CN103809385A - Level angle adjusting mechanism and method for photomask structure of exposure machine - Google Patents
Level angle adjusting mechanism and method for photomask structure of exposure machine Download PDFInfo
- Publication number
- CN103809385A CN103809385A CN201210451840.0A CN201210451840A CN103809385A CN 103809385 A CN103809385 A CN 103809385A CN 201210451840 A CN201210451840 A CN 201210451840A CN 103809385 A CN103809385 A CN 103809385A
- Authority
- CN
- China
- Prior art keywords
- levels
- exposure machine
- guide groove
- photomask structure
- adjusting mechanism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention relates to a level angle adjusting mechanism and method for a photomask structure of an exposure machine. According to the level angle adjusting mechanism and method, the level angle of the photomask structure can be adjusted. The level angle adjusting mechanism comprises at least three horizontal driving parts, at least three horizontal driving sources, at least three vertical driven parts and at least three universal joints, wherein the horizontal driving parts are horizontally and movably arranged at the exposure machine and are provided with first oblique plane connecting units; the vertical driven parts are vertically and movably arranged at the exposure machine and are provided with second oblique plane connecting units movably connected with the first oblique plane connecting units; one sides of the universal joints are connected with the vertical driven parts, and the other sides of the universal joints are connected with the photomask structure; the horizontal driving parts are driven by the horizontal driving sources. Therefore, according to the level angle adjusting mechanism and the level angle adjusting method, the level angle of the photomask structure can be adjusted to be parallel to a counterpart.
Description
Technical field
The present invention relates to a kind of horizontal angle adjusting mechanism and method of exposure machine photomask structure, espespecially there is the first inclined-plane linkage unit and the second inclined-plane linkage unit of face-to-face flexible connection.
Background technology
The photomask structure of exposure machine is the primary structure of making board circuit, general photomask structure conventionally has plummer and is arranged at the light shield on plummer, in the time that exposure machine wish is made the circuit of various boards, first need shift out plummer to take off previous light shield from exposure machine, then more different light shields is arranged to plummer and plummer is retracted in exposure machine, to make different board circuits.But, the process of aforementioned replacing light shield but easily makes light shield produce error with the parallel degree of homologue, therefore, how to invent a kind of horizontal angle adjusting mechanism and method of exposure machine photomask structure, so that the level angle of its capable of regulating photomask structure so that light shield is parallel with homologue, will be that the present invention wants positive disclosed feature.
Summary of the invention
Because the shortcoming of above-mentioned known technology, it does not reach perfection inventor's thoughts, then exhausting the concentrated research of its intelligence overcomes, be engaged in this industry accumulating experience for many years with it, and then develop a kind of horizontal angle adjusting mechanism and method of exposure machine photomask structure, to the level angle that reaches capable of regulating photomask structure so that the light shield object parallel with homologue.
For reaching above-mentioned purpose, the first aspect of the present invention provides a kind of horizontal angle adjusting mechanism of exposure machine photomask structure, it comprises: at least three levels are to drive division, and its horizontal anomalous movement is arranged at this exposure machine, and these levels have respectively the first inclined-plane linkage unit to drive division; At least three levels are to drive source, and it is arranged at this exposure machine to drive respectively these levels to drive division; At least three vertically to operand, it is vertically movably set in this exposure machine, and these vertically have respectively the second inclined-plane linkage unit to be flexibly connected face-to-face with these the first inclined-plane linkage units respectively to operand; And at least three universal joints, it connects these vertically to operand with a side respectively, and connects this photomask structure with opposite side respectively.
Said mechanism more comprise at least three levels to pedestal, at least three vertically to pedestal or above both, it is arranged at this exposure machine, these levels to drive division respectively horizontal anomalous movement be arranged at these levels to pedestal, these are vertically vertically movably set in respectively these vertically to pedestal to drive division.
These levels of said mechanism have respectively a horizontal direction guiding rail to drive division, and this exposure machine has at least three levels to guide groove, and these horizontal direction guiding rails are movably set in respectively these levels to guide groove; Or these levels have respectively level to guide groove to drive division, this exposure machine has at least three horizontal direction guiding rails, and these horizontal direction guiding rails are movably set in respectively these levels to guide groove.
These levels of said mechanism have respectively horizontal direction guiding rail to drive division, and these levels have respectively level to guide groove to pedestal, and these horizontal direction guiding rails are movably set in respectively these levels to guide groove; Or these levels have respectively level to guide groove to drive division, these levels have respectively horizontal direction guiding rail to pedestal, and these horizontal direction guiding rails are movably set in respectively these levels to guide groove.
These levels of said mechanism are arranged at this exposure machine to drive source, and these levels have respectively driver element to drive source, and these levels have respectively passive unit to drive division, and these driver elements are connected with these passive units respectively.
These levels of said mechanism are arranged at this exposure machine or are arranged at respectively these levels to pedestal to drive source, these levels have respectively driver element to drive source, these levels have respectively passive unit to drive division, and these driver elements are connected with these passive units respectively.
These of said mechanism vertically have respectively vertical guide rails to operand, and this exposure machine has at least three vertically to guide groove, and these vertical guide rails are movably set in respectively these vertically to guide groove; Or these vertically have respectively vertically to guide groove to operand, this exposure machine has at least three vertical guide rails, and these vertical guide rails are movably set in respectively these vertically to guide groove.
These of said mechanism vertically have respectively vertical guide rails to operand, and these vertically have respectively vertically to guide groove to pedestal, and these vertical guide rails are movably set in respectively these vertically to guide groove; Or these vertically have respectively vertically to guide groove to operand, these vertically have respectively vertical guide rails to pedestal, and these vertical guide rails are movably set in respectively these vertically to guide groove.
These of said mechanism the first inclined-plane linkage unit has respectively an oblique guide rail, and these the second inclined-plane linkage units have respectively oblique guide groove, and these oblique guide rails are movably set in respectively these oblique guide grooves; Or these the first inclined-plane linkage units have respectively oblique guide groove, these the second inclined-plane linkage units have respectively oblique guide rail, and these oblique guide rails are movably set in respectively these oblique guide grooves.
The second aspect of the present invention provides a kind of level angle method of adjustment of exposure machine photomask structure, and it comprises the following step:
The horizontal angle adjusting mechanism of the exposure machine photomask structure as described in the first aspect is provided; And
Activate at least one level to drive source to adjust the level angle of this photomask structure.
Therefore, the level angle of the horizontal angle adjusting mechanism of exposure machine photomask structure of the present invention and method capable of regulating photomask structure is so that light shield is parallel with homologue.
Accompanying drawing explanation
Fig. 1 is the decomposing schematic representation of preferred embodiment of the present invention.
Fig. 2 is the combination schematic diagram of preferred embodiment of the present invention.
Fig. 3 is the schematic diagram one of preferred embodiment action of the present invention.
Fig. 4 is the schematic diagram two of preferred embodiment action of the present invention.
Fig. 5 is the schematic diagram three of preferred embodiment action of the present invention.
[primary clustering symbol description]
1 exposure machine
11 photomask structures
111 light shields
12 translation mechanisms
2 levels are to drive division
21 first inclined-plane linkage units
211 oblique guide rails
22 levels are to guide groove
23 passive units
3 levels are to drive source
31 driver elements
4 vertically to operand
41 second inclined-plane linkage units
411 oblique guide grooves
42 vertically to guide groove
5 universal joints
51 connecting links
511 spheroids
512 connect pole socket
52 bases
521 spherical grooves
6 levels are to pedestal
61 horizontal direction guiding rails
7 vertically to pedestal
71 vertical guide rails
Embodiment
For fully understanding object of the present invention, feature and effect, existing by following specific embodiment, and coordinate appended graphicly, and the present invention is described in detail, illustrate as rear:
Fig. 1 and Fig. 2 are respectively decomposing schematic representation and the combination schematic diagram of preferred embodiment of the present invention, as shown in the figure, the first aspect of the present invention is a kind of horizontal angle adjusting mechanism of exposure machine photomask structure, its comprise at least three levels to drive division 2, at least three levels to drive source 3, at least three vertically to operand 4 and at least three universal joints 5, in graphic, the quantity of each assembly is with three as illustration, and the quantity of each assembly can be also more than three according to actual demand.
These levels are arranged at the conplane diverse location of this exposure machine 1 to drive division 2 horizontal anomalous movements, as the conplane diverse location of the translation mechanism 12 of this exposure machine 1, these levels are arranged at other mechanisms of this exposure machine 1 to drive division 2 also visual actual demand, in the time that this exposure machine 1 has level to structure, these levels just can directly be arranged at the level of this exposure machine 1 to the diverse location of structure to drive division 2, in the time that this exposure machine 1 does not have level to structure, these levels just can be arranged at least three levels to pedestal 6 by first horizontal anomalous movement respectively to drive division 2, these levels are arranged at this exposure machine 1 again to pedestal 6, and these levels convert different shapes to the setting position of pedestal 6 visual reality, so that these levels can horizontal anomalous movement be arranged at the conplane diverse location of this exposure machine 1 to drive division 2, these levels have respectively the first inclined-plane linkage unit 21 to drive division 2.
These levels can be respectively electro-motor, automatically controlled pneumatic cylinder or controlled oil cylinder pressure to drive source 3 ... Deng and can be arranged at this exposure machine 1, or be arranged at respectively these levels to pedestal 6 to drive respectively these levels to drive division 2, these levels can be electrically connected to control module (not shown) to control the start of these levels to drive source 3 to drive source 3.
These are vertically vertically movably set in the diverse location of this exposure machine 1 to operand 4, as the diverse location of the translation mechanism 12 of this exposure machine 1, these vertically to operand 4 also visual actual demand be arranged at other mechanisms of this exposure machine 1, in the time that this exposure machine 1 has vertically to structure, these vertically just can directly be arranged at the vertical diverse location to structure of this exposure machine 1 to operand 4, in the time that this exposure machine 1 does not have vertically to structure, these vertically just can first vertically be movably set in respectively at least three vertically to pedestal 7 to operand 4, these are vertically arranged at this exposure machine 1 again to pedestal 7, and these vertically convert different shapes to the setting position of pedestal 7 visual reality, so that these vertically can vertically be movably set in the diverse location of this exposure machine 1 to operand 4, these vertically have respectively the second inclined-plane linkage unit 41 to be flexibly connected face-to-face with these the first inclined-plane linkage units 21 respectively to operand 4, in addition, these levels need reserved activity space to avoid these levels to be blocked in the time that drive division 2 moves horizontally to moving horizontally in direction of drive division 2, these vertically also need reserved activity space to avoid these to be vertically blocked in the time that operand 4 vertically moves on the vertical moving direction of operand 4, moreover, these levels vertically select one to be arranged at pedestal or to select both to be arranged at pedestal simultaneously to the visual actual demand of operand 4 to drive division 2 and these.
These universal joints 5 connect these vertically to operand 4 with a side respectively, and connect this photomask structure 11 with opposite side respectively, as shown in the figure, these universal joints 5 can have respectively connecting link 51 and base 52, these connecting links 51 have respectively spheroid 511, these bases 52 have respectively spherical groove 521, and this isosphere 511 is movably set in these spherical grooves 521.In addition, these bases 52 can be respectively vertically connected to operand 4 with these, and these connecting links 51 can be connected with this photomask structure 11, or these connecting links 51 can be respectively vertically connected to operand 4 with these, and these bases 52 can be connected with this photomask structure 11.Moreover these connecting links 51 can be connected in this photomask structure 11 or these are vertically to operand 4 by connecting pole socket 512 respectively.Moreover connecting link 51 of the present invention and base 52 are only an illustration, allly make that this photomask structure 11 and these are vertical all should belong to category of the present invention to the universal structure being connected of operand 4.
As shown in Figure 1, these above-mentioned levels have respectively a level to guide groove 22 to drive division 2, and these levels have respectively a horizontal direction guiding rail 61 to pedestal 6, and these horizontal direction guiding rails 61 are movably set in respectively these levels to guide groove 22; And also can phase double replacement changing these levels into guide groove 22 and these horizontal direction guiding rails 61, these levels there is respectively horizontal direction guiding rail 61 to drive division 2, these levels have respectively level to guide groove 22 to pedestal 6, and these horizontal direction guiding rails 61 are movably set in respectively these levels to guide groove 22.In addition, in the time that these levels are directly arranged at this exposure machine 1 to drive division 2, this exposure machine 1 also can arrange at least three horizontal direction guiding rails 61 or at least three levels to guide groove 22, so that these levels are to the level of drive division 2 to guide groove 22 or horizontal direction guiding rail 61 is movable arranges.Moreover horizontal direction guiding rail 61 of the present invention and level can be T shape or L shaped according to actual demand to the cross sectional shape of guide groove 22 ... Deng.Moreover level of the present invention is only an illustration to guide groove 22 and horizontal direction guiding rail 61, all structures that make these levels be arranged at this exposure machine 1 to drive division 2 horizontal anomalous movements all should belong to category of the present invention.
As shown in Figure 1, these above-mentioned levels are arranged at respectively these levels to pedestal 6 to drive source 3, these levels have respectively driver element 31 to drive source 3, and these levels have respectively a passive unit 23 to drive division 2, and these driver elements 31 are connected with these passive units 23 respectively.In addition, these levels also can directly be arranged at this exposure machine 1 to drive source 3.Moreover driver element 31 of the present invention and passive unit 23 can be spur gear engagement level and connect the connecting portion of level to drive division to tooth bar, wrom tooth wheel engagement level to the flexible cylinder of tooth bar (as shown in the figure), pneumatic cylinder (or oil hydraulic cylinder) ... Deng.Moreover driver element 31 of the present invention and passive unit 23 are only an illustration, all mechanisms of these levels to these levels of drive source 3 horizontal drive to drive division 2 that make all should belong to category of the present invention.
As shown in Figure 1, above-mentioned these vertically have respectively vertically to guide groove 42 to operand 4, and these vertically have respectively vertical guide rails 71 to pedestal 7, and these vertical guide rails 71 are movably set in respectively these vertically to guide groove 42; And these vertically also can phase double replacement change these into guide groove 42 and these vertical guide rails 71 and vertically have respectively a vertical guide rails 71 to operand 4, these vertically have respectively one vertically to guide groove 42 to pedestal 7, and these vertical guide rails 71 are movably set in respectively these vertically to guide groove 42.In addition, in the time that these are vertically directly arranged at this exposure machine 1 to operand 4, this exposure machine 1 can arrange at least three vertical guide rails 71 or at least three vertically to guide groove 42, so that these vertical vertically arranging to guide groove 42 or vertical guide rails 71 is movable to operand 4.Moreover, vertical guide rails 71 of the present invention and can be vertically T shape or L shaped according to actual demand to the cross sectional shape of guide groove 42 ... Deng.Moreover of the present invention is vertically only an illustration to guide groove 42 and vertical guide rails 71, all these structures that are vertically vertically movably set in this exposure machine 1 to operand 4 that make all should belong to category of the present invention.
As shown in Figure 1, above-mentioned these the first inclined-plane linkage unit 21 has respectively oblique guide rail 211, and these the second inclined-plane linkage units 41 have respectively oblique guide groove 411, and these oblique guide rails 211 are movably set in respectively these oblique guide grooves 411; And also can phase double replacement changing these the first inclined-plane linkage units 21 into, these oblique guide rails 211 and these oblique guide grooves 411 there is respectively oblique guide groove 411, these the second inclined-plane linkage units 41 have respectively oblique guide rail 211, and these oblique guide rails 211 are movably set in respectively these oblique guide grooves 411.In addition, the cross sectional shape of oblique guide rail 211 of the present invention and oblique guide groove 411 can be T shape or L shaped according to actual demand ... Deng.Moreover oblique guide groove 411 of the present invention and oblique guide rail 211 are only an illustration, all these the first inclined-plane linkage units 21 that make all should belong to category of the present invention with the structure that these the second inclined-plane linkage units 41 are flexibly connected face-to-face.
The level angle method of adjustment that the second aspect of the present invention is a kind of exposure machine photomask structure, it comprises the following step:
The horizontal angle adjusting mechanism of exposure machine photomask structure as above is provided; And
Activate at least one level to drive source 3 to adjust the level angle of this photomask structure 11.
Fig. 3 to Fig. 5 is respectively the schematic diagram one to three of preferred embodiment action of the present invention, as shown in the figure, the present embodiment is using one of them position of this horizontal angle adjusting mechanism as illustration, the manner of execution of these all the other positions of horizontal angle adjusting mechanism is also same, in addition, this horizontal angle adjusting mechanism can according to actual position of demand start, two positions, three positions or more than.
As shown in Figures 3 and 4, when certain position that the parallel sensor (not shown) of this exposure machine senses this photomask structure 11 need move down just can make the light shield 111 of this photomask structure 11 parallel with homologue (not shown) time, this control module (not shown) just can start this level to drive source 3, this level just can drive this level to move to left to drive division 2 by this driver element 31 (as wrom tooth wheel) and this passive unit 23 (if level is to tooth bar) to drive source 3, and can promoting this by the mutual slippage of this first inclined-plane linkage unit 21 and this second inclined-plane linkage unit 41 to drive division 2, this level vertically moves down to operand 4, this photomask structure 11 just can change level angle downwards by the cooperation of the connecting link of this universal joint 5 51 and base 52, and then make this light shield 111 parallel with homologue.
As shown in Fig. 3 and Fig. 5, when certain position that the parallel sensor (not shown) of this exposure machine senses this photomask structure 11 needs to move just can make the light shield 111 of this photomask structure 11 parallel with homologue (not shown) time, this control module (not shown) just can start this level to drive source 3, this level just can drive this level to move to right to drive division 2 by this driver element 31 (as wrom tooth wheel) and this passive unit 23 (if level is to tooth bar) to drive source 3, and this level can drive this vertically to move on operand 4 by the mutual slippage of this first inclined-plane linkage unit 21 and this second inclined-plane linkage unit 41 to drive division 2, this photomask structure 11 just can upwards change level angle by the cooperation of the connecting link of this universal joint 5 51 and base 52, and then make this light shield 111 parallel with homologue.
As mentioned above, the present invention by these levels the first inclined-plane linkage unit 21 to drive source 3, these levels to drive division 2, these are vertically to the second inclined-plane linkage unit 41 of operand 4 and these universal joints 5 and make this photomask structure 11 capable of regulating level angles, and then make the light shield 111 of this photomask structure 11 can be parallel with homologue.
The present invention is open with preferred embodiment hereinbefore, so has the knack of and those skilled in the art will appreciate that this embodiment is only for describing the present invention, and should not be read as and limit the scope of the invention.It should be noted, variation and the displacement of all and this embodiment equivalence, all should be made as and be covered by category of the present invention.Therefore, protection scope of the present invention when with claim below the person of being defined be as the criterion.
Claims (10)
1. a horizontal angle adjusting mechanism for exposure machine photomask structure, is characterized in that, it comprises:
At least three levels are to drive division, and its horizontal anomalous movement is arranged at this exposure machine, and these levels have respectively the first inclined-plane linkage unit to drive division;
At least three levels are to drive source, and it is arranged at this exposure machine to drive respectively these levels to drive division;
At least three vertically to operand, it is vertically movably set in this exposure machine, and these vertically have respectively the second inclined-plane linkage unit to be flexibly connected face-to-face with these the first inclined-plane linkage units respectively to operand; And
At least three universal joints, it connects these vertically to operand with a side respectively, and connects this photomask structure with opposite side respectively.
2. the horizontal angle adjusting mechanism of exposure machine photomask structure as claimed in claim 1, it is characterized in that, also comprise at least three levels to pedestal, at least three vertically to pedestal or above both, it is arranged at this exposure machine, these levels to drive division respectively horizontal anomalous movement be arranged at these levels to pedestal, these are vertically vertically movably set in respectively these vertically to pedestal to drive division.
3. the horizontal angle adjusting mechanism of exposure machine photomask structure as claimed in claim 1, it is characterized in that, these levels have respectively horizontal direction guiding rail to drive division, and this exposure machine has at least three levels to guide groove, and these horizontal direction guiding rails are movably set in respectively these levels to guide groove; Or these levels have respectively level to guide groove to drive division, this exposure machine has at least three horizontal direction guiding rails, and these horizontal direction guiding rails are movably set in respectively these levels to guide groove.
4. the horizontal angle adjusting mechanism of exposure machine photomask structure as claimed in claim 2, it is characterized in that, these levels have respectively horizontal direction guiding rail to drive division, and these levels have respectively level to guide groove to pedestal, and these horizontal direction guiding rails are movably set in respectively these levels to guide groove; Or these levels have respectively level to guide groove to drive division, these levels have respectively a horizontal direction guiding rail to pedestal, and these horizontal direction guiding rails are movably set in respectively these levels to guide groove.
5. the horizontal angle adjusting mechanism of exposure machine photomask structure as claimed in claim 1, it is characterized in that, these levels are arranged at this exposure machine to drive source, these levels have respectively a driver element to drive source, these levels have respectively passive unit to drive division, and these driver elements are connected with these passive units respectively.
6. the horizontal angle adjusting mechanism of exposure machine photomask structure as claimed in claim 2, it is characterized in that, these levels are arranged at this exposure machine or are arranged at respectively these levels to pedestal to drive source, these levels have respectively driver element to drive source, these levels have respectively a passive unit to drive division, and these driver elements are connected with these passive units respectively.
7. the horizontal angle adjusting mechanism of exposure machine photomask structure as claimed in claim 1, it is characterized in that, these vertically have respectively vertical guide rails to operand, and this exposure machine has at least three vertically to guide groove, and these vertical guide rails are movably set in respectively these vertically to guide groove; Or these vertically have respectively vertically to guide groove to operand, this exposure machine has at least three vertical guide rails, and these vertical guide rails are movably set in respectively these vertically to guide groove.
8. the horizontal angle adjusting mechanism of exposure machine photomask structure as claimed in claim 2, it is characterized in that, these vertically have respectively vertical guide rails to operand, and these vertically have respectively one vertically to guide groove to pedestal, and these vertical guide rails are movably set in respectively these vertically to guide groove; Or these vertically have respectively vertically to guide groove to operand, these vertically have respectively vertical guide rails to pedestal, and these vertical guide rails are movably set in respectively these vertically to guide groove.
9. the horizontal angle adjusting mechanism of exposure machine photomask structure as claimed in claim 1, it is characterized in that, these the first inclined-plane linkage units have respectively oblique guide rail, and these the second inclined-plane linkage units have respectively oblique guide groove, and these oblique guide rails are movably set in respectively these oblique guide grooves; Or these the first inclined-plane linkage units have respectively oblique guide groove, these the second inclined-plane linkage units have respectively oblique guide rail, and these oblique guide rails are movably set in respectively these oblique guide grooves.
10. a level angle method of adjustment for exposure machine photomask structure, is characterized in that it comprises the following step:
The horizontal angle adjusting mechanism of exposure machine photomask structure is as claimed in any one of claims 1-9 wherein provided; And
Activate at least one level to drive source to adjust the level angle of this photomask structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210451840.0A CN103809385A (en) | 2012-11-12 | 2012-11-12 | Level angle adjusting mechanism and method for photomask structure of exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210451840.0A CN103809385A (en) | 2012-11-12 | 2012-11-12 | Level angle adjusting mechanism and method for photomask structure of exposure machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103809385A true CN103809385A (en) | 2014-05-21 |
Family
ID=50706364
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210451840.0A Pending CN103809385A (en) | 2012-11-12 | 2012-11-12 | Level angle adjusting mechanism and method for photomask structure of exposure machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103809385A (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2919303Y (en) * | 2006-06-02 | 2007-07-04 | 广辉电子股份有限公司 | Baseplate supporting structure of photo exposing machine |
| CN201217034Y (en) * | 2008-06-19 | 2009-04-08 | 天津理工大学 | Side-punch die frame |
| WO2010017892A1 (en) * | 2008-08-14 | 2010-02-18 | Asml Netherlands B.V. | Radiation source, lithographic apparatus and device manufacturing method |
| CN101713931A (en) * | 2008-10-03 | 2010-05-26 | 株式会社日立高新技术 | An exposure device for display panel, exposure method and assembling or adjusting method of the display panel exposure device |
| CN102132216A (en) * | 2009-11-09 | 2011-07-20 | 日本精工株式会社 | Mask holding mechanism |
| CN202306139U (en) * | 2011-09-28 | 2012-07-04 | 浙江大学 | 3-PSR-V parallel connection mechanism for regulating immersion unit |
| CN202904220U (en) * | 2012-11-12 | 2013-04-24 | 川宝科技股份有限公司 | Horizontal angle adjusting mechanism for photomask structure of exposure machine |
-
2012
- 2012-11-12 CN CN201210451840.0A patent/CN103809385A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2919303Y (en) * | 2006-06-02 | 2007-07-04 | 广辉电子股份有限公司 | Baseplate supporting structure of photo exposing machine |
| CN201217034Y (en) * | 2008-06-19 | 2009-04-08 | 天津理工大学 | Side-punch die frame |
| WO2010017892A1 (en) * | 2008-08-14 | 2010-02-18 | Asml Netherlands B.V. | Radiation source, lithographic apparatus and device manufacturing method |
| CN101713931A (en) * | 2008-10-03 | 2010-05-26 | 株式会社日立高新技术 | An exposure device for display panel, exposure method and assembling or adjusting method of the display panel exposure device |
| CN102132216A (en) * | 2009-11-09 | 2011-07-20 | 日本精工株式会社 | Mask holding mechanism |
| CN202306139U (en) * | 2011-09-28 | 2012-07-04 | 浙江大学 | 3-PSR-V parallel connection mechanism for regulating immersion unit |
| CN202904220U (en) * | 2012-11-12 | 2013-04-24 | 川宝科技股份有限公司 | Horizontal angle adjusting mechanism for photomask structure of exposure machine |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN202904220U (en) | Horizontal angle adjusting mechanism for photomask structure of exposure machine | |
| CN204066595U (en) | For the resource platform of industrial robot installation and debugging course teaching | |
| CN204690270U (en) | Double lead-screw Synchronous Transmission zero-waiting full-automatic single-head Sewing machines | |
| CN202762799U (en) | Automatic punching machine guided by machine vision | |
| CN103809385A (en) | Level angle adjusting mechanism and method for photomask structure of exposure machine | |
| CN103911744B (en) | A kind of 3 D stereo braiding apparatus | |
| CN103753235B (en) | A kind of multi-axis linkages based on parallel module | |
| CN204603575U (en) | Automatic laser cutting mechanism | |
| CN102686037A (en) | Double-head light-emitting diode (LED) lamp strip chip mounter | |
| CN202219376U (en) | Sight glass laser cutting bed | |
| CN201807826U (en) | Numerical control plasma six-axis and five-linkage groove cutting machine | |
| CN103337225A (en) | Lamp bar angle adjustment device and LED display screen applying adjustment device | |
| CN204290838U (en) | A kind of adjustable connecting-rod formula solar energy tracking support | |
| CN204747141U (en) | Combined type numerical control bender | |
| CN205020598U (en) | Multi -functional crane span structure make -up machine | |
| CN202211942U (en) | Leaf for grating of radiotherapy equipment | |
| CN202669341U (en) | Desktop computerized numerical control (CNC) carving machine | |
| CN205302681U (en) | Economic management drawing device | |
| CN105391904A (en) | Scanner with wide scanning range | |
| CN205311090U (en) | Automatic positioning mechanism of laser marking machine | |
| CN203931411U (en) | A kind of outdoor billboard | |
| CN209859343U (en) | Process simulation device with display capable of automatically lifting | |
| CN209125116U (en) | A kind of automatic continuous laser marking machine of thermal cut-off | |
| CN105206168A (en) | Teaching simulant elevator training device | |
| CN102337641A (en) | Special type pattern machine for sewing in large area |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140521 |