CN103433261A - Plasma cleaning auxiliary device for components and parts - Google Patents
Plasma cleaning auxiliary device for components and parts Download PDFInfo
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- CN103433261A CN103433261A CN2013103686954A CN201310368695A CN103433261A CN 103433261 A CN103433261 A CN 103433261A CN 2013103686954 A CN2013103686954 A CN 2013103686954A CN 201310368695 A CN201310368695 A CN 201310368695A CN 103433261 A CN103433261 A CN 103433261A
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Abstract
The invention relates to a plasma cleaning auxiliary device for components and parts. The bottom of a frame (2) is connected with a screen mesh (3) to serve as the bottom of a tray, a partition plate (4) is arranged in the middle of the frame (2) to divide the tray into two areas, and 704 or 705 silica gel (3a) is coated on the screen mesh (3) in one area. When the plasma cleaning auxiliary device is used, an element (4) cleaned in a double-side mode is arranged on the screen mesh (3) on the left area, an element (5) cleaned in a single-side mode is arranged on the silica gel (3a) on the right area, and finally a cleaning device is arranged into a plasma cleaning machine to be cleaned. The plasma cleaning auxiliary device has the advantages that by means of the action of leakage holes of the screen mesh, plasma can bombard the elements from all sides, and the cleaning efficiency is remarkably improved. The screen mesh can dredge and disperse airflow to prevent the elements from being blown by the airflow, piled and rubbed. The silica gel can absorb the components and the parts to prevent the components and the parts from being blown by the airflow, piled and rubbed. Compared with a method using a blue film or a UV film to fix the elements, the plasma cleaning auxiliary device removes a special film shifting machine and a special ultraviolet light machine and saves cleaning cost.
Description
Technical field
The present invention relates to electronic product and manufacture field, relate in particular to the front plasma washing equipment of components and parts assembling of microelectronic product.
Background technology
Plasma cleaning technique is mainly to utilize the active plasma with certain energy, and cleaned material is carried out to physical bombardment and chemical reaction double action, makes the cleaned material surface mass become particle and gaseous material, through vacuumizing discharge, and reaches the cleaning purpose.Bleeding in the plasma cleaning process, inflation and Ions Bombardment and chemical reaction are main process.
The assembling circuit of highly reliable credit rating, for improving the assembling reliability, need to adopt the plasma cleaning method to remove the solder side oxidation to components and parts (being mainly dead terminal electrode member and active device bare chip) contact resistance or the voidage of/welding bonding to reduce before assembling.And along with the raising of hybrid circuit integrated level, the size of components and parts is used more and more less, the passive element minimum dimension reaches 0201 type, the bare chip minimum dimension has reached 0.2 ㎜ * below 0.2 ㎜, there is a following difficult problem in the conventional plasma cleaning of small-sized component: 1. components and parts are lightweight, easily by air-flow, blown off, overturn or pile up, not reaching cleaning performance, and (as discrete bare chip) rubs wound mutually easily to cause fallible component; 2. two-sided cleaning components and parts (as most dead terminal electrode members), because of plasma can not with fine contact the in components and parts bottom surface (with the real end, holding the contact-making surface of dish), thereby can not carry out the bottom surface cleaning, caused cleaning efficiency low; 3. single face cleaning element (as discrete bare chip eutectic solder side or bonding face), when real bottom tray is placed, blow because of inlet air flow, is difficult to carry out not damaged and fixes.
Current way mainly contains two kinds, one, be the transhipment of strengthening components and parts, store control, the inventory reduction T/A, to reduce oxidation.This kind of way is to put prevention first substantially, but is difficult to fundamentally stop oxidative phenomena, particularly for the high reliability circuit, can cause often that parameters precision is poor or yield rate is low.In addition, also can cause the increase of the costs such as transhipment, storage; Two, adopt fixedly components and parts of blue film, UV film or gel box during plasma cleaning, the method is components and parts effectively fixedly, as elements such as bare chip or termination electrode electric capacity, resistors, but there is following problem: 1. adopt film to fix, for the easy damaged element, as bare chip etc., after completing, cleaning needs special group film machine and ultraviolet ray machine scraper element, cause to unload and get the increase of element cost, adopt gel box to fix, gel box is made complexity, purchase cost is higher; 2. for the termination electrode element of the two-sided cleaning of needs, because plasma can not penetrate rete, can only carry out the single face cleaning, cleaning efficiency is low.
Summary of the invention
The object of the present invention is to provide a kind of isoionic cleaning servicing unit of high reliability assembling circuit components and parts of realizing, this device has overcome plasma cleaning process small-medium size components and parts easy damaged, cleaning efficiency is low or clean the high in cost of production shortcoming.
To achieve these goals, the present invention adopts following technical scheme:
A kind of components and parts plasma cleaning servicing unit, comprise the pallet that frame and bottom bracket form, and it is characterized in that: the frame bottom connects silk screen trying to get to the heart of a matter as pallet.
Described support, frame can be metal, plastics or bezel;
Described silk screen adopts stainless steel cloth, polyester net or the nylon mesh of certain order number.
On the basis of technique scheme, the technical scheme of following progress can be arranged:
The frame middle part arranges one dividing plate pallet is divided into to two zones.
Adopt 704 or 705 silica gel on silk screen in a zone of pallet, be coated on the surface of silk screen in this zone.
Perhaps do not add dividing plate, the part on the pallet silk screen adopts 704 or 705 silica gel, is coated on the surface of this part silk screen.
When the flat boards such as adopting metal, pottery, glass, plastics of trying to get to the heart of a matter of pallet, try to get to the heart of a matter and also can apply 704 or 705 silica gel, arrived harmless fixation.
The invention has the beneficial effects as follows: 1. stainless steel, polyester or nylon mesh etc. are made the container of basetray, when plasma cleaning, effect due to small opening, plasma not only can be from positive, side bombardment element, can also in the tray back small opening, bombard element, and fully contact and occur to clean chemical reaction with the element all surface, significantly improve cleaning efficiency; Small opening can be dredged diffusing air current, prevents that element from being blown by air-flow, removes, piles up, and avoids element to rub mutually wound.2. adopt the silica gel such as 704,705, smooth, be applied in tray bottom equably, during plasma cleaning, the minute aperture of Silica Surface absorption components and parts, prevent that the single face cleaning element such as chip from being blown by air-flow, avoids piling up and mutually rubbing wound; With respect to blue film or UV film retaining element, do not need special group film machine and ultraviolet ray machine, save and clean cost.
The accompanying drawing explanation
Fig. 1 is structure chart of the present invention;
Fig. 2 is the structure chart that the present invention increases dividing plate;
Fig. 3 is the schematic diagram of application examples one of the present invention;
Fig. 4 is the cutaway view of Fig. 2.
The specific embodiment
Embodiment mono-:
A kind of components and parts plasma cleaning servicing unit overall structure provided by the invention is as shown in Figure 1:
Comprise by support 1, rectangular shaped rim 2,3 pallets that form of trying to get to the heart of a matter.Wherein, support 1 is by screw thread or gluingly with frame 2, is connected, plays a supportive role, and the stainless steel cloth 3 of certain order number is connected with frame 2 by the network process that stretches tight as trying to get to the heart of a matter, bottom formation with the pallet of silk screen.
Embodiment bis-:
As shown in Figure 2 and Figure 3, one dividing plate 2a also can be set at frame 2 middle parts pallet is divided into to two zones, zone retains silk screen 3 does and tries to get to the heart of a matter, and tries to get to the heart of a matter on silk screen 3 and adopt 704 or 705 silica gel 3a in another zone, smooth, be applied on silk screen equably.
Fig. 4 is that the present invention adopts the cleaning device shown in Fig. 2 to hold and clean the schematic diagram of components and parts.
During use, at first will need the element 4 of two-sided cleaning to be placed on the silk screen 3 of left area, be spread in a single layer, and avoid element to pile up and the phase mutual friction; Then the silica gel 3a that single face cleaning element 5 is put into to zone, the right is upper, is spread in a single layer, and avoids element to pile up and the phase mutual friction.Then cleaning device of the present invention is put into to plasma cleaner, through bleeding, inflation and Ions Bombardment and chemical reaction complete cleaning process, after adopting flexible tweezers after cleaning level firmly being touched chip gently, it is stand-by that the gripping chip is put into formulation Sheng film magazine, after the termination electrode element is directly imported to contain film magazine stand-by, complete whole cleaning process.
Note also the use compliant tool during placing element, prevent from clamping lesion element while picking and placeing.During cleaning, whole device is put into to plasma cleaner, clean by normal operation sequence or parameter, during cleaning, due to the effect of silk screen small opening and the effect of silica gel absorption power, can reach efficient, not damaged element cleaning.After cleaning completes, for two-sided cleaning element, can directly from cleaning device, pour out, for circuit, bonding or welding, to the single face cleaning element, can pass through flexible tweezers, after laterally touching element, and direct gripping chip, the bonding or welding for circuit.Finally complete whole cleaning process.
Above-described embodiment is only better embodiment of the present invention; describe technical conceive of the present invention and essential implementation in detail; protection scope of the present invention is limited; all any simple modification that Spirit Essence is done according to the present invention and equivalent structure transformation or modification, within all should being encompassed in protection scope of the present invention.
Claims (4)
1. a components and parts plasma cleaning servicing unit, comprise the pallet that frame (2) and bottom bracket (1) form, and it is characterized in that: frame (2) bottom connects silk screen (3) trying to get to the heart of a matter as pallet.
2. a kind of components and parts plasma cleaning servicing unit according to claim 1, is characterized in that: in the middle part of frame (2), one dividing plate (4) is set pallet is divided into to two zones.
3. a kind of components and parts plasma cleaning servicing unit according to claim 2, is characterized in that: adopt 704 or 705 silica gel (3a) on the silk screen (3) in a zone of pallet, be coated on the surface of silk screen in this zone (3).
4. a kind of components and parts plasma cleaning servicing unit according to claim 1 is characterized in that: the part on pallet silk screen (3) adopts 704 or 705 silica gel (3a), is coated on the surface of this part silk screen (3).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310368695.4A CN103433261B (en) | 2013-08-22 | 2013-08-22 | A kind of components and parts plasma cleaning auxiliary device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310368695.4A CN103433261B (en) | 2013-08-22 | 2013-08-22 | A kind of components and parts plasma cleaning auxiliary device |
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| Publication Number | Publication Date |
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| CN103433261A true CN103433261A (en) | 2013-12-11 |
| CN103433261B CN103433261B (en) | 2016-06-29 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201310368695.4A Active CN103433261B (en) | 2013-08-22 | 2013-08-22 | A kind of components and parts plasma cleaning auxiliary device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105023830A (en) * | 2015-06-06 | 2015-11-04 | 锦州七七七微电子有限责任公司 | A plasma cleaning method applied in a production process of a metal-round-shell-packaged monolithic integrated circuit |
Citations (5)
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|---|---|---|---|---|
| JPH08162294A (en) * | 1994-12-08 | 1996-06-21 | Daido Steel Co Ltd | Plasma treatment apparatus |
| CN101478857A (en) * | 2008-01-04 | 2009-07-08 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma treatment apparatus |
| CN202320995U (en) * | 2011-11-18 | 2012-07-11 | 台州胜豪塑业有限公司 | Plastic tray |
| KR20130024534A (en) * | 2011-08-31 | 2013-03-08 | 이종관 | Water purifier having sterilization and cleaning function using plasma |
| CN203124332U (en) * | 2013-03-29 | 2013-08-14 | 申秀梅 | Washing equipment of operative instrument |
-
2013
- 2013-08-22 CN CN201310368695.4A patent/CN103433261B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08162294A (en) * | 1994-12-08 | 1996-06-21 | Daido Steel Co Ltd | Plasma treatment apparatus |
| CN101478857A (en) * | 2008-01-04 | 2009-07-08 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma treatment apparatus |
| KR20130024534A (en) * | 2011-08-31 | 2013-03-08 | 이종관 | Water purifier having sterilization and cleaning function using plasma |
| CN202320995U (en) * | 2011-11-18 | 2012-07-11 | 台州胜豪塑业有限公司 | Plastic tray |
| CN203124332U (en) * | 2013-03-29 | 2013-08-14 | 申秀梅 | Washing equipment of operative instrument |
Non-Patent Citations (5)
| Title |
|---|
| 刘国诠等: "《色谱柱技术》", 31 July 2001, article "色谱柱技术", pages: 128-129 * |
| 周宁琳: "《有机硅聚合物导论》", 31 May 2000, article "有机硅聚合物导论", pages: 112 * |
| 张国柱等: "等离子清洗技术", 《电机元件》, vol. 21, no. 4, 25 December 2001 (2001-12-25), pages 31 - 34 * |
| 张塍: "等离子清洗的应用与技术研究", 《电子工业专用设备》, no. 137, 10 June 2006 (2006-06-10), pages 21 - 27 * |
| 陈诵英: "《吸附与催化》", 31 August 2001, article "吸附与催化", pages: 1-2 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105023830A (en) * | 2015-06-06 | 2015-11-04 | 锦州七七七微电子有限责任公司 | A plasma cleaning method applied in a production process of a metal-round-shell-packaged monolithic integrated circuit |
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| Publication number | Publication date |
|---|---|
| CN103433261B (en) | 2016-06-29 |
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