CN103376343B - A kind of removable die opening electron gun system for high current electron beam analyzer - Google Patents
A kind of removable die opening electron gun system for high current electron beam analyzer Download PDFInfo
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- CN103376343B CN103376343B CN201210132572.6A CN201210132572A CN103376343B CN 103376343 B CN103376343 B CN 103376343B CN 201210132572 A CN201210132572 A CN 201210132572A CN 103376343 B CN103376343 B CN 103376343B
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Abstract
The invention discloses a kind of removable die opening electron gun system for high current electron beam analyzer, comprise a main vacuum cavity and the electron gun being positioned at main vacuum cavity, described main vacuum cavity transverse horizontal is settled.Described electron gun system also comprises a concentric shafts assembly, and it inserts from the rear end level of described main vacuum cavity, and its one end is positioned at described main vacuum cavity, and the other end extends described main vacuum cavity) outward.Described electron gun comprises an anode, a negative electrode and a grid, and described negative electrode and described grid are arranged on described concentric shafts assembly.The present invention can realize spacing independent regulation in heat survey process of each electrode of high current electron gun system, can obtain optimized electronic gun system geometric parameter by Optimal Experimental design, this becomes than present analysis device electron gun system, and save time in hundred times of ground, human and material resources.Further, electron gun of the present invention can be added to 100kV, and laterally can access in large-scale high current electron beam analyzer and use.
Description
Technical field
The invention belongs to analysis and the field of measuring technique of microwave vacuum device electronic optical texture, be specifically related to a kind of laboratory apparatus of the analysis for microwave vacuum device electronic optical texture, particularly a kind of removable die opening electron gun system for high current electron beam analyzer.
Background technology
Microwave device refers to the device being operated in microwave band (300 ~ 30000 megahertz).Microwave device is divided into microwave electron tube, microwave semiconductor device, microwave integrated circuit and Microwave Power Module by the difference of its principle of work and power, material therefor and technique.Microwave electron tube comprises klystron, travelling wave tube, magnetron, backward wave tube, convolution visitor, Virtual Cathode Oscillators etc., its utilize electronics to move in a vacuum and with peripheral circuit interact produce vibrate, amplify, the various function such as mixing.High current electron beam the Electron-Optics Analysis instrument is for the great significance for design of microwave electron tube, and the electron gun system of this analyzer is its important component part.
Fig. 1 is the part-structure figure of traditional high current electron beam the Electron-Optics Analysis instrument for microwave electron tube.As seen from Figure 1, described high current electron stream the Electron-Optics Analysis instrument comprises electron gun system 1, and electron gun system 1 for generation of high current electron beam, and incides electron drift pipe 2.And electron gun system 1 and electron drift pipe 2 are longitudinally erects setting, and electron drift pipe 2 is arranged on the top of electron gun system 1, and electron gun system 1 launches high current electron beam to top.
As shown in Figure 2, electron gun system 1 comprises electron gun, main vacuum cavity, pumped vacuum systems, external tapping, high-voltage feedback power head, heater, ceramic ring, cathode heater lead-in wire etc.Electron gun comprises grid, negative electrode, anode, and negative electrode, heater, grid are fixed on the bottom of main vacuum chamber by ceramic ring, and make it to insulate with the locular wall of main vacuum chamber.Cathode heater lead-in wire draws main vacuum cavity by the high-voltage feedback power head bottom main vacuum cavity, and grid and negative electrode are idiostatic structures.High-voltage feedback power head only can withstand voltage about 10kV; Anode head component is placed on another large flange dish at main vacuum cavity top.Negative electrode Zhiyang pole span from, grid to cathode distance is all fixing, is supported that the length of ring determines by the transition of negative electrode, grid.
The shortcoming of traditional electron gun system is:
One, the anode-cathode distance that change any one electrode all must stop testing the transition member waited for and ressemble applicable length under heat survey state.This process will reach more than three days, and the test that will complete optimization electron gun system electro-optical performance needs to devote considerable time, human and material resources;
They are two years old, it can not access large-scale high current electron beam the Electron-Optics Analysis instrument as parts, directly on it, assemble large-scale electromagnetic focusing system again and electron beam energy-dispersive analysis system is just difficult to achieve, so that high current electron beam the Electron-Optics Analysis instrument for a long time does not all carry out to the electron beam transmission performance of electron beam in electromagnetic focusing situation, the analysis that can fall apart;
They are three years old, because original electron beam analyzer can only use under the condition of modulator below high pressure 10kV, and the development of novel large power microwave vacuum device is all to high voltage, high power future development, analyzer old so just can not simulate the state that about 20-100kV electron beam has obvious relativistic effect, the authenticity of its simulation is just had a greatly reduced quality, and just has a strong impact on the quality of electro-optic structure (comprising electron gun system) designed reliability and microwave vacuum device.
Summary of the invention
(1) technical problem that will solve
Technical problem to be solved by this invention makes up above-mentioned three defects that the high current electron beam the Electron-Optics Analysis instrument of fixing electron gun system is longitudinally erect in traditional use, that is: change electrode spacing difficulty, time and effort consuming; Analyzer can not be sunk as accessed large-scale high current electron beam electronic light as parts; Can not simulate the high current electron beam of 20 ~ 100kV.
(2) technical scheme
For solving the problems of the technologies described above, the present invention proposes a kind of electron gun system for high current electron beam analyzer, comprise a main vacuum cavity and the electron gun being positioned at this main vacuum cavity, described main vacuum cavity transverse horizontal is settled, and comprising a front end and a rear end in the horizontal direction, the high current electron beam that described electron gun produces is from the described rear end of described main vacuum cavity to described front end emission.
According to a specific embodiment of the present invention, described electron gun system also comprises a concentric shafts assembly, and it inserts from the rear end level of described main vacuum cavity, and its one end is positioned at described main vacuum cavity, and the other end extends outside described main vacuum cavity.
Described electron gun comprises an anode, a negative electrode and a grid, and described negative electrode and described grid are arranged on described concentric shafts assembly.
According to a specific embodiment of the present invention, described anode is fixed on the front end of described main vacuum cavity by an anode fixture.
According to a specific embodiment of the present invention, described concentric shafts assembly can make described negative electrode and described grid carry out moving and locating along the axis of concentric shafts assembly respectively.
According to a specific embodiment of the present invention, described main vacuum cavity comprises an observation window, and it is for observing and measure the distance of described negative electrode and grid.
According to a specific embodiment of the present invention, described concentric shafts assembly comprises concentric shafts and the outer concentric shafts of grid in negative electrode, is nested in described negative electrode inside and outside concentric shafts and the outer concentric shafts of described grid.
According to a specific embodiment of the present invention, in described negative electrode, concentric shafts is positioned at one end of main vacuum cavity, for settling described negative electrode; The outer concentric shafts of described grid is positioned at one end of main vacuum cavity, for settling described grid.
According to a specific embodiment of the present invention, described negative electrode is fixed on concentric shafts in negative electrode by a cathodic ceramic ring, and described grid is fixed on the outer concentric shafts of grid by a grid ceramic ring.
According to a specific embodiment of the present invention, described electron gun system also comprises an optical table, and described optical table is positioned at the outside of described main vacuum cavity, and is positioned at the below of described concentric shafts assembly, for supporting and locating described concentric shafts assembly.
According to a specific embodiment of the present invention, this optical table comprises negative electrode optical table and grid optical table, it is respectively used to support concentric shafts and the outer concentric shafts of grid in described negative electrode, and make it axially move horizontally respectively, further, described negative electrode optical table is arranged on described grid optical table.
(3) beneficial effect
One, electron gun system of the present invention goes for dissimilar high current electron beam the Electron-Optics Analysis instrument, so versatility of the present invention is wide;
They are two years old, electron gun system of the present invention adopts transversary except being used alone, can also access large-sized transversal high current electron beam analyzer further to the electron beam formation of electron gun system as parts, transmitting procedure carries out global test, and can test electron beam Energy distribution;
Its three, electron gun system of the present invention can reach 1 × 10
-6pa condition of high vacuum degree, and testing from a few hectovolt to ten ten thousand volts of high voltage modulator voltages, can detect that microwave vacuum device relativistic effect in development at present affects situation to electron beam performance;
They are four years old, the present invention can realize spacing independent regulation in heat survey process of each electrode of high current electron gun system, can obtain optimized electronic gun system geometric parameter by Optimal Experimental design, this becomes than present analysis device electron gun system, and save time in hundred times of ground, human and material resources;
Its five, the process structure problem of the electro-optical performance defect that the present invention can exist some microwave vacuum device of producing and unstable properties be carried out heat and be surveyed experiment and dynamical system is simulated, to determine solution and measures.
Accompanying drawing explanation
Fig. 1 is the part-structure schematic diagram of traditional high current electron beam the Electron-Optics Analysis instrument;
Fig. 2 is the electron gun system schematic diagram of traditional high current electron beam the Electron-Optics Analysis instrument;
Fig. 3 is the structural representation of the electron gun system of high current electron beam the Electron-Optics Analysis instrument of the present invention;
Fig. 4 is that schematic diagram is looked on a left side for the electron gun system of high current electron beam the Electron-Optics Analysis instrument of the present invention;
Fig. 5 is the schematic diagram of the concentric shafts assembly of the electron gun system of high current electron beam the Electron-Optics Analysis instrument of the present invention;
Fig. 6 is the close-up schematic view of the concentric shafts assembly of the electron gun system of high current electron beam the Electron-Optics Analysis instrument of the present invention;
Fig. 7 is the close-up schematic view of the anode fixture of the electron gun system of high current electron beam the Electron-Optics Analysis instrument of the present invention.
Description of reference numerals in Fig. 3 ~ 7 is as follows:
1. observation window, 2. high-voltage feedback power system, 3. high-vacuum exhaust system, 4. concentric shafts in negative electrode, 5. the outer concentric shafts of grid, 6. rear port large flange dish, 7. anode, 8. negative electrode, 9. grid, 10. cathodic ceramic ring, 11. grid ceramic rings, large flange dish before 12., 13. negative electrode optical tables, 14. grid optical tables, concentric shafts servomotor in 15. negative electrodes, the outer concentric shafts motion servo motor of 16. grids, 17. low voltage feeder heads, 18. front ports, 19. anodized insulation ceramic rings, 20. 3 extra-high voltage feed heads, 21. 4 extra-high voltage feed heads, 22. high vacuum valves, 23. vacuum pipes, 24. mechanical pumps, 25. molecular pumps, 26. ionic pumps, 301. main vacuum cavities, 302. concentric shafts assemblies, 303. anode fixtures, 304. support, 305. optical table, 306. external tapping.
Embodiment
For making the object, technical solutions and advantages of the present invention clearly understand, below in conjunction with specific embodiment, and with reference to accompanying drawing, the present invention is described in further detail.
Fig. 3 is the structural representation of the electron gun system of the high current electron beam the Electron-Optics Analysis instrument of one embodiment of the present of invention, Fig. 4 is that schematic diagram is looked on a left side for this electron gun system, Fig. 5 is the schematic diagram of the concentric shafts assembly of this electron gun system, Fig. 6 is the concentric shafts assembly close-up schematic view of this electron gun system, and Fig. 7 is the close-up schematic view of the anode fixture of this electron gun system.
From Fig. 3 ~ 7, the electron gun system of high current electron beam the Electron-Optics Analysis instrument of the present invention comprises a main vacuum cavity 301 and is positioned at the electron gun of main vacuum cavity 301, described main vacuum cavity 301 is circular cylindrical cavities, and transverse horizontal is settled, the two ends in the horizontal direction of circular cylindrical cavity are called front-end and back-end, in figure 3, left part is front end, and right part is rear end.Described concentric shafts assembly 302 inserts from the rear end level of described main vacuum cavity 301, and the axle center of concentric shafts assembly 302 is concentric with the axle center of main vacuum cavity 301.
According to the present invention, the front end of main vacuum cavity 301 comprises an anode 7, and described anode 7 is fixed on the front end of described main vacuum cavity by an anode fixture 303.
According to the present invention, described main vacuum cavity 301 comprises an observation window 1, and it is for observing and measure the distance of described negative electrode 8 and grid 9.
Described main vacuum cavity 301 inside also comprises a high-voltage feedback power device 2, and according to a preferred embodiment of the present invention, it is become by the high-voltage feedback power head group of two three poles or four poles high frequency tolerant modulation voltage (such as 100kV).
In addition, the inwall of described main vacuum cavity 301 is also provided with circulating water cooling system, and it is for carrying out temperature control to electron gun system, make it can not in working order time overheated.
Described main vacuum cavity 301 also comprises a front port 18, and it is for being connected with the measurement or analytical system of electron gun system outside, and it is positioned at the front end of described main vacuum cavity 301.
Described main vacuum cavity 301 also comprises a front port large flange dish 12, and it is for being fixed on the front end of described main vacuum cavity 301 by described anode fixture 303.
The true cavity 301 of described master also comprises a rear port large flange dish 6, and it is for being fixed on the rear end of described main vacuum cavity 301 movably by horizontal axis by described concentric shafts assembly 302.
Described concentric shafts assembly 302 is provided with a negative electrode 8 and a grid 9, and described anode 7, negative electrode 8, grid 9 form electron gun, and for generation of high current electron beam, and forward end is launched.According to the present invention, described concentric shafts assembly 302 can make negative electrode 8 and grid 9 carry out moving and locating along the axis of concentric shafts assembly 302 respectively.
Specifically, described concentric shafts assembly 302 comprises concentric shafts 4 in negative electrode, the outer concentric shafts 5 of grid.Be nested inside and outside concentric shafts 4 and the outer concentric shafts 5 of grid in described negative electrode, namely as shown in Figure 3 and Figure 5, the outer concentric shafts 5 of grid is enclosed within the outside of concentric shafts 4 in negative electrode.In described negative electrode, concentric shafts 4 and the outer concentric shafts 5 of grid have two ends all in the horizontal direction as previously mentioned, and one end is inserted in described main vacuum cavity 301, the other end extends outside described main vacuum cavity, and concentric shafts 4 is positioned at one end of main vacuum cavity 301 for settling described negative electrode 8 in described negative electrode, the outer concentric shafts 5 of described grid is positioned at one end of main vacuum cavity 301 for settling described grid 9.
Described grid is outer uses the high vacuum wavy metal seal of tube between concentric shafts 5 and the described rear port large flange dish 6 of described main vacuum cavity 301, also uses the high vacuum wavy metal seal of tube in described negative electrode between concentric shafts 4 and the outer concentric shafts 5 of described grid.
According to a preferred embodiment of the present invention, described negative electrode 8 is fixed on one end of concentric shafts 4 in negative electrode by a cathodic ceramic ring 10; Described grid 9 is fixed on one end of the outer concentric shafts 5 of grid by a grid ceramic ring 11.Described negative electrode 8 and grid 9 are all connected in the respective electrode of the high-voltage feedback power device of described main vacuum cavity 301 by lead-in wire, and described lead-in wire periphery is all coated with vacuum ceramic material.The external diameter of described grid ceramic ring 11 is greater than described cathodic ceramic ring 10, and two vacuum ceramic rings can withstand voltage high pressure (such as 100kV).
Described anode fixture 303 for being fixed on the device of the leading inside of described main vacuum cavity 301 with insulating by anode 7.According to the present invention, as shown in Figure 5, anode fixture 303 comprises anodized insulation ceramic ring 19, and it is for insulating anode 7 and front large flange dish 12.In addition, there is the vacuum wire of little vacuum ceramic pipe by string, and by low voltage feeder head 17, anode 7 is drawn from main vacuum chamber.
Electron gun system of the present invention also comprises an optical table 305, and described optical table 305 is positioned at the outside of described main vacuum cavity 301, and is positioned at the below of described concentric shafts assembly 302, for supporting and locating described concentric shafts assembly 302.This optical table 305 comprises negative electrode optical table 13 and grid optical table 14, and it is respectively used to support concentric shafts 4 and the outer concentric shafts 5 of grid in described negative electrode, and makes it axially move horizontally respectively.
Wherein, described negative electrode optical table 13 is arranged on described grid optical table 14, negative electrode optical table 13 comprises concentric shafts servomotor 15 in negative electrode, grid optical table 14 comprises the outer concentric shafts servomotor 16 of grid, and in negative electrode, concentric shafts servomotor 15 and the outer concentric shafts servomotor 16 of grid lay respectively on described negative electrode optical table 13 and described grid optical table 14.
In described negative electrode, concentric shafts 4 and moving horizontally of the outer concentric shafts 5 of grid are controlled respectively by concentric shafts servomotor 15, the outer concentric shafts servomotor 16 of grid in the negative electrode of described optical table 305, according to the preferred embodiment of the present invention, the precision of its running fix is 0.05 millimeter.
In addition, according to electron gun system of the present invention also Bao Shouyi support, it is positioned at the below of described main vacuum cavity 301 and described optical table 305, and for supporting described main vacuum cavity 301 and described optical table 305.
Described electron gun system also comprises a high-vacuum exhaust system 3, and it is connected to described main vacuum cavity, and for vacuumizing described main vacuum cavity 301.According to a preferred embodiment of the present invention, it is made up of mechanical pump 24, molecular pump 25, ionic pump 26, high vacuum gate 22 and high vacuum pipe 23;
The foregoing describe the overall structure of electron gun system and the concrete structure of parts thereof of the high current electron beam the Electron-Optics Analysis instrument of one embodiment of the present of invention, the operation principle of the electron gun system of this embodiment of the present invention is also described according to said structure below, is beneficial to those skilled in the art and clearly understands the present invention.
According to the abovementioned embodiments of the present invention, electron drift pipe and electron beam sectional X-ray bremstrahlen detector is connected at the external tapping 306 of the electron gun system of high current electron beam the Electron-Optics Analysis instrument, or three-dimensional Faraday cup aperture scanner, and after carrying out sealed vacuum, start high vacuum exhausting apparatus 3, make the vacuum degree of main vacuum cavity 301 reach 1 × 10
-6after the pa order of magnitude, heat to negative electrode 8, make it progressively to be added to rated temperature value;
Then, first measure negative electrode 8, the swell increment of grid 9 after thermal expansion is stablized by the observation window 1 of described main vacuum cavity 301, by the outer concentric shafts servomotor 16 of grid of concentric shafts servomotor 15 in the negative electrode of concentric shafts in control cathode 4, grid outer concentric shafts 5, the distance of negative electrode 8 and anode 7, negative electrode 8 are adjusted with the distance of grid 9 again, make it to reach former Computer Design value or desirable design load.In this embodiment, the range accuracy of adjustment location is at 0.05 millimeter.
Then, receive on grid 9 after modulation pulse negative high voltage being received negative electrode 8 and corresponding dividing potential drop respectively by high-voltage feedback power head; Now electron beam electro-optical performance is detected by described X ray bremstrahlen detector or three-dimensional Faraday cup aperture scanning means, make by regulate yin and yang pole span organize result more from, grid cathode distance, best experiment size under finding out this state again, the structure changing electron gun on this basis is further optimized experiment, the electron gun be optimized and electron-optical system optimal design structure.
Advantage of the present invention is: the above-mentioned whole process high current electron beam the Electron-Optics Analysis instrument of erectting fixing electron gun system more longitudinal than traditional use become hundred, on save time thousandfold, human and material resources.
The present invention can access large-sized transversal high vacuum dynamic high current electron beam the Electron-Optics Analysis instrument as parts from described external tapping 306, carries out having electromagnetic focusing system and electron beam detection system of faling apart to remove to measure the transmission performance of high current electron beam and electron beam and to fall apart characteristic; The electron-optical system design that the present invention can use modulation high frequency or pulse voltage can carry out when having obvious relativistic effect to affect from a few hectovolt to 100,000 volts; These are that traditional longitudinal fixing electron gun system high current electron beam the Electron-Optics Analysis device of use cannot be accomplished.
Above-described specific embodiment; object of the present invention, technical scheme and beneficial effect are further described; be understood that; the foregoing is only specific embodiments of the invention; be not limited to the present invention; within the spirit and principles in the present invention all, any amendment made, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (7)
1. the electron gun system for high current electron beam analyzer, comprise a main vacuum cavity (301) and be positioned at the electron gun of this main vacuum cavity (301), described electron gun comprises an anode (7), a negative electrode (8) and a grid (9), described main vacuum cavity (301) comprises one for described anode (7) being drawn described main vacuum cavity (301) low voltage feeder head (17) outward, it is characterized in that:
Described main vacuum cavity (301) transverse horizontal is settled;
Described electron gun system also comprises a concentric shafts assembly (302), its level inserts described main vacuum cavity (301), further, its one end is positioned at described main vacuum cavity (301), and the other end extends described main vacuum cavity (301) outward;
Described negative electrode (8) and described grid (9) are arranged on described concentric shafts assembly (302), and described concentric shafts assembly (302) carries out moving and locating along the axis of concentric shafts assembly (302) for making described negative electrode (8) and described grid (9) respectively;
Described concentric shafts assembly (302) comprises concentric shafts in negative electrode (4) and the outer concentric shafts (5) of grid, be nested inside and outside concentric shafts (4) and the outer concentric shafts (5) of described grid in described negative electrode, in described negative electrode, concentric shafts (4) is positioned at one end of main vacuum cavity (301), for settling described negative electrode (8); The outer concentric shafts (5) of described grid is positioned at one end of main vacuum cavity (301), for settling described grid (9).
2., as claimed in claim 1 for the electron gun system of high current electron beam analyzer, it is characterized in that, the vacuum degree of described main vacuum cavity (301) is 1 × 10
-6pa.
3., as claimed in claim 2 for the electron gun system of high current electron beam analyzer, it is characterized in that, described anode (7) is fixed on the front end of described main vacuum cavity (301) by an anode fixture (303).
4. as claimed in claim 2 for the electron gun system of high current electron beam analyzer, it is characterized in that, described main vacuum cavity (301) comprises an observation window (1), and it is for observing and measure the distance of described negative electrode (8) and grid (9).
5. as claimed in claim 2 for the electron gun system of high current electron beam analyzer, it is characterized in that, described negative electrode (8) is fixed on concentric shafts in negative electrode (4) by a cathodic ceramic ring (10), and described grid (9) is fixed on the outer concentric shafts (5) of grid by a grid ceramic ring (11).
6. as claimed in claim 2 for the electron gun system of high current electron beam analyzer, it is characterized in that, described electron gun system also comprises an optical table (305), described optical table (305) is positioned at the outside of described main vacuum cavity (301), and be positioned at the below of described concentric shafts assembly (302), for supporting and locating described concentric shafts assembly (302).
7. as claimed in claim 6 for the electron gun system of high current electron beam analyzer, it is characterized in that, this optical table (305) comprises negative electrode optical table (13) and grid optical table (14), it is respectively used to support concentric shafts (4) and the outer concentric shafts (5) of grid in described negative electrode, and make it axially move horizontally respectively, further, described negative electrode optical table (13) is arranged on described grid optical table (14).
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| CN201210132572.6A CN103376343B (en) | 2012-04-28 | 2012-04-28 | A kind of removable die opening electron gun system for high current electron beam analyzer |
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| CN201210132572.6A CN103376343B (en) | 2012-04-28 | 2012-04-28 | A kind of removable die opening electron gun system for high current electron beam analyzer |
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| CN103376343A CN103376343A (en) | 2013-10-30 |
| CN103376343B true CN103376343B (en) | 2015-11-04 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103760452B (en) * | 2014-02-20 | 2016-02-10 | 中国科学院电子学研究所 | For electronic gun heat measurement system and the monitoring bearing calibration thereof of electron beam analyser |
| CN104142225B (en) * | 2014-08-06 | 2016-11-09 | 中国科学院电子学研究所 | The small area fiber YAG probe detection device of high current electronics note |
| CN105977119B (en) * | 2016-07-12 | 2017-11-17 | 电子科技大学 | A kind of grided electron gun virtual anode method for determining position |
| CN106770430A (en) * | 2017-01-20 | 2017-05-31 | 中国科学院电子学研究所 | A kind of microwave tube electron gun swell increment measurement apparatus and method |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1235366A (en) * | 1998-05-09 | 1999-11-17 | Eev有限公司 | Electron gun arrangements |
| CN1507001A (en) * | 2002-12-09 | 2004-06-23 | 中华映管股份有限公司 | CRT electron gun with gradually reduced electron beam hole size |
| CN2735536Y (en) * | 2004-09-24 | 2005-10-19 | 中国科学院上海应用物理研究所 | Cathode arrangement for strong current electronic gun |
| CN201877391U (en) * | 2010-12-10 | 2011-06-22 | 安徽华东光电技术研究所 | Millimeter wave travelling wave tube electron gun structure |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US6798155B2 (en) * | 2002-05-15 | 2004-09-28 | Lg. Philips Display Co., Ltd. | Color image display device |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1235366A (en) * | 1998-05-09 | 1999-11-17 | Eev有限公司 | Electron gun arrangements |
| CN1507001A (en) * | 2002-12-09 | 2004-06-23 | 中华映管股份有限公司 | CRT electron gun with gradually reduced electron beam hole size |
| CN2735536Y (en) * | 2004-09-24 | 2005-10-19 | 中国科学院上海应用物理研究所 | Cathode arrangement for strong current electronic gun |
| CN201877391U (en) * | 2010-12-10 | 2011-06-22 | 安徽华东光电技术研究所 | Millimeter wave travelling wave tube electron gun structure |
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