CN104020887A - Touch screen - Google Patents
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- CN104020887A CN104020887A CN201410239490.0A CN201410239490A CN104020887A CN 104020887 A CN104020887 A CN 104020887A CN 201410239490 A CN201410239490 A CN 201410239490A CN 104020887 A CN104020887 A CN 104020887A
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Abstract
A touch screen comprises a touch substrate, a protection panel and a transparent optical adhesive layer. The touch substrate comprises a transparent substrate body, a first conducting layer arranged on one side of the transparent substrate body and second touch electrodes arranged on the transparent substrate body. The first conducting layer comprises a cured transparent photosensitive resin matrix and conductive nano wires embedded into the cured transparent photosensitive resin matrix, the conductive nano wires are connected in a staggered mode to form a conductive grid, the first conducting layer is patterned to form a plurality of first touch electrodes, and the first touch electrodes and the second touch electrodes are used for determining X-axis coordinates and Y-axis coordinates of touch points. The protection panel is arranged on one side of the touch substrate. The transparent optical adhesive layer is arranged between the touch substrate and the protection panel and used for bonding the touch substrate and the protection panel. The touch screen has better conductivity.
Description
Technical field
The present invention relates to touch technology field, particularly relate to a kind of touch-screen.
Background technology
Touch-screen is to receive the inductive arrangement that touches input signal.Touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that photoelectricity industry is a dark horse.
Touch-screen comprises touch base plate and is laminated in the protection panel on touch base plate.The method for making of traditional touch base plate is generally:
(1) directly in transparent substrates, form conductive layer.Be example with ITO (Indium Tin Oxide, tin indium oxide) conductive layer, need to first carry out ITO plated film, then the ITO layer obtaining is carried out to graphical treatment.Because conductive layer is outside exposed, be easily scratched, and then cause the electric conductivity of conductive layer to reduce.
(2) residuite layer is set in transparent substrates, then adopt the modes such as impression on residuite layer, to form latticed groove, filled conductive material (for example, metal, Graphene etc.) in latticed groove, forms latticed conductive layer again.Because a side of latticed conductive layer is exposed to outside residuite layer, and the easily oxidation by air of a lot of conductive materials (for example, argent).And the oxidized meeting of conductive material causes the electric conductivity of latticed conductive layer to reduce.
Summary of the invention
Based on this, be necessary to provide a kind of touch-screen with better electric conductivity.
A kind of touch-screen, comprising:
Touch base plate, comprise transparent substrates, be located at the first conductive layer of described transparent substrates one side and be located at the second touch-control electrode in described transparent substrates, described the first conductive layer comprises curing transparent feel photopolymer resin matrix and embeds the electrical-conductive nanometer silk thread in described curing transparent feel photopolymer resin matrix, and described electrical-conductive nanometer silk thread is cross-linked to form conductive grid; Described the first conductive layer is patterned and forms multiple the first touch-control electrodes; Described the first touch-control electrode and described the second touch-control electrode are respectively used to determine X axis coordinate and the Y-axis coordinate of touch point;
Protect panel, be located at a side of described touch base plate; And
Transparent optical glue-line, is located between described touch base plate and described protection panel, for described touch base plate and the protection panel of boning.
In an embodiment, the material of described transparent substrates is glass, polymethylmethacrylate, polycarbonate, polyethylene terephthalate, cyclic olefine copolymer or cyclic olefin polymer therein.
In an embodiment, the thickness of described transparent substrates is 0.02mm～0.5mm therein.
In an embodiment, the thickness of described transparent substrates is 0.05mm～0.2mm therein.
In an embodiment, the thickness of described the first conductive layer is 0.05 μ m～10 μ m therein.
In an embodiment, the thickness of described the first conductive layer is 0.08 μ m～2 μ m therein.
In an embodiment, the diameter of described electrical-conductive nanometer silk thread is 10nm～1000nm therein, and length is 20nm～50 μ m.
In an embodiment, described electrical-conductive nanometer silk thread is gold nano silk thread, silver nanoparticle silk thread, Cu nanowire line, aluminium nanometer silk thread or carbon nanometer silk thread therein, and the sheet resistance of described the first conductive layer is 0.1 Ω/～200 Ω/.
In an embodiment, the sheet resistance of described the first conductive layer is 10 Ω/～100 Ω/ therein.
In an embodiment, at least part of described electrical-conductive nanometer silk thread exposes outside the side of described curing transparent feel photopolymer resin matrix away from described transparent substrates therein.
In an embodiment, described touch base plate also comprises the second conductive layer of being located at described transparent substrates opposite side therein, and described the second touch-control electrode is formed by described the second conductive layer pattern; Described the first touch-control electrode is strip, multiple described the first touch-control electrode parallel interval are arranged, described the second touch-control electrode is strip, and multiple described the second touch-control electrode parallel interval are arranged, and described the second touch-control electrode is with described first touch-control electrode is vertical arranges.
In an embodiment, the structure of described the first touch-control electrode and material are identical with structure and the material of described the second touch-control electrode respectively therein.
In an embodiment, described the second conductive layer is ITO conductive layer, metal grill conductive layer, graphene conductive layer, carbon nanotube conducting layer or conducting polymer conductive layer therein.
Therein in an embodiment, described the second touch-control electrode is also formed by described the first conductive layer pattern, multiple described the first touch-control electrodes extend longitudinally respectively and arrange lateral separation, described in each, the first touch-control electrode coordinates and is used for intercoupling formation coupling capacitance with some described the second touch-control electrodes, is longitudinally spaced with some described the second touch-control electrode that described in each, the first touch-control electrode coordinates.
In an embodiment, described the first touch-control electrode and described the second touch-control electrode are pectination therein, and described the first touch-control electrode and some described the second touch-control electrodes are mutually chimeric.
In an embodiment, the material of described protection panel is glass, sapphire, carbonic acid polyester, polyethylene terephthalate or poly-first acrylic acid formicester therein.
In an embodiment, the thickness of described protection panel is 0.1mm～2.5mm therein.
In an embodiment, the thickness of described protection panel is 0.3mm～0.7mm therein.
Conductive grid in above-mentioned the first conductive layer is coated by transparent feel photopolymer resin matrix, thereby makes above-mentioned the first conductive layer can avoid preferably scratching, and is not easy to damage.Greatly reduce the chance that conductive grid contacts with air simultaneously, make above-mentioned the first conductive layer be not easy oxidized.Therefore, above-mentioned touch-screen has better electric conductivity.And the conductive grid that is cross-linked to form with electrical-conductive nanometer silk thread of above-mentioned the first conductive layer realizes conduction, with respect to ITO conductive layer, it has relatively low resistivity.And electrical-conductive nanometer silk thread with respect to ITO more cheaply, softer, thereby make above-mentioned touch-screen there is good bending resistance folding endurance.In addition, the conductive grid that electrical-conductive nanometer silk thread is cross-linked to form is taking transparent feel photopolymer resin matrix as carrier, in the time making the first conductive layer, directly can obtain by exposure imaging (ITO conductive layer also needs through overetched step), can simplify technique.And in the time making the first conductive layer, without additionally making with photoresist, further simplify technique.
Brief description of the drawings
Fig. 1 is the structural representation of the touch-screen of an embodiment;
Fig. 2 is the exploded view of the touch-screen in Fig. 1;
Fig. 3 is the structural representation of the first conductive layer;
Fig. 4 is the structural representation of the touch base plate in another embodiment;
Fig. 5 is the process flow diagram of the method for making of the touch base plate of an embodiment.
Embodiment
Below in conjunction with drawings and the specific embodiments, touch-screen is further detailed.
As shown in Figures 1 and 2, the touch-screen 10 of an embodiment, comprises touch base plate 100, transparent optical glue-line 200 and protection panel 300.
Touch base plate 100 comprises transparent substrates, is located at the first conductive layer of transparent substrates one side and is located at the second touch-control electrode in transparent substrates.The first conductive layer comprises curing transparent feel photopolymer resin matrix and embeds the electrical-conductive nanometer silk thread in curing transparent feel photopolymer resin matrix, and electrical-conductive nanometer silk thread is cross-linked to form conductive grid.The first conductive layer is patterned and forms multiple the first touch-control electrodes.The first touch-control electrode and the second touch-control electrode are respectively used to determine X axis coordinate and the Y-axis coordinate of touch point.
In the present embodiment, touch base plate 100 comprises transparent substrates 110, the first conductive layer 120 and the second conductive layer 130.
The material of transparent substrates 110 can be glass, polymethylmethacrylate, polycarbonate, polyethylene terephthalate, cyclic olefine copolymer or cyclic olefin polymer.The thickness of transparent substrates 110 is 0.02mm～0.5mm.Further, in the present embodiment, considering after the processing complexity of transparent substrates 110 and the integral thickness of touch-screen 10, the thickness of transparent substrates 110 is preferably 0.05mm～0.2mm.
As Figure 1-3, the first conductive layer 120 is located at transparent substrates 110 1 sides.The first conductive layer 120 comprises curing transparent feel photopolymer resin matrix 121 and evenly embeds the electrical-conductive nanometer silk thread 123 in this matrix 121.These electrical-conductive nanometer silk threads 123 are cross-linked to form conductive grid, make the overall homogeneous conductive of this first conductive layer 120.In the present embodiment, electrical-conductive nanometer silk thread 123 exposes the side of this curing transparent feel photopolymer resin matrix 121 away from transparent substrates 110 at least partly, thereby makes the surface conduction of this first conductive layer 120.Although partially conductive nanometer silk thread 123 is exposed to outside curing transparent feel photopolymer resin matrix 121, but the main part of the conductive grid that electrical-conductive nanometer silk thread 123 is cross-linked to form or coated by transparent feel photopolymer resin matrix 121, therefore, above-mentioned touch base plate 100 has better anti-oxidant and scratch resistance ability with respect to traditional touch base plate.
In the present embodiment, this first conductive layer 120 is patterned and forms the first touch-control electrode 122 that many parallel interval are arranged.The first touch-control electrode 122 is strip.
In the present embodiment, the thickness of the first conductive layer 120 is 0.05 μ m～10 μ m.In the time of the thickness of design the first conductive layer 120, need to consider whether adhesion, electrical-conductive nanometer silk thread 123 between the first conductive layer 120 and transparent substrates 110 can embed in curing transparent feel photopolymer resin matrix 121 and the factor such as the integral thickness of touch-screen 10 preferably.After amid all these factors, the thickness of the first conductive layer 120 is preferably 0.08 μ m～2 μ m.
In the present embodiment, the diameter of electrical-conductive nanometer silk thread 123 is 10nm～1000nm, and length is 20nm～50 μ m.Because the diameter of electrical-conductive nanometer silk thread 123 is less than the visual width of human eye, thereby ensure the visually-clear of the first conductive layer 120.Electrical-conductive nanometer silk thread 123 can be easy to prepare and have for gold nanowires line, silver nanoparticle silk thread, Cu nanowire line, aluminium nanometer silk thread, carbon nanometer silk thread etc. the conductive thread of better electric conductivity.
Further, in the present embodiment, the sheet resistance of the first conductive layer 120 is 0.1 Ω/～200 Ω/, there is better electric conductivity compared to ITO conductive layer, be more suitable for for making as panel computer (pad), all-in-one (All in one, AIO), the larger touch-control product of notebook (Note Book) equidimension.
The electric conductivity of the first conductive layer 120 is relevant to diameter and electrical-conductive nanometer silk thread 123 distribution densities of electrical-conductive nanometer silk thread 123, and diameter is larger, and distribution density is larger, and electric conductivity is better, and sheet resistance is lower.But the diameter of electrical-conductive nanometer silk thread 123 is larger, distribution density is larger, the transmitance of conductive layer is lower.Therefore,, in order to ensure the balance of transmitance and electric conductivity, the sheet resistance of the first conductive layer 120 is preferably 10 Ω/～100 Ω/.
The second conductive layer 130 is located at transparent substrates 110 opposite sides, and the second touch-control electrode is formed by the second conductive layer 130 patternings.This second conductive layer 130 is ITO conductive layer, and is patterned and forms the second touch-control electrode 132 of some strips.These the second touch-control electrodes 132 parallel interval arrange and with the vertical setting of the first touch-control electrode 122.Work as conductor, for example when finger touch, the first touch-control electrode 122 and the second touch-control electrode 132, because capacitance variations forms touching signals, are respectively used to determine X axis coordinate and the Y-axis coordinate of touch point.
Be appreciated that in other embodiments, the second conductive layer 130 can be also metal grill conductive layer, graphene conductive layer, carbon nanotube conducting layer or conducting polymer conductive layer.The second conductive layer 130 also can have similar structure to the first conductive layer 120, comprise curing transparent feel photopolymer resin matrix and evenly embed the electrical-conductive nanometer silk thread in this matrix, these electrical-conductive nanometer silk threads are cross-linked to form conductive grid, make the overall homogeneous conductive of this second conductive layer 130.
As shown in Figure 4, in other embodiments, touch base plate 400 only comprises transparent substrates 410 and is located at relative two one of them the conductive layers 420 of surface of transparent substrates 410.Conductive layer 420 is patterned and forms multiple the first touch-control electrodes 421 and multiple the second touch-control electrode 423.Multiple the first touch-control electrodes 421 extend longitudinally respectively and arrange lateral separation, and each first touch-control electrode 421 coordinates and is used for intercoupling formation coupling capacitance with some the second touch-control electrodes 423.Some the second touch-control electrodes 423 that coordinate with each first touch-control electrode 421 are longitudinally spaced.These the first touch-control electrodes 421 and the second touch-control electrode 423 are pectination.Each first touch-control electrode 421 is mutually chimeric with the second touch-control electrode 423 of some spaces longitudinally arrangement.By detecting the capacitance variations of the first touch-control electrode 421 and corresponding the second touch-control electrode 423, judge the coordinate of touch point.Wherein, the first touch-control electrode 421 can be used for judging the X-axis coordinate of touch point, and the second corresponding touch-control electrode 423 can be used for judging the Y-axis coordinate of touch point.
As shown in Figure 5, in the present embodiment, also provide a kind of method for making of touch base plate, comprise the steps:
Step S510, nesa coating is provided, nesa coating comprises transparent substrates and is located at the electrically conducting transparent photosensitive resin hypothallus of the semi-solid preparation of transparent substrates one side, the electrically conducting transparent photosensitive resin hypothallus of semi-solid preparation comprises the electrical-conductive nanometer silk thread in the transparent feel photopolymer resin matrix of semi-solid preparation and the transparent feel photopolymer resin matrix of embedding semi-solid preparation, wherein, electrical-conductive nanometer silk thread is cross-linked to form conductive grid.
In the present embodiment, the method for making of nesa coating comprises the steps: to provide transparent feel photopolymer resin, electrical-conductive nanometer silk thread and transparent substrates.Electrical-conductive nanometer silk thread is scattered in transparent feel photopolymer resin, obtains electrically conducting transparent photosensitive resin.Electrically conducting transparent photosensitive resin is coated in a side of transparent substrates, and obtains nesa coating through solidifying to process.
Wherein, transparent feel photopolymer resin comprises each component of following parts by weight: 30～50 parts of film-forming resins, 1～10 part of emulsion, 10～40 parts of organic solvents, 0.1～5 part of stabilizing agent, 0.1～5 part of levelling agent and 0.1～5 part of defoamer, the umber of each component and be 100.
Film-forming resin is at least one in polymethylmethacrylate, linear phenolic resin, epoxy resin, crotonic acid, acrylate, vinyl ether and M Cr.Emulsion is at least one in diazobenzene quinone, diazo naphthoquinone ester, polyvinyl cinnamate, poly-Chinese cassia tree fork malonic acid glycol ester polyester, aromatic diazo salt, aromatic sulfonium salts, fragrant salt compounded of iodine and ferrocene salt.Organic solvent is tetrahydrofuran, methyl ethyl ketone, cyclohexanone, propylene glycol, N, dinethylformamide, ethyl cellosolve acetate, ethyl acetate and butyl acetate, toluene, dimethylbenzene, tripropylene glycol diacrylate, trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, dipentaerythrite six acrylate, 1, at least one in 6-hexanediol methoxyl mono acrylic ester and ethoxylation neopentyl glycol methoxyl mono acrylic ester.Stabilizing agent is at least one in p-dihydroxy-benzene, p methoxy phenol, 1,4-benzoquinone, 2,6 one di-t-butyl cresols, phenothiazine and anthraquinone.Levelling agent is at least one in polyacrylate, acetate butyrate fiber, nitrocellulose and polyvinyl butyral.Defoamer is at least one in phosphate, fatty acid ester and organosilicon.
Transparent feel photopolymer resin has photosensitive property in the time of fluid state or semi-cured state, and transparent feel photopolymer resin does not have photosensitive property in the time of solid state.Wherein, the transparent feel photopolymer resin matrix of semi-solid preparation comprises 60～80 parts of film-forming resins, 1～10 part of emulsion, 5～20 parts of organic solvents, 0.1～5 part of stabilizing agent, 0.1～5 part of levelling agent and 0.1～5 part of defoamer, the umber of each component and be 100.
Further, in the present embodiment, nesa coating also comprises the ITO layer of being located in advance transparent substrates opposite side, so that follow-up formation the second conductive layer.
Step S520, is placed in mask plate above the electrically conducting transparent photosensitive resin hypothallus of semi-solid preparation, adopts the ultraviolet light corresponding with the electrically conducting transparent photosensitive resin hypothallus of semi-solid preparation to carry out exposure-processed to the electrically conducting transparent photosensitive resin hypothallus of semi-solid preparation.
Wherein, carry out in the process of exposure-processed at the electrically conducting transparent photosensitive resin hypothallus to semi-solid preparation, the wavelength of exposure-processed is 300nm～400nm, and the energy of exposure-processed is 50mj/cm
2～500mj/cm
2.
Step S530, adopts developer solution to carry out development treatment to the electrically conducting transparent photosensitive resin hypothallus of the semi-solid preparation through exposure-processed, so that the electrically conducting transparent photosensitive resin hypothallus of semi-solid preparation forms the first touch-control electrode that many parallel interval are arranged.
Wherein, developer solution is that massfraction is the aqueous solution of 0.1%～10% weak base salt.Weak base salt can be sal tartari, sodium carbonate etc.
Step S540, is cured processing to the electrically conducting transparent photosensitive resin hypothallus of the semi-solid preparation through development treatment, obtains the first conductive layer.
Wherein, in the present embodiment, solidify and be treated to heat curing, the temperature of heat curing is 80 DEG C～150 DEG C, and the time of heat curing is 10min～60min.Be appreciated that in other embodiments, curing processing can be also ultra-violet curing, and the wavelength of ultra-violet curing is 300nm～400nm, and the energy of ultra-violet curing is 200mj/cm
2～2000mj/cm
2.
Obtaining after the first conductive layer, first on the first conductive layer, pasting diaphragm, then ITO layer is carried out to exposure-processed, development treatment and etch processes successively, forming the second touch-control electrode that many parallel interval are arranged, obtaining the second conductive layer.Wherein, the first touch-control electrode is with second touch-control electrode is vertical arranges.
Transparent optical glue-line 200 is located at touch base plate 100 1 sides.
Protection panel 300 is located at the side of transparent optical glue-line 200 away from touch base plate 100.
In the present embodiment, touch base plate 100 has the first conductive layer 120 and the second conductive layer 130, and transparent optical glue-line 200 can be located at the first conductive layer 120 or be located on the second conductive layer 130.
In other embodiments, touch base plate 100 can only include transparent substrates 110 and the first conductive layer 120.Now, transparent optical glue-line 200 can be located at the first conductive layer 120 or be located in the side of transparent substrates 110 away from the first conductive layer 120.
In the present embodiment, the material of protection panel 300 can be glass, sapphire, carbonic acid polyester, polyethylene terephthalate or poly-first acrylic acid formicester.The thickness of protection panel 300 is 0.1mm～2.5mm.Further, the thickness of protection panel 300 is preferably 0.3mm～0.7mm.
Conductive grid in above-mentioned the first conductive layer 120 is coated by transparent feel photopolymer resin matrix, thereby makes above-mentioned the first conductive layer 120 can avoid preferably scratching, and is not easy to damage.Greatly reduce the chance that conductive grid contacts with air simultaneously, make above-mentioned the first conductive layer 120 be not easy oxidized.Therefore, above-mentioned touch base plate 100 has better electric conductivity.And the conductive grid that is cross-linked to form with electrical-conductive nanometer silk thread of above-mentioned the first conductive layer 120 realizes conduction, with respect to ITO conductive layer, it has relatively low resistivity.And electrical-conductive nanometer silk thread with respect to ITO more cheaply, softer, thereby make above-mentioned touch base plate 100 there is good bending resistance folding endurance.In addition, the conductive grid that electrical-conductive nanometer silk thread is cross-linked to form is taking transparent feel photopolymer resin matrix as carrier, in the time making the first conductive layer 120, directly can obtain by exposure imaging (ITO conductive layer also needs through overetched step), can simplify technique.And in the time making the first conductive layer 120, without additionally making with photoresist, further simplify technique.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (18)
1. a touch-screen, is characterized in that, comprising:
Touch base plate, comprise transparent substrates, be located at the first conductive layer of described transparent substrates one side and be located at the second touch-control electrode in described transparent substrates, described the first conductive layer comprises curing transparent feel photopolymer resin matrix and embeds the electrical-conductive nanometer silk thread in described curing transparent feel photopolymer resin matrix, and described electrical-conductive nanometer silk thread is cross-linked to form conductive grid; Described the first conductive layer is patterned and forms multiple the first touch-control electrodes; Described the first touch-control electrode and described the second touch-control electrode are respectively used to determine X axis coordinate and the Y-axis coordinate of touch point;
Protect panel, be located at a side of described touch base plate; And
Transparent optical glue-line, is located between described touch base plate and described protection panel, for described touch base plate and the protection panel of boning.
2. touch-screen according to claim 1, is characterized in that, the material of described transparent substrates is glass, polymethylmethacrylate, polycarbonate, polyethylene terephthalate, cyclic olefine copolymer or cyclic olefin polymer.
3. touch-screen according to claim 1, is characterized in that, the thickness of described transparent substrates is 0.02mm～0.5mm.
4. touch-screen according to claim 3, is characterized in that, the thickness of described transparent substrates is 0.05mm～0.2mm.
5. touch-screen according to claim 1, is characterized in that, the thickness of described the first conductive layer is 0.05 μ m～10 μ m.
6. touch-screen according to claim 5, is characterized in that, the thickness of described the first conductive layer is 0.08 μ m～2 μ m.
7. touch-screen according to claim 1, is characterized in that, the diameter of described electrical-conductive nanometer silk thread is 10nm～1000nm, and length is 20nm～50 μ m.
8. touch-screen according to claim 1, is characterized in that, described electrical-conductive nanometer silk thread is gold nano silk thread, silver nanoparticle silk thread, Cu nanowire line, aluminium nanometer silk thread or carbon nanometer silk thread, and the sheet resistance of described the first conductive layer is 0.1 Ω/～200 Ω/.
9. touch-screen according to claim 8, is characterized in that, the sheet resistance of described the first conductive layer is 10 Ω/～100 Ω/.
10. touch-screen according to claim 1, is characterized in that, at least part of described electrical-conductive nanometer silk thread exposes outside the side of described curing transparent feel photopolymer resin matrix away from described transparent substrates.
11. touch-screens according to claim 1, is characterized in that, described touch base plate also comprises the second conductive layer of being located at described transparent substrates opposite side, and described the second touch-control electrode is formed by described the second conductive layer pattern; Described the first touch-control electrode is strip, multiple described the first touch-control electrode parallel interval are arranged, described the second touch-control electrode is strip, and multiple described the second touch-control electrode parallel interval are arranged, and described the second touch-control electrode is with described first touch-control electrode is vertical arranges.
12. touch-screens according to claim 11, is characterized in that, the structure of described the first touch-control electrode and material are identical with structure and the material of described the second touch-control electrode respectively.
13. touch-screens according to claim 11, is characterized in that, described the second conductive layer is ITO conductive layer, metal grill conductive layer, graphene conductive layer, carbon nanotube conducting layer or conducting polymer conductive layer.
14. touch-screens according to claim 1, it is characterized in that, described the second touch-control electrode is also formed by described the first conductive layer pattern, multiple described the first touch-control electrodes extend longitudinally respectively and arrange lateral separation, described in each, the first touch-control electrode coordinates and is used for intercoupling formation coupling capacitance with some described the second touch-control electrodes, is longitudinally spaced with some described the second touch-control electrode that described in each, the first touch-control electrode coordinates.
15. touch-screens according to claim 14, is characterized in that, described the first touch-control electrode and described the second touch-control electrode are pectination, and described the first touch-control electrode and some described the second touch-control electrodes are mutually chimeric.
16. touch-screens according to claim 1, is characterized in that, the material of described protection panel is glass, sapphire, carbonic acid polyester, polyethylene terephthalate or poly-first acrylic acid formicester.
17. touch-screens according to claim 1, is characterized in that, the thickness of described protection panel is 0.1mm～2.5mm.
18. touch-screens according to claim 17, is characterized in that, the thickness of described protection panel is 0.3mm～0.7mm.
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| CN105487728A (en) * | 2014-09-17 | 2016-04-13 | 宸鸿科技(厦门)有限公司 | Touch panel and manufacturing method therefor |
| CN105988615A (en) * | 2015-02-06 | 2016-10-05 | 宸鸿光电科技股份有限公司 | Touch control module and manufacturing method thereof |
| CN106354353A (en) * | 2016-09-23 | 2017-01-25 | 苏州维业达触控科技有限公司 | Touch conductive film, touch module and display device |
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