CN104294231B - Vacuum magnetron sputtering coating equipment with height-adjustable molecular pump gas partitioning plate - Google Patents
Vacuum magnetron sputtering coating equipment with height-adjustable molecular pump gas partitioning plate Download PDFInfo
- Publication number
- CN104294231B CN104294231B CN201410534887.2A CN201410534887A CN104294231B CN 104294231 B CN104294231 B CN 104294231B CN 201410534887 A CN201410534887 A CN 201410534887A CN 104294231 B CN104294231 B CN 104294231B
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- China
- Prior art keywords
- magnetron sputtering
- sputtering coating
- vacuum magnetron
- gas barrier
- coating equipment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses vacuum magnetron sputtering coating equipment with a height-adjustable molecular pump gas partitioning plate. The vacuum magnetron sputtering coating equipment comprises gas partitioning plates and a height adjusting structure, wherein the height adjusting structure consists of two groups of symmetrical lifting mechanisms; the lifting mechanisms comprise hanging plates, eccentric gears and ejector bars; rotating shafts of the eccentric gears are fixed on the vacuum magnetron sputtering coating equipment; the ejector bars are arranged on the upper sides of the eccentric gears; the tops of the hanging plates are connected with the ejector bars; the bottom ends of the hanging plates are arranged on the lower sides of the gas partitioning plates and are used for supporting the gas partitioning plates. The vacuum magnetron sputtering coating equipment has the advantages that firstly, the flexibility is relatively good, the gas partitioning plates can be adjusted to be in different heights so as to be applicable to demands of production when three-silver glass and single-silver glass are produced alternatively, and the production efficiency is improved; secondly, when relatively thick laminated glass is produced, in order to prevent the glass from being clamped by the gas partitioning plates, the partitioning plates can be lifted up, and when relatively thin glass is produced, the partitioning plates can be descended, so that the edge effect of a product can be eliminated, and the color uniformity of the product is improved.
Description
Technical field
The present invention is applied to glass industry, is related to off-line type vacuum magnetic-control sputtering glass coating equipment technical field, specifically
It is related to a kind of vacuum magnetron sputtering coating film equipment of adjustable molecular pump gas barrier height.
Background technology
With magnetron sputtering as principle, manufacture coated glass field using horizontal vacuum filming equipment, molecular pump every
Gas plate plays the regulation direction of air-flow and the effect of size, and this effect is significant for industrialized production glass, but mesh
The gas barrier of front all filming equipments is highly unadjustable, has the disadvantage in that
Easily clamp glass when the 1st, producing very thick laminated glass, bring very burden to production.
2nd, produce that the molecular pump gas barrier requiring when three silver medals and single silver products is highly different, molecular pump gas barrier is highly solid
Fixed, cause difficulty to coating wire debugging membrane system, adjust the piece time to lengthen, inefficiency.
3rd, existing coating wire molecular pump gas barrier highly easily cause air-flow suddenly big or suddenly small so that product colour edge effect
Phenomenon is serious, and product colour uniformity is had an impact, and affects product appearance.
Content of the invention
The invention aims to making up the deficiencies in the prior art, provide that a kind of production efficiency is higher, product colour more
Plus the vacuum magnetron sputtering coating film equipment of uniform adjustable molecular pump gas barrier height.
In order to reach the purpose of the present invention, technical scheme is as follows:
A kind of vacuum magnetron sputtering coating film equipment of adjustable molecular pump gas barrier height it is characterised in that: there is gas barrier
And height adjusting structure, described height adjusting structure is made up of two groups of symmetrical elevating mechanisms, described elevating mechanism include link plate,
Eccentric and push rod,
The rotary shaft of described eccentric is fixed on vacuum magnetron sputtering coating film equipment, and described push rod is arranged on described bias
The upside of wheel, the top of described link plate is connected with push rod, and gas barrier located at the downside of gas barrier and is held in the bottom of link plate, described
Link plate be shaped as l shape.
As preferred technical scheme: the outside of described eccentric is provided with copper sheathing.
When rotating eccentric, push rod can be driven to move up and down, thus driving the link plate being connected with push rod to move up and down, finally
The gas barrier on link plate is driven to move up and down, base plate and live-roller height due to placing glass are changeless, from
And achieve height distance scalable this purpose between gas barrier and glass.And link plate be shaped as l shape, the lower end of link plate
There is the protrusion side of a horizontally set, gas barrier is placed on the protrusion side of link plate lower end by the gravity of itself so that trapping
Plate is big with link plate contact area, is in close contact, will not gas leakage.
The invention has the benefit that
1), motility more preferably, can be by gas barrier height adjustment to different height when exchanging and doing three silver medals and single silver glass
Degree, to adapt to the needs producing, improves production efficiency.
2), produce during thicker laminated glass in order to avoid glass is clamped by gas barrier, the height of gas barrier can be raised,
When producing relatively thin glass, gas barrier is highly turned down, the edge effect of product can be eliminated, be conducive to improving the color of product
Uniformity.
Brief description
Fig. 1 is the structural representation of the present invention.
Specific embodiment
With reference to embodiment, the invention will be further described, but protection scope of the present invention is not limited solely to implement
Example.
As shown in figure 1, a kind of vacuum magnetron sputtering coating film equipment of adjustable molecular pump gas barrier height, including placement glass
Base plate 5, the live-roller 6 on base plate 5 and the height adjusting structure being located at live-roller 6 top.Height adjusting structure by
Two groups of symmetrical elevating mechanism compositions, elevating mechanism includes link plate 4, eccentric 7 and push rod 3.
Push rod 3 be arranged on eccentric 7 upside and with eccentric upper contact, the rotary shaft of eccentric 7 is fixed on vacuum
On magnetic-controlled sputtering coating equipment, specifically it is integrally fixed on the pump end and operating side of coating wire.The top of link plate 4 is connected with push rod 3,
Gas barrier 1 located at the downside of gas barrier 1 and is held in the bottom of link plate 4, and the link plate 4 in two symmetrical elevating mechanisms is just held
The both sides of gas barrier 1.
When rotating eccentric 7, push rod 3 can be driven to move up and down, thus drive moving down on the link plate 4 being connected with push rod 3
Dynamic, finally drive the gas barrier 1 being located on link plate to move up and down, base plate 5 and live-roller 6 height due to placing glass are fixing
Constant, it is achieved thereby that height distance scalable this purpose between gas barrier 1 and glass.And link plate 4 be shaped as l
Shape, there is the protrusion side of a horizontally set lower end of link plate 4, and gas barrier 1 is placed on the protrusion side of link plate 4 lower end by the gravity of itself
Above so that gas barrier 1 is big with link plate 4 contact area, it is in close contact, will not gas leakage.
The outside of eccentric 7 is provided with copper sheathing 2, in order to protect eccentric 7, reduces friction loss.
Finally it is noted that above example only not limits technology described in the invention in order to the present invention to be described
Scheme, therefore, although this specification with reference to each above-mentioned embodiment to present invention has been detailed description, this
Field it is to be appreciated by one skilled in the art that still the present invention can be modified or equivalent, and all without departing from this
The technical scheme of spirit and scope of invention and its improvement, it all should be covered in scope of the presently claimed invention.
Claims (2)
1. a kind of vacuum magnetron sputtering coating film equipment of adjustable molecular pump gas barrier height it is characterised in that: have gas barrier and
Height adjusting structure, described height adjusting structure is made up of two groups of symmetrical elevating mechanisms, and described elevating mechanism includes link plate
(4), eccentric (7) and push rod (3),
The rotary shaft of described eccentric (7) is fixed on vacuum magnetron sputtering coating film equipment, and described push rod (3) is arranged on described inclined
The upside of heart wheel (7), the top of described link plate (4) is connected with push rod (3), and the bottom of link plate (4) is located at the downside of gas barrier (1)
And hold gas barrier (1), described link plate (4) be shaped as l shape.
2. the vacuum magnetron sputtering coating film equipment of adjustable molecular pump gas barrier height according to claim 1, its feature exists
In: the outside of described eccentric (7) is provided with copper sheathing (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410534887.2A CN104294231B (en) | 2014-10-10 | 2014-10-10 | Vacuum magnetron sputtering coating equipment with height-adjustable molecular pump gas partitioning plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410534887.2A CN104294231B (en) | 2014-10-10 | 2014-10-10 | Vacuum magnetron sputtering coating equipment with height-adjustable molecular pump gas partitioning plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104294231A CN104294231A (en) | 2015-01-21 |
| CN104294231B true CN104294231B (en) | 2017-02-01 |
Family
ID=52314177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410534887.2A Active CN104294231B (en) | 2014-10-10 | 2014-10-10 | Vacuum magnetron sputtering coating equipment with height-adjustable molecular pump gas partitioning plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104294231B (en) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1228266C (en) * | 2002-09-06 | 2005-11-23 | 鲍冠中 | Magnetic control sputtering hot-bending coated glass and its production method and device |
| US7674360B2 (en) * | 2003-12-12 | 2010-03-09 | Applied Materials, Inc. | Mechanism for varying the spacing between sputter magnetron and target |
| CN201817543U (en) * | 2010-10-25 | 2011-05-04 | 北儒精密股份有限公司 | Lifting movable magnet set |
| CN202090052U (en) * | 2011-04-27 | 2011-12-28 | 广东中环真空设备有限公司 | Magnetic-controlled sputtering coating equipment |
| CN202688421U (en) * | 2012-06-15 | 2013-01-23 | 杨宪杰 | Horizontal type coating equipment |
| CN204151410U (en) * | 2014-10-10 | 2015-02-11 | 咸宁南玻节能玻璃有限公司 | A kind of vacuum magnetron sputtering coating film equipment of adjustable molecular pump gas barrier height |
-
2014
- 2014-10-10 CN CN201410534887.2A patent/CN104294231B/en active Active
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| Publication number | Publication date |
|---|---|
| CN104294231A (en) | 2015-01-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C53 | Correction of patent for invention or patent application | ||
| CB03 | Change of inventor or designer information |
Inventor after: Yu Huajun Inventor after: Jiang Wei Inventor after: Hu Yong Inventor before: Yu Huajun Inventor before: Jiang Wei Inventor before: Xiong Jian Inventor before: Su Changfei Inventor before: Zhang Yaopeng |
|
| COR | Change of bibliographic data |
Free format text: CORRECT: INVENTOR; FROM: YU HUAJUN JIANG WEI XIONG JIAN SU CHANGFEI ZHANG YAOPENG TO: YU HUAJUN JIANG WEI HU YONG |
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| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |