CN103480860B - Alkaline etching waste liquid for producing printed circuit board is utilized to prepare the method for high-purity nano copper - Google Patents
Alkaline etching waste liquid for producing printed circuit board is utilized to prepare the method for high-purity nano copper Download PDFInfo
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- CN103480860B CN103480860B CN201310441610.0A CN201310441610A CN103480860B CN 103480860 B CN103480860 B CN 103480860B CN 201310441610 A CN201310441610 A CN 201310441610A CN 103480860 B CN103480860 B CN 103480860B
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Abstract
The invention discloses a kind of method utilizing alkaline etching waste liquid for producing printed circuit board to prepare high-purity nano copper, it is characterized in that, it comprises the steps: a, gets in appropriate alkaline etching waste liquid for producing loading centrifuge tube and carry out high speed centrifugation, by centrifuge tube at the middle and upper levels clarified solution add ammoniacal liquor and regulate solution, simultaneously adding surface active dispersing agent to solution obtains reactant A; B, preparation comprise the B solution of hydrazine hydrate, NaOH and Nanometer Copper dispersion enhancing agents, and heating is stirred; Again reactant A is slowly dropped in solution B, reaction; C, reacted after be cooled to room temperature; Then transfer in centrifuge tube and carry out high speed centrifugation separation, after being separated, collect lower floor's solution; D, by the solution that obtains containing high-purity nano copper by absolute ethanol washing, the alcoholic solution containing Nanometer Copper is transferred to vacuum rotary evaporator carries out extraction copper nanoparticle for the last time in washing.The present invention easily operates, and without large power consumption, can carry out large-scale production under existence conditions.
Description
Technical field
The present invention relates to the technical field extracting nano-metallic copper powder method, particularly relate to the method that the alkaline etching waste liquid for producing emitted from printed circuit board factory prepares high-purity nano copper powder.
Background technology
Copper nanoparticle is because its size is in 100 nanometer range, there is comparatively bigger serface compared with common copper powder, exactly because also so nano copper particle shows excellent characteristic in optical property, catalytic performance, electric conductivity etc., in the industrial products of some characteristics of the ground of extensive use at present application, enhance product performance.Such as due to copper nanoparticle size very little and soft, therefore be a kind of well lubricating additive, added in the lubricating oil used by automobile, the wearability of engine cylinder and piston can be improved, the lubricating oil adding copper nanoparticle also has the function of energy-conserving and environment-protective, in addition because copper nanoparticle has higher electric conductivity, be that conduction adding material has prepared various conductor paste, for the formation of printed circuit board circuit at present with copper nanoparticle.
At present, most printed circuit board circuit is all utilize etching solution to be undertaken etching by the design of engineering, therefore produces a large amount of etching waste liquors.Containing a large amount of copper in alkaline etching waste liquid for producing, it is mainly with [Cu (NH
3)
4]
2+form exist, simultaneously also containing a large amount of NH
3h
2o, Cl
-deng.Optionally abandon etching waste liquor not only serious environment pollution, and waste a large amount of copper.
In recent years, researcher had proposed some effective recovery methods for the recovery of utility in the etching waste liquor produced in PCB manufacture process, and these methods have: 1 ﹑ chemical precipitation method.NaOH, Na is added in alkaline etching waste liquid for producing
2cO
3deng alkaline matter, generate Cu (OH)
2precipitation obtains Cu (OH) through filtration
2solid, then obtains CuO or adds H after high-temperature heating
2sO
4solution finally obtains CuSO
4; 2 ﹑ extract electro-deposition.In alkaline etching waste liquid for producing, first add contact break agent makes copper dissociate out from the complex compound of copper and become copper ion, then add some extractants of copper to the inside, through the solution obtaining copper ion of stripping, then utilizes the method for electro-deposition to obtain elemental copper; The direct electro-deposition of 3 ﹑.Representational is German Elochen alkaline etching liquid recovery system.The method requires the CuCl in etching solution
2become CuSO
4.After production process produces etching waste liquor.Due in waste liquid without Cl
-, can be out of use and extract and direct electro-deposition obtains Cu simple substance.But these method ubiquity complex process, the rate of recovery not high, expend the shortcomings such as higher and regenerant cost performance is not high, limit their extensive uses in this industry.
Summary of the invention
Object of the present invention is exactly deficiency in order to solve prior art and the one provided easily operates, and environmental protection and energy saving, the alkaline etching waste liquid for producing printed circuit board that utilizes that can carry out large-scale production under existence conditions prepares the method for high-purity nano copper.
The present invention adopts following technical solution to realize above-mentioned purpose: a kind of method utilizing alkaline etching waste liquid for producing printed circuit board to prepare high-purity nano copper, it is characterized in that, it comprises the steps:
A, get appropriate alkaline etching waste liquid for producing and load in centrifuge tube and carry out high speed centrifugation, to remove suspended impurity trickle in alkaline etching waste liquid for producing, centrifugal after by centrifuge tube at the middle and upper levels clarified solution transfer in container, adding ammoniacal liquor regulates the pH value of solution within the scope of 8-12, add the composite surface active dispersing agents by softex kw and polyvinylpyrrolidone to solution simultaneously, its addition with alkaline etching waste liquid for producing amount for benchmark, add 0.04 kilogram-0.15 kilogram in the alkaline etching waste liquid for producing of 1 liter, now will obtain solution as reaction A thing;
B, preparation reactant B solution, comprise in B solution there is reproducibility hydrazine hydrate, there is alkaline NaOH and Nanometer Copper dispersion enhancing agents polyethylene glycol, wherein the thing mass concentration of hydrazine hydrate is 0.05 ~ 0.25 mol/L, the substance withdrawl syndrome of NaOH is 0.2-2 mol/L, the thing mass concentration of polyethylene glycol is 0.5-2 mol/L, solution B is heated to 60 DEG C-100 DEG C, stirs with 100 revs/min of-1000 revs/min of speed simultaneously; Again reactant A is slowly dropped in solution B, drip and react 60 minutes-120 minutes with relief system;
C, reacted after be cooled to room temperature; Then transfer in centrifuge tube and carry out high speed centrifugation separation, after being separated, present the solution of the gel state containing high-purity nano copper powder and the upper solution of clarification, collect lower floor solution, after supernatant liquid is separated can again by technique utilize;
D, by the solution that obtains containing high-purity nano copper by absolute ethanol washing, the alcoholic solution containing Nanometer Copper is transferred to vacuum rotary evaporator carries out extraction copper nanoparticle for the last time in washing, and adjustment vacuum is 0.08Mpa-0.1Mpa.
Preferably, method step is more specifically: get 45-50 milliliter alkaline etching waste liquid for producing and load in the centrifuge tube of 2 25 milliliters, carry out centrifugal; Centrifugal complete after centrifuge tube supernatant liquid is poured in the beaker of 200 milliliters, add 4-6 gram of polyvinylpyrrolidone and 4-6 gram of softex kw as reactant A solution simultaneously; The NaOH of preparation containing 0.08-0.12 mol/L hydration hydrazine, 0.4-0.6 mol/L gram, the B solution 40-60 milliliter of 0.8-1.2 mol/L polyethylene glycol; B solution poured in there-necked flask, regulating thermostatic bath temperature is at 70-90 DEG C, and open and stir, mixing speed, at about 150-250 rev/min, drips solution A in there-necked flask, takes out and be cooled to room temperature after having reacted; Poured into by the reaction solution being cooled to room temperature in the centrifuge tube of 2 50 milliliters and again carry out centrifugation, collect the material of lower floor's gel state in centrifuge tube, upper liquid is carried out reclaiming treating for subsequent use on production line; To collect the material absolute ethanol washing in gel state, and transfer in rotary vacuum evaporator and carry out extraction copper nanoparticle when washing last, control vacuum is 0.08-0.09Mpa.
Preferably, method step is more specifically: get 45-50 milliliter alkaline etching waste liquid for producing and load in the centrifuge tube of 2 25 milliliters, carry out centrifugal; Centrifugal complete after centrifuge tube supernatant liquid is poured in the beaker of 200 milliliters, add 7-9 gram of polyvinylpyrrolidone and 7-9 gram of softex kw as reactant A solution simultaneously; The B solution 45-60 milliliter of the hydrazine hydrate of preparation containing 0.3-0.6 mol/L, the NaOH of 0.3-0.6 mol/L, the polyethylene glycol of 0.8-1.2 mol/L; B solution poured in there-necked flask, regulating thermostatic bath temperature is at 85-100 DEG C, and open and stir, mixing speed, at about 180-300 rev/min, drips solution A in there-necked flask, takes out and be cooled to room temperature after having reacted; The reaction solution being cooled to room temperature is poured in the centrifuge tube of 2 50 milliliters and is carried out centrifugation, collects the material of lower floor's gel state in centrifuge tube, and upper liquid is carried out reclaiming treating for subsequent use on production line; To collect the material absolute ethanol washing in gel state, and transfer in rotary vacuum evaporator and carry out extraction copper nanoparticle when washing last, control vacuum is 0.08-0.09Mpa.
Preferably, method step is more specifically: get 90-100 milliliter alkaline etching waste liquid for producing and load in the centrifuge tube of 2 50 milliliters, carry out centrifugal; Centrifugal complete after centrifuge tube supernatant liquid is poured in the beaker of 200 milliliters, add 7-10 gram of polyvinylpyrrolidone and 7-10 gram of softex kw as reactant A solution simultaneously; The NaOH of preparation containing 0.2-0.25 mol/L hydration hydrazine, 0.8-1.5 mol/L gram, the B solution 45-50 milliliter of 1.8-2 mol/L polyethylene glycol; B solution poured in there-necked flask, regulating thermostatic bath temperature is at 80-100 DEG C, and open and stir, mixing speed, at about 180-250 rev/min, drips solution A in there-necked flask, takes out and be cooled to room temperature after having reacted; The reaction solution being cooled to room temperature is poured in the centrifuge tube of 3 50 milliliters and is carried out centrifugation, collects the material of lower floor's gel state in centrifuge tube, and upper liquid is carried out reclaiming treating for subsequent use on production line; To collect the material absolute ethanol washing in gel state, and transfer in rotary vacuum evaporator and carry out extraction copper nanoparticle when washing last, control vacuum is 0.08-0.09Mpa.
The beneficial effect that the present invention adopts above-mentioned technical solution to reach is:
The process conditions that the present invention adopts are not harsh, easily operate, without large power consumption, can carry out large-scale production under existence conditions; Through test, the copper nanoparticle purity prepared is high, good dispersion, antioxygenic property good, and granular size size is within 30-100 nanometer; Meet the requirement of " Green Chemistry " in whole preparation process, achieve waste water discharge-reducing, the object of resources circulation recycling.
Accompanying drawing explanation
Fig. 1 is the XRD collection of illustrative plates that the present invention prepares copper nanoparticle.
Fig. 2 a and Fig. 2 b is the SEM collection of illustrative plates that the present invention prepares copper nanoparticle.
Detailed description of the invention
A kind of method utilizing alkaline etching waste liquid for producing printed circuit board to prepare high-purity nano copper of the present invention, it comprises the steps:
A, get appropriate alkaline etching waste liquid for producing and load in centrifuge tube and carry out high speed centrifugation, to remove suspended impurity trickle in alkaline etching waste liquid for producing, centrifugal after by centrifuge tube at the middle and upper levels clarified solution transfer in container, adding ammoniacal liquor regulates the pH value of solution within the scope of 8-12, add the composite surface active dispersing agents by softex kw and polyvinylpyrrolidone to solution simultaneously, its addition with alkaline etching waste liquid for producing amount for benchmark, add 0.04 kilogram-0.15 kilogram in the alkaline etching waste liquid for producing of 1 liter, now will obtain solution as reaction A thing;
B, preparation reactant B solution, comprise in B solution there is reproducibility hydrazine hydrate, there is alkaline NaOH and Nanometer Copper dispersion enhancing agents polyethylene glycol, wherein the thing mass concentration of hydrazine hydrate is 0.05 ~ 0.25 mol/L, the substance withdrawl syndrome of NaOH is 0.2-2 mol/L, the thing mass concentration of polyethylene glycol is 0.5-2 mol/L, solution B is heated to 60 DEG C-100 DEG C, stirs with 100 revs/min of-1000 revs/min of speed simultaneously; Again reactant A is slowly dropped in solution B, drip and react 60 minutes-120 minutes with relief system;
C, reacted after be cooled to room temperature; Then transfer in centrifuge tube and carry out high speed centrifugation separation, after being separated, present the solution of the gel state containing high-purity nano copper powder and the upper solution of clarification, collect lower floor solution, after supernatant liquid is separated can again by technique utilize;
D, by the solution that obtains containing high-purity nano copper by absolute ethanol washing, the alcoholic solution containing Nanometer Copper is transferred to vacuum rotary evaporator carries out extraction copper nanoparticle for the last time in washing, and adjustment vacuum is 0.08Mpa-0.1Mpa.
Prepare the XRD collection of illustrative plates of copper nanoparticle and SEM collection of illustrative plates as shown in Figure 1, Figure 2 shown in a and Fig. 2 b, purity is high, good dispersion.As seen from Figure 1, the copper nanoparticle purity of preparation is high, not containing other impurity; Fig. 2 illustrates copper nanoparticle its 10000 times and 30000 times of Electronic Speculum results of preparation, and good dispersion, granular size is in 30-100 nanometer range.
Below in conjunction with specific embodiment, technical scheme of the present invention is described in further detail.
Embodiment 1
Get 50 milliliters of alkaline etching waste liquid for producing to load in the centrifuge tube of 2 25 milliliters, carry out centrifugal; Centrifugal complete after centrifuge tube supernatant liquid is poured in the beaker of 200 milliliters, add 5 grams of polyvinylpyrrolidones and 5 grams of softex kws as reactant A solution simultaneously; The NaOH of preparation containing 0.1 mol/L hydration hydrazine, 0.5 mol/L gram, the B solution 50 milliliters of 1 mol/L polyethylene glycol; B solution poured in there-necked flask, regulating thermostatic bath temperature is at 80 DEG C, and open and stir, mixing speed, at about 200 revs/min, drips solution A in there-necked flask, takes out and be cooled to room temperature after having reacted; Poured into by the reaction solution being cooled to room temperature in the centrifuge tube of 2 50 milliliters and again carry out centrifugation, collect the material of lower floor's gel state in centrifuge tube, upper liquid is carried out reclaiming treating for subsequent use on production line; To collect the material absolute ethanol washing in gel state, and transfer in rotary vacuum evaporator and carry out extraction copper nanoparticle when washing last, control vacuum is 0.08Mpa.
Embodiment 2
Get 50 milliliters of alkaline etching waste liquid for producing to load in the centrifuge tube of 2 25 milliliters, carry out centrifugal; Centrifugal complete after centrifuge tube supernatant liquid is poured in the beaker of 200 milliliters, add 8 grams of polyvinylpyrrolidones and 8 grams of softex kws as reactant A solution simultaneously; The B solution 50 milliliters of the hydrazine hydrate of preparation containing 0.5 mol/L, the NaOH of 0.5 mol/L, the polyethylene glycol of 1 mol/L; B solution poured in there-necked flask, regulating thermostatic bath temperature is at 90 DEG C, and open and stir, mixing speed, at about 200 revs/min, drips solution A in there-necked flask, takes out and be cooled to room temperature after having reacted; The reaction solution being cooled to room temperature is poured in the centrifuge tube of 2 50 milliliters and is carried out centrifugation, collects the material of lower floor's gel state in centrifuge tube, and upper liquid is carried out reclaiming treating for subsequent use on production line; To collect the material absolute ethanol washing in gel state, and transfer in rotary vacuum evaporator and carry out extraction copper nanoparticle when washing last, control vacuum is 0.08Mpa.
Example 3
Get 100 milliliters of alkaline etching waste liquid for producing to load in the centrifuge tube of 2 50 milliliters, carry out centrifugal; Centrifugal complete after centrifuge tube supernatant liquid is poured in the beaker of 200 milliliters, add 8 grams of polyvinylpyrrolidones and 8 grams of softex kws as reactant A solution simultaneously; The NaOH of preparation containing 0.25 mol/L hydration hydrazine, 1.0 mol/L gram, the B solution 50 milliliters of 2 mol/L polyethylene glycol; B solution poured in there-necked flask, regulating thermostatic bath temperature is at 90 DEG C, and open and stir, mixing speed, at about 200 revs/min, drips solution A in there-necked flask, takes out and be cooled to room temperature after having reacted; The reaction solution being cooled to room temperature is poured in the centrifuge tube of 3 50 milliliters and is carried out centrifugation, collects the material of lower floor's gel state in centrifuge tube, and upper liquid is carried out reclaiming treating for subsequent use on production line; To collect the material absolute ethanol washing in gel state, and transfer in rotary vacuum evaporator and carry out extraction copper nanoparticle when washing last, control vacuum is 0.08Mpa.
Above-described is only the preferred embodiment of the present invention, it should be pointed out that for the person of ordinary skill of the art, and without departing from the concept of the premise of the invention, can also make some distortion and improvement, these all belong to protection scope of the present invention.
Claims (1)
1. utilize alkaline etching waste liquid for producing printed circuit board to prepare a method for high-purity nano copper, it is characterized in that, it comprises the steps:
Get 45-50 milliliter alkaline etching waste liquid for producing to load in the centrifuge tube of 2 25 milliliters, carry out centrifugal; Centrifugal complete after centrifuge tube supernatant liquid is poured in the beaker of 200 milliliters, add 4-6 gram of polyvinylpyrrolidone and 4-6 gram of softex kw as reactant A solution simultaneously; The NaOH of preparation containing 0.08-0.12 mol/L hydration hydrazine, 0.4-0.6 mol/L gram, the B solution 40-60 milliliter of 0.8-1.2 mol/L polyethylene glycol; B solution poured in there-necked flask, regulating thermostatic bath temperature is at 70-90 DEG C, and open and stir, mixing speed, at 150-250 rev/min, drips solution A in there-necked flask, takes out and be cooled to room temperature after having reacted; Poured into by the reaction solution being cooled to room temperature in the centrifuge tube of 2 50 milliliters and again carry out centrifugation, collect the material of lower floor's gel state in centrifuge tube, upper liquid is carried out reclaiming treating for subsequent use on production line; To collect the material absolute ethanol washing in gel state, and transfer in rotary vacuum evaporator and carry out extraction copper nanoparticle when washing last, control vacuum is 0.08-0.09Mpa.
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| CN106077700A (en) * | 2016-07-13 | 2016-11-09 | 许勤峰 | A kind of method utilizing circuit board waste liquid to prepare Nanometer Copper catalysis slurry |
| CN106041122A (en) * | 2016-07-13 | 2016-10-26 | 许勤峰 | Method for preparing nanometre copper-catalyzed slurry by virtue of PCB acidic waste liquid |
| CN109536725B (en) * | 2019-01-14 | 2020-06-16 | 北京康普锡威科技有限公司 | Treatment method of waste etching liquid of printed circuit board, nano copper powder and preparation method thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102019430A (en) * | 2009-09-18 | 2011-04-20 | 福建师范大学福清分校 | Method for recovering copper from alkaline etching waste liquid and recycling alkaline etching liquid |
| CN102354571A (en) * | 2011-05-19 | 2012-02-15 | 广东成德电路股份有限公司 | Nano-copper conductive slurry preparation method by utilizing printed circuit board alkaline etching waste liquid |
| CN102557297A (en) * | 2011-12-31 | 2012-07-11 | 重庆重冶铜业有限公司 | Treatment method of waste liquid after cleaning copper plated layer of printed circuit board |
| CN102560500A (en) * | 2012-02-03 | 2012-07-11 | 昆山市洁驰环保科技发展有限公司 | Method for producing nanometer copper powder by use of waste alkaline etching solution which can be regenerated and apparatus thereof |
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- 2013-09-25 CN CN201310441610.0A patent/CN103480860B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102019430A (en) * | 2009-09-18 | 2011-04-20 | 福建师范大学福清分校 | Method for recovering copper from alkaline etching waste liquid and recycling alkaline etching liquid |
| CN102354571A (en) * | 2011-05-19 | 2012-02-15 | 广东成德电路股份有限公司 | Nano-copper conductive slurry preparation method by utilizing printed circuit board alkaline etching waste liquid |
| CN102557297A (en) * | 2011-12-31 | 2012-07-11 | 重庆重冶铜业有限公司 | Treatment method of waste liquid after cleaning copper plated layer of printed circuit board |
| CN102560500A (en) * | 2012-02-03 | 2012-07-11 | 昆山市洁驰环保科技发展有限公司 | Method for producing nanometer copper powder by use of waste alkaline etching solution which can be regenerated and apparatus thereof |
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