CN104233233A - Reaction chamber and epitaxial growth equipment - Google Patents
Reaction chamber and epitaxial growth equipment Download PDFInfo
- Publication number
- CN104233233A CN104233233A CN201310252607.4A CN201310252607A CN104233233A CN 104233233 A CN104233233 A CN 104233233A CN 201310252607 A CN201310252607 A CN 201310252607A CN 104233233 A CN104233233 A CN 104233233A
- Authority
- CN
- China
- Prior art keywords
- reaction chamber
- pallet
- temperature
- subcoil
- size
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
The invention provides a reaction chamber and epitaxial growth equipment. The reaction chamber comprises a plurality of trays, and an induction coil, wherein the plurality of trays are arranged in the reaction chamber; the induction coil is encircled on the peripheral wall of the reaction chamber, is connected with an alternating current power supply, and is used for heating the trays in an induction heating manner; the induction coil comprises at least two sub-coils which are mutually independent, and is arranged along the circumferential direction of the peripheral wall of the reaction chamber; the alternating current power supply corresponds to the sub-coils in quantity, and is electrically connected with the sub-coils in one-to-one correspondence; and by independently controlling the phase and/or size of alternating current provided by the alternating current power supply to the corresponding sub-coil, alternating magnetic fields generated by the sub-coils interact, so that the temperature of each region of each tray tends to be uniform. According to the reaction chamber provided by the invention, the trays arranged in the reaction chamber can be heated, and each region on each tray has uniform temperature, thereby improving the uniformity of the process.
Description
Technical field
The present invention relates to microelectronic processing technique field, particularly, relate to a kind of reaction chamber and epitaxial growth equipment.
Background technology
Adopt MOCVD (Metal Organic Chemical Vapor Deposition, hereinafter referred to as MOCVD) the equipment principle of preparing film passes into reaction chamber after being mixed mutually with IV or the hydride of group Ⅴ element by II or III race's organometallics, mixed gas at the substrate surface generation pyrolysis of heating, and forms film in substrate surface epitaxy.
Typical MOCVD device comprises reactive system, gas delivery system and exhaust treatment system.Fig. 1 is the structure diagram of reactive system in MOCVD device.Refer to Fig. 1, MOCVD device comprises reaction chamber 1, is provided with vertically spaced multiple pallet 2 made by resistant to elevated temperatures magnetic conductor material such as graphite, in order to carry workpiece to be machined in reaction chamber 1; And, ruhmkorff coil 3 is wound with at the side-wall outer side of reaction chamber 1, its canoe is specially: the side-wall outer side being vertically spirally wrapped around reaction chamber 1, as shown in Figure 2, and, ruhmkorff coil is connected with AC power (not shown), when passing into alternating flow electricity in ruhmkorff coil 3, it produces alternating magnetic field in reaction chamber 1, thus will the eddy current of alternation be induced in pallet 2, pallet 2 heats by eddy current, and then indirectly the workpiece to be machined be placed on pallet 2 is heated to the temperature needed for technique.
Answer in the process of coil heats workpiece to be machined in use sense, due to the surface action of induction heating, the distribution of alternating magnetic field is as shown in the shadow region 4 in Fig. 2, the distribution of alternating magnetic field mainly concentrates on the fringe region of each layer pallet 2, the distribution density of the eddy current causing pallet 2 fringe region to induce is greater than the distribution density of the eddy current induced in central zone, the heat that this heat that pallet 2 fringe region is produced produces than central zone is many, thus cause the temperature of temperature higher than central zone of pallet 2 fringe region, and then cause there is the temperature difference between workpiece to be machined fringe region and central zone, reduce the homogeneity of technique.
Summary of the invention
The present invention is intended at least to solve one of technical problem existed in prior art, propose a kind of reaction chamber and epitaxial growth equipment, it can heat the pallet be arranged in reaction chamber, and make the regional on each pallet have uniform temperature, to improve the homogeneity of technique.
A kind of reaction chamber is provided for realizing object of the present invention, comprise the multiple pallets set within it, and the ruhmkorff coil be looped around on the periphery wall of described reaction chamber, wherein, described multiple pallet adopts magnetic conductor material to make, and vertically interval is arranged, in order to carry workpiece to be machined; Described ruhmkorff coil is connected with AC power, in order to adopt the mode of induction heating to heat described pallet, it is characterized in that, described ruhmkorff coil comprises at least two subcoils independent of each other, and along the circumferential array of described reaction chamber; The quantity of described AC power is corresponding with the quantity of described subcoil, and the two is electrically connected correspondingly, by the independent phase place and/or the size that control the exchange current that each described AC power provides to described subcoil corresponding with it, the alternating magnetic field produced by each subcoil is interacted, is tending towards even to make the temperature of each pallet regional.
Wherein, each described subcoil is the cambered surface coil be wound around at a cambered surface internal screw, and described cambered surface is corresponding with the cambered surface of the periphery wall of described reaction chamber on the other side.
Wherein, the shape of described at least two subcoils is identical with size.
Wherein, on the periphery wall of described reaction chamber, and be provided with at least one insulated column between adjacent two circle coils in each described subcoil, in order to support described subcoil, and isolate two adjacent circle coils.
Wherein, described insulated column comprises metal column, and the outside surface of described metal column is provided with insulation layer.
Wherein, described reaction chamber also comprises temperature measuring unit, in order to measure the temperature of each pallet regional; Obtain phase place and/or the size of the exchange current that each described AC power provides to described subcoil corresponding with it according to the temperature of each pallet regional, be tending towards even to make the temperature of each pallet regional.
Wherein, described temperature measuring unit comprises the quantity infrared temperature sensor corresponding with described pallet, and described infrared temperature sensor is arranged on the oblique upper of described pallet correspondingly, in order to measure the temperature of described pallet regional.
Wherein, described reaction chamber also comprises control unit, described control unit is sent and next temperature signal by each described infrared temperature sensor respectively for receiving, and regulates phase place and/or the size of the exchange current of corresponding described alternating source output according to this temperature signal.
Wherein, described reaction chamber also comprises storage unit, and described storage unit is for the corresponding relation between the phase place of exchange current that prestores heat-up time, the difference of temperature of each pallet regional and each described AC power and provide to described subcoil corresponding with it and/or size; Described control unit receives and is sent and next temperature signal by each described infrared temperature sensor respectively, and read current heat-up time in described storage unit, the phase place of the exchange current that each described AC power corresponding with this temperature signal provides to described subcoil corresponding with it and/or size, and the exchange current controlling that alternating source described in each exports same phase and/or size with it.
As another technical scheme, the present invention also provides a kind of epitaxial growth equipment, comprises reaction chamber, and described reaction chamber have employed above-mentioned reaction chamber provided by the invention.
The present invention has following beneficial effect:
Reaction chamber provided by the invention, it passes through on its periphery wall around to few two subcoils independent of each other, and each subcoil is electrically connected with AC power correspondingly, can by the independent phase place and/or the size that control the exchange current that each AC power provides to subcoil corresponding with it, and the alternating magnetic field produced by each subcoil is interacted, thus the temperature of each pallet regional can be made to be tending towards even, and then the temperature homogeneity of the workpiece to be machined be placed on pallet can be improved, improve process uniformity.
Epitaxial growth equipment provided by the invention, it, by adopting above-mentioned reaction chamber provided by the invention, can improve the temperature homogeneity of workpiece to be machined, thus can improve process uniformity.
Accompanying drawing explanation
Fig. 1 is the structure diagram of reactive system in MOCVD device;
The type of heating schematic diagram that Fig. 2 heats pallet for reactive system in MOCVD device shown in Fig. 1;
The sectional view of the reaction chamber that Fig. 3 provides for the present embodiment;
The front view of the reaction chamber that Fig. 4 A provides for the present embodiment;
The side-view of the reaction chamber that Fig. 4 B provides for the present embodiment; And
The vertical view of the reaction chamber that Fig. 4 C provides for the present embodiment.
Embodiment
For making those skilled in the art understand technical scheme of the present invention better, below in conjunction with accompanying drawing to the invention provides reaction chamber and epitaxial growth equipment is described in detail.
The sectional view of the reaction chamber that Fig. 3 provides for the present embodiment.The front view of the reaction chamber that Fig. 4 A provides for the present embodiment.The side-view of the reaction chamber that Fig. 4 B provides for the present embodiment.The vertical view of the reaction chamber that Fig. 4 C provides for the present embodiment.See also Fig. 3, Fig. 4 A, Fig. 4 B and Fig. 4 C.Reaction chamber 20 comprises the multiple pallets 24 set within it, and is looped around the ruhmkorff coil on the periphery wall of reaction chamber 20.Wherein, multiple pallet 24 adopts the magnetic conductor material of graphite etc. to make, and vertically interval is arranged, in order to carry workpiece to be machined; Ruhmkorff coil is connected with AC power, in order to adopt the mode heated tray 24 of induction heating, thus indirect heating workpiece to be machined.
In the present embodiment, ruhmkorff coil comprises two subcoils (211 independent of each other that the periphery wall along reaction chamber arranges, 212), two subcoils (211,212) shape is identical with size, it is the cambered surface coil be wound around at a cambered surface internal screw, and this cambered surface is corresponding with the cambered surface of the periphery wall of reaction chamber 20 on the other side, as shown in Figure 4 C.And, the quantity of AC power is corresponding with the quantity of subcoil, that is: two AC power (221, 222), and AC power (221, 222) with subcoil (211, 212) be electrically connected correspondingly, can by the independent phase place and/or the size that control the exchange current that each AC power provides to subcoil corresponding with it, and the alternating magnetic field produced by each subcoil is interacted, thus the temperature of each pallet 24 regional can be made to be tending towards even, and then the temperature homogeneity of the workpiece to be machined be placed on pallet 24 can be improved, improve process uniformity.
Such as, as shown in Figure 4 C, two subcoils (211, 212) magnetic field produced separately is dash area in Fig. 4 C, when making two AC power (221, 222) simultaneously to subcoil (211, 212) equal and opposite in direction is passed into, and during the electric current of phase 180 °, two subcoils (211, 212) magnetic field produced separately attracts each other, with to close to each other, thus the Distribution of Magnetic Field of reaction chamber 20 central zone can be increased, this is when the temperature of pallet 24 central zone is lower, the central zone of pallet 24 and the temperature head of fringe region can be made up, thus the temperature of pallet 24 can be made to be tending towards even.Similar with it, when making two AC power (221,222) simultaneously to subcoil (211,212) equal and opposite in direction is passed into, and during the identical electric current of phase place, two subcoils (211,212) magnetic field produced separately is repelled mutually, this makes the temperature of pallet 24 fringe region lower, can reduce the central zone of pallet 24 and the temperature head of fringe region, thus the temperature entirety of pallet 24 can be made to be tending towards even.
And for example, when making two AC power (221,222) pass into differ in size to subcoil (211,212) simultaneously, and during the electric current of phase 180 °, then two subcoils (211,212) magnetic field produced separately can to the larger side skew of electric current, that is, adjust two AC power (221 for the lower corresponding position of the temperature of pallet 24,222) electric current and/or phase place, be tending towards even to make the temperature of pallet 24 regional.
Due to two symmetrically arranged subcoils (211 on the periphery wall of reaction chamber 20,212) interaction relationship in the magnetic field produced after passing into electric current is the simplest, this is convenient to control the phase place of the exchange current passing into subcoil and/or size, the alternating magnetic field produced to make two subcoils interacts, thus the temperature of each pallet 24 regional is tending towards even.
In the present embodiment, on the periphery wall of reaction chamber 20, and be provided with at least one insulated column 23 between adjacent two circle coils in each subcoil, it comprises metal column and is arranged at the insulation layer on metal column outside surface, in order to support subcoil, and isolate two adjacent circle coils.In actual applications, insulated column 23 also can adopt insulating material to make.
In the present embodiment, reaction chamber 20 also comprises temperature measuring unit and control unit.Wherein, temperature measuring unit is for measuring the temperature of each pallet 24 regional, and send it to control unit, particularly, temperature measuring unit comprises the quantity infrared temperature sensor corresponding with pallet 24, each infrared temperature sensor is arranged on the oblique upper of the pallet 24 corresponded, and in order to measure the temperature of this pallet 24 regional in technological process in real time, and sends it to control unit.Control unit obtains phase place and/or the size of the exchange current that each AC power provides to subcoil corresponding with it according to the temperature of each pallet 24 regional, be tending towards even to make the temperature of each pallet 24 regional.
In actual applications, if the vertical spacing between adjacent two pallets 24 is less, this makes the infrared temperature sensor being arranged on each pallet 24 oblique upper cannot measure the temperature of pallet 24 regional, in this case, the mode of demarcating in advance can be adopted to obtain the temperature distribution of each pallet 24 in whole temperature-rise period.This mode of demarcating in advance is specially: on each pallet 24, arrange multiple thermopair in advance; The workpiece to be machined be opposite on this pallet 24 carries out one-time process; In the process of carrying out this technique, utilize thermocouple measurement and the temperature of recoding tray 24 regional, and obtain the corresponding relation between the phase place of the exchange current that heat-up time, the difference of temperature of each pallet 24 regional and each AC power provide to subcoil corresponding with it and/or size.When carrying out formal technique, controlling phase place and/or the size of the exchange current that each AC power provides to subcoil corresponding with it by this corresponding relation, being tending towards even to make the temperature of each pallet 24 regional.
Preferably, reaction chamber 20 also comprises storage unit, it is for the corresponding relation between the phase place of exchange current that prestores heat-up time, the difference of temperature of each pallet 24 regional and each AC power and provide to subcoil corresponding with it and/or size, easy understand, this corresponding relation can demarcate acquisition in advance by above-mentioned.In the process of carrying out technique, if be provided with infrared temperature sensor in each pallet 24 oblique upper, then control unit receives the temperature signal sent by infrared temperature sensor, current heat-up time in its reading cells, the phase place of the exchange current that the AC power corresponding with this temperature signal provides to subcoil corresponding with it and/or size, and the exchange current controlling that each alternating source exports same phase and/or size with it.If cannot infrared temperature sensor be arranged, the then control unit phase place of exchange current that can provide to subcoil corresponding with it according to the AC power corresponding with this heat-up time in current heat-up time reading cells and/or size, and control the exchange current that each alternating source exports same phase and/or size with it.
As from the foregoing, corresponding relation between the phase place of the exchange current that the difference of the heat-up time that can obtain in advance according to adopting above-mentioned mode of demarcating in advance, the temperature of each pallet 24 regional and each AC power provide to subcoil corresponding with it and/or size, controls phase place and/or the size of the exchange current that each AC power provides to subcoil corresponding with it.Such as, corresponding in pallet 24 temperature-rise period 100 ~ 200 DEG C, the differing temps section of 200 ~ 300 DEG C of grades, can control AC power and alternately pass into equal and opposite in direction, electric current and the equal and opposite in direction of phase 180 °, electric current that phase place is identical to subcoil.
It should be noted that, in the present embodiment, ruhmkorff coil comprises two subcoils independent of each other, but the present invention is not limited to this, in actual applications, ruhmkorff coil can also comprise more than three subcoils independent of each other, and AC power is electrically connected with subcoil correspondingly; And, the size and shape of each subcoil can be identical, also can be different, as long as by the phase place that controls the exchange current that each AC power provides to the subcoil of correspondence with it and/or size, the temperature of each pallet 24 regional can be made to be tending towards even.
In sum, the reaction chamber that the present embodiment provides, it passes through on its periphery wall around to few two subcoils independent of each other, and each subcoil is electrically connected with AC power correspondingly, can by the independent phase place and/or the size that control the exchange current that each AC power provides to subcoil corresponding with it, and the alternating magnetic field produced by each subcoil is interacted, thus the temperature of each pallet regional can be made to be tending towards even, and then the temperature homogeneity of the workpiece to be machined be placed on pallet can be improved, improve process uniformity.
As another scheme, the present invention also provides a kind of epitaxial growth equipment, and it comprises reaction chamber, and this reaction chamber have employed the reaction chamber that above-described embodiment provides.
The epitaxial growth equipment that the present embodiment provides, its above-mentioned reaction chamber provided by adopting the present embodiment, can improve the temperature homogeneity of workpiece to be machined, thus can improve process uniformity.
Be understandable that, the illustrative embodiments that above embodiment is only used to principle of the present invention is described and adopts, but the present invention is not limited thereto.For those skilled in the art, without departing from the spirit and substance in the present invention, can make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.
Claims (10)
1. a reaction chamber, comprises the multiple pallets set within it, and is looped around the ruhmkorff coil on the periphery wall of described reaction chamber, wherein, described multiple pallet adopts magnetic conductor material to make, and vertically interval is arranged, in order to carry workpiece to be machined; Described ruhmkorff coil is connected with AC power, in order to adopt the mode of induction heating to heat described pallet, it is characterized in that, described ruhmkorff coil comprises at least two subcoils independent of each other, and along the circumferential array of described reaction chamber;
The quantity of described AC power is corresponding with the quantity of described subcoil, and the two is electrically connected correspondingly, by the independent phase place and/or the size that control the exchange current that each described AC power provides to described subcoil corresponding with it, the alternating magnetic field produced by each subcoil is interacted, is tending towards even to make the temperature of each pallet regional.
2. reaction chamber according to claim 1, is characterized in that, each described subcoil is the cambered surface coil be wound around at a cambered surface internal screw, and described cambered surface is corresponding with the cambered surface of the periphery wall of described reaction chamber on the other side.
3. reaction chamber according to claim 1 and 2, is characterized in that, the shape of described at least two subcoils is identical with size.
4. reaction chamber according to claim 2, it is characterized in that, on the periphery wall of described reaction chamber, and be provided with at least one insulated column between adjacent two circle coils in each described subcoil, in order to support described subcoil, and isolate two adjacent circle coils.
5. reaction chamber according to claim 4, is characterized in that, described insulated column comprises metal column, and the outside surface of described metal column is provided with insulation layer.
6. reaction chamber according to claim 1, is characterized in that, described reaction chamber also comprises temperature measuring unit, in order to measure the temperature of each pallet regional;
Obtain phase place and/or the size of the exchange current that each described AC power provides to described subcoil corresponding with it according to the temperature of each pallet regional, be tending towards even to make the temperature of each pallet regional.
7. reaction chamber according to claim 6, it is characterized in that, described temperature measuring unit comprises the quantity infrared temperature sensor corresponding with described pallet, and described infrared temperature sensor is arranged on the oblique upper of described pallet correspondingly, in order to measure the temperature of described pallet regional.
8. reaction chamber according to claim 7, it is characterized in that, described reaction chamber also comprises control unit, described control unit is sent and next temperature signal by each described infrared temperature sensor respectively for receiving, and regulates phase place and/or the size of the exchange current of corresponding described alternating source output according to this temperature signal.
9. reaction chamber according to claim 8, it is characterized in that, described reaction chamber also comprises storage unit, and described storage unit is for the corresponding relation between the phase place of exchange current that prestores heat-up time, the difference of temperature of each pallet regional and each described AC power and provide to described subcoil corresponding with it and/or size;
Described control unit receives and is sent and next temperature signal by each described infrared temperature sensor respectively, and read current heat-up time in described storage unit, the phase place of the exchange current that each described AC power corresponding with this temperature signal provides to described subcoil corresponding with it and/or size, and the exchange current controlling that alternating source described in each exports same phase and/or size with it.
10. an epitaxial growth equipment, comprises reaction chamber, it is characterized in that, described reaction chamber have employed the reaction chamber as described in claim 1-9 any one.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310252607.4A CN104233233A (en) | 2013-06-24 | 2013-06-24 | Reaction chamber and epitaxial growth equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310252607.4A CN104233233A (en) | 2013-06-24 | 2013-06-24 | Reaction chamber and epitaxial growth equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104233233A true CN104233233A (en) | 2014-12-24 |
Family
ID=52222109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310252607.4A Pending CN104233233A (en) | 2013-06-24 | 2013-06-24 | Reaction chamber and epitaxial growth equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104233233A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113652741A (en) * | 2021-07-30 | 2021-11-16 | 浙江晶盛机电股份有限公司 | Epitaxial growth device |
| CN114250451A (en) * | 2021-06-01 | 2022-03-29 | 浙江求是半导体设备有限公司 | Epitaxial growth device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1812010A (en) * | 2005-01-27 | 2006-08-02 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Inductive coupling coil and inductive coupling plasma apparatus thereof |
| JP2009301901A (en) * | 2008-06-13 | 2009-12-24 | Toshiba Home Technology Corp | Coil for induction heating |
| CN102016119A (en) * | 2008-09-04 | 2011-04-13 | 东京毅力科创株式会社 | Heat treatment apparatus |
| JP2011222402A (en) * | 2010-04-13 | 2011-11-04 | Chubu Electric Power Co Inc | Heating apparatus |
-
2013
- 2013-06-24 CN CN201310252607.4A patent/CN104233233A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1812010A (en) * | 2005-01-27 | 2006-08-02 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Inductive coupling coil and inductive coupling plasma apparatus thereof |
| JP2009301901A (en) * | 2008-06-13 | 2009-12-24 | Toshiba Home Technology Corp | Coil for induction heating |
| CN102016119A (en) * | 2008-09-04 | 2011-04-13 | 东京毅力科创株式会社 | Heat treatment apparatus |
| JP2011222402A (en) * | 2010-04-13 | 2011-11-04 | Chubu Electric Power Co Inc | Heating apparatus |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114250451A (en) * | 2021-06-01 | 2022-03-29 | 浙江求是半导体设备有限公司 | Epitaxial growth device |
| CN113652741A (en) * | 2021-07-30 | 2021-11-16 | 浙江晶盛机电股份有限公司 | Epitaxial growth device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102343798B1 (en) | Substrate treatment device | |
| KR101297493B1 (en) | Induction heating apparatus | |
| US20120138599A1 (en) | Semiconductor substrate heat treatment apparatus | |
| CN104233233A (en) | Reaction chamber and epitaxial growth equipment | |
| CN104372310B (en) | Reaction chamber and epitaxial growth equipment | |
| US9851149B2 (en) | Magnetic annealing apparatus and magnetic annealing method | |
| CN106341918B (en) | Load coil and the induction heating apparatus for having used the load coil | |
| CN204445330U (en) | Cooking apparatus | |
| CN110167224A (en) | A kind of current stabilization electromagnetic heater and Electromechanic heating roller | |
| CN104513971B (en) | reaction chamber and plasma processing device | |
| US10281138B2 (en) | Electrode water heater | |
| KR101196555B1 (en) | Induction heating unit | |
| CN104372309A (en) | Heating device, reaction cavity, and plasma processing equipment | |
| CN107591214A (en) | For simulating the heating system of molten bath endogenous pyrogen | |
| CN103184435A (en) | Heating device, heating method and semiconductor processing equipment | |
| CN104419910B (en) | Reaction chamber and plasma processing equipment | |
| CN106537056A (en) | Super-high-efficiency induction hot water heater | |
| CN204006187U (en) | Electromagnetic oven | |
| CN104250849A (en) | Reaction cavity and epitaxial growth equipment | |
| CN220441925U (en) | Atomizing heating structure and heating non-combustion atomizing device | |
| US20180002809A1 (en) | Cvd reactor with a multi-zone heated process chamber | |
| CN106637392A (en) | Uniformity-adjustable silicon epitaxial reaction equipment heating device and adjustment method thereof | |
| JP5596998B2 (en) | Semiconductor substrate heat treatment apparatus and temperature estimation method using semiconductor substrate heat treatment apparatus | |
| CN209906878U (en) | Heating sensing device in coating equipment and coating equipment | |
| JP2013160461A (en) | Powder and granular material heating device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20141224 |