CN103978564A - Substrate processing device - Google Patents

Substrate processing device Download PDF

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Publication number
CN103978564A
CN103978564A CN201410036362.6A CN201410036362A CN103978564A CN 103978564 A CN103978564 A CN 103978564A CN 201410036362 A CN201410036362 A CN 201410036362A CN 103978564 A CN103978564 A CN 103978564A
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CN
China
Prior art keywords
substrate
ctenii
platform
carrier
adsorption section
Prior art date
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Pending
Application number
CN201410036362.6A
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Chinese (zh)
Inventor
成尾徹
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Mitsuboshi Diamond Industrial Co Ltd
Original Assignee
Mitsuboshi Diamond Industrial Co Ltd
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Publication date
Application filed by Mitsuboshi Diamond Industrial Co Ltd filed Critical Mitsuboshi Diamond Industrial Co Ltd
Publication of CN103978564A publication Critical patent/CN103978564A/en
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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/03Glass cutting tables; Apparatus for transporting or handling sheet glass during the cutting or breaking operations
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/033Apparatus for opening score lines in glass sheets
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/027Scoring tool holders; Driving mechanisms therefor
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/037Controlling or regulating
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/10Glass-cutting tools, e.g. scoring tools
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Specific Conveyance Elements (AREA)

Abstract

The invention relates to a substrate processing device comprising an adsorption reversing device capable of shortening platform operation time between substrate reversing and loading a next step. The substrate processing device (A) comprises a marking device (B) for forming a marking line on the surface of a substrate (W), and an adsorption reversing device (C) of an adsorption portion (14) for adsorbing marked substrate (W) and reversing the substrate (W) to a bearing portion load in the next step. The adsorption portion (14) of the adsorption reversing device (C) is provided with ctenii shapes of multiple ctenii portions (14a) extended from an axis to orthometric direction by using a rotating shaft (13) as a basic end. The bearing portion is formed by being spaced apart from multiple bearing members (24) arranged in parallel and at intervals. The rotating shaft (13) is configured close to the platform (2) and the bearing portion (14) of the rotating shaft (13) in a manner that the ctenii portions (14a) can be arranged between the bearing members (24) and loads the substrate (W) on the ctenii portions (14a) on the bearing members (24) when absorbing the substrate (W) from the platform (2) of the marking device (B) and reversing and rotating.

Description

Base plate processing device
Technical field
The present invention relates to delineation line that a kind of substrate processing disjunction forming at the fragile material by glass, silicon, pottery, compound semiconductor etc. uses, along the base plate processing device of this delineation line disjunction substrate etc.
Background technology
Existing known, such as disclosed following method in patent documentation 1 grade: to loading the large-area mother substrate on platform, by scoring device, break bar (also claiming scribe wheel) is rotated under the state that applies set delineation pressure, or the thermal strain that produces of the irradiation that utilizes laser beam etc., form many mutually orthogonal parallel delineation lines, afterwards, by absorption inversion set, thereby mother substrate reversion is loaded in the platform of brisement device, the face that is opposition side from the face with being provided with this delineation line is pressed and is made substrate deflection with brisement bar, disjunction substrate by this, take out unit goods.
In addition, such as disclosed following method in patent documentation 2 (Figure 45) etc.: in the situation of carrying out disjunction to being fitted with the mother substrate of 2 pieces of glass substrates, to loading the mother substrate on the platform of scoring device, by break bar is rotated, in the one side of substrate, be that A face forms delineation line.Then, utilize absorption inversion set absorption substrate also to make, after its reversion, to be loaded on the platform of brisement device, to becoming the substrate B face at the back side of substrate A face, utilize brisement bar etc. to press and by the disjunction of substrate A face.Then, with similarly above-mentioned, at substrate B face, form delineation line, make after substrate reversion, to substrate A face, utilize brisement bar etc. to press and by the disjunction of substrate B face.Afterwards, by broken substrate from brisement device removal migration next step.
Patent documentation 1: International Publication WO2005/053925 communique
Patent documentation 2: International Publication WO2002/057192 communique
Summary of the invention
In the processing method of the substrate as above-mentioned, be used in the absorption inversion set of substrate reversion, possess the adsorption plate that has absorption substrate and make its reversion.And, for example, can obtain following means: to utilizing scoring device to delineate and load the mother substrate on platform, utilize the adsorption plate of absorption inversion set adsorb and make after it reverses, by the substrate on the adsorption plate that is held in absorption inversion set that is adsorbed becoming upward, the platform conveyance of the adsorption plate absorption of the absorption carrying device that utilization arranges in addition past next step, for example brisement device.Or on the contrary, adsorption plate to the mother substrate utilization absorption carrying device on the platform in scoring device adsorbs, move to on the adsorption plate of the absorption inversion set of mode standby upward and carry out transfer, making this adsorption plate reversion, is on the platform of brisement device in next step by the substrate-placing of showing, reverse in the back side.
Yet, in existing known method, have following problem: for mother substrate from scoring device is got and make its reversion, by the substrate-placing having reversed on the platform of next step, and need to adsorb inversion set and the absorption carrying device arranging in addition, thereby the maximization of device formation, cost are uprised.In addition, also have following problem: by the platform transfer from the substrate of the adsorption plate reversion of absorption inversion set toward next step or from the platform of scoring device by substrate, expending time in during toward the adsorption plate transfer of absorption inversion set, and the needed activity duration of the disjunction of substrate is elongated.
Because above-mentioned existing known problem, the object of the invention is to, a kind of base plate processing device of new structure is provided, technical problem to be solved is to make it when substrate being reversed and load the action in the carrier of platform of next step etc., there is more existing known techniques and install more easily formation, and possess and have the absorption inversion set that can shorten the activity duration, be very suitable for practicality.
The object of the invention to solve the technical problems realizes by the following technical solutions.In a kind of base plate processing device proposing according to the present invention, possess and have: scoring device, take the main path of conveyance brittle substrate sequentially as the 1st direction, in the way of this main path, on the surface of brittle substrate, form delineation line; And absorption inversion set, have and adsorb this brittle substrate of being delineated by scoring device and make its reversion, the adsorption section of the carrier transfer of past next step; The adsorption section of this absorption inversion set, has and take the axle center of rotating shaft as cardinal extremity from rotating shaft and toward the direction of quadrature, extend the shape of the comb shape of a plurality of ctenii portion arranging, and forms the turn of can reversing by this rotating shaft; This carrier, forms to bear member across spaced and parallel configuration a plurality of; The rotating shaft of this adsorption section, extends and arranges along the direction with the 1st direction quadrature; With the ctenii portion of this adsorption section during at the platform absorption brittle substrate from scoring device and by rotating shaft reversion turn, can dive in this and bear between member and by the brittle substrate in ctenii portion and load the mode of bearing member in this, this rotating shaft is disposed near the position of platform and this carrier of scoring device.
The object of the invention to solve the technical problems also can be applied to the following technical measures to achieve further.
Aforesaid base plate processing device, wherein this carrier bear member, be disposed at while accepting substrate from adsorption section the position of can flat-hand position accepting substrate.By this, posture that can level in bearing member, can prevent substrate transfer at substrate, to produce scar when transfer.
Aforesaid base plate processing device, this carrier wherein, is a plurality of members that bear that haunt freely above the platform of brisement device and forms by being arranged at, and this bears member, forms when the transfer of substrate to give prominence to posture between the ctenii portion of this adsorption section.By this, can be when substrate transfer, effectively transfer the platform from brisement device outstanding bear member, and can decline and load in platform surface by bearing member through the substrate of transfer, can then carry out next brisement step.
Aforesaid base plate processing device, this carrier wherein, by an end of the platform at brisement device mutually across spaced and parallel a plurality of members that bear of forming form, while forming the transfer in substrate, the ctenii portion of this adsorption section slips in bearing between member.By this, the mechanism that makes to bear component lifting can be omitted, the formation of carrier can be formed simply.
Aforesaid base plate processing device, this carrier wherein, by what formed by a plurality of conveyer belts, bear member and form, this each conveyer belt, with the little width in interval between the ctenii portion of this adsorption section, form, and form when substrate transfer, the ctenii portion of this adsorption section slips between each conveyer belt.By this, can be after substrate transfer, by conveyer belt make substrate continuously conveyance to next step.
The present invention compared with prior art has obvious advantage and beneficial effect.By technique scheme, base plate processing device of the present invention at least has following advantages and beneficial effect: the adsorption section of absorption inversion set of the present invention, during from the platform absorption substrate of scoring device and by rotating shaft reversion turn, can by through reversion substrate transfer in bear member above, therefore, can omit the existing absorption carrying device in order to transfer substrate as known and device is formed and simplified, and can seek the reduction of equipment cost.In addition, the rotating shaft of absorption inversion set be disposed between the platform of scoring device and carrier and these member near, therefore only so that adsorption section reversion just can make the action of substrate reversion and the action on carrier by the substrate-placing after reversion simultaneously.By this, there is the effect that can shorten significantly the activity duration.
In sum, the invention relates to a kind of base plate processing device, it possesses to have and can shorten after substrate reversion to loading in the absorption inversion set of the activity duration of the platform of next step.This base plate processing device, possesses to have on the surface of substrate, to form the scoring device of delineation line and have and adsorbs the substrate through delineating and make its reversion and the absorption inversion set of the adsorption section of the carrier transfer of past next step; The adsorption section of absorption inversion set, forms to have and take rotating shaft and from axle center, toward the direction of quadrature, extend the comb shape of a plurality of ctenii portion arranging as cardinal extremity; Carrier, forms to bear member across spaced and parallel configuration a plurality of; With ctenii portion, at the platform absorption substrate from scoring device and while reversing turn, can dive in bearing between member and by the substrate-placing in ctenii portion in the mode of bearing member near the configuration by rotating shaft toward platform and the carrier of scoring device.The present invention has significant progress technically, and has obvious good effect, is really a new and innovative, progressive, practical new design.
Above-mentioned explanation is only the general introduction of technical solution of the present invention, in order to better understand technological means of the present invention, and can be implemented according to the content of description, and for above and other object of the present invention, feature and advantage can be become apparent, below especially exemplified by preferred embodiment, and coordinate accompanying drawing, be described in detail as follows.
Accompanying drawing explanation
Fig. 1 means the approximate three-dimensional map that the integral body of base plate processing device of the present invention forms.
Fig. 2 is the stereogram of the scoring device in the base plate processing device of Fig. 1.
Fig. 3 is the stereogram of the absorption inversion set in the base plate processing device of Fig. 1.
Fig. 4 is the stereogram of the brisement device in the base plate processing device of Fig. 1.
Fig. 5 is the profile of carrier that is arranged at the platform of brisement device.
Fig. 6 means the figure of the job step of utilizing base plate processing device of the present invention.
Fig. 7 means the stereogram of another embodiment of carrier.
Fig. 8 means the figure of the job step of utilizing the base plate processing device that possesses the carrier that has Fig. 7.
Fig. 9 means the stereogram of the another embodiment of carrier.
Figure 10 means the figure of the job step of utilizing the base plate processing device that possesses the carrier that has Fig. 9.
[symbol description]
A: base plate processing device
B: scoring device
C: absorption inversion set
D: brisement device
W: substrate
2: the platform of scoring device
9: break bar
14: the adsorption section of absorption inversion set
14a: ctenii portion
19: the platform of brisement device
24,26,27: as the member that bears of carrier
28: conveyer belt
The specific embodiment
For further setting forth the present invention, reach technological means and the effect that predetermined goal of the invention is taked, below in conjunction with accompanying drawing and preferred embodiment, its specific embodiment of base plate processing device, structure, feature and effect thereof to proposing according to the present invention, be described in detail as follows.
Below, according to the embodiment shown in Fig. 1~Fig. 6, the details of base plate processing device of the present invention is described.Base plate processing device A in the present embodiment, as shown in Figure 1, consists of scoring device B, absorption inversion set C and brisement device D.Processed substrate W (with reference to Fig. 6), becomes along the 1st direction from scoring device B and sequentially divides a word with a hyphen at the end of a line to brisement device D via absorption inversion set C.So-called " the 1st direction " is the directions X in figure.In the present invention, the transport path along the 1st direction by substrate, is called " main path of substrate ".
Scoring device B, as shown in Figure 2, possesses and has the platform 2 moving along the track 1 that extends setting at directions X, and driven by the thread spindle 3 rotating by motor.Further, platform 2, possesses a plurality of air adsorptions hole (not shown) in the above, and become can turn in horizontal plane by the rotary driving part 5 of built-in motor on mobile microscope carrier 4.In addition, by possessing, there are the pillar of pair of right and left 6 and crane span structure in the beam 8 of the guide member 7 extending in Y-direction of these pillars 6, to be formed with the support of a type.At guide member 7, the engraving head 10 with break bar 9 is mounted to and can in Y-direction, be moved along guide member 7.
Absorption inversion set C, as shown in Figure 3, possesses the adsorption section 14 of the comb shape that has the rotating shaft 13 extending in Y-direction of the side plate 12 that is supported at left and right on stand 11 and rotate together with rotating shaft 13.The adsorption section 14 of comb shape is as the direction of cardinal extremity from rotating shaft 13 toward quadrature, to extend a plurality of ctenii 14a of portion that arrange and form by take rotating shaft 13.Adsorption section 14, as shown in Figure 1, forms the position contacting above the platform 2 with scoring device B, to form following brisement device D carrier bear member 24, the turn of reversing together with rotating shaft 13.In addition, at the 14a of ctenii portion of adsorption section 14, with the posture contacting above platform 2, below the 14a of ctenii portion, be provided with a plurality of air adsorptions hole (not shown).Further, rotating shaft 13, is configured between the platform 2 of scoring device B and the carrier of brisement device D, and approaches the position of platform 2 and carrier.In addition, rotating shaft 13, by reversion drive division 15 drivings of built-in motor.
Brisement device D, as shown in Figure 4, possess along the track 16 extending at directions X and by the turn of thread spindle 17 mobile mobile microscope carrier 18, and at this, move microscope carrier 18 platform 19 with a plurality of air adsorptions hole (not shown) be installed.Further, by the pillar 20 of pair of right and left and crane span structure, in these pillars 20 beam 21 that extends in Y-direction, form the support of door type, and at this beam 21, the tabular brisement bar 22 extending in Y-direction is mounted to can be by 23 liftings of fluid cylinder.
Platform 19 at brisement device D, be provided with from outstanding posture outstanding above it to becoming with flat surface a plurality of members 24 that bear that the posture of submerging of same level is haunted, this bears member 24, is formed with from adsorption section 14 carriers of accepting via the essence of the substrate W of absorption inversion set C reversion.As carrier, bear member 24, during with transfer at substrate W, to give prominence to the mode that posture slips between the 14a of ctenii portion of this adsorption section 14, configure side by side, and form by be disposed at below fluid cylinder 25 etc. elevating mechanism (with reference to Fig. 5) and carry out lifting.
The air adsorption hole of the adsorption section 14 of the platform 2,19 of above-mentioned scoring device B and brisement device D and absorption inversion set C, though omit graphic, but form by pipe arrangement with the air suction device of vavuum pump etc., be connected, and by air adsorption hole and by attracting air adsorbable substrate W.
Then, use Fig. 6 that the procedure of processing of the substrate W that utilizes above-mentioned base plate processing device is sequentially described.In Fig. 6 (a), load the substrate W on the platform 2 of scoring device B, in being already processed with in the above by scoring device B along the state of many delineation lines of Y-direction (fore-and-aft direction in figure).The processing of this delineation line, is by after uploading at platform 2 and being equipped with substrate W, makes platform 2 move to the position of engraving head 10 (with reference to Fig. 1,2), makes break bar 9 be crimped on the surface of substrate W, makes break bar 9 move and carry out in Y-direction.
By the substrate W loading after formation on this platform 2 delineation line, as shown in Fig. 6 (b), utilize the 14a of ctenii portion of the adsorption section 14 of absorption inversion set C adsorb and make its turn of reversing.The 14a of ctenii portion through reversion turn, slips in being provided with a plurality of bearing between member 24, by reversion the substrate W transfer that has been held in upside in bear member 24 above.The 14a of ctenii portion also by substrate W transfer after bearing member 24, as shown in Fig. 6 (c), turn is to from the angle [alpha] of substrate W separation.By this, can make substrate W fully keep somewhere in bear member 24 above.
Then,, as shown in Fig. 6 (d), (e), make the platform 19 of brisement device D move and from the 14a of ctenii portion separation, make the 14a of ctenii portion past scoring device B side reversion turn for next substrate W '.In brisement device D, make mounting have the platform 19 of substrate W to move to the below of brisement bar 22 (with reference to Fig. 1,4) and make brisement bar 22 down moving, along the delineation line of Y-direction, substrate W brisement is become to short rectangular-shaped.Afterwards, by the substrate W of brisement from platform 19 removals.
In addition, make the 14a of ctenii portion reversion and by substrate W transfer when bearing member 24 surperficial, once substrate W contacts with inclination attitude with respect to the surface of bearing member 24, probably will injure the surface of substrate W.Therefore, when substrate transfer, as shown in Fig. 6 (b), when the adsorption plane of the 14a of ctenii portion has become the posture of level, can pre-setly bear the extrusion position of member 24, with by substrate W transfer in bear member 24 above.By this, can in the situation that not injuring substrate W, carry out transfer.
Fig. 7 means another embodiment of the carrier in the present invention.In this embodiment, carrier, is by one end of the platform 19 at brisement device D, to be processed into a plurality of of veteranellinae shape bear member 26 and form.Bear member 26 mutually across spaced and parallel configuration, and the 14a of ctenii portion that forms this adsorption section 14 when the transfer of substrate W slips in bearing between member 26, on bear member 26, with flat-hand position, accept substrate W.
Fig. 8 means the figure same with Fig. 6 of the sequence of operation in the embodiment shown in above-mentioned Fig. 7.With last embodiment similarly, load the substrate W on platform 2, as shown in Fig. 8 (a), (b), to adsorb the 14a of ctenii portion of the adsorption section 14 of inversion set C, adsorb and the turn of reversing.Through reversion turn the 14a of ctenii portion, slip in being provided with a plurality of bearing between member 26, by substrate W transfer in bear member 26 above.The 14a of ctenii portion also by substrate W transfer after bearing member 26, as shown in Fig. 8 (c), turn is to from the angle [alpha] of substrate W separation.
Then,, as shown in Fig. 8 (d), make the platform 19 of brisement device D move and from the 14a of ctenii portion separation, make the 14a of ctenii portion past scoring device B side reversion turn as shown in Fig. 8 (e).In this embodiment, the member 26 that bears that becomes the carrier of substrate is bearing as member 24 without the mechanism of oscilaltion as shown in last embodiment, therefore can simplify the formation of carrier.
Fig. 9 means usings the embodiment that bears member 27 that a plurality of conveyer belts 28 form as carrier of the present invention.Each conveyer belt 28, forms with the little width in interval between the 14a of ctenii portion of this absorption inversion set C, and forms the 14a of ctenii portion when substrate transfer and slip between each conveyer belt 27, on conveyer belt 27, with flat-hand position, accepts substrate W.
Figure 10 means the sequence of operation of the embodiment shown in above-mentioned Fig. 9.With last embodiment similarly, loaded the substrate W on platform 2, as shown in Figure 10 (a), (b), be adsorbed on the 14a of ctenii portion and the reversion turn of the adsorption section 14 of absorption inversion set C.The reversed 14a of ctenii portion of turn, slips in being provided with between a plurality of conveyer belt 28, by substrate W transfer above conveyer belt 28.The 14a of ctenii portion also by substrate W transfer after conveyer belt 28, as shown in Figure 10 (c), turn is to from the angle [alpha] of substrate W separation.
Then, as shown in Figure 10 (d), transfer has been in the substrate W of conveyer belt 28, and by conveyer belt 28, conveyance is to next step, and make the 14a of ctenii portion as shown in Figure 10 (e) toward scoring device B side reversion turn.
As described above, in the present invention, the adsorption section 14 of absorption inversion set C, during at the platform 2 absorption substrate W from scoring device B and by rotating shaft 13 reversion turn, can by through reversion substrate W transfer in bear member 24,26,27 above, therefore can omit as existing known as in order to the absorption carrying device of transfer substrate, and can simplify base plate processing device A.In addition, the rotating shaft 13 of absorption inversion set C is configured between the platform 2 and carrier of scoring device B, and in these the approximated position of member, therefore only make adsorption section 14 reversions, just can make simultaneously substrate W reversion action, with the substrate W after reversion is loaded to the action on carrier.By this, can significantly shorten the activity duration.
Though illustrated that above the present invention is not limited to above-mentioned example about representational embodiment of the present invention.For example, though diagram is omitted, also the adsorption section 14 of absorption inversion set C can be formed can upper-lower position adjustment with respect to side plate 12.By this, make adsorption section 14 reversion and by substrate W during toward the surperficial transfer of carrier, the fine position of adsorption section 14 can be made into substrate W correctly becomes the position of flat-hand position with respect to the surface of carrier.
The present invention is used in the base plate processing device that forms delineation line on substrate, carry out brisement along this delineation line.
The above, it is only preferred embodiment of the present invention, not the present invention is done to any pro forma restriction, although the present invention discloses as above with preferred embodiment, yet not in order to limit the present invention, any those skilled in the art, do not departing within the scope of technical solution of the present invention, when can utilizing the technology contents of above-mentioned announcement to make a little change or being modified to the equivalent embodiment of equivalent variations, in every case be not depart from technical solution of the present invention content, any simple modification of above embodiment being done according to technical spirit of the present invention, equivalent variations and modification, all still belong in the scope of technical solution of the present invention.

Claims (5)

1. a base plate processing device, it comprises:
Scoring device, take the main path of conveyance brittle substrate sequentially as the 1st direction, in the way of this main path, on the surface of brittle substrate, forms delineation line; And
Absorption inversion set, has and adsorbs this brittle substrate of being delineated by scoring device and make its reversion, the adsorption section of the carrier transfer of past next step;
It is characterized in that:
The adsorption section of this absorption inversion set, has and take the axle center of rotating shaft as cardinal extremity from rotating shaft and toward the direction of quadrature, extend the shape of the comb shape of a plurality of ctenii portion arranging, and form the turn of can reversing by this rotating shaft;
This carrier, forms to bear member across spaced and parallel configuration a plurality of;
The rotating shaft of this adsorption section, extends and arranges along the direction with the 1st direction quadrature;
With the ctenii portion of this adsorption section during at the platform absorption brittle substrate from scoring device and by rotating shaft reversion turn, can dive in this and bear between member and by the brittle substrate in ctenii portion and load the mode of bearing member in this, this rotating shaft is disposed near the position of platform and this carrier of scoring device.
2. base plate processing device according to claim 1, is characterized in that wherein,
This carrier bear member, be disposed at while accepting substrate from adsorption section the position of can flat-hand position accepting substrate.
3. base plate processing device according to claim 1 and 2, is characterized in that wherein,
This carrier, is a plurality of members that bear that haunt freely above the platform of brisement device and forms by being arranged at, and this bears member, forms when the transfer of substrate to give prominence to posture between the ctenii portion of this adsorption section.
4. base plate processing device according to claim 1 and 2, is characterized in that wherein,
This carrier, by an end of the platform at brisement device mutually across spaced and parallel a plurality of members that bear of forming form, and form when the transfer of substrate, the ctenii portion of this adsorption section slips in bearing between member.
5. base plate processing device according to claim 1 and 2, is characterized in that wherein,
This carrier, bears member and forms by what consist of a plurality of conveyer belts;
This each conveyer belt, the width little with the interval between the ctenii portion of this adsorption section forms, and forms when substrate transfer, and the ctenii portion of this adsorption section slips between each conveyer belt.
CN201410036362.6A 2013-02-07 2014-01-24 Substrate processing device Pending CN103978564A (en)

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JP2013022624A JP6126396B2 (en) 2013-02-07 2013-02-07 Substrate processing equipment
JP2013-022624 2013-02-07

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CN110405962A (en) * 2019-07-23 2019-11-05 上海理工大学 Automatic turnover semiconductor cleavage device and processing method

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JP2017095294A (en) * 2015-11-20 2017-06-01 三星ダイヤモンド工業株式会社 Substrate cutting device
JP6509772B2 (en) * 2016-04-12 2019-05-08 株式会社佐藤鉄工所 Molding material supply device

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