CN104591255A - Method for preparing micron-sized copper oxide from copper chloride etching waste liquid - Google Patents

Method for preparing micron-sized copper oxide from copper chloride etching waste liquid Download PDF

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Publication number
CN104591255A
CN104591255A CN201310527814.6A CN201310527814A CN104591255A CN 104591255 A CN104591255 A CN 104591255A CN 201310527814 A CN201310527814 A CN 201310527814A CN 104591255 A CN104591255 A CN 104591255A
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China
Prior art keywords
waste liquid
etching waste
copper chloride
chloride etching
micron order
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Pending
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CN201310527814.6A
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Chinese (zh)
Inventor
孙立
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Individual
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Individual
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Priority to CN201310527814.6A priority Critical patent/CN104591255A/en
Publication of CN104591255A publication Critical patent/CN104591255A/en
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Abstract

The invention discloses a method for producing solid fuel from swill-cooked dirty oil. The method comprises the following steps of filtering swill-cooked dirty oil to remove impurities, adding a saturated sodium hydroxide solution into the swill-cooked dirty oil according to a certain ratio, carrying out heating for a full reaction, carrying out cooling until gel is not concretionary, adding industrial alcohol and paraffin into the gel according to a certain ratio, carrying out fast stirring to obtain a uniform mixture, pouring the mixture into a mold box and carrying out cooling molding. The method utilizes swill-cooked dirty oil as a raw material to realize production of solid fuel, realizes waste recycle and provides a novel purpose of swill-cooked dirty oil.

Description

A kind of method utilizing copper chloride etching waste liquid to prepare micron order cupric oxide
Technical field
The present invention relates to a kind of waste utilization method, be specifically related to a kind of method utilizing copper chloride etching waste liquid to prepare micron order cupric oxide.
Background technology
Along with improving constantly of China's electronic industry annual growth, driven printed circuit board (PCB) and related industries development, China has become the printed circuit board (PCB) production center the biggest in the world.Printed circuit board (PCB) etching process produces a large amount of copper-containing etching waste solutions, do not carry out process can cause environmental pollution and cause the wasting of resources, current China on average produces etching waste liquor daily more than thousands of tons of, if copper wherein can be reclaimed, will produce great economic benefit.
Summary of the invention
Technical problem to be solved by this invention is for the deficiencies in the prior art, provides a kind of method utilizing copper chloride etching waste liquid to prepare micron order cupric oxide.
Technical problem to be solved by this invention is realized by following technical scheme.The present invention is a kind of method utilizing copper chloride etching waste liquid to prepare micron order cupric oxide, be characterized in: acidic etching waste liquid being diluted with water to copper ion concentration is 10-20 grams per liter, add glucose, glucose and cupric ion mol ratio are 1:1.5, be placed in the water bath with thermostatic control of 80 DEG C, stir, add sodium hydroxide solution simultaneously.React after 1-2 hour and filter, with absolute ethanol washing, filter cake is placed in the dry 1-2 hour of vacuum drying oven of 50-70 DEG C, be i.e. obtained micron order cupric oxide.
Compared with prior art, the inventive method is reasonable in design, and acidic etching waste liquid not only can be utilized by further, can also prepare high value copper.
Embodiment
Below further describe concrete technical scheme of the present invention, so that those skilled in the art understands the present invention further, and do not form the restriction to its right.
Embodiment 1, a kind of method utilizing copper chloride etching waste liquid to prepare micron order cupric oxide, acidic etching waste liquid being diluted with water to copper ion concentration is 10-20 grams per liter, add glucose, glucose and cupric ion mol ratio are 1:1.5, be placed in the water bath with thermostatic control of 80 DEG C, stir, add sodium hydroxide solution simultaneously.React after 1-2 hour and filter, with absolute ethanol washing, filter cake is placed in the dry 1-2 hour of vacuum drying oven of 50-70 DEG C, be i.e. obtained micron order cupric oxide.

Claims (6)

1. utilize copper chloride etching waste liquid to prepare a method for micron order cupric oxide, it is characterized in that acidic etching waste liquid thin up, reduction, neutralization, filtration, washing, drying to form.
2. a kind of method utilizing copper chloride etching waste liquid to prepare micron order cupric oxide according to claim 1, is characterized in that described dilution is that copper chloride etching waste liquid to be diluted with water to copper ion concentration be 10-20 grams per liter.
3. a kind of method utilizing copper chloride etching waste liquid to prepare micron order cupric oxide according to claim 1, in the copper chloride etching waste liquid after dilution, glucose is added when it is characterized in that described reduction, glucose and cupric ion mol ratio are 1:1.5, and reduction temperature is 80 DEG C.
4. a kind of method utilizing copper chloride etching waste liquid to prepare micron order cupric oxide according to claim 1, is characterized in that described neutralization neutralizes with sodium hydroxide.
5. a kind of method utilizing copper chloride etching waste liquid to prepare micron order cupric oxide according to claim 1, is characterized in that described washing is washed with dehydrated alcohol.
6. a kind of method utilizing copper chloride etching waste liquid to prepare micron order cupric oxide according to claim 1, is characterized in that described drying filter cake is placed in the dry 1-2 hour of vacuum drying oven of 50-70 DEG C.
CN201310527814.6A 2013-10-31 2013-10-31 Method for preparing micron-sized copper oxide from copper chloride etching waste liquid Pending CN104591255A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201310527814.6A CN104591255A (en) 2013-10-31 2013-10-31 Method for preparing micron-sized copper oxide from copper chloride etching waste liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201310527814.6A CN104591255A (en) 2013-10-31 2013-10-31 Method for preparing micron-sized copper oxide from copper chloride etching waste liquid

Publications (1)

Publication Number Publication Date
CN104591255A true CN104591255A (en) 2015-05-06

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310527814.6A Pending CN104591255A (en) 2013-10-31 2013-10-31 Method for preparing micron-sized copper oxide from copper chloride etching waste liquid

Country Status (1)

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CN (1) CN104591255A (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1072737A (en) * 1991-10-28 1993-06-02 日铁矿业株式会社 Handle the method for etching reagent
CN1082511A (en) * 1992-06-02 1994-02-23 日立化成工业株式会社 Handle the method and apparatus of copper chloride etching waste liquid
CN2861181Y (en) * 2005-11-25 2007-01-24 叶建均 Regeneration and copper recovery device for copper chloride acid etching liquid
CN101910429A (en) * 2008-01-15 2010-12-08 荏原工程服务有限公司 Method and apparatus for removing/recovering copper from copper-containing acidic waste liquid and process for producing copper-containing substance
JP2011168856A (en) * 2010-02-19 2011-09-01 Swing Corp Method and device for recovering copper from copper-containing acid waste liquid
CN102345128A (en) * 2011-09-30 2012-02-08 重庆浩康医药化工集团有限公司 Recycling process of etching solution of circuit board

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1072737A (en) * 1991-10-28 1993-06-02 日铁矿业株式会社 Handle the method for etching reagent
CN1082511A (en) * 1992-06-02 1994-02-23 日立化成工业株式会社 Handle the method and apparatus of copper chloride etching waste liquid
CN2861181Y (en) * 2005-11-25 2007-01-24 叶建均 Regeneration and copper recovery device for copper chloride acid etching liquid
CN101910429A (en) * 2008-01-15 2010-12-08 荏原工程服务有限公司 Method and apparatus for removing/recovering copper from copper-containing acidic waste liquid and process for producing copper-containing substance
JP2011168856A (en) * 2010-02-19 2011-09-01 Swing Corp Method and device for recovering copper from copper-containing acid waste liquid
CN102345128A (en) * 2011-09-30 2012-02-08 重庆浩康医药化工集团有限公司 Recycling process of etching solution of circuit board

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
黄凌云等: ""利用酸性CuCl2蚀刻废液制备微米级Cu2O粉体"", 《过程工程学报》 *

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Application publication date: 20150506