CN103635624A - Method and apparatus for surface treatment of materials utilizing multiple combined energy sources - Google Patents

Method and apparatus for surface treatment of materials utilizing multiple combined energy sources Download PDF

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Publication number
CN103635624A
CN103635624A CN201280032253.6A CN201280032253A CN103635624A CN 103635624 A CN103635624 A CN 103635624A CN 201280032253 A CN201280032253 A CN 201280032253A CN 103635624 A CN103635624 A CN 103635624A
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plasma
roller
base material
laser
processing region
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CN201280032253.6A
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CN103635624B (en
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普拉文·米斯特里
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Mtix Ltd
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Mtix Ltd
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    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/02Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements ultrasonic or sonic; Corona discharge
    • D06M10/025Corona discharge or low temperature plasma
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/005Laser beam treatment

Abstract

Material treatment is effected in a treatment region (124) by at least two energy sources, such as (i) an atmospheric pressure (AP) plasma and (ii) an ultraviolet (UV) laser directed into the plasma and optionally onto the material being treated. Precursor materials (323) may be dispensed before, and finishing material (327) may be dispensed after treatment. Electrodes (e1, e2) for generating the plasma may comprise two spaced-apart rollers (212/214; 412/414; 436/438). Nip rollers (416/418; 436/438) adjacent the electrode rollers (412/414) define a semi-airtight cavity (440), and may have a metallic outer layer (437/439).

Description

Use material surface treatment method and the device of a plurality of energy sources of combination
The cross reference of related application
The application requires the applying date rights and interests of the US 61/501,874 of submission on June 28th, 2011.
Technical field
The present invention relates to material and various base material, the more specifically for example surface treatment of fabric, and relate more specifically to use the material processed in a plurality of different-energies source of combining, one of described energy source can be atmospheric pressure plasma (AP) conventionally.
Background technology
The development of " smart fabric " is the concerned field of enlivening always, to improve various performances as stain resistance, waterproof, color fast degree and can pass through to use advanced person's processing of plasma technology, source of microwave energy and other characteristic that chemical treatment in some cases realizes.
In the situation that do not affect the volume performance of these fibers, the surface property that atmospheric plasma treatment (APT) can be improved fiber is as hydrophily, and can manufacture device and converter is used by fabric, to improve natural and surface propertys synthetic fiber, with improve cohesiveness, wettability, impressionability, can dyeability, and the shrinkage factor that reduces material.
Atmospheric pressure plasma (or AP plasma or atmospheric plasma) is the title in particular cases of considering that the pressure in plasma approximately mates with ambient atmosphere.AP plasma has outstanding technical meaning, because compare with low-pressure plasma or high pressure plasma, does not need expensive reaction vessel to guarantee to maintain the stress level that is different from atmospheric pressure.In addition, in many cases, these AP plasma physical efficiencys are readily incorporated in production line.Various forms of plasma exciatiaons are feasible, comprise that AC (interchange) excites, DC (direct current) and low-frequency excitation, exciting and microwave-excitation by radio wave.Yet, only have the AP plasma exciting by AC to obtain any industrial significance of being worth mentioning.
Conventionally, by interchange, excite (corona discharge) and plasma jet to produce AP plasma.In plasma jet, pulsed arc produces by the high-voltage discharge (5-15kV, 10-100kHz) in plasma jet.A kind of process gas (for example flow through this discharge portion without oily compressed air) is excited and converts plasmoid to.This plasma then by injector head to arrive on the surface of pending material.This injector head has ground potential, in this way, suppresses to a great extent the band electromotive force part of plasma jet.In addition, injector head is determined the geometry of the light beam occurring.A plurality of injector heads can interact for the respective regions of the base material with processed.For example, having several meters of sheet materials of processing width can process by a line jet.
The method of AP and vacuum plasma has been used to clean and active material surface is bonding to be ready for, printing, spraying, polymerization or other functional or decorative coating.AP processes and may be better than for processing continuously the vacuum plasma of material.Another kind of surface treatment method utilizes microwave energy to carry out polymerization precursor coating.
Summary of the invention
The present invention relates in general to provides improved technology for example, for the treatment of (surface treatment and modification) material, base material for example, fabric (comprising weaving or knit goods and supatex fabric) for example more specifically, and relate to widely plasma (as atmospheric pressure (AP) plasma) combination that various additional energy sources (as laser irradiation) and high voltage are produced and process, this may change core and the surface of processed material, and can in dry environment, use gas or the precursor material of introducing.The combination of various energy sources is disclosed.
One embodiment of the present of invention comprise that the interactional energy source (atmosphere (AP) plasma producing as laser and high voltage) of at least two combinations of utilization processes the method and apparatus with production technology fabric and other material substantially.
Technology disclosed herein can be incorporated into the system of processing for the automation of textile material at an easy rate.Functional can acquisition in the following manner: anhydrous cleaning (as etching or ablation), the free radical by from the teeth outwards forms to activate and increase or reduce simultaneously and selectively required functional characteristic.Can the method (forming such as the lip-deep free radical at material) by manufacturing chemistry and/or metamorphosis obtain or strengthen, increase or reduce, antimicrobial properties fire-retardant such as hydrophobicity, hydrophily, reduce contraction, fiber wash, scold water, low temperature dyeing, increase dyestuff absorbs and the performance such as color fast degree.Can apply and process the coating (for example nano-scale coating of advanced material composition) of material.
AP energy of plasma is combined with the energy source of one or more additional (or second) (or mixing) can generate more effectively (with the viable commercial) energy environment for base material treatment, described additional energy source is for example laser, X ray, electron beam, microwave or other different energy source.The second energy source also can be applied for and AP energy of plasma combination (in phase, side by side), and/or (connects, optionally) apply to obtain desired properties successively with AP energy of plasma.
The second energy source can act on the plasma plume separately producing, and manufactures more effective energetic plasma environment, also have and directly act on lip-deep ability simultaneously, and in some cases, the core of this material stands this mixed processing.
Technology disclosed herein goes for but is not limited to: the processing of the similar materials such as fabric (organic and inorganic), paper, synthetic paper, plastics, these materials are conventionally with the form (" yard goods " (yard goods)) of flat sheet.Technology disclosed herein also can be applied to any material plasticity extruding or extruding metal, rolling mill, injection moulding, spinning, comb and parallel cotton fibers prior to spinning, weave cotton cloth, glass manufacture, base material etching and cleaning and coating, and be applicable in fact any material processed technology.As the rigid material of the flat sheet of glass (as touch-screen) can be processed by technology disclosed herein.
According to an aspect of the present invention, provide a kind of method for the treatment of base material (102,402,404), having comprised:
At processing region (124), generate plasma, described processing region comprises two isolated electrode (e1/e2; 212/214; 412/414; 452/454);
The second energy source guiding that at least one is different to the first energy source enters plasma to obtain hybrid plasma with Plasma Interaction; And
Described hybrid plasma and the base material in processing region (124) are interacted.
On the other hand, the present invention includes device for the treatment of material (100,400A, 400B, 400C, 400D, 400E, 400F, 400G), comprising:
Two isolated electrode (e1/e2; 212/214; 412/414), for producing plasma at processing region (124);
One or more laser instruments (130), are directed to one or more light beams (132) of correspondence in processing region, with plasma and processed material at least one interaction.
Aspect another, the present invention includes the purposes of the device for the treatment of fabric substrate described herein.
One different aspect, the present invention includes the textile material obtaining by described method herein.
Aspect another, the present invention has conceived the method for the plasma of material processed that generates.
Advantages more of the present invention can include but not limited to: generation more has energy with effective plasma so that for subsequent treatment or fine finishining is cleaned and the method for activated surface.For example, ultraviolet ray (UV) laser emission (continuous wave (CW) or pulse) can combine with the AP plasma that electromagnetism produces, to generate reaction environment highly ionized more and that be full of energy for the treatment of surface.Resultingly mix the effect that energy can have the summation that is greater than its various piece.Pulsed laser energy can be used for driving plasma, generates ripple, and laser energy can be so that the plasma wave arriving accelerates, and this plasma wave acts on base material as sea slap sandy beach.
Plasma accelerated and that be more full of energy can cause free radical on the fiber of the matrix of processing or surface, and makes ionogen be attached to caused free radical.The attached of Zhe Lei functional group (as carboxyl, hydroxyl or other are attached to the functional group of lip-deep increase polar character) may cause larger hydrophily and other required functional performance.
The present invention advantageously under the situation that has material base material in controlled atmospheric environment in conjunction with energy source.Compare with coated layer simply, final result may be synthetic in the conversion of substrate surface and material---base material may change physically.
In one exemplary embodiment, high-frequency RF plasma generation is in extending across the envelope (or chamber or chamber) forming between the rotating roller of whole width of processing window and driven roller.The plasma field producing is consistent on the whole width of processing region, and can under atmospheric pressure operate.High power ultraviolet ray (UV) laser instrument is arranged for plasma and/or processed material and interacts.From the light beam of laser instrument, can be shaped as and have rectangular cross section, it demonstrates consistent power density at whole processing region.Gas delivery system can be used to any combination of a plurality of (for example 4) environmental gas and precursor to be combined into the single supply of filling hybrid plasma chamber.In addition, spraying or atomization induction system can be set to the thin consistent layer of sol-gel or process accelerator can be put on to processed material (preliminary treatment or post processing).
The process of binding plasma and photon (for example ultraviolet laser) is dried, and is to carry out under atmospheric pressure, and use safety and inert gas (as nitrogen, oxygen, argon gas and carbon dioxide).Change the power level of laser and plasma, then change environmental gas or add sol-gel and/or other organic or inorganic precursor, that is, changed " formula ", make system can produce various process application.
Process has several application, comprising: clean, preparation and reinforcing material performance.
-for cleaning, laser may be strengthened the effective power of plasma and act on substrate material in self right.
-for example, for being that the second process (dyeing) is prepared substrate material, the surface of fiber can be by ablation in a controlled manner, thus increased the hydrophily of material (for example textile material).In addition, by by the process area of environmental gas drawing-in system, for example, on the surface of material (fabric), may generate chemical substance, this may cause the chemical substance that interacts to realize more efficient dyestuff penetration or stronger coloring process or reduce the temperature of dyestuff with dyeing medium.For example, the fiber of preparing fabric is to obtain the intensity of the better control of chromium oxidation dye being improved to the black being obtained.Therefore, process exist to reduce the possibility of the chemical composition (this can reduce the negative effect of environment and processing cost) of dyestuff for this reason.
-for performance, strengthening, this process can realize the synthetic of material on substrate surface.By changing frequency and the power level of laser and plasma and other material being incorporated in processing environment, the surface of system ablation substrate, the synthetic new material in surface of the fiber of a series of chemical reactions between base material and environmental gas in fabric web.
Accompanying drawing explanation
Can be in detail with reference to the embodiment of disclosure, some of them limiting examples can illustrate in the accompanying drawing of enclosing.These figure are schematic diagram normally.For illustrate clear for the purpose of, some elements in the accompanying drawings may be exaggerated, other can omit.Relation between different elements in the drawings can by its display mode and place mode in the drawings (such as " top ", " bottom ", " left side ", " right side ", " on ", D score etc.) indicate.Should be appreciated that the wording and the term that adopt should not be interpreted as restriction, the only object for illustrating herein.
Fig. 1 is the schematic diagram for the treatment of system according to an embodiment of the invention.
Fig. 2 is the fragmentary, perspective view in plasma region of the treatment system of Fig. 1.
Fig. 2 A is the fragmentary, perspective view in plasma region of the treatment system of Fig. 1.
Fig. 3 is according to the fragmentary, perspective view in the pretreatment zone of the treatment system of Fig. 1 of some embodiments of the present invention, plasma region and post processing region.
Fig. 4 A-4G is according to the schematic diagram of the element in the processing region of the treatment system of Fig. 1 of some embodiments of the present invention.
The specific embodiment
The present invention relates in general to processing (for example surface treatment) material (for example fabric) to change its performance.
To describe various embodiment so that instruction of the present invention to be described, these embodiment should be interpreted as illustrative and nonrestrictive.Although in the context of various exemplary embodiments describe, in general terms the present invention, should be appreciated that this and do not mean that the present invention is limited to these specific embodiments.Embodiment can be example or the enforcement of one or more aspects of the present invention.Although various feature of the present invention can be described in the context of single embodiment, also can provide these features dividually or with any suitable mutual combination.Otherwise although the present invention can be described in the context of the embodiment separating, the present invention also can realize in single embodiment.
The surface treatment of base material is below mainly discussed, and base material can be the fabric that the form (being wound on the long material sheet in cylindrical core) of rolling up provides.Include but not limited to that one or more synthetic processing of material can be applicable on a surface or two surfaces of fabric substrate, and can introduce additional material.As used herein, " base material " can be to have two surperficial thin materials " sheet " that can be called as " front " and " afterwards " surface or " top " and " bottom " surface.
Some embodiments of the present invention
Following examples and each side thereof can be described in combination and illustrate with system, tool and method, and it is exemplary and explanat that described system, tool and method are intended to, but not limited field.Can set forth concrete configuration and details, to understand the present invention.But, it will be apparent to those skilled in the art that the present invention can in the situation that some details that do not present be in this article implemented.And well-known feature can be omitted or simplify to do not obscure description of the invention.
Fig. 1 illustrates for base material 102 is processed, superficial treatment system 100 and the method for for example surface-treated integral body.In the figure presenting herein, base material 102 is shown as and advances from right to left by system 100.
Base material 102 can be for example textile material, and may be provided in " yard goods " as lengthy motion picture material on roller.For example, pending base material can be fabric web material, and as cotton/polyester, about 1m is wide, and about 1mm is thick, and about 100 meters long.
The 100A place, importation that a part 102A (as the part of still untreated base material 102 1mx1m) is shown in system 100 unclamps out from supply spool R1.Base material 102 passes through the processing section 120 of device 100 from importation 100A.After processing, base material 102 leaves treating apparatus 120, and can collect in any suitable manner, for example, be wound on winding reel R2.The output 100B place that part 102B (for example 1mx1m part of the base material 102 of processed mistake) is shown in system 100 is winding on winding reel R2.Various rollers " R " can be arranged between the various piece of system 100 (as shown in the figure) and within (not shown), with guiding material, pass through system.
Processing section 120 can comprise three regions (or scope ,Huo district) conventionally:
-optional preliminary treatment (or precursor) region 122,
-processing (or plasma) region 124, and
-optional post processing (or fine finishining) region 126.
Processing region 124 can comprise that its element is normally well-known for generation of the parts of high voltage (HV) alternating current (AC) atmospheric pressure plasma (AP), and some of them will below describe in detail.
Laser instrument 130 can be provided as the second energy source, and for light beam 132 is provided, light beam 132 interacts with AP in main processing region 124, and light beam 132 also can clash into the surface of base material 102.
Controller 140 can be arranged for the operation of controlling above-described various parts and element, and can provide together with common man-machine interface (input, demonstration etc.).
Fig. 2 illustrates a part for main processing region 124 and the certain operations element in described main processing region 124.Show three orthogonal axis x, y and z.(in Fig. 1, show corresponding x and y axle.)
Show two slender electrodes 212 (e1) and 214 (e2), one of them can be considered negative electrode, and another can be considered anode.These two electrode e1 and e2 can be set to parallel to each other conventionally, are parallel to y axle and extend, and be spaced apart from each other in x direction.For example, electrode e1 and e2 can form in any suitable manner, for example, with the form of bar or pipe or other rotatable drum electrode material, nominally and be spaced a distance each other, this distance is enough to hold the gap of the thickness of the material after processing.Electrode e1 and e2 can be arranged on the about 1mm in top surface 102a top of processed base material 102.
Can give in any suitable manner electrode e1 and e2 energising, with along the right length of resulting cathode/anode between electrode e1 and e2 and closely in the space of electrode e1 and e2, generate atmospheric pressure plasma (AP), it can be described as " plasma reaction district ".
As mentioned above, laser beam 132 may be directed in main processing region 124, and the surface that can clash into base material 102.Here, laser beam 132 is shown as roughly directed along y axle, be roughly parallel to electrode e1 and e2 and between electrode e1 and e2, and a little more than the top surface 102a of base material 102, to interact with the plasma (plume) being produced by two electrode e1 and e2.In an exemplary application, the trace of light beam can be the rectangle of about 30mm * 15mm.Light beam can be horizontal or vertical ground directed, with realize best that direct base material irradiates and/or with the interaction of the expectation of plasma
In laser beam 102 and the Plasma Interaction being produced by two electrode e1 and e2, can make the small but enough orientations " inclination " of laser beam 132, with the pending base material 102 of direct irradiation.More specifically, laser beam 132 can with the top surface 102a of base material 102 " α " angle into about 0 degree, to do not clash into its surperficial 102a.Alternatively, laser beam 132 can be with the top surface 102a of base material 102 into about " α " angle that is less than 1 to 10 degree, thereby clashes into its surperficial 102a.Light beam 132 can have other orientation, for example vertical (" α "=90 degree) in the surperficial 102a of base material 102.Laser beam 132 can be used conventional galvanometer etc. to be scanned, to interact with the plasma being produced by two electrode e1 and e2 or the part of base material 102 or both any selections.
Plasma can use the first energy source for example high voltage (HV) alternating current (AC) generate.Also can make different the second energy source (as laser) and Plasma Interaction, cause " hybrid plasma ", and also can make hybrid plasma and processed base material (material) interact (at processing region).Except interacting with the first energy source, also can make the second energy source directly interact with processed material.Can manufacture the plasma through Stimulated Light of itself with the direct interaction of base material or other gas (second or precursor), the described plasma through Stimulated Light then can be further and the Plasma Interaction producing with high voltage, with provocative reaction environment more to heavens.
By main processing region (scope) 124 o'clock, base material 102 (processed material) can be guided by roller.One of showing in these rollers 214 of Fig. 2 A can be used as anode, and another roller 212 can be as for generation of the right negative electrode of the cathode/anode of plasma (vice versa).Can note, in Fig. 2, base material 102 is arranged into a side of two electrode e1 and e2, and (below, as shown in the figure), in Fig. 2 A, base material 102 is disposed between two electrode e1 and e2.In both cases, the action of plasma being generated by electrode e1 and e2 is at least one surface of base material 102.Anode and negative electrode can have insulating materials by coat, as pottery.
Should be understood that the present invention is not limited to any specific layout or the configuration of electrode e1 and e2, and the example of explaining in Fig. 2,2A to be intended to be only some possibilities of illustration.In addition, for example, as using substituting of two electrode e1 and e2, a line plasma jet (not shown) of conveying plasma can be provided to be created on the upper required plasma of surperficial 102a of base material 102.
Fig. 3 illustrates, in pretreatment zone (scope) 122, cover a line shower nozzle (nozzle) 322 of whole width of pending material or other suitable device and can be used for the precursor material 323 of solid-state, liquid state or gaseous state to be assigned on base material 102, so as can processing example as the specific performance of antimicrobial, fire retardant or super-hydrophobic/water-wet behavior.
" buffering " district in the middle of can having between pretreatment zone (scope) 122 and main processing region (scope) 124, to allow the material applying when preliminary treatment infiltrate if having time (being absorbed) base material.This process is the single length of riding material still, but buffering for example can keep the fabric up to 200m.For example, when processed material (as yard goods) is supplied with by system with 20m/min, this will allow to have some minutes " drying time " between preliminary treatment (122) and hybrid plasma processing (124), and do not stop material, not flow through system.
Similarly, in post processing region (scope) 126, cover a line shower nozzle (nozzle) 326 of whole width of material of processed (124) or other suitable device and can be used for the fine finishining material 327 of solid-state, liquid state or gaseous state to be assigned on base material 102, to make it have the characteristic of expectation.
Some embodiment of processing region (124)
Fig. 4 A-4G shows the embodiment of the various elements in processing region 124.
Fig. 4 A illustrates an embodiment 400A, wherein:
-the first (" top ") roller 412 can be used as electrode e1 work, and can have the diameter of about 10cm, and the length of 2 meters (entering the page).Roller 412 can have the outer surface of metal-cored and ceramic (electric insulation).
-the second (" bottom ") roller 414 can be used as electrode e2 work, and can have the diameter of about 15cm, and the length of 2 meters (entering the page).Roller 414 can have the outer surface of metal-cored and ceramic (electric insulation).
-second roller 414 is configured to be parallel to the first roller 412, and under the first roller 412 (as shown in the figure), there is the gap that for example, is supplied to the thickness of the substrate material 402 (comparing 102) between roller 412 and 414 corresponding to (being slightly smaller than) therebetween.The direction that material is advanced can be from right to left, as indicated by arrow.Base material 402 has in a top surface 402a (relatively 102a) and a lower surface 402b (relatively 102b).
The-the first roller 412 can be used as right " anode " of anode/cathode, and high voltage (HV) is supplied in this.Second roller 414 can be used as right " negative electrode " of anode/cathode, and can ground connection.
The-the first (" right side ") roll or donor rollers 416 (n1) are arranged near the bottom-right quadrant of the first roller 412 (as shown in the figure), and against the quadrant in the upper right side (as shown in the figure) of second roller 414.Roller 416 can have the diameter of about 12cm and the length (entering the page) of 2 meters.The outer surface of roller 416 can engagement roller 412 outer surface.The thickness of the substrate material 402 (comparing 102) between roller 416 and 414 for example, is supplied with in gap between the outer surface of the outer surface of roller 416 and roller 414 corresponding to (being slightly smaller than).
The-the second (" left side ") roll or donor rollers 418 (n2) are disposed near the quadrant of lower left of the first roller 412 (as shown in the figure), and against the quadrant on the upper left side (as shown in the figure) of second roller 414.Roller 418 can have the diameter of about 12cm and the length (entering the page) of 2 meters.The outer surface of roller 418 can engagement roller 412 outer surface.The thickness of the substrate material 402 (comparing 102) between roller 418 and 414 for example, is supplied with in gap between the outer surface of the outer surface of roller 418 and roller 414 corresponding to (being slightly smaller than).
-conventionally, roll or donor rollers 416,418 should have the outer surface of insulation, to avoid the short circuit of anode and negative electrode 412,414.
Such layout of using roller 412,414,416,418 also can form half airtight chamber (" 440 ") between the outer surface of four rollers 412,414,416,418, for limiting processing region 124 and comprising plasma.Whole chamber 440 can comprise first (" right side ") part 440a in the space between apex roller, right roller and lower roller 412,416,414, and the space between apex roller, left roller and lower roller 412,418,414 comprises second (" left side ") part 440b.Filled circles in the end of the lead-out wire of the right half 440a in this chamber 440 represents to enter the gas flow in chamber.Filled Rectangle in the end of the lead-out wire of the left half 440b in this chamber 440 represents laser beam (132).
In chamber, the plasma of 440 interior generations can be atmospheric pressure (AP) plasma.Therefore, the sealing in chamber 440 is unnecessary.Yet end cap or plate (not shown) can be arranged on the end of roller 412,414,416,418, to comprise (partly sealing) and to control the gas flow entering with exhaust chamber 440.
Fig. 4 B shows an embodiment 400B, and wherein left roller, right roller 416 and 418 slightly outwards move from roller 412 and 414, thereby have opened chamber 440, to allow to process thicker and/or more rigid base material.Yet this will require each electrode (anode and negative electrode) to be driven independently or directly.This material is driven and is passed through conversion zone by outside supply and take up roll.
Fig. 4 C shows an embodiment 400C, and wherein, use is roughly inverted U-shaped shielding part 420 but not left and right roller (416 and 418) limits the chamber 440 with right and left part 440a and 440b.Shielding part 420 is arranged to substantially completely around a roller 412 (place of passing through except supplying material), and at least in part round another roller 414.Extra shielding part (not shown) can be disposed under lower roller 414.
Fig. 4 D shows embodiment 400D, and it is suitable for processing rigid substrate.Above-mentioned base material 402 is flexible, for example fabric.The rigid substrate glass of touch-screen display device (for example for) can also be processed with hybrid plasma and precursor material.There is the rigid substrate 404 of top surface 404a and basal surface 404b by apex roller (e1) 412 and lower roller (e2) 414.A line nozzle 422 (comparing 322) can be arranged to provide the precursor material as the form of liquid, solid-state or atomization.As the shielding part (not shown) of 420 (with reference to Fig. 4 C) can be combined to comprise hybrid plasma.
Fig. 4 E illustrates a kind of layout 400E, and it comprises a line high-voltage plasma nozzle (shower nozzle) 430, but not columniform electrode e1 and e2.For example, in processing region 124,10 shower nozzles 430 are opened with the intervals of 20cm.Show rigid substrate 404.Before precursor material is exposed to hybrid plasma, in pretreating zone 122, a line nozzle 422 (comparing 322) can be arranged and precursor material be provided (for example, with atomised form) to base material 404.For example, in pretreatment zone 122,10 shower nozzles 422 are opened with the intervals of 20cm.Can comprise if the shielding part (not shown) of 420 (with reference to Fig. 4 C) is to comprise hybrid plasma.This layout makes to process metal or other conductive base.
Fig. 4 F shows an embodiment 400F, one can operate first (" top ") roller 412 as electrode e1 (or anode), one and can operate second (" the bottom ") roller 414 as electrode e2 (or negative electrode), and two rolls 436 and 438 (relatively 416 and 418).
Compare with embodiment 400A (Fig. 4 A), in the present embodiment, roller 436 and 438 from top and lower roller 412 and 414 outwards slightly (for example 1cm) spaced apart.Therefore, although it still can contribute to comprise plasma, it possibly cannot be used as donor rollers, and may need the donor rollers (not shown) that provides independent.
Right roller 436 (comparing 416) is illustrated as having in its surface layer or coating 437.Left roller 438 (comparing 418) is shown as has layer or coating 439 in its surface.For example, roller 436 in hybrid plasma processing region 124 and 438 can wrap up by metal forming (or having metal outer), this metallic film (or metal outer) can be etched by high energy hybrid plasma and/or laser (the second energy source) in processing procedure, the plume that generation contains active metal plasma, active metal plasma can easily have the nanolayered coating of metal ingredient with generation on substrate material with the coupling of substrate surface free radical).Metal material (metal forming, layer) can pass through controllably etching or ablation of plasma, the metal ingredient of outflow can with plasma reaction, and as be deposited on base material with the form of nano level layer.
Application roll 436 and 438 metal material for example can comprise any or combination in titanium, copper, aluminium, gold or silver.One in roller can scribble a kind of material, and another roller can apply another kind of material.Roller 436 and 438 different piece can apply different materials.Conventionally, when these materials are ablated, it forms vapor precursor material in processing region 124 (and therefore can form contrast with the nozzle 322 and 422 of precursor material is provided in pretreatment zone 124).
Fig. 4 G shows an embodiment 400G, it uses the plate electrode 452 and 454 of two flat sheet, but not roller (412,414), described two plate electrodes are spaced apart from each other to form a processing region (reaction/synthetic district) 124, and material piece 404 can be supplied with by this processing region.The gas that is supplied to processing region represents by justifying 440a, and laser beam is represented by rectangle 440b.Nozzle 422 can be provided to carry precursor material in pretreating zone 122.Nozzle 426 can arrange and in post processing zone 126, carry fine finishining material.
Supplementary features
Although do not specifically illustrate, process (124) at mixed tensor and be assigned to afterwards that fine finishining material on base material 102 can be exposed to the second plasma or hybrid plasma immediately so that dry, sealing or react with the fine finishining material of distribution by hybrid plasma activated surface after.
Although do not specifically illustrate, but should be appreciated that various gas be directed in plasma (as in processing region 124) so that processed base material obtains characteristic and the performance of various expectations as O2, N2, H, CO2, argon, helium or as the compound of silane or siloxy group material.
For making processed material obtain antimicrobial properties, can introduce precursor material, for example non-money base silane/siloxane and aluminium chloride family are as 3 (ortho-siliformic acid base) propyl-dimethyl octadecane (3 (trihydroxylsilyl) propyldimethyl octadecyl), ammonium chloride.Other silane/siloxane group and siloxanes and ethyoxyl silicon (raising hydrophobicity) can be used to affect hydrophobicity.The HMDO (Hexamethylidisiloxane) that the gas phase of usining in plasma applies can make the surface smoothing of fabric fibre and increase the contact angle as the index of hydrophobicity level.
Can plasma composition be introduced to thickness the further thickness that infiltrates porous substrate of porous substrate by negative absorption or local atmosphere vacuum.Fig. 3 shows aspirator in processing region 124 (platen (bed) 324 that for example base material 102 passes through) can be provided with a plurality of holes, and is connected to by rights aspirator (not shown) and manufactures required effect.Platen 324 can be used as one of electrode for generation of plasma.Alternatively, can be changed at an easy rate a roller or analog (there is hole and be connected with aspirator) and carry out this function.
Should be appreciated that this process is that be dried and low on the impact of environment, remaining or bi-product gas or composition are safe in essence, can discharge and reclaim by rights or process from this system.
Therefore, the method of processing material with at least two energy sources is provided, wherein said two energy sources comprise: (i) by the atmospheric pressure plasma of the various γ-ray emissions through high energy electromagnetic field, and (ii) with described Plasma Interaction at least one laser with generation " hybrid plasma ".Laser can be worked in ultraviolet range (308nm or less).Laser can comprise the PRK of the power output with at least 25 watts, and described power output comprises and surpass 100 watts, surpass 150 watts, over 200 watts.Laser can be pulse, for example, have 25Hz's or higher (as 350-400 hertz) frequency, comprises psec and femtosecond laser.Although illustrated and only had a laser and plasma (and base material) to interact, used two or more laser within the scope of the present invention.
For produce some exemplary parameters of plasma at processing region, be: high voltage produces plasma, 1-2KW (kilowatt); 308nm UV laser, 500MJ, 350Hz; In the mist of argon 80%, 20% oxygen or CO2.
As the alternative of laser or except using laser, ultraviolet ray (UV) source such as UV lamp or high power ultraviolet ray LED (light emitting diode) array that arranges along the length of processing region of can using enters AP plasma to generate hybrid plasma by energy guiding, and interact with processed material (for example, etching, reaction and synthetic).
Substantially, above, show a surperficial 102a who processes substrate material 102, and described some exemplary processing.Below within the scope of the present invention: for example, by making material 102 circulations back by processing region 124, also can process the relative lower surface 102b of material 102.Different energy sources and environment, precursor and accurately machined material can be used to the second surface of the material of processing.In this way, two of material surfaces can be processed.It is also understood that processing may extend in the surface of processed material to change or to strengthen the performance of inner (core) material.In some cases, the core of top surface and lower surface and material can be processed from a side effectively.
This system can be used for processing the material outside sheet form.For example, system can be used to be annealed and improved optics and the morphological character of Organic Light Emitting Diode (OLED) by mixed tensor.These scattered devices can be transmitted in any suitable manner (transmission) and be passed through system.
The energy of other type also can apply in combination with each other or successively, to generate the disposal ability of enhancing.For example, the method of processing material can be utilized the combination of at least two energy sources, the various combinations of the plasma producing as microwave and laser or microwave and electromagnetism or plasma and microwave or plasma, laser, pulse microwave electron cyclotron resonace (ECR).
Two energy sources can comprise: (i) atmospheric pressure plasma, and it utilizes by the various ionized gas of high-energy electromagnetic field; And (ii) ultraviolet ray (UV) source, in its generation and guiding radiation entry altitude Ionized plasma and directly in pending surface.Ultraviolet light source can comprise high power ultraviolet ray LED (light emitting diode) array arranging along the development length of processing region.High power ultraviolet ray LED can with Plasma Interaction, with activated plasma more to heavens, and act directly on base material with etching base material or make base material reaction.
Automated material-handling system can controllably carry material to pass through the energy field being produced by combined energy source.
Can carry out series of processing steps, for example:
Step 1-(optional) applies precursor,
Step 2-is exposed to mixed tensor,
Step 3-(optional) applies precursor or fine finishining material, and
Step 4-is exposed to hybrid energy sources.
Wherein, all steps all directly complete in mode successively in system.
Below within the scope of the invention: introduce during the course an induction system, it can directly add gas phase/vapor phase precursor material in this plasma reaction zone.
The treatment process parameter that some are exemplary
process 1-hydrophily
Precursor material
Dimethyl silicone polymer combustion fat agent (hydroxycut) (agent of PMDSO combustion fat)
Or: copolymer (dimethyl siloxane and/or mixing dimethylsilane (dimethylesilane))
Laser
Frequency 250Hz
Power 380MJ
Plasma
Vector gas argon gas ... 80%
Reacting gas O2 ... 20%
15 liters/min of flow pressure: a little more than 1 bar
Power 2KW
process 2-dyeability
Precursor
There is no precursor or other front body catalyst
Laser
Frequency 250Hz
Power 380MJ
Plasma
Vector gas argon gas ... 80%
Reacting gas O2 or N2 ... 20%
15 liters/min of flow pressure: a little more than 1 bar
Power 2KW
process 3-hydrophobicity
Precursor octamethylcy-clotetrasiloxane/poly dimethyl monosilane blend (water dissolvable), the methylhydrogenpolysi,oxane of mixing with polyglycol ether with dimethyl silicone polymer (water dissolvable), or the combination of above material and dimethyl silicone polymer.Use water miscible blend to allow with deionized water, to dilute this material to applying needed concentration, the cost benefit having obtained and output performance result.Water-soluble blend can be with relevant additive manufacture-these are to manufacture the basic skills of emulsion for miscella and water, conventionally size by emulsion dispersion agent (is macroscopic view or microcosmic, 100 microns of > of macroscopic view, 30 microns of microcosmic <) this emulsion is described.
Or: copolymer (dimethyl siloxane and/or mixing dimethylsilane (dimethylesilane))
Laser
Frequency is 350Hz at least
Power is 450MJ at least
Plasma
Vector gas nitrogen, argon gas, helium ... 80%
Reacting gas CO2 or N2 ... 2-20%
Flow 10-40 liter/min pressure: a little more than 1 bar
Power 0.5-1KW
process 4-anti-flammability
Precursor
Based on thering is the siloxanes/silane of crucial inorganic compound (being the transition oxide of titanium, silicon, zirconium and boron substantially) and copolymer and the terpolymer of polyborosiloxane.In being below also included within: the silicone copolymers of boracic and terpolymer, as the polyborosiloxane of organosilicon/oxygen ethyl modification.According to the requirement of the type of substrate material and output, can use the up-to-date phosphorus blend based on some limited material compositions.The blend (water miscible) of octamethylcy-clotetrasiloxane/poly dimethyl silane, is mixed with dimethyl silicone polymer and polyglycol ether (water miscible), or the combination of above and dimethyl silicone polymer, has following additive:
-to the calcium metaborate of silane/siloxane (calcium metaborbate) additive
-Si oxide additive to silane/siloxane
-isopropyl titanate additive
-titanium dioxide (routile)
-ammonium phosphate
-aluminium oxide
-Firebrake ZB
-containing the boric acid boron of ceramic precursor oligomer (preceramic oligomores)
-aeroge and aquogel, the polyacrylate that low-density or high density are crosslinked.
-Nano/micron capsule composition
Example: dimethyl siloxane and/or dimethylsilane, there is polyborosiloxane, the transition oxide of interpolation, scope is the oxide (as TiO2, SiO2 (gas phase, gel or unbodied), Al2O3 etc.) of 5 to 10% volumes.Precursor material as herein described for example, can improve the anti-flammability of material in the described system herein of using hybrid plasma (having laser).Below in scope of the present invention: precursor material described in this paper is utilizing the anti-flammability (or other performance) that can improve material in the material handling system of non-mixed plasma (for example, without laser).
Laser
Frequency is 350Hz at least
Power is 450MJ at least
Plasma
Vector gas nitrogen, argon gas, helium ... 80%
Reacting gas CO2 or N2 ... 2-20%
Flow 10-20 liter/min pressure: a little more than 1 bar
Power 0.5-1KW
process 5-antimicrobial
Precursor
Siloxanes/silanes blend, as hydrophobicity platform, is added with:
Octadecyl dimethyl (the silica-based propyl group of 3-triethyl group) ammonium chloride.
Octamethylcy-clotetrasiloxane/poly dimethyl silanes blend (water-soluble), is mixed with polydiethylsiloxane and polyglycol ether (water-soluble), or the combination of above and dimethyl silicone polymer, has following additive:
-octadecyl dimethyl (3-trimethoxy silicon propyl group) ammonium chloride,
-shitosan
Laser
Frequency is 350Hz at least
Power is 450MJ at least
Plasma
Vector gas nitrogen, argon gas, helium ... 80%
Reacting gas CO2 or N2 ... 2-20%
Flow 10-20 liter/min pressure: a little more than 1 bar
Power 0.5-1KW
The embodiment with respect to limited quantity has described the present invention, but these should not be interpreted as the restriction to scope of the present invention, but as the example of some embodiment.Those skilled in the art it is contemplated that other possible variation, change and enforcement, and it is set forth and also should be considered as within the scope of the invention and can be required protection according to the disclosure.

Claims (31)

1. for the treatment of a method for base material (102,402,404), comprising:
In processing region (124), generate plasma, described processing region comprises two isolated electrode (e1/e2; 212/214; 412/414; 452/454);
The second energy source guiding that at least one is different to the first energy source enters plasma to obtain hybrid plasma with Plasma Interaction; And
Described hybrid plasma and the base material in processing region (124) are interacted.
2. method according to claim 1, wherein:
Described the first energy source comprises high voltage alternating current (AC); And
Described the second energy source comprises the radiation from laser.
3. method according to claim 2, wherein, described laser plasma interactions, and directly act on processed material.
4. according to the method in claim 2 or 3, wherein, described laser has at least one in following characteristics:
Described laser comprises PRK;
The work in ultraviolet ray (UV) wave-length coverage of described laser;
Described laser is with the power output work of at least 25 watts.
5. method according to claim 2, wherein:
Described plasma comprises atmospheric pressure (AP) plasma.
6. according to the method described in aforementioned arbitrary claim, also comprise:
Before processing base material, distribute (122,322,422) to base material precursor material (323,437).
7. according to the method described in aforementioned arbitrary claim, also comprise:
After processing base material, by fine finishining material (327,439) distribute (126,326,426) to base material.
8. according to the method described in aforementioned arbitrary claim, wherein:
Described plasma comprises high voltage (HV) atmospheric pressure (AP) plasma.
9. according to the method described in aforementioned arbitrary claim, wherein:
Described electrode (e1/e2) comprises roller (212/214; 412/414).
10. according to the method described in aforementioned arbitrary claim, wherein, described base material is a kind of material.
11. according to the method described in aforementioned arbitrary claim, and wherein, described base material is a kind of synthetic textiles material.
12. methods according to claim 11, wherein, described synthetic textiles material is polyester.
13. according to the method described in any one in claim 1 to 10, and wherein, described base material is organic material.
14. methods according to claim 13, wherein, described organic material is at least one that select from cotton and wool.
15. devices for the treatment of material (100,400A, 400B, 400C, 400D, 400E, 400F, 400G), comprising:
Two isolated electrode (e1/e2; 212/214; 412/414), for producing plasma at processing region (124);
One or more laser instruments (130), for one or more light beams (132) of correspondence are directed to processing region, with plasma and processed material at least one interaction.
16. devices according to claim 15, wherein, described two isolated electrodes (e1/e2) comprise the first roller and second roller (412/414), and comprise:
(Fig. 4 A, 4B, 4F) the 3rd roller and the 4th roller (416/418), it is arranged near described the first roller and second roller, and at the first roller, second roller, the 3rd roller and the 4th roller (412,414,416,418) between outer surface, form half airtight chamber (440), for limiting described processing region (124) and for comprising plasma.
17. devices according to claim 16, wherein:
At least one in (Fig. 4 F) the 3rd roller and the 4th roller (436,438) comprises metal outer (437,439).
18. according to claim 15 to the device described in any one in 17, and wherein, described two isolated electrodes (e1/e2) comprise the first roller and second roller (412/414), and comprise:
(Fig. 4 C) shielding part (420), it arranges to limit chamber (440) around described the first roller and second roller (412,414).
19. according to claim 15 to the device described in any one in 18, also comprises with at least one in lower component:
(Fig. 4 D, 4E) nozzle (322,422), it is for delivery of the precursor material of liquid, solid-state or atomised form; And
(Fig. 3) nozzle (326), it is for being assigned to processed material by fine finishining material (327).
20. according to claim 15 to the device described in any one in 19, wherein:
(Fig. 4 G) described two isolated electrodes (e1/e2) comprise the first plate and the second plate (452,454).
21. purposes according to claim 15 to the device described in any one in 20, it is for the treatment of fabric substrate.
22. purposes according to claim 21, wherein, described fabric substrate is synthetic textiles material.
23. purposes according to claim 22, wherein, described synthetic textiles material is polyester.
24. purposes according to claim 21, wherein, described base material is organic material.
25. purposes according to claim 24, wherein, described organic material is at least one that select from cotton and wool.
26. by the textile material obtaining according to the method described in any one in claim 1 to 14.
27. generate the method for the plasma of material processed: comprising:
At least two kinds of different energy sources that combination is selected from high voltage, plasma, laser, UV lamp and pulse microwave electron cyclotron resonace (ECR).
28. methods according to claim 27, wherein:
One of described at least two kinds of different energy sources generate atmospheric pressure (AP) plasma.
29. methods according to claim 27, wherein:
An energy source is plasma; And
Another energy source is the laser beam being directed in plasma.
30. according to the method described in claim 27 or 28, wherein:
Described laser beam is directed on processed material.
31. according to the method described in any one in claim 27 to 30, wherein:
Described plasma is provided by plasma nozzle.
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