Sr 0.45Pb 0.51) TiO 3+ 4%PbSiO 3(seeing Table 3).Experiment adopting process 3 is got initial feed Ti (OC 4H 9) 4300ml (concentration 1.17M), Sr (NO 3) 233.43 gram, Pb (NO 3) 263.95 gram, the Si (OC of 0.40M 2H 5) 4Solution 20.00ml, the Y (NO of 0.093M 3) 3Solution 60.00ml, and form the 1500ml mixed solution, to mixed solution and dripping oxalic acid solution (respectively containing about 115 grams of oxalic acid), the gained precipitation by the washing of technology 3 conditions, dry, calcining, is obtained powder body material.The Li that in powder body material, adds 0.256%M 2CO 3Salpeter solution 2.50ml, and make their even mixing, dry back is in 140MPa pressure compacted under, respectively at 1100 ℃, 1110 ℃, 1120 ℃, 1130 ℃, 1140 ℃, 1150 ℃, 1160 ℃, 1170 ℃, 1180 ℃ of sintering 60 minutes (20 ℃ of heating rates/min).The performance parameter of the sample that obtains is seen table 3 and Fig. 3, and as seen, the performance of sample can be regulated according to the burning shrinkage temperature.
Example 4. selects Mn as additive, and fixing prescription is (Sr 0.45Pb 0.43) TiO 3+ 12%PbSiO 3(seeing Table 4).Experiment adopting process 4 is got initial feed Ti (OC 4H 9) 4300ml (concentration 1.17M), Sr (NO 3) 233.43 gram, Pb (NO 3) 263.95 gram, the Y (NO of 0.093M 3) 3Solution 60.00ml, and form the 1500ml mixed solution, to mixed solution and dripping oxalic acid solution (respectively containing about 115 grams of oxalic acid), the gained precipitation by the washing of technology 4 conditions, dry, calcining, is obtained powder body material.Si (the OC that in powder body material, adds 0.40M 2H 5) 4Solution 60.00ml, the Mn (NO of 0.256%M 3) 2(raw material of Mn) solution 5.00ml, and so that their even mixing are dry rear in 140MPa pressure compacted under, respectively at 1100 ℃, 1110 ℃, 1120 ℃, 1130 ℃, 1140 ℃, 1150 ℃, 1160 ℃, 1170 ℃, (20 ℃ of heating rates/min), the performance parameter of the sample that obtains is seen table 4 and Fig. 4 for 1180 ℃ of sintering 60 minutes, as seen, the performance of sample is relatively stable with sintering temperature.
The powder body material (seeing Table 5) of 5 pairs of embodiment of the invention 3 of example and example 4 preparations, in 140MPa pressure compacted under, respectively with 5 ℃/min, 10 ℃/min, 15 ℃/min, 20 ℃/min, the speed of 25 ℃/min is warming up to 1150 ℃, sintering 60 minutes.The performance parameter of the sample that obtains sees Table 5, and Fig. 5 a and Fig. 5 b curve have provided the resistivity-temperature characteristic curve of sample (corresponding example 3 and example 4 respectively).
Example 6. fixing prescriptions are (Sr 0.45Pb 0.43) TiO 3+ 12%PbSiO 3, and fixing additive (FeO 3/2) amount be 0.01mol%, be semiconducting element (seeing Table 6) with Bi, Nd, Dy, Sb, Nb, La, Yb and Ce etc.Experiment adopting process 2 is got initial feed TiO 228.04 gram, SrCO 323.32 eight groups of gram and each eight parts compositions of PbO43.09 gram, every group of Bi, Nd, Dy, Sb, Nb, La, Yb and Ce solution 30.00ml that adds respectively 0.093M (this solution chatted by technology 2 semiconducting element raw material formulated), ball milling was dried 24 hours in 120 ℃ after 48 hours respectively, in 860 ℃ of calcinings 90 minutes, the Si (OC of 0.40M will be added simultaneously respectively after the powder after the calcining (the about 50 grams) pulverizing again 2H 5) 4Fe (the NO of solution 60.00ml and 0.256%M 3) 25.00 milliliters of solution evenly mix, dry after in 140MPa pressure compacted under, in 1160 ℃ of sintering 60 minutes (20 ℃ of heating rates/min).The performance parameter of the sample that obtains sees Table 6, and what Fig. 6 curve provided is the resistivity-temperature characteristic curve of sample.
Example 7 fixing prescriptions are (Sr 0.45Pb 0.51) TiO 3+ 4%PbSiO 3, and fixing semiconducting element (Bi 2O 3) amount be 0.8mol% (seeing Table 7).Experiment adopting process 2 is got initial feed TiO 228.04 gram, SrCO 323.32 four groups of gram and each four parts compositions of PbO43.09 gram, every group of Bi (NO that adds respectively 0.093M 3) 3Solution 60.00ml, difference ball milling in 120 ℃ of oven dry 24 hours, again in 860 ℃ of calcinings 90 minutes, will add respectively the Si (OC of 0.40M after 48 hours after the powder after the calcining (the about 50 grams) pulverizing 2H 5) 4Solution 20.00ml, and add respectively successively Si 3N 4, AST, BaPbO 3Respectively 0.15 restrain with BN, evenly mix, dry rear in 140MPa pressure compacted under, in 1160 ℃ of sintering 60 minutes (heating rate 20/min).The performance parameter of the sample that obtains sees Table 7, and what Fig. 7 curve provided is the resistivity-temperature characteristic curve of sample.
Example 8. fixing prescriptions are (Sr 0.45Pb 0.43) TiO 3+ 12%PbSiO 3, and fixing semiconducting element (Nd 2O 3) amount be 0.8mol% (seeing Table 8).Experiment adopting process 1 is got TiO 228.04 gram, BaCO 348.48 each five parts of grams, SrCO 3With each five parts of PbO, quality is respectively: SrCO 34.664 gram, 3.498 grams, 2.332 grams, 1.166 and 0 gram; The PbO4.309 gram, 6.464 restrain, 8.618 grams, 10.773 grams and 12.927 grams are pressed five groups of the corresponding compositions of table 8, every group of Nd (NO that adds simultaneously respectively 0.093M 3) 3Si (the OC of solution 60.00ml and 0.40M 2H 5) 4Solution 60.00ml, difference ball milling in 120 ℃ of oven dry 24 hours, again in 860 ℃ of calcinings 90 minutes, will add respectively the Mn (NO of 0.256%M after 48 hours after the powder after the calcining (the about 50 grams) pulverizing 3) 25.00 milliliters of solution evenly mix, dry after in 140MPa pressure compacted under, in 1160 ℃ of sintering 60 minutes (20 ℃ of heating rates/min).The performance parameter of the sample that obtains sees Table 8, and what Fig. 8 curve provided is the resistivity-temperature characteristic curve of sample.
Example 9. can add part semiconducting element and segment glass phase constituent PbO in order to improve stability in the secondary adding technology.Be (Sr such as fixing prescription 0.45Pb 0.43) TiO 3+ 12%PbSiO 3, experiment adopting process 2 is got TiO 228.04 gram, SrCO 323.32 gram and PbO40.00 gram, the Nd (NO of adding 0.093M 3) 3Solution 20.00ml ball milling in 120 ℃ of oven dry 24 hours, again in 860 ℃ of calcinings 90 minutes, will add respectively the PbO2.09 gram, the Nd (NO of 0.093M after the powder after the calcining (the about 50 grams) pulverizing after 48 hours simultaneously 3) 3Solution 40.00ml, the Si (OC of 0.40M 2H 5) 4Mn (the NO of solution 60.00ml and 0.256%M 3) 25.00 milliliters of solution evenly mix, dry after in 140MPa pressure compacted under, in 1160 ℃ of sintering 60 minutes (20 ℃ of heating rates/min).The stable performance of the sample that obtains, reproducibility is good.
Above-mentioned experimental example explanation is adjusted by prescription, can be so that the room temperature resistivity of sample (25 ℃ of ρ) is lower than 20 Ω cm, negative temperature coefficient (α -50 ℃) be lower than-5.0%/℃, the NTC resistivity decreased surpasses 3 orders of magnitude, positive temperature coefficient (α + 50 ℃) be higher than+5.0%/℃, PTC resistivity rises and surpasses 4 orders of magnitude.It is low to utilize composition and engineering of the present invention to obtain sintering temperature, and performance is adjustable, and stability and the good NTC-PTC composite thermistor material of repeatability.
(table 1)
The sample sequence number Principal component (mol%) Semiconducting element (mol%) Additive (mol%) Technological parameter Performance parameter
SrO PbO TiO 2 SiO 2 Y 2O 3 MnO 2 Sintering temperature (℃) Sintering time (min) Heating rate (℃/min) ρ 25℃(Ω·cm) ρ min(Ω·cm) α -50℃(%/℃) α +50℃(%/℃) NTC drop PTC jump
1-1 45 55 100 4.0 0.025 0.01 1160 60 20 4.17E10 4.20E8 -5.31 0.90 10 2.0 10 0.47
1-2 45 55 100 4.0 0.05 0.01 1160 60 20 4.20E10 3.27E8 -5.10 2.32 10 2.0 10 0.73
1-3 45 55 100 4.0 0.1 0.01 1160 60 20 1.69E10 1.21E9 -6.39 1.72 10 1.5 10 0.62
1-4 45 55 100 4.0 0.2 0.01 1160 60 20 4.34E10 4.27E9 -4.99 1.00 10 1.2 10 0.50
1-5 45 55 100 4.0 0.4 0.01 1160 60 20 2.37E3 3.34E2 -1.67 7.60 10 1.1 10 4.22
1-6 45 55 100 4.0 0.8 0.01 1160 60 20 4.05E4 4.61E2 -3.54 6.60 10 2.7 10 4.70
1-7 45 55 100 4.0 1.6 0.01 1160 60 20 9.64E8 4.13E5 -5.88 7.59 10 4.4 10 2.55
(table 2)
The sample sequence number Principal component (mol%) Semiconducting element (mol%) Additive (mol%) Technological parameter Performance parameter
SrO PbO TiO 2 SiO 2 Y 2O 3 FeO 3/2 Sintering temperature (℃) Sintering time (min) Heating rate (℃/min) ρ 25℃(Ω·cm) ρ min(Ω·cm) α -50℃ (%/℃) α +50℃ (%/℃) NTC drop PTC jump
2-1 45 55 100 0.3 0.8 0.01 1160 60 20 1.07E2 6.06E1 0.80 5.62 10 0.37 10 2.58
2-2 45 55 100 1.0 0.8 0.01 1160 60 20 4.15E5 9.12E4 1.99 8.42 10 0.90 10 3.81
2-3 45 55 100 2.0 0.8 0.01 1160 60 20 8.98E2 8.48E1 2.58 6.46 10 1.41 10 4.11
2-4 45 55 100 4.0 0.8 0.01 1160 60 20 4.05E4 4.61E2 3.33 6.00 10 2.37 10 4.62
2-5 45 55 100 12.0 0.8 0.01 1160 60 20 1.48E4 3.85E2 2.86 5.98 10 2.02 10 5.02
(table 3)
The sample sequence number Principal component (mol%) Semiconducting element (mol%) Additive (mol%) Technological parameter Performance parameter
SrO PbO TiO 2 SiO 2 Y 2O 3 LiO 1/2 Sintering temperature (℃) Sintering time (min) Heating rate (℃/min) ρ 25℃(Ω·cm) ρ min(Ω·cm) α -50℃ (%/℃) α +50℃ (%/℃) NTC drop PTC jump
3-1 45 55 100 4.0 0.8 0.01 1100 60 20 6.02E2 6.37E1 2.11 4.00 10 1.27 10 3.45
3-2 45 55 100 4.0 0.8 0.01 1110 60 20 9.00E2 7.29E1 2.21 4.49 10 1.33 10 3.60
3-3 45 55 100 4.0 0.8 0.01 1120 60 20 2.00E3 1.07E2 2.47 4.64 10 1.68 10 3.85
3-4 45 55 100 4.0 0.8 0.01 1130 60 20 4.50E3 1.44E2 2.70 5.62 10 1.76 10 4.10
3-5 45 55 100 4.0 0.8 0.01 1140 60 20 1.65E4 2.50E2 3.01 5.7 10 2.17 10 4.33
3-6 45 55 100 4.0 0.8 0.01 1150 60 20 1.00E5 4.91E2 3.37 5.93 10 2.37 10 4.72
3-7 45 55 100 4.0 0.8 0.01 1160 60 20 1.65E5 1.09E3 3.90 6.89 10 2.81 10 4.69
3-8 45 55 100 4.0 0.8 0.01 1170 60 20 3.60E5 2.51E3 4.00 6.96 10 2.80 10 4.52
3-9 45 55 100 4.0 0.8 0.01 1180 60 20 1.77E6 4.80E3 4.44 6.78 10 3.36 10 4.26
(table 4)
The sample sequence number Principal component (mol%) Semiconducting element (mol%) Additive (mol%) Technological parameter Performance parameter
SrO PbO TiO 2 SiO 2 Y 2O 3 MnO 2 Sintering temperature (℃) Sintering time (min) Heating rate (℃/min) ρ 25℃(Ω·cm) ρ min(Ω·cm) α -50℃ (%/℃) α -50℃ (%/℃) NTC drop PTC jump
4-1 45 55 100 12.0 0.8 0.01 1100 60 20 1.17E5 3.34E3 2.71 4.78 10 1.88 10 4.05
4-2 45 55 100 12.0 0.8 0.01 1110 60 20 1.50E5 3.40E3 2.77 5.44 10 1.92 10 4.38
4-3 45 55 100 12.0 0.8 0.01 1120 60 20 1.91E5 3.82E3 2.80 5.32 10 1.97 10 4.62
4-4 45 55 100 12.0 0.8 0.01 1130 60 20 8.00E4 1.67E3 2.77 5.64 10 2.06 10 4.84
4-5 45 55 100 12.0 0.8 0.01 1140 60 20 7.00E4 1.27E3 3.02 5.55 10 2.19 10 4.95
4-6 45 55 100 12.0 0.8 0.01 1150 60 20 1.83E4 3.85E2 3.11 6.27 10 2.26 10 4.90
4-7 45 55 100 12.0 0.8 0.01 1160 60 20 3.09E4 4.44E2 3.09 5.09 10 2.25 10 4.89
4-8 45 55 100 12.0 0.8 0.01 1170 60 20 3.15E4 5.08E2 3.15 5.27 10 2.28 10 4.47
4-9 45 55 100 12.0 0.8 0.01 1180 60 20 4.95E4 5.72E2 3.31 4.16 10 2.41 10 3.95
(table 5)
The sample sequence number Principal component (mol%) Semiconducting element (mol%) Additive (mol%) Technological parameter Performance parameter
SrO PbO TiO 2 SiO 2 Y 2O 3 Li or Mn Sintering temperature (℃) Sintering time (min) Heating rate (℃/min) ρ 25℃(Ω·cm) ρ min(Ω·cm) α -50℃ (%/℃) α +50℃ (%/℃) NTC drop PTC jump
5-1 45 55 100 4.0 0.8 Li0.01 1160 60 5 4.55E2 5.08E1 2.07 3.85 10 1.21 10 2.77
5-2 45 55 100 4.0 0.8 Li0.01 1160 60 10 3.00E3 1.50E2 2.56 4.55 10 1.57 10 3.41
5-3 45 55 100 4.0 0.8 Li0.01 1160 60 15 1.33E4 3.23E2 3.20 6.17 10 2.04 10 4.45
5-4 45 55 100 4.0 0.8 Li0.01 1160 60 20 1.00E5 4.91E2 3.37 5.93 10 2.37 10 4.72
5-5 45 55 100 4.0 0.8 Li0.01 1160 60 25 1.39E5 1.03E3 3.91 7.33 10 2.77 10 4.79
5-6 45 55 100 12.0 0.8 Mn0.01 1160 60 5 5.32E4 1.23E3 2.94 5.34 10 2.04 10 4.44
5-7 45 55 100 12.0 0.8 Mn0.01 1160 60 10 3.28E4 6.89E2 2.97 5.77 10 2.08 10 4.72
5-8 45 55 100 12.0 0.8 Mn0.01 1160 60 15 2.56E4 5.20E2 3.08 6.11 10 2.18 10 4.85
5-9 45 55 100 12.0 0.8 Mn0.01 1160 60 20 1.83E4 3.85E2 3.11 6.27 10 2.26 10 4.90
5-0 45 55 100 12.0 0.8 Mn0.01 1160 60 25 6.02E4 6.78E2 3.31 5.49 10 2.47 10 4.46
(table 6)
The sample sequence number Principal component (mol%) Semiconducting element (mol%) Additive (mol%) Technological parameter Performance parameter
SrO PbO TiO 2 SiO 2 FeO 3/2 Sintering temperature (℃) Sintering time (min) Heating rate (℃/min) ρ 25℃(Ω·cm) ρ min(Ω·cm) α -50℃ (%/℃) α +50℃ (%/℃) NTC drop PTC jump
6-1 45 55 100 12.0 Bi0.4 0.01 1160 60 20 3.99E3 1.46E1 4.47 5.39 10 2.95 10 4.36
6-2 45 55 100 12.0 Nd0.4 0.01 1160 60 20 1.00E4 2.65E1 4.52 5.41 10 3.16 10 4.12
6-3 45 55 100 12.0 Dy0.4 0.01 1160 60 20 6.82E3 3.20E1 4.48 5.11 10 2.89 10 3.47
6-4 45 55 100 12.0 Sb0.4 0.01 1160 60 20 1.99E4 5.31E1 4.71 5.56 10 3.14 10 3.78
6-5 45 55 100 12.0 Nb0.4 0.01 1160 60 20 9.01E4 1.37E2 5.22 5.22 10 3.43 10 3.44
6-6 45 55 100 12.0 La0.4 0.01 1160 60 20 1.72E5 2.74E2 5.21 5.19 10 3.49 10 3.43
6-7 45 55 100 12.0 Yb0.4 0.01 1160 60 20 6.99E5 3.43E2 4.49 4.49 10 2.83 10 3.47
6-8 45 55 100 12.0 Ce0.4 0.01 1160 60 20 3.26E5 6.64E2 4.70 4.71 10 3.26 10 3.36
(table 7)
The sample sequence number Principal component (mol%) Semiconducting element (mol%) Additive (wt.%) Technological parameter Performance parameter
SrO PbO TiO 2 SiO 2 Bi 2O 3 Sintering temperature (℃) Sintering time (min) Heating rate (℃/min) ρ 25℃(Ω·cm) ρ min(Ω·cm) α -50℃ (%℃) α +50℃ (%/℃) NTC drop PTC jump
7-1 45 55 100 4.0 0.8 a0.3 1160 60 20 8.71E3 2.91E1 5.23 5.39 10 3.07 10 4.16
7-2 45 55 100 4.0 0.8 b0.3 1160 60 20 2.51E4 1.14E2 4.49 5.10 10 2.90 10 3.47
7-3 45 55 100 4.0 0.8 c0.3 1160 60 20 6.60E4 1.31E2 4.73 5.56 10 3.31 10 3.36
7-4 45 55 100 4.0 0.8 d0.3 1160 60 20 1.80E5 2.76E2 5.22 4.41 10 3.47 10 3.44
[notes] additive a, b, c, d represent Si respectively 3N 4, AsT, BaPbO 3And BN, content is the weight percentage with respect to principal component.(table 8)
The sample sequence number Principal component (mol%) Semiconducting element (mol%) Additive (mol%) Technological parameter Performance parameter
SrO BaO PbO TiO 2 SiO 2 Nd 2O 3 MnO 2 Sintering temperature (℃) Sintering time (min) Heating rate (℃/min) ρ 25℃(Ω·cm) ρ min(Ω·cm) α -50℃ (%/℃) α +50℃ (%/℃) NTC drop PTC jump
8-1 20 70 10 100 12.0 0.8 0.01 1160 60 20 9.98E2 3.02E2 2.44 7.89 10 0.82 10 4.57
8-2 15 70 15 100 12.0 0.8 0.01 1160 60 20 2.73E3 1.98E2 2.85 7.61 10 1.54 10 4.50
8-3 10 70 20 100 12.0 0.8 0.01 1160 60 20 1.20E4 1.07E2 3.85 6.40 10 2.48 10 4.57
8-4 5 70 25 100 12.0 0.8 0.01 1160 60 20 4.11E4 4.99E1 4.43 5.89 10 3.48 10 4.53
8-5 0 70 30 100 12.0 0.8 0.01 1160 60 20 1.83E5 2.48E1 4.79 4.47 10 4.53 10 4.10

Claims (5)

1. the combined characteristic thermosensitive resistor material of a low temperature sintering is characterized in that the principal component of this material consists of:
(Sr 1-x-yBa yPb x) Ti zO 3+ wPb mSi nO 2n+mX=0.1~0.9 wherein; Y=0~0.9; Z=0.8~1.2; W=0.001~1; M/n=0.1~10
Prescription contains metal element Ti in the principal component, contains Sr, Ba, and three kinds of metallic elements of Pb or wherein any two kinds, the oxide of above-mentioned metallic element forms ceramic phase, i.e. (Sr 1-x-yBa yPb x) Ti zO 3, its total amount accounts for 50~99.9mol% of total amount of material; Prescription contains the Si element in the principal component, forms glassy phase, i.e. Pb with Pb etc. mSi nO 2n+m, its total amount accounts for 0.1~30mol% of total amount of material; At least contain a kind of trace element in the prescription, be among Y, Yb, La, Sb, Nd, Dy, Bi, Ce, the Nb one or more, its content accounts for 0.01~5mol% of total amount of material; Be added with a small amount of secondary additive in the prescription, be AST (1/3Al 2O 33/4SiO 21/4TiO 2), BaPbO 3, Si 3N 4, in BN and Mn, Fe, the Li compound one or more, its content accounts for 0.001~15mol% of total amount of material.
2. a method for preparing the combined characteristic thermosensitive resistor material of low temperature sintering as claimed in claim 1 is characterized in that initial feed is selected from TiO 2, SrCO 3, Sr (NO 3) 2, PbO, Pb 3O 4, PbCO 3, Pb (NO 3) 2, BaCO 3, Ba (NO 3) 2, SiO 2And Si (OC 2H 5) 4In the oxide or salt etc. required element, semiconducting element initial feed is selected from Y 2O 3, Y (NO 3) 3, Yb 2O 3, Yb (NO 3) 3, La 2O 3, La (NO 3) 3, Sb 2O 3, Nd 2O 3, Nd (NO 3) 3, Dy 2O 3, Bi 2O 3, Bi (NO 3) 3, Nb 2O 5, CeO 2And Ce (NO 3) 3In the oxide or salt etc. required element, additive is generally selected the higher synthetic product of purity, is AST, BaPbO 3, Si 3N 4, BN and Mn (NO 3) 2, Fe (NO 3) 2, Li 2CO 31. this technology comprise the steps: initial feed and semiconducting element by the formulation ratio weighing; 2. mixing and ball milling (48 hours, alcohol-water blending agent, granularity is less than 1 μ m); 3. oven dry (100~150 ℃, 10~30 hours); 4. pre-burning (800~1000 ℃, 1~2 hour); 5. pulverize (granularity is less than 1 μ m), and add in proportion additive simultaneously; 6. drying (100~150 ℃, 10~30 hours), granulation, moulding (typed pressure 100~500MPa); 7. sintering (1000~1300 ℃, 5~180 minutes) namely obtains the composite thermistor material.
3. a method for preparing the combined characteristic thermosensitive resistor material of low temperature sintering as claimed in claim 1 is characterized in that initial feed is selected from TiO 2, SrCO 3, Sr (NO 3) 2, PbO, Pb 3O 4, PbCO 3, Pb (NO 3) 2, BaCO 3, Ba (NO 3) 2, SiO 2And Si (OC 2H 5) 4In the oxide or salt etc. required element, semiconducting element initial feed is selected from Y 2O 3, Y (NO 3) 3, Yb 2O 3, Yb (NO 3) 3, La 2O 3, La (NO 3) 3, Sb 2O 3, Nd 2O 3, Nd (NO 3) 3, Dy 2O 3, Bi 2O 3, Bi (NO 3) 3, Nb 2O 5, CeO 2And Ce (NO 3) 3In the oxide or salt etc. required element, additive is generally selected the higher synthetic product of purity, is AST, BaPbO 3, Si 3N 4, BN and Mn (NO 3) 2, Fe (NO 3) 2, Li 2CO 31. this technology comprise the steps: initial feed and semiconducting element by the formulation ratio weighing; 2. mixed billiard ball mill (48 hours, alcohol-water blending agent, granularity is less than 1 μ m); 3. oven dry (100~150 ℃, 10~30 hours); 4. pre-burning (800~1000 ℃, 1~2 hour), i.e. synthesize ceramic phase (Sr 1-xPb x) Ti yO 35. pulverize ceramic phase (granularity is less than 1 μ m), and additive and glassy phase raw material are pressed formulation ratio and ceramic phase (Sr 1-xPb x) Ti yO 3Powder body material evenly mixes; 6. drying (100~150 ℃, 10~30 hours), granulation, moulding (typed pressure 100~500MPa); 7. sintering (1000~1300 ℃, 5~180 minutes) namely obtains the composite thermistor material.
4. a method for preparing the combined characteristic thermosensitive resistor material of low temperature sintering as claimed in claim 1 is characterized in that initial feed is selected from TiCl 4, Ti (OC 4H 9) 4, SrCO 3, Sr (NO 3) 2, PbCO 3, Pb (NO 3) 2, BaCO 3, Ba (NO 3) 2And Si (OC 2H 5) 4In the oxide or salt etc. required element, semiconducting element initial feed is selected from Y 2O 3, Y (NO 3) 3, Yb 2O 3, Yb (NO 3) 3, La 2O 3, La (NO 3) 3, Sb 2O 3, Nd 2O 3, Nd (NO 3) 3, Dy 2O 3, Bi 2O 3, Bi (NO 3) 3, Nb 2O 5, CeO 2, Ce (NO 3) 3In the oxide or salt etc. required element, additive is generally selected the higher synthetic product of purity, is AST, BaPbO 3, Si 3N 4, BN and Mn (NO 3) 2, Fe (NO 3) 2, Li 2CO 31. this technology comprise the steps: initial feed and semiconducting element by the formulation ratio weighing; 2. with initial feed and the semiconducting element of weighing form mixed solution (the Ti ion concentration is between 0.01~10M in the solution) jointly; 3. carry out co-precipitation (10~80 ℃ of precipitation temperatures) take oxalic acid (or oxalic acid ammonia) as precipitating reagent; 4. with sediment washing (ethanol dehydration is more than three times after the washed several times with water), dispersion (dispersant is n-butanol), oven dry (100~150 ℃, 10~30 hours); 5. calcine 600~800 ℃, be incubated 0.5~1.5 hour, obtain the main formula powder body material; 6. the secondary additive is evenly mixed with the main formula powder body material; 7. dry (100~150 ℃, 10~30 hours), moulding (typed pressure 100~500MPa); 8. sintering (1000~1300 ℃, 5~180 minutes) namely obtains the composite thermistor material.
5. a method for preparing the combined characteristic thermosensitive resistor material of low temperature sintering as claimed in claim 1 is characterized in that initial feed is selected from TiCl 4, Ti (OC 4H 9) 4, SrCO 3, Sr (NO 3) 2, PbCO 3, Pb (NO 3) 2, BaCO 3, Ba (NO 3) 2And Si (OC 2H 5) 4In the oxide or salt etc. required element, semiconducting element initial feed is selected from Y 2O 3, Y (NO 3) 3, Yb 2O 3, Yb (NO 3) 3, La 2O 3, La (NO 3) 3, Sb 2O 3, Nd 2O 3, Nd (NO 3) 3, Dy 2O 3, Bi 2O 3, Bi (NO 3) 3, Nb 2O 5, CeO 2, Ce (NO 3) 3In the oxide or salt etc. required element, additive is generally selected the higher synthetic product of purity, is AST, BaPbO 3, Si 3N 4, BN and Mn (NO 3) 2, Fe (NO 3) 2, Li 2CO 31. this technology comprise the steps: initial feed and semiconducting element by the formulation ratio weighing; 2. with initial feed and the semiconducting element of weighing form mixed solution (the Ti ion concentration is between 0.01~10M in the solution) jointly; 3. carry out co-precipitation (10~80 ℃ of precipitation temperatures) take oxalic acid (or oxalic acid ammonia) as precipitating reagent; 4. with sediment washing (ethanol dehydration is more than three times after the washed several times with water), dispersion (dispersant is n-butanol), oven dry (100~150 ℃, 10~30 hours); 5. calcine 600~800 ℃, be incubated 0.5~1.5 hour, obtain ceramic phase (Sr 1-xPb x) Ti yO 3Powder body material; 6. additive and glassy phase raw material are pressed formulation ratio and ceramic phase (Sr 1-xPb x) Ti yO 3Powder body material evenly mixes; 7. dry (100~150 ℃, 10~30 hours), moulding (typed pressure 100~500MPa); 8. sintering (1000~1300 ℃, 5~180 minutes) namely obtains the composite thermistor material.
CN97100777A 1997-02-26 1997-02-26 Medium- and low-temp. sintered combined characteristic thermosensitive resistor material composition and preparing method Expired - Fee Related CN1047457C (en)

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CN101763926B (en) * 2010-02-25 2012-03-21 深圳市三宝创业科技有限公司 Positive-temperature coefficient thermosensitive resistor and production method thereof
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CN101962294A (en) * 2010-07-15 2011-02-02 上海大学 W-type low-and-medium temperature NTC-PTC binary composite thermistor material and preparation method thereof
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