CN104548806A - Single crystal furnace vacuum filtering device and cleaning method thereof - Google Patents
Single crystal furnace vacuum filtering device and cleaning method thereof Download PDFInfo
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- CN104548806A CN104548806A CN201410817876.5A CN201410817876A CN104548806A CN 104548806 A CN104548806 A CN 104548806A CN 201410817876 A CN201410817876 A CN 201410817876A CN 104548806 A CN104548806 A CN 104548806A
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Abstract
The invention relates to the field of solar photovoltaic technology, and discloses a single crystal furnace vacuum filtering device. The single crystal furnace vacuum filtering device comprises a tank body, a cover, a gas inlet, a gas outlet, a cleaning port and a drain outlet, wherein the cover is arranged at the top of the tank body; the cleaning port is formed in the cover; the drain outlet is formed in the bottom of the tank body; the gas inlet and the gas outlet are formed in the tank body; a plurality of filter cores are arranged inside the tank body. The single crystal furnace vacuum filtering device provided by the invention performs blast cleaning on the filter cores by inflating high-speed gas through the cleaning port in the top of the tank body, and discharge dust through the drain outlet, so that the filtering device does not need to be detached for cleaning the filter cores; the single crystal furnace vacuum filtering device provided by the invention saves a lot of manpower and material resources, improves the utilization efficiency of a single crystal furnace, can conveniently clean the filter cores, and has the advantage of remarkable economic benefits.
Description
Technical field
The present invention relates to solar-photovoltaic technology field, particularly relate to a kind of single crystal growing furnace vacuum apparatus and method for cleaning, particularly a kind of filter efficiency is high, durable and can carry out single crystal growing furnace vacuum apparatus and the method for cleaning of filter core cleaning by convenience and high-efficiency.
Background technology
In monocrystalline silicon production process, a large amount of vaporization at high temperature things can be produced, vavuum pump is directly entered into as can not be effectively filtered and process, pumping fluid can be polluted, affect vacuum pump performance and safety, and the replacing of pumping fluid and waste oil disposal also very difficult, the decline of vavuum pump usefulness directly can affect again output and the product quality of single crystal growing furnace.Therefore, first filtration treatment must be carried out to the gas entering vavuum pump.
Current, filter is of a great variety, but the problem such as ubiquity filter efficiency is not high, scale removal process is complicated, filter core useful life is short, cause production cost to remain high.Many companies even do not use filter, and the service life of vavuum pump will be very short, needs often to change pumping fluid, complex procedures simultaneously.
In view of the defect of above-mentioned prior art, need to provide a kind of filter efficiency high, durable and single crystal growing furnace vacuum apparatus and the method for cleaning of filter core cleaning can be carried out by convenience and high-efficiency.
Summary of the invention
(1) technical problem that will solve
The technical problem to be solved in the present invention is that existing filter is of a great variety, but the problem such as ubiquity filter efficiency is not high, scale removal process is complicated, filter core useful life is short, cause production cost to remain high.Many companies even do not use filter, and the service life of pump will be very short, needs often to change pump oil, the problem of complex procedures simultaneously.
(2) technical scheme
In order to solve the problems of the technologies described above, a kind of single crystal growing furnace vacuum apparatus provided by the invention, it comprises: tank body, lid, air inlet, gas outlet, clean-up port and sewage draining exit, described lid is arranged at tank body top, described clean-up port is arranged on described lid, described sewage outfalls setting is in described tank base, and described air inlet and gas outlet are all arranged on described tank body, are provided with multiple filter core in described tank body.
Wherein, also comprise the card be arranged in described tank body, described card is provided with multiple flange, described flange is corresponding with described filter core to be arranged.
Wherein, the bottom of described tank body is taper.
Wherein, described filter core comprises filter mesh layer and supporting layer, and described filter mesh layer is looped around on described supporting layer, and the material of described filter core is metal.
Wherein, the entrance point of described air inlet is provided with filtering plate.
Wherein, described air inlet is communicated with single crystal growing furnace exhaust outlet.
Wherein, described gas outlet is connected with vavuum pump.
A kind of method for cleaning applying above-mentioned single crystal growing furnace vacuum apparatus that the present invention also provides, wherein, comprises the steps:
S1, close described air inlet and gas outlet, open described clean-up port, pass into gas and described filter core is jetted;
Dust after S2, winding-up falls into the bottom of described tank body, opens described sewage draining exit, is discharged by the dust after winding-up.
(3) beneficial effect
Technique scheme tool of the present invention has the following advantages: in single crystal growing furnace vacuum apparatus provided by the invention, lid is arranged at tank body top, clean-up port is arranged on lid, sewage outfalls setting is in tank base, and air inlet and gas outlet are all arranged on tank body, is provided with multiple filter core in tank body.Pass into high-speed gas by the clean-up port at tank body top in single crystal growing furnace vacuum apparatus provided by the invention and reverse blast cleaning is carried out to filter core, and sewage draining exit discharge dust.Just filter core can be cleared up without the need to dismantling filter.Single crystal growing furnace vacuum apparatus provided by the invention saves a large amount of manpower and materials, improves single crystal growing furnace utilization ratio, and easy cleaning filter core, there is the advantage of remarkable in economical benefits.
Accompanying drawing explanation
Fig. 1 is the top view of the single crystal growing furnace vacuum apparatus of the embodiment of the present invention;
Fig. 2 is the front schematic view of card in the single crystal growing furnace vacuum apparatus of the embodiment of the present invention.
In figure: 1: tank body; 2: lid; 3: air inlet; 4: gas outlet; 5: clean-up port; 6: sewage draining exit; 7: card; 8: filter core; 9: flange.
Detailed description of the invention
In describing the invention, except as otherwise noted, the implication of " multiple " is two or more; Term " on ", D score, "left", "right", " interior ", the orientation of the instruction such as " outward " or position relationship be based on orientation shown in the drawings or position relationship, only the present invention for convenience of description and simplified characterization, instead of indicate or imply that the machine of indication or element must have specific orientation, with specific azimuth configuration and operation, therefore can not be interpreted as limitation of the present invention.
In describing the invention, it should be noted that, unless otherwise clearly defined and limited, term " installation ", " being connected ", " connection " should be interpreted broadly, and such as, can be fixedly connected with, also can be removably connect, or connect integratedly; Can be mechanical connection, also can be electrical connection; Can be directly be connected, also indirectly can be connected by intermediary.For the ordinary skill in the art, concrete condition above-mentioned term concrete meaning in the present invention can be understood.
Below in conjunction with drawings and Examples, the specific embodiment of the present invention is described in further detail.Following examples for illustration of the present invention, but are not used for limiting the scope of the invention.
As shown in Figure 1, the single crystal growing furnace vacuum apparatus of the embodiment of the present invention, it comprises: tank body 1, lid 2, air inlet 3, gas outlet 4, clean-up port 5 and sewage draining exit 6, and lid 2 is arranged at tank body 1 top, clean-up port 5 is arranged on lid 2, and sewage draining exit 6 is arranged at bottom tank body 1.Sewage draining exit 6 can be connected to automatic dust gathering-device, realizes dust collection automation.Air inlet 3 and gas outlet 4 are all arranged on tank body 1, and in the present embodiment, air inlet 3 and gas outlet 4 are all arranged at the same side of tank body 1.Gas outlet 4 is connected with vavuum pump, and air inlet 3 is communicated with the exhaust outlet of single crystal growing furnace.Be provided with multiple filter core 8 in tank body 1, in the present invention, dust can be blocked in outer surface by filter core 8.Discharge clean gas after filtering and enter vavuum pump.
Multiple filter core 8 is adopted to ensure that larger filter area and enough continuous filtration working times in tank body 1.At furnace shutdown period, pass into gas by the clean-up port 5 at tank body 1 top and reverse blast cleaning is carried out to filter core 8, and sewage draining exit 6 discharging dust, just can clear up filter core without the need to dismantling tank body 1.Single crystal growing furnace vacuum apparatus provided by the invention saves a large amount of manpower and materials, improves single crystal growing furnace utilization ratio, and easy cleaning filter core 8, there is the advantage of remarkable in economical benefits.
The card 7 be arranged in tank body 1 is also comprised in single crystal growing furnace vacuum apparatus provided by the invention, card 7 is provided with multiple flange 9, flange 9 is corresponding with filter core 8 to be arranged, filter core 8 is provided with flange, flange on filter core 8 is fixedly connected with flange 9, filter core 8 is arranged on card 7 by flange 9, installs and firmly facilitates.Lid 2 is connected by dismountable flange, conveniently keeps in repair filter core 8 and changes.
Before and after filter core 8 filters, install bypass additional in the present embodiment, and controlled by valve switch, when unexpected Severe blockage or other fault appear in filter core 8, can bypass be opened, continue to maintain single crystal growing furnace normal operation circumstances, until this crystal-pulling completes.
Conveniently dust is discharged from sewage draining exit 6, and the bottom of tank body 1 single crystal growing furnace vacuum apparatus provided by the invention is taper.In the present embodiment, filter core 8 comprises filter mesh layer and supporting layer, and filter mesh layer is looped around on supporting layer, and the material of filter core 8 is metal, adopts stainless steel in the present embodiment.The filter core of metal material can withstand high temperatures high pressure, and filter core 8 array arranges and ensures enough filter areas, thus improves filter effect, prevents the dust in single crystal growing furnace from entering in vavuum pump, guarantees product quality.
The opening and closing of the air inlet 3 in the present embodiment, gas outlet 4, clean-up port 5 and sewage draining exit 6 can use hand-operated valve, also can be realized by electrically-controlled valve or Pneumatic valve, can realize Automatic clearance, saves manpower.In order to make filter effect better, the entrance point of the air inlet 3 in the present embodiment is provided with filtering plate.
The present invention applies the method for cleaning of above-mentioned single crystal growing furnace vacuum apparatus, comprises the steps:
S1, closedown air inlet 3 and gas outlet 4, open clean-up port 5, pass into high-speed gas and jet to filter core 8;
Dust after S2, winding-up falls into the bottom of tank body 1, opens sewage draining exit 6, is discharged by the dust after winding-up.
When single crystal growing furnace vacuum apparatus provided by the invention uses, open air inlet 3 and gas outlet 4, waste gas enters from air inlet 3, filtered by filter core 8 pairs of gases, finally discharge from gas outlet 4, need to close air inlet 3 and gas outlet 4 during cleaning filter core 8, open clean-up port 5, pass into gas at a high speed, oppositely jetted in filter core 8 surface.Open sewage draining exit 6, the solid dust nature be left out in filter core 8 surface is discharged by sewage draining exit 6.
In sum, the present invention has the following advantages: in single crystal growing furnace vacuum apparatus provided by the invention, lid is arranged at tank body top, and clean-up port is arranged on lid, and sewage outfalls setting is in tank base, air inlet and gas outlet are all arranged on tank body, are provided with multiple filter core in tank body.Pass into high-speed gas by the clean-up port at tank body top in single crystal growing furnace vacuum apparatus provided by the invention and reverse blast cleaning is carried out to filter core, and sewage draining exit discharge dust.Just filter core can be cleared up without the need to dismantling filter.Single crystal growing furnace vacuum apparatus provided by the invention saves a large amount of manpower and materials, improves single crystal growing furnace utilization ratio, and easy cleaning filter core, there is the advantage of remarkable in economical benefits.
Above embodiment only in order to technical scheme of the present invention to be described, is not intended to limit; Although with reference to previous embodiment to invention has been detailed description, those of ordinary skill in the art is to be understood that: it still can be modified to the technical scheme described in foregoing embodiments, or carries out equivalent replacement to wherein portion of techniques feature; And these amendments or replacement, do not make the essence of appropriate technical solution depart from the spirit and scope of various embodiments of the present invention technical scheme.
Claims (8)
1. a single crystal growing furnace vacuum apparatus, it is characterized in that, comprise: tank body (1), lid (2), air inlet (3), gas outlet (4), clean-up port (5) and sewage draining exit (6), described lid (2) is arranged at tank body (1) top, described clean-up port (5) is arranged on described lid (2), described sewage draining exit (6) is arranged at described tank body (1) bottom, described air inlet (3) and gas outlet (4) are all arranged on described tank body (1), multiple filter core (8) is provided with in described tank body (1).
2. single crystal growing furnace vacuum apparatus as claimed in claim 1, it is characterized in that: also comprise the card (7) be arranged in described tank body (1), described card (7) is provided with multiple flange (9), described flange (9) is corresponding with described filter core (8) to be arranged.
3. single crystal growing furnace vacuum apparatus as claimed in claim 1, is characterized in that: the bottom of described tank body (1) is taper.
4. single crystal growing furnace vacuum apparatus as claimed in claim 1, it is characterized in that: described filter core (8) comprises filter mesh layer and supporting layer, described filter mesh layer is looped around on described supporting layer, and the material of described filter core (8) is metal.
5. single crystal growing furnace vacuum apparatus as claimed in claim 1, is characterized in that: the entrance point of described air inlet (3) is provided with filtering plate.
6. single crystal growing furnace vacuum apparatus as claimed in claim 1, is characterized in that: described air inlet (3) is communicated with single crystal growing furnace exhaust outlet.
7. single crystal growing furnace vacuum apparatus as claimed in claim 1, is characterized in that: described gas outlet (4) are connected with vavuum pump.
8. application rights requires a method for cleaning for the single crystal growing furnace vacuum apparatus described in 1-7, it is characterized in that, comprises the steps:
S1, close described air inlet (3) and gas outlet (4), open described clean-up port (5), pass into gas and described filter core (8) is jetted;
Dust after S2, winding-up falls into the bottom of described tank body (1), opens described sewage draining exit (6), is discharged by the dust after winding-up.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410817876.5A CN104548806A (en) | 2014-12-24 | 2014-12-24 | Single crystal furnace vacuum filtering device and cleaning method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410817876.5A CN104548806A (en) | 2014-12-24 | 2014-12-24 | Single crystal furnace vacuum filtering device and cleaning method thereof |
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| CN104548806A true CN104548806A (en) | 2015-04-29 |
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| CN201410817876.5A Pending CN104548806A (en) | 2014-12-24 | 2014-12-24 | Single crystal furnace vacuum filtering device and cleaning method thereof |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105056646A (en) * | 2015-07-28 | 2015-11-18 | 侯继伟 | Automatic dust collector for vacuum tail gas of monocrystal silicon growing furnace |
| CN105442036A (en) * | 2015-12-02 | 2016-03-30 | 上海汉虹精密机械有限公司 | Monocrystalline silicon growth furnace vacuum supporting system |
| CN106669301A (en) * | 2016-09-13 | 2017-05-17 | 沈阳隆基电磁科技股份有限公司 | Vacuum dust removal equipment for single crystal growth furnace |
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| US20070028572A1 (en) * | 2005-01-11 | 2007-02-08 | Joint-Stock Company "Condor-Ecology | Filter |
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| CN202802978U (en) * | 2012-06-28 | 2013-03-20 | 郭丰亮 | Gas-solid separation device |
| CN202909561U (en) * | 2012-10-22 | 2013-05-01 | 陕西天宏硅材料有限责任公司 | Novel tail gas filtering device of polycrystalline silicon reduction furnace and thermal hydrogenation furnace |
| CN204429011U (en) * | 2014-12-24 | 2015-07-01 | 北京优势同翔科技有限公司 | A kind of single crystal growing furnace vacuum apparatus |
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2014
- 2014-12-24 CN CN201410817876.5A patent/CN104548806A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US20070028572A1 (en) * | 2005-01-11 | 2007-02-08 | Joint-Stock Company "Condor-Ecology | Filter |
| CN201168494Y (en) * | 2008-01-06 | 2008-12-24 | 贾守心 | Ultra-high molecular weight polyethylene filter |
| CN101717089A (en) * | 2009-12-01 | 2010-06-02 | 乐山乐电天威硅业科技有限责任公司 | Trichlorosilane synthesis gas gas-solid separating device |
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| CN202802978U (en) * | 2012-06-28 | 2013-03-20 | 郭丰亮 | Gas-solid separation device |
| CN102867558A (en) * | 2012-09-28 | 2013-01-09 | 清华大学 | Dusty gas filter |
| CN202909561U (en) * | 2012-10-22 | 2013-05-01 | 陕西天宏硅材料有限责任公司 | Novel tail gas filtering device of polycrystalline silicon reduction furnace and thermal hydrogenation furnace |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105056646A (en) * | 2015-07-28 | 2015-11-18 | 侯继伟 | Automatic dust collector for vacuum tail gas of monocrystal silicon growing furnace |
| CN105442036A (en) * | 2015-12-02 | 2016-03-30 | 上海汉虹精密机械有限公司 | Monocrystalline silicon growth furnace vacuum supporting system |
| CN106669301A (en) * | 2016-09-13 | 2017-05-17 | 沈阳隆基电磁科技股份有限公司 | Vacuum dust removal equipment for single crystal growth furnace |
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Application publication date: 20150429 |
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