CN103639153A - Device and method for cleaning target gap - Google Patents
Device and method for cleaning target gap Download PDFInfo
- Publication number
- CN103639153A CN103639153A CN201310686918.1A CN201310686918A CN103639153A CN 103639153 A CN103639153 A CN 103639153A CN 201310686918 A CN201310686918 A CN 201310686918A CN 103639153 A CN103639153 A CN 103639153A
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- CN
- China
- Prior art keywords
- target
- gap
- dust
- crevice cleaning
- insufflation unit
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/04—Cleaning by suction, with or without auxiliary action
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- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a device and a method for cleaning a target gap, and relates to the field of semiconductor fabrication. By means of the device and the method, dust can be prevented from scattering during a gap cleaning process. The device for cleaning the target gap comprises a target front-blowing unit, a target side-blowing unit and a target side dust collector. The method for cleaning the target gap comprises the steps as follows: blowing is performed on the gap of the front of targets; blowing is performed on a first target side; dust is absorbed from the gap of a second target side, and the first side and the second side are opposite.
Description
Technical field
The present invention relates to field of semiconductor manufacture, relate in particular to a kind of target crevice cleaning apparatus and method.
Background technology
In field of semiconductor manufacture, particularly in field of liquid crystal, adopt the technique of magnetron sputtering technique making film very universal.Along with liquid crystal panel size is increasing, therefore the glass size adopting is also increasing, dimensional requirement for magnetic control spattering target is larger, but be subject to target to make the restriction of technique, general target needs the piecemeal use that is stitched together, but target stitching portion has gap, gap is generally 1mm left and right, can be because technical process is gathered dust granules in target gap after using a period of time, need to clean the gap of target, to prevent that the dust in gap from causing the bad of product in magnetron sputtering technique process.
Existing target crevice cleaning method is to adopt the thinner scraps of paper or steel disc inserted into gap that dust is cleared, but dust can be scattered in the processing chamber of magnetron sputtering like this, still can in technical process, cause the bad of product, particle in gap may contain heavy metal particles simultaneously, easily by human body, is sucked and people's health is worked the mischief.
Summary of the invention
The invention provides a kind of target crevice cleaning apparatus and method, can avoid being scattered of dust in crevice cleaning process.
For solving the problems of the technologies described above, the present invention adopts following technical scheme:
On the one hand, provide a kind of target crevice cleaning device, comprising:
The positive insufflation unit of target, target side insufflation unit and target side dust catcher.
Particularly, also comprise: seal bootr, the positive insufflation unit of described target, target side insufflation unit and target side dust catcher are arranged in described seal closure.
Particularly, described seal bootr is U-shaped structure, and the inner side of described U-shaped structure is open space.
Preferably, described seal bootr is made by elastomeric material.
Particularly, the positive insufflation unit of described target is connected with the first breather line, and described target side is blown afloat unit and is connected with the second breather line, and described the first breather line and the second breather line are respectively arranged with air valve.
On the other hand, provide a kind of target crevice cleaning method, comprising:
Blow in gap to target front;
Blow in gap to target the first side;
From the gap draw dust of target the second side, described the first side is the face relative with described the second side.
Target crevice cleaning apparatus and method provided by the invention, by blowing and remove dust and use dust catcher that the dust of removing in gap is directly collected in gap, crevice cleaning is effective and can not cause damage to target; In addition, avoided being scattered of dust in crevice cleaning process, thereby the dust of avoiding being scattered in processing chamber causes product bad in magnetron sputtering technique process, the skyborne heavy metal particles of simultaneously having avoided being scattered is sucked by human body and people's health is worked the mischief.
Accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, to the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skills, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the structural representation of a kind of target in the embodiment of the present invention;
Fig. 2 is the structural representation of a kind of target crevice cleaning device in the embodiment of the present invention;
Fig. 3 be in Fig. 2 AA ' to schematic cross-section;
Fig. 4 is the structural representation of a kind of seal bootr in the embodiment of the present invention;
Fig. 5 is structural representation when seal bootr covers on target in Fig. 4;
Fig. 6 is the flow chart of a kind of target crevice cleaning method in the embodiment of the present invention.
The specific embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, obviously, described embodiment is only the present invention's part embodiment, rather than whole embodiment.Embodiment based in the present invention, those of ordinary skills, not making the every other embodiment obtaining under creative work prerequisite, belong to the scope of protection of the invention.
As shown in Figure 1, the target using in magnetron sputtering technique is formed on backboard 2 by 1 splicing of polylith target, between polylith target 1, there is gap 3, gap 3 by thin paper sheet or steel disc insertion target clears dust at present, but dust can be scattered in the processing chamber of magnetron sputtering like this, still can in technical process, cause the bad of product, the particle in gap may contain heavy metal particles simultaneously, easily by human body, is sucked and people's health is worked the mischief.In addition, because the scraps of paper are softer, gap cannot be cleaned out, and steel disc is harder, easily target itself is caused to damage.A kind of new target crevice cleaning apparatus and method that the embodiment of the present invention proposes based on above-mentioned spliced target just.
As shown in Figures 2 and 3, the embodiment of the present invention provides a kind of target crevice cleaning device, comprising: the positive insufflation unit 4 of target, target side insufflation unit 5 and target side dust catcher 6.
Particularly, target 1 is arranged on backboard 2, on target 1, the face at backboard 2 places is the back side, the face relative with the back side is the front of target 1, when target 1 is carried out to crevice cleaning, the positive insufflation unit 4 of target is positioned over the positive of target 1 and aims at gap, target side insufflation unit 5 is positioned over apertured the first side of target 1 tool and aims at gap, target side dust catcher 6 is positioned over the second side of target 1 and aims at gap, the second side is the face relative with the first side, the positive insufflation unit 4 of target like this, target side insufflation unit 5, target side dust catcher 6 and backboard 2 are just surrounded gap, the positive insufflation unit 4 of target and the 3 interior air blowings to gap of target side insufflation unit 5 afterwards, dust in gap 3 is blown to dust catcher 6 places, target side of the second side, dust is drawn and collected to target side dust catcher 6 from the gap of the second side simultaneously.
Target crevice cleaning device in the embodiment of the present invention, by blowing and remove dust and use dust catcher that the dust of removing in gap is directly collected in gap, crevice cleaning is effective and can not cause damage to target; In addition, avoided being scattered of dust in crevice cleaning process, thereby the dust of avoiding being scattered in processing chamber causes product bad in magnetron sputtering technique process, the skyborne heavy metal particles of simultaneously having avoided being scattered is sucked by human body and people's health is worked the mischief.
Particularly, above-mentioned target crevice cleaning device can also comprise: seal bootr 7, the positive insufflation unit 4 of target, target side insufflation unit 5 and target side dust catcher 6 are arranged in seal bootr 7.
Particularly, as shown in Figure 4 and Figure 5, seal bootr 7 is U-shaped structure, and the inner side of U-shaped structure is open space, for covering the gap of above-mentioned positive insufflation unit, target side insufflation unit, target side dust catcher and target; Seal bootr 7 forms enclosure space with target 1 and backboard 2, further prevents that in crevice cleaning process, dust is scattering in processing chamber.
Preferably, seal bootr 7 is made by elastomeric material, has preferably sealing property.
Particularly, as shown in Figure 3, the positive insufflation unit 5 of target is connected with the first breather line 51, the positive insufflation unit 5 of target is connected to compression drying air (the Compressed Dry Air of magnetron sputtering apparatus by the first breather line 51, CDA) device, CDA device is used for providing dry gas, target side is blown afloat unit 6 and is connected with the second breather line 61, target side is blown afloat unit 6 and is connected to CDA device by the second breather line 61, the first breather line 51 and the second breather line 61 are respectively arranged with air valve 8, during target crevice cleaning, can can control the positive insufflation unit 5 of target and target side by air valve 8 blows afloat unit 6 and blows simultaneously, or the positive insufflation unit 5 of target is first blown, the rear air blowing in unit 6 is blown afloat in target side.Certainly, also air valve 8 can be set, directly by the positive insufflation unit 5 of CDA device control target and target side, blow afloat unit 6 and blow simultaneously.
Target crevice cleaning device in the embodiment of the present invention, by blowing and remove dust and use dust catcher that the dust of removing in gap is directly collected in gap, crevice cleaning is effective and can not cause damage to target; In addition, avoided being scattered of dust in crevice cleaning process, thereby the dust of avoiding being scattered in processing chamber causes product bad in magnetron sputtering technique process, the skyborne heavy metal particles of simultaneously having avoided being scattered is sucked by human body and people's health is worked the mischief.
As shown in Figure 6, the embodiment of the present invention provides a kind of target crevice cleaning method, can be for above-mentioned target crevice cleaning device, and this target crevice cleaning method comprises:
It should be noted that, above-mentioned steps 101 and step 102 can be carried out simultaneously, also can first carry out steps 101, and then carry out steps 102.
Target crevice cleaning method in the embodiment of the present invention, by blowing and remove dust and use dust catcher that the dust of removing in gap is directly collected in gap, crevice cleaning is effective and can not cause damage to target; In addition, avoided being scattered of dust in crevice cleaning process, thereby the dust of avoiding being scattered in processing chamber causes product bad in magnetron sputtering technique process, the skyborne heavy metal particles of simultaneously having avoided being scattered is sucked by human body and people's health is worked the mischief.
The above; be only the specific embodiment of the present invention, but protection scope of the present invention is not limited to this, is anyly familiar with those skilled in the art in the technical scope that the present invention discloses; can expect easily changing or replacing, within all should being encompassed in protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of described claim.
Claims (6)
1. a target crevice cleaning device, is characterized in that, comprising:
The positive insufflation unit of target, target side insufflation unit and target side dust catcher.
2. target crevice cleaning device according to claim 1, is characterized in that, also comprises:
Seal bootr, the positive insufflation unit of described target, target side insufflation unit and target side dust catcher are arranged in described seal closure.
3. target crevice cleaning device according to claim 2, is characterized in that,
Described seal bootr is U-shaped structure, and the inner side of described U-shaped structure is open space.
4. target crevice cleaning device according to claim 1 and 2, is characterized in that,
Described seal bootr is made by elastomeric material.
5. target crevice cleaning device according to claim 1, is characterized in that,
The positive insufflation unit of described target is connected with the first breather line, and described target side is blown afloat unit and is connected with the second breather line, and described the first breather line and the second breather line are respectively arranged with air valve.
6. a target crevice cleaning method, is characterized in that, comprising:
Blow in gap to target front;
Blow in gap to target the first side;
From the gap draw dust of target the second side, described the first side is the face relative with described the second side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310686918.1A CN103639153A (en) | 2013-12-13 | 2013-12-13 | Device and method for cleaning target gap |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310686918.1A CN103639153A (en) | 2013-12-13 | 2013-12-13 | Device and method for cleaning target gap |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103639153A true CN103639153A (en) | 2014-03-19 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310686918.1A Pending CN103639153A (en) | 2013-12-13 | 2013-12-13 | Device and method for cleaning target gap |
Country Status (1)
| Country | Link |
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| CN (1) | CN103639153A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109023289A (en) * | 2018-08-08 | 2018-12-18 | 武汉华星光电半导体显示技术有限公司 | Target cleaning assemblies and target clean method, film-forming apparatus |
| CN109482578A (en) * | 2018-12-31 | 2019-03-19 | 桂林电子科技大学 | A kind of target dust-extraction unit |
| CN113369182A (en) * | 2021-04-21 | 2021-09-10 | 芜湖映日科技股份有限公司 | Seam cleaning method after target binding |
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| JPH026886A (en) * | 1988-06-27 | 1990-01-11 | Hitachi Ltd | Air shower for article |
| US5197160A (en) * | 1991-02-04 | 1993-03-30 | Smith Alexander L | Cleaning device for cleaning carpets |
| CN2577998Y (en) * | 2002-10-17 | 2003-10-08 | 逢开有限公司 | Air knife dust collector |
| CN201008870Y (en) * | 2007-03-05 | 2008-01-23 | 咸阳华清设备科技有限公司 | Screen dust removing device of flat panel display |
| WO2011111139A1 (en) * | 2010-03-08 | 2011-09-15 | シャープ株式会社 | Cleaning instrument, and instrument having polarizing plate attached thereto |
| CN203124994U (en) * | 2013-01-11 | 2013-08-14 | 深圳市大族激光科技股份有限公司 | Air-exhaust and dust-removing device of large-breadth panel cutting machine |
| CN203333748U (en) * | 2013-04-26 | 2013-12-11 | 武汉经开能源科技发展有限公司 | Automatic cleaning device for target surface |
-
2013
- 2013-12-13 CN CN201310686918.1A patent/CN103639153A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH026886A (en) * | 1988-06-27 | 1990-01-11 | Hitachi Ltd | Air shower for article |
| US5197160A (en) * | 1991-02-04 | 1993-03-30 | Smith Alexander L | Cleaning device for cleaning carpets |
| CN2577998Y (en) * | 2002-10-17 | 2003-10-08 | 逢开有限公司 | Air knife dust collector |
| CN201008870Y (en) * | 2007-03-05 | 2008-01-23 | 咸阳华清设备科技有限公司 | Screen dust removing device of flat panel display |
| WO2011111139A1 (en) * | 2010-03-08 | 2011-09-15 | シャープ株式会社 | Cleaning instrument, and instrument having polarizing plate attached thereto |
| CN203124994U (en) * | 2013-01-11 | 2013-08-14 | 深圳市大族激光科技股份有限公司 | Air-exhaust and dust-removing device of large-breadth panel cutting machine |
| CN203333748U (en) * | 2013-04-26 | 2013-12-11 | 武汉经开能源科技发展有限公司 | Automatic cleaning device for target surface |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109023289A (en) * | 2018-08-08 | 2018-12-18 | 武汉华星光电半导体显示技术有限公司 | Target cleaning assemblies and target clean method, film-forming apparatus |
| CN109482578A (en) * | 2018-12-31 | 2019-03-19 | 桂林电子科技大学 | A kind of target dust-extraction unit |
| CN113369182A (en) * | 2021-04-21 | 2021-09-10 | 芜湖映日科技股份有限公司 | Seam cleaning method after target binding |
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Application publication date: 20140319 |
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| RJ01 | Rejection of invention patent application after publication |