CN103744271B - A kind of laser direct writing system and photoetching method - Google Patents
A kind of laser direct writing system and photoetching method Download PDFInfo
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- CN103744271B CN103744271B CN201410042111.9A CN201410042111A CN103744271B CN 103744271 B CN103744271 B CN 103744271B CN 201410042111 A CN201410042111 A CN 201410042111A CN 103744271 B CN103744271 B CN 103744271B
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Abstract
A kind of laser direct writing system and photoetching method, comprise focometry system and exposure system, described focometry system adopts after the mode of off-line measures the three-dimensional appearance information of whole body surface to be etched, described three-dimensional appearance convert information is focusing information and sends to described exposure system, described exposure system is according to described focusing information, carrying out in photoetching process to described body surface to be etched, the concavo-convex degree of focusing to be applicable to described body surface to be etched, makes exposure station focus on the surface of described photoetching object all the time.
Description
Technical field
Patent of the present invention relates to laser lithography field, especially a kind of laser direct writing system and method with three-dimensional navigation focusing function, can be used for accurate mask manufacture, mems device makes, semiconductor mask-free photolithography, the fields such as large format micro-nano graph manufacture.
Background technology
Laser direct-write photoetching technology belongs to a kind of emerging without mask micro-nano processing method.Be widely used in mask manufacture, semiconductor devices makes and micro-nano graph makes field.The substrate of laser direct-writing processing may be relatively smooth wafer, mask plate, and the Sapphire Substrate that also likely flatness is poor or even surface scribble the yielding material of photoresist such as: organic glass etc.
Existing laser direct writing system generally has focus controlling module.Such as: Chinese patent application CN102385261A announces the coaxial focusing mechanism of a kind of litho machine and focusing method, Chinese patent CN101477306B refer to a kind of laser direct writing system utilizing 4 quadrant detector to detect as focal length.Chinese patent CN101846890B announces a kind of parallel light etching system.The focusing detecting method that said apparatus and system are announced is different, but in the control method of focal length, all have employed on-line real time monitoring focusing mode.This mode low speed inscribe and substrate self to compare the control of focusing under flat conditions no problem, but inscription speed promoted, upwards, focus controlling just occurs obvious delayed Platform movement speed 100mm/s, the poor robustness of system.
Analyze its reason mainly to there is some problem following and be difficult to overcome:
1. in position from defocus method, relate to ccd image gather and analysis, normal CCD transmission frame number is less than 100 frames, and after inscription speed gets on, sample frequency does not reach, and causes the sampled data for analyzing inadequate.
2. although adopt hypervelocity camera, but need the electric signal converting thereof into actuating motor after acquisition image information, this link relates to image recognition processing and servosignal is changed, and postpones if having time, causes focus controlling delayed.
3. adopt quadrant detector as position from defocus device, but its detection stroke is limited, and some substrates exist buckling deformation, a bit move quickly in addition a bit from substrate, if the focal length before both differs by more than measurement range, be easy to cause focusing axle to run and fly phenomenon.
In addition, need on-line real time monitoring to require also corresponding raising to process data to hardware configuration, cause equipment cost to rise.
Summary of the invention
In view of this, the object of the present invention is to provide a kind of laser direct writing method and the system with navigation focusing function.Solve the needs that existing laser direct writing system focus controlling cannot meet high speed inscription, the overall performance of improving laser straight-writing system.
A kind of laser direct writing system that object according to the present invention proposes, comprise focometry system and exposure system, described focometry system adopts after the mode of off-line measures the three-dimensional appearance information of whole body surface to be etched, described three-dimensional appearance convert information is focusing information and sends to described exposure system, described exposure system is according to described focusing information, carrying out in photoetching process to described body surface to be etched, the concavo-convex degree of focusing to be applicable to described body surface to be etched, makes exposure station focus on the surface of described photoetching object all the time.
Preferably, described focusing information is the horizontal coordinate X of body surface each point, the corresponding relation between Y value and the defocusing amount △ Z of this point.
Preferably, the described focometry system integration is in described exposure system, and this focometry system and described exposure system at least share same object lens and same objective table, described objective table are placed described object to be etched.
Preferably, described laser direct writing system also comprise control object lens move up and down the first drive motor, drive described object lens and described objective table to do the second drive motor of relative level movement, and central controller, by moving up and down of described object lens and moving horizontally of relative objective table, described focometry system completes the measuring three-dimensional morphology to whole body surface to be etched, and calculates the described focusing information of acquisition by described central controller.
Preferably, described focometry system also comprises the first light source, optical path, astigmatism optical device and the first ccd sensor, the incident light that described first light source sends is through optical path, from objective lens entrance to body surface to be etched, the reflected light that described body surface to be etched sends then enters optical path from object lens, astigmatism optical device and the first ccd sensor, during measurement, the incident light that described first light source sends forms a hot spot at body surface to be etched, described first ccd sensor is according to this spot size, the focal length of real-time adjustment object lens, and object lens and body surface to be etched do relative level move time, some selected measurement points obtain the focusing information of these points.
Preferably, described exposure system also comprises secondary light source, pattern generator and exposure light path, and the incident light that described secondary light source sends, through pattern generator, exposure light path, forms exposure figure from objective lens entrance to body surface to be etched.
Preferably, described laser direct writing system also comprises one and to focus online backup system.
Preferably, described focometry system and each self-separation of described exposure system are arranged, this focometry system and described exposure system comprise object lens and an objective table separately, the object lens that wherein focometry system is corresponding and objective table are for measuring object lens and measuring objective table, the object lens that exposure system is corresponding and objective table are exposure object lens and exposure objective table, and described measurement objective table and exposure objective table are all in order to place object to be etched.
Preferably, described focometry system also comprises the first drive motor that control survey object lens move up and down, drives described measurement object lens and described measurement objective table to do the second drive motor of relative level movement, and central controller, by moving up and down of described measurement object lens and moving horizontally of relative measurement objective table, described focometry system completes the measuring three-dimensional morphology to whole body surface to be etched, and calculates the described focusing information of acquisition by described central controller.
Preferably, described focometry system also comprises the first light source, optical path, astigmatism optical device and the first ccd sensor, the incident light that described first light source sends is through optical path, from measurement objective lens entrance to body surface to be etched, the reflected light that described body surface to be etched sends then enters optical path from measurement object lens, astigmatism optical device and the first ccd sensor, during measurement, the incident light that described first light source sends forms a hot spot at body surface to be etched, described first ccd sensor is according to this spot size, the focal length of object lens is measured in real-time adjustment, and measure object lens and body surface to be etched do relative level move time, some selected measurement points obtain the focusing information of these points.
Preferably, described exposure system also comprise control exposure object lens move up and down the 3rd drive motor, drive described exposure object lens and described exposure objective table to make the four-wheel drive motor of relative level movement, and central controller, by moving up and down of described exposure object lens and moving horizontally of relative exposure objective table, described exposure system completes the photoetching to object to be etched.
Preferably, described exposure system also comprises secondary light source, pattern generator and exposure light path, and the incident light that described secondary light source sends, through pattern generator, exposure light path, forms exposure figure from exposure objective lens entrance to described body surface to be etched.
Meanwhile, the invention allows for a kind of photoetching method, this photolithographicallpatterned uses laser direct writing system as above, comprises focometry stage and photolithographic stage,
The described focometry stage comprises step:
1) standard light spot size Df and the standard objective focal length Zf at body surface reference point place is obtained;
2) according to the size of body surface breadth to be etched, the sampled measurements point of suitable quantity is selected;
3) start to measure, driven between object lens and objective table by the second drive motor and relatively move, when object lens move to each sampled measurements point, mobile Z axis, object lens are driven to move up and down the Df size making light spot lock-in arrive step 1), record the grating scale reading Zi of now focus adjusting mechanism and corresponding XY position coordinates Xi, Yi afterwards;
4) data acquisition that step 3) completes all sampled points is repeated;
5) all data in step 4) are processed, the focusing information needed for generation,
In described photolithographic stage, utilize above-mentioned focusing information, realize the focus controlling of object lens in exposure process.
Preferably, described step 1) can adopt manual adjustment mode or automatic shaping modes to carry out.
Preferably, in described step 5), the process of data is referred to that data Zi and the Zf of collection point does difference, obtains three-dimensional defocusing amount △ Z, then set up the servo algorithm of △ Z and each measurement point horizontal coordinate XY position: △ Z=f (x, y).
Preferably, in described photolithographic stage, described online focusing backup system can also be utilized, complete the online auxiliary focusing in exposure process.
Preferably, described online auxiliary focusing comprises: after exposure starts, and profit utilizes described first ccd sensor to detect the size variation of hot spot, analyze data, real-time calculating out of focus adjustment amount △ Ze, sets up new servo algorithm △ Z '=f (x, y)+△ Ze.
Compared with prior art, laser direct writing system of the present invention and photoetching method have following advantage:
Focusing speed is fast.Due to the method adopting offline inspection to combine with on-line checkingi, off-line Shape measure eliminates large focusing departure by hardware servo algorithm, on-line real-time measuremen is for eliminating little out of focus deviation, very little by the institutional adjustment amount of real-time processing controls, therefore system focusing fast response time.
System robustness is strong.Three-dimensional appearance data are obtained in advance because off-line focal length detects, therefore by finding in advance three-dimensional appearance Data Analysis Services to eliminate the detection abnormity point on substrate, and concerning only adopting the focus effect detecting in real time and directly may will have influence on abnormity point position focusing system, even occur that race flies phenomenon.
System overhead is little, lower than detecting focusing system in real time to hardware requirement.Large focusing deviation is obtained by measuring three-dimensional morphology in early stage and is controlled by hardware servo algorithm, and the focal length drift that little deviation adjusting elimination long-play system is just done in later stage on-line checkingi focusing reduces requirement of real-time.
The method, in conjunction with ultraviolet pulse light source (time shutter 10-100 nanosecond), can realize the high-quality graphics exposure under motion state, and can not make the quality deterioration of figure photoetching, can support meter level movement velocity.This pattern and current acoustooptic modulation technology, continuous light source stepping exposure mode make a marked difference, and efficiency improves greatly.
Accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is the module diagram of the laser direct-write photoetching system of first embodiment of the invention.
Fig. 2 is the driving device structure schematic diagram of object lens part in Fig. 1
Fig. 3 is the geometry analysis diagram of body surface to be etched.
Fig. 4 is the module diagram of the laser direct-write photoetching system of second embodiment of the invention.
Embodiment
As described in the background art, in existing laser direct-write photoetching technology, owing to adopting the mode of online focusing, easily be limited to the processing power of instrument and equipment, in some are inscribed at a high speed, occur that image acquisition pixel is inadequate, response lag and focusing axle run problems such as flying, make existing laser direct-write photoetching technology cannot carry out high speed on the substrate of some rough surfaces and inscribe.
Therefore, the present invention proposes a kind of new laser direct-write photoetching technology, its total mentality of designing is the three-dimensional appearance information first obtaining whole body surface to be etched, then this three-dimensional information is converted into the focusing information that can be exposed light path identification, so, exposure system, when exposing body surface to be etched, only need can complete Correct exposure to each point of body surface to be etched according to above-mentioned focusing information.Figure is obtained and completes in two steps with focusing point, can avoid producing the problems such as response lag in online focussing process.According to above-mentioned mentality of designing, the concrete laser direct-write photoetching system of the present invention comprises focometry system and exposure system, described focometry system adopts after the mode of off-line measures the three-dimensional appearance information of whole body surface to be etched, described three-dimensional appearance convert information is focusing information and sends to described exposure system, described exposure system is according to described focusing information, carrying out in photoetching process to described body surface to be etched, the concavo-convex degree of focusing to be applicable to described body surface to be etched, makes exposure station focus on the surface of described photoetching object all the time.
Below, will be described laser direct-write photoetching technology of the present invention by specific embodiment.
Refer to Fig. 1, Fig. 1 is the module diagram of the laser direct-write photoetching system of first embodiment of the invention.As shown in the figure, in the present embodiment, take mode focometry system and exposure system integrated, namely on a board equipment, have focometry system 10 and exposure system 20 concurrently simultaneously.This embodiment, its advantage is off-line measurement and the exposure work afterwards that can complete body surface information on a station, saves the space shared by equipment, and the cost of whole production line.Its shortcoming is that must carry out first off-line measurement according to every a slice substrate, the operation of post-exposure is carried out, and efficiency does not reach optimization in batch becomes to produce.
Continue referring to Fig. 1, in this laser direct-write photoetching system, focometry system 10 is integrated in exposure system 20, now, the section components of this focometry system 10 and exposure system 20 are shared, and such as two systems in the example shown share object lens 111 and objective table 30 etc.
Particularly, focometry system 10 comprises the first light source 101, optical path 110, astigmatism optical device 120 and the first ccd sensor 121.Wherein the first light source 101 is preferably LASER Light Source, such as the infrared semiconductor laser of 650nm wavelength.Optical path 110 is used for the light that the first light source 101 sends to be delivered to the surface of object to be etched, forms a hot spot.This hot spot can be fed back in the first ccd sensor 121 by astigmatism device 120 by this optical path simultaneously.In order to realize this function, this optical path 110 at least comprises two pieces of half-reflecting half mirrors 112 and 113, the light that first piece of half-reflecting half mirror 112 is used for the first light source 101 to send toward the reflection of object lens 111 direction, simultaneously again by the light that feeds back from object toward the first ccd sensor 121 direction transmission; Second piece of half-reflecting half mirror 113 to guide in object lens 111 except the light sent by the first light source 101 and the light of being returned by reflections off objects guides to except the first ccd sensor 121, in this embodiment, this second half-reflecting half mirror 113 is also taken into account simultaneously and is guided the light in exposure system 20.During measurement, the incident light that this first light source 101 sends is through optical path 110, body surface to be etched is incided from object lens 111, the reflected light that described body surface to be etched sends then enters optical path 110 from object lens 111, astigmatism optical device 120 and the first ccd sensor 121, the incident light that described first light source sends forms a hot spot at body surface to be etched, described first ccd sensor is according to this spot size, the focal length of real-time adjustment object lens, and object lens and body surface to be etched do relative level move time, some selected measurement points obtain the focusing information of these points.
Exposure system 20 comprises secondary light source 201, pattern generator 202 and exposure light path 210, this secondary light source 201 can be LASER Light Source or mercury lamp light source, be preferably laser pulse light source, this pattern generator 202 adopts DMD spatial light modulator, the figure produced in this pattern generator 202, after the convergent-divergent of follow-up exposure light path 210, forms exposure figure at body surface to be etched.Exposure light path 210 adopts the micro imaging system of double telecentric structure, in this exposure light path 210, at least comprise a half-reflecting half mirror (half-reflecting half mirror 113 in namely illustrating) shared with above-mentioned optical path 110, and some light in order to be sent by secondary light source 201 is directed into the optical mirror slip of object lens 111.Between secondary light source 201 and pattern generator 202, the optical mirror slip that some are used for collimating and/or expanding can also be set.The incident light that this secondary light source 201 sends, through pattern generator 202, exposure light path 210, incides body surface to be etched from object lens 111 and forms exposure figure.
It is pointed out that object lens 111 are as optical mirror slip or optical mirror slip group, namely can be used as a part for optical path 110, also can as a part for exposure light path 210.In addition, each light path in diagram, although depict the optical mirror slip of each position, but in actual applications, corresponding light channel structure can do some adjustment accordingly or replace, as long as the conduct direction that can ensure light roughly as described herein, do not do exhaustive to light path feasible arbitrarily herein.
Except above-mentioned optical module, laser direct writing system of the present invention is also provided with the mechanical component controlling the motion of these optical modules and the electric assembly (not shown) of these mechanical components being carried out to order control.Particularly, this laser direct writing system comprise control object lens and move up and down the first drive motor, drive described object lens and described objective table to do the second drive motor of relative level movement, and control the central controller that all parts carry out work.
Object lens are arranged on this first drive motor, as shown in Figure 2.The motor that this first drive motor adopts high precision corresponding speed fast, such as voice coil motor etc.This first drive motor also arranges grating scale simultaneously, the coordinate of object lens at Z axis can be read by grating scale like this, namely reflect the focusing situation of object lens.Under the cooperation of the first drive motor and the second drive motor, by moving up and down of described object lens and moving horizontally of relative objective table, described focometry system completes the measuring three-dimensional morphology to whole body surface to be etched, and calculates the described focusing information of acquisition by described central controller.
To in the control of exposure figure, drive object lens to move up and down by this first drive motor, realize the adjustment of exposure light path focal length, reach the effect of optimum exposure.
When using above-mentioned laser direct writing system to carry out photoetching operation, first object to be etched is fixed to objective table, consider pinpoint problem, can some aligning structure be set on objective table, the alignment mark that such as can coordinate with object edge to be etched, or the limiting component etc. that can design for contour of object to be etched.Object lens are corresponded to the reference position of body surface to be etched by each drive motor initialization.Then enter the focometry stage, utilize the three-dimensional appearance of focometry system to body surface to test, obtain object surface three-dimensional morphology data, and be converted into corresponding focusing information.It is as follows that this focometry stage specifically comprises step:
1) standard light spot size and the standard objective focal length at body surface reference point place is obtained.This step can adopt manual adjustment mode or automatic shaping modes to carry out.If manual adjustment mode, the image of coming is fed back by eye-observation object lens, now, need increase by can take the second ccd sensor of object lens feedback image, second ccd sensor 220 as illustrated in the drawing, this the second ccd sensor 220 exposure system can share exposure light path, now can by increasing by one piece of half-reflecting half mirror 213 and some suitable optical mirror slips in exposure light path, the exposure figure formed by body surface to be etched enters exposure light path 210 from object lens 111, and enter optical mirror slip from half-reflecting half mirror 213, finally enter described second ccd sensor 220.Human eye is by observing the image in this second ccd sensor 220, the most clearly time (namely under focusing state), open the first light source, first ccd sensor is utilized by the hot spot now projecting body surface to be etched to carry out measuring and record, spot diameter is recorded as Df, and record object lens are herein at the Z axis coordinate Zf of vertical direction, this Zf can regard as the objective focal length of standard.If automatic shaping modes, then need dependence third-party image processing software, utilize this image processing software to obtain from the image in the first ccd sensor (also can be the second above-mentioned ccd sensor), and when setting size when a CCD spot size equals first prefocusing or the 2nd CCD figure the most clearly time notice focometry system log (SYSLOG) under spot size Df now and objective focal length Zf.This reference point can be selected from the relatively high point of body surface flatness, and the starting point also can directly selecting object lens corresponding is as a reference point.
2) according to the size of body surface breadth to be etched, the sampled measurements point of suitable quantity is selected.Because whole focometry process need considers the problem of overall efficiency, the rule be therefore generally directly proportional to breadth size according to the quantity of measurement point is selected.But also can according to the height of body surface flatness to be etched, or photoetching process increases the requirement of measuring accuracy or reduces measurement point.It should be noted that these measurement points must cover the surface of whole object to be etched, and preferably can keep homogeneity between points.
3) start to measure, driven between object lens and objective table by the second drive motor and relatively move, when object lens move to each sampled measurements point, mobile Z axis is as Fig. 2, object lens are driven to move up and down the Df size making light spot lock-in arrive step 1), record the grating scale reading Zi of now focus adjusting mechanism and corresponding XY position coordinates Xi, Yi afterwards, wherein i represents i-th point.
4) data acquisition that step 3) completes all sampled points is repeated.
5) all data in step 4) are processed, the focusing information needed for generation.Here process refers to first does difference by data Zi and the Zf of each collection point, obtains three-dimensional defocusing amount △ Z, then sets up the servo algorithm of △ Z and each measurement point horizontal coordinate XY position: △ Z=f (x, y), schematic diagram is as Fig. 3.And namely so-called focusing information refer to the horizontal coordinate X of body surface each point, the relation between Y value and the defocusing amount △ Z of this point.
In each step above-mentioned, all measurements and calculations to data all rely on central controller and carry out.And central controller is after obtaining final focusing information, set up the focusing control program to exposure system according to this focusing information.
After completing above work, enter photolithographic stage, utilize above-mentioned focusing information, realize the focus controlling of object lens in exposure process.Particularly, the XY position that central controller can move to according to current object to be etched exports corresponding Z axis amount of movement, and the numerical value of this amount of movement equals the size of the defocusing amount △ Z of corresponding XY point.
Further, in this embodiment, using focometry system simultaneously as backup system of focusing online, the online auxiliary focusing in exposure process can be completed.Particularly, after exposure starts, this first ccd sensor 121 starts the size variation detecting hot spot, analyzes data, calculates out of focus adjustment amount △ Ze in real time, sets up new servo algorithm △ Z '=f (x, y)+△ Ze.
In addition, the online focal length auxiliary adjustment that this backup system of focusing online can also use other technology existing to realize in exposure process, such as Astigmatism methord, knife-edge method, critical angle prism method or quadrant detector mensuration.
Except the laser direct writing system in embodiment one, present invention also offers the second embodiment.Refer to Fig. 4, Fig. 4 is the laser direct writing system structural representation under second embodiment of the invention.As shown in the figure, in this second embodiment, described focometry system and each self-separation of described exposure system, the benefit arranged like this is can in batch production, the measurement of photoetching and focal length can be carried out simultaneously to the object to be etched of different batches, improve production efficiency.Simultaneously shortcoming needs two complete equipments, adds cost.
Particularly, this focometry system 10 ' comprises object lens and an objective table separately with exposure system 20 ', the object lens that wherein focometry system 10 ' is corresponding and objective table are for measuring object lens 111 ' and measuring objective table 30 ', the object lens that exposure system 20 ' is corresponding and objective table are exposure object lens 211 and exposure objective table 30 ", described measurement objective table 30 ' and exposure objective table 30 " all in order to place object to be etched, and, this measurement objective table 30 ' and exposure objective table 30 " preferably there is identical specification and size, so, the reference position of focometry and exposure process can be made to have the effect of exactitude position.
Identical with the first embodiment, this focometry system 10 ' also comprises the first light source 101 ', optical path 110 ', astigmatism optical device 120 ' and the first ccd sensor 121 '.The incident light that this first light source 101 ' sends is through optical path 110 ', body surface to be etched is incided from object lens 111 ', the reflected light that described body surface to be etched sends then enters optical path 110 ' from object lens 111 ', astigmatism optical device 120 ' and the first ccd sensor 121 ', the incident light that described first light source sends forms a hot spot at body surface to be etched, described first ccd sensor is according to this spot size, the focal length of real-time adjustment object lens, and object lens and body surface to be etched do relative level move time, some selected measurement points obtain the focusing information of these points.
Relative to the first embodiment, in this second embodiment, optical path 110 ' only needs the distribution considered incident light and reflected light two-way light beam, therefore can save the setting of optical mirror slip in light path, as shown in FIG., can only with a half-reflecting half mirror 112 '.
Exposure system 20 ' also comprises secondary light source 201 ', pattern generator 202 ' and exposure light path 210 ', the incident light that this secondary light source 201 ' sends, through pattern generator 202 ', exposure light path 210 ', incides body surface to be etched from exposure object lens 211 and forms exposure figure.
In this second embodiment, the central controller being used for controlling all parts mechanical motion can be same, as shown in Figure 4, also can separate and a central controller is set separately separately, then pass through data transfer means between each central controller, such as wire communication, radio communication or third party's data storage carrier reach the object exchanging data.In the embodiment of independent setting separately, focometry system 10 ' also comprises the first drive motor that control survey object lens 111 ' move up and down, drives described measurement object lens 111 ' and described measurement objective table 30 ' to do the second drive motor of relative level movement, and central controller, by moving up and down of described measurement object lens and moving horizontally of relative measurement objective table, described focometry system completes the measuring three-dimensional morphology to whole body surface to be etched, and calculates the described focusing information of acquisition by described central controller.Exposure system 20 ' also comprise control exposure object lens 211 and move up and down the 3rd drive motor, drive described exposure object lens 211 and described exposure objective table 30 " make the four-wheel drive motor of relative level movement; and central controller; by moving up and down of described exposure object lens and moving horizontally of relative exposure objective table, described exposure system completes the photoetching to object to be etched.
Further, also can comprise one in this second embodiment to focus online backup system, online focusing backup system can be use light path as same in focometry system to arrange, and also can be the system of some other spot size that can detect in exposure process, not repeat them here.
Certainly, this second embodiment also can increase the 2nd CCD220 ' in exposure system, and its effect played also is in measurement or exposure process, allows human eye can observe the focusing situation of current object lens.
For in this second embodiment, carry out the method for photoetching, basic identical with the first embodiment, repeat no more herein.But for focometry stage and photolithographic stage, carry out at two different boards respectively.Now need to increase some transloading equipments between two stages, transport tape or mechanical arm etc. on such as streamlined production line.In addition, in the embodiment that two central controllers are arranged separately, also increase the operation of a step data transmission.
To the above-mentioned explanation of the disclosed embodiments, professional and technical personnel in the field are realized or uses the present invention.To be apparent for those skilled in the art to the multiple amendment of these embodiments, General Principle as defined herein can without departing from the spirit or scope of the present invention, realize in other embodiments.Therefore, the present invention can not be restricted to embodiment illustrated herein, but will meet the widest scope consistent with principle disclosed herein and features of novelty.
Claims (15)
1. a laser direct writing system, it is characterized in that: comprise focometry system and exposure system, described focometry system adopts after the mode of off-line measures the three-dimensional appearance information of whole body surface to be etched, described three-dimensional appearance convert information is focusing information and sends to described exposure system, described exposure system is according to described focusing information, carrying out in photoetching process to described body surface to be etched, the concavo-convex degree of focusing to be applicable to described body surface to be etched, exposure station is made to focus on the surface of described photoetching object all the time, described focometry system also comprises the first light source, optical path, astigmatism optical device and the first ccd sensor, the incident light that described first light source sends is through optical path, from objective lens entrance to body surface to be etched, the reflected light that described body surface to be etched sends then enters optical path from object lens, astigmatism optical device and the first ccd sensor, when using this focometry systematic survey:
1) the standard light spot size D at body surface reference point place to be etched is obtained
fwith standard objective focal length Z
f;
2) according to the size of body surface breadth to be etched, the sampled measurements point of suitable quantity is selected;
3) make to relatively move between object lens and objective table, when object lens move to each sampled measurements point, drive object lens move up and down make light spot lock-in arrive step 1) D
fsize, records the grating scale reading Z of now focus adjusting mechanism afterwards
iwith corresponding XY position coordinates X
i, Y
i;
4) step 3 is repeated) complete the data acquisition of all sampled points;
5) by step 4) in all data process, the focusing information needed for generation.
2. laser direct writing system as claimed in claim 1, is characterized in that: described focusing information is the horizontal coordinate X of body surface each point, the corresponding relation between Y value and the defocusing amount △ Z of this point.
3. laser direct writing system as claimed in claim 1, it is characterized in that: the described focometry system integration is in described exposure system, this focometry system and described exposure system at least share same object lens and same objective table, described objective table are placed described object to be etched.
4. laser direct writing system as claimed in claim 3, it is characterized in that: described laser direct writing system also comprise control object lens move up and down the first drive motor, drive described object lens and described objective table to do the second drive motor of relative level movement, and central controller, by moving up and down of described object lens and moving horizontally of relative objective table, described focometry system completes the measuring three-dimensional morphology to whole body surface to be etched, and calculates the described focusing information of acquisition by described central controller.
5. laser direct writing system as claimed in claim 4, it is characterized in that: described exposure system also comprises secondary light source, pattern generator and exposure light path, the incident light that described secondary light source sends, through pattern generator, exposure light path, forms exposure figure from objective lens entrance to body surface to be etched.
6. laser direct writing system as claimed in claim 5, is characterized in that: described laser direct writing system also comprises one and to focus online backup system.
7. laser direct writing system as claimed in claim 1, it is characterized in that: described focometry system and each self-separation of described exposure system are arranged, this focometry system and described exposure system comprise object lens and an objective table separately, the object lens that wherein focometry system is corresponding and objective table are for measuring object lens and measuring objective table, the object lens that exposure system is corresponding and objective table are exposure object lens and exposure objective table, and described measurement objective table and exposure objective table are all in order to place object to be etched.
8. laser direct writing system as claimed in claim 7, it is characterized in that: described focometry system also comprises the first drive motor that control survey object lens move up and down, drives described measurement object lens and described measurement objective table to do the second drive motor of relative level movement, and central controller, by moving up and down of described measurement object lens and moving horizontally of relative measurement objective table, described focometry system completes the measuring three-dimensional morphology to whole body surface to be etched, and calculates the described focusing information of acquisition by described central controller.
9. laser direct writing system as claimed in claim 7, it is characterized in that: described exposure system also comprise control exposure object lens move up and down the 3rd drive motor, drive described exposure object lens and described exposure objective table to make the four-wheel drive motor of relative level movement, and central controller, by moving up and down of described exposure object lens and moving horizontally of relative exposure objective table, described exposure system completes the photoetching to object to be etched.
10. laser direct writing system as claimed in claim 7, it is characterized in that: described exposure system also comprises secondary light source, pattern generator and exposure light path, the incident light that described secondary light source sends, through pattern generator, exposure light path, forms exposure figure from exposure objective lens entrance to described body surface to be etched.
11. 1 kinds of photoetching methods, this photoetching method uses the laser direct writing system as described in claim 1-10 any one, comprises focometry stage and photolithographic stage, it is characterized in that:
The described focometry stage comprises step:
1) standard light spot size Df and the standard objective focal length Zf at body surface reference point place is obtained;
2) according to the size of body surface breadth to be etched, the sampled measurements point of suitable quantity is selected;
3) start to measure, driven between object lens and objective table by the second drive motor and relatively move, when object lens move to each sampled measurements point, mobile Z axis, drive object lens move up and down make light spot lock-in arrive step 1) Df size, record the grating scale reading Zi of now focus adjusting mechanism and corresponding XY position coordinates Xi, Yi afterwards;
4) step 3 is repeated) complete the data acquisition of all sampled points;
5) by step 4) in all data process, the focusing information needed for generation,
In described photolithographic stage, utilize above-mentioned focusing information, realize the focus controlling of object lens in exposure process.
12. photoetching methods as claimed in claim 11, is characterized in that: described step 1) manual adjustment mode or automatic shaping modes can be adopted to carry out.
13. photoetching methods as claimed in claim 11, it is characterized in that: described step 5) in, the process of data is referred to that data Zi and the Zf of collection point does difference, obtain three-dimensional defocusing amount △ Z, then the servo algorithm of △ Z and each measurement point horizontal coordinate XY position is set up: △ Z=f (x, y).
14. photoetching methods as claimed in claim 11, is characterized in that: in described photolithographic stage, and described focometry system can also be utilized as backup system of focusing online, complete the online auxiliary focusing in exposure process.
15. photoetching methods as claimed in claim 14, it is characterized in that: described online auxiliary focusing comprises: after exposure starts, described first ccd sensor is utilized to detect the size variation of hot spot, analyze data, real-time calculating out of focus adjustment amount △ Ze, set up new servo algorithm △ Z '=f (x, y)+△ Ze.
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