CN104014828A - WS2/Zr soft coating micro-nano composite texture ceramic cutting tool and preparing method thereof - Google Patents

WS2/Zr soft coating micro-nano composite texture ceramic cutting tool and preparing method thereof Download PDF

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Publication number
CN104014828A
CN104014828A CN201410263779.6A CN201410263779A CN104014828A CN 104014828 A CN104014828 A CN 104014828A CN 201410263779 A CN201410263779 A CN 201410263779A CN 104014828 A CN104014828 A CN 104014828A
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texture
soft coating
cutting tool
sintex
micro
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邢佑强
邓建新
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Shandong University
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Shandong University
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23P—METAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
    • B23P15/00—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass
    • B23P15/28—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass cutting tools
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

The invention belongs to the field of mechanical cutting tool manufacturing, and relates to a preparing method for a WS2/Zr soft coating micro-nano composite texture ceramic cutting tool. Base materials of the cutting tool are ceramic. The method comprises the steps that firstly, the laser machining technology is adopted to machine micrometer textures of different morphologies and sizes on the front tool face of the ceramic cutting tool, then the laser machining technology is adopted to machine nanometer textures on a negative chamfer and the front tool face, and finally the medium frequency magnetron sputtering deposition plus multi-arc ion plating method is adopted to deposit a WS2/Zr soft coating on the surface of the cutting tool, wherein the WS2/Zr soft coating is arranged on the surface of the cutting tool, and a Zr transition layer is arranged between the soft coating and a base body. According to the ceramic cutting tool, friction between tool chips can be effectively reduced during cutting, the cutting force and the cutting temperature are reduced, and the abrasion resistance capacity of the cutting tool is improved, so that the service life of the cutting tool is prolonged. The ceramic cutting tool can be widely applied to dry cutting and cutting machining of difficult-to-machine materials.

Description

A kind of WS 2compound textured ceramic cutter of/Zr soft coating micro-nano and preparation method thereof
One, technical field
The invention belongs to machine cut cutter and manufacture field, related to a kind of WS 2compound textured ceramic cutter of/Zr soft coating micro-nano and preparation method thereof.
Two, background technology
The good characteristics such as sintex is high owing to having hardness, and heat resistance and chemical stability are good, are widely used in the machining of difficult-to-machine material.But during due to dry cutting, the friction between cutter rake face upper slitter bits is extremely violent, has caused the serious wear of cutter, and the friction while being therefore badly in need of improving Tool in Cutting is to improve its cutter life.
Self-lubricating knife tool, because itself having antifriction, wear-resistant and lubricating function, is therefore a kind of Green Dry Cutting cutter.In recent years, China made great progress in the correlative study aspect sintex and Surface Texture cutter.Chinese patent " CN200410024226.1 " has been reported a kind of Al 2o 3/ TiC/CaF 2ceramic complex cutter material, this cutter, by add kollag in tool matrix, makes it in the time of machining, form continuous solid lubrication layer at tool surface, thereby realizes the self-lubricating function of cutter itself.Chinese patent " application number 201110353909.1 " has been reported a kind of WS 2soft coating is received texture self-lubricating cutter and preparation method thereof, and this cutter adopts femtosecond laser to process nanometer texture at tool surface, then adopts multi-arc ion coating+medium frequency magnetron sputtering sedimentation successively to deposit Zr transition and a layer WS 2soft coating.Chinese patent " application number 201010124734.2 " has been reported a kind of femtosecond laser preparation method of micro-nano composite texturing cutting tool by using, and this cutter adopts femtosecond laser processing micro-nano texture further to improve the anti-abrasion resistance properties of cutter in conjunction with coating technology.Chinese patent " CN201210447210.6 " has been reported a kind of micro-nano compound textured ceramic cutter of filling lubricant, realizes antifriction function by the double action of texture and lubricant.
Three, summary of the invention
The object of the invention is to overcome above-mentioned the deficiencies in the prior art, compound textured ceramic cutter of a kind of soft coating micro-nano and preparation method thereof is provided.The present invention processes the micro-nano texture of different-shape and size at tool surface, then at texture cutter deposition one deck soft coating, in dry working angles, tool surface soft coating can form effective lubricating film, simultaneously surface is received texture and has been improved the bond strength of coating and matrix, micro-texture can effectively play and catch abrasive dust and self-lubricating effect, thereby reduces the wearing and tearing of cutter, improves cutter life.
The present invention realizes in the following manner:
1. a WS 2the compound textured ceramic cutter of/Zr soft coating micro-nano, matrix material is Al 2o 3base or Si 3n 4base pottery, is characterized in that the negative chamfered edge of sintex place has nanometer texture, has micro-nano compound texture, texture surface deposition WS on rake face 2/ Zr soft coating, WS 2between/Zr soft coating and texture, there is one deck Zr transition zone.
2. a WS 2the compound textured ceramic cutter of/Zr soft coating micro-nano preparation method, adopt laser processing technology to process a micron texture at sintex rake face, and process nanometer texture on the negative chamfered edge of sintex and rake face, then adopt multi-arc ion coating+medium frequency magnetron sputtering deposition process successively at textured ceramic tool surface deposition Zr transition zone and WS 2/ Zr soft coating, its concrete preparation method is as follows:
(1) in the micro-nano texture of sintex Surface Machining
(1) by sintex rake face and negative chamfered edge place grinding and polishing to minute surface, put into successively alcohol and the each 20min of acetone ultrasonic cleaning;
(2) adopt Nd:YAG Solid State Laser to process the micron texture of different-shape and size in sintex rake face cutter bits contact zone; Wherein, micron texture width is 30-80 μ m, and the degree of depth is 10-150 μ m;
(3) adopt femtosecond laser to process the nanometer texture of different-shape and size in the negative chamfered edge place of sintex and rake face cutter bits contact zone; Nanometer texture internal structure is corrugated groove, and groove width is 200-400nm, and the degree of depth is 50-300nm, and the cycle is 600-800nm;
(2) at texture tool surface deposition soft coating
(1) pre-treatment: compound micro-nano textured ceramic cutter is put into alcohol and the each 20min of acetone ultrasonic cleaning successively, put into rapidly vacuum chamber of film coating machine after employing vacuum drying chamber is fully dry.Vacuum chamber base vacuum 7.0 × 10 -3pa, is heated to 180 DEG C, temperature retention time 30-40min;
(2) Ion Cleaning: pass into Ar gas, its pressure is 0.6-1.5Pa, opens grid bias power supply, voltage 800-900V, dutycycle 0.2, Glow Discharge Cleaning 15min; Bias voltage is reduced to 200-300V, opens ion gun Ion Cleaning 20min, opens arc source, bias voltage 400-600V, target current 80A, Ions Bombardment Zr target 1-2min;
(3) deposition Zr: adjust Ar air pressure to 0.4-0.5Pa, bias voltage is reduced to 100-200V, electric arc plating Zr2-5min;
(4) deposition WS 2/ Zr: open WS 2target, bias voltage is adjusted to 120-150V, target current 0.5-1.5A, depositing temperature is 150-200 DEG C, medium frequency magnetron sputtering deposition WS 2/ Zr60-120min;
(5) close WS 2target and Zr target, close grid bias power supply, ion gun and gas source, insulation 30-60min, and deposited coatings finishes.
A kind of WS provided by the invention 2compound textured ceramic cutter of/Zr soft coating micro-nano and preparation method thereof, this cutter, in conjunction with mechanical performance and the design feature of sintex itself, is combined micro-nano compound texture, when cutting with soft coating, tool surface soft coating can form effective lubricating film, tool matrix bearing load; Simultaneously texture is received on surface has increased the bond strength of coating and matrix, and micro-texture can play collects abrasive dust and lubricant and reduces cutter and consider the features such as contact length to be worth doing, thereby can play effective self-lubricating function.This cutter combines the advantage of micro-nano compound texture, soft coating and sintex self, has both had compared with low-friction coefficient, has again higher hardness, and Tool in Cutting performance can be significantly improved.
Four, brief description of the drawings
Fig. 1 is WS of the present invention 2the compound textured ceramic cutter of/Zr soft coating micro-nano rake face coating structure and Surface Texture schematic diagram.Wherein: 1 is sintex matrix, 2 is rake face, and 3 is negative chamfered edge, and 4 is micro-texture, and 5 for receiving texture, and 6 is WS 2/ Zr soft coating.
Five, detailed description of the invention
Example 1: a kind of WS 2compound textured ceramic cutter of/Zr soft coating micro-nano and preparation method thereof, matrix material is Al 2o 3base pottery; The negative chamfered edge of sintex of the present invention place has nanometer texture, and rake face has micro-nano compound texture, texture surface deposition WS 2/ Zr soft coating, has one deck Zr transition zone between soft coating and texture.Preparation method prepared by this cutter, adopt Solid State Laser to process a micron texture at sintex rake face, and on the negative chamfered edge of sintex and rake face, process nanometer texture with femtosecond laser, then adopt multi-arc ion coating+medium frequency magnetron sputtering deposition process successively at textured ceramic tool surface deposition one deck Zr transition zone and WS 2/ Zr soft coating, its concrete preparation method is as follows:
(1) in the micro-nano texture of sintex Surface Machining
(1) by sintex rake face and negative chamfered edge place grinding and polishing to minute surface, put into successively alcohol and the each 20min of acetone ultrasonic cleaning;
(2) adopt Nd:YAG Solid State Laser to process the micron texture of different-shape and size in sintex rake face cutter bits contact zone; Wherein, micron texture width is about 50 μ m, and the degree of depth is 50 μ m, and spacing is 150 μ m;
(3) adopt femtosecond laser to process the nanometer texture of different-shape and size in the negative chamfered edge place of sintex and rake face cutter bits contact zone; Nanometer texture internal structure is corrugated groove, and groove width is 300-400nm, and the degree of depth is 100-150nm, and the cycle is about 700nm;
(2) at texture tool surface deposition soft coating
(1) pre-treatment: compound micro-nano textured ceramic cutter is put into alcohol and the each 20min of acetone ultrasonic cleaning successively, put into rapidly vacuum chamber of film coating machine after employing vacuum drying chamber is fully dry.Vacuum chamber base vacuum 7.0 × 10 -3pa, is heated to 180 DEG C, temperature retention time 30min;
(2) Ion Cleaning: pass into Ar gas, its pressure is 1Pa, opens grid bias power supply, voltage 800V, dutycycle 0.2, Glow Discharge Cleaning 15min; Bias voltage is reduced to 200-300V, opens ion gun Ion Cleaning 20min, opens arc source, bias voltage 500V, target current 80A, Ions Bombardment Zr target 1min;
(3) deposition Zr: adjust Ar air pressure to 0.5Pa, bias voltage is reduced to 100V, electric arc plating Zr2min;
(4) deposition WS 2/ Zr: open WS 2target, bias voltage is adjusted to 130V, target current 1A, depositing temperature is 150 DEG C, medium frequency magnetron sputtering deposition WS 2/ Zr100min;
(5) close WS 2target and Zr target, close grid bias power supply, ion gun and gas source, insulation 30min, and deposited coatings finishes.
Example 2: compound textured ceramic cutter of a kind of WS2/Zr soft coating micro-nano and preparation method thereof, matrix material is Si 3n 4base pottery; The negative chamfered edge of sintex of the present invention place has nanometer texture, and rake face has micro-nano compound texture, texture surface deposition WS 2/ Zr soft coating, has one deck Zr transition zone between soft coating and texture.This cutter is prepared preparation method, adopt Solid State Laser to process a micron texture at sintex rake face, and on the negative chamfered edge of sintex and rake face, process nanometer texture with femtosecond laser, then adopt multi-arc ion coating+medium frequency magnetron sputtering deposition process successively at textured ceramic tool surface deposition one deck Zr transition zone and WS 2/ Zr soft coating, its concrete preparation method is as follows:
(1) process micro-nano texture at tool surface
(1) by sintex rake face and negative chamfered edge place grinding and polishing to minute surface, put into successively alcohol and the each 20min of acetone ultrasonic cleaning;
(2) adopt Nd:YAG Solid State Laser to process the micron texture of different-shape and size in sintex rake face cutter bits contact zone; Wherein, micron texture width is about 50 μ m, and the degree of depth is 100 μ m;
(3) adopt femtosecond laser to process the nanometer texture of different-shape and size in the negative chamfered edge place of sintex and rake face cutter bits contact zone; Nanometer texture internal structure is corrugated groove, and groove width is 300-400nm, and the degree of depth is 150-200nm, and the cycle is 650-750nm;
(2) at texture tool surface deposition soft coating
(1) pre-treatment: compound micro-nano textured ceramic cutter is put into alcohol and the each 20min of acetone ultrasonic cleaning successively, put into rapidly vacuum chamber of film coating machine after employing vacuum drying chamber is fully dry.Vacuum chamber base vacuum 7.0 × 10 -3pa, is heated to 180 DEG C, temperature retention time 30min;
(2) Ion Cleaning: pass into Ar gas, its pressure is 1.5Pa, opens grid bias power supply, voltage 900V, dutycycle 0.2, Glow Discharge Cleaning 15min; Bias voltage is reduced to 300V, opens ion gun Ion Cleaning 20min, opens arc source, bias voltage 500V, target current 80A, Ions Bombardment Zr target 2min;
(3) deposition Zr: adjust Ar air pressure to 0.5Pa, bias voltage is reduced to 150V, electric arc plating Zr3min;
(4) deposition WS 2/ Zr: open WS 2target, bias voltage is adjusted to 150V, target current 1A, depositing temperature is 180 DEG C, medium frequency magnetron sputtering deposition WS 2/ Zr120min;
(5) close WS 2target and Zr target, close grid bias power supply, ion gun and gas source, insulation 50min, and deposited coatings finishes.

Claims (2)

1. a WS 2the compound textured ceramic cutter of/Zr soft coating micro-nano, matrix material is Al 2o 3base or Si 3n 4base pottery, is characterized in that the negative chamfered edge of sintex place has nanometer texture, has micro-nano compound texture, textured ceramic tool surface deposition WS on sintex rake face 2/ Zr soft coating, WS 2between/Zr soft coating and texture, there is one deck Zr transition zone.
2. a WS 2the compound textured ceramic cutter of/Zr soft coating micro-nano preparation method, it is characterized in that: adopt laser processing technology to process a micron texture at sintex rake face, and process nanometer texture on the negative chamfered edge of sintex and rake face, then adopt multi-arc ion coating+medium frequency magnetron sputtering deposition process successively at textured ceramic tool surface deposition Zr transition zone and WS 2/ Zr soft coating, its concrete preparation method is as follows:
(1) in the micro-nano texture of sintex Surface Machining
(1) by sintex rake face and negative chamfered edge place grinding and polishing to minute surface, put into successively alcohol and the each 20min of acetone ultrasonic cleaning;
(2) adopt Nd:YAG Solid State Laser to process the micron texture of different-shape and size in sintex rake face cutter bits contact zone; Wherein, micron texture width is 30-80 μ m, and the degree of depth is 10-150 μ m;
(3) adopt femtosecond laser to process the nanometer texture of different-shape and size in the negative chamfered edge place of sintex and rake face cutter bits contact zone; Nanometer texture internal structure is corrugated groove, and groove width is 200-400nm, and the degree of depth is 50-300nm, and the cycle is 600-800nm;
(2) at textured ceramic tool surface deposition soft coating
(1) pre-treatment: compound micro-nano textured ceramic cutter is put into alcohol and the each 20min of acetone ultrasonic cleaning successively, put into rapidly vacuum chamber of film coating machine after employing vacuum drying chamber is fully dry.Vacuum chamber base vacuum 7.0 × 10 -3pa, is heated to 180 DEG C, temperature retention time 30-40min;
(2) Ion Cleaning: pass into Ar gas, its pressure is 0.6-1.5Pa, opens grid bias power supply, voltage 800-900V, dutycycle 0.2, Glow Discharge Cleaning 15min; Bias voltage is reduced to 200-300V, opens ion gun Ion Cleaning 20min, opens arc source, bias voltage 400-600V, target current 80A, Ions Bombardment Zr target 1-2min;
(3) deposition Zr: adjust Ar air pressure to 0.4-0.5Pa, bias voltage is reduced to 100-200V, electric arc plating Zr2-5min;
(4) deposition WS 2/ Zr: open WS 2target, bias voltage is adjusted to 120-150V, target current 0.5-1.5A, depositing temperature is 150-200 DEG C, medium frequency magnetron sputtering deposition WS 2/ Zr60-120min;
(5) close WS 2target and Zr target, close grid bias power supply, ion gun and gas source, insulation 30-60min, and deposited coatings finishes.
CN201410263779.6A 2014-06-13 2014-06-13 WS2/Zr soft coating micro-nano composite texture ceramic cutting tool and preparing method thereof Pending CN104014828A (en)

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CN104928631A (en) * 2014-09-05 2015-09-23 北京机械工业自动化研究所 Manufacturing method of high-wear-resistant WS2 solid lubricating film
CN105798463A (en) * 2016-05-31 2016-07-27 山东大学 Pre-treatment technology used before coating of hard alloy cutter
CN106191765A (en) * 2016-07-06 2016-12-07 山东大学 Texturing soft and rigid composite coating layer and preparation method thereof
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CN106270581A (en) * 2016-08-30 2017-01-04 江苏大学 A kind of cutter strengthening lubrication and cooling and application thereof, processing method
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Application publication date: 20140903