CN104704434B - 用于压力式质量流控制器自我校验的方法和设备 - Google Patents
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- G01—MEASURING; TESTING
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- G—PHYSICS
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Abstract
一种质量流控制***,当对到过程的流体流控制时可针对其精确度自我校验。所述***包括:用于作为控制信号的函数来控制通过***的流体流的控制阀;用于作为通过***的流体的测得流量和目标流量设定值的函数来产生控制信号的控制器;压力传感器,用于测量和控制在测量和校验流率中使用的流体压力;以及流体源,其用于提供用于在控制过程的步骤之间的任何时候校验***精确度的已知体积的流体。
Description
技术领域
本公开通常涉及质量流控制器,以及更具体地涉及压力式质量流控制器的自我校验。如本文所用的术语“气体”被认为包括气体或蒸气。
背景技术
通常情况下,质量流控制器(MFC)实时地控制和监测流体(即,气体或蒸气)流的速率,使得流动通过装置的气体质量的流率可被计量和控制。质量流控制器(MFC)通常用于在半导体制造过程期间控制气体的流动,其中流入到半导体工具诸如真空腔室内的气体流必须被小心地加以控制以产生高产率的半导体产品。MFC通常设计和校准成在特定的流率范围内控制特定类型气体的流率。所述装置基于给定设定值来控制流率,所述给定设定值通常由用户或诸如半导体工具本身的外部装置预先确定。设定值可取决于针对每一步骤所需的流率来随着过程的每一步骤来改变。MFC可以是模拟或数字的。它们通常设计成与入口气体的压力范围配合使用,MFC通常可适用于低压和高压。所有的MFC具有入口端口,和出口端口,包括质量流传感器和比例控制阀的质量流计。***控制器用作反馈控制***的一部分,其根据如由设定值所确定的流率与由质量流传感器所感测的测得的流率的比较(或作为所述比较的函数)来给控制阀提供控制信号。反馈控制***从而操作该阀,以使得所测得的流量保持在由设定值所确定的流率下。
这种控制***假设MFC保持在特定公差范围内的校准状态。为了测试MFC是否在校准的公差范围内,通常利用这种装置作为质量流校验器来对MFC进行离线测试。后者即质量流校验器用于测试流率。虽然离线测试是非常精确的,但是总有一个问题,即MFC会在过程运行期间(实时地)变得未进行校准,并且直到过程完成才被检测。这通常会导致半导体产品的更低产率,并甚至是完全失败导致整体产品产率损失。这可能是昂贵的,而且显然是不希望的。所需要的是在过程正在运行的同时用于持续实时地测试MFC精确度的***和方法。
质量流控制器包括两种类型,热式和压力式质量流控制器。序列号为13/354,988美国专利申请描述了一种用于测试热式质量流控制器使得质量流控制器的精确度可以无需离线作业的方式进行校验的***和方法,该美国专利申请于2012年1月20日以JunhuaDing的名义提交,其标题为“实时监测通过质量流控制器的流动的***和方法(System andMethod of Monitoring Flow Through Mass Flow Controllers in Real Time)”;并转让给本受让人。
发明内容
本发明的某些实施例涉及到质量流控制***,当对到过程的流体流控制时其精确度可实时地自我校验,所述***包括:
用于根据控制信号(或作为所述控制信号的函数)来控制通过***的流体流的控制阀;
用于根据通过***的流体的测得流量和设定值(或作为其函数)来产生控制信号的控制器;以及
流体源,其用于提供用于在流控制过程的步骤之间的任何时候校验***精确度的已知体积的流体。在一个实施方式中,该***还包括流限制装置以针对流量测量产生阻塞流动状态;压力传感器,其用于提供代表***中流限制装置上游的流体的所测得压力的压力测量信号;以及温度传感器,其用于提供代表***中流体的所测得温度的温度测量信号。
在另一实施方式中,该***进一步包括第二压力传感器,其用于提供代表所述流限制装置下游流体的所测得压力的压力测量信号,使得可针对非阻塞流动状态测量流率。
根据另一个实施方式,提供当对到过程的流控制时校验质量流控制***精确度的方法。该方法包括:根据控制信号控制通过***的流体流;根据通过***的流体的所测得流量和设定值来产生控制信号;并提供用于在流控制过程的步骤之间的任何时候校验***精确度的已知体积的流体。
附图说明
附图仅仅通过实例的方式而并非通过限制性的方式描绘了根据本发明教导的一个或多个实施方式。在附图中,相同的附图标记指代相同或相似的元件。
图1是压力式MFC的一个实施例的总体示意图,其配置成允许以无需离线作业的方式来测试MFC的精确度;以及
图2是压力式MFC的第二实施例的总体示意图,其配置成允许以无需离线作业的方式来测试MFC的精确度。
具体实施方式
在下面的详细描述中,许多具体细节通过实例的方式提出,以便提供对有关教导的透彻理解。然而,对于本领域内的那些技术人员应当显而易见的是本教导可在没有这些细节的情况下加以实施。在其它情况下,以相对高程度地且无需细节的方式对已知的方法、程序、组件和/或电路进行了说明,以便避免不必要地模糊本教导的方面。
应当理解的是,本主题技术的其它配置对于本领域内的那些技术人员而言从下面的详细描述将变得容易显而易见,其中主题技术的各种配置通过实例的方式进行了示出和说明。如将被认识到的那样,主题技术能够具有其它和不同的配置,且其若干细节能够在各种其它方面中进行变型,但是所有这些都不脱离主题技术的范围。因此,附图和具体实施方式在本质上应被视为是说明性的而并非限制性的。
本公开涉及压力式MFC。存在两个实施例,一个用于阻塞流动状态,而另一个用于非阻塞流动状况。如将被看到的那样,一个装置可配置成在任一模式下进行操作。
阻塞流动是一种可压缩流动效应。变得“阻塞”或受到限制的参数是流体的速度。阻塞流动因此是一种流体动态状态,其中在给定的压力和温度下流动通过MFC的流体在其通过一个限制(诸如一个固定横截面面积的孔口或喷嘴)进入一较低的压力环境下时速度将增加。阻塞流动是一种限制状态,当质量流率在上游压力固定的同时将不随着下游压力环境下的进一步降低而增加时发生上述限制状态。在阻塞流动状态下,质量流率可通过增加上游压力或者通过降低上游温度来增加。因为质量流率无关于下游压力,而仅依赖于限制上游侧的温度和压力,因此气体的阻塞流动在许多应用中是有用的。在阻塞流动状态下,诸如阀的流限制装置、校准孔口板和喷嘴可用于产生所需的质量流率。针对阻塞流动状态,相对于流限制装置的上游压力Pu和下游压力Pd必须满足以下基准:
其中γ是气体的比热比。
如图1中所示,新颖的压力式MFC 100的实施例配置成:(a)适于阻塞流动状态;和(b)用于实时提供能够校验MFC精确度的信息。MFC 100在MFC 100的入口端口120处接收流体110。流体从入口端口通过支撑块件140的导管130引导到出口端口150。MFC 100块件140的上游部分支撑上游比例控制阀160,所述上游比例控制阀配置成响应于并根据施加到上游阀的流量控制信号调节通过MFC 100出口150的流体110的流率。具体地,上游控制阀160可根据并响应于来自控制器170的流量控制信号在完全打开和完全关闭位置之间的任何位置下操作以便控制来自MFC出口150的流体110的流率。流量控制信号根据下述由控制器170产生:所示的施加到控制器170并代表通过MFC的流体的所需(流量设定值)流率的设定流量信号(由用户和/或来自诸如独立计算机或过程工具的外部装置的外部程序设定);以及(b)代表所测得流率的所测得流量信号,所测得流率为流动通过MFC的流体的压力和温度的函数。控制器170包括用于存储校准系数的存储器,所述校准***是基于由所述***接收到的所感测温度和压力信号提供精确测得的流量信号所必需的。在示出的实施例中,该测得的流量信号作为由压力传感器180(以压力换能器的形式在图1中示出)所提供的压力信号和由温度传感器190所提供的温度信号的函数来提供。MFC 100的出口150设有以200指示的某些类型的流限制装置,其可由下游控制阀210提供(通过控制所述阀的位置而形成受限制的开口),或由单独的装置提供,诸如流喷嘴/孔口,其在阻塞流动状态下具有限制流体从出口150流动的流量和压力的效果。
为了实时地校验MFC的精确度,在图1所示的实施例,MFC 100还进一步包括在出口150处由块件140支撑的下游控制阀210,和贮存器220。贮存器220由块件140支撑在两个控制阀160和210之间。贮存器配置成存储流入到MFC内的已知体积的流体。温度传感器190耦联到贮存器220,这样它测量所述贮存器壁的温度,该温度近似于贮存器220中流体并由此近似于在MFC内流动的流体的温度。温度传感器190将代表所测得的温度信号提供给控制器170。所测得的流率是该测得的温度以及由压力传感器180所测得压力的函数。压力传感器180在两个阀160和210之间还与导管130耦联,并配置成测量流动通过导管130到达示出为下游控制阀210的孔口200的流限制装置的流体110的压力。
在操作过程中,下游控制阀210是打开的,而流量设定值被设定在非零值,从而使得控制器170来控制通过上游阀160的流动,这样所测得的流量将等于非零设定值。代表所感测温度和压力的数据以信号的形式从温度传感器190和压力传感器180传送到控制器170以便用于确定流动通过MFC的所测得的质量流。如下面更详细描述的那样,控制器170根据针对阻塞流动状态的方程式(2)确定所测得的流率
Qp=C′·A·f(m,γ,T)·Pu, (2)
其中,C′是孔口200的孔口排放系数,A为有效的孔口面积,m为气体的分子量,γ为气体的比热容量比,T为气体温度,Pu为上游压力,以及
f(m,γ,T)为与气体分子量m、气体的比热容量γ、和气体温度T有关的数学函数。
控制器170将阀控制信号提供给阀160,用于控制流入和流出MFC100的流,这样所测得的流率QP追踪由流量设定值所指令的流动。只要MFC被正确地校准,则两者将基本保持相等(在允许的公差范围内)。在阀210用于限定流限制装置的孔口的情况下,在阻塞流动状态下,阀210的位置将保持不变。
可在被指令的零设定值的任何时间执行流量(或流动)校验检查,诸如像在气体输送过程中的两个步骤之间的时间段内进行,或是在完成该过程之后进行。在流量校验期间,当流体持续从贮存器220流动(与MFC下游的压力相比,这处于更高的压力下)时,控制器170将自动地关闭上游比例控制阀160,以允许控制器170基于由压力传感器170所提供的压力信号的衰变率来校验流率。该校验阶段通常需要约100-300毫秒以便执行测量。在某些实施例中,该校验阶段可在100到300毫秒之间。在该校验阶段期间,来自贮存器220的流体110被引导流出MFC 100的出口150。由衰变率原理所确定的流率,QV,其为剩余流体110离开***时所处的流率的指示,可通过方程式(3)来确定:
其中,t表示时间,k表示转换常数,以及V、Pu和T分别表示贮存器220的体积、如由压力传感器170所测得的气体压力、以及如由温度传感器160所测得的气体温度。
一旦校验阶段结束,下游比例控制阀210就完全关闭,以防止任何剩余流体110离开所述MFC 100。在校验阶段期间,MFC 100使用方程式(2)对照衰变流率,如根据方程式(3)所确定的QV来校验所计算出的流率Qp。
如果Qp从QV偏差的程度高于预定的精确度公差极限,则MFC 100可将警报发送出到主控制器(未示出),以警告脱离校准状态。备选地,MFC 100可基于校验值QV以数学方式调整或更新系数,诸如调整或更新在流量计算方程式(2)中的C′和/或A,以至于在Qp和QV之间的流量误差最小化,等于或低于预定的精确度公差极限。因此,在该流量校验阶段期间,MFC100在公差极限范围内重新校准。因此,一旦调整,当随后指令非零状态,则MFC 100利用经校验的流率值,以达到流体离开***时所处的目标流率。
图2示出用于针对非阻塞流动状态操作MFC的实施例。具体地,MFC 250包括与图1所示实施例相同或相似的组件,但具有附加的压力传感器260(示出为压力换能器),其布置成感测流限制装置200下游的气体压力。第二压力传感器260可安装到块件140,或与块件分开地安装。
应当理解的是图2的实施例。可用于阻塞流动状态和非阻塞流动状态。图2实施例的操作模式从而确定MFC 250是否是针对阻塞流动状态还是针对非阻塞流动状态而操作。
针对非阻塞流动状态,所测得的流率通过方程式(4)计算成:
Qp=f(Pu,Pd,T,m,γ,A), (4)
其中f是上游压力Pu、下游压力Pd、气体温度T、气体分子量m、气体比热比γ和有效孔口面积A的数学函数。
在非阻塞流动状态下的流动过程中,为了进行校验,上游阀再次关闭,且气体将接着从贮存器220流动并流出MFC 250的出口150(在阀260的下游)。经校验的流率,QV,仍通过上述方程式(3)来确定。
与Qp和QV值有关的数据可在控制器170中累积,以及然后可将与Qp和QV相关的数据进行比较,以确定MFC是否超出特定的校准公差。进一步地,在方程式(4)中的所述系数可被更新,以将Qp和QV之间的流量误差最小化。因此,MFC 250在流量校验阶段期间被重新校准。
因此,前述是在过程正在运行的同时用于持续实时地测试和校验MFC校准设定的***和方法。在一个附加实施例中,如果在存储于控制器170的存储器中的当前系数与从由***所进行的测量所确定的系数之间存在差异,则该***还可通过基于所述校验结果调节流量计算系数进行自我校准。在这种布置中,用于所测得流率Qp的流量计算方程式的所述系数可基于校验结果重新计算,使得Qp和QV之间的流量误差最小化,等于或低于预定的精确度公差极限,以便在流量校验阶段期间在公差极限范围内重新校准***。
由于在不脱离本文所包含的本发明范围的情况下可对上述设备和过程进行的其它变化和修改,因此意旨包含在上述说明中的所有主题应以说明性而非限制性的意义来加以解释。
Claims (14)
1.一种自我校验的质量流控制***,所述质量流控制***用于当对到过程的流体流控制时的实时精确度校验,所述***包括:
入口,其接收处于压力下的流体;
出口,其输送所述处于压力下的流体;
导管,流体在压力下流动通过所述导管;
控制阀,其对所述导管内从所述入口至所述出口的流体流进行控制;
连接至所述导管的贮存器,其存储已知体积的流体;
在所述贮存器与所述出口之间的流限制装置,其可控地限制所述贮存器与所述出口之间的流体流;
压力传感器,其耦联到所述导管并且感测所述导管内流体的压力,提供表示所述压力的信号作为输出;以及
产生控制信号的控制器,所述控制信号作为通过***的流体的测得的流量和流量设定值的函数,并且其中所述控制器控制所述控制阀的位置且使用来自单个的所述压力传感器的所述信号用于所述质量流控制***的两种不同操作;
(i)用于过程操作的对所述控制阀的流控制,其基于来自所述压力传感器的信号以便使得通过所述导管的流体流量与所述流量设定值相等;以及
(ii)通过基于来自所述压力传感器的信号来确定所述贮存器内的压力衰变率而对流体流控制的精确度进行流校验。
2.根据权利要求1所述的质量流控制***,其中所述流限制装置被控制以针对通过所述导管的流体流产生阻塞流动状态。
3.根据权利要求2所述的质量流控制***,其中所述流限制装置具有孔口,所述孔口的横截面面积是可调节的。
4.根据权利要求2所述的质量流控制***,还包括第二控制阀,其用于提供限定流限制装置的可调节开口。
5.根据权利要求1所述的质量流控制***,还包括配置成提供代表所述导管中流体的所测得温度的温度测量信号的温度传感器。
6.根据权利要求5所述的质量流控制***,其中所述控制器配置成作为***中流体的所测得压力和温度的函数将通过导管的所测得的流体流量Qp确定成:
Qp=C′·A·f(m,γ,T)·Pu,
其中,C′是流限制装置的孔口排放系数,A为流限制装置的有效孔口面积,m为流体的分子量,γ为流体的比热容量比,T为流体温度,Pu为压力,以及f(m,γ,T)为与流体分子量、流体的比热容量比、和流体温度有关的数学函数。
7.根据权利要求1所述的质量流控制***,其中所述贮存器是定位在控制阀下游,这样当指令为零流量设定值时控制阀关闭,并且仍允许流体从贮存器流动并由所述质量流控制***基于阻塞流动状态测量QP,其中另一个流量测量QV由来自贮存器的流体衰变率而得出为:
其中,t表示时间,k表示转换常数,以及V、Pu和T分别表示贮存器的体积、贮存器中流体的压力和温度。
8.根据权利要求7所述的质量流控制***,其中***可作为由来自贮存器的流体衰变率所得出的流量测量QV和由***基于阻塞流动状态所测得的流体流量QP之间差异的函数来自我校验其流量精确度。
9.根据权利要求7所述的质量流控制***,还包括第二控制阀,其中在流量校验完成之后所述第二控制阀关闭以便履行零流量设定值命令。
10.根据权利要求7所述的质量流控制***,其中在流控制过程的步骤之间的任何时候的校验阶段期间进行校验,校验阶段在100和300毫秒之间。
11.根据权利要求7所述的质量流控制***,其中所述贮存器定位在所述控制阀和所述流限制装置之间。
12.根据权利要求7所述的质量流控制***,其中如果Qp从QV偏差的程度高于预定的精确度公差极限,则***将警报提供给主控制器以警告脱离校准状态。
13.根据权利要求7所述的质量流控制***,其中***可基于校验结果针对所测得的流体流量QP调节流量计算方程的系数,使得在Qp和QV之间的流量误差最小化,等于或低于预定的精确度公差极限,以便***在流量校验阶段期间在公差极限范围内重新校准。
14.根据权利要求1所述的质量流控制***,其中所述压力传感器为第一压力传感器,所述第一压力传感器用于产生作为流限制装置上游的流体压力的函数的信号,并且还包括第二压力传感器,所述第二压力传感器用于产生作为流限制装置下游的流体压力的函数的信号以便在非阻塞流动状态期间测量流体流量,其中所测得的流体流量QP基于以下方程式:
Qp=f(Pu,Pd,T,m,γ,A),
其中f是上游压力Pu、下游压力Pd、流体温度T、气体分子量m,气体比热比γ和有效孔口面积A的数学函数。
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EP2901227B1 (en) | 2019-03-06 |
KR20150060788A (ko) | 2015-06-03 |
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EP2901227A1 (en) | 2015-08-05 |
US10801867B2 (en) | 2020-10-13 |
US10031005B2 (en) | 2018-07-24 |
US20180306615A1 (en) | 2018-10-25 |
KR101662046B1 (ko) | 2016-10-04 |
WO2014051925A1 (en) | 2014-04-03 |
JP6093019B2 (ja) | 2017-03-08 |
CN104704434A (zh) | 2015-06-10 |
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TW201433897A (zh) | 2014-09-01 |
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