CN103824649B - A kind of method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality - Google Patents
A kind of method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality Download PDFInfo
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- CN103824649B CN103824649B CN201410035552.6A CN201410035552A CN103824649B CN 103824649 B CN103824649 B CN 103824649B CN 201410035552 A CN201410035552 A CN 201410035552A CN 103824649 B CN103824649 B CN 103824649B
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Abstract
The invention discloses a kind of method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality: on flexible material substrate, first prepare TCO thin film；The TCO thin film of preparation is placed in electromagnetic field and it is heated so that it is conduction, light transmission get a promotion, obtain the transparent conductive oxide film optimizing.The method of the present invention not only solves this difficult problem of the TCO preparing at low temperatures on flexible material, and also can carry out rapid thermal treatment to the existing TCO thin film being typically prepared on glass, thus obtains the more excellent TCO thin film of performance.Can be widely applied to field of flexible display and photovoltaic art.
Description
Technical field
The invention belongs to field of material technology, relate to a kind of method optimizing transparent conductive oxide film quality, especially a kind of method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality.
Background technology
With developing by leaps and bounds of information technology and photovoltaic, flexible conducting material is increasingly subject to people's attention and pays close attention to, and has broad application prospects in many fields, such as photovoltaic cell, display screen etc..Existing TCO coating technique is all to utilize the methods such as thermal evaporation, electron beam evaporation, vacuum sputtering, chemical gaseous phase deposition, spraying, these methods high permeability to be expected, the TCO film of high conductivity are necessary for adding the temperature not less than 200 DEG C to substrate base, and so high temperature makes the composite of PET class be difficult to use, or even if TCO thin film can be plated at low temperatures, the electrically or optically characteristic of film do not reach technology use require.Therefore, PET temperature tolerance difference, this restrict its application at flexible solar cell, field of flexible display.How to prepare under cryogenic and there is the excellent TCO electrode of good photoelectric characteristic become key.
Content of the invention
It is an object of the invention to the shortcoming overcoming above-mentioned prior art, a kind of method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality is provided, the method can solve the problem that this difficult problem of TCO preparing on flexible material at low temperatures, can be applied to field of flexible display and photovoltaic art.
It is an object of the invention to be achieved through the following technical solutions:
This method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality, prepares TCO thin film first on flexible substrates；The TCO thin film of preparation is placed in electromagnetic field and it is selectively heated so that it is conduction, light transmission get a promotion, obtain the transparent conductive oxide film optimizing.
Further, above transparent conductive oxide film of preparing on flexible substrates is the mode using thermal evaporation, electron beam evaporation, vacuum sputtering, chemical gaseous phase deposition or spraying.
Further, above heat treatment process is to carry out in oxygen, air, nitrogen or argon gas.
Above-mentioned TCO thin film is the mixture of one or more of the zinc oxide of the indium oxide of doping, the tin oxide of doping and doping, metal alloy or laminate film.
Above-mentioned flexible material substrate is glass, macromolecular material or stainless steel.
Above-mentioned flexible material substrate is PET, polyamide, Merlon, polyethylene or organic material.
Upper prefabricated membrane type includes: for preparing all kinds of oxidation film and the emtal alloy film of TCO thin film.
Above-mentioned obtain optimize transparent conductive oxide film thickness 10 nanometers to 3 microns between.
Further, above-mentioned when heating, wave frequency is between 10Hz to 100GHz.
Further, when TCO thin film made above and heat treatment, reel-to-reel technology is used.
The method have the advantages that
The present invention utilizes Electromagnetic Heating to optimize the method for transparent conductive oxide film quality by electromagnetism selectively heating TCO thin film (alloy film or conductive oxide film).Utilizing electromagnetic induction principle, high frequency electric flows through the magnetic field that coil produces change at a high speed, and the magnetic field of change produces countless little eddy current by conductive film, makes moment of conduction prefabricated membrane itself generate heat, and as the composite of substrate, non-conductive, will not be heated up considerably.Thus realize that under low temperature, selective thermal processes the effective ways of TCO thin film on the backing material of non-refractory.The method not only solves this difficult problem of the TCO preparing at low temperatures on flexible material, and also can carry out rapid thermal treatment to the existing TCO thin film being typically prepared on glass, thus obtains the more excellent TCO thin film of performance.Can be widely applied to field of flexible display and photovoltaic art.
Brief description
Fig. 1 is the preparation process schematic diagram of embodiments of the invention 1；
Fig. 2 is the preparation process schematic diagram of embodiments of the invention 2；
Fig. 3 is the preparation process schematic diagram of embodiments of the invention 3；
Fig. 4 is the preparation process schematic diagram of embodiments of the invention 4；
Fig. 5 is the one of which preparation process schematic diagram of the inventive method；
Fig. 6 is the another kind of preparation process schematic diagram of the inventive method.
Detailed description of the invention
As shown in Figure 6: the method that the present invention utilizes Electromagnetic Heating to optimize transparent conductive oxide film quality is: on flexible material substrate, first prepare TCO thin film (this prefabricated TCO film itself or backing material must conduct electricity)；The TCO thin film of preparation is placed in electromagnetic field to its heat (heat treatment process be be conducive to optimize TCO film atmosphere in carry out, such as oxygen, air, nitrogen, argon gas etc.), make it conduct electricity, light transmission gets a promotion, and obtains the transparent conductive oxide film optimizing.Wherein preparing transparent conductive oxide film on flexible material substrate is the mode using thermal evaporation, electron beam evaporation, vacuum sputtering, chemical gaseous phase deposition or spraying.Wave frequency used in the present invention is between 10Hz to 100GHz.Film preparation and heat treatment reel-to-reel technology.
Above-mentioned TCO thin film is one of following film:
The indium oxide of doping, the tin oxide of doping, the zinc oxide of doping, above-mentioned hopcalite, metal alloy or laminate film etc..
Above-described flexible material substrate is one of following:
Glass, stainless steel, macromolecular material such as PET, polyamide, Merlon, polyethylene etc., organic material etc..
Prefabricated membrane type of the presently claimed invention includes: purpose is for preparing TCO(transparent conductive oxide) all kinds of oxidation film of film and alloy firm.
The transparent conductive oxide film thickness of the present invention 10 nanometers to 3 microns between.
With embodiment, the present invention is described in further detail below in conjunction with the accompanying drawings:
Embodiment 1
Being deposited on ITO on PET composite material volume by the method for magnetron sputtering, prefabricated ito thin film is processed by device as shown in Figure 1, carries out according to following:
1. prepare ito thin film with magnetron sputtering apparatus, sputtering condition:
2.PET composite is rolled up, thickness: 0.125mm；Width: 150mm；Length: 300m.
3. electromagnetic wave generator: frequency: 13.56MHz, power 30 watts.
4. volume transmission speed is 1 meter per second, and ito thin film surface temperature reaches 230 DEG C (laser temperature-measuring measurement amounts).Volume transmission speed determines the temperature that ito thin film can reach, and final decision processes transmitance and the resistivity of rear film.
5. the result after processing
1) transmitance: before process, 86%, after process 93%；
2) resistivity: process front 1.9 × 10-4Ω cm, after process 1.9 × 10-4Ω·cm。
Embodiment 2
Being deposited on white glass substrate with e-beam evaporation by AZO, prefabricated AZO film is processed by device as shown in Figure 2, carries out according to following:
1. instrument ZZSX-500 electron beam evaporation equipment evaporation AZO film in section north in using, evaporation conditions:
2. white glass substrate, thickness: 0.9mm；Width: 100mm；Length: 100mm.
3. electromagnetic wave generator: frequency: 40KHz.Power 200 watts.
4. process the time: 20 seconds, AZO film surface temperature reached 315 DEG C (laser temperature-measuring measurement amounts).
5. the result after processing:
1) transmitance: process front 91%, after process 95%；
2) resistivity: process front 1.87 × 10-3Ω cm, after process 8.2 × 10-4Ω·cm。
Embodiment 3
Being deposited on ITO at the bottom of stainless steel lining with e-beam evaporation, prefabricated ito thin film is processed by device as shown in Figure 4.Carry out according to following:
1. instrument ZZSX-500 electron beam evaporation equipment evaporation ito film in section north in using, evaporation conditions:
2. at the bottom of stainless steel lining, thickness: 0.3mm；Width: 150mm；Length: 150mm.
3. electromagnetic wave generator: frequency: 40KHz；Power 360 watts.
4. process the time: 20 seconds, ito film surface temperature reached 273 DEG C (laser temperature-measuring measurement amounts).
5. the result after processing:
1) transmitance is greatly improved, and is about increased to 90% by 80%
2) resistivity: process front 4.9 × 10-4Ω cm, after process 3.7 × 10-4Ω·cm。
Embodiment 4
Being deposited on white glass substrate with e-beam evaporation by ITO, prefabricated ito thin film is processed in O2 atmosphere by device as shown in Figure 4.Carry out according to following:
1. instrument ZZSX-500 electron beam evaporation equipment evaporation ito film in section north in using, evaporation conditions:
2. white glass substrate, thickness: 0.9mm；Width: 100mm；Length: 100mm.
3. electromagnetic wave generator: frequency: 40KHz；Power 200 watts.
4. the process time: 20 seconds.
5. the result after processing:
1) transmitance: process front 78%, after process 91%；
2) resistivity: process front 5 × 10-4Ω cm, after process 3 × 10-4Ω·cm。
Embodiment 5
This electromagnetic heater is integrated in vacuum sputtering chamber, forms the production system of high-quality TCO film in a set of flexible substrate with vacuum sputter system, as shown in Figure 5.Pressing shown in figure, transmission system is arranged on each type flexible material volume on return idler 1, reaches, after sputtering requirement, to start active roller the 2nd, sputter equipment, electromagnetic heater until vacuum simultaneously.Active roller 2 drives whole transmission system to move；Deposition quality by parameter adjustment films such as the distances between sputtering power, sputtering pressure, sputtering target and flexible material volume；Heat treatment situation by parameter adjustment films such as the power of high frequency coil, frequencies；Transmission speed affects deposit thickness and the heating-up temperature of film.
Claims (6)
1. one kind utilizes the method that Electromagnetic Heating optimizes transparent conductive oxide film quality, it is characterised in that first prepare TCO thin film on flexible material substrate；The TCO thin film of preparation is placed in electromagnetic field and it is heated so that it is conduction, light transmission get a promotion, obtain the transparent conductive oxide film optimizing；Preparing transparent conductive oxide film on flexible material substrate is the mode using thermal evaporation, electron beam evaporation, vacuum sputtering, chemical gaseous phase deposition or spraying；Heat treatment process is to carry out in oxygen, air, nitrogen or argon gas；When heating, wave frequency is between 10Hz to 100GHz；When preparation TCO thin film and heat treatment, use reel-to-reel technology.
2. the method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality according to claim 1, it is characterized in that, described TCO thin film is the mixture of one or more of the zinc oxide of the indium oxide of doping, the tin oxide of doping and doping, alloy or laminate film.
3. the method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality according to claim 1, it is characterised in that described flexible material substrate is glass, macromolecular material, stainless steel foil or aluminium foil.
4. the method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality according to claim 1, it is characterised in that described flexible material substrate is organic material, and described organic material is PET, polyamide, Merlon or polyethylene.
5. the method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality according to claim 1, it is characterised in that prefabricated membrane type includes: for preparing all kinds of oxidation film and the alloy firm of TCO thin film.
6. according to claim 1 utilize Electromagnetic Heating optimize transparent conductive oxide film quality method, it is characterised in that obtain optimize transparent conductive oxide film thickness 10 nanometers to 3 microns between.
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| CN106048530A (en) * | 2016-07-20 | 2016-10-26 | 陕西师范大学 | Transparent conducting oxide (TCO) film and preparation method thereof |
| CN106683795A (en) * | 2017-03-02 | 2017-05-17 | 苏州维业达触控科技有限公司 | Coating method of transparent conducting film and device for forming hydrophobic and oleophobic substance |
| CN114242338B (en) * | 2021-12-16 | 2024-02-06 | 长春博信光电子有限公司 | Method for improving resistance value of ITO film |
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| CN101036236A (en) * | 2004-10-08 | 2007-09-12 | 仲夏股份公司 | Apparatus and method of manufacturing solar cells |
| CN102134691A (en) * | 2010-12-22 | 2011-07-27 | 中国兵器工业第五二研究所 | Cobalt-based amorphous giant magneto-impedance ribbon and preparation method thereof |
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| JP2000087219A (en) * | 1998-09-08 | 2000-03-28 | Mitsubishi Rayon Co Ltd | Forming method of transparent conductive film |
| KR101297084B1 (en) * | 2011-02-23 | 2013-08-19 | 한국전기연구원 | Transparent conductive film, device for manufacturing transparent conductive film, and method of manufacturing transparent conductive film |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101036236A (en) * | 2004-10-08 | 2007-09-12 | 仲夏股份公司 | Apparatus and method of manufacturing solar cells |
| CN102134691A (en) * | 2010-12-22 | 2011-07-27 | 中国兵器工业第五二研究所 | Cobalt-based amorphous giant magneto-impedance ribbon and preparation method thereof |
Non-Patent Citations (1)
| Title |
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| ITO薄膜的制备及通电电流对薄膜特性的影响;裴瑜;《中国优秀硕士学位论文全文数据库 工程科技I辑》;20111215(第S1期);第1-42页 * |
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