CN104046270A - Chemical polishing composition for memories - Google Patents
Chemical polishing composition for memories Download PDFInfo
- Publication number
- CN104046270A CN104046270A CN201410292072.8A CN201410292072A CN104046270A CN 104046270 A CN104046270 A CN 104046270A CN 201410292072 A CN201410292072 A CN 201410292072A CN 104046270 A CN104046270 A CN 104046270A
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- China
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- parts
- polishing composition
- chemical polishing
- coupling agent
- memories
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
The invention discloses a chemical polishing composition for memories. The chemical polishing composition is characterized by comprising the following substances in parts by weight: 1-3 parts of surfactant, 2-5 parts of organic additive, 1-3 parts of regulating agent, 50-55 parts of waterborne medium, 1-2 parts of nano-graphite powder, 7-13 parts of ammonia water, 7-13 parts of aluminium hydroxide, 9-13 parts of hollow glass beads, 11-18 parts of sorbitol, 7-10 parts of polypropylene, 9-16 parts of polyethylene, 1-8 parts of glycerol, 7-16 parts of diphenyl ketone, 1-7 parts of coupling agent, 14-19 parts of methyl triethoxysilane, 1-2 parts of titanate coupling agent and 0.5 part of nano-silver. The chemical polishing composition has the beneficial effects of simplicity in preparation, obvious polishing effects and stable properties.
Description
Technical field
The present invention relates to a kind of storer chemical rightenning composition.
Background technology
Constant to increasing internal memory or the demand of hard-disk capacity and the trend of internal memory or hard disk miniaturization (because needing more minidisk driving mechanism in computer equipment), emphasize the importance of internal memory or hard film manufacture method, comprise planarization or the polishing of this class disc, to guarantee performance the best.Although exist severally for the chemically machinery polished relevant to semiconductor device manufacture (CMP) composition and method, almost there is no conventional CMP method or the CMP composition that is purchased is very suitable for planarization or the polishing of internal memory or hard film.
Summary of the invention
Technical problem to be solved by this invention is to provide a kind of storer chemical rightenning composition.
For solving the problems of the technologies described above, the technical solution used in the present invention is:
A kind of storer chemical rightenning composition, it is characterized in that, comprise the material of following parts by weight: tensio-active agent 1-3 part, organic additive 2-5 part, conditioning agent 1-3 part, aqueous medium 50-55 part, Nano graphite powder 1-2 part, ammoniacal liquor 7-13 part, aluminium hydroxide 7-13 part, hollow glass micropearl 9-13 part, sorbyl alcohol 11-18 part, polypropylene 7-10 part, polyethylene 9-16 part, glycerine 1-8 part, two ketone 7-16 parts, coupling agent 1-7 part, Union carbide A-162 14-19 part, titanate coupling agent 1-2 part, 0.5 part of nanometer silver.
The invention has the beneficial effects as follows: preparation is simple, and polishing effect is obvious, stable performance.
Embodiment
Embodiment 1
A kind of storer chemical rightenning composition, it is characterized in that, comprise the material of following parts by weight: tensio-active agent 1-3 part, organic additive 2-5 part, conditioning agent 1-3 part, aqueous medium 50-55 part, Nano graphite powder 1-2 part, ammoniacal liquor 7-13 part, aluminium hydroxide 7-13 part, hollow glass micropearl 9-13 part, sorbyl alcohol 11-18 part, polypropylene 7-10 part, polyethylene 9-16 part, glycerine 1-8 part, two ketone 7-16 parts, coupling agent 1-7 part, Union carbide A-162 14-19 part, titanate coupling agent 1-2 part, 0.5 part of nanometer silver.
Claims (1)
1. a storer chemical rightenning composition, it is characterized in that, comprise the material of following parts by weight: tensio-active agent 1-3 part, organic additive 2-5 part, conditioning agent 1-3 part, aqueous medium 50-55 part, Nano graphite powder 1-2 part, ammoniacal liquor 7-13 part, aluminium hydroxide 7-13 part, hollow glass micropearl 9-13 part, sorbyl alcohol 11-18 part, polypropylene 7-10 part, polyethylene 9-16 part, glycerine 1-8 part, two ketone 7-16 parts, coupling agent 1-7 part, Union carbide A-162 14-19 part, titanate coupling agent 1-2 part, 0.5 part of nanometer silver.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410292072.8A CN104046270A (en) | 2014-06-26 | 2014-06-26 | Chemical polishing composition for memories |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410292072.8A CN104046270A (en) | 2014-06-26 | 2014-06-26 | Chemical polishing composition for memories |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104046270A true CN104046270A (en) | 2014-09-17 |
Family
ID=51499682
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410292072.8A Pending CN104046270A (en) | 2014-06-26 | 2014-06-26 | Chemical polishing composition for memories |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104046270A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104610802A (en) * | 2015-02-02 | 2015-05-13 | 芜湖市宝艺游乐科技设备有限公司 | Waterproof polyethylene powder coating containing nanometer silver grafted colloidal graphite and preparation method of waterproof polyethylene powder coating |
-
2014
- 2014-06-26 CN CN201410292072.8A patent/CN104046270A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104610802A (en) * | 2015-02-02 | 2015-05-13 | 芜湖市宝艺游乐科技设备有限公司 | Waterproof polyethylene powder coating containing nanometer silver grafted colloidal graphite and preparation method of waterproof polyethylene powder coating |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140917 |