CN103904547A - Pulsed laser system and driving method thereof - Google Patents
Pulsed laser system and driving method thereof Download PDFInfo
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- CN103904547A CN103904547A CN201310656731.7A CN201310656731A CN103904547A CN 103904547 A CN103904547 A CN 103904547A CN 201310656731 A CN201310656731 A CN 201310656731A CN 103904547 A CN103904547 A CN 103904547A
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- pulse
- laser beam
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/034—Observing the temperature of the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0626—Energy control of the laser beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10038—Amplitude control
- H01S3/10046—Pulse repetition rate control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/1028—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the temperature
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
Abstract
The present invention relates to a pulse-type laser system and a method of driving the same. The method of driving the pulse-type laser system according to the present invention includes: allowing a control unit to determine pulse energy of a laser beam and exposure time to the laser beam, which are appropriate to the irradiation of the laser beam into a workpiece, based on information of machining conditions of the workpiece received from a data server; allowing the control unit to determine average output power and energy of the laser beam, which are transmitted from a beam monitoring device, to be in the set range of the average output power and energy of the laser beam; allowing the control unit to set the pulse energy and the average output power of the laser beam, which are appropriate to the machining of the workpiece, based on the determination information; and allowing the control unit to calculate loss-time, which is off-time, of the trigger pulse to provide the loss-time to a trigger pulse generator so that the variation in the measured average power is minimized so the set average output power of the laser beam approximates the measured average output power of the laser beam. As described above, according to the present invention, the pulse energy is acquired by fixing the pulse width of the trigger signal, and required average optical power is acquired by changing (adjusting) the loss-time, which is in the off-time duration of the trigger signal, thereby simultaneously stabilizing the change in the average output power and the energy change between pulses of the laser beam.
Description
The cross reference of related application
The application requires the rights and interests of No. 10-2012-0153491st, the korean patent application sequence number that is entitled as " pulse laser system and driving method thereof " of submitting on December 26th, 2012, by reference the application's full content is combined in to this.
Technical field
The present invention relates to pulse laser system and driving method thereof, more specifically, relate to and a kind ofly can make the average output power of laser beam and pulse laser system and the driving method thereof of pulse pulsed energy (pulse-to-pulse energy) vary stable simultaneously.
Background technology
Conventionally,, in the technique of use laser, laser power or energy stability is in time regarded as an important factor.
In order to obtain the stability of laser, by laser diode and direct power output or the energy of controlling laser for the method for pumping energy media such as gas of regulating.
Using in the processing of the through holes such as drill, because its characteristic is used the laser beam of pulse form, wherein, be difficult to make power output and pulse pulsed energy Simultaneous Stabilization.Under normal conditions, in order to make stable output power, can within a time period, cause pulse energy unstable.Particularly, when in process time section, required pulse energy is not enough, this processing will stop, thereby causes reducing of the productivity.
In the prior art, adopted the pumping energy that regulates pumping peak power or the method for pumping time to control laser medium.
Using pulse width modulation (PWM) to regulate the method for pumping time is a kind of method that uses the measurement optical power change such as optical pickocff to reduce.Because said method produces the light output time changing according to the pumping time, so said method can be limited in important manufacture field of time for exposure.
The variation of the luminous power that can reduce to measure by the magnitude of direct adjusting high frequency pump signal, and do not limit for the pumping time.But, because said method also needs control interface, so the control circuit of laser will become complexity.
Minimize in order to make to regulate the energy of the light beam pulse producing during pump energy to reduce, it is also possible with the method that increases the umber of pulse can work in-process using that power During produces another type pump signal.But, owing to should preparing various forms of pump signal etc., so the method also makes control circuit become complicated.
Alternately, in order to reduce the variation in pulse pulsed energy, a kind of optical pickocff output signal that detects is also possible with the method that regulates pump energy or optical loss factor.But the method may can not make the energy changing Simultaneous Stabilization between pulse and power output variation yet.
[prior art document]
[patent documentation]
(patent documentation 1) United States Patent (USP) discloses No. 2008-0023452
(patent documentation 2) United States Patent (USP) discloses No. 2011-0284507
(patent documentation 3) United States Patent (USP) discloses the 4th, 856, No. 010
(patent documentation 4) United States Patent (USP) discloses the 5th, 982, No. 790
Summary of the invention
An object of the present invention is to provide so a kind of pulse laser system and driving method thereof, this pulse laser system can make energy changing Simultaneous Stabilization between the average output power of laser beam and pulse by using change the pulse duration of (and regulate) and triggering signal the idle time of triggering signal.
According to an illustrative embodiment of the invention, provide a kind of pulse laser system, comprising: laser beam supply unit, illuminating laser beam on workpiece; Lasing light emitter, provides laser pulse to laser beam supply unit; Supply unit, to lasing light emitter supply high frequency power; Trigger impulse maker, produces triggering signal so that the trigger impulse of generation to be provided to supply unit; Controller, output allows trigger impulse maker to produce the control signal of trigger impulse and this system of entirety control; Beam Monitoring device, to monitoring to provide relevant information to controller from the laser beam of laser beam supply unit output; Device for detecting temperature, monitors to provide relevant information to controller to the temperature of laser beam supply unit; And data server, provide the information relevant to the processing of workpiece to controller.
Carry out Configuration Control Unit based at least one in field programmable gate array (FPGA) logic, digital signal processor (DSP) and CPU (CPU).
Beam Monitoring device can be monitored at least one from power, energy and the position of the laser beam of laser beam supply unit output.
The information relevant to the processing of workpiece can comprise the unlatching period of peak power, pulse energy and the pulse of laser beam pulses.
Controller can receive temperature information from device for detecting temperature, and in the temperature range of not setting at the temperature information receiving, and the idle time of the time period can control to make laser beam pulses not expose on workpiece time is elongated or shorten.
According to another illustrative embodiments of the present invention, a kind of driving method of pulse laser system is provided, this pulse laser system comprises laser beam supply unit, lasing light emitter, supply unit, trigger impulse maker, controller, Beam Monitoring device, device for detecting temperature and data server, and the method comprises: pulse energy and the time for exposure that will be irradiated to the proper laser bundle workpiece are determined according to the processing conditions information of the workpiece providing from data server by controller; Determine that by controller the average output power of the light beam that sends from Beam Monitoring device and energy are whether in setting the average output power of light beam and the scope of energy; Set based on definite information the pulse energy and the light beam average output power that are suitable for processing work by controller; And calculate idle time, be the period that light beam does not expose on workpiece this idle time, thereby the average power variation of measuring is minimized, to make the light beam average power of measuring follow the light beam average output power of setting and be provided the idle time calculating to trigger impulse maker.
The processing conditions information of workpiece can comprise the unlatching period of peak power, pulse energy and the pulse of laser beam pulses.
The method can further comprise by controller determines suitable light beam state and the temperature in laser beam supply unit according to the processing conditions information of the workpiece being provided by data server.
Light beam state can comprise position, size and the shape of light beam.
The method can further comprise by controller determines that the temperature information that sends from device for detecting temperature is whether in the scope of the temperature range in setting.
When as this definite result being the temperature information that sends from device for detecting temperature not within the scope of design temperature time, controller can control so that idle time (, the shutoff period of laser beam pulses) is elongated or shorten.
The method can further comprise from the pulse energy of setting calculates the pulse duration as the unlatching period of trigger impulse, and the pulse duration calculating is provided to trigger impulse maker.
Calculate idle time according to following equation:
Lt=Pw×（1-Dc）/Dc
Wherein, Lt represents idle time, and Pw represents the pulse duration of the period on workpiece as laser beam lithography, and Dc represents duty ratio.
Brief description of the drawings
Fig. 1 is the diagram that schematically shows the configuration of pulse laser system according to an illustrative embodiment of the invention;
Fig. 2 shows the flow chart of the process of the driving method of carrying out according to an illustrative embodiment of the invention pulse laser system;
Fig. 3 shows the characteristic curve diagram of the relevance between idle time and the duty ratio of the driving method that is applicable to pulse laser system according to an illustrative embodiment of the invention;
Fig. 4 A to Fig. 4 D shows the diagram of the control form of the trigger impulse producing in the trigger impulse maker of pulse laser system according to an illustrative embodiment of the invention;
Fig. 5 A to Fig. 5 D shows the diagram of each pulse energy (the energy per pulse) variation changing according to the average power of the pulse width modulation control based on prior art; And
Fig. 6 A to Fig. 6 D shows the diagram of each pulse energy variation changing according to average power the driving method in the case of having applied pulse laser system according to an illustrative embodiment of the invention.
Embodiment
The term using in this specification and claim and vocabulary should not be construed as limited to conventional implication or dictionary definition, but should be interpreted as implication and the concept of the relevant technical scope of the present invention based on certain rule, according to this rule, inventor can suitably define term concepts, and to describe the most rightly, he or she has become known for the best approach of the present invention.
Run through in this specification, describe unless separately had clearly, otherwise " comprising " any parts will be understood to tacit declaration and comprise miscellaneous part, but not get rid of any other parts.Term " unit ", " module ", " device " etc. refer to the unit of at least one function of processing or operation, and this function or operation can be implemented by the combination of hardware, software or hardware and software.
Hereinafter, describe with reference to the accompanying drawings embodiments of the present invention in detail.
Fig. 1 is the diagram that schematically shows the configuration of pulse laser system according to an illustrative embodiment of the invention.
With reference to Fig. 1, pulse laser system according to an illustrative embodiment of the invention comprises laser beam supply unit 110, lasing light emitter 120, supply unit 130, trigger impulse maker 140, controller 150, Beam Monitoring device 160, device for detecting temperature 170 and data server 180.
Laser beam supply unit 110 by laser beam irradiation on workpiece 190.Above-mentioned laser beam supply unit 110 can be configured to comprise an optical system of multiple convex lens and concavees lens.
Lasing light emitter 120 provides laser pulse to laser beam supply unit 110.As lasing light emitter 120 as above, can use CO
2laser, excimer laser etc.
The laser beam that Beam Monitoring device 160 is exported laser beam supply unit 110 is monitored and is provided relevant information to controller 150.At least one in power, energy and the position of the laser beam that above-mentioned Beam Monitoring device 160 can be exported laser beam supply unit 110 monitored.
The laser beam that device for detecting temperature 170 is exported laser beam supply unit 110 is monitored and is provided relevant information to controller 150.
Next, will the driving method of the pulse laser system with configuration described above according to an illustrative embodiment of the invention be described.
Fig. 2 is the flow chart of the process of the driving method of execution pulse laser system according to an illustrative embodiment of the invention.
With reference to Fig. 2, the driving method of pulse laser system is according to an illustrative embodiment of the invention the driving method of pulse laser system according to an illustrative embodiment of the invention, as mentioned above, this pulse laser system comprises: laser beam supply unit 110, lasing light emitter 120, supply unit 130, trigger impulse maker 140, controller 150, Beam Monitoring device 160, device for detecting temperature 170, and data server 180, wherein, first controller 150 determines (S201) according to the processing conditions information of the workpiece 190 being provided by data server 180 to pulse energy and the time for exposure of the proper laser bundle that will be irradiated to workpiece 190.Herein, the processing conditions information of workpiece 190 can comprise the unlatching period of peak power, pulse energy and the pulse of laser beam pulses.
In addition, controller 150 is determined proper laser bundle and the temperature (S202) in laser beam supply unit 110 according to the processing conditions information of the workpiece 190 being provided by data server 180.In this case, the proper laser pencil state in laser beam supply unit 110 can comprise position, size and the shape of light beam.
Then, determine whether (S203) in the scope of the setting average output power in light beam and energy of the average output power of the light beams that send from Beam Monitoring device 160 and energy by controller 150.
In addition, determine whether (S204) in the temperature range in setting of the temperature information that sends from device for detecting temperature 170 by controller 150.In this case, as this definite result, when the temperature information sending from device for detecting temperature 170 not in set temperature range in time, controller 150 control so that idle time is elongated or shorten, wherein, be the unexposed period on workpiece time of laser beam pulses this idle time.
In addition, definite information arrange of controller 150 based in S203 is applicable to pulse energy and the light beam average output power (S205) of processing work 190.
Then, controller 150 calculates the pulse as the unlatching period of trigger impulse according to setting pulse energy, and provides the pulse duration calculating (S206) to trigger impulse maker 140.
In addition, follow the light beam average output power of setting in order to make the light beam average power of measuring, controller 150 calculates idle time, be the unexposed period on workpiece time of light beam this idle time, thereby the average power variation of measuring is minimized, and be provided the idle time (S207) of calculating to trigger impulse maker 140.
As mentioned above, in the present invention, can obtain desired pulse energy by the pulse duration of fixing triggering signal, and by change (adjusting) as can obtain the idle time of the period at intermittence of triggering signal average light power.Herein, the idle time of trigger impulse and duty ratio meet following equation.
Pw/（Pw+Lt）=Dc
Wherein, Lt represents idle time, the pulse duration of period when Pw represents as laser beam lithography on workpiece, and Dc represents duty ratio.
Therefore, can calculate idle time according to following equation.
Lt=Pw×（1-Dc）/Dc
Fig. 3 shows the characteristic curve diagram of the relevance of idle time as above and duty ratio.
As shown in Figure 3, can recognize, idle time and duty ratio are each other in inversely proportional exponential function relation.
Fig. 4 A to Fig. 4 D shows the diagram of the control form of the trigger impulse producing in the trigger impulse maker of pulse laser system according to an illustrative embodiment of the invention.
With reference to Fig. 4 A to Fig. 4 D, Fig. 4 A shows a kind of form of the trigger impulse producing in trigger impulse maker 140, and Fig. 4 B shows the optics power output output corresponding to trigger impulse in Fig. 4 A.In addition, Fig. 4 C shows the process of wherein recently determining and change average power according to the duty of pulse, and Fig. 4 D shows the width according to trigger impulse, the cumulative energy value of each pulse of light beam.In Fig. 4 D, can recognize, along with pulse duration increases, pulse energy also increases.
Meanwhile, Fig. 5 A to Fig. 5 D shows the diagram of each pulse energy variation of the average power variation of the pulse width modulation control based on prior art.
With reference to Fig. 5 A to Fig. 5 D, it shows based on controlling 30 pulses are sampled and the variation of each pulse energy in the time changing average power according to the PWM of prior art., can recognize herein, the part declining in duty ratio, pulse energy also reduces (seeing Fig. 5 D).In such as laser hole processing and other fields, due to the above-mentioned reduction of pulse energy, and can not meet processing conditions.
Fig. 6 A to Fig. 6 D shows the diagram of the pulse energy variation changing according to average power in the case of the driving method of application pulse laser system according to an illustrative embodiment of the invention.
With reference to Fig. 6 A to Fig. 6 D, it shows the result (, application changes the method that change (adjusting) idle time) of the driving method of application pulse laser system according to an illustrative embodiment of the invention., can recognize, even in the time that similarly average power changes, pulse energy is identical (being shown in Fig. 6 D) all the time herein.Therefore, maintain constant pulse energy to meet processing conditions.
As mentioned above, according to an illustrative embodiment of the invention, pulse duration by fixing triggering signal can obtain desired pulse energy, and by changing (adjustings) as obtaining desired average light power the idle time of period at triggering signal intermittence, thereby may make the energy changing Simultaneous Stabilization between average output power and the pulse of laser beam.
In addition, according to prior art, in the time that pulse laser system produces high-output power, due to the compromise between output power stability and pulse energy, so the mass formation harmful effect of pulse laser system to workpiece, but in guaranteeing workpiece quality, can obtain according to an illustrative embodiment of the invention, the stability of light beam.
Although disclose the preferred embodiment of the present invention, but the present invention is not limited thereto, but those of skill in the art will be appreciated that, in not departing from as claims, in disclosed scope and spirit of the present invention, various transformations, interpolation and replacement are all possible.Therefore, should explain actual range of the present invention according to following claim, and of the present invention all technical spirit in equivalency range include within the scope of the invention.
Claims (13)
1. a pulse laser system, comprising:
Laser beam supply unit, by laser beam irradiation to workpiece;
Lasing light emitter, offers described laser beam supply unit by laser pulse;
Supply unit, provides high frequency power to described lasing light emitter;
Trigger impulse maker, produces trigger impulse so that the described trigger impulse of generation to be provided to described supply unit;
Controller, output allows described trigger impulse maker to produce the control signal of described trigger impulse and the described system of entirety control;
Beam Monitoring device, monitors to provide relevant information to described controller to the described laser beam of described laser beam supply unit output;
Device for detecting temperature, monitors to provide relevant information to described controller to the temperature of described laser beam supply unit; And
Data server, provides the information relevant to the processing of described workpiece to described controller.
2. pulse laser system according to claim 1, wherein, configures described controller based at least one in field programmable gate array (FPGA) logic, digital signal processor (DSP) and CPU (CPU).
3. pulse laser system according to claim 1, wherein, at least one in power, energy and the position of the described laser beam of described Beam Monitoring device to described laser beam supply unit output monitored.
4. pulse laser system according to claim 1, wherein, the described information relevant to the processing of described workpiece comprises the unlatching period of peak power, pulse energy and the pulse of laser beam pulses.
5. pulse laser system according to claim 1 and 2, wherein, described controller receives temperature information from described device for detecting temperature, and carry out and control to make not within the scope of design temperature idle time elongated or shorten at the described temperature information receiving, wherein, be the shutoff period of laser beam pulses described idle time.
6. the driving method of a pulse laser system, described pulse laser system comprises: laser beam supply unit, lasing light emitter, supply unit, trigger impulse maker, controller, Beam Monitoring device, device for detecting temperature and data server, and described method comprises:
The processing conditions information of the workpiece being provided according to described data server by described controller is determined pulse energy and the time for exposure that will be irradiated to the proper laser bundle on described workpiece;
Determine that by described controller the average output power of the light beam that described Beam Monitoring device sends and energy are whether in setting the average output power and energy range of light beam;
Information setting by described controller based on definite is suitable for processing described pulse energy and the light beam average output power of described workpiece; And
Calculate idle time, thereby the variation in the described average power that makes to measure minimizes, so that the light beam average power of measuring is followed the described light beam average output power of setting and will offer described trigger impulse maker the described idle time calculating, wherein, be the unexposed period on described workpiece of described light beam described idle time.
7. method according to claim 6, wherein, the described processing conditions information of described workpiece comprises the unlatching period of peak power, pulse energy and the pulse of laser beam pulses.
8. method according to claim 6, further comprises: the described processing conditions information of the described workpiece being provided according to described data server by described controller is determined light beam state and temperature suitable in described laser beam supply unit.
9. method according to claim 8, wherein, described light beam state comprises position, size and the shape of described light beam.
10. method according to claim 6, further comprises: determine that by described controller described temperature information that described device for detecting temperature sends is whether in the scope of the temperature range in setting.
11. methods according to claim 10, wherein, as described definite result, the described temperature information sending from described device for detecting temperature is not in the temperature range in described setting time, described controller control so that idle time elongated or shorten, wherein, be the unexposed time period on workpiece time of described laser beam pulses described idle time.
12. methods according to claim 6, further comprise: calculate pulse duration according to setting pulse energy, and the described pulse duration calculating is provided to described trigger impulse maker, and wherein, described pulse duration is the unlatching period of described trigger impulse.
13. methods according to claim 6, wherein, calculate described idle time according to following equation:
Lt=Pw×（1–Dc）/Dc
Wherein, Lt represents described idle time, the described pulse duration of time period when Pw represents as described laser beam lithography on workpiece, and Dc represents duty ratio.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020120153491A KR101387314B1 (en) | 2012-12-26 | 2012-12-26 | Pulsed laser system and driving method thereof |
| KR10-2012-0153491 | 2012-12-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103904547A true CN103904547A (en) | 2014-07-02 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310656731.7A Pending CN103904547A (en) | 2012-12-26 | 2013-12-06 | Pulsed laser system and driving method thereof |
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| KR (1) | KR101387314B1 (en) |
| CN (1) | CN103904547A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105938974A (en) * | 2016-06-08 | 2016-09-14 | 北京牙科通医疗科技股份有限公司 | Laser variable pulse width protection system |
| CN107946895A (en) * | 2016-10-12 | 2018-04-20 | 深圳大学 | Laser energy stability device and its antihunt means |
| CN108057953A (en) * | 2017-12-13 | 2018-05-22 | 广东正业科技股份有限公司 | A kind of laser-processing system and laser power control method |
| WO2019214200A1 (en) * | 2018-05-09 | 2019-11-14 | 深圳市创鑫激光股份有限公司 | Laser pulse power control method, pulse optical fiber laser device, and laser cutting system |
| WO2019218634A1 (en) * | 2018-03-14 | 2019-11-21 | 深圳市创鑫激光股份有限公司 | Control method for laser, electronic control apparatus, laser, laser drilling device, and storage medium |
| CN114406452A (en) * | 2020-10-12 | 2022-04-29 | 住友重机械工业株式会社 | Control device for laser processing machine, and laser processing method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107414294A (en) * | 2017-08-08 | 2017-12-01 | 江苏大金激光科技有限公司 | A kind of laser-beam welding machine |
| CN117583722B (en) * | 2024-01-19 | 2024-04-30 | 深圳市智鼎自动化技术有限公司 | Laser processing system and laser energy control method |
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| JP2858236B2 (en) * | 1996-03-19 | 1999-02-17 | 住友重機械工業株式会社 | Laser processing equipment |
| JP2004034121A (en) * | 2002-07-05 | 2004-02-05 | Sumitomo Heavy Ind Ltd | Laser beam machining device and machining method |
| JP2007245159A (en) * | 2006-03-13 | 2007-09-27 | Sumitomo Heavy Ind Ltd | Laser beam machining apparatus and laser beam machining method |
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2012
- 2012-12-26 KR KR1020120153491A patent/KR101387314B1/en not_active IP Right Cessation
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- 2013-12-06 CN CN201310656731.7A patent/CN103904547A/en active Pending
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| US5269778A (en) * | 1988-11-01 | 1993-12-14 | Rink John L | Variable pulse width laser and method of use |
| US5982790A (en) * | 1997-01-16 | 1999-11-09 | Lightwave Electronics Corporation | System for reducing pulse-to-pulse energy variation in a pulsed laser |
| JP2003188446A (en) * | 2001-12-19 | 2003-07-04 | Sumitomo Heavy Ind Ltd | Method for stabilizing pulse for laser processing |
| US20060176917A1 (en) * | 2005-02-09 | 2006-08-10 | Ultratech, Inc. | CO2 laser stabilization systems and methods |
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| CN105938974A (en) * | 2016-06-08 | 2016-09-14 | 北京牙科通医疗科技股份有限公司 | Laser variable pulse width protection system |
| CN105938974B (en) * | 2016-06-08 | 2019-02-05 | 北京牙科通医疗科技股份有限公司 | A kind of laser variable pulse width protection system |
| CN107946895A (en) * | 2016-10-12 | 2018-04-20 | 深圳大学 | Laser energy stability device and its antihunt means |
| CN108057953A (en) * | 2017-12-13 | 2018-05-22 | 广东正业科技股份有限公司 | A kind of laser-processing system and laser power control method |
| WO2019218634A1 (en) * | 2018-03-14 | 2019-11-21 | 深圳市创鑫激光股份有限公司 | Control method for laser, electronic control apparatus, laser, laser drilling device, and storage medium |
| WO2019214200A1 (en) * | 2018-05-09 | 2019-11-14 | 深圳市创鑫激光股份有限公司 | Laser pulse power control method, pulse optical fiber laser device, and laser cutting system |
| CN114406452A (en) * | 2020-10-12 | 2022-04-29 | 住友重机械工业株式会社 | Control device for laser processing machine, and laser processing method |
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| KR101387314B1 (en) | 2014-04-21 |
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