CN104678694A - Layout correction method and device - Google Patents
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- CN104678694A CN104678694A CN201310612554.2A CN201310612554A CN104678694A CN 104678694 A CN104678694 A CN 104678694A CN 201310612554 A CN201310612554 A CN 201310612554A CN 104678694 A CN104678694 A CN 104678694A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
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Abstract
The invention discloses a layout correction method and device. The layout correction method comprises the following steps of acquiring an original layout comprising at least one graph, acquiring a stepped part of the graph outline, wherein the stepped part comprises a first line, a second line parallel to the first line, and a third line intersecting with the first line and the second line, acquiring a third line step with a size less than a threshold value, wherein the step is used as a step to be treated, carrying out pre-treatment on the step to be treated by replacing a part of the step to be treated by a polygonal line composed of multiple lines orderly connected at obtuse angles, wherein an acute included angle of the first line and a fourth line obtained by fitting of intersection points of the multiple lines of the polygonal line and the intersection point of the first line and the second line is decreased along with decreasing of the third line size, and carrying out optical proximity correction on the pretreated layout. The pretreated layout graph is conducive to optical proximity correction.
Description
Technical field
The present invention relates to semiconductor fabrication process, particularly a kind of domain modification method and domain corrective.
Background technology
In semiconductor fabrication process, often need to make mask.The Forming Quality of mask directly affects the quality of the figure made on wafer.Along with constantly reducing of semiconductor technology node, device feature size is constantly close to the wavelength being even less than light source.In the case, optical proximity effect must not become irrespective factor.
In existing reticle pattern manufacturing process, first design original layout according to the component graphics that need make on wafer and optical principle.The example (taking dotted line as housing) that Fig. 1 and Fig. 2 respectively illustrates the component graphics that need make on wafer and the original layout designed according to described component graphics.Then, the original layout designed is transferred on mask plate.But the figure be transferred on mask plate often exists gap with original layout, such as, the right angle in original layout can form fillet (rounding) being transferred to after on mask plate.The component graphics adopting this actual mask pattern that there is deviation to make can not be inconsistent with expection yet.
Therefore, need to provide the more accurate domain modification method of one and equipment.
Summary of the invention
The problem that the present invention solves is to provide the more accurate domain modification method of one and equipment.
For solving the problem, the invention provides a kind of domain modification method, comprising:
Obtain original layout, described original layout comprises at least one figure;
Obtain in the part of step in the profile of described figure, described step comprises the first line segment, the second line segment and three line segment all crossing with described first line segment, the second line segment that are parallel to each other;
Obtain the 3rd line segment size and be less than the step of threshold value as pending step;
Pre-service is carried out to described pending step, described pre-service comprises: a part for described pending step replaced with and become obtuse angle to intersect the broken line of connection successively by many line segments, the part that the part of described broken line and described first line segment intersects at the first intersection point, described broken line and described second line segment meets at the second intersection point, and the acute angle that the 4th straight line of the intersection point of many articles of line segments of described broken line, described first intersection point and described second intersection point matching and described first line segment are formed reduces along with the minimizing of described 3rd line segment size; And
Optical proximity correction is carried out to pretreated domain.
Alternatively, described many line segments comprise the N bar first group line segment parallel with described first line segment, and N+1 bar is parallel to each other and becomes second group of line segment of the crossing connection in obtuse angle successively with described first group of line segment, and wherein N is more than or equal to 1.
Alternatively, the point being distributed in described 4th straight line in the intersection point of described many articles of line segments, described first intersection point and described second intersection point is equal with the some quantity being distributed in described 4th straight line another side, and equal with the distance of described 4th straight line.
Alternatively, the intersection point of described 4th straight line and described many articles of line segments divides the part of described 4th straight line between first, second line segment described equally.
Alternatively, the tangent value of acute angle that described 4th straight line is formed to described first line segment is directly proportional to the size of described 3rd line segment.
Alternatively, the quantitative range of described many line segments is 3 to 15.
Alternatively, described threshold value carries out the twice of the radius of corner graphically formed for the rectangular figures in the described original layout of employing.
Correspondingly, the invention provides a kind of domain corrective, comprising:
Detecting unit, for detecting the figure of original layout, and obtains in the part of step in the profile of described figure, and described step comprises the first line segment, the second line segment and three line segment all crossing with described first line segment, the second line segment that are parallel to each other;
Judging unit, for judging whether the 3rd line segment size of the described step obtained is less than threshold value;
Pretreatment unit, step for being less than threshold value to the 3rd line segment size carries out pre-service, described pre-service comprises: a part for described pending step replaced with and become obtuse angle to intersect the broken line of connection successively by many line segments, a part for described broken line and described first line segment intersects at the first intersection point, a part for described broken line and described second line segment meets at the second intersection point, the intersection point of many line segments of described broken line, the acute angle that 4th straight line of described first intersection point and described second intersection point matching and described first line segment are formed reduces along with the minimizing of described 3rd line segment size, and
Amending unit, for carrying out optical proximity correction to pretreated domain.
Alternatively, described many line segments comprise the N bar first group line segment parallel with described first line segment, and N+1 bar is parallel to each other and becomes second group of line segment of the crossing connection in obtuse angle successively with described first group of line segment, and wherein N is more than or equal to 1.
Alternatively, the point being distributed in described 4th straight line in the intersection point of described many articles of line segments, described first intersection point and described second intersection point is equal with the some quantity being distributed in described 4th straight line another side, and equal with the distance of described 4th straight line.
Alternatively, the intersection point of described 4th straight line and described many articles of line segments divides the part of described 4th straight line between first, second line segment described equally.
Alternatively, the tangent value of acute angle that described 4th straight line is formed to described first line segment is directly proportional to the size of described 3rd line segment.
Alternatively, the quantitative range of described many line segments is 3 to 15.
Alternatively, described threshold value carries out the twice of the radius of corner graphically formed for the rectangular figures in the described original layout of employing.
Compared with prior art, the present invention has the following advantages:
Carry out pretreated layout patterns according to the embodiment of the present invention, the figure that mask plate is formed is more close with transferring them to.That is, adopt the embodiment of the present invention through pretreated layout patterns, can predict more exactly and be transferred to the figure after on mask plate, thus the contiguous makeover process of control both optical better, be conducive to controlling the correction of domain.
Accompanying drawing explanation
Fig. 1 shows the example of the component graphics that need make on wafer.
Fig. 2 shows the original layout figure that the component graphics according to Fig. 1 is designed.
Fig. 3 shows the schematic flow sheet of the domain modification method of the embodiment of the present invention.
Fig. 4 shows the example of an original layout part of the embodiment of the present invention.
Fig. 5 shows the enlarged diagram of step 205a and 205b in Fig. 4.
Fig. 6 shows the ramp pattern of step 205b and correspondence thereof.
Fig. 7 shows the example through pretreated step of the embodiment of the present invention.
Fig. 8 shows the example through pretreated step of further embodiment of this invention.
Fig. 9 shows the block diagram of the domain corrective of the embodiment of the present invention.
Embodiment
The embodiment of the present invention provides a kind of domain modification method and equipment.Carry out pretreated layout patterns according to the embodiment of the present invention, the figure that mask plate is formed is more close with transferring them to.That is, adopt the embodiment of the present invention through pretreated layout patterns, can predict more exactly and be transferred to the figure after on mask plate, thus the contiguous makeover process of control both optical better, be conducive to controlling the correction of domain.
Fig. 3 shows the schematic flow sheet of the domain modification method of the embodiment of the present invention.Described domain modification method comprises:
Step S101, obtain original layout, described original layout comprises at least one figure;
Step S103, obtains in the part of step in the profile of described figure, and described step comprises the first line segment, the second line segment and three line segment all crossing with described first line segment, the second line segment that are parallel to each other;
Step S105, obtains the 3rd line segment size and is less than the step of threshold value as pending step;
Step S107, pre-service is carried out to described pending step, described pre-service comprises: a part for described pending step replaced with and become obtuse angle to intersect the broken line of connection successively by many line segments, a part for described broken line and described first line segment intersects at the first intersection point, a part for described broken line and described second line segment meets at the second intersection point, the intersection point of many line segments of described broken line, the acute angle that 4th straight line of described first intersection point and described second intersection point matching and described first line segment are formed reduces along with the minimizing of described 3rd line segment size, and
Step S109, carries out optical proximity correction to pretreated domain.
Below in conjunction with specific embodiments technical scheme of the present invention is described in detail.
With reference to figure 3, perform step S101, obtain original version Figure 20, described original version Figure 20 and at least comprise a figure 201.
Fig. 4 shows the example of an original layout part of the embodiment of the present invention.Described original layout 20(with dotted line in scheming for frame) domain for according to the graphics devices structural design that need be formed on wafer.Described original version Figure 20 at least comprises a figure 201, and described figure 201 has profile, and the graph outline shown in Fig. 4 presents step shape.With bottom illustrated dotted border to the right for reference direction, the outline line of described figure 201 comprises the horizontal line section becoming 0 ° of angle with reference direction, and with the vertical line segment of reference direction angle in 90 °.
Continue with reference to figure 4, perform step S103, obtaining in the profile of described figure 201 is the part of step, and described step comprises the first line segment, the second line segment and three line segment all crossing with described first line segment, the second line segment that are parallel to each other.
By detecting the graph outline in described domain 20, the pending part in figure can be obtained, i.e. right angle portions and the part in step.For the original version Figure 20 shown in Fig. 4, can obtain and need illustrate with circular dashed line frame in right angle portions 203a, 203b(figure to be processed) and step part 205a, 205b(figure in illustrate with circular dashed line frame).Due to the process of right angle portions similarly to the prior art, do not repeat them here.Process to step is below described in detail in detail.
Fig. 5 shows the enlarged diagram of step 205a and 205b in Fig. 4.Step has three line segments to form, and is respectively the first line segment and the second line segment that are parallel to each other, and with described first line segment and all crossing the 3rd line segment of the second line segment.Described first line segment and the second line segment lay respectively at the both sides of described 3rd line segment.Profile due to usual original layout figure only includes the line segment becoming 0 ° and 90 ° with said reference direction, and therefore described first line segment and the second line segment are vertical with described 3rd line segment respectively.Therefore, a step comprises two right angles, the described size of the 3rd line segment and the height of step.
Perform step S105, obtain the 3rd line segment size and be less than the step of threshold value as pending step.
For the step of differing heights, the mode of process is different.In some embodiments, the radius R that the rectangular figures by experiment in the known original layout of data is transferred to fillet figure corresponding on mask plate is roughly how many, can using the twice of described radius of corner R as threshold value.When the height of step is greater than described threshold value, such as, step 205a, two right angles that this step comprises can process as independently rectangular figures separately, such as, cut separately and start from right-angled apices the line segment formation opening that length is approximately R, then close this opening with a line segment.When the height of step is less than described threshold value, such as, step 205b, is handled as follows this step as pending step.
Perform step S107, pre-service is carried out to described pending step 205b, described pre-service comprises: a part of described pending step 205b replaced with and become obtuse angle to intersect the broken line of connection successively by many line segments, a part for described broken line and described first line segment intersects at the first intersection point, a part for described broken line and described second line segment meets at the second intersection point, the intersection point of many line segments that described broken line comprises, the acute angle that 4th straight line of described first intersection point and described second intersection point matching and described first line segment are formed reduces along with the minimizing of described 3rd line segment size.
Through actual mask fabrication, the step cutting pattern in original layout can change into ramp pattern, and along with the reduction of described bench height, the ramp pattern of its correspondence also can become more smooth.Fig. 6 shows the ramp pattern of described step 205b and correspondence thereof.The domatic outline line roughly on the slope that the dotted line in Fig. 6 is formed after showing and described step 205b being transferred to mask plate, described domatic outline line roughly meets at respective mid point with described 3rd line segment.Inventor finds, the acute angle that described domatic outline line and first, second line segment described are formed reduces along with the reduction of described bench height.By great many of experiments, find that the tangent value of described acute angle and described bench height are roughly inversely proportional to.Known, if to described step 205b after pre-service, its figure close to slope as shown in Figure 6, can be conducive to follow-up optical proximity correction, and then improves the precision of domain correction.
Provide several pretreated example below.
Fig. 7 shows the example through pretreated step of the embodiment of the present invention.As shown in Figure 7, the step 205b in Fig. 6 forms step 205c after pre-service.A part of described step 205b is replaced by and becomes obtuse angle to intersect the broken line of connection successively by many line segments.Particularly, shown in a part of JK(Fig. 7 chain lines of a part of CD, the 3rd line segment DJ of described step 205b first line segment AD and the second line segment JM) be replaced by broken line CFHK.Described broken line comprises a line segment FH parallel with first, second line segment described, and is connected to line segment FH two ends, respectively becomes line segment CF and HK at 135 ° of angles with line segment FH.The remainder AC of described broken line CFHK and described first line segment meets at the first intersection point C, meets at the second intersection point K with the remainder KM of described second line segment.The figure that line segment AB, phantom line segments BL in Fig. 7 and line segment LM are formed illustrates in general and described step 205b is transferred to ramp pattern corresponding after on mask plate through actual mask fabrication, wherein phantom line segments BL corresponds to the domatic outline line of the ramp pattern of described step 205b after representing actual mask fabrication, meets at respective mid point G with the 3rd line segment DJ be replaced.By a part of described step 205b being replaced to multiple obtuse angles step cutting pattern as shown in Figure 7, make pretreated after step 205c more close to the ramp pattern that described step 205b is corresponding.The turning point of described multiple obtuse angles step cutting pattern, i.e. intersection point F, H of many line segments of comprising of described broken line CFHK, and the acute angle that the fitting a straight line of described first intersection point C and described second intersection point K and first, second line segment described are formed reduces along with the reduction of the size of described 3rd line segment DJ, thus make obtuse angle step cutting pattern roughly extend the realistic mask fabrication of trend become the Changing Pattern of figure.
In certain embodiments, the fitting a straight line of turning point F, H, C and K of described multiple obtuse angles step overlaps with described domatic outline line BL, that is, make the turning point of multiple obtuse angles step in Fig. 7 generally along described domatic outline line BL to distribute, thus reach better simulate effect.In certain embodiments, the quantity being distributed in obtuse angle step turning point F, H, C and the K on described fitting a straight line (i.e. the straight line at described domatic outline line BL place) both sides is equal, and it is also equal apart from the distance of described domatic outline line BL, thus make each point all be unlikely to excessive apart from the distance of described domatic outline line BL, improve simulate effect further.
From geometrical principle, broken line under above-mentioned configuration and described domatic outline line BL(and the part of described fitting a straight line between first, second line segment described) intersection point divide described domatic outline line BL equally, i.e. intersection point E, G and H quarterline virtual segment BL, thus, the formation method of broken line can be determined.
In some embodiments, first determine the number of the line segment forming broken line.Such as, to form two obtuse angle step cutting patterns, then need the parallel segment that formation one is parallel with first, second line segment described, and two become the inclined line segment of the crossing connection in obtuse angle with described parallel segment.Then, the length of described parallel segment is determined.Through geometric analysis, formula (1) and formula (2) can be obtained:
Tan (x)=C/H formula (1)
D=H/2* [cot (x)-1] formula (2)
Wherein, x represents acute angle formed by described phantom line segments BL and first, second line segment described, and C is the constant that an experiment obtains, and H is the size of described 3rd line segment, i.e. bench height, d is the length of described parallel segment.
If 1/2C is constant A, formula (3) can be obtained by formula (1) and formula (2):
d=A*H
2-H/2 （3）。
Described parallel segment and described 3rd line segment are vertically intersected on respective mid point.Determine the length of described parallel segment, described parallel segment can be formed.Then, from the two-end-point of described parallel segment, inclined line segment described in each self-forming, described inclined line segment and described parallel segment respectively in 135 ° of angles, each with first, second line segment intersection described in the first intersection point and the second intersection point.Then, remove described 3rd line segment, and first, second line segment described from first, second intersection point described to the part of described 3rd line segment.Thus, the pre-service to this step cutting pattern is completed.
Fig. 8 shows the example through pretreated step of further embodiment of this invention.As shown in Figure 8, the step 205b in Fig. 6 forms step 205d after pre-service.A part of bc, the 3rd line segment ck of the first line segment ac of original step 205b and a part of kl(Fig. 8 chain lines of the second line segment km illustrate) be replaced.The step 205d formed after replacing comprises three obtuse angle steps, is made up of remainder ab, the broken line bdfhjl of the first line segment and the remainder lm of the 3rd line segment.The remainder ab of described broken line bdfhjl and described first line segment meets at the first intersection point b, meets at the second intersection point l with the remainder lm of described second line segment.Described broken line bdfhjl comprises two parallel segment df and hj, and three inclined line segment bd, fh and jl becoming 135 ° of obtuse angles with described parallel segment.The matched curve of turning point b, d, f, h, j and l of three obtuse angle steps illustrates with dotted line in bevel wheel profile bl(Fig. 8) overlap.In some embodiments, turning point f, j quantity being distributed in described fitting a straight line (i.e. the straight line at described bevel wheel profile bl place) turning point d, h on one side and another side is equal, and equal apart from the distance of described fitting a straight line, thus realize better fitting effect.Owing to being provided with more obtuse angle step, to make through pretreated step cutting pattern 205d, more close to the actual ramp pattern made, to achieve better effect.
From geometrical principle, in above-mentioned configuration, described broken line bdfhjl and described bevel wheel profile bl(and the part of described fitting a straight line between first, second line segment described) intersection point e, g and i divide described phantom line segments bl equally, the concrete formation method of described broken line bdfhjl can be obtained thus.Specifically can with reference to above-described embodiment.
From above-described embodiment, the obtuse angle step that step cutting pattern after pretreated has is more, the turning point of obtuse angle step the distribution of fitting a straight line both sides more even, turning point distance fitting a straight line apart from nearer, the effect then simulated is better, and then makes the precision of domain correction higher.But the quantity of obtuse angle step can not be too much, otherwise can increase calculated amount, affects efficiency, and make pretreated after figure middle conductor undersized, be unfavorable for the simulation in later stage.Therefore, the quantity of obtuse angle step is comparatively suitable between 2 to 8.Need N-1 bar parallel segment and N bar inclined line segment owing to forming N number of step (N is more than or equal to 2), correspondingly, the quantitative range of many line segments that described broken line comprises is comparatively suitable between 3 to 15.
Perform step S109, optical proximity correction is carried out to pretreated domain.
Because the described actual mask pattern corresponding with it through pretreated layout patterns is more close, therefore this layout patterns is adopted to carry out optical proximity correction (Optical Proximity Correction, OPC), the actual mask pattern made can be predicted better, thus the formation of analog device structure better.Through the iterative process of OPC, finally form layout patterns, through actual mask fabrication and adopt this mask to carry out the making of device architecture, more preferably component graphics can be obtained.S109 is well known to those skilled in the art, and does not repeat them here.
Correspondingly, the present invention also provides a kind of domain corrective.Fig. 9 shows the block diagram of the domain corrective 300 of the embodiment of the present invention.Described domain corrective 300 comprises:
Detecting unit 301, for detecting the figure of original layout, and obtains in the part of step in the profile of described figure, and described step comprises the first line segment, the second line segment and three line segment all crossing with described first line segment, the second line segment that are parallel to each other;
Judging unit 303, for judging whether the 3rd line segment size of the described step obtained is less than threshold value;
Pretreatment unit 305, step for being less than threshold value to the 3rd line segment size carries out pre-service, described pre-service comprises: a part for described pending step replaced with and become obtuse angle to intersect the broken line of connection successively by many line segments, a part for described broken line and described first line segment intersects at the first intersection point, a part for described broken line and described second line segment meets at the second intersection point, the intersection point of many line segments of described broken line, the acute angle that 4th straight line of described first intersection point and described second intersection point matching and described first line segment are formed reduces along with the minimizing of described 3rd line segment size, and
Amending unit 307, for carrying out optical proximity correction to pretreated domain.
The concrete configuration of each unit of described domain corrective 300 with reference to above-described embodiment, can not repeated them here.
Although the present invention with preferred embodiment openly as above; but it is not for limiting the present invention; any those skilled in the art without departing from the spirit and scope of the present invention; can make possible variation and amendment, the scope that therefore protection scope of the present invention should define with the claims in the present invention is as the criterion.
Claims (14)
1. a domain modification method, is characterized in that, comprising:
Obtain original layout, described original layout comprises at least one figure;
Obtain in the part of step in the profile of described figure, described step comprises the first line segment, the second line segment and three line segment all crossing with described first line segment, the second line segment that are parallel to each other;
Obtain the 3rd line segment size and be less than the step of threshold value as pending step;
Pre-service is carried out to described pending step, described pre-service comprises: a part for described pending step replaced with and become obtuse angle to intersect the broken line of connection successively by many line segments, the part that the part of described broken line and described first line segment intersects at the first intersection point, described broken line and described second line segment meets at the second intersection point, and the acute angle that the 4th straight line of the intersection point of many articles of line segments of described broken line, described first intersection point and described second intersection point matching and described first line segment are formed reduces along with the minimizing of described 3rd line segment size; And
Optical proximity correction is carried out to pretreated domain.
2. domain modification method as claimed in claim 1, it is characterized in that, described many line segments comprise the N bar first group line segment parallel with described first line segment, and N+1 bar is parallel to each other and becomes second group of line segment of the crossing connection in obtuse angle successively with described first group of line segment, and wherein N is more than or equal to 1.
3. domain modification method as claimed in claim 1, it is characterized in that, the point being distributed in described 4th straight line one side in the intersection point of described many articles of line segments, described first intersection point and described second intersection point is equal with the some quantity being distributed in described 4th straight line another side, and equal with the distance of described 4th straight line.
4. domain modification method as claimed in claim 1, it is characterized in that, the intersection point of described 4th straight line and described many articles of line segments divides the part of described 4th straight line between first, second line segment described equally.
5. domain modification method as claimed in claim 1, it is characterized in that, the tangent value of the acute angle that described 4th straight line is formed to described first line segment is directly proportional to the size of described 3rd line segment.
6. domain modification method as claimed in claim 1, it is characterized in that, the quantitative range of described many line segments is 3 to 15.
7. domain modification method as claimed in claim 1, is characterized in that, described threshold value carries out the twice of the radius of corner graphically formed for the rectangular figures in the described original layout of employing.
8. a domain corrective, comprising:
Detecting unit, for detecting the figure of original layout, and obtains in the part of step in the profile of described figure, and described step comprises the first line segment, the second line segment and three line segment all crossing with described first line segment, the second line segment that are parallel to each other;
Judging unit, for judging whether the 3rd line segment size of the described step obtained is less than threshold value;
Pretreatment unit, step for being less than threshold value to the 3rd line segment size carries out pre-service, described pre-service comprises: a part for described pending step replaced with and become obtuse angle to intersect the broken line of connection successively by many line segments, a part for described broken line and described first line segment intersects at the first intersection point, a part for described broken line and described second line segment meets at the second intersection point, the intersection point of many line segments of described broken line, the acute angle that 4th straight line of described first intersection point and described second intersection point matching and described first line segment are formed reduces along with the minimizing of described 3rd line segment size, and
Amending unit, for carrying out optical proximity correction to pretreated domain.
9. domain corrective as claimed in claim 8, it is characterized in that, described many line segments comprise the N bar first group line segment parallel with described first line segment, and N+1 bar is parallel to each other and becomes second group of line segment of the crossing connection in obtuse angle successively with described first group of line segment, and wherein N is more than or equal to 1.
10. domain corrective as claimed in claim 8, it is characterized in that, the point being distributed in described 4th straight line one side in the intersection point of described many articles of line segments, described first intersection point and described second intersection point is equal with the some quantity being distributed in described 4th straight line another side, and equal with the distance of described 4th straight line.
11. domain correctives as claimed in claim 8, is characterized in that, the intersection point of described 4th straight line and described many articles of line segments divides the part of described 4th straight line between first, second line segment described equally.
12. domain correctives as claimed in claim 8, is characterized in that, the tangent value of the acute angle that described 4th straight line is formed to described first line segment is directly proportional to the size of described 3rd line segment.
13. domain correctives as claimed in claim 8, it is characterized in that, the quantitative range of described many line segments is 3 to 15.
14. domain correctives as claimed in claim 8, is characterized in that, described threshold value carries out the twice of the radius of corner graphically formed for the rectangular figures in the described original layout of employing.
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| CN106304667A (en) * | 2016-09-20 | 2017-01-04 | 凌云光技术集团有限责任公司 | A kind of profile engraving method and device |
| WO2020140718A1 (en) * | 2019-01-03 | 2020-07-09 | 无锡华润上华科技有限公司 | Mask manufacturing method and mask |
| CN113064322A (en) * | 2021-03-26 | 2021-07-02 | 福建省晋华集成电路有限公司 | Mask pattern correction method, storage medium and equipment |
| CN113759670A (en) * | 2021-08-20 | 2021-12-07 | 上海华虹宏力半导体制造有限公司 | Method for correcting non-smooth OPC graph |
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