CN104630512B - Dispersion type copper-bismuth-tin immiscible alloy composite wire rod and preparation method thereof - Google Patents

Dispersion type copper-bismuth-tin immiscible alloy composite wire rod and preparation method thereof Download PDF

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CN104630512B
CN104630512B CN201310553970.XA CN201310553970A CN104630512B CN 104630512 B CN104630512 B CN 104630512B CN 201310553970 A CN201310553970 A CN 201310553970A CN 104630512 B CN104630512 B CN 104630512B
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alloy
composite wire
pulse current
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CN104630512A (en
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江鸿翔
赵九洲
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Institute of Metal Research of CAS
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Abstract

The present invention discloses a dispersion type copper-bismuth-tin immiscible alloy composite wire rod and a preparation method thereof, and belongs to the technical field of alloy composite materials and preparation thereof. The dispersion type copper-bismuth-tin immiscible alloy composite wire rod is characterized in that a Cu-Bi-Sn immiscible alloy is adopted as a raw material, and a continuous solidification technology under a pulse current effect is adopted to prepare the copper-bismuth-tin immiscible alloy composite wire rod with the dispersed phase uniformly distributed in the matrix, wherein the solidification rate is 8-20 mm/s. According to the present invention, the continuous solidification technology under the pulse current effect is adopted, the nucleation rate of the rich (Cu, Sn) phase (hereinafter referred as: dispersed phase) during the liquid-liquid phase change process of the (10-15)wt% Cu-(75-80)wt% Bi-10wt% Sn alloy is increased, the phase segregation is inhibited, and the dispersion type Cu-Bi-Sn alloy composite material is prepared.

Description

A kind of diffusion-type copper bismuth stannum immiscible alloy composite wire and preparation method thereof
Technical field
The invention belongs to alloy wire preparing technical field is and in particular to a kind of diffusion-type Cu-Bi-Sn immiscible alloy is multiple Zygonema material and preparation method thereof.
Background technology
Cu-Bi-Sn immiscible alloy composite wire has a wide range of applications in fields such as welding, catalysis and machineries. It is very necessary for therefore developing a kind of diffusion-type copper bismuth tin alloy composite wire and its technology of preparing, has great market price Value.But there is liquid-liquid decomposition process during the cooling of such alloy melt, easily form gravity segregation when solidifying in gravitational field tight The tissue of weight, its preparation and application is restricted.
Content of the invention
It is an object of the invention to provide a kind of diffusion-type copper bismuth stannum immiscible alloy composite wire and preparation method thereof, carry Go out by suitably choosing alloying component and crystallizer inner lining material, carry out continuous solidification under pulse current effect, make alloy During liquid-liquid decomposition, the nucleation rate of disperse phase drop increases, and weakens and eliminate the phase segregation phenomenon in process of setting, obtains more Dephasing is uniformly distributed in the copper bismuth stannum immiscible alloy composite wire of matrix.
The technical scheme is that:
A kind of preparation method of diffusion-type copper bismuth stannum immiscible alloy composite wire, the method is miscible with Cu-Bi-Sn difficulty Alloy is raw material, prepares disperse phase using the continuous solidification technology under pulse current effect and is uniformly distributed in the copper bismuth in matrix Stannum immiscible alloy composite wire;Wherein:Setting rate is 8-20mm/s.
Continuous solidification technology under the described effect using pulse current refers to:In preparation process, alloy melt is applied along knot The pulse current of brilliant device axial direction, the inner lining material of adopted continuous solidification its crystallizer of device is corundum simultaneously, crystallizer Internal diameter 5-15mm.The peak current density of described pulse current is(1~3)×104A/cm2, pulse width is 4~6 μ s, pulse Frequency is 20~50Hz.
In the chemical composition of described Cu-Bi-Sn alloy raw material:Cu (10-15) wt%, Sn10wt%, Bi are surplus.
The preparation method of diffusion-type Cu-Bi-Sn alloy composite wire of the present invention specifically includes following steps:
1)Described Cu-Bi-Sn immiscible alloy raw material is heated fusing, forms uniform alloy melt;
2)Under pulse current effect, continuous solidification is carried out to alloy melt, obtain diffusion-type Cu-Bi-Sn alloy recombination line Material.
In the diffusion-type Cu-Bi-Sn alloy composite wire being obtained using said method, rich(Cu, Sn)Phase particle dispersion It is distributed in rich Bi alloy substrate.
The principle of the present invention is as follows:
During the lower solidification of pulse current effect, rich during Cu-Bi-Sn immiscible alloy liquid-liquid decomposition(Cu, Sn)Phase drop Nucleation rate increases, mean radiuss reduce, and drop is equal along the Stokes movement velocity of crystallizer axial direction and Marangoni movement velocity Reduce, promote the acquisition of diffusion-type Cu-Bi-Sn immiscible alloy composite wire.
Brief description
Fig. 1 is the continuous solidification device with impulse current generator.
In figure:1- wire;2- graphite electrode;3- crucible;4- resistive heater;5- alloy melt;6- pulse generating units; 7- crystallizer;8- water cooler;9- alloy bar;10- conduction slide plate;11- lifting rod.
Fig. 2 is not apply during pulse current 15wt%Cu-75wt%Bi-10wt%Sn alloy with 10mm/s speed continuous solidification Tissue afterwards.
Fig. 3 be apply pulse current when 15wt%Cu-75wt%Bi-10wt%Sn alloy with 10mm/s speed continuous solidification after Tissue(Peak current density is:30000A/cm2, pulse frequency is 50Hz, and pulse width is 6 μ s).
Fig. 4 is not apply after during pulse current, 10wt%Cu-80wt%Bi-10wt%Sn alloy is with 8mm/s speed continuous solidification Tissue.
Fig. 5 be apply pulse current when 10wt%Cu-80wt%Bi-10wt%Sn alloy with 8mm/s speed continuous solidification after Tissue(Peak current density is:20000A/cm2, pulse frequency is 50Hz, and pulse width is 6 μ s).
Fig. 6 is not apply during pulse current 10wt%Cu-80wt%Bi-10wt%Sn alloy with 10mm/s speed continuous solidification The tissue of sample afterwards.
Fig. 7 be apply pulse current when 10wt%Cu-80wt%Bi-10wt%Sn alloy with 10mm/s speed continuous solidification after Tissue(Peak current density is:10000A/cm2, pulse frequency is 50Hz, and pulse width is 6 μ s).
Fig. 8 be apply pulse current when 10wt%Cu-80wt%Bi-10wt%Sn alloy with 10mm/s speed continuous solidification after The tissue of sample(Peak current density is:30000A/cm2, pulse frequency is 50Hz, and pulse width is 4 μ s).
Fig. 9 be apply pulse current when 10wt%Cu-80wt%Bi-10wt%Sn alloy with 10mm/s speed continuous solidification after The tissue of sample(Peak current density is:30000A/cm2, pulse frequency is 50Hz, and pulse width is 6 μ s).
Figure 10 for peak current density is:30000A/cm2, pulse width is 6 μ s, when pulse frequency is 20Hz, 10wt% Cu-80wt%Bi-10wt%Sn alloy is with the tissue of sample after 10mm/s speed continuous solidification.
Specific embodiment
Research shows, under the conditions of continuous solidification, Cu-Bi-Sn immiscible alloy is rich during liquid-liquid decomposition(Cu, Sn)Drop nucleation rate is relatively low, typically results in that disperse phase drop is thick, the formation of skewness or even two phase stratification tissue, such as Shown in Fig. 2, Fig. 4 and Fig. 6.
When melt is passed to the pulse current along crystallizer axial direction, disperse phase drop nucleation rate increases, and can be formed Diffusion-type composite wire.Accordingly, the present invention passes through from Cu-Bi-Sn immiscible alloy, using continuous under pulse current effect Solidification technology, is prepared for diffusion-type composite wire, as shown in Fig. 3, Fig. 5, Fig. 7, Fig. 8 and Fig. 9.
Coagulation system used in following examples is as shown in figure 1, this device is on the basis of conventional continuous solidification device Increase pulse generating units 6 so as to pulse current can be applied to alloy melt 5, the liner of crystallizer 7 adopts corundum simultaneously Material, crystallizer 7 internal diameter 5-15mm.Concrete structure is:This coagulation system includes crucible 3 for fusing metal, is used for solidifying The crystallizer 7 of alloy melt 5 and pulse generating units 6;Wherein:By resistive heater 4, described crucible 3 is heated, pass through Water cooler 8 cools down to described crystallizer 7, so that alloy melt 5 solidifies, water cooler 8 lower section setting traction alloy bar(Wire rod)9 Lifting rod 11.Described pulse generating units 6 one outfan connects one end of graphite electrode 2, described graphite by wire 1 The other end of electrode 2 stretches in the alloy melt 5 in crucible 3.Its another outfan of described pulse generating units 6 passes through conduction Slide plate 10 is connected with alloy bar 9, thus realizing applying pulse current to alloy melt 5.
Embodiment 1
From 15wt%Cu-75wt%Bi-10wt%Sn alloy, using the continuous solidification device under pulse current effect, with firm The beautiful inner lining material for crystallizer, setting rate is 10mm/s, is 30000A/cm2 by the peak current density of melt, pulse Frequency is 50Hz, and pulse width is 6 μ s.Prepare diffusion-type Cu-Bi-Sn alloy composite wire, its a diameter of 8mm.
Its preparation process is as follows:
With resistance furnace melting Cu-Bi-Sn alloy, obtain homogeneous melt by being incubated in 1173K, stirring after 40 minutes;Make Melt is in pulse current(Peak current density is 30000A/cm2, and pulse frequency is 50Hz, and pulse width is 6 μ s)Connect under effect Continuous solidification.
As shown in figure 3, in figure white phase is rich Bi matrix, black phase is richness to the present embodiment gained alloy composite wire(Cu, Sn)Phase.In process of setting, pulse current promotes disperse phase drop nucleation rate to increase, and in solidified structure, disperse phase size is tiny and equal Even distribution.
Comparative example 1
Difference from Example 1 is:Pulse current is not applied to alloy melt.Gained Cu-Bi-Sn alloy recombination line Material tissue is as shown in Figure 2.In Fig. 2, white phase is rich Bi matrix, and black phase is richness(Cu, Sn)Phase, disperse phase liquid in process of setting Drip nucleation rate relatively low, in solidified structure disperse phase size is thick and uneven distribution.
Experiment shows, in embodiment 1 solidification sample, disperse phase particle size is thin during pulse current compared with not applying in comparative example 1 Little, and uniform particle is distributed in matrix.
Embodiment 2
From 10wt%Cu-80wt%Bi-10wt%Sn alloy, using the continuous solidification device under pulse current effect, with firm The beautiful inner lining material for crystallizer, setting rate is 8mm/s, is 20000A/cm2 by the peak current density of melt, pulse Frequency is 50Hz, and pulse width is 6 μ s.Prepare diffusion-type Cu-Bi-Sn alloy composite wire, its a diameter of 8mm.
Its preparation process is as follows:
With resistance furnace melting Cu-Bi-Sn alloy, obtain homogeneous melt by being incubated in 1173K, stirring after 40 minutes;Make Melt is in pulse current(Peak current density is 20000A/cm2, and pulse frequency is 50Hz, and pulse width is 6 μ s)Connect under effect Continuous solidification.
As shown in figure 5, in figure white phase is rich Bi matrix, black phase is richness to the present embodiment gained alloy composite wire(Cu, Sn)Phase.In process of setting, pulse current promotes disperse phase drop nucleation rate to increase, and alloy assumes diffusion-type solidified structure.
Comparative example 2
Difference from Example 2 is:Pulse current is not applied to alloy melt.Gained Cu-Bi-Sn alloy recombination line Material is organized as shown in figure 4, white phase is rich Bi matrix in Fig. 4, and black phase is richness(Cu, Sn)Phase, alloy assumes two-phase laminated flow and coagulates Gu tissue.
Experiment shows, in embodiment 2 solidification sample, disperse phase particle size is thin during pulse current compared with not applying in comparative example 2 Little, and uniform particle is distributed in matrix.
Embodiment 3
From 10wt%Cu-80wt%Bi-10wt%Sn alloy, using the continuous solidification device under pulse current effect, with firm The beautiful inner lining material for crystallizer, setting rate is 10mm/s, is 10000A/cm2 by the peak current density of melt, pulse Frequency is 50Hz, and pulse width is 6 μ s.Prepare diffusion-type Cu-Bi-Sn alloy composite wire, its a diameter of 8mm.
Its preparation process is as follows:
With resistance furnace melting Cu-Bi-Sn alloy, obtain homogeneous melt by being incubated in 1173K, stirring after 40 minutes;Make Melt is in pulse current(Peak current density is 10000A/cm2, and pulse frequency is 50Hz, and pulse width is 6 μ s)Connect under effect Continuous solidification.
As shown in fig. 7, in figure white phase is rich Bi matrix, black phase is richness to the present embodiment gained alloy composite wire(Cu, Sn)Phase.In process of setting, pulse current promotes disperse phase drop nucleation rate to increase, disperse phase particle size in Solidification Structure Tiny and be uniformly distributed in matrix.
Comparative example 3
Difference from Example 3 is:Pulse current is not applied to alloy melt.Gained Cu-Bi-Sn alloy recombination line Material is organized as shown in fig. 6, white phase is rich Bi matrix in Fig. 6, and black phase is richness(Cu, Sn)Phase.Disperse phase liquid in process of setting Drip nucleation rate relatively low, in Solidification Structure disperse phase size is more thick and skewness in the base.
Experiment shows, in embodiment 3 solidification sample, disperse phase particle size is thin during pulse current compared with not applying in comparative example 3 Little, and uniform particle is distributed in matrix.
Embodiment 4
From 10wt%Cu-80wt%Bi-10wt%Sn alloy, using the continuous solidification device under pulse current effect, with firm The beautiful inner lining material for crystallizer, setting rate is 10mm/s, is 30000A/cm2 by the peak current density of melt, pulse Frequency is 50Hz, and pulse width is 4 μ s.Prepare diffusion-type Cu-Bi-Sn alloy composite wire, its a diameter of 8mm.
Its preparation process is as follows:
With resistance furnace melting Cu-Bi-Sn alloy, obtain homogeneous melt by being incubated in 1173K, stirring after 40 minutes;Make Melt is in pulse current(Peak current density is 30000A/cm2, and pulse frequency is 50Hz, and pulse width is 4 μ s)Connect under effect Continuous solidification.
As shown in figure 8, in figure white phase is rich Bi matrix, black phase is richness to the present embodiment gained alloy composite wire(Cu, Sn)Phase.In process of setting, pulse current leads to disperse phase drop nucleation rate to increase, disperse phase particle size in Solidification Structure Tiny and be uniformly distributed with matrix in.
Experiment shows, in sample disperse phase particle size do not apply (Fig. 6) during pulse current tiny, uniform particle be distributed In matrix.
Embodiment 5
From 10wt%Cu-80wt%Bi-10wt%Sn alloy, using the continuous solidification device under pulse current effect, with firm The beautiful inner lining material for crystallizer, setting rate is 10mm/s, is 30000A/cm2 by the peak current density of melt, pulse Frequency is 50Hz, and pulse width is 6 μ s.Prepare diffusion-type Cu-Bi-Sn alloy composite wire, its a diameter of 8mm.
Its preparation process is as follows:
With resistance furnace melting Cu-Bi-Sn alloy, obtain homogeneous melt by being incubated in 1173K, stirring after 40 minutes;Make Melt is in pulse current(Peak current density is 30000A/cm2, and pulse frequency is 50Hz, and pulse width is 6 μ s)Connect under effect Continuous solidification.
As shown in figure 9, in figure white phase is rich Bi matrix, black phase is richness to the present embodiment gained alloy composite wire(Cu, Sn)Phase.In process of setting, pulse current leads to disperse phase drop nucleation rate to increase, disperse phase particle size in Solidification Structure Tiny and be uniformly distributed with matrix in.
Experiment shows, in sample disperse phase particle size do not apply (Fig. 6) during pulse current more tiny, uniform particle It is distributed in matrix.
Embodiment 6
From 10wt%Cu-80wt%Bi-10wt%Sn alloy, using the continuous solidification device under pulse current effect, with firm The beautiful inner lining material for crystallizer, setting rate is 10mm/s, is 30000A/cm2 by the peak current density of melt, pulse Frequency is 20Hz, and pulse width is 6 μ s.Prepare diffusion-type Cu-Bi-Sn alloy composite wire, its a diameter of 8mm.
Its preparation process is as follows:
With resistance furnace melting Cu-Bi-Sn alloy, obtain homogeneous melt by being incubated in 1173K, stirring after 40 minutes;Make Melt is in pulse current(Peak current density is 30000A/cm2, and pulse frequency is 20Hz, and pulse width is 6 μ s)Connect under effect Continuous solidification.
As shown in Figure 10, in figure white phase is rich Bi matrix to the present embodiment gained alloy composite wire, and black phase is richness (Cu, Sn)Phase.In process of setting, pulse current leads to disperse phase drop nucleation rate to increase, disperse phase particle in Solidification Structure Size tiny and be uniformly distributed with matrix in.
Experiment shows, in sample disperse phase particle size do not apply (Fig. 6) during pulse current tiny, uniform particle be distributed In matrix.

Claims (3)

1. a kind of preparation method of diffusion-type copper bismuth stannum immiscible alloy composite wire it is characterised in that:The method is with Cu- Bi-Sn immiscible alloy is raw material, prepares disperse phase using the continuous solidification technology under pulse current effect and is uniformly distributed in Copper bismuth stannum immiscible alloy composite wire in matrix;Wherein:Setting rate is 8-20mm/s;Weight percentage, institute State in the chemical composition of Cu-Bi-Sn immiscible alloy raw material:Cu is 10-15%, and Sn is 10%, Bi is surplus;
Continuous solidification technology under the described effect using pulse current refers in preparation process, alloy melt be applied along crystallizer The pulse current of axial direction, the inner lining material of adopted continuous solidification its crystallizer of device is corundum simultaneously, crystallizer internal diameter 5-15mm;
The peak current density of described pulse current is (1~3) × 104A/cm2, pulse width is 4~6 μ s, and pulse frequency is 20 ~50Hz.
2. diffusion-type copper bismuth stannum immiscible alloy composite wire according to claim 1 preparation method it is characterised in that: The preparation method of described composite wire specifically includes following steps:
1) described Cu-Bi-Sn immiscible alloy raw material is heated fusing, form uniform alloy melt;
2) under pulse current effect, continuous solidification is carried out to alloy melt, obtain diffusion-type Cu-Bi-Sn alloy composite wire.
3. a kind of diffusion-type copper bismuth stannum immiscible alloy composite wire of utilization claim 1 methods described preparation, its feature exists In:In described composite wire, rich (Cu, Sn) phase particle dispersion is distributed in rich Bi alloy substrate.
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