CN104021845A - Transparent conductor - Google Patents

Transparent conductor Download PDF

Info

Publication number
CN104021845A
CN104021845A CN201410239553.2A CN201410239553A CN104021845A CN 104021845 A CN104021845 A CN 104021845A CN 201410239553 A CN201410239553 A CN 201410239553A CN 104021845 A CN104021845 A CN 104021845A
Authority
CN
China
Prior art keywords
transparent
conductive
semi
silk thread
conductive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201410239553.2A
Other languages
Chinese (zh)
Inventor
唐根初
刘伟
蒋芳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanchang OFilm Tech Co Ltd
Suzhou OFilm Tech Co Ltd
OFilm Group Co Ltd
Original Assignee
Nanchang OFilm Tech Co Ltd
Suzhou OFilm Tech Co Ltd
Shenzhen OFilm Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanchang OFilm Tech Co Ltd, Suzhou OFilm Tech Co Ltd, Shenzhen OFilm Tech Co Ltd filed Critical Nanchang OFilm Tech Co Ltd
Priority to CN201410239553.2A priority Critical patent/CN104021845A/en
Publication of CN104021845A publication Critical patent/CN104021845A/en
Pending legal-status Critical Current

Links

Landscapes

  • Laminated Bodies (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

Disclosed is a transparent conductor. The transparent conductor comprises a transparent substrate, an adhesive layer and a conducting layer which are successively stacked. The conducting layer is a semi-solid transparent conductive photosensitive resin layer, and comprises a semi-solid transparent photosensitive resin matrix and nanometer conductive wires filling the semi-solid transparent photosensitive resin matrix. The nanometer conductive wires are connected in a staggered mode to form a conductive grid. According to the transparent conductor, the conducting layer realizes conduction through the conductive grid formed by staggered connection of the nanometer conductive wires, and compared to an ITO conducting layer, the conducting layer has relatively quite low resistance. The nanometer conductive wires are better in flexibility compared to ITO, such that the transparent conductor has quite good anti-bending performance. The conductive grid in the conducting layer is wrapped by the semi-solid transparent photosensitive resin matrix, such the conducting layer can better be prevented from scratches and is not easily damaged. The opportunities of contact between the conductive grid and air are greatly reduced, and the conducting layer is not easily oxidized. Therefore, the transparent conductor has quite good conducting performance.

Description

Transparent conductive body
Technical field
The present invention relates to touch technology field, particularly relate to a kind of transparent conductive body.
Background technology
Touch-screen is the inductive arrangement that can receive the input signals such as touch.Touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that photoelectricity industry is a dark horse.
Transparent conductive body is the important component part of touch-screen, generally includes substrate and is arranged at the conductive layer on substrate, and conductive layer can obtain transparency electrode after graphical treatment.At present, conductive layer is generally tin indium oxide (Indium Tin Oxides, ITO) conductive layer.Although the develop rapidly at a tremendous pace of the manufacturing technology of touch-screen.But take projecting type capacitor screen as example, there is not too large change in the basic manufacturing process of ITO conductive layer in recent years.Always inevitably need ITO plated film, ITO is graphical.
But the resistivity of ITO conductive layer is larger, on the larger equipment of panel computer (Tablet Personal Computer), all-in-one (All in one, AIO), notebook (Notebook) equidimension, limited its usability.
Summary of the invention
Based on this, being necessary, for the larger problem of ITO resistance conductive layer rate, provides the transparent conductive body that a kind of resistivity is lower.
A transparent conductive body, comprising:
Transparent substrates;
Conductive layer, be arranged at the surface of described transparent substrates, described conductive layer is the electrically conducting transparent photosensitive resin layer of semi-solid preparation, the electrically conducting transparent photosensitive resin layer of described semi-solid preparation comprises the transparent feel photopolymer resin matrix of semi-solid preparation and is filled in the conductive nano silk thread in the transparent feel photopolymer resin matrix of described semi-solid preparation, and described conductive nano silk thread is cross-linked to form conductive grid; And
Tack coat, is arranged between described transparent substrates and described conductive layer.
In an embodiment, the thickness range of described transparent substrates is 0.02mm~0.5mm therein.
In an embodiment, the thickness range of described transparent substrates is 0.05mm~0.2mm therein.
In an embodiment, the thickness range of described conductive layer is 10nm~500nm therein.
In an embodiment, described conductive nano silk thread is gold nano silk thread, silver nanoparticle silk thread, Cu nanowire line, aluminium nanometer silk thread or carbon nanometer silk thread therein.
In an embodiment, the diameter range of described conductive nano silk thread is 10nm~1000nm therein, and length range is 20nm~50 μ m, and the sheet resistance of described conductive layer is 0.1 Ω/~500 Ω/.
In an embodiment, the sheet resistance of described conductive layer is 20 Ω/~200 Ω/ therein.
Therein in an embodiment, the transparent feel photopolymer resin matrix that the described conductive nano silk thread of part is exposed to described semi-solid preparation is stated the surface of transparent substrates dorsad.
In an embodiment, the material of described tack coat is identical with the material of the transparent feel photopolymer resin matrix of described semi-solid preparation, and the transparent feel photopolymer resin matrix of the semi-solid preparation of described tack coat and described conductive layer is one-body molded therein.
In an embodiment, the thickness range of described tack coat is 0.5 μ m~50 μ m therein.
Above-mentioned transparent conductive body at least comprises following advantage:
In above-mentioned transparent conductive body, the conductive grid that conductive layer is cross-linked to form with conductive nano silk thread is realized conduction, and with respect to ITO conductive layer, it has relatively low resistivity.And conductive nano silk thread is better with respect to ITO pliability, thereby make above-mentioned transparent conductive body there is good bending resistance folding endurance.Conductive grid in conductive layer is coated by the transparent feel photopolymer resin matrix of semi-solid preparation, thereby makes above-mentioned conductive layer can avoid preferably scratching, and is not easy to damage.Greatly reduce the chance that conductive grid contacts with air simultaneously, above-mentioned conductive layer is not easy oxidized.Therefore, above-mentioned transparent conductive body has better electric conductivity.
Accompanying drawing explanation
Fig. 1 is the structural representation of transparent conductive body in an execution mode;
Fig. 2 is the structural representation of tack coat and conductive layer in Fig. 1;
Fig. 3 is not for removing the tack coat of release film and the structural representation of conductive layer.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail.A lot of details have been set forth in the following description so that fully understand the present invention.But the present invention can implement to be much different from alternate manner described here, and those skilled in the art can do similar improvement without prejudice to intension of the present invention in the situation that, so the present invention is not subject to the restriction of following public concrete enforcement.
Term as used herein " vertical ", " level ", " left side ", " right side " and similar statement just for illustrative purposes, do not represent it is unique execution mode.
Unless otherwise defined, all technology of using are herein identical with the implication that belongs to the common understanding of those skilled in the art of the present invention with scientific terminology.The term using in specification of the present invention herein, just in order to describe the object of specific embodiment, is not intended to be restriction the present invention.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
Refer to Fig. 1 and Fig. 2, the transparent conductive body 10 in an execution mode comprises transparent substrates 100, conductive layer 200 and tack coat 300.Conductive layer 200 can form specific conductive pattern after the operation of overexposure-development-curing, thereby makes this transparent conductive body 10 can be applicable to the fields such as touch-screen, flat-panel monitor or photovoltaic cell.
The material of transparent substrates 100 can be glass, polymethyl methacrylate, Merlon, PETG, cyclic olefine copolymer or cyclic olefin polymer.The thickness range of transparent substrates 100 can be 0.02mm~0.5mm.Consider after the processing complexity of transparent substrates 100 and the integral thickness of transparent conductive body 10, the thickness range of transparent substrates 100 is preferably 0.05mm~0.2mm.
Conductive layer 200 is arranged at the surface of transparent substrates 100.Particularly, conductive layer 200 is arranged at the surface of transparent substrates 100 indirectly by tack coat 300.Tack coat 300 is arranged between transparent substrates 100 and conductive layer 200, to increase the adhesive property between conductive layer 200 and transparent substrates 100.The electrically conducting transparent photosensitive resin layer that conductive layer 200 is semi-solid preparation, the electrically conducting transparent photosensitive resin layer of semi-solid preparation comprises the transparent feel photopolymer resin matrix 210 of semi-solid preparation and is filled in the conductive nano silk thread 220 in the transparent feel photopolymer resin matrix 210 of semi-solid preparation, and conductive nano silk thread 220 is cross-linked to form conductive grid.
The thickness range of conductive layer 200 can be 10nm~500nm.Conductive layer 200 is by conductive nano silk thread 220 is sneaked in the transparent feel photopolymer resin of flow-like, then the transparent feel photopolymer resin of convection cell shape is cured the transparent feel photopolymer resin matrix of formation semi-solid preparation and obtains.The transparent feel photopolymer resin of semi-solid preparation comprises film-forming resin, emulsion, solvent, stabilizer, levelling agent and defoamer.The weight content of each component is: 60~80 parts of film-forming resins, 1~10 part of emulsion, 5~20 parts of solvents, 0.1~5 part of stabilizer, 0.1~5 part of levelling agent, 0.1~5 part of defoamer, the umber sum of each component is 100.
Film-forming resin is at least one in polymethyl methacrylate, linear phenolic resin, epoxy resin, crotonic acid, acrylate, vinyl ethers and M Cr.
Emulsion is at least one in diazobenzene quinone, diazo naphthoquinone ester, polyvinyl cinnamate, poly-Chinese cassia tree fork malonic acid glycol ester polyester, aromatic diazo salt, aromatic sulfonium salts, fragrant salt compounded of iodine and ferrocene salt.
Solvent is oxolane, methyl ethyl ketone, cyclohexanone, propylene glycol, N, dinethylformamide, ethyl cellosolve acetate, ethyl acetate and butyl acetate, toluene, dimethylbenzene, tripropylene glycol diacrylate, trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, dipentaerythrite six acrylate, 1, at least one in 6-hexylene glycol methoxyl group mono acrylic ester and ethoxylation neopentyl glycol methoxyl group mono acrylic ester.
Stabilizer is at least one in hydroquinones, p methoxy phenol, 1,4-benzoquinone, 2,6 one di-t-butyl cresols, phenothiazine and anthraquinone.
Levelling agent is at least one in polyacrylate, acetate butyrate fiber, nitrocellulose and polyvinyl butyral resin.
Defoamer be phosphate, fatty acid ester and organosilyl at least one.
In present embodiment, the diameter of conductive nano silk thread 220 is 10nm~1000nm, and length is 20nm~50 μ m.Because the diameter of conductive nano silk thread 220 is less than the visual width of human eye, thereby guarantee the visually-clear of conductive layer 200.Conductive nano silk thread 220 can be easy to prepare and have for gold nanowires line, silver nanoparticle silk thread, Cu nanowire line, aluminium nanometer silk thread, carbon nanometer silk thread etc. the conductive thread of better electric conductivity.In present embodiment, conductive nano silk thread adopts silver nanoparticle silk thread.
In present embodiment, the sheet resistance of conductive layer 200 is 0.1 Ω/~500 Ω/ (the every square of ohm), compared to ITO conductive layer, there is better conductivity, be more suitable for for making as panel computer (Tablet Personal Computer), all-in-one (All in one, AIO), the larger touch-control product of notebook (Note Book) equidimension.
The conductivity of conductive layer 200 is relevant to diameter and conductive nano silk thread 220 distribution densities of conductive nano silk thread 220, and diameter is larger, and distribution density is larger, and conductivity is better, and sheet resistance is lower.Yet the diameter of conductive nano silk thread 220 is larger, distribution density is larger, the transmitance of conductive layer 200 is lower.Therefore,, in order to guarantee the balance of transmitance and conductivity, the sheet resistance of conductive layer 200 is preferably 20 Ω/~200 Ω/.
In present embodiment, the transparent feel photopolymer resin matrix 210 that part conductive nano silk thread 220 exposes semi-solid preparation is the surface of transparent substrates 100 dorsad, so that conductive layer 200 whole of the surface conduction of transparent substrates 100 dorsad.Although one end of part conductive nano silk thread 220 is exposed to outside the transparent feel photopolymer resin matrix 210 of semi-solid preparation, but the main part of the conductive grid that conductive nano silk thread 220 is cross-linked to form or coated by the transparent feel photopolymer resin matrix 210 of semi-solid preparation, therefore, above-mentioned transparent conductive body 10 has better anti-oxidant and scratch resistance ability with respect to traditional transparent conductive body.
Tack coat 300 is arranged at the surface of transparent substrates 100.Tack coat 300 is transparent material formation.The thickness range of tack coat 300 can be 0.5 μ m~50 μ m.In the present embodiment, the material of tack coat 300 is identical with the material of the transparent feel photopolymer resin matrix 210 of semi-solid preparation, and tack coat 300 is one-body molded with the transparent feel photopolymer resin matrix 210 of the semi-solid preparation of conductive layer 200.
Particularly, refer to Fig. 3, transparent feel photopolymer resin matrix 210 and the tack coat 300 of the semi-solid preparation of conductive layer 200 are made of one piece, and form the transparent feel photopolymer resin dry film of a semi-solid preparation.One side of dry film is mixed with conductive nano silk thread 220, makes dry film be mixed with a side conduction of conductive nano silk thread 220 and forms conductive layer 200, and the side that dry film is not mixed with conductive nano silk thread 220 forms tack coat 300.Before use, the both sides of dry film are equipped with release film 20 and using as protection.During use, the release film of dry film both sides 20 is peeled off, a side that then makes dry film form tack coat 300 by hot pressing fits in transparent substrates 100 to obtain transparent conductive body 10.
Above-mentioned transparent conductive body 10 at least comprises following advantage:
In above-mentioned transparent conductive body 10, the conductive grid that conductive layer 200 is cross-linked to form with conductive nano silk thread 220 is realized conduction, and with respect to ITO conductive layer, it has relatively low resistivity.And conductive nano silk thread 220 is better with respect to ITO pliability, thereby make above-mentioned transparent conductive body 10 there is good bending resistance folding endurance.Conductive grid in conductive layer 200 is coated by the transparent feel photopolymer resin matrix 210 of semi-solid preparation, thereby makes above-mentioned conductive layer 200 can avoid preferably scratching, and is not easy to damage.Greatly reduce the chance that conductive grid contacts with air simultaneously, make above-mentioned conductive layer 200 be not easy oxidized.Therefore, above-mentioned transparent conductive body 10 has better electric conductivity.
The above embodiment has only expressed several execution mode of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection range of patent of the present invention should be as the criterion with claims.

Claims (10)

1. a transparent conductive body, is characterized in that, comprising:
Transparent substrates;
Conductive layer, be arranged at the surface of described transparent substrates, described conductive layer is the electrically conducting transparent photosensitive resin layer of semi-solid preparation, the electrically conducting transparent photosensitive resin layer of described semi-solid preparation comprises the transparent feel photopolymer resin matrix of semi-solid preparation and is filled in the conductive nano silk thread in the transparent feel photopolymer resin matrix of described semi-solid preparation, and described conductive nano silk thread is cross-linked to form conductive grid; And
Tack coat, is arranged between described transparent substrates and described conductive layer.
2. transparent conductive body according to claim 1, is characterized in that, the thickness range of described transparent substrates is 0.02mm~0.5mm.
3. transparent conductive body according to claim 2, is characterized in that, the thickness range of described transparent substrates is 0.05mm~0.2mm.
4. transparent conductive body according to claim 1, is characterized in that, the thickness range of described conductive layer is 10nm~500nm.
5. transparent conductive body according to claim 1, is characterized in that, described conductive nano silk thread is gold nano silk thread, silver nanoparticle silk thread, Cu nanowire line, aluminium nanometer silk thread or carbon nanometer silk thread.
6. transparent conductive body according to claim 1, is characterized in that, the diameter range of described conductive nano silk thread is 10nm~1000nm, and length range is 20nm~50 μ m, and the sheet resistance of described conductive layer is 0.1 Ω/~500 Ω/.
7. transparent conductive body according to claim 6, is characterized in that, the sheet resistance of described conductive layer is 20 Ω/~200 Ω/.
8. transparent conductive body according to claim 1, is characterized in that, the transparent feel photopolymer resin matrix that the described conductive nano silk thread of part is exposed to described semi-solid preparation is stated the surface of transparent substrates dorsad.
9. transparent conductive body according to claim 1, it is characterized in that, the material of described tack coat is identical with the material of the transparent feel photopolymer resin matrix of described semi-solid preparation, and the transparent feel photopolymer resin matrix of the semi-solid preparation of described tack coat and described conductive layer is one-body molded.
10. transparent conductive body according to claim 1, is characterized in that, the thickness range of described tack coat is 0.5 μ m~50 μ m.
CN201410239553.2A 2014-05-30 2014-05-30 Transparent conductor Pending CN104021845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410239553.2A CN104021845A (en) 2014-05-30 2014-05-30 Transparent conductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410239553.2A CN104021845A (en) 2014-05-30 2014-05-30 Transparent conductor

Publications (1)

Publication Number Publication Date
CN104021845A true CN104021845A (en) 2014-09-03

Family

ID=51438559

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410239553.2A Pending CN104021845A (en) 2014-05-30 2014-05-30 Transparent conductor

Country Status (1)

Country Link
CN (1) CN104021845A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104238858A (en) * 2014-09-17 2014-12-24 南昌欧菲光科技有限公司 Touch display screen
CN104267860A (en) * 2014-09-17 2015-01-07 南昌欧菲光科技有限公司 Touch display screen
CN106328252A (en) * 2016-10-24 2017-01-11 昆山峰实电子科技有限公司 Silver nanowire conducting transparent film and manufacture method thereof
WO2021159259A1 (en) * 2020-02-10 2021-08-19 苏州大学 Flexible transparent electrode and preparation method therefor, and flexible solar cell prepared using flexible transparent electrode

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103123564A (en) * 2013-03-22 2013-05-29 汕头超声显示器技术有限公司 Capacitive touch screen and manufacturing method thereof
CN203350852U (en) * 2012-06-28 2013-12-18 日立化成株式会社 Touch panel of electrostatic capacitance coupled mode
CN103456392A (en) * 2013-08-27 2013-12-18 南昌欧菲光科技有限公司 Transparent electric conductor and manufacturing method thereof
CN103472945A (en) * 2013-08-19 2013-12-25 南昌欧菲光科技有限公司 Touch control element for touch screen and manufacturing method of touch control element
CN103576977A (en) * 2012-08-09 2014-02-12 纬创资通股份有限公司 Touch panel and manufacturing method thereof
CN203910288U (en) * 2014-05-30 2014-10-29 南昌欧菲光科技有限公司 Transparent conductive body

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN203350852U (en) * 2012-06-28 2013-12-18 日立化成株式会社 Touch panel of electrostatic capacitance coupled mode
CN103576977A (en) * 2012-08-09 2014-02-12 纬创资通股份有限公司 Touch panel and manufacturing method thereof
CN103123564A (en) * 2013-03-22 2013-05-29 汕头超声显示器技术有限公司 Capacitive touch screen and manufacturing method thereof
CN103472945A (en) * 2013-08-19 2013-12-25 南昌欧菲光科技有限公司 Touch control element for touch screen and manufacturing method of touch control element
CN103456392A (en) * 2013-08-27 2013-12-18 南昌欧菲光科技有限公司 Transparent electric conductor and manufacturing method thereof
CN203910288U (en) * 2014-05-30 2014-10-29 南昌欧菲光科技有限公司 Transparent conductive body

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104238858A (en) * 2014-09-17 2014-12-24 南昌欧菲光科技有限公司 Touch display screen
CN104267860A (en) * 2014-09-17 2015-01-07 南昌欧菲光科技有限公司 Touch display screen
CN106328252A (en) * 2016-10-24 2017-01-11 昆山峰实电子科技有限公司 Silver nanowire conducting transparent film and manufacture method thereof
WO2021159259A1 (en) * 2020-02-10 2021-08-19 苏州大学 Flexible transparent electrode and preparation method therefor, and flexible solar cell prepared using flexible transparent electrode

Similar Documents

Publication Publication Date Title
KR101570398B1 (en) Transparent conductive ink, and method for producing transparent conductive pattern
CN104020882A (en) Touch screen
TWI570600B (en) Transparent conductor and touch panel
CN104020883A (en) Touch substrate, manufacturing method thereof and touch screen with touch substrates adopted
CN104021845A (en) Transparent conductor
CN104020885B (en) Touch base plate and preparation method thereof
JP2015181097A (en) Base material with transparent conductive film, base material with transparent conductive pattern and method for manufacturing the same, touch panel, and solar cell
CN104020884A (en) Touch substrate and manufacturing method thereof
CN104020889A (en) Touch substrate and manufacturing method thereof
CN104020888A (en) Touch screen
CN204028865U (en) Touch screen
CN104020890B (en) Touch-screen of the touch base plate with its preparation method and using the touch base plate
CN107705882B (en) Flexible transparent conducting film, preparation method and flexible touch screen
CN204087174U (en) Touching display screen
CN203910288U (en) Transparent conductive body
CN204480210U (en) Touch-screen
CN203909754U (en) Touch substrate and touch screen provided with touch substrate
CN203909749U (en) Touch screen
CN104020887A (en) Touch screen
CN101548202B (en) Optical filter for display panel and method of manufacturing the same
CN104238859A (en) Touch display screen
CN104238855B (en) Touching display screen
CN104020886B (en) Touch-screen
CN203909752U (en) Touch substrate and touch screen provided with touch substrate
CN203909771U (en) Touch substrate

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20140903

RJ01 Rejection of invention patent application after publication