CN103357633A - Cleaning method for thin film solar cell glass substrates - Google Patents
Cleaning method for thin film solar cell glass substrates Download PDFInfo
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- CN103357633A CN103357633A CN2013102995039A CN201310299503A CN103357633A CN 103357633 A CN103357633 A CN 103357633A CN 2013102995039 A CN2013102995039 A CN 2013102995039A CN 201310299503 A CN201310299503 A CN 201310299503A CN 103357633 A CN103357633 A CN 103357633A
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Abstract
A cleaning method for thin film solar cell glass substrates comprises the following steps: (1) conducting cleaning on glass substrates by alkaline detergent solution; (2) conducting cleaning on the cleaned glass substrate by deionized water; (3) conducting ultrasonic cleaning on the glass substrate by the alkaline detergent solution; (4) conducting cleaning on the alkaline detergent solution cleaned glass substrate by deionized water; (5) conducting ultrasonic cleaning on the glass substrate by the deionized water; (6) conducting ultrasonic cleaning on the glass substrate by sodium hydroxide solution; (7) conducting cleaning on the sodium hydroxide solution cleaned glass substrate by deionized water; (8) conducting ultrasonic cleaning on the glass substrate by the sodium hydroxide solution; (9) conducting cleaning on the glass substrate by deionized water; (10) drying the glass substrate, so as to obtain clean glass substrate, and the obtained clean glass substrate is used for preparing thin film solar cell. According to the cleaning method for thin film solar cell glass substrates, pinhole number on the electrode film is greatly decreased, the cleaning effect is good, the technology is simple and the cleaning cost is decreased, and the method is suitable for mass production.
Description
Technical field
The invention belongs to technical field of thin-film solar, be specifically related to a kind of cleaning method of thin-film solar cells substrate of glass, be particularly useful for CIGS thin-film solar cells technology of preparing.
Background technology
At present, the mainstream technology of solar cell is crystal silicon battery, and thin-film solar cells has adopted the inline technology of monolithic owing to can prepare at cheap matrix, and its assembly cost constantly descends; And thin-film solar cells low light level performance is good, and annual electricity generating capacity often is higher than crystal silicon battery.Therefore, thin-film solar cells has good development potentiality.Future, the development pattern that photovoltaic market will form crystal silicon cell and hull cell technology and deposit, the market share of thin film solar cell will progressively enlarge along with the increase of technology maturation, cost and BIPV demand.
CIGS (CIGS) thin-film solar cells have photoelectric transformation efficiency height, power benefit good, without the characteristics such as decline, radioresistance, life-span be long, with low cost, became in recent years the focus that people study solar cell.As the first operation in the copper indium gallium selenium solar cell preparation flow, the glass substrate cleanliness factor after the cleaning directly has influence on battery performance.The substrate of glass cleanliness factor is poor, can cause the binding ability of film and substrate to descend, pinhole number increases after the back electrode film forming, even the large tracts of land peeling phenomenon occurs in absorbed layer film forming and annealing process subsequently, has a strong impact on photoelectric transformation efficiency and the yield rate of copper indium gallium selenium solar cell.Traditional substrate of glass cleaning method uses the reagent such as acetone, ethanol, hydrogen peroxide, adopts the modes such as dry of toasting, and adsorbs easily dust in the environment after cleaning, and cleaning is complicated, and it is higher to clean cost, is unsuitable for large-scale production.
Summary of the invention
The cleaning method that the purpose of this invention is to provide a kind of thin-film solar cells substrate of glass; can effectively remove greasy dirt, particle, dust that glass basic surface adheres to; the sintering marking and organic pollution etc.; not only guarantee the cleannes of glass basic surface; significantly the pinhole number after the reduction thin film solar cell electrode rete film forming improve battery quality and yield rate, and technique is simple; the cleaning cost is low, is suitable for large-scale production.
For achieving the above object, the technical solution used in the present invention is:
A kind of cleaning method of thin-film solar cells substrate of glass may further comprise the steps:
Step (1): substrate of glass is scrubbed with alkaline cleaner solution;
Step (2): adopt deionized water that the substrate of glass after scrubbing is washed;
Step (3): the alkaline cleaner solution of employing carries out ultrasonic cleaning to substrate of glass;
Step (4): adopt the substrate of glass after deionized water is cleaned alkaline cleaner solution to wash;
Step (5): adopt deionized water that substrate of glass is carried out ultrasonic cleaning;
Step (6): the sodium hydroxide solution of employing carries out ultrasonic cleaning to substrate of glass;
Step (7): adopt deionized water that substrate of glass is washed;
Step (8): adopt deionized water that substrate of glass is carried out ultrasonic cleaning;
Step (9): adopt deionized water that substrate of glass is washed;
Step (10): dry up substrate of glass.
The cleaning method of above-mentioned thin-film solar cells substrate of glass, it is characterized in that, in the described step (1), when substrate of glass is scrubbed, the material of the scrubbing tool that adopts is nylon, utilize material to scrub substrate of glass for the scrubbing tool of nylon, can effectively remove oil stain on glass surface, large granular impurity.
The cleaning method of above-mentioned thin-film solar cells substrate of glass, it is characterized in that, it is characterized in that, in described step (2), (4), (7) and (9), use Fan spray head during deionized water rinsing, angle between the fan-shaped current two edges of ejection is 60 ゜～120 ゜, and intersection and the glass of fan-shaped flow plane and glass surface move perpendicular direction, and angle is 45 ゜～90 ゜ between fan-shaped flow plane and the glass surface.The current of Fan spray head ejection are fan-shaped, have increased the interaction of current and glass surface, effectively remove the granule foreign of glass surface.
The cleaning method of above-mentioned thin-film solar cells substrate of glass, in described step (1) and (3), alkaline cleaner solution neutral and alkali cleaning agent and deionized water volume ratio are 1:1～1:19, described alkaline cleaner is a kind of of commercially available prod.
The cleaning method of above-mentioned thin-film solar cells substrate of glass, in the described step (3), the frequency of ultrasonic cleaning is 28KHz, and cleaning water temperature is 40～60 ℃, and scavenging period is 3～15 minutes.In alkaline cleaner solution, use ultrasonicly, can by the effect of mechanical force, make dust and spot on the substrate of glass break away from glass basic surface.
The cleaning method of above-mentioned glass film solar battery glass substrate is characterized in that, in step (5) and (8), the frequency of ultrasonic cleaning is 40KHz, and cleaning water temperature is 40～60 ℃, and scavenging period is 3～15 minutes.Heating can be removed the organic pollution that glass surface adheres to; Utilize the deionized water ultrasonic cleaning can thoroughly remove the residual alkaline cleaning fluid of glass basic surface and sodium hydroxide solution, can guarantee that glass basic surface does not retain active ion, guarantee the long-term stability of depositional coating.
The cleaning method of above-mentioned glass film solar battery glass substrate, in step (6), the mass percent of NaOH is 0.5%～20% in the sodium hydroxide solution, solvent is deionized water, supersonic frequency is 40KHz, and cleaning water temperature is 40～60 ℃, and scavenging period is 3～20 minutes.Utilize sodium hydroxide solution to clean, can remove the most of impurity of glass basic surface and glass sintering impression.Useful result of the present invention is; utilize the pinhole number after the cleaning method of a kind of thin-film solar cells substrate of glass provided by the invention not only can significantly reduce the thin film solar cell electrode film forming; improve quality of forming film; improve battery efficiency and yield rate; and owing to do not need to use the reagent such as acetone, ethanol, hydrogen peroxide; also not baking drying waits the power consumption operation; only use cheap alkaline cleaning fluid and the sodium hydroxide solution of low concentration; therefore; technique is simple; cost is low, and is suitable for large-scale production.
Description of drawings
Fig. 1 is the cleaning method process chart of thin-film solar cells substrate of glass of the present invention;
Fig. 2 is for adopting the pin hole distribution situation figure behind the substrate of glass magnetron sputtering deposition Mo film after the cleaning in the embodiment of the invention 1.
The specific embodiment
The invention provides a kind of cleaning method of thin-film solar cells substrate of glass, below with reference to shown in Figure 1, the invention will be further described in conjunction with the embodiments, but following embodiment can not be in order to limit protection scope of the present invention.
Embodiment 1:
Step (1) is utilized nylon bruss to pick alkaline cleaner solution and substrate of glass is carried out positive and negative is scrubbed;
Step (2) is utilized Fan spray head, adopts deionized water that the substrate of glass of scrubbing is washed;
Step (3) adopts certain density alkaline cleaner solution that substrate of glass is carried out ultrasonic cleaning, and the volume ratio of cleaning agent and deionized water is 1:9 in the alkaline cleaner solution, and supersonic frequency is 28KHz, and cleaning water temperature is 50 ℃, and scavenging period is 5 minutes;
Step (4) is utilized Fan spray head, adopts deionized water that substrate of glass is washed;
Step (5) adopts deionized water that substrate of glass is carried out ultrasonic cleaning, and supersonic frequency is 40KHz, and cleaning water temperature is 50 ℃, and scavenging period is 5 minutes;
Step (6) adopts certain density sodium hydroxide solution that substrate of glass is carried out ultrasonic cleaning, and the sodium hydroxide solution mass percent concentration is 10%, and supersonic frequency is 40KHz, and cleaning water temperature is 50 ℃, and scavenging period is 10 minutes;
Step (7) is utilized Fan spray head, adopts deionized water that substrate of glass is washed;
Step (8) adopts deionized water that substrate of glass is carried out ultrasonic cleaning, and supersonic frequency is 40KHz, and cleaning is 50 ℃, and the time is 5 minutes;
Step (9), right substrate of glass is washed to utilize Fan spray head;
Step (10) dries up substrate of glass.
As shown in Figure 2, behind the substrate of glass magnetron sputtering deposition Mo film after cleaning in the employing embodiment of the invention 1, without obvious pin hole, rete is fine and close, satisfies thin-film solar cells preparation technology needs fully in the rete.
Embodiment 2:
Step (1) is utilized nylon bruss to pick alkaline cleaner solution substrate of glass is scrubbed;
Step (2) is utilized Fan spray head, adopts deionized water that the substrate of glass of scrubbing is washed;
Step (3) adopts certain density alkaline cleaner solution that substrate of glass is carried out ultrasonic cleaning, and the volume ratio of cleaning agent and deionized water is 1:5 in the alkaline cleaner solution, and supersonic frequency is 28KHz, and cleaning water temperature is 45 ℃, and scavenging period is 10 minutes;
Step (4) is utilized Fan spray head, adopts deionized water that substrate of glass is washed;
Step (5) adopts deionized water that substrate of glass is carried out ultrasonic cleaning, and supersonic frequency is 40KHz, and cleaning water temperature is 45 ℃, and scavenging period is 10 minutes;
Step (6) adopts certain density sodium hydroxide solution that substrate of glass is carried out ultrasonic cleaning, and the sodium hydroxide solution mass percent concentration is 15%, and supersonic frequency is 40KHz, and cleaning water temperature is 45 ℃, and scavenging period is 20 minutes;
Step (7) is utilized Fan spray head, adopts deionized water that substrate of glass is washed;
Step (8) adopts deionized water that substrate of glass is carried out ultrasonic cleaning, and supersonic frequency is 40KHz, and cleaning is 45 ℃, and the time is 10 minutes;
Step (9) is utilized Fan spray head, adopts deionized water that substrate of glass is washed;
Step (10) dries up substrate of glass.
Embodiment 3:
Step (1) is utilized nylon bruss to pick alkaline cleaner solution substrate of glass is scrubbed;
Step (2) is utilized Fan spray head, adopts deionized water that the substrate of glass of scrubbing is washed;
Step (3) adopts certain density alkaline cleaner solution that substrate of glass is carried out ultrasonic cleaning, and the volume ratio of cleaning agent and deionized water is 1:3 in the alkaline cleaner solution, and supersonic frequency is 28KHz, and cleaning water temperature is 55 ℃, and scavenging period is 3 minutes;
Step (4) is utilized Fan spray head, adopts deionized water that substrate of glass is washed;
Step (5) adopts deionized water that substrate of glass is carried out ultrasonic cleaning, and supersonic frequency is 40KHz, and cleaning water temperature is 55 ℃, and scavenging period is 3 minutes;
Step (6) adopts certain density sodium hydroxide solution that substrate of glass is carried out ultrasonic cleaning, and the sodium hydroxide solution mass percent concentration is 5%, and supersonic frequency is 40KHz, and cleaning water temperature is 55 ℃, and scavenging period is 8 minutes;
Step (7) is utilized Fan spray head, adopts deionized water that substrate of glass is washed;
Step (8) adopts deionized water that substrate of glass is carried out ultrasonic cleaning, and supersonic frequency is 40KHz, and cleaning is 55 ℃, and the time is 3 minutes;
Step (9) is utilized Fan spray head, adopts deionized water that substrate of glass is washed;
Step (10) dries up substrate of glass, utilizes the substrate of glass that cleans up to prepare copper indium gallium selenium solar cell.
The present patent application people has done detailed explanation and description in conjunction with Figure of description to embodiments of the invention; but those skilled in the art should understand that; above embodiment only is the preferred embodiments of the invention; detailed explanation is just in order to help the reader to understand better spirit of the present invention; and be not limiting the scope of the invention; on the contrary, any any improvement of doing based on invention spirit of the present invention all should drop within protection scope of the present invention.
Claims (7)
1. the cleaning method of a thin-film solar cells substrate of glass may further comprise the steps:
Step (1): substrate of glass is scrubbed with alkaline cleaner solution;
Step (2): adopt deionized water that the substrate of glass after scrubbing is washed;
Step (3): adopt alkaline cleaner solution that substrate of glass is carried out ultrasonic cleaning;
Step (4): adopt the substrate of glass after deionized water is cleaned alkaline cleaner solution to wash;
Step (5): adopt deionized water that substrate of glass is carried out ultrasonic cleaning;
Step (6): adopt sodium hydroxide solution that substrate of glass is carried out ultrasonic cleaning;
Step (7): adopt deionized water that substrate of glass is washed.
Step (8): adopt deionized water that substrate of glass is carried out ultrasonic cleaning.
Step (9): adopt deionized water that substrate of glass is washed.
Step (10): dry up substrate of glass.
2. the cleaning method of thin-film solar cells substrate of glass according to claim 1, it is characterized in that: in described step (1), when substrate of glass was scrubbed, the material of the scrubbing tool of employing was nylon.
3. the cleaning method of thin-film solar cells substrate of glass according to claim 1, it is characterized in that: in described step (2), (4), (7), (9), use Fan spray head during deionized water rinsing, angle between the fan-shaped current two edges of ejection is 60 ゜～120 ゜, fan-shaped flow plane and glass surface intersection and glass move perpendicular direction, and angle is 45 ゜～90 ゜ between fan-shaped flow plane and the glass surface.
4. the cleaning method of thin-film solar cells substrate of glass according to claim 1, it is characterized in that: in described step (1) and (3), alkaline cleaner solution neutral and alkali cleaning agent and deionized water volume ratio are 1:1～1:19, and described alkaline cleaner is a kind of of commercially available prod.
5. the cleaning method of thin-film solar cells substrate of glass according to claim 1, it is characterized in that: in described step (3), the ultrasonic cleaning frequency is 28KHz, and cleaning water temperature is 40～60 ℃, and scavenging period is 3～15 minutes.
6. the cleaning method of thin-film solar cells substrate of glass according to claim 1, it is characterized in that: in step (5) and (8), the frequency of ultrasonic cleaning is 40KHz, and cleaning water temperature is 40～60 ℃, and scavenging period is 3～15 minutes.
7. the cleaning method of thin-film solar cells substrate of glass according to claim 1, it is characterized in that, in step (6), the mass percent of NaOH is 0.5%～20% in the sodium hydroxide solution, solvent is deionized water, supersonic frequency is 40KHz, and cleaning water temperature is 40～60 ℃, and scavenging period is 3～20 minutes.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103680990A (en) * | 2013-12-30 | 2014-03-26 | 中国科学院上海硅酸盐研究所 | Method for using alkaline liquor to clean substrate used for preparing dye-sensitized solar cell |
| CN106334702A (en) * | 2016-10-24 | 2017-01-18 | 中山瑞科新能源有限公司 | Device capable of recycling TCO (transparent conductive oxide) glass automatically |
| CN106424057A (en) * | 2016-11-30 | 2017-02-22 | 合肥亿福自动化科技有限公司 | Automatic glass cleaning system |
| CN111299233A (en) * | 2019-12-17 | 2020-06-19 | 东莞市凯融光学科技有限公司 | Cleaning method of chalcogenide glass lens |
| CN112750735A (en) * | 2020-12-31 | 2021-05-04 | 阳光中科（福建）能源股份有限公司 | Perovskite solar cell FTO base belt cleaning device |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103680990A (en) * | 2013-12-30 | 2014-03-26 | 中国科学院上海硅酸盐研究所 | Method for using alkaline liquor to clean substrate used for preparing dye-sensitized solar cell |
| CN106334702A (en) * | 2016-10-24 | 2017-01-18 | 中山瑞科新能源有限公司 | Device capable of recycling TCO (transparent conductive oxide) glass automatically |
| CN106424057A (en) * | 2016-11-30 | 2017-02-22 | 合肥亿福自动化科技有限公司 | Automatic glass cleaning system |
| CN111299233A (en) * | 2019-12-17 | 2020-06-19 | 东莞市凯融光学科技有限公司 | Cleaning method of chalcogenide glass lens |
| CN112750735A (en) * | 2020-12-31 | 2021-05-04 | 阳光中科（福建）能源股份有限公司 | Perovskite solar cell FTO base belt cleaning device |
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Application publication date: 20131023 |