CN104411081A - Linear array micro-nano focus X-ray source for micro-nano CT (computer tomography) system - Google Patents
Linear array micro-nano focus X-ray source for micro-nano CT (computer tomography) system Download PDFInfo
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Abstract
The linear array micro-nano focus X-ray source for a micro-nano CT system. The linear array micro-nano focus X-ray source for the micro-nano CT system comprises cathodes 2, grids 3, anodes 4, focusing electrodes 5, magnetic solenoids 7, deflecting electrodes 8 and a target 9; the cathodes are used for producing electrons, the anodes are used for electron acceleration, the grids are arranged between the anodes and the cathodes and used for adjusting beam intensity of electron emitted by the cathodes, the focusing electrodes are used for completing first-time focusing of accelerated electrons, the magnetic solenoids are used for completing second-time focusing of the electrons, and the deflecting electrodes are used for controlling the position that the electrons hit on the target. By means of the linear array micro-nano focus X-ray source for the micro-nano CT system, static CT scanning can be achieved, namely, a radiation source, an object to be detected and a detector are all in a static state, electron beam scanning substitutes for mechanical scanning, thus error caused by mechanical scanning can be avoided, small external disturbance, small size, light weight and fast detection speed can be obtained, and linear array micro-nano focus X-ray source for the micro-nano CT system can be applied to CT systems of different types.
Description
Technical field
The present invention relates to a kind of linear array micro-nano focal spot x-ray source apparatus, especially a kind of linear array micro-nano focus X-ray source for micro-nano CT system
Background technology
Traditional microfocus X-ray source, focus generally only has 1, and for the quick dynamic digital image-forming detecting system of micro-nano Microsecond grade that the fields such as biology, medical science require, traditional microfocus X-ray source performance can not meet its requirement.Current microfocus X-ray source generally only has 1 focus, when for micro-nano CT system, there is following shortcoming: general micro-nano CT system continues many hours usually with the scanning of the whole X ray projections required for high resolution reconstruction, so, the same position of target layer can produce a large amount of heat, and this may cause metallic target fusing even to burn; Secondly, what the Microfocus X-ray CT system of 1 focus adopted is mechanical scanning, will inevitably introduce machine error like this, affect the performance index such as the resolution of CT system.
Summary of the invention
Technical problem: the object of the present invention is to provide a kind of linear array micro-nano focus X-ray source for micro-nano CT system, this linear array micro-nano focus X-ray source may be used in micro-nano CT system, adopt electronic scanning technique, the scanning of electricity consumption signal controlling electron beam replaces the mechanical scanning in conventional CT system, reduce error and the time of scanning, improve the precision of systems axiol-ogy.
For solving the problems of the technologies described above, the invention provides following technical scheme:
The invention provides a kind of in the linear array micro-nano focus X-ray source of micro-nano CT system, it is characterized in that: comprise negative electrode 2, grid 3, anode 4, focusing electrode 5, magnetic solenoid 7, deflecting electrode 8 and target 9; Described negative electrode is for generation of electronics, and described anode is used for Accelerating electron; Described grid is arranged between the anode and the cathode, for regulating the electronic beam current intensity of cathode emission; Described focusing electrode focuses on for completing the first time of the electronics after acceleration, and described magnetic solenoid focuses on for the second time completing electronics, and described deflecting electrode gets to position on target for controlling electronics.
Further, described x-ray source is contained in shell 1, and described shell is used for isolated air.
Further, the voltage put on deflecting electrode is sawtooth voltage, by adding continuous deflecting voltage to electron beam, making electron beam continuous sweep on x-ray target, realizing the continuous sweep of x-ray focus on x-ray target.
Further, described negative electrode adopts field electron emission materials.
Further, described negative electrode adopts the mode electron emission of sequential filming.
Further, the voltage between described anode and negative electrode is 20 ~ 160KV.
Compared to existing technology, linear array micro-nano focal spot x-ray source apparatus provided by the invention has following advantage: linear array micro-nano focus X-ray source provided by the invention adopts electronic scanning technique, by the Time share scanning of electron beam, realize the scanning of X ray Microfocus X-ray on ray target, thus the mechanical scanning that instead of in traditional CT, avoid the error that mechanical scanning brings; When electron beam due to high-intensity high-density is got on ray target, a large amount of heat can be produced, by controlling electron beam Time share scanning, thus not in the same time electron beam get to the diverse location on ray target, and then improve radiating efficiency, prevent the temperature of ray target too high; Control focus by electron beam scanning to scan on metallic target, can sweep time be reduced, in medical treatment, during the field application such as safety check, reduce the radiation dose that human body bears; Adopt Field Electron Emission negative electrode, controllability is good, and without the need to heated cathode, instantaneous transmission, by regulating grid voltage, can control electron emission quantity, thus control valve size of current.
Accompanying drawing explanation
When reading specification by reference to the accompanying drawings, structure and the various feature and advantage of described linear array micro-nano focal spot x-ray source apparatus will become easy to understand more, wherein:
Fig. 1 is the overall schematic of the linear array micro-nano focal spot x-ray source apparatus according to preferred embodiment of the present invention;
Fig. 2 is linear array micro-nano focus X-ray source electronic scanning schematic diagram;
Fig. 3 is sawtooth voltage waveform figure added by deflecting electrode;
Fig. 4 is according to micro-nano focus of the present invention radiogenic point-like tandem target structure figure;
Fig. 5 is that electron beam incides dot matrix target generation X ray schematic diagram;
Fig. 6 is that the X-ray intensity that target spot and target base produce contrasts schematic diagram;
Fig. 7 is electronics bremstrahlen schematic diagram;
Fig. 8 is the X ray conversion capability comparison diagram of tungsten, diamond, beryllium material.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, be described in detail the technical scheme in the embodiment of the present invention, obviously, described embodiment is only a part of embodiment of the present invention, instead of whole embodiments.Based on the embodiment in the present invention, the every other embodiment that those of ordinary skill in the art obtain under the prerequisite not making creative work, all belongs to the scope of protection of the invention.
The present invention relates to a kind of linear array micro-nano focal spot x-ray source apparatus, especially a kind of linear array micro-nano focus X-ray source for micro-nano CT system.
A kind of linear array micro-nano focus X-ray source 13 for micro-nano CT system, this x-ray source 13 comprises the negative electrode 2 for generation of electronics, the anode 4 to Accelerating electron, regulate negative electrode 2 and the grid 3 of electron amount between anode 4, Electron Beam Focusing is become the focusing electrode 5 of small bore, high density electron beam 6 and magnetic solenoid 7, target 9, accurately controls electron beam and get to the deflecting electrode 8 of target 9 assigned address and be the shell 1 that x-ray source 13 completely cuts off air.
Described focusing electrode focused on for the first time of electronics, and described magnetic solenoid focuses on for the second time of electronics, and the electronics that negative electrode sends is got on target after twice focusing, thus made target send ray 11.
The employing electronic scanning technique of this x-ray source novelty, makes radiation focus point position accurately to control, and realizes the linear array scanning of x-ray source focus, replaces the mechanical scanning in traditional CT, avoid the error that mechanical scanning brings; Heat dispersion is also 1-2 times of general x-ray source simultaneously.
In above-mentioned x-ray source, the voltage of described deflecting electrode 8 is accurately controlled by control system, thus electron beam is got to the position realization accurately control of x-ray target 9, by the Time share scanning of electron beam, realize the scanning of X ray Microfocus X-ray on x-ray target 9, replace the mechanical scanning in traditional CT on the one hand, avoid the error that mechanical scanning brings; On the other hand, when electron beam due to high-intensity high-density is got on x-ray target 9, a large amount of heat can be produced, by controlling electron beam Time share scanning, thus not in the same time electron beam get to the diverse location on x-ray target 9, and then raising radiating efficiency, reduce over the impact that high-temperature brings x-ray source.
As preferably, deflecting electrode 8 adopts sawtooth voltage, as Fig. 3, adds continuous deflecting voltage to electron beam, makes electron beam continuous sweep on x-ray target 9, realizes the continuous sweep of x-ray focus on x-ray target.Add sawtooth waveforms deflecting voltage first to deflecting electrode 8, then negative electrode starts electron emission, thus forms the electron beam of continuous sweep, and continuous sweep on x-ray target, realizes the continuous sweep of focus.
In some embodiments, deflecting electrode 8 can adopt discontinuous mode, by position fixing on fixed voltage scanning x-ray target 9, form relation one to one, concrete steps are: first the voltage of deflecting electrode 8 be transferred to a voltage and keep, then negative electrode 2 electron emission is by accelerating, focus on, get on x-ray target 9 after deflection, produce X ray 11 pairs of detected materials 10 and carry out imaging, after imaging is complete, negative electrode 2 stops electron emission, regulate deflecting electrode 8 voltage to next fixing magnitude of voltage, negative electrode 2 starts electron emission, the position on x-ray target corresponding to this fixed voltage 9 is got to through same process, so go down, until the focus imaging of all positions is complete, realize the pulse scanning of focus.
In above-mentioned x-ray source 13, described negative electrode 2 adopts Field Electron Emission negative electrode, and such as carbon nanometer cathode, Graphene negative electrode etc., overcome the shortcomings of conventional hot-cathode, substantially increase the emission density of electric current simultaneously, thus the X ray of high strength can be produced.Also to have energy consumption low in Field Electron Emission source in addition, fast the advantage such as startup.
As preferably, negative electrode 2 takes sequential filming electronics, for the continuous sweep of electron beam provides condition.
In some embodiments, negative electrode 2 also can adopt impulse ejection.
In above-mentioned x-ray source 13, making alive between described grid 3 and negative electrode 2, accurately controls and regulates size of current between negative electrode 2 and anode 4.
In above-mentioned x-ray source 13, high voltage between described anode 4 and negative electrode 2, between 20 ~ 160KV, by Accelerating electron to high level, makes final electronics high velocity bombardment x-ray target 9, produces X ray.
In above-mentioned x-ray source 13, described magnetic solenoid 7 adopts electromagnetic lens principle will focus the electrons into small bore, highdensity electron beam, thus can form the x-ray focus of micron or submicron-scale on x-ray target.
In above-mentioned x-ray source 13, described shell 1 adopts good airproof performance, is not easy the alloys such as damaged material such as Stainless Steel and makes.
In the present embodiment, the structure of target as shown in Figure 4, the point-like tandem target spot that described target 9 comprises target base 15 and is arranged on target base, described point-like tandem target spot comprises several point-like target spots 14, several point-like target spots are spaced by certain distance, point-like target array is point-like in-line configuration, and its effect is that the electron energy of incidence is converted into X-ray energy, forms the X ray effective focal spot of micro-nano size.Described target spot is converted into the ability of X ray much larger than target base, and the effect of target base is fixing target spot, has enough intensity isolation X-ray tube inner vacuum simultaneously.
Described target spot is rectangular-shaped, and its high H is 5 ~ 10 μm, and width d and length w designs according to the size of penetrating source effective focal spot, can reach submicron order.Target spot quantity will design according to radiographic source effective focal spot number needs, can be 1,2, can cause 1024 or more.
As the further optimization to the present embodiment, the distance between two target spots is greater than 10 ~ 15 times of target spot length w value.
As the further optimization to the present embodiment, the thickness D of described target base is 200 ~ 300 μm, also can require design according to radiographic source vacuum requirement, target size etc.
As the further optimization to the present embodiment, the electron beam bore inciding target surface can be greater than the size 2 ~ 4 times of target spot length w.
Electron beam 3 in x-ray source obtains very large kinetic energy under the effect of high voltage electric field, fly to target surface at a high speed, due to the inhibition of target surface, make electronics abrupt deceleration, the energy major part of loss is converted into heat, sub-fraction then radiates with X-ray form, namely the bremsstrahlung effect of electronics, as Fig. 7.Bremsstrahlung intensity I
radapproximate representation is:
In formula, Z is target atom ordinal number, and z is incoming charged particles atomic number, and electronics z=-1, e are electron charge.(1) formula illustrate, electron impact on target surface, the X-ray transformation efficiency of target and target atom ordinal number Z
2be directly proportional.
Therefore, target spot selects the material of high atomic number, highdensity target, as tungsten, tantalum, molybdenum, gold etc., to improve X ray yield.The material of low-density, low atomic number selected by target base, as beryllium, diamond.Relative to target spot, it is very low that target sill produces X ray 18 intensity.As in Fig. 6, the X ray 17 that target spot produces forms very strong peak value, and the X-ray intensity that target sill produces is relatively low.Therefore, the width being the X-ray beam intensity peak that effective focal spot produces with target spot of x-ray source.Fig. 8 is for utilizing Monte-Carlo Simulation software EGSnrc simulation result, show in figure, the X-ray intensity 10% that the tungsten target that the beryllium of 250 μm, the X-ray intensity of 10 μm of diamond generations are less than 10 μm produces, and being mainly low energy X ray, this this x-ray photon is easy to be filtered sheet and filters out.Therefore, based on above-mentioned principle, the X ray Effective focus size that point-like tandem target structure of the present invention produces can be approximately equal to target spot size.
Prepare the method for the present embodiment target 9: adopt the methods such as punching press, flow casting molding, sintering to prepare target layer; On target layer upper surface print, sintering or plated film, photoetching mode in target layer material, prepare target spot.
Target described in the present embodiment, due to target spot high density, high atomic number material its be converted into the target sill of ability much larger than low-density low atomic number of X ray, thus radiogenic Effective focus size determines primarily of the size of target spot, do not contact directly with beam cross section is long-pending, be conducive to forming multifocal array that is stable, micro-nano size, greatly reducing the requirement to Electron Beam Focusing size, scan deflection precision controlling etc., providing a feasible approach for realizing sub-micron even the linear array multifocal radiographic source of nanoscale focal spot size.Optionally, can by arranging target structures, the size of different size, the corresponding energy optimizing electron beam, realizes the radiographic source of requirement of different focal spot size, different characteristic spectral line, to meet different ray detection demands.
The foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, obviously, those skilled in the art can carry out various change and modification to the present invention and not depart from the spirit and scope of the present invention.Like this, if these amendments of the present invention and modification belong within the scope of the claims in the present invention and equivalent technologies thereof, then the present invention is also intended to comprise these change and modification.
Claims (6)
1. for the linear array micro-nano focus X-ray source of micro-nano CT system, it is characterized in that: comprise negative electrode (2), grid (3), anode (4), focusing electrode (5), magnetic solenoid (7), deflecting electrode (8) and target (9); Described negative electrode is for generation of electronics, and described anode is used for Accelerating electron; Described grid is arranged between the anode and the cathode, for regulating the electronic beam current intensity of cathode emission; Described focusing electrode focuses on for completing the first time of the electronics after acceleration, and described magnetic solenoid focuses on for the second time completing electronics, and described deflecting electrode gets to position on target for controlling electronics.
2. the linear array micro-nano focus X-ray source for micro-nano CT system according to claim 1, is characterized in that: described x-ray source is contained in shell (1), and described shell is used for isolated air.
3. the array microfocus X-ray source for micro-nano CT system according to claim 1, it is characterized in that: the voltage put on deflecting electrode is sawtooth voltage, by adding continuous deflecting voltage to electron beam, make electron beam continuous sweep on x-ray target, realize the continuous sweep of x-ray focus on x-ray target.
4. the array microfocus X-ray source for micro-nano CT system according to claim 1, is characterized in that: described negative electrode adopts field electron emission materials.
5. the array microfocus X-ray source for micro-nano CT system according to claim 1, is characterized in that: described negative electrode adopts the mode electron emission of sequential filming.
6. the array microfocus X-ray source for micro-nano CT system according to claim 1, is characterized in that: the voltage between described anode and negative electrode is 20 ~ 160KV.
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| WO2020001276A1 (en) * | 2018-06-29 | 2020-01-02 | 北京纳米维景科技有限公司 | Scanning-type x-ray source and imaging system therefor |
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| WO2020001276A1 (en) * | 2018-06-29 | 2020-01-02 | 北京纳米维景科技有限公司 | Scanning-type x-ray source and imaging system therefor |
| CN109192642A (en) * | 2018-08-30 | 2019-01-11 | 中国科学院国家空间科学中心 | A kind of pulsar X-ray simulation source radiating coherence |
| CN113039625A (en) * | 2018-11-05 | 2021-06-25 | 伊克斯拉姆公司 | Mechanical alignment of an X-ray source |
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Application publication date: 20150311 |