CN104404472B - A kind of magnetron sputtering plating vacuum chamber temperature control door and application process - Google Patents
A kind of magnetron sputtering plating vacuum chamber temperature control door and application process Download PDFInfo
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- CN104404472B CN104404472B CN201410737865.6A CN201410737865A CN104404472B CN 104404472 B CN104404472 B CN 104404472B CN 201410737865 A CN201410737865 A CN 201410737865A CN 104404472 B CN104404472 B CN 104404472B
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Abstract
A kind of magnetron sputtering plating vacuum chamber temperature control door and application process, be by：Temperature control door, long heating module, long heating module positive pole, long heating module negative pole, rectangle heating module, both positive and negative polarity input/output port, locator are constituted；The structure and its method of heating are simple, and rationally, easy to use, operation is easily quick for design science；Ensure in Large Scale and Continuous production indium oxide tin film, by controlling the heating-up temperature at each position to magnetron sputtering magnetically supported vehicle target, ito thin film is obtained the resistance that justifying has good uniformity, resistivity reaches 2 × 10‑4 Ω/cm, transmitance reach more than 90%；The product quality of ito thin film is significantly improved, operating efficiency is greatly improved, production cost is saved, increase the service life more than 2 times, energy-conserving and environment-protective.
Description
Technical field
The present invention relates to ito film heater, especially a kind of magnetron sputtering plating vacuum chamber temperature control door and application process.
Background technology
ITO nesa coating is doping indium and tin oxide film, and abbreviation ito thin film is Indium Tin Oxide contracting
Write.Ito thin film is a kind of n-type semiconductor, and it has many excellent physics, chemical property, such as higher visible ray
Transmitance and conductance, have a good tack with most of substrate, stronger hardness and good antiacid, alkali and organic molten
Agent ability, therefore, is widely used in photoelectric device.Such as：Liquid crystal display (LCD), plasma display (PDP), electricity
Pole is given out light display (EL/OLED), touch-screen, in solar cell and other electronic instruments.
At present, the preparation method of ito thin film is a lot, common are：It is spraying process, vacuum vapor deposition method, chemical vapor deposition, anti-
Answer ion implanting and magnetron sputtering etc..In these preparation methods, it is most common that current magnetron sputtering method is.Due to magnetic
Control sputtering has good controllability and is easily obtained the uniform film of large area, therefore is widely used in display device
The preparation of ito thin film.Magnetron sputtering prepares ito thin film, mainly uses direct current (DC) power supply in Ar sputter gas and abundant oxygen
Change in Ar/O2 mixed gas and produce plasma, In-Sn alloys targets or In2O3, SnO2 oxide target or ceramic target are banged
Hit, to obtain ito thin film on various substrates.In preparation process condition such as target Theil indices, sedimentation rate, underlayer temperature,
Sputtering power and subsequent anneal processing, all the photoelectric characteristic to ito thin film has significant effect；But, existing technology is in glass
Low temperature preparation ito thin film poor optical properties on glass substrate, not exclusively, structure is imperfect for film oxidation；Especially to temperature not of the same race
Ito thin film crystal structure and resistance under the conditions of degree, it is impossible to which accurately and effectively regulation controls temperature to control the uniformity of resistance,
Reduce the product quality of ito thin film, and production operating efficiency, add production cost, influence display and instrument
Service life；It is the bottleneck in the production development of this area, it is impossible to meet the demand in user and market.
In view of the foregoing, existing ito thin film heater and its method need innovation.
The content of the invention
The invention aims to overcome deficiency of the prior art, there is provided a kind of magnetron sputtering plating vacuum chamber temperature control
Door and application process, the structure and its method of heating are simple, and rationally, easy to use, operation is easily quick for design science；Ensure
In Large Scale and Continuous production indium oxide tin film, by controlling the heating-up temperature at each position to magnetron sputtering magnetically supported vehicle target, make
Ito thin film obtains the resistance that justifying has good uniformity, and resistivity reaches that 2 × 10-4 Ω/cm, transmitance reach more than 90%；It is bright
The aobvious product quality for improving ito thin film, greatly improves operating efficiency, saves production cost, increases the service life more than 2 times, saves
Can environmental protection.
The present invention to achieve these goals, is adopted the following technical scheme that：A kind of magnetron sputtering plating vacuum chamber temperature control door
And application process, be by：Temperature control door, long heating module, long heating module positive pole, long heating module negative pole, rectangle heating module,
Both positive and negative polarity input/output port, locator are constituted；The vertically arranged long heating module group in middle part of temperature control door side, long heating module group
Both sides be symmetrical arranged long a pair heating module, be symmetrical arranged a pair of rectangles between long a pair heating module and long heating module group
Heating module group.
Described long heating module group is laterally set up in parallel by least two block length heating modules and constituted, above long heating module
Middle part sets long heating module positive pole and long heating module negative pole.
Described rectangle heating module group is vertically set up in parallel by least four pieces rectangle heating modules and constituted, and every piece of rectangle adds
Thermal modules side, which is set in both positive and negative polarity input and output hole, both positive and negative polarity input and output hole, sets rectangle heating module positive pole and rectangle to add
Thermal modules negative pole.
Described every block length heating module and every piece of rectangle heating module is fixed by locator with temperature control door.
Described every block length heating module and every piece of rectangle heating module is to be correspondingly arranged at least two in U-shaped heating tube
S-shaped heating tube is constituted.
In continuity vacuum magnetron sputtering coating film canyon, long heating module positive pole and long heating module negative pole respectively with
Rectangle heating module positive pole and rectangle in the both positive and negative polarity connection of power supply, the both positive and negative polarity input and output hole of rectangle heating module side
Heating module negative pole is connected with the both positive and negative polarity of power supply respectively, every block length heating module and every piece of rectangle heating module in temperature control door
After energization, electric energy is converted to heat energy and outwards radiated by heating tube, to each position of ito thin film installed on car body in suspension operation
Heated, can be controlled by industrial computer per block length heating module and every piece of rectangle heating module uses different heating-up temperatures,
The different parts of ito thin film on car body in suspension operation are heated using different temperature, car body passes through continuity vacuum
Behind magnetic-controlled sputtering coating equipment room, naturally cool to normal temperature state, be made ito thin film finished product resistivity reach 2 × 10-4 Ω/
Cm, transmitance reaches more than 90%.
Described long heating module and the temperature adjusting range of rectangle heating module are 50-400 DEG C, according to ito thin film
Different size, can use different heating-up temperatures to the long heating module and rectangle heating module of diverse location in temperature control door, make
The heating-up temperature of ito thin film is consistent.
The beneficial effects of the invention are as follows：The structure and its method of heating are simple, and design science is reasonable, easy to use, operation
It is easily quick；Ensure in Large Scale and Continuous production indium oxide tin film, by controlling each portion to magnetron sputtering magnetically supported vehicle target
The heating-up temperature of position, makes ito thin film obtain the resistance that justifying has good uniformity, resistivity reaches 2 × 10-4 Ω/cm, transmitance
Reach more than 90%；The product quality of ito thin film is significantly improved, operating efficiency is greatly improved, production cost is saved, extension is used
More than 2 times of life-span, energy-conserving and environment-protective.
The present invention passes through long-term many experiments, optimization as Theil indices in target, sedimentation rate, underlayer temperature, sputtering power and
After these technological parameters such as subsequent anneal processing, the fine ITO with higher conductance and visible light transmissivity can be obtained
Film.
The resistivity for the ito thin film that the present invention is prepared on a glass substrate reaches that 2 × 10-4 Ω/cm and transmitance reach
More than 90%.So, good transparent conductive film can be prepared, in its system with magnetron sputtering technique on a glass substrate
We are deeply ground to the resistance situation that film is prepared under the conditions of different base temperature (150 DEG C -350 DEG C) while standby
Study carefully, in the prior art on a glass substrate low temperature preparation ito thin film poor optical properties when, often it is general be interpreted it is thin
Film oxidation is incomplete, and structure is imperfect, the long-term substantial amounts of experiment of present invention warp, therefore the ITO under to temperature conditionss not of the same race
Film crystal structure and resistance draw new developmental achievement.
Brief description of the drawings
The invention will be further described below in conjunction with the accompanying drawings：
Fig. 1 is, general assembly structural representation；
In Fig. 1：Temperature control door 1, long heating module 2, long heating module positive pole 2-2, long heating module negative pole 2-3, rectangle add
Thermal modules 3, both positive and negative polarity input/output port 3-2, locator 4.
Embodiment
The present invention is described in further detail with embodiment with reference to embodiment：
Embodiment 1
The vertically arranged long heating module group in middle part of the side of temperature control door 1, the both sides of long heating module group are symmetrical arranged a pair
Long heating module 2, is symmetrical arranged a pair of rectangle heating module groups between long a pair heating module 2 and long heating module group.
Embodiment 2
Described long heating module group is laterally set up in parallel by least two block length heating module 2 and constituted, on long heating module 2
Side middle part sets long heating module positive pole 2-2 and long heating module negative pole 2-3.
Embodiment 3
Described rectangle heating module group is vertically set up in parallel by least four pieces rectangle heating modules 3 and constituted, every piece of rectangle
The side of heating module 3 sets in both positive and negative polarity input and output hole 3-2, both positive and negative polarity input and output hole 3-2 and is setting rectangle heating module just
Pole and rectangle heating module negative pole.
Embodiment 4
Described every block length heating module 2 and every piece of rectangle heating module 3 is fixed by locator 4 with temperature control door 1.
Embodiment 5
Described every block length heating module 2 and every piece of rectangle heating module 3 is that at least two are correspondingly arranged in U-shaped heating tube
Individual S-shaped heating tube is constituted.
Embodiment 6
In continuity vacuum magnetron sputtering coating film canyon, long heating module positive pole 2-2 and long heating module negative pole 2-3
It is connected respectively with the both positive and negative polarity of power supply, the rectangle heating module in the both positive and negative polarity input and output hole 3-2 of the side of rectangle heating module 3
Positive pole and rectangle heating module negative pole are connected with the both positive and negative polarity of power supply respectively, every block length heating module 2 in temperature control door 1 and every piece
After rectangle heating module 3 is powered, electric energy is converted to heat energy and outwards radiated by heating tube, to what is installed on car body in suspension operation
Each position of ito thin film is heated, and can control to use per block length heating module 2 and every piece of rectangle heating module 3 by industrial computer
The different parts of ito thin film on car body in suspension operation are heated, car body by different heating-up temperatures using different temperature
After continuity vacuum magnetron sputtering coating film canyon, normal temperature state is naturally cooled to, the resistivity of ito thin film finished product is made
2 × 10-4 Ω/cm is reached, transmitance reaches more than 90%.
Embodiment 7
Described long heating module 2 and the temperature adjusting range of rectangle heating module 3 are 50-400 DEG C, according to ito thin film
Different size, different heating temperature can be used to the long heating module 2 and rectangle heating module 3 of diverse location in temperature control door 1
Degree, makes the heating-up temperature of ito thin film consistent.
Claims (1)
1. a kind of application process of magnetron sputtering plating vacuum chamber temperature control door, the magnetron sputtering plating vacuum chamber temperature control door be by
Temperature control door (1), long heating module (2), long heating module positive pole (2-2), long heating module negative pole (2-3), rectangle heating module
(3), both positive and negative polarity input/output port (3-2), locator (4) are constituted；It is characterized in that：The middle part of temperature control door (1) side is vertically set
Long heating module group is put, the both sides of long heating module group are symmetrical arranged long a pair heating module (2), long a pair heating module (2)
A pair of rectangle heating module groups are symmetrical arranged between long heating module group；
Described long heating module group is laterally set up in parallel by least two block length heating modules (2) and constituted, on long heating module (2)
Side middle part sets long heating module positive pole (2-2) and long heating module negative pole (2-3)；
Described rectangle heating module group is vertically set up in parallel by least four pieces rectangle heating modules (3) and constituted, and every piece of rectangle adds
Thermal modules (3) side sets both positive and negative polarity input and output hole (3-2), and rectangle heated mould is set in both positive and negative polarity input and output hole (3-2)
Block positive pole and rectangle heating module negative pole；
Described every block length heating module (2) and every piece of rectangle heating module (3) are solid by locator (4) and temperature control door (1)
It is fixed；
Described every block length heating module (2) and every piece of rectangle heating module (3) is that at least two are correspondingly arranged in U-shaped heating tube
Individual S-shaped heating tube is constituted；
Described application process is：
In continuity vacuum magnetron sputtering coating film canyon, long heating module positive pole (2-2) and long heating module negative pole (2-3)
It is connected respectively with the both positive and negative polarity of power supply, the rectangle heating in the both positive and negative polarity input and output hole (3-2) of rectangle heating module (3) side
Module positive pole and rectangle heating module negative pole are connected with the both positive and negative polarity of power supply respectively, every block length heating module in temperature control door (1)
(2) and after every piece of rectangle heating module (3) energization, electric energy is converted to heat energy and outwards radiated by heating tube, in suspension operation
Each position of ito thin film installed on car body is heated, and can be controlled by industrial computer per block length heating module (2) and every piece of rectangle
Heating module (3) uses different heating-up temperatures, and different temperature is used to the different parts of ito thin film on car body in suspension operation
Degree is heated, and after car body is by continuity vacuum magnetron sputtering coating film canyon, naturally cools to normal temperature state, and ITO is made
The resistivity of finished film reaches 2 × 10-4Ω cm, transmitance reaches more than 90%；
Described long heating module (2) and the temperature adjusting range of rectangle heating module (3) are 50-400 DEG C, according to ito thin film
Different size, can be to the long heating module (2) and rectangle heating module (3) of diverse location in temperature control door (1) using different
Heating-up temperature, makes the heating-up temperature of ito thin film consistent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410737865.6A CN104404472B (en) | 2014-11-29 | 2014-11-29 | A kind of magnetron sputtering plating vacuum chamber temperature control door and application process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410737865.6A CN104404472B (en) | 2014-11-29 | 2014-11-29 | A kind of magnetron sputtering plating vacuum chamber temperature control door and application process |
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| Publication Number | Publication Date |
|---|---|
| CN104404472A CN104404472A (en) | 2015-03-11 |
| CN104404472B true CN104404472B (en) | 2017-08-25 |
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| CN201410737865.6A Active CN104404472B (en) | 2014-11-29 | 2014-11-29 | A kind of magnetron sputtering plating vacuum chamber temperature control door and application process |
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114242338B (en) * | 2021-12-16 | 2024-02-06 | 长春博信光电子有限公司 | Method for improving resistance value of ITO film |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1195378A (en) * | 1995-09-06 | 1998-10-07 | 美国3M公司 | Substrate fixture |
| CN101962759A (en) * | 2009-07-21 | 2011-02-02 | 深圳市宇光高科新能源技术有限公司 | PECVD system with internal heater |
| CN204265844U (en) * | 2014-11-29 | 2015-04-15 | 洛阳康耀电子有限公司 | A kind of magnetron sputtering plating vacuum chamber temperature control door |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010168649A (en) * | 2008-12-26 | 2010-08-05 | Canon Anelva Corp | Substrate processing apparatus, deposition method, and electronic device manufacturing method |
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2014
- 2014-11-29 CN CN201410737865.6A patent/CN104404472B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1195378A (en) * | 1995-09-06 | 1998-10-07 | 美国3M公司 | Substrate fixture |
| CN101962759A (en) * | 2009-07-21 | 2011-02-02 | 深圳市宇光高科新能源技术有限公司 | PECVD system with internal heater |
| CN204265844U (en) * | 2014-11-29 | 2015-04-15 | 洛阳康耀电子有限公司 | A kind of magnetron sputtering plating vacuum chamber temperature control door |
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| CN104404472A (en) | 2015-03-11 |
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