CN104611681A - Magnetron-sputtering winding coating machine capable of rapidly changing target and continuously and efficiently coating film in single-surface reciprocating manner - Google Patents
Magnetron-sputtering winding coating machine capable of rapidly changing target and continuously and efficiently coating film in single-surface reciprocating manner Download PDFInfo
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- CN104611681A CN104611681A CN201510066781.9A CN201510066781A CN104611681A CN 104611681 A CN104611681 A CN 104611681A CN 201510066781 A CN201510066781 A CN 201510066781A CN 104611681 A CN104611681 A CN 104611681A
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Abstract
The invention discloses a magnetron-sputtering winding coating machine capable of rapidly changing target and continuously and efficiently coating a film in a single-surface reciprocating manner, belonging to the field of coating equipment. The magnetron-sputtering winding coating machine comprises a vacuum chamber, an uncoiling mechanism, a coiling mechanism, a cold roll, deviation correcting devices, two or more rotary target changing devices and negative electrode cells, wherein the negative electrode cells are formed corresponding to each rotary target changing device, openings are formed in the two sides of each negative electrode cell; a set of deviation correcting device is arranged at each of the uncoiling mechanism and the coiling mechanism; the negative electrode cells are distributed on the circumference, coated with a base band, of the cold roll, and each set of the deviation correcting device and the corresponding negative electrode cells are arranged on the same axis; the base band is driven to do a reciprocating motion by the uncoiling mechanism and the coiling mechanism. According to the magnetron-sputtering winding coating machine, a negative electrode target can be timely and rapidly replaced when the coating vacuum chamber is not opened, and multiple film layers can be coated by virtue of the reciprocating motion of base materials in a film coating process, so that the film coating efficiency is greatly improved; the magnetron-sputtering winding coating machine is particularly suitable for large-scale high-efficiency production.
Description
Technical field
The present invention relates to a kind of vacuum plating unit, more particularly, relate to a kind of fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine.
Background technology
Vacuum winding coating technique is exactly prepare at coiled strip substrate surface the technology that one deck or multilayer have the film of certain function by the method such as thermal evaporation or magnetron sputtering in vacuum chamber.Vacuum winding filming equipment mainly contains following characteristics: one, plated base material are flexible parent metal, and namely having can be windability; Two, coating process has continuity, and namely within a work period, plated film carries out continuously; Three, coating process carries out in high vacuum environment.Winding film coating machine is unreeling with in wrapup procedure, substrate surface is coated with film, the structure of plated film is exactly the operate portions of vacuum winding filming equipment, it is between the unwinding and rewinding of base material, and the principle of work of operate portions can be any one in thermal resistance evaporation, induction evaporation mode, electron beam evaporation, magnetron sputtering or other vacuum coating method.The working process of magnetron sputtering is that electronics accelerates to fly in the process of base material film to collide with sputter gas argon gas under the effect of electric field, ionize out a large amount of argon ions and electronics, electronics flies to base material film, constantly collides with ar atmo in the process, produces more ar atmo and electronics; Argon ion accelerates to bombard target under the effect of electric field, sputters a large amount of target atom, is deposited on base material film surface filming in neutral target atom (or molecule).
Flexible parent metal is widely used in the middle of organic semiconductors technologies, transparency electrode and touch-screen.In recent years along with the develop rapidly to magnetron sputtering technique itself in the widespread demand of flexible substrates Coating Materials and flexible parent metal, various high-performance optical film is coated with successfully in large area flexible substrate.Due to the important directions that flexible parent metal has simple, the easy transport of continuous seepage, the advantage such as arbitrary shape, flexible parcel that can conveniently cut into is magnetron sputtering technique development always.Therefore, plate functional membrane many employings winding film plating mode on a plastic film, and the good functional membrane of function will be plated on a plastic film, as plated the good low-reflection film of function (low-E film) on polyester film, minimum two silver-colored structural membrane also needs the rete of plating more than 9 layers, if plating visible light transmissivity is greater than 85%, resistance is less than 1 Ω/m
2electromagnetic shielding film (EMI film), then to plate four silver medal structural membrane, i.e. 17 tunic layers.Plate every one deck and all will configure a set of negative electrode and target core, and monoblock type plated film is singly rolled in traditional winding film coating machine employing, namely in a plated film vacuum chamber, a cold roller is laid, 2 ~ 3 negative electrodes, target core and releasing coil mechanism, rolling-up mechanism, due to structural limitations reason, can not to arrange at circumference the negative electrode of as many as more than 4 groups, the rete that a coating just can plate more than 4 layers difference in functionalitys can not be adapted to, even if lay two cold rollers in a coating chamber, 4 ~ 6 negative electrodes and target core, also can not arrange any more 17 negative electrodes and target position.For reaching the object of having plated 17 tunics, design in a traditional way, need at least 3 cold rollers, the pipeline of water flowing, energising is many, the gas discharge quantity produced is large, be unfavorable for vacuum pump economical operation, therefore traditional coating equipment can not adapt to the plated film that a coating just can plate more than 4 layers, can not produce that rete is many, the functional plastic rete of better function.Between each negative electrode cell of machining state, also there is the seepage (5% ~ 20%) of process gas each other under the state that generally multiple poles target is arranged, the plated film that processing is obtained does not reach the requirement of technique.
In anticathode spattering filming device, winding-type vacuum coater can continuous seepage and significantly improve the efficiency of film forming with it, but, in existing winding-type vacuum coater, each is used for the installation limited amount of spatter film forming negative electrode cell, plating multilayer dielectric film needs repeatedly to change target, needs again again to vacuumize after changing target at every turn, required time is longer, complex operation, has had a strong impact on plated film efficiency, and waste mass energy; In addition, existing winding-type vacuum coater often needs with cleaning device, heating unit, unreels and support the use formation production line with rolling-up mechanism, can cause like this equipment many, take the large problem in the place of production.In view of this, how to design and a kind ofly only just high-level efficiency to sputter multilayer functional membrane continuously and become and have technical problem to be solved with single vacuum coating film equipment.
Summary of the invention
1. invent the technical problem that will solve
The object of the invention is to the above-mentioned deficiency overcoming existing coating equipment, a kind of fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine is provided, adopt technical scheme of the present invention, timely quick-replaceable cathode target is got final product when not opening plated film vacuum chamber, and utilize base material to-and-fro movement to realize being coated with of stratified film, simplify electrical control gear and program; One time plated film stroke can complete being coated with of stratified film, substantially increase the efficiency of coating equipment plating multilayer functional membrane, and plated film precision is high; Meanwhile, compact equipment, occupation of land space is little, is suitable for the high efficiency production in enormous quantities of plating multilayer functional membrane in base band.
2. technical scheme
For achieving the above object, technical scheme provided by the invention is:
One of the present invention fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, comprise vacuum chamber, uncoiling room, be located at the uncoiling mechanism of uncoiling indoor, rolling room, the rolling-up mechanism being located at rolling indoor and the cold roller be located in vacuum chamber, also comprise deviation correcting device, target assembly is changed in two or more revolution, and change the negative electrode cell of the corresponding two sides opening in target assembly position with each revolution, between described uncoiling room and vacuum chamber, slide valve is equipped with between rolling room and vacuum chamber, base band between described uncoiling mechanism and rolling-up mechanism is coated on cold roller after reversing roller commutation, described uncoiling mechanism and rolling-up mechanism place are respectively provided with one group of deviation correcting device, and described deviation correcting device is positioned at uncoiling room and rolling is indoor, described negative electrode cell is distributed in cold roll cladding to be had on the periphery of base band, and often group revolution changes target assembly and the negative electrode cell corresponding with it is all located on same axis with cold roller, described revolution is changed target assembly and is comprised support, rotary disk, drive the traversing mechanism that rotary disk rotates, drive the axial stretching mechanism that rotary disk stretches vertically, be installed on the two or more flexible axle sleeve on rotary disk, be installed on that telescopic shaft puts for the pole target stand plate of installing target core be installed on radial extension mechanism on support and relative with the opening direction of negative electrode cell, described rotary disk is the barrel-like structure being provided with inner chamber, described flexible axle sleeve is installed on the sidewall of rotary disk, after axial stretching mechanism shrinks, described radial extension mechanism is just corresponding with a flexible axle sleeve, for pole target stand plate outwards being ejected and embedding the little indoor of negative electrode, described uncoiling mechanism and rolling-up mechanism drive base band to realize to-and-fro movement.
Further, described flexible axle sleeve comprises interior axle, middle axle sleeve and outer shaft, be located in middle axle sleeve in described, and be provided with the first compression spring between interior axle and middle axle sleeve, described tunnel shaft is sheathed in outer shaft, and being provided with the second compression spring between middle axle sleeve and outer shaft, described outer shaft is fixedly installed on rotary disk.
Further, described axial stretching mechanism is also provided with three joint cartridge type guide rails.
Further, described axial stretching mechanism and radial extension mechanism are electric pushrod, and described traversing mechanism is stepper-motor.
Further, target assembly is changed in described revolution and the negative electrode cell that arrange corresponding to it is provided with 3 groups.
Further, gas isolating plate is provided with between the negative electrode cell described in adjacent two.
Further, described deviation correcting device is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System.
Further, be also provided with pretreating device between described uncoiling mechanism and cold roller, described pretreating device comprises ion source pre-treatment mechanism, and described ion source pre-treatment mechanism is arranged in vacuum chamber, for cleaning the dirt on base band surface.
Further, also comprise cold well coil pipe deep cooling mechanism, described cold well coil pipe deep cooling organization establishes in vacuum chamber, for condensation to a large amount of steam discharged in base band pretreatment process.
3. beneficial effect
Adopt technical scheme provided by the invention, compared with existing known technology, there is following unusual effect:
(1) one of the present invention fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, its uncoiling mechanism and rolling-up mechanism place are respectively provided with one group of deviation correcting device, and deviation correcting device is positioned at uncoiling room and rolling is indoor, under the effect of deviation correcting device, the back and forth motion continuously of base band can be realized, make the rolling neat in edge of base band, reach the processing object of back and forth plating multilayer film; On the periphery that cold roll cladding has base band, be evenly provided with two or more revolution changes target assembly simultaneously, being coated with of multilayer film can be completed in a plated film stroke, and adopt revolution to change target assembly, cathode target can be changed in time when not opening plated film vacuum chamber, realize being coated with continuously of multilayer film, substantially increase the efficiency of plating multilayer film, simplify electrical control gear and program, be particularly suitable for the high efficiency production in enormous quantities of plating multilayer functional membrane in base band; Secondly, revolution changes target assembly structure simply, and it is convenient to control, and changes target flexible movements, greatly saves and change target time and device fabrication cost;
(2) one of the present invention fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, its revolution is changed target assembly and is had axial stretching mechanism, for the cathode target after use is moved to vacuum chamber outside, can carry out changing target in vacuum chamber outside after a plated film completes, simple to operation;
(3) one of the present invention fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, its flexible axle sleeve comprises interior axle, middle axle sleeve and outer shaft, inside be located in middle axle sleeve, and be provided with the first compression spring between interior axle and middle axle sleeve, tunnel shaft is sheathed in outer shaft, and be provided with the second compression spring between middle axle sleeve and outer shaft, outer shaft is fixedly installed on rotary disk, telescopic shaft nested structure is simple, design ingenious, only need to utilize one group of radial extension mechanism can realize stretching out of multiple poles target, and after the contraction of radial extension mechanism, target core can exit negative electrode cell automatically, facilitate Rotation With Changing target, adopt two-stage to stretch out structure simultaneously, ensure that target core has enough movement travels,
(4) one of the present invention fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, its axial stretching mechanism is also provided with three joint cartridge type guide rails, ensure that axial stretching mechanism has enough rigidity, guarantee to stretch out larger distance;
(5) one of the present invention fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, its axial stretching mechanism and radial extension mechanism are electric pushrod, traversing mechanism is stepper-motor, electric pushrod and stepper-motor are convenient to electrical control, stable, and on the processing environment in vacuum chamber without impact;
(6) one of the present invention fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, target assembly is changed in its revolution and the negative electrode cell that arrange corresponding to it is provided with 3 groups, farthest make use of the finite space of vacuum chamber, compact construction, take up an area space little, be particularly suitable for producing in enormous quantities;
(7) one of the present invention fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, its deviation correcting device is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System, and correction controls precisely, and error is little.
Accompanying drawing explanation
Fig. 1 is the structure principle chart of a kind of fast quick change target one side of the present invention reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine;
Fig. 2 is the structural representation that target assembly is changed in revolution in the present invention;
Fig. 3 is the partial enlarged drawing of Fig. 2;
Fig. 4 is the principle schematic that the revolution in the present invention changes that target assembly ejects pole target stand plate.
Label declaration in schematic diagram:
1, vacuum chamber; 2, uncoiling room; 201, uncoiling mechanism; 3, deviation correcting device; 4, slide valve; 5, base band; 6, pretreating device; 7, reversing roller; 8, cold roller; 9, rolling room; 901, rolling-up mechanism; 10, target assembly is changed in revolution; 1001, support; 1002, axial stretching mechanism; 1003, three joint cartridge type guide rails; 1004, rotary disk; 1005, flexible axle sleeve; 1006, pole target stand plate; 1007, radial extension mechanism; 1008, interior axle; 1009, middle axle sleeve; 1010, outer shaft; 1011, the first compression spring; 1012, the second compression spring; 11, negative electrode cell; 12, target core; 13, gas isolating plate; 14, air inlet electromagnetic valve; 15, to bleed magnetic valve; 16, roughing vacuum pump; 17, cryopump; 18, molecular pump extraction valve; 19, molecular pump; 20, forepump is bled magnetic valve; 21, forepump.
Embodiment
For understanding content of the present invention further, the present invention is described in detail by reference to the accompanying drawings.
Composition graphs 1, one of the present invention fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, comprise vacuum chamber 1, be located at the uncoiling room 2 of vacuum chamber 1 both sides and rolling room 9, the working part be located in vacuum chamber 1, and be located at vacuum chamber 1 outside for providing the external pump group of coating process condition, the detecting and controlling system of detection and control plated film machining state; Wherein, uncoiling mechanism 201 is provided with in uncoiling room 2, rolling-up mechanism 901 is provided with in rolling room 9, be provided with cold roller 8 in vacuum chamber 1, reversing roller 7, two or more revolution change target assembly 10 and change the negative electrode cell 11 of the corresponding two sides opening in target assembly 10 position with each revolution, slide valve 4 is equipped with between uncoiling room 2 and vacuum chamber 1, between rolling room 9 and vacuum chamber 1, respectively be provided with one group of deviation correcting device 3 between uncoiling mechanism 201 and reversing roller 7, between rolling-up mechanism 901 and reversing roller 7, and this deviation correcting device 3 is positioned at uncoiling room 2 and rolling room 9; Negative electrode cell 11 is distributed in cold roller 8 and is coated with on the periphery of base band 5, and often group revolution changes target assembly 10 and the negative electrode cell 11 corresponding with it is all located on same axis with cold roller 8, is also provided with the pretreating device 6 being positioned at vacuum chamber 1 between uncoiling mechanism 201 and reversing roller 7.External pump group comprises roughing vacuum pump group, cryopump 17 and molecular pump group, roughing vacuum pump group comprises roughing vacuum pump 16, air inlet electromagnetic valve 14 and magnetic valve 15 of bleeding, roughing vacuum pump 16, air inlet electromagnetic valve 14 are connected with vacuum chamber 1 according to syndeton as shown in Figure 1 with magnetic valve 15 of bleeding, be mainly used in the gas in vacuum chamber 1 to extract out fast, reach the working conditions of molecular pump; Cryopump 17 is connected with vacuum chamber 1, is mainly used in cooling the steam produced in pretreatment process in vacuum chamber 1 fast, and coordinates roughing vacuum pump group and molecular pump group to make to reach capacity in vacuum chamber 1 vacuum state; Molecular pump group comprises forepump 21, forepump is bled magnetic valve 20, molecular pump 19 and molecular pump extraction valve 18, forepump 21, forepump are bled after magnetic valve 20, molecular pump 19 and molecular pump extraction valve 18 are connected successively and are connected with vacuum chamber 1, are mainly used in realizing reaching capacity fast vacuum state; In addition, owing to being provided with multiple negative electrode cell 11 in the present invention, once can plate multilayer functional membrane, therefore one group of molecular pump group is difficult to reach processing requirement, therefore arranges two groups of molecular pump groups (as shown in Figure 1).Detecting and controlling system comprises gas analyzer, vacuumometer, gas meter, optical fiber inductive probe, tension control system and computer, and gas analyzer is located in negative electrode cell 11, for analyzing gaseous constituent in negative electrode cell 11 and content; Vacuumometer is located in vacuum chamber 1, for measuring the air pressure in vacuum chamber 1; Gas meter is located on the intake ducting of negative electrode cell 11, for the air input of control cathode cell 11; Optical fiber inductive probe stretches in negative electrode cell 11, for carrying out online collection analysis to target as sputter metal oxide gas out; Tension control system is located at uncoiling mechanism 201, cold roller 8, rolling-up mechanism 901 and is located on the bridle rolls in base band 5, for controlling the smooth running of flexible base band 5; Gas analyzer, vacuumometer, gas meter are connected respectively at computer with optical fiber inductive probe, for calculating each processing parameter and controlling.
One of the present invention fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, by improving vacuum chamber 1 internal structure performing plated film work, the revolution of many groups is utilized to change target assembly 10, can timely quick-replaceable cathode target as required when not opening plated film vacuum chamber, and utilize rolling and unreel two groups of deviation correcting devices 3 and realize base band to-and-fro movement, thus realize being coated with continuously of stratified film, simplify electrical control gear and program, one time plated film stroke can complete being coated with of stratified film, substantially increase the efficiency of coating equipment plating multilayer functional membrane, and plated film precision is high, meanwhile, compact equipment, occupation of land space is little, is particularly suitable for producing in enormous quantities.
Below in conjunction with embodiment, the invention will be further described.
Embodiment
As shown in Figure 1, the one fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine of the present embodiment, comprise vacuum chamber 1, uncoiling room 2, be located at the uncoiling mechanism 201 in uncoiling room 2, rolling room 9, the cold roller 8 be located at the rolling-up mechanism 901 in rolling room 9 and be located in vacuum chamber 1, also comprise deviation correcting device 3, target assembly 10 is changed in two or more revolution, and change the negative electrode cell 11 of the corresponding two sides opening in target assembly 10 position with each revolution, between uncoiling room 2 and vacuum chamber 1, slide valve 4 is equipped with between rolling room 9 and vacuum chamber 1, enter in vacuum chamber 1 for stoping the gas in uncoiling room 2 and rolling room 9, avoid the vacuum tightness affecting vacuum chamber 1, two groups are also provided with for changing the reversing roller 7 in base band 5 direction in vacuum chamber 1, base band 5 between uncoiling mechanism 201 and rolling-up mechanism 901 is coated on cold roller 8 after reversing roller 7 commutates, and base band 5 is also provided with bridle rolls, this bridle rolls is connected with torque motor, for adjusting the tension force of base band 5 in real time, uncoiling mechanism 201, cold roller 8 and rolling-up mechanism 901 three synchronous interaction, in the plated film course of processing, the cooling fluid of-15 ~-20 DEG C is passed in cold roller 8, for reducing the high temperature that plated film produces, ensure coating quality, after plated film terminates, cold roller 8 can be made again to get back to room temperature state fast, uncoiling mechanism 201 and rolling-up mechanism 901 place are respectively provided with one group of deviation correcting device 3, and deviation correcting device 3 is positioned at uncoiling room 2 and rolling room 9, uncoiling mechanism 201 and rolling-up mechanism 901 all have rolling and unreel function, uncoiling mechanism 201 and rolling-up mechanism 901 drive base band 5 to realize to-and-fro movement, in rolling and the to-and-fro movement that unreels, two groups of deviation correcting devices 3 and uncoiling mechanism 201, rolling-up mechanism 901 form closed chain system of processing, base band 5 rolling neat in edge can be guaranteed, thus ensure that the reciprocating stability of base band 5, negative electrode cell 11 is distributed in cold roller 8 and is coated with on the periphery of base band 5, and often group revolution changes target assembly 10 and the negative electrode cell 11 corresponding with it is all located on same axis with cold roller 8, negative electrode cell 11 is also provided with cooling plate, air supply mechanism and atmosphere division board 13, gas isolating plate 13 is arranged at the both sides of negative electrode cell 11, couple together between adjacent two negative electrode cells 11, cooling plate is arranged on the outer wall of negative electrode cell 11, and cooling plate is distributed with water-cooled tube, air supply mechanism is located in negative electrode cell 11, and be connected with the tonifying Qi unit of outside, also vacuum device is provided with in negative electrode cell 11, and this vacuum device is connected with outside molecular pump, target assembly 10 is changed in revolution can by pivotal mode, cathode target can be changed in time when not opening plated film vacuum chamber 1, achieve the function of plating multilayer film continuously in base band 5, overcome existing coating equipment to need again to vacuumize when target is changed in vacuum chamber 1 outside, the deficiency of waste plenty of time and the energy.Specifically in the present embodiment, target assembly 10 is changed in revolution and the negative electrode cell 11 that arrange corresponding to it is provided with 3 groups, namely trilamellar membrane can be plated in a movement travel of base band 5, the fast quick change target of target assembly 10 is changed in conjunction with the to-and-fro movement of base band 5 and revolution, can realize plating multilayer functional membrane continuously, substantially increase plated film efficiency, farthest make use of the finite space of vacuum chamber 1 simultaneously, compact construction, occupation of land space is little.
As shown in Figure 2, revolution in the present embodiment is changed target assembly 10 and is comprised support 1001, rotary disk 1004, drive the traversing mechanism that rotary disk 1004 rotates, drive the axial stretching mechanism 1002 that rotary disk 1004 stretches vertically, be installed on the two or more flexible axle sleeve 1005 on rotary disk 1004, be installed on flexible axle sleeve 1005 for the pole target stand plate 1006 of installing target core 12 be installed on radial extension mechanism 1007 on support 1001 and relative with the opening direction of negative electrode cell 11, rotary disk 1004 is for being provided with the barrel-like structure of inner chamber, axial stretching mechanism 1002 is connected with the bottom of rotary disk 1004, and ensure that axial stretching mechanism 1002 is coaxial with rotary disk 1004, flexible axle sleeve 1005 is installed on the sidewall of rotary disk 1004, can be protruding under the ejection effect of radial extension mechanism 1007, specifically in the present embodiment, often organize on the rotary disk 1004 turning round and change target assembly 10 and be evenly provided with 4 target cores 12, after once changing target, the functional membrane that target assembly 10 can plate more than 4 layers at least is continuously changed in one group of revolution, and the target core 12 on pole target stand plate 1006 adopts flange connection, facilitates the disassembling, assembling and replacing of target core 12, as shown in Figure 4, after axial stretching mechanism 1002 shrinks, radial extension mechanism 1007 just axle sleeve 1005 position flexible with is corresponding, for outwards being ejected by pole target stand plate 1006 and embedding in negative electrode cell 11.Adopt axial stretching mechanism 1002 to achieve and target core 12 is released vacuum chamber 1, without the need to carrying out the replacing of target core 12 in vacuum chamber 1 inside, simple to operation; In addition, in order to make axial stretching mechanism 1002 have enough rigidity, making rotary disk 1004 stretch out larger distance, in the present embodiment, axial stretching mechanism 1002 being provided with three joint cartridge type guide rails 1003.In the present embodiment, above-mentioned axial stretching mechanism 1002 and radial extension mechanism 1007 are electric pushrod, and traversing mechanism is stepper-motor, and the control of electric pushrod and stepper-motor is convenient, accurate positioning, can not impact the processing environment in vacuum chamber.As shown in Figure 3, flexible axle sleeve 1005 in the present embodiment comprises interior axle 1008, middle axle sleeve 1009 and outer shaft 1010, interior axle 1008 is located in middle axle sleeve 1009, and be provided with the first compression spring 1011 between interior axle 1008 and middle axle sleeve 1009, middle axle sleeve 1009 is located in outer shaft 1010, and be provided with the second compression spring 1012 between middle axle sleeve 1009 and outer shaft 1010, outer shaft 1010 is fixedly installed on rotary disk 1004, flexible axle sleeve 1005 structure is simple, design ingenious, only need to utilize one group of radial extension mechanism 1007 can realize stretching out of multiple poles target, and after radial extension mechanism 1007 contraction, target core 12 can exit negative electrode cell 11 automatically, facilitate Rotation With Changing target, adopt two-stage to stretch out structure simultaneously, ensure that target core 12 has enough movement travels.
The one fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine of the present embodiment, deviation correcting device 3 is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System, correction controls precisely, and error is little, particularly, for transparent base band, as polyester film etc., adopt ultrasonic wave deviation-rectifying system, for opaque base band, as metallic film etc., adopt the Photoelectric Error Correction System or ultrasonic wave deviation-rectifying system.Above-mentioned ultrasonic wave deviation-rectifying system or the deviating correcting principle of the Photoelectric Error Correction System are prior art, just repeat no more at this.In addition, be also provided with pretreating device 6 between the uncoiling mechanism 201 in the present embodiment and cold roller 8, pretreating device 6 comprises ion source pre-treatment mechanism, and ion source pre-treatment mechanism is arranged in vacuum chamber 1, for cleaning the dirt on base band 5 surface; Cold well coil pipe deep cooling mechanism is also provided with near pretreating device 6, this cold well coil pipe deep cooling mechanism utilizes liquid nitrogen as refrigeration agent, surrounding temperature can be made in 3 ~ 5 minutes to drop to subzero about 120 DEG C, for condensation to a large amount of steam discharged in base band 5 pretreatment process, and coordinate pumped vacuum systems gas clean-up.In addition, for the ease of observing the working order in vacuum chamber 1, vacuum chamber 1 also offers view port.
The one fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine of the present embodiment, add man-hour, be set on uncoiling mechanism 201 by the base band 5 of rolling, the one end of drawing base band 5 walks around reversing roller 7 and cold roller 8 respectively as shown in Figure 1, and is fixed on rolling-up mechanism 901; The target core 12 be coated with needed for rete is installed on corresponding pole target stand plate 1006; Closing vacuum chamber 1, utilizes external pump group to vacuumize vacuum chamber 1, realizes processing condition needed for plated film, and uncoiling room 2 and rolling room 9 also slightly vacuumize in the lump simultaneously; During plated film, uncoiling mechanism 201 and rolling-up mechanism 901 synchronously unreel and rolling, and the synchronous interaction of cold roller 8, realizes winding film plating simultaneously; After uncoiling mechanism 201 has unreeled (namely trilamellar membrane layer has plated), each group of revolution is changed target assembly 10 and is carried out changing target action according to setting program: radial extension mechanism 1007 shrinks, pole target stand plate 1006 exits in negative electrode cell 11, traversing mechanism turns an angle according to the time variable control rotary disk 1004 established in advance, change another target core 12, and utilize radial extension mechanism 1007 to be ejected by the pole target stand plate 1006 fixing this target core 12 in embedding negative electrode cell 11, complete and once change target; Change after target completes, uncoiling mechanism 201 and rolling-up mechanism 901 start to rotate backward, i.e. the exchange function of uncoiling mechanism 201 and rolling-up mechanism 901, the also synchronous interaction of cold roller 8, realize being coated with of second time six tunics; Repeat above-mentioned steps, change target assembly 10 for the revolution with four groups of target cores 12 and the coating equipment that target assembly 10 is changed in three groups of revolutions is set, at least can be coated with 12 tunic layers continuously on the one side of base band 5, in addition four groups of target cores 12 and three groups turn round the independent assortment changing target assembly 10, being coated with of more multiple film layer can be realized, substantially increase the efficiency of plating multilayer functional membrane; After the revolution target changed on target assembly 10 has all been coated with, shuts down, utilized axial stretching mechanism 1002 that rotary disk 1004 is released vacuum chamber 1, carry out replacing target core 12 in vacuum chamber 1 outside.Because uncoiling mechanism 201 and rolling-up mechanism 901 place are respectively provided with one group of deviation correcting device 3, therefore can realize the back and forth motion continuously of base band 5, reach the processing object of plating multilayer film; Utilize revolution to change target assembly 10 and realize fast quick change target in vacuum chamber 1, save and change the target time and eliminate the repetition vacuum pumping of repeatedly changing needed for target, time-saving energy-saving; Meanwhile, revolution changes target assembly 10 structure simply, and it is convenient to control, and changes target flexible movements; Adopt structure of the present invention, the structure of magnetic-control sputtering coiling film coating machine is obviously simplified, and without the need to electric control system and the program of complexity, greatly reduces occupation area of equipment, reduce device fabrication cost, be particularly suitable for the production in enormous quantities of plating multilayer functional membrane in base band.
Below be schematically described the present invention and embodiment thereof, this description does not have restricted, and shown in accompanying drawing is also one of embodiments of the present invention, and actual structure is not limited thereto.So, if those of ordinary skill in the art enlightens by it, when not departing from the invention aim, without creatively designing the frame mode similar to this technical scheme and embodiment, all should protection scope of the present invention be belonged to.
Claims (9)
1. a fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, comprise vacuum chamber (1), uncoiling room (2), be located at the uncoiling mechanism (201) in uncoiling room (2), rolling room (9), the cold roller (8) be located at the rolling-up mechanism (901) in rolling room (9) and be located in vacuum chamber (1), it is characterized in that: also comprise deviation correcting device (3), target assembly (10) is changed in two or more revolution, and change the negative electrode cell (11) of the corresponding two sides opening in target assembly (10) position with each revolution, between described uncoiling room (2) and vacuum chamber (1), slide valve (4) is equipped with between rolling room (9) and vacuum chamber (1), base band (5) between described uncoiling mechanism (201) and rolling-up mechanism (901) is coated on cold roller (8) after reversing roller (7) commutation, described uncoiling mechanism (201) and rolling-up mechanism (901) place are respectively provided with one group of deviation correcting device (3), and described deviation correcting device (3) is positioned at uncoiling room (2) and rolling room (9), described negative electrode cell (11) is distributed in cold roller (8) and is coated with on the periphery of base band (5), and often organizes revolution and change target assembly (10) and the negative electrode cell (11) corresponding with it is all located on same axis with cold roller (8), described revolution is changed target assembly (10) and is comprised support (1001), rotary disk (1004), drive the traversing mechanism that rotary disk (1004) rotates, drive the axial stretching mechanism (1002) that rotary disk (1004) is flexible vertically, be installed on the two or more flexible axle sleeve (1005) on rotary disk (1004), be installed on the radial extension mechanism (1007) upper and relative with the opening direction of negative electrode cell (11) with being installed on support (1001) for pole target stand plate (1006) of installing target core (12) on flexible axle sleeve (1005), described rotary disk (1004) is for being provided with the barrel-like structure of inner chamber, described flexible axle sleeve (1005) is installed on the sidewall of rotary disk (1004), after axial stretching mechanism (1002) shrinks, described radial extension mechanism (1007) is just corresponding with a flexible axle sleeve (1005), for pole target stand plate (1006) outwards being ejected and embedding in negative electrode cell (11), described uncoiling mechanism (201) and rolling-up mechanism (901) drive base band (5) to realize to-and-fro movement.
2. one according to claim 1 fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, it is characterized in that: described flexible axle sleeve (1005) comprises interior axle (1008), middle axle sleeve (1009) and outer shaft (1010), described interior axle (1008) is located in middle axle sleeve (1009), and be provided with the first compression spring (1011) between interior axle (1008) and middle axle sleeve (1009), described middle axle sleeve (1009) is located in outer shaft (1010), and be provided with the second compression spring (1012) between middle axle sleeve (1009) and outer shaft (1010), described outer shaft (1010) is fixedly installed on rotary disk (1004).
3. one according to claim 2 fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, is characterized in that: described axial stretching mechanism (1002) is also provided with three joint cartridge type guide rails (1003).
4. one according to claim 3 fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, it is characterized in that: described axial stretching mechanism (1002) and radial extension mechanism (1007) are electric pushrod, and described traversing mechanism is stepper-motor.
5. the fast quick change of the one according to Claims 1-4 any one target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, is characterized in that: target assembly (10) is changed in described revolution and the negative electrode cell (11) that arrange corresponding to it is provided with 3 groups.
6. one according to claim 5 fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, is characterized in that: be provided with gas isolating plate (13) between the negative electrode cell (11) described in adjacent two.
7. one according to claim 6 fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, is characterized in that: described deviation correcting device (3) is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System.
8. one according to claim 7 fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, it is characterized in that: between described uncoiling mechanism (201) and cold roller (8), be also provided with pretreating device (6), described pretreating device (6) comprises ion source pre-treatment mechanism, described ion source pre-treatment mechanism is arranged in vacuum chamber (1), for cleaning the dirt on base band (5) surface.
9. one according to claim 8 fast quick change target one side reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine, it is characterized in that: also comprise cold well coil pipe deep cooling mechanism, described cold well coil pipe deep cooling organization establishes in vacuum chamber (1), for condensation to a large amount of steam discharged in base band (5) pretreatment process.
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| CN201510066781.9A CN104611681B (en) | 2015-02-09 | 2015-02-09 | Magnetron-sputtering winding coating machine capable of rapidly changing target and continuously and efficiently coating film in single-surface reciprocating manner |
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| CN201510066781.9A CN104611681B (en) | 2015-02-09 | 2015-02-09 | Magnetron-sputtering winding coating machine capable of rapidly changing target and continuously and efficiently coating film in single-surface reciprocating manner |
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| CN107267931A (en) * | 2017-07-24 | 2017-10-20 | 无锡南理工科技发展有限公司 | From the application method for moving target assembly |
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| CN110331376A (en) * | 2019-08-21 | 2019-10-15 | 广东腾胜科技创新有限公司 | A kind of T-type Vacuum Roll Coating Equipment with diaphragm valve |
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| CN107217237A (en) * | 2017-07-24 | 2017-09-29 | 无锡南理工科技发展有限公司 | Target assembly is moved based on electron beam evaporation equipment certainly |
| CN107267931A (en) * | 2017-07-24 | 2017-10-20 | 无锡南理工科技发展有限公司 | From the application method for moving target assembly |
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| CN107267932A (en) * | 2017-07-24 | 2017-10-20 | 无锡南理工科技发展有限公司 | A kind of application process from the reaction electron beam evaporation instrument for moving target |
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| CN107267933B (en) * | 2017-07-24 | 2019-10-18 | 山东环邦新材料科技有限公司 | A kind of reaction electron beam evaporation equipment for moving target certainly |
| CN107267931B (en) * | 2017-07-24 | 2019-11-22 | 利辛县诚创科技中介服务有限公司 | From the application method for moving target assembly |
| CN107267932B (en) * | 2017-07-24 | 2019-12-03 | 徐州长盛电力设备有限公司 | A kind of application method from the reaction electron beam evaporation instrument for moving target |
| CN110331376A (en) * | 2019-08-21 | 2019-10-15 | 广东腾胜科技创新有限公司 | A kind of T-type Vacuum Roll Coating Equipment with diaphragm valve |
| CN112708866A (en) * | 2020-12-23 | 2021-04-27 | 青岛大学 | Flexible substrate continuous coating machine based on magnetron sputtering technology and coating method thereof |
| CN112708866B (en) * | 2020-12-23 | 2023-03-28 | 青岛大学 | Flexible substrate continuous coating machine based on magnetron sputtering technology and coating method thereof |
| CN112708867A (en) * | 2020-12-31 | 2021-04-27 | 广东谛思纳为新材料科技有限公司 | Reciprocating film coating equipment and film coating method |
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