CN104630825A - Device and process for electrolytically extracting copper in acidic etching liquid - Google Patents

Device and process for electrolytically extracting copper in acidic etching liquid Download PDF

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Publication number
CN104630825A
CN104630825A CN201510028257.2A CN201510028257A CN104630825A CN 104630825 A CN104630825 A CN 104630825A CN 201510028257 A CN201510028257 A CN 201510028257A CN 104630825 A CN104630825 A CN 104630825A
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CN
China
Prior art keywords
etching
copper
liquid
cylinder
electrolysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510028257.2A
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Chinese (zh)
Inventor
周爱成
邰康乾
赵奕栋
樊新林
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KUNSHAN MEIYUANDA ENVIRONMENTAL PROTECTION TECHNOLOGY Co Ltd
Original Assignee
KUNSHAN MEIYUANDA ENVIRONMENTAL PROTECTION TECHNOLOGY Co Ltd
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Publication date
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Priority to CN201510028257.2A priority Critical patent/CN104630825A/en
Publication of CN104630825A publication Critical patent/CN104630825A/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25CPROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/12Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/46Regeneration of etching compositions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25CPROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

Abstract

The invention provides a device and a process for electrolytically extracting copper in an acidic etching liquid. The device comprises an etching tank, a waste liquid barrel, a copper extraction unit, a dissolving absorption jar and a water absorption jar, wherein the etching tank is connected with the waste liquid barrel which is connected with the copper extraction unit; the copper extraction unit comprises an etching liquid chamber, a regenerated liquid chamber and an electrolytic reaction chamber; the electrolytic reaction chamber is divided into a cathode area and an anode area at an interval by use of a composite high-molecular ionic membrane; the anode area is connected with the dissolving absorption jar by use of an exhaust pipeline, while the cathode area is connected with the water absorption jar by use of an exhaust pipeline; the dissolving absorption jar is in circular connection with the etching tank. The device is reasonable in structure, and the process is complete; the problems of high energy consumption and low reuse rate of electrolytic copper extraction from the acidic etching liquids in the prior art are solved; the quality of the cathode copper is improved, and meanwhile, material waste is reduced and the reuse rate is increased.

Description

Copper device and technique thereof are put forward in a kind of acidic etching liquid electrolysis
Technical field
The present invention relates to acidic etching liquid and reclaim field, especially relate to a kind of acidic etching liquid electrolysis and put forward copper device and technique thereof.
Background technology
In recent years, electric appliance and electronic industry fast development, printed circuit board (PCB) is as the important component part of electric appliance and electronic product, and output also increases day by day, but consequent pollution problem is also more and more outstanding.In the acidic etching liquid of printed-wiring board (PWB), waste liquid copper content reaches more than 100g/L, as do not recycled very well, will cause a large amount of loss of copper resource and the severe contamination to environment.Although occurred that the related process of copper is carried in etching solution electrolysis at present, there is following problem: 1, to put forward the efficiency of copper low in electrolysis, and energy consumption is large; 2, just copper is carried in simple electrolysis of carrying out, and cannot carry out recycle to etching solution; 3, the waste gas produced still pollutes the environment.
Summary of the invention
For solving the problems of the technologies described above, the present invention proposes a kind of acidic etching liquid electrolysis and carry copper device, comprise etching bath, waste liquid barrel, carry copper unit, solution absorption cylinder, water absorb cylinder; Described etching bath is connected with described waste liquid barrel, and described waste liquid barrel is connected with described copper unit of carrying; Described copper unit of carrying comprises etching sap cavity, regeneration sap cavity, electrolytic reaction room, described electrolytic reaction room is divided into spaced cathodic area and positive column by composite high-molecular ionic membrane, in described cathodic area, negative plate is installed, in described positive column, positive plate is installed; Described positive column is connected with described etching sap cavity, and described cathodic area is connected with regeneration sap cavity; Described positive column is connected with described solution absorption cylinder by gas exhaust duct, and described cathodic area absorbs cylinder by gas exhaust duct and described water and is connected; Described solution absorption cylinder circulates with etching bath and is connected.
As a preferred embodiment of the present invention, also comprise exhaust gas treating tower, described exhaust gas treating tower and described water absorb cylinder and are connected.
As a preferred embodiment of the present invention, also comprise turning barrel in regenerated liquid, in described regenerated liquid, the fluid inlet of turning barrel is connected with described regeneration sap cavity, and in described regenerated liquid, the liquid outlet of turning barrel is connected with described etching bath.
As a preferred embodiment of the present invention, described solution absorption cylinder and described water absorb in cylinder and are provided with agitator.
As a preferred embodiment of the present invention, in described solution absorption cylinder, be placed with hydrochloric acid, oxygenant and etching solution.
A kind of acidic etching liquid electrolysis copper-extracting process, comprises the following steps:
1) waste liquid produced in etching bath is passed into electrolytic reaction room and carry out electrolysis;
2) electrolytic reaction room is divided into positive column and cathodic area by composite high-molecular ionic membrane, and in step 1, waste liquid is in electrolytic reaction room after electrolysis, and cathodic area is reclaimed and obtained copper, and positive column produces chlorine and hydrogen chloride gas;
3) gas that step 2 middle-jiao yang, function of the spleen and stomach polar region produces passes in the etching solution containing hydrochloric acid and oxygenant, for again etching use; The waste gas that negative electrode produces passes through water coolant, and by emission-control equipment process.
Copper device is carried in the acidic etching liquid electrolysis that the present invention proposes and technique has following beneficial effect: the present invention is device and the technique that copper is carried in circulation, capable of circulationly repeatedly copper is carried to etching solution and recycle is carried out to etching solution, repeatedly to put forward copper efficiency high in electrolysis, simultaneously high to the cyclic utilization rate of etching solution, and the present invention produces secondary pollution in recycling process, energy-conserving and environment-protective.The present invention is rational in infrastructure, perfect technology, solves the electrolysis of prior art acidic etching liquid and puies forward the high energy consumption of copper existence, the problem of low reclamation rate, not only improve cathode copper quality, reduce material waste simultaneously, improve reclamation rate.
Accompanying drawing explanation
In order to be illustrated more clearly in the technical scheme in the embodiment of the present invention, below the accompanying drawing used required in describing embodiment is briefly described.
Fig. 1 is the structural representation that copper device is carried in acidic etching liquid electrolysis of the present invention;
Fig. 2 is schematic flow sheet of the present invention;
Wherein, 1-etching bath, 2-solution absorption cylinder, 3-water absorbs cylinder, and 4-electrolytic reaction room, 5-regenerates sap cavity, and 6-etches sap cavity, 7-exhaust gas treating tower, 8-waste liquid barrel, 9-hydrochloric acid tank 9,10-etching solution storage tank, 11-regenerated liquid storage tank.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described.
In conjunction with Fig. 1-2, the present invention proposes a kind of acidic etching liquid electrolysis and carry copper device, comprise etching bath 1, waste liquid barrel 8, carry copper unit, solution absorption cylinder 2, water absorb cylinder 3; Described etching bath 1 is connected with described waste liquid barrel 8, and described waste liquid barrel 8 is connected with described copper unit of carrying; Described copper unit of carrying comprises etching sap cavity 6, regeneration sap cavity 5, electrolytic reaction room 4, described electrolytic reaction room 4 is divided into spaced cathodic area and positive column by composite high-molecular ionic membrane, in described cathodic area, negative plate is installed, in described positive column, positive plate is installed; Described positive column is connected with described etching sap cavity 6, and described cathodic area is connected with regeneration sap cavity 5; Described positive column is connected with described solution absorption cylinder 2 by gas exhaust duct, described cathodic area absorbs cylinder 3 by gas exhaust duct and described water and is connected, an exhaust gas treating tower 7 is preferably set simultaneously, absorbs cylinder 3 with described water and be connected, further the waste gas produced is processed; Described solution absorption cylinder 2 circulates with etching bath 1 and is connected.Simultaneously, be placed with hydrochloric acid, oxygenant and etching solution in described solution absorption cylinder 2, the gas that antianode district produces carries out oxidation and utilizes, and described solution absorption cylinder is connected with hydrochloric acid tank 9, regenerated liquid storage tank 11 and etching solution storage tank 10 respectively, as required, hydrochloric acid can be regulated.The ratio of oxygenant and etching solution.
In order to better again be utilized by etching solution, the present invention can also comprise turning barrel in regenerated liquid, and in described regenerated liquid, the fluid inlet of turning barrel is connected with described regeneration sap cavity 5, and in described regenerated liquid, the liquid outlet of turning barrel is connected with described etching bath 1.
In order to improve reaction efficiency of the present invention, described solution absorption cylinder 2 and described water absorb in cylinder 3 and are provided with agitator.
The present invention discloses a kind of acidic etching liquid electrolysis copper-extracting process, comprises the following steps:
1) waste liquid produced in etching bath 1 is passed into electrolytic reaction room 4 and carry out electrolysis;
2) electrolytic reaction room 4 is divided into positive column and cathodic area by composite high-molecular ionic membrane, and in step 1, waste liquid is in electrolytic reaction room 4 after electrolysis, and cathodic area is reclaimed and obtained copper, and positive column produces chlorine and hydrogen chloride gas;
3) gas that step 2 middle-jiao yang, function of the spleen and stomach polar region produces passes in the etching solution containing hydrochloric acid and oxygenant, for again etching use; The waste gas that negative electrode produces by water coolant, and is processed by emission-control equipment (exhaust gas treating tower).
Acidic etching liquid electrolysis copper-extracting process disclosed in this invention, capable of circulationly utilizes etching solution and carries copper, is cyclic electrolysis copper-extracting process, and not single once puies forward copper process, and put forward copper efficiency high, etching solution cycling and reutilization efficiency is high.
To be apparent for those skilled in the art to the multiple amendment of embodiment, General Principle as defined herein can without departing from the spirit or scope of the present invention, realize in other embodiments.Therefore, the present invention can not be restricted to these embodiments shown in this article, but will meet the widest scope consistent with principle disclosed herein and features of novelty.

Claims (6)

1. a copper device is carried in acidic etching liquid electrolysis, it is characterized in that, comprise etching bath, waste liquid barrel, carry copper unit, solution absorption cylinder, water absorb cylinder; Described etching bath is connected with described waste liquid barrel, and described waste liquid barrel is connected with described copper unit of carrying; Described copper unit of carrying comprises etching sap cavity, regeneration sap cavity, electrolytic reaction room, described electrolytic reaction room is divided into spaced cathodic area and positive column by composite high-molecular ionic membrane, in described cathodic area, negative plate is installed, in described positive column, positive plate is installed; Described positive column is connected with described etching sap cavity, and described cathodic area is connected with regeneration sap cavity; Described positive column is connected with described solution absorption cylinder by gas exhaust duct, and described cathodic area absorbs cylinder by gas exhaust duct and described water and is connected; Described solution absorption cylinder circulates with etching bath and is connected.
2. copper device is carried in acidic etching liquid electrolysis according to claim 1, it is characterized in that, also comprises exhaust gas treating tower, and described exhaust gas treating tower and described water absorb cylinder and is connected.
3. copper device is carried in acidic etching liquid electrolysis according to claim 1, it is characterized in that, also comprises turning barrel in regenerated liquid, and in described regenerated liquid, the fluid inlet of turning barrel is connected with described regeneration sap cavity, and in described regenerated liquid, the liquid outlet of turning barrel is connected with described etching bath.
4. copper device is carried in acidic etching liquid electrolysis according to claim 1, it is characterized in that, described solution absorption cylinder and described water absorb in cylinder and is provided with agitator.
5. copper device is carried in acidic etching liquid electrolysis according to claim 1, it is characterized in that, is placed with hydrochloric acid, oxygenant and etching solution in described solution absorption cylinder.
6. an acidic etching liquid electrolysis copper-extracting process, is characterized in that, comprises the following steps:
1) waste liquid produced in etching bath is passed into electrolytic reaction room and carry out electrolysis;
2) electrolytic reaction room is divided into positive column and cathodic area by composite high-molecular ionic membrane, and in step 1, waste liquid is in electrolytic reaction room after electrolysis, and cathodic area is reclaimed and obtained copper, and positive column produces chlorine and hydrogen chloride gas;
3) gas that step 2 middle-jiao yang, function of the spleen and stomach polar region produces passes in the etching solution containing hydrochloric acid and oxygenant, for again etching use; The waste gas that negative electrode produces passes through water coolant, and by emission-control equipment process.
CN201510028257.2A 2015-01-20 2015-01-20 Device and process for electrolytically extracting copper in acidic etching liquid Pending CN104630825A (en)

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CN104911596A (en) * 2015-06-01 2015-09-16 深圳中能润德环保有限公司 Device and method for cyclic regeneration and copper extraction of etching liquid
CN104947111A (en) * 2015-07-02 2015-09-30 深圳市洁驰科技有限公司 Oxidation device of cuprous ions in acid etching liquid for printed circuit board
CN105002501A (en) * 2015-09-09 2015-10-28 成都虹华环保科技股份有限公司 Acidic waste etching solution cyclic regeneration system capable of saving resources
CN105177581A (en) * 2015-09-09 2015-12-23 成都虹华环保科技股份有限公司 System for circulating and regenerating waste acidic etching solutions with tail gas treatment function
CN105177582A (en) * 2015-09-09 2015-12-23 成都虹华环保科技股份有限公司 System for circulating and regenerating waste acidic etching solutions by re-circulating regeneration solutions
CN105177583A (en) * 2015-09-09 2015-12-23 成都虹华环保科技股份有限公司 Method and system for circulating and regenerating zero-emission waste acidic etching solutions
CN106011950A (en) * 2016-07-29 2016-10-12 陈铭 Waste liquid copper extraction system
WO2017041471A1 (en) * 2015-09-09 2017-03-16 成都虹华环保科技股份有限公司 Resource-saving acidic etching waste solution reuse and recovery system
WO2017041470A1 (en) * 2015-09-09 2017-03-16 成都虹华环保科技股份有限公司 Acidic etching waste solution reuse and recovery system having tail-gas treatment function
WO2017041472A1 (en) * 2015-09-09 2017-03-16 成都虹华环保科技股份有限公司 Zero-emission acidic etching waste solution reuse and recovery method and system
CN110042425A (en) * 2019-04-23 2019-07-23 博罗县华盈科技有限公司 A kind of heavy process for copper of alkaline etching waste liquid for producing direct electrowinning
CN111394727A (en) * 2019-09-10 2020-07-10 长沙利洁环保科技有限公司 Acid etching solution cyclic regeneration system

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* Cited by examiner, † Cited by third party
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CN104911596A (en) * 2015-06-01 2015-09-16 深圳中能润德环保有限公司 Device and method for cyclic regeneration and copper extraction of etching liquid
CN104947111A (en) * 2015-07-02 2015-09-30 深圳市洁驰科技有限公司 Oxidation device of cuprous ions in acid etching liquid for printed circuit board
CN105002501A (en) * 2015-09-09 2015-10-28 成都虹华环保科技股份有限公司 Acidic waste etching solution cyclic regeneration system capable of saving resources
CN105177581A (en) * 2015-09-09 2015-12-23 成都虹华环保科技股份有限公司 System for circulating and regenerating waste acidic etching solutions with tail gas treatment function
CN105177582A (en) * 2015-09-09 2015-12-23 成都虹华环保科技股份有限公司 System for circulating and regenerating waste acidic etching solutions by re-circulating regeneration solutions
CN105177583A (en) * 2015-09-09 2015-12-23 成都虹华环保科技股份有限公司 Method and system for circulating and regenerating zero-emission waste acidic etching solutions
WO2017041471A1 (en) * 2015-09-09 2017-03-16 成都虹华环保科技股份有限公司 Resource-saving acidic etching waste solution reuse and recovery system
WO2017041470A1 (en) * 2015-09-09 2017-03-16 成都虹华环保科技股份有限公司 Acidic etching waste solution reuse and recovery system having tail-gas treatment function
WO2017041472A1 (en) * 2015-09-09 2017-03-16 成都虹华环保科技股份有限公司 Zero-emission acidic etching waste solution reuse and recovery method and system
CN106011950A (en) * 2016-07-29 2016-10-12 陈铭 Waste liquid copper extraction system
CN110042425A (en) * 2019-04-23 2019-07-23 博罗县华盈科技有限公司 A kind of heavy process for copper of alkaline etching waste liquid for producing direct electrowinning
CN111394727A (en) * 2019-09-10 2020-07-10 长沙利洁环保科技有限公司 Acid etching solution cyclic regeneration system

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