CN104045233B - Big core multimode fibre - Google Patents
Big core multimode fibre Download PDFInfo
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- CN104045233B CN104045233B CN201410245579.8A CN201410245579A CN104045233B CN 104045233 B CN104045233 B CN 104045233B CN 201410245579 A CN201410245579 A CN 201410245579A CN 104045233 B CN104045233 B CN 104045233B
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
- C03B37/01815—Reactant deposition burners or deposition heating means
- C03B37/01823—Plasma deposition burners or heating means
- C03B37/0183—Plasma deposition burners or heating means for plasma within a tube substrate
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/01205—Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments
- C03B37/01262—Depositing additional preform material as liquids or solutions, e.g. solution doping of preform tubes or rods
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2203/00—Fibre product details, e.g. structure, shape
- C03B2203/10—Internal structure or shape details
- C03B2203/22—Radial profile of refractive index, composition or softening point
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2203/00—Fibre product details, e.g. structure, shape
- C03B2203/10—Internal structure or shape details
- C03B2203/22—Radial profile of refractive index, composition or softening point
- C03B2203/24—Single mode [SM or monomode]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2203/00—Fibre product details, e.g. structure, shape
- C03B2203/10—Internal structure or shape details
- C03B2203/22—Radial profile of refractive index, composition or softening point
- C03B2203/26—Parabolic or graded index [GRIN] core profile
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/70—Control measures
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
Abstract
The present invention describes the multimode fibre prepared by improved method, and this method reduce manufacturing costs.These methods can also be more efficient in terms of power attenuation.In one of multiple specific implementation modes, improved design has the big core of pure silicon dioxide obtained from rod-in-tube technique.In this specific embodiment, using isothermal rf- plasma deposition technique, lower doping covering is prepared by the way that the silica of Fluorin doped to be deposited in silica starting pipe.It is inserted into silica core and silica starting Guan Rong collapses.It removes silica and starts pipe and the drawing optical fiber from the silica bar of the glass fluxing technique of Fluorin doped.
Description
Technical field
The present invention relates to one group of designs of the optical fiber with big core.It is set more particularly, to for cost efficiency manufacture
The multimode fibre of meter.
Background technology
The middle long-haul transmission of optical signal is used for extremely low-loss optical fiber.They are typically that list is transmitted in small core
Mould.In order to provide best light guide performance with low-loss, the index distribution of optical fiber is typically complicated, usually has upper doping
The core of (relative to pure silicon dioxide) and multiple covering.It is many on the contrary, in short-range applications (such as several meters to tens of rice)
Optical fiber is to design the simpler and less expensive multimode fibre of cost therewith.These optical fiber usually core with bigger simultaneously carries more
High optical power, but best optical delivery efficiency is not required.These design main purposes be facilitate manufacture thus bring
Lower unit cost.
One of these simple multimodes designs have the step-refraction index of pure silicon dioxide core and single lower doping covering.
This design has doping core and the Single Mode Fiber Design of multiple covering on step opposite with most of.Therefore this optical fiber system
It causes considerably lower.
Although multimode fibre of this step-refraction index itself is simple and manufactures with cost efficiency, further decrease into
Originally it is persevering target.
Invention content
The present invention devises the multimode fibre that can be manufactured by the improved method of reduction manufacturing cost.These methods may be
In terms of power attenuation also more efficiently.In one of embodiment, improved design includes the pure titanium dioxide derived from rod-in-tube technique
The big core of silicon.In this embodiment, using isothermal rf- plasma deposition technique, by depositing flourine deped silicon dioxide in pipe
Oxygen generates the lower covering adulterated.For convenience's sake, this method is herein referred to as isothermal RF plasma internal depositions, or
IRFPID.It is inserted into silica plug and collapses Guan Rong is started.Silica starts pipe and can be removed and by Fluorin doped glass
The silica bar drawing optical fiber of glass cladding.
The present invention relates to methods for optical fiber manufacture, this method includes：
(a) heating optical fiber precast body is to softening temperature,
With
(b) from precast body drawing optical fiber,
It is characterized in that optical fiber preform is made by the steps, the step includes：
(i) it is adulterated by isothermal RF plasmas internal deposition (IRFPID) in the case where IRFPID silica is started and formed in pipe
Glass-clad, wherein IRFPID include：
Silica starting pipe is placed in the resonance coil of plasma generator by (i '),
(ii ') will introduce silica comprising the chemical reactant of lower dopant and start in pipe,
(iii ') keeps silica to start the internal pressure subatmospheric in pipe,
(iv ') excites resonance coil to generate isothermal plasma in pipe to be started in silica,
(v ') heats the inner wall of substrate tube,
(vi ') only makes lower doped-glass be deposited on silica in the narrow zone of the isothermal plasma upstream of generation
It starts pipe not deposit in isothermal plasma above, the narrow zone is no more than silica and starts length of tube
1%,
(ii) glass plug IRFPID silica is inserted into start in pipe,
(iii) make IRFPID silica start Guan Rong collapse on the glass plug to generate with core material and in core
First solid glass body of the lower doping clad material on material.
This method further comprises that removal at least part IRFPID starts pipe to form the second solid-state glass of core material
Glass body, and from the first solid glass body removal the lower doping clad material on core material the step of.
In the above-mentioned methods, the part that the only described IRFPID starts pipe is removed.
In the above-mentioned methods, the IRFPID starts pipe and is all removed.
In the above-mentioned methods, the IRFPID starts pipe and is removed by mechanical lapping.
In the above-mentioned methods, the IRFPID starts pipe and is removed by plasma etching mode.
In the above-mentioned methods, the IRFPID starts pipe and is removed by chemical etching.
In the above-mentioned methods, the IRFPID starts pipe appointing by mechanical lapping, plasma etching and chemical etching
Meaning combines to remove.
In the above-mentioned methods, the negative δ values of the lower doped-glass covering are less than -0.05%.
In the above-mentioned methods, the negative δ percent values of the lower doped-glass covering are in -0.15% and -2.2% range
It is interior.
In the above-mentioned methods, for the glass core stick at the core in optical fiber, core radius is 5 microns to 1000 microns.
In the above-mentioned methods, the thickness of the lower doping covering changes in 0.5 micron to 1000 microns section.
In the above-mentioned methods, the glass plug is the silica plug of the δ values with approximation zero.
In the above-mentioned methods, the glass plug is graded index plug.
In the above-mentioned methods, including the chemical reactant of lower dopant contains fluorine.
The invention further relates to a kind of with core and the optical fiber of lower doping covering, the wherein radius of core are micro- for 5 to 1000
Rice, and wherein optical fiber is made up of the above method.
The present invention relates to a kind of methods of manufacture optical fiber preform, including：
(i) it is adulterated by isothermal RF plasmas internal deposition (IRFPID) in the case where IRFPID silica is started and formed in pipe
Glass-clad, wherein IRFPID include：
Silica starting pipe is placed in the resonance coil of plasma generator by (i '),
(ii ') will introduce silica comprising the chemical reactant of lower dopant and start in pipe,
(iii ') keeps silica to start the internal pressure subatmospheric in pipe,
(iv ') excites resonance coil to generate isothermal plasma in pipe to be started in silica,
(v ') heats the inner wall of substrate tube,
(vi ') only makes lower doped-glass be deposited on silica in the narrow zone of the isothermal plasma upstream of generation
It starts pipe not deposit in isothermal plasma above, the narrow zone is no more than silica and starts length of tube
1%,
(ii) glass plug IRFPID silica is inserted into start in pipe,
(iii) make IRFPID silica start Guan Rong to collapse on the glass plug, generate with core material and in core material
On lower doping clad material the first solid glass body.
This method further comprises removing at least part IRFPID and starts pipe to form the second solid glass body of core material,
And from the first solid glass body remove core material on lower doping clad material the step of.
In the above-mentioned methods, the negative δ values of the lower doped-glass covering are less than -0.05%.
In the above-mentioned methods, including the chemical reactant of lower dopant contains fluorine.
The invention further relates to one kind optical fiber preforms made of the above method.
The present invention relates to a kind of preparation methods of lower doping pipe, including：
(i) it is adulterated by isothermal RF plasmas internal deposition (IRFPID) in the case where IRFPID silica is started and formed in pipe
Glass-clad, wherein IRFPID include：
Silica starting pipe is placed in the resonance coil of plasma generator by (i '),
(ii ') will introduce silica comprising the chemical reactant of lower dopant and start in pipe,
(iii ') keeps silica to start the internal pressure subatmospheric in pipe,
(iv ') excites resonance coil to generate isothermal plasma in pipe to be started in silica,
(v ') heats the inner wall of substrate tube,
(vi ') only makes lower doped-glass be deposited on silica in the narrow zone of the isothermal plasma upstream of generation
It starts pipe not deposit in isothermal plasma above, the narrow zone is no more than silica and starts length of tube
1%.
This method further comprises removing the step of at least part IRFPID starts pipe.
In the above-mentioned methods, the negative δ values of the lower doped glass layer are less than -0.05%.
In the above-mentioned methods, including the chemical reactant of lower dopant contains fluorine.
The invention further relates to one kind, and the lower doping made of the above method is managed.
The present invention relates to a kind of isothermal RF plasmas internal deposition (IRFPID) methods, including：
Silica starting pipe is placed in the resonance coil of plasma generator by (i '), and the plasma occurs
The power bracket of device is 2-20kW,
Chemical reactant comprising fluorine dopant is introduced silica and started in pipe by (ii '),
(iii ') keeps silica to start the interior range for being pressed in 0.1 to 50 supports in pipe,
(iv ') excites resonance coil to generate isothermal plasma in pipe to be started in silica,
The inner wall of substrate tube is heated to 1000 DEG C to 1600 DEG C of range by (v '),
(vi ') only makes Fluorin doped glass be deposited on silica in the narrow zone of the isothermal plasma upstream of generation
It starts pipe not deposit in isothermal plasma above, the narrow zone is no more than silica and starts length of tube
1%,
Wherein
Chemical reactant comprising fluorine dopant is transported to silica with 1 to 2000cc/min to start in pipe,
With 50 to 15000cc/min conveying O2；
With 0 to 2000cc/min conveying SiCl4；
The lateral rate of isothermal plasma is more than 1m/min；With
The lateral length of isothermal plasma is more than 0.1m.
In the above-mentioned methods：
The power bracket of the resonance coil of plasma generator is 3-15kW；
It is pressed within the scope of 5 to 20 supports in silica starting pipe；
Silica starts the temperature in pipe within the scope of 1100 DEG C to 1400 DEG C；
Chemical reactant comprising fluorine dopant is transported to silica with 10 to 1000cc/min to start in pipe；
With 500 to 10000cc/min conveying O2；
With 0 to 1500cc/min conveying SiCl4；
The lateral rate of isothermal plasma is more than 4m/min；With
The lateral length of isothermal plasma is between 0.25 to 3 meters.
In the above-mentioned methods, the diameter of inner pipe for starting pipe is 20 millimeters or bigger, and pipe thickness is 3 millimeters or thicker.
In the above-mentioned methods, including the chemical reactant of fluorine dopant includes SiF4。
In the above-mentioned methods, including the chemical reactant of fluorine dopant includes C2F6。
The invention further relates to a kind of optical fiber with core and Fluorin doped covering, and the wherein radius of core is 5 to 1000 micro-
Rice, wherein optical fiber are manufactured by isothermal RF plasmas internal deposition (IRFPID) method.
The invention further relates to the optical fiber preforms that one kind is manufactured by isothermal RF plasmas internal deposition (IRFPID) method.
The invention further relates to the Fluorin doped pipes that one kind is manufactured by isothermal RF plasmas internal deposition (IRFPID) method.
Description of the drawings
Fig. 1 is refractive index profile of optical fibers according to the embodiment of the present invention, shows general distributed constant to have
Help the IRFPID methods of the description present invention；
Fig. 2 and Fig. 3 is the rod-in-tube technique schematic diagram for the IRFPID methods for manufacturing optical fiber preform；
Fig. 4 is the schematic diagram of IRFPID techniques, shows that high purity glass, which is deposited on IRFPID, to be started on inside pipe wall；
Fig. 5 shows the molten step of collapsing after IRFPID techniques；
Fig. 6 shows the optional step in present invention process：It removes IRFPID and starts pipe, leave the rank for drawing optical fiber
Jump refractive index precast body.
Fig. 7 is optical fiber drawing apparatus schematic diagram, which can be used for will be pre- made of IRFPID methods
Body processed is drawn into the optical fiber of continuous length.
Detailed description
With reference to figure 1, the exemplary dimensions design parameter that IRFPID methods of the present invention can be used to generate is shown.The figure is shown
The step-refraction index distribution map of multimode fibre, wherein optical fiber core 11 is pure silicon dioxide, or the silica being lightly doped
(showing the δ values close to zero).δ values are hundred between common refractive index and base value 0 (refractive index for indicating pure silicon dioxide)
Divide ratio poor.The size of core is 2r.The radius of integral optical fiber core/covering is indicated with R in this embodiment.Covering 12 is fluorine
Doping silicon dioxide, have shown in bear δ values.The lower common negative δ values of doping covering, n can be less than -0.05%, preferably be situated between
In -0.05% and -3.0%, most preferably between -0.15% and -2.2%.Big core radius indicates with r,
Usually at 5 microns to 1000 microns, preferably change in 24 microns to 100 micron ranges.The thickness R-r of lower doping covering can be with
At 0.5 micron to 1000 microns, preferably change in 1 micron to 200 micron ranges.
In this second embodiment, it is indicated by dotted line 14, the radius of integral optical fiber core/covering is R2.Region 14 is thick
Degree is the undoped covering of R2-R.The step of preparing this covering will state below.Radius R2 can wide variation.
Commonly known in the art to be, the same ratio distribution map with different absolute values will be characterized for manufacturing
The precast body of IRFPID optical fiber.
It is prepared by improved rod-in-tube technique according to IRFPID optical fiber preforms of the present invention.In conjunction with attached drawing 2 and 3 pairs of rod-in-tube techniques into
Row description.It can be understood that involved, the drawings are not necessarily drawn to scale.
The plug 22 of diagram is inserted into cladding 21.According to the preferred embodiment of the present invention, plug is pure dioxy
Silica is lightly doped close to zero in SiClx or δ values.Preferably, it is the low-loss for realizing best, plug non-impurity-doped.Pure titanium dioxide
Silicon rod can commercially be obtained from various sources.The preparation of plug is not a part for IRFPID methods described herein.From
Main IRFPID methods are set out, and prepared by plug is not all the flexibility and cost effectiveness that manufacturing sequence increases.Although
Pure silicon dioxide stick is preferred plug, but the arbitrary glass plug for being suitable for multimode fibre core can use.For example, each
The graded-index glass plug of type can be employed as the glass core of precast body made from IRFPID methods through the invention
Body.
Those skilled in the art will appreciate that very big prefabricated plug is used to prepare corresponding big core diameter
It is possibly realized, without increasing the time and complexity prepared by precast body, and deposited in the form of cigarette ash relative to core material
For art methods so that precast body size is obtained being significantly increased and is possibly realized.
As shown in figure 3, after assembly stick 22 and pipe 21, Guan Rong collapses to generation solid bar 33 on stick, and plug 34 is in addition to very
It can not be distinguished with cladding except small refringence.
Pipe in IRFPID methods under being deposited in glass tube substrate doped-glass by be made.Commercial actual use
Representative glass tube substrate size have typical L/D ratio 10-15.Pipe in deposition provide one it is protected
Environment so that the degree of purity and composition of depositional environment can obtain height control.Deposition method using isothermal RF generate etc.
Gas ions create narrow conversion zone in pipe.Using isothermal low pressure plasma operating condition, which generates plasma
The narrow deposition zone domain (that is, position at reaction mass introducing between plasma) of body upstream.Plasma operations
Condition generally depends on the parameter of many interactions.Substantially, crucial to be designed to provide enough energy densities for producing
Raw narrow conversion zone, while sufficiently low heat level is kept, to avoid the evaporation of the inner surface of substrate tube.
IRFPID methods will be described in detail by means of the schematic illustration of Fig. 4.In IRFPID, several operation ginsengs are controlled
Number is so as to the deposition region extremely narrow in the plasma upstream end formation close to generation.Control sedimentary condition makes described narrow
Narrow deposition region only accounts for about the 1% of typical substrate length of tube.The value of this and prior art MCVD and PCVD technique 10-30% are formed
Comparison.More broadly, used condition generally produces one centimetre or smaller narrow deposition zone domain.Silicon dioxide tube 41 is used
Make substrate tube.Glass precursor is introduced into pipe 41 at 43.In this embodiment, reactant includes the inner wall being suitable in substrate tube
The upper silicon compound and fluorine compounds for generating Fluorin doped glass 44.Reactant may include SiCl4And C2F6.But this field is public
Other precursor materials for manufacturing lower doped-glass known may also used to adulterate deposit under generating in substrate tube.
Plasma generator is used to generate the isothermal RF plasmas 42 with enough energy densities and is mixed to form fluorine
Miscellaneous glass deposit." isothermal " plasma means that ion in plasma and electronics are in almost the same temperature.
On the contrary, traditional PCVD systems use non-isothermal plasma, wherein electron energy more much higher than ion.In the arrangement of the present invention
It is middle that isothermal plasma is used to react and be deposited on close to generation at plasma " upstream ", as shown in Figure 4.It is cut with cigarette ash
So on the contrary, upstream sedimentation mechanism is formed by uniform particle and grown so that generating the glass particle melted.What these melted
The subsequent thermophoretic deposition of glass particle is in plasma upstream.Deposition hair generates before reactant enters heating region.
Narrow thermal region in several inches of Plasma Center is reacts the heat that high concentration is provided with thermophoretic deposition, and plasma exists
Tube wall is further heated in downstream, to improve the temperature of 41 side wall of substrate tube.Therefore, when plasma generator is across pipe 41
When, the heating region of plasma " upstream " is the place that deposition occurs.The temperature of inner wall is melted glass particle and is formed enough
Uniform glass-film.The parameter of IRFPID techniques is controlled so that conversion zone is not heated to substrate and will start to evaporate or divide
The temperature for solving rather than melting.For example, it is recommended that RF plasmas are run under 2-20kW power brackets, the temperature at tube lining bottom
Degree is maintained in the range of 1000 DEG C to 1600 DEG C.Pressure subatmospheric in IRFPID methods, for example, it is less than 100 supports, it is excellent
It is selected within the scope of 0.1 to 50 support.Low pressure causes deposition region extremely narrow in conjunction with isothermal plasma, for example, approximate pipe range
1%, normally about one centimetre or less.Low pressure additionally aids the thermal content for reducing the very plasma of high temperature so that substrate
It will not be evaporated with reactant.Compared with other techniques, IRFPID methods also generate higher deposition efficiency, to further save
Cost-saving.
One important feature of IRFPID methods is low pressure, and isothermal plasma body technology generates before entering plasma
(that is, plasma upstream) is deposited on the thawing glass particle on substrate wall.Not will produce in the process of the present invention/deposit cigarette
Ash.Also, additional deposition phenomenon does not occur in heating region；All depositions are all happened at close to plasma upstream
The narrow zone at place.Meanwhile plasma need not be used for curing schedule, because deposited particles are will be cured in deposition
Glass particle.
The more details of isothermal plasma deposition step can be found in U.S. Patent number 8,252,387, and the patent is public
It opens in August in 2012 28 days, and transfers present assignee.The full patent texts are hereby incorporated by reference.
It will be appreciated by those skilled in the art that other than refractive index profile shown in FIG. 1, IRFPID methods can be used
In generating broad diversity being currently known or changing the index distribution more developed, these variations need one or more
Lower doped region.It is to be further appreciated that the ability for forming the increased core material of thickness make in core design it is extensive various
Property is possibly realized.
When IRFPID, which is deposited, to be completed, Guan Rong is collapsed onto silica plug using known technology, that is, heats the pipe extremely
More than glass transition temperature, i.e. ＞ 2000-2400 DEG C become so that the surface tension of glass tube makes pipe diameter slowly shrink
May, solid bar is finally formed after multipass spray gun (torch).The molten stick that collapses is shown in Fig. 5, with silica
Plug 51, IRFPID silica start doped layer 52 under pipe 53 and IRFPID.If desired, the cleaning before molten collapse can be introduced
Step.Equally, the ambient enviroment between controllable tubulation and stick.The datail description of suitable additional step in U.S. Patent number 8,
252,387, it is disclosed in August in 2012 28, is incorporated herein by reference in this as additional introduction related to the present invention.
Next, according to a preferred aspect of the invention, IRFPID silica starts pipe 53 and can be removed.This can lead to
Mechanical lapping, plasma etching, chemical etching are crossed, or is realized by the combination of these technologies.In some cases, depend on
In the quality for applying and/or starting tube material, the residual for the starting tube material being looped around around IRFIPD deposit glass can be retained
Amount.However, in one preferred embodiment, all starting Guan Jun are removed.The terminal of etching work procedure can be by the molten stick that collapses
Index distribution determine.Complete to can measure etched precast body later grinding or etching to determine overetch
(overetching) the considerations of amount, overetched amount alternatively starts pipe factor.Obviously, in this case, overetch
Better than undercut.Therefore, IRFPID depositions and etching period can be limited for IRFPID deposition materials but restriction
(finite) it etches and designs.Preferably, the pipe more than 90% is removed, and more typically, all Guan Jun are removed.
The retained embodiment of pipe is at least partly started to be shown by dotted line 14 in Fig. 1.
After getting rid of at least partly IRFPID and starting pipe, the core glass of IRFPID depositions remains, such as Fig. 6 institutes
Show.In currently preferred practice, the stick in Fig. 6 is the IRFPID precast bodies for drawing optical fiber.
As described above, IRFPID optical fiber preforms are then used to drawing optical fiber.From IRFPID precast body drawing optical fibers
Appropriate device is as shown in Figure 7.Fig. 7 shows precast body 71, indicates for softening glass preform and starting the molten of fiber drawing
The pedestal 72 of stove (not shown).Drawing optical fiber is indicated with 73.Newborn fiber surface is then by coating cup (in general manner by 74
Indicate), coating cup 74 has the chamber 75 for including coating prepolymer 76.The fiber of liquid coating from coating chamber is pierced by film
First 81.The fluid dynamic combination of die head 81 and prepolymer controls coating thickness.Then the fiber 84 that will be coated with through prepolymer
UV lamp 85 is exposed to cure prepolymer and complete painting process.Other curing radiations can be used in appropriate circumstances.Have
The optical fiber of solidify coating is wound the winding of disk 87.The draw rate of winder control fiber.Usual 1-50 meter per seconds model can be used
Enclose interior draw rate.It is important that fiber is located at coating cup center, especially it is located at outlet die head 81 and hits exactly, to keep fiber
With the proper alignment of coating.Business equipment usually has the pulley linear for control fiber.Fluid dynamic in mold itself
Learning pressure helps that fiber is made to occupy center.The step motor control winder controlled by micro-stepping protractor (not shown).
The coating material of optical fiber is typically polyurethane, polyacrylate (acrylates) or polyurethane-acrylate,
Middle addition UV photoinitiators.Device in Fig. 7 shows there is individually coated cup, but with the double application device of double coating cups
It is common.In double coated fibers, typical initial or internal coating material is the material of soft, low modulus, such as organic
Silicon, hot melt wax or many any one of polymer materials with relatively low modulus.For the common of the second or external coating
Material is high modulus polymer, typically polyurethane or acrylic resin.Both materials may be low in business practice
With the polyacrylate of high-modulus.Coating thickness is usually in a diameter of 150-300 microns of range, with about 240 microns of mark
It is accurate.
In addition, the IRFPID methods of the present invention may be utilized in fabricating lower doping pipe.Different from being deposited in lower dopant such as fluorine
After be inserted into core, lower doping pipe can be used as individual overclad tubes.Depending on the application of lower doping pipe, at least part starts pipe
It can be removed by any means described above.Although the various IRFPID methods for starting pipe and may be used to the present invention,
Starting pipe with 20mm or bigger diameter of inner pipe and 3mm or thicker pipe thicknesses is to be preferably used in rising for the lower doping pipe of manufacture
Dynamic pipe.
In IRFPID methods, in order to obtain required lower dopant profiles, it is necessary to which carefully control silica is mixed under
The deposition of heterocompound.For example, for use IRFPID methods of the present invention fluorine deposit for, it is recommended that RF plasmas with
The Power operation of 2-20kW, inside pipe wall temperature are maintained at 1000 DEG C to 1600 DEG C of range, and the pressure in pipe is maintained at 0.1 to 50
The range of support.Preferably, for RF power in the range of 3-15kW, inside pipe wall temperature is in the range of 1100 DEG C to 1400 DEG C, pipe
Interior pressure is in the range of 5 to 20 support.
The flow rate of certain compounds also needs carefully to control in deposition process.For example, for using the present invention
IRFPID methods fluorine deposition for, it is recommended that with 50 to 15000cc/min conveying O2, with 0 to 2000cc/min conveying
SiCl4, and with 1 to 2000cc/min conveying SiF4Or C2F6.Preferably, with 500 to 10000cc/min conveying O2, with 0 to
1500cc/min conveys SiCl4, and with 10 to 1000cc/min conveying SiF4Or C2F6。
Preferably, the lateral rate of the isothermal plasma of generation is more than 1m/min, it is highly preferred that more than 4m/min.And
And the lateral length of plasma is preferably greater than 0.1m, is more preferably between 0.25 and 3m.
Although the various pipes that start can be used for the IRFPID methods of the present invention, there is 20 millimeters or bigger diameter of inner pipe
Starting pipe with 3 millimeters or thicker pipe thickness is that the IRFPID methods of the present invention preferably start pipe.
Those skilled in the art can carry out various additional modifications to the present invention.It specifically instructs and obtains from this specification
, substantially according to principle and its doctrine of equivalents all changes schemes (being improved by their prior arts) reasonably
It is considered as falling into the described and claimed scope of the invention.
Claims (12)
1. a kind of methods for optical fiber manufacture, including：
(i) by depositing (IRFPID) in isothermal radio frequency plasma body glass is adulterated in the case where IRFPID silica is started and formed in pipe
Glass layer, wherein the IRFPID includes：
Silica starting pipe is placed in the resonance coil of plasma generator by (i ')；
(ii ') will introduce the silica comprising the chemical reactant of lower dopant and start in pipe；
(iii ') keeps silica to start the internal pressure subatmospheric in pipe；
(iv ') excites resonance coil to generate isothermal plasma in pipe to be started in silica；
(v ') heats the inner wall of substrate tube；With
(vi ') only makes lower doped-glass be deposited on silica starting in the narrow zone of the isothermal plasma upstream of generation
It is not deposited on pipe and in isothermal plasma body, the narrow zone starts length of tube no more than the silica
1%,
Wherein
The power bracket of plasma generator is 2-20kW,
Including the chemical reactant of lower dopant is the chemical reactant containing fluorine dopant, by the chemical reactant containing fluorine dopant
Silica is transported to 1 to 2000cc/ minute (cc/min) to start in pipe；
Silica starts the internal pressure in pipe between 0.1 to 50 support；
The inner wall of substrate tube is heated to the range between 1000 DEG C to 1600 DEG C；
With 50 to 15000cc/min conveying O2；
With 0 to 2000cc/min conveying SiCl4；
The lateral rate of isothermal plasma is more than 1m/min；With
The lateral length of isothermal plasma is more than 0.1m, and
The negative δ values of the lower doped glass layer are less than -0.05%, and wherein δ values are the refractions of refractive index and expression pure silicon dioxide
Common percent difference between the base value 0 of rate, and
Wherein silica, which starts, manages the L/D ratio with 10-15, and the method further includes：
(ii) glass plug IRFPID silica is inserted into start in pipe；With
(iii) make IRFPID silica start Guan Rong collapse on the glass plug to generate with core material and in the core
First solid glass body of the lower doping clad material on material.
2. the method as described in claim 1 further comprises：It removes at least part IRFPID and starts pipe.
3. method as claimed in claim 2, wherein removal at least part IRFPID one of is selected from the group the step of starting pipe：
Only removal IRFPID starts a part for pipe；
Remove the whole that IRFPID starts pipe；
At least part that IRFPID starts pipe is removed by mechanical lapping；
At least part that IRFPID starts pipe is removed by plasma etching；
At least part that IRFPID starts pipe is removed by chemical etching；With
At least part that IRFPID starts pipe is made a return journey by the arbitrary combination of mechanical lapping, plasma etching and chemical etching
It removes.
4. the method as described in claim 1, wherein the negative δ values of the lower doped glass layer are between -0.15% to -3.0%.
5. method as claimed in claim 4, wherein the negative δ values of the lower doped glass layer are between -0.15% to -2.2%.
6. the method as described in claim 1, the first solid glass body is optical fiber preform, and this method further comprises：
The optical fiber preform is heated to softening temperature；With
By the precast body drawing optical fiber, which has core and lower doping covering.
7. method as claimed in claim 6, wherein the radius of the core is 5 microns to 1000 microns.
8. method as claimed in claim 6, wherein the thickness of the lower doping covering is 0.5 micron to 1000 microns.
9. the method as described in claim 1, wherein the glass core stick is the silica plug with zero δ values.
10. the method as described in claim 1, wherein the glass core stick is graded index plug.
11. the method as described in claim 1, wherein：
The power bracket of the resonance coil of plasma generator is 3-15kW；
It is pressed within the scope of 5 to 20 supports in silica starting pipe；
Silica starts the temperature in pipe within the scope of 1100 DEG C to 1400 DEG C；
Chemical reactant containing fluorine dopant is transported to silica with 10 to 1000cc/min to start in pipe；
With 500 to 10000cc/min conveying O2；
With 0 to 1500cc/min conveying SiCl4；
The lateral rate of isothermal plasma is more than 4m/min；With
The lateral length of isothermal plasma is between 0.25 to 3 meters.
12. the method as described in claim 1, the chemical reactant containing fluorine dopant includes selected from the reactant of the following group：
SiF4；With
C2F6。
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/834,973 US9002162B2 (en) | 2013-03-15 | 2013-03-15 | Large core multimode optical fibers |
| US13/834,973 | 2013-03-15 |
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| CN104045233A CN104045233A (en) | 2014-09-17 |
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| US (1) | US9002162B2 (en) |
| EP (1) | EP2784034B1 (en) |
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| US8252387B2 (en) * | 2007-12-10 | 2012-08-28 | Ofs Fitel, Llc | Method of fabricating optical fiber using an isothermal, low pressure plasma deposition technique |
| DE102014115534A1 (en) * | 2014-10-24 | 2016-04-28 | J-Plasma Gmbh | Method for the bi-directional and / or unidirectional removal of a glass cladding layer of a glass mold and a glass mold |
| NL2015161B1 (en) * | 2015-07-13 | 2017-02-01 | Draka Comteq Bv | A method for preparing a primary preform by etching and collapsing a deposited tube. |
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| JP5826318B2 (en) | 2015-12-02 |
| US20140270665A1 (en) | 2014-09-18 |
| JP2014181175A (en) | 2014-09-29 |
| CN104045233A (en) | 2014-09-17 |
| US9002162B2 (en) | 2015-04-07 |
| EP2784034B1 (en) | 2017-06-07 |
| EP2784034A1 (en) | 2014-10-01 |
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