CN104681381A - Oxide cathode plasma source with large area and high ionization rate - Google Patents
Oxide cathode plasma source with large area and high ionization rate Download PDFInfo
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- CN104681381A CN104681381A CN201510066213.9A CN201510066213A CN104681381A CN 104681381 A CN104681381 A CN 104681381A CN 201510066213 A CN201510066213 A CN 201510066213A CN 104681381 A CN104681381 A CN 104681381A
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- large area
- fixed head
- ionization rate
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Abstract
The invention discloses an oxide cathode plasma source with a large area and a high ionization rate. The oxide cathode plasma source comprises a supporting frame formed by an upper beam, a lower beam and a fixed plate, a lamp filament array used for heating, and a metal reflector plate arranged at the back and the periphery of the lamp filament array, and a cathode plate, wherein the fixed plate is of an annular structure with the polygonal exterior and the round interior, and wafers are arranged on the outer edge of the cathode plate; the cathode plate is electrically connected to the fixed plate through electric connection pieces, and the electric connection pieces are easily-deformable metal sheets. The oxide cathode plasma source has the advantages of stable structural performance and capability of producing large-scale uniform plasma environment.
Description
Technical field
The present invention relates to hot cathode technology field, be specifically related to a kind of large area high ionization rate oxide coated cathode plasma source.
Background technology
Oxide coated cathode is widely used in electronics industry, is further developing of hot filament cathode.The general designation of the class emitter that present said oxide coated cathode general reference sprays one deck alkaline earth oxide at based metal surfaces and makes, document G. He Meng, S. Hua Geng receives and shows " the oxide coated cathode first volume ", " oxide coated cathode volume Two ", has detailed introduction in Jiang Jianping work " cathode electronics and gas discharge principle " to oxide coated cathode.Relative to hot filament cathode, its work function, working temperature are all much lower, but emission effciency is but higher than thoriated-tungsten cathode a lot.More estimable, under pulsed discharge pattern, it can provide the many current density larger than hot filament cathode.The representative instance that oxide coated cathode is applied in plasma physics experimental study is the LAPD (Large Area Plasma Device) of University of California in Los Angeles, document D.Leneman, W.Gekelman, and J.Moggs, Rev.Sci.Instrum.77,015108 (2006) is described in detail the parameter of this plasma source, structure and discharge scenario.
As Fig. 1, it is the rough schematic view of the operation principle of oxide coated cathode, be coated with the high temperature Base Metal plate of oxide coating as negative electrode, and placing an anodic grid mesh apart from its correct position place, between negative electrode and positive electrode, add pulse voltage, make the electron detachment of overflowing in oxide coating out, and obtain certain speed and go to collide neutral gas molecule, neutral gas molecule is ionized, produces plasma.
Current oxide coated cathode application stock size is industrially less.In some application, the uniform on a large scale background plasma environment that experimenter needs, but also there is no larger-size oxide coated cathode in prior art.
Summary of the invention
The invention provides a kind of large area high ionization rate oxide coated cathode plasma source, it has structural behaviour and stablizes, and can provide the advantage of uniform plasma environment in a big way.
Technical problem to be solved by this invention realizes by the following technical solutions:
A kind of large area high ionization rate oxide coated cathode plasma source, it comprises support frame be made up of upper beam, underbeam and fixed head, is used for the filament array of heating, is arranged on after filament array and the metallic reflection plate of surrounding, minus plate; Described fixed head is circulus circular in outer polygon, and described minus plate outward flange is provided with contact.
Tangential and the footpath row of the circle of described fixed head has heat insulation slit.
Described fixed head is provided with breach.
Described filament array is by the wire being weaving through many high-temperature insulation earthenwares placed side by side, and earthenware, is used for fixing the stopper slot having U-type groove and the gag lever post composition of earthenware.
Described wire be one or more wires synthesis one.
Electrical connection between described minus plate and fixed head is completed by electric connecting sheet, and electric connecting sheet is yielding sheet metal.
The invention has the beneficial effects as follows: the mechanical connection between minus plate with fixed head processes with being electrically connected to separate by the present invention, both ensure that the stability of mechanical connection therebetween, also ensure that good electrical connection; When runway nibs on fixed head and minus plate contact can prevent hot operation, dilatancy is comparatively large and occur bulge phenomenon; Heat insulation slit on fixed head can reduce the temperature of the contact point of fixed head and miscellaneous part, makes Stability Analysis of Structures.
Accompanying drawing explanation
Fig. 1 is the rough schematic view of oxide coated cathode operation principle;
Fig. 2 is the front view of the preferred embodiments of the present invention;
Fig. 3 is the left view of the preferred embodiments of the present invention;
Fig. 4 is the detailed structure schematic diagram of the filament array of the preferred embodiments of the present invention;
Fig. 5 is the detailed structure schematic diagram that the local electric of the preferred embodiments of the present invention connects.
Embodiment
In order to make easy to understand of the present invention, below in conjunction with concrete diagram, set forth the present invention further.
As described in Fig. 2-5, a kind of large area high ionization rate oxide coated cathode plasma source, its critical piece comprises upper beam 11, underbeam 12, minus plate 13, fixed head 14, filament (or earthenware) array 15, gag lever post 16, the parts such as electric connecting sheet 17, earthenware stopper slot 18, reflecting plate 19.
Because temperature difference when temperature during work and assembling is comparatively large, and the scale ratio of oxide coated cathode is comparatively large, and support frame of the present invention adopts segmented, and main by weight is by upper beam 11, and underbeam 12 is born.As Fig. 2, fixed head respectively has 3 holes up and down, and wherein the hole 146 of bottom center, is circular port, and all the other holes are racetrack.The hole, two, left and right 147 of below is the runway nibs of level, the hole 145 of top center is the racetrack of vertical direction, and its right and left is the runway nibs 144 be obliquely installed, and its incline direction, angle of inclination are depending on actual needs, change, 15 degree, this Rio according to the size of minus plate.
The present invention adopts filament array heater-type to heat, and as shown in Figure 4, an one metal wire 25 or many one metal wires synthesize one in the structural representation of filament array, are weaving through in many high-temperature insulation earthenwares 23 placed side by side.Earthenware is embedded in the special stopper slot 18 having U-type groove (abbreviation stopper slot), and the outside of stopper slot puts a gag lever post 16 again, further the activity of restriction earthenware.Several earthenwares are composed in series a unit, are connected to electrode 24.The array of multiple earthenware unit composition is called earthenware array or filament array.
As shown in Figure 2, the fixed head 14 of the present embodiment is designed to an outer octagon, the circulus of interior circle, if wished, it also can be that in outer hexagon, circle waits other shapes.Its Main Function is the support providing minus plate 13, and uniform current guided on minus plate, and we do not wish that temperature that it works is too high or lose too many heat by it.Fixed head passes through each 3 point cantact up and down and contacts with upper underbeam.In order to reduce the temperature of these contact points, our inner circle on fixed head is tangential, has opened 4 heat insulation slits 141.Wherein upper and lower this 2 slits effectively reduce the heat being transmitted to contact point.During fixed head work, the temperature of inner edges is higher than outer peripheral, so himself also have the problem that thermal expansion is inconsistent, the thermal expansion amplitude of inward flange is higher than outward flange.The risk may brought in order to avoid this is inconsistent, we have also opened 4 slits 142 in fixed head inner circle radial direction, are used for discharging this thermal stress.
The special tie point 148 that fixed head 14 is arranged by corner with peripheral circuit is connected.Near these 4 points, open 4 breach 143, reduced heat losses on the one hand, reduce the temperature of tie point 148; On the other hand, suitable breach size, can reduce by four angle temperature of minus plate 13, improves the uniformity of cathode plate temperature.
As Fig. 2, Fig. 3, stopper slot 18 directly contacts with earthenware 23, and temperature during its work is very high.For tackling thermal expansion during its work, we are designed to its upper end can be freely up and down movable.Fig. 3 upper right, stopper slot upper end 182 is columniform, has a circular hole at the corresponding part of upper beam, and this circular hole limits the degree of freedom of stopper slot radial direction, but it can axially can freely activity.Fig. 3 bottom right, in order to increase the thermal resistance between stopper slot and underbeam, the lower end of stopper slot does not directly contact with underbeam, limits the swing of its horizontal direction with a location-plate 26, and a cheese head screw 22 has been installed below stopper slot, stopper slot is placed on this screw.On the other hand, for avoiding the thermal radiation of stopper slot 18 to be applied directly to upper underbeam, we are also provided with one deck reflecting plate 20 between stopper slot and upper underbeam, and this reflecting plate plays the effect of fixing gag lever post 16 simultaneously.
Fig. 5 is the partial enlarged drawing of the Contact details of minus plate and fixed head.The circular edges of minus plate is stretched out uniformly 12 contacts 131, its each contact has the hole 132 of 1 racetrack, on fixed head, correspondence has a circular port.On minus plate, why arrange 12 runway nibs, be consider that minus plate and fixed head are when hot operation, and the thermal expansion degree of the two is different.These 12 points coordinate, and just ensure the mechanical connection of minus plate and fixed head, but in order to make the free-extension of hot dirty shrinkage in junction, these 12 tie points not secure fit.In order to make up the bad defect of electrical connection that above-mentioned cooperation may bring, be additionally provided with electric connecting sheet 17.Respectively there is a dogleg section 172 at the two ends of electric connecting sheet, its dogleg section 133 secure fit corresponding with on minus plate.Secure fit between the dogleg section 171 of electric connecting sheet and fixed head 14.Electric connecting sheet is a thin slice, yielding in the radial direction of circular cathode plate, to offset minus plate thermal expansion amount different from fixed head.Uniform current is guided on 12 contacts of minus plate by electric connecting sheet 17, ensures the uniformity of minus plate electromotive force as much as possible.
Filament array constitutes the thermal source that is similar to flat bulk, its thermal radiation towards both direction close to each half, in order to improve efficiency of utilization, reduce thermal loss, reduce the heat load of other peripheral components, we are provided with reflecting plate 19 at the another side of filament array simultaneously, reflecting plate 19 is one piece of metal sheet, its needs at high temperature maintain the original state preferably, and under high temperature, still there is higher heat reflectivity on its surface.The reflecting plate of the present embodiment adopts thin molybdenum plate.Reflector can be individual layer, can be also multilayer, depending on actual needs, is multilayer here.Similar, be also provided with reflector in the surrounding of filament array, reduce thermal loss further.
More than show and describe general principle of the present invention and principal character and advantage of the present invention.The technical staff of the industry should understand; the present invention is not restricted to the described embodiments; what describe in above-described embodiment and specification just illustrates principle of the present invention; without departing from the spirit and scope of the present invention; the present invention also has various changes and modifications, and these changes and improvements all fall in the claimed scope of the invention.Application claims protection range is defined by appending claims and equivalent thereof.
Claims (6)
1. a large area high ionization rate oxide coated cathode plasma source, is characterized in that: it comprises the support frame be made up of upper beam, underbeam and fixed head, is used for the filament array heated, and is arranged on after filament array and the metallic reflection plate of surrounding, minus plate; Described fixed head is circulus circular in outer polygon, and described minus plate outward flange is provided with contact.
2. a kind of large area high ionization rate oxide coated cathode plasma source according to claim 1, is characterized in that: the tangential and radial direction of the circle of described fixed head has heat insulation slit.
3. a kind of large area high ionization rate oxide coated cathode plasma source according to claim 1, is characterized in that: described fixed head is provided with breach.
4. a kind of large area high ionization rate oxide coated cathode plasma source according to claim 1, is characterized in that: described filament array forms by being weaving through the wire of many high-temperature insulation earthenwares placed side by side, earthenware, the stopper slot having U-type groove being used for fixing earthenware and gag lever post.
5. a kind of large area high ionization rate oxide coated cathode plasma source according to claim 4, is characterized in that: described wire be one or more wires synthesis one.
6. a kind of large area high ionization rate oxide coated cathode plasma source according to claim 1, it is characterized in that: the electrical connection between described minus plate and fixed head is completed by electric connecting sheet, electric connecting sheet is yielding sheet metal.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510066213.9A CN104681381A (en) | 2015-02-04 | 2015-02-04 | Oxide cathode plasma source with large area and high ionization rate |
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| CN201510066213.9A CN104681381A (en) | 2015-02-04 | 2015-02-04 | Oxide cathode plasma source with large area and high ionization rate |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108417470A (en) * | 2018-03-19 | 2018-08-17 | 中国科学技术大学 | A kind of high ionization rate large area oxide-coated cathode plasma source cathode and production method |
| CN108986611A (en) * | 2018-08-17 | 2018-12-11 | 中国科学技术大学 | A kind of space magnetic field joins phenomena simulation device again |
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| JPH03173035A (en) * | 1989-11-09 | 1991-07-26 | Samsung Electron Devices Co Ltd | Dispenser cathode |
| CN1453809A (en) * | 2002-04-25 | 2003-11-05 | 汤姆森许可贸易公司 | Oxide cathode of high density thin emitting zone for eectronic gun |
| WO2005062334A1 (en) * | 2003-12-23 | 2005-07-07 | L.G. Philips Displays Netherlands B.V. | Oxide cathode |
| CN204391037U (en) * | 2015-02-04 | 2015-06-10 | 中国科学技术大学 | A kind of large area high ionization rate oxide coated cathode plasma source |
-
2015
- 2015-02-04 CN CN201510066213.9A patent/CN104681381A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03173035A (en) * | 1989-11-09 | 1991-07-26 | Samsung Electron Devices Co Ltd | Dispenser cathode |
| CN1453809A (en) * | 2002-04-25 | 2003-11-05 | 汤姆森许可贸易公司 | Oxide cathode of high density thin emitting zone for eectronic gun |
| WO2005062334A1 (en) * | 2003-12-23 | 2005-07-07 | L.G. Philips Displays Netherlands B.V. | Oxide cathode |
| CN204391037U (en) * | 2015-02-04 | 2015-06-10 | 中国科学技术大学 | A kind of large area high ionization rate oxide coated cathode plasma source |
Non-Patent Citations (2)
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| ALAN G.LYNN等: ""The helcat dual-source plasma device"", 《REVIEW OF SCIENTIFIC INSTRUMENTS》 * |
| D.LENEMAN等: ""The plasma source of the large plasma device at University of California Los Angeles"", 《REVIEW OF SCIENTIFIC INSTRUMENTS》 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108417470A (en) * | 2018-03-19 | 2018-08-17 | 中国科学技术大学 | A kind of high ionization rate large area oxide-coated cathode plasma source cathode and production method |
| CN108986611A (en) * | 2018-08-17 | 2018-12-11 | 中国科学技术大学 | A kind of space magnetic field joins phenomena simulation device again |
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