CN104498219A - Formula of rust remover for solar silicon wafer - Google Patents

Formula of rust remover for solar silicon wafer Download PDF

Info

Publication number
CN104498219A
CN104498219A CN201410846928.1A CN201410846928A CN104498219A CN 104498219 A CN104498219 A CN 104498219A CN 201410846928 A CN201410846928 A CN 201410846928A CN 104498219 A CN104498219 A CN 104498219A
Authority
CN
China
Prior art keywords
parts
rust remover
solar silicon
silicon wafers
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201410846928.1A
Other languages
Chinese (zh)
Inventor
聂金根
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ZHENJIANG GANGNAN ELECTRIC CO Ltd
Original Assignee
ZHENJIANG GANGNAN ELECTRIC CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ZHENJIANG GANGNAN ELECTRIC CO Ltd filed Critical ZHENJIANG GANGNAN ELECTRIC CO Ltd
Priority to CN201410846928.1A priority Critical patent/CN104498219A/en
Publication of CN104498219A publication Critical patent/CN104498219A/en
Pending legal-status Critical Current

Links

Landscapes

  • Detergent Compositions (AREA)

Abstract

The invention provides a formula of a rust remover for a solar silicon wafer. The rust remover comprises the following components in parts by weight: 50-100 parts of a reducing agent, 20-50 parts of sodium hydroxide, 20-60 parts of a preservative, 10-50 parts of sodium carbonate, 30-50 parts of anhydrous sodium silicate, 10-60 parts of calcium chloride, 10-50 parts of propylene glycol monomethyl ether and 50-150 parts of water. The rust remover is convenient to prepare, low in cost, free of hazards, capable of saving water, incapable of injuring hand, safe and simple in cleaning process, good in cleaning effect and little in influences to hygiene and health of human beings.

Description

A kind of rust remover formula of solar silicon wafers
Technical field
The present invention relates to industry cleaning link field, particularly relate to a kind of clean-out system field of solar silicon wafers.
Background technology
The cleaning of solar silicon wafers refers to that cleaning silicon chip surface is subject to physics, chemistry or biological effect and the pollution layer that formed or tectum make it recover the process of original surface.The cleaning of solar silicon wafers has energy-conservation, consumption reduction, water saving, safety, stable yields, improves the quality of products, faster production, extension device work-ing life, reduce the effects such as environmental pollution and specious and human health.Current solar silicon wafers can produce dirt for a long time, as cleaned not in time, can affect products production, and most of clean-out system tool toxic substance, easily corrodes skin simultaneously.
Summary of the invention
The object of this invention is to provide a kind of rust remover formula of solar silicon wafers, solve the problem that existing clean-out system easily corrodes skin.
Object of the present invention can be achieved through the following technical solutions;
A rust remover formula for solar silicon wafers, comprises following component by weight;
Reductive agent 20-50 part
Hydrochloric acid 30-80 part
Wilkinite 20-30 part
Phosphoric acid 30-90 part
Anhydrous sodium metasilicate 30-50 part
Calcium chloride 10-60 part
Hexamethylenetetramine 10-50 part
Water 300-500 part.
The rust remover formula of above-mentioned a kind of solar silicon wafers, wherein, preferably, its composition is counted as follows by weight:
Reductive agent 20 parts
Hydrochloric acid 40 parts
Wilkinite 20 parts
Phosphoric acid 60 parts
Anhydrous sodium metasilicate 30 parts
10 parts, calcium chloride
Hexamethylenetetramine 15 parts
300 parts, water.
The rust remover formula of above-mentioned a kind of solar silicon wafers, wherein, described reductive agent is 1:2 with the weight fraction ratio of hydrochloric acid.
The rust remover formula of above-mentioned a kind of solar silicon wafers, wherein, described wilkinite is 1:3 with the weight fraction ratio of phosphoric acid.
The rust remover formula of above-mentioned a kind of solar silicon wafers, wherein, described anhydrous sodium metasilicate is 1:10 with the weight fraction ratio of water.
The rust remover formula of above-mentioned a kind of solar silicon wafers, wherein, described calcium chloride compares 2:3 with the weight fraction of hexamethylenetetramine.
The beneficial effect of this programme:
The rust remover formula of a kind of solar silicon wafers provided by the invention, configuration is convenient, and cost is low, and without harm, water saving, do not hinder hand, cleaning process is safe and simple, and cleaning performance is good, affects little on human health.
Embodiment
Embodiment 1: a kind of rust remover formula of solar silicon wafers, comprises following component by weight;
Reductive agent 20 parts
Hydrochloric acid 40 parts
Wilkinite 20 parts
Phosphoric acid 60 parts
Anhydrous sodium metasilicate 30 parts
10 parts, calcium chloride
Hexamethylenetetramine 15 parts
300 parts, water.
Embodiment 2: a kind of rust remover formula of solar silicon wafers, comprises following component by weight;
Reductive agent 30 parts
Hydrochloric acid 60 parts
Wilkinite 25 parts
Phosphoric acid 75 parts
Anhydrous sodium metasilicate 40 parts
12 parts, calcium chloride
Hexamethylenetetramine 18 parts
400 parts, water.
Embodiment 3: a kind of rust remover formula of solar silicon wafers, comprises following component by weight;
Reductive agent 40 parts
Hydrochloric acid 80 parts
Wilkinite 30 parts
Phosphatase 79 0 part
Anhydrous sodium metasilicate 50 parts
16 parts, calcium chloride
Hexamethylenetetramine 48 parts
500 parts, water.
The rust remover formula of a kind of solar silicon wafers provided by the invention, configuration is convenient, and cost is low, and without harm, water saving, do not hinder hand, cleaning process is safe and simple, and cleaning performance is good, affects little on human health.
The above; be only the present invention's preferably embodiment, but protection scope of the present invention is not limited thereto, is anyly familiar with those skilled in the art in the technical scope that the present invention discloses; the change that can expect easily or replacement, all should be encompassed in protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of claims.

Claims (6)

1. a rust remover formula for solar silicon wafers, is characterized by, and comprises following component by weight;
Reductive agent 20-50 part
Hydrochloric acid 30-80 part
Wilkinite 20-30 part
Phosphoric acid 30-90 part
Anhydrous sodium metasilicate 30-50 part
Calcium chloride 10-60 part
Hexamethylenetetramine 10-50 part
Water 300-500 part.
2. the rust remover formula of a kind of solar silicon wafers as claimed in claim 1, is characterized by, and preferably, its composition is counted as follows by weight:
Reductive agent 20 parts
Hydrochloric acid 40 parts
Wilkinite 20 parts
Phosphoric acid 60 parts
Anhydrous sodium metasilicate 30 parts
10 parts, calcium chloride
Hexamethylenetetramine 15 parts
300 parts, water.
3. the rust remover formula of a kind of solar silicon wafers as claimed in claim 1, is characterized by, and described reductive agent is 1:2 with the weight fraction ratio of hydrochloric acid.
4. the rust remover formula of a kind of solar silicon wafers as claimed in claim 1, is characterized by, and described wilkinite is 1:3 with the weight fraction ratio of phosphoric acid.
5. the rust remover formula of a kind of solar silicon wafers as claimed in claim 1, is characterized by, and described anhydrous sodium metasilicate is 1:10 with the weight fraction ratio of water.
6. the rust remover formula of a kind of solar silicon wafers as claimed in claim 1, is characterized by, and described calcium chloride compares 2:3 with the weight fraction of hexamethylenetetramine.
CN201410846928.1A 2014-12-31 2014-12-31 Formula of rust remover for solar silicon wafer Pending CN104498219A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410846928.1A CN104498219A (en) 2014-12-31 2014-12-31 Formula of rust remover for solar silicon wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410846928.1A CN104498219A (en) 2014-12-31 2014-12-31 Formula of rust remover for solar silicon wafer

Publications (1)

Publication Number Publication Date
CN104498219A true CN104498219A (en) 2015-04-08

Family

ID=52939674

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410846928.1A Pending CN104498219A (en) 2014-12-31 2014-12-31 Formula of rust remover for solar silicon wafer

Country Status (1)

Country Link
CN (1) CN104498219A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104967071A (en) * 2015-05-11 2015-10-07 江苏士林电气设备有限公司 Novel bus bridge stand
CN104962928A (en) * 2015-05-11 2015-10-07 江苏士林电气设备有限公司 Bus bridge stand rust remover formula preparation method
CN106336953A (en) * 2016-08-24 2017-01-18 安徽正田能源科技有限公司 Acidic ultrasonic cleaning agent for cleaning of silicon wafers
CN106350241A (en) * 2016-08-24 2017-01-25 安徽正田能源科技有限公司 Mixed ultrasonic wave cleaning agent for silicon chip cleaning
CN106350269A (en) * 2016-08-24 2017-01-25 安徽正田能源科技有限公司 Silicon wafer surface stain decomposition agent and processing method thereof

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1097473A (en) * 1993-07-12 1995-01-18 王国辉 Metal cleaning agent for preventing rust
CN102677071A (en) * 2011-03-11 2012-09-19 镇江市欣泰化工物资有限公司 Metal cleaner
CN103103533A (en) * 2012-11-13 2013-05-15 铜陵祥云消防科技有限责任公司 Gas-phase antirust agent containing modified nanometer bentonite
CN103525591A (en) * 2013-10-21 2014-01-22 柳州鑫磊科技有限公司 Environment-friendly cleaning agent
CN103820805A (en) * 2012-11-16 2014-05-28 季爱英 Rust removal cleaning agent
CN104005037A (en) * 2014-06-08 2014-08-27 陈建宝 Metal antirust cleaning agent

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1097473A (en) * 1993-07-12 1995-01-18 王国辉 Metal cleaning agent for preventing rust
CN102677071A (en) * 2011-03-11 2012-09-19 镇江市欣泰化工物资有限公司 Metal cleaner
CN103103533A (en) * 2012-11-13 2013-05-15 铜陵祥云消防科技有限责任公司 Gas-phase antirust agent containing modified nanometer bentonite
CN103820805A (en) * 2012-11-16 2014-05-28 季爱英 Rust removal cleaning agent
CN103525591A (en) * 2013-10-21 2014-01-22 柳州鑫磊科技有限公司 Environment-friendly cleaning agent
CN104005037A (en) * 2014-06-08 2014-08-27 陈建宝 Metal antirust cleaning agent

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104967071A (en) * 2015-05-11 2015-10-07 江苏士林电气设备有限公司 Novel bus bridge stand
CN104962928A (en) * 2015-05-11 2015-10-07 江苏士林电气设备有限公司 Bus bridge stand rust remover formula preparation method
CN106336953A (en) * 2016-08-24 2017-01-18 安徽正田能源科技有限公司 Acidic ultrasonic cleaning agent for cleaning of silicon wafers
CN106350241A (en) * 2016-08-24 2017-01-25 安徽正田能源科技有限公司 Mixed ultrasonic wave cleaning agent for silicon chip cleaning
CN106350269A (en) * 2016-08-24 2017-01-25 安徽正田能源科技有限公司 Silicon wafer surface stain decomposition agent and processing method thereof

Similar Documents

Publication Publication Date Title
CN104498219A (en) Formula of rust remover for solar silicon wafer
WO2011138719A3 (en) Highly concentrated caustic block for ware washing
CN106591851A (en) Automobile casting part cleaning treatment liquid
CN104498231A (en) Formula of detergent for solar silicon wafer
WO2011138720A3 (en) Use of a soluble lithium salt as a glass etching inhibitor
CN103409760B (en) Environmental protection rust removing and rust resistance cleaning agent and preparation method thereof
CN102744230A (en) Cleaning method for dirty and stuck solar silicon chip
CN104028503B (en) The cleaning method of silicon material
CN104593788A (en) Harmless rust remover formula for industrial cleaning
CN104862093A (en) Acid ultrasonic cleaning agent
MX2016001818A (en) Cleansing wipes.
CN104498218A (en) Preparation method of cleaning agent for solar silicon wafer
MX2018013974A (en) Cleaning compositions for use with calcite-based stone.
CN104531391A (en) Preparation method for rust remover of solar silicon wafer
TW201612307A (en) Cleaning solution for photo-resist and use of cleaning solution for removal of photo-resist etching residues
CN108611195A (en) A kind of mechanical equipment detergent
CN104513729A (en) Low-cost non-toxic industrial cleaning detergent formulation
CN103173772A (en) Rust/oil removing agent
WO2011031092A3 (en) Cleaning solution composition for substrate for preparation of flat panel display
CN105502694A (en) Scale remover for water cooling equipment
CN102151670A (en) Method for cleaning and drying glass sheet
CN106590965A (en) Smooth treatment agent for automobile processing materials
CN102048492B (en) Glass anti-fogging cleaning towel
CN108018130A (en) A kind of use in toilet cleaning agent
CN104403810A (en) Efficient and environment-friendly floor oil cleaning agent

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20150408