CN104387078A - 硅硼碳氮基复合材料及其制备方法 - Google Patents
硅硼碳氮基复合材料及其制备方法 Download PDFInfo
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- CN104387078A CN104387078A CN201410568735.4A CN201410568735A CN104387078A CN 104387078 A CN104387078 A CN 104387078A CN 201410568735 A CN201410568735 A CN 201410568735A CN 104387078 A CN104387078 A CN 104387078A
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- 239000002131 composite material Substances 0.000 title claims abstract description 41
- 238000002360 preparation method Methods 0.000 title claims abstract description 24
- 239000000203 mixture Substances 0.000 claims abstract description 45
- 238000006243 chemical reaction Methods 0.000 claims abstract description 15
- 239000007791 liquid phase Substances 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 12
- 238000010438 heat treatment Methods 0.000 claims abstract description 11
- 239000003960 organic solvent Substances 0.000 claims abstract description 11
- 239000002994 raw material Substances 0.000 claims abstract description 7
- 239000002033 PVDF binder Substances 0.000 claims description 42
- 239000012510 hollow fiber Substances 0.000 claims description 42
- 239000012528 membrane Substances 0.000 claims description 42
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 42
- ZQOBAJVOKBJPEE-UHFFFAOYSA-N [B].[C].[N].[Si] Chemical compound [B].[C].[N].[Si] ZQOBAJVOKBJPEE-UHFFFAOYSA-N 0.000 claims description 28
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 26
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 20
- 239000011159 matrix material Substances 0.000 claims description 16
- 229920001709 polysilazane Polymers 0.000 claims description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 14
- 229910021529 ammonia Inorganic materials 0.000 claims description 13
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 11
- 239000007789 gas Substances 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 9
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 9
- 238000005660 chlorination reaction Methods 0.000 claims description 9
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 8
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 claims description 8
- 229910052796 boron Inorganic materials 0.000 claims description 8
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims description 8
- 238000006197 hydroboration reaction Methods 0.000 claims description 8
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 claims description 8
- 229910052786 argon Inorganic materials 0.000 claims description 7
- DMZWVCJEOLBQCZ-UHFFFAOYSA-N chloro(ethenyl)silane Chemical compound Cl[SiH2]C=C DMZWVCJEOLBQCZ-UHFFFAOYSA-N 0.000 claims description 7
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 7
- 230000035484 reaction time Effects 0.000 claims description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 6
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 5
- MCQRPQCQMGVWIQ-UHFFFAOYSA-N boron;methylsulfanylmethane Chemical compound [B].CSC MCQRPQCQMGVWIQ-UHFFFAOYSA-N 0.000 claims description 5
- BSGONOOEHPZOMN-UHFFFAOYSA-N dichloro(ethenyl)silane Chemical compound Cl[SiH](Cl)C=C BSGONOOEHPZOMN-UHFFFAOYSA-N 0.000 claims description 5
- 239000001307 helium Substances 0.000 claims description 5
- 229910052734 helium Inorganic materials 0.000 claims description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 claims description 5
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 229910003902 SiCl 4 Inorganic materials 0.000 claims description 4
- 229910000085 borane Inorganic materials 0.000 claims description 4
- BGECDVWSWDRFSP-UHFFFAOYSA-N borazine Chemical compound B1NBNBN1 BGECDVWSWDRFSP-UHFFFAOYSA-N 0.000 claims description 4
- YLJJAVFOBDSYAN-UHFFFAOYSA-N dichloro-ethenyl-methylsilane Chemical compound C[Si](Cl)(Cl)C=C YLJJAVFOBDSYAN-UHFFFAOYSA-N 0.000 claims description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 4
- 150000003568 thioethers Chemical class 0.000 claims description 4
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 claims description 4
- UORVGPXVDQYIDP-UHFFFAOYSA-N trihydridoboron Substances B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 claims description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
- 229920002554 vinyl polymer Polymers 0.000 claims description 4
- 239000005050 vinyl trichlorosilane Substances 0.000 claims description 4
- DCERHCFNWRGHLK-UHFFFAOYSA-N C[Si](C)C Chemical compound C[Si](C)C DCERHCFNWRGHLK-UHFFFAOYSA-N 0.000 claims description 3
- RAABOESOVLLHRU-UHFFFAOYSA-N diazene Chemical compound N=N RAABOESOVLLHRU-UHFFFAOYSA-N 0.000 claims description 3
- 229910000071 diazene Inorganic materials 0.000 claims description 3
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims description 3
- 238000005984 hydrogenation reaction Methods 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 229920000620 organic polymer Polymers 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 239000008096 xylene Substances 0.000 claims 1
- 238000002156 mixing Methods 0.000 abstract description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 238000005452 bending Methods 0.000 description 6
- 238000000197 pyrolysis Methods 0.000 description 6
- 239000000843 powder Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 4
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 3
- 229910052580 B4C Inorganic materials 0.000 description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 230000003078 antioxidant effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000005265 energy consumption Methods 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 3
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 235000006708 antioxidants Nutrition 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910052743 krypton Inorganic materials 0.000 description 2
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 2
- 238000005272 metallurgy Methods 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910015397 B-N Inorganic materials 0.000 description 1
- 229910015407 B—N Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- 229910007991 Si-N Inorganic materials 0.000 description 1
- 229910006294 Si—N Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- -1 pottery Substances 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
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- Carbon And Carbon Compounds (AREA)
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104974352A (zh) * | 2015-06-24 | 2015-10-14 | 中国航空工业集团公司北京航空材料研究院 | 一种含环硼氮烷结构的SiBCN陶瓷前驱体的制备方法 |
CN105152670A (zh) * | 2015-07-01 | 2015-12-16 | 西北工业大学 | 一种SiC纳米线增强SiBCN陶瓷的制备方法 |
CN106752895A (zh) * | 2017-01-18 | 2017-05-31 | 丽水市知科科技有限公司 | 一种自润滑修复剂及其制备方法 |
CN107381589A (zh) * | 2017-08-10 | 2017-11-24 | 东华大学 | 一种有序介孔硅硼碳氮材料的制备方法 |
CN107540399A (zh) * | 2017-09-18 | 2018-01-05 | 中科院广州化学有限公司南雄材料生产基地 | 碳纳米管增韧SiBCN(O)金属基陶瓷涂层及其制法 |
CN109678539A (zh) * | 2017-10-19 | 2019-04-26 | 中国科学院上海硅酸盐研究所 | 一种致密Cf/SiBCN陶瓷基复合材料及其制备方法 |
CN109704778A (zh) * | 2019-01-21 | 2019-05-03 | 武汉科技大学 | 一种SiBCN陶瓷及其制备方法 |
Citations (4)
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WO2002022522A2 (de) * | 2000-09-14 | 2002-03-21 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Silicium-bor-kohlenstoff-stickstoff-keramiken und vorläuferverbindungen, verfahren zu deren herstellung sowie deren verwendung |
CN101148358A (zh) * | 2007-09-13 | 2008-03-26 | 中国人民解放军国防科学技术大学 | 一种聚硼硅氮烷先驱体的制备方法 |
CN102115539A (zh) * | 2010-12-31 | 2011-07-06 | 厦门大学 | 一种液态聚硼硅氮烷的制备方法 |
CN102557637A (zh) * | 2011-12-14 | 2012-07-11 | 天津大学 | 硅硼碳氮基复合材料及其制备方法 |
-
2014
- 2014-10-22 CN CN201410568735.4A patent/CN104387078B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2002022522A2 (de) * | 2000-09-14 | 2002-03-21 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Silicium-bor-kohlenstoff-stickstoff-keramiken und vorläuferverbindungen, verfahren zu deren herstellung sowie deren verwendung |
CN101148358A (zh) * | 2007-09-13 | 2008-03-26 | 中国人民解放军国防科学技术大学 | 一种聚硼硅氮烷先驱体的制备方法 |
CN102115539A (zh) * | 2010-12-31 | 2011-07-06 | 厦门大学 | 一种液态聚硼硅氮烷的制备方法 |
CN102557637A (zh) * | 2011-12-14 | 2012-07-11 | 天津大学 | 硅硼碳氮基复合材料及其制备方法 |
Non-Patent Citations (2)
Title |
---|
NARAYANAN JANAKIRAMAN ET AL.: "Phase evolution and crystallization in Si–B–C–N ceramics derived from a polyborosilazane precursor: microstructural characterization", 《JOURNAL OF THE EUROPEAN CERAMIC SOCIETY》 * |
李亚静: "SiBCN 陶瓷前驱体高温裂解机理", 《无机材料学报》 * |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104974352A (zh) * | 2015-06-24 | 2015-10-14 | 中国航空工业集团公司北京航空材料研究院 | 一种含环硼氮烷结构的SiBCN陶瓷前驱体的制备方法 |
CN105152670A (zh) * | 2015-07-01 | 2015-12-16 | 西北工业大学 | 一种SiC纳米线增强SiBCN陶瓷的制备方法 |
CN106752895A (zh) * | 2017-01-18 | 2017-05-31 | 丽水市知科科技有限公司 | 一种自润滑修复剂及其制备方法 |
CN107381589A (zh) * | 2017-08-10 | 2017-11-24 | 东华大学 | 一种有序介孔硅硼碳氮材料的制备方法 |
CN107540399A (zh) * | 2017-09-18 | 2018-01-05 | 中科院广州化学有限公司南雄材料生产基地 | 碳纳米管增韧SiBCN(O)金属基陶瓷涂层及其制法 |
CN107540399B (zh) * | 2017-09-18 | 2020-01-17 | 中科院广州化学有限公司南雄材料生产基地 | 碳纳米管增韧SiBCN(O)金属基陶瓷涂层及其制法 |
CN109678539A (zh) * | 2017-10-19 | 2019-04-26 | 中国科学院上海硅酸盐研究所 | 一种致密Cf/SiBCN陶瓷基复合材料及其制备方法 |
CN109678539B (zh) * | 2017-10-19 | 2022-03-08 | 中国科学院上海硅酸盐研究所 | 一种致密Cf/SiBCN陶瓷基复合材料及其制备方法 |
CN109704778A (zh) * | 2019-01-21 | 2019-05-03 | 武汉科技大学 | 一种SiBCN陶瓷及其制备方法 |
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