CN103279009A - Flexible ultraviolet light imprinting composite template and preparation method thereof - Google Patents
Flexible ultraviolet light imprinting composite template and preparation method thereof Download PDFInfo
- Publication number
- CN103279009A CN103279009A CN2013102344292A CN201310234429A CN103279009A CN 103279009 A CN103279009 A CN 103279009A CN 2013102344292 A CN2013102344292 A CN 2013102344292A CN 201310234429 A CN201310234429 A CN 201310234429A CN 103279009 A CN103279009 A CN 103279009A
- Authority
- CN
- China
- Prior art keywords
- siliceous
- sulfydryl
- monomer
- flexible
- potpourri
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Abstract
The invention provides a flexible ultraviolet light imprinting composite template and a preparation method thereof. The composite template adopts a three-layer structure and comprises a flexible supporting layer, a middle layer and a rigid structure layer, wherein the flexible supporting later is a low-elasticity-modulus polymer substrate; the middle layer is an ultraviolet light curing cross-linking agent of a mixture of a polyfunctionality organic sulfydryl monomer and a polyfunctionality organic olefin monomer; the rigid structure layer is an ultraviolet light curing cross-linking agent of a mixture of a polyfunctionality sulfydryl monomer containing silicon and a polyfunctionality olefin monomer containing silicon; and the surface of the rigid structure layer adopts a micro-nano imprinting structure. The lexible ultraviolet light imprinting composite template is cured and prepared in an ordinary laboratory environment, and vacuum or nitrogen protection is not required; when the ultraviolet light curing imprinting is performed, mechanical assistance is not required; and the composite template has the advantages as follows: the flexible template imprinting is self-adapted to the shape of the substrate, and the rigid template can duplicate a high-resolution nano-structure.
Description
Technical field
The present invention relates to a kind of flexible ultraviolet impressing composite shuttering and preparation method thereof, specifically a kind of flexible ultraviolet impressing composite shuttering based on sulfydryl-alkene photocrosslinkable mixture and preparation method thereof.
Background technology
The ultraviolet light curing nano stamping technique is little with fast, the required pressure of its moulding, become the stamping technique main flow gradually with the compatible good characteristics of conventional semiconductor processing.As a kind of pattern technology of preparing that is not subjected to photolithography limitation restriction, low cost, high resolving power, high yield, the ultraviolet light curing nano stamping technique is in fields such as biochip sensor, LED patterned substrate, subwavelength optical elements, become that price is relatively low, dependable performance, had the technology of preparing of volume production ability.
Impression block is one of key element of ultraviolet light curing nano stamping technique.Traditional ultraviolet light polymerization impression block adopts fused quartz to make, and the transparent material of this high rigidity is difficult to have large tracts of land superelevation flatness, thereby needs suitable impressed pressure to realize large area imprinting in the ultraviolet impressing process.Rigid template in use very easily produces cracked because defective, pressure are uneven, also the large tracts of land defective occurs because particle makes imprint result easily.
Flexible impression block then can overcome rigid template cracked shortcoming easily, and contacts with substrate formation general character in large area imprinting.The simplest flexible impression block is made based on the Sylgard184PDMS material of Corning company.But the PDMS template of this single layer structure can't loyalty copy high-precision configuration because elastic modulus is low excessively, and easy deformation under pressure.
Chinese patent CN201210471464.1 discloses a kind of nano impression composite shuttering and preparation method thereof, compound by plastic plate, low elastic modulus PDMS and high elastic modulus PDMS three-decker, making it both have soft template can deformation and carry out the advantage of large area imprinting, have hard template hardness height again, can copy the advantage of high-precision configuration.
CN200910108047.9 discloses a kind of nano-imprint stamp and preparation method thereof, the composite structure of this template is flexible substrates, adhesion promoting layer and polymeric layer, polymeric layer is realized solidifying based on the esters of acrylic acid photo-crosslinking, and flexible substrates can guarantee that nano-imprint stamp has good resistance to crushing.
Because the shortcoming that existing impression composite shuttering exists some to overcome: the PDMS preparation of heat curing is slow, can be because of the different structure replica bias that produce of thermal expansivity with caster, and the modulus of existing heat curing PDMS is also lower; The esters of acrylic acid photo-curing material can not be in air solidifies fully, and the edge can exist and do not solidify into branch when making template, and then influence impression quality.Therefore, need provide a kind of under the common lab environment flexible ultraviolet impressing template by illumination preparation fast, needing no vacuum or nitrogen protection and preparation method thereof.
Summary of the invention
The technical problem to be solved in the present invention is: overcome the deficiency of existing impression composite shuttering, providing can preparation fast in air, solidify fully, high-resolution flexible ultraviolet impressing composite shuttering.This flexible ultraviolet impressing composite shuttering is the photocuring preparation under the common lab environment, needing no vacuum or nitrogen protection; Need not machinery when implementing the ultraviolet light polymerization impression and assist, both had the advantage of Flexible formwork assembly impression self-adaptation substrate shape, also have the advantage of the reproducible high-resolution nano-structure of rigid template.
Technical solution of the present invention is: a kind of flexible ultraviolet impressing composite shuttering, and described composite shuttering is three-decker, comprises flexible support layers, middle layer and rigid structural layer; Described rigid structure laminar surface has the micro-nano embossing structure;
Described flexible support layers is a kind of of polyurethane, epoxy resin, polyester, silicon rubber, polycarbonate (PC), polymethylmethacrylate, poly terephthalic acid dimethyl ester (PET), styrene and butadiene, isoprene copolymer, neoprene-phenylethene grafted copolymer or ethylene-propylene rubber-styrene-alkene graft copolymer;
Described middle layer is polyfunctionality sulfydryl monomer and olefinic monomer potpourri ultraviolet light polymerization cross-linking agent, and mercapto functional group is 0.85-1.2 with the ratio of carbon-carbon double bond molal quantity in described polyfunctionality sulfydryl monomer and the olefinic monomer;
Described rigid structural layer is the siliceous sulfydryl monomer of polyfunctionality and not siliceous olefinic monomer, not siliceous sulfydryl monomer and siliceous olefinic monomer or siliceous sulfydryl monomer and siliceous olefinic monomer potpourri ultraviolet light polymerization cross-linking agent; Described ultraviolet light polymerization cross-linking agent elastic modulus is more than 15MPa, and mercapto functional group is 0.6-1.35 with the ratio of carbon-carbon double bond molal quantity in described siliceous sulfydryl monomer and not siliceous olefinic monomer, not siliceous sulfydryl monomer and siliceous olefinic monomer or siliceous sulfydryl monomer and the siliceous olefinic monomer potpourri.
The siliceous sulfydryl monomer of described polyfunctionality, siliceous olefinic monomer, not siliceous sulfydryl monomer, not siliceous olefinic monomer all contain two or more curable crosslinking functionalities, and curable crosslinking functionality is sulfydryl or carbon carbon unsaturated double-bond.
Described sulfydryl comprises mercapto alkane, sulfydryl aromatic hydrocarbon, mercaptoacetate and mercaptopropionic acid ester; Described carbon carbon unsaturated double-bond comprises vinyl, vinyl ether, propenyl ether, allyl ether, acrylate, methacrylate, styrene, N-vinylamide, conjugated diolefine, vinyl cyanide, allyl isocyanuric acid ester, allyl triazine, beta-unsaturated esters, maleimide.
The siliceous sulfydryl monomer of described polyfunctionality is long-chain siloxane, hydrosulphonyl silane or the sulfydryl grafting cage shape siloxane that sulfydryl terminal or side chain contain sulfydryl.
Described not siliceous sulfydryl monomer is tri-thiol propionic ester alkane, four mercaptopropionic acid ester alkane or mercaptopropionic acid ester triazine.
Described siliceous olefinic monomer is long-chain siloxane, vinyl silanes or the carbon carbon unsaturated double-bond grafting cage shape siloxane that carbon carbon unsaturated double-bond terminal or side chain contain carbon carbon unsaturated double-bond.
Described not siliceous olefinic monomer is triallyl ether alkane, triallyl ether alkylol, allyl isocyanuric acid ester or allyl triazine.
Described micro-nano embossing body structure surface has a layered low-surface energy anti-sticking layer; Described low-surface-energy anti-sticking layer be perfluor trichlorosilane and silicon hydroxyl reaction form fluoridize organic supramolecular self assembly anti-sticking layer.
Prepare the method for flexible ultraviolet impressing composite shuttering, may further comprise the steps:
(1) spin coating is with rigid structural layer potpourri and the curing of organic diluent dilution on caster, and the mass percent of rigid structural layer potpourri and organic diluent is between 1%-20%;
(2) spin coating is with the middle layer potpourri of organic diluent dilution on rigid structural layer mixture solidified cross-linking agent, and the mass percent of middle layer potpourri and organic diluent is between 1%-25%;
(3) flexible substrates is covered on the potpourri of middle layer;
(4) separate caster and composite shuttering after the cured interlayer.
Described organic diluent comprises pentane, hexane, heptane, octane, chlorine benzene,toluene,xylene, acetone, MEK, methylisobutylketone, formic ether, ethyl acetate, dimethyl formamide, methyl acrylate, ethyl acrylate, butyl acrylate, methyl methacrylate, Jia Jibingxisuanyizhi, butyl methacrylate, methyl vinyl ether, ethyl vinyl ether and their potpourri.
The present invention's advantage compared with prior art is:
(1) the present invention's photocuring preparation under the common lab environment, process time is short, and need not nitrogen or vacuum protection;
Need not machinery when (2) the present invention implements the ultraviolet light curing nano impression assists;
(3) the present invention had both had the advantage of Flexible formwork assembly impression self-adaptation substrate shape, also had the advantage of the reproducible high-resolution nano-structure of rigid template.
Description of drawings
Fig. 1 is the cross-sectional view of flexible ultraviolet impressing composite shuttering provided by the invention;
Fig. 2 is the process flow diagram of flexible ultraviolet impressing composite shuttering preparation method preferred embodiment provided by the invention;
Fig. 3 is flexible ultraviolet impressing template provided by the invention used (siliceous) sulfydryl monomer and (siliceous) olefinic monomer typical structure synoptic diagram;
Fig. 4 is Flexible formwork assembly photo in the present embodiment;
Fig. 5 is Flexible formwork assembly photo in the present embodiment;
Fig. 6 is Flexible formwork assembly surface water contact angle photo in the present embodiment.
Fig. 7 is Flexible formwork assembly surface scan electron micrograph in the present embodiment, and it is the porous alumina formwork of 140 nanometers that structure copies from the aperture.
Embodiment
Hereinafter with reference to accompanying drawing; the preferred embodiments of the present invention are described in detail; preferred embodiment only limits to explain the present invention; protection scope of the present invention should comprise the full content of claim, and namely can realize the full content of claim of the present invention by preferred embodiment those skilled in the art.
Fig. 1 is flexible ultraviolet impressing composite shuttering structural representation of the present invention, and flexible ultraviolet impressing composite shuttering of the present invention is three-layer composite structure, comprises flexible support layers 1, middle layer 2 and rigid structural layer 3.
The surface of rigid structural layer 3 has the micro-nano embossing structure, and described micro-nano embossing structure copies from caster and obtains.Described rigid structural layer 3 is the ultraviolet light polymerization cross-linking agent of polyfunctionality (siliceous) sulfydryl monomer and (siliceous) olefinic monomer potpourri.Described polyfunctionality (siliceous) sulfydryl monomer and (siliceous) olefinic monomer potpourri be the potpourri of preferred pentaerythrite four-3-mercaptopropionic acid ester (structural representation is seen Fig. 3 polyfunctionality sulfydryl monomer), acryloxy propyl group methylsiloxane homopolymer (structural representation is seen Fig. 3 polyfunctionality silicon-containing monomer), allyl isocyanuric acid ester (structural representation is seen Fig. 3 polyfunctionality olefinic monomer), Ethylene glycol dimethacrylate in the present embodiment.In described polyfunctionality (siliceous) sulfydryl monomer and (siliceous) olefinic monomer potpourri, the mass percentage content of pentaerythrite four-3-mercaptopropionic acid ester is preferably 15%-20%, the mass percentage content of acryloxy propyl group methylsiloxane homopolymer is preferably 50%-60%, the mass percentage content of allyl isocyanuric acid ester is preferably 10%-15%, and the mass percentage content of Ethylene glycol dimethacrylate is preferably 5%-7%.
The present invention further provides the preparation method of described flexible ultraviolet impressing composite shuttering, as shown in Figure 2, preparation method's preferred embodiment of described flexible ultraviolet impressing composite shuttering may further comprise the steps:
(1) the rigid structural layer potpourri prepolymer 30 that spin coating is diluted with organic diluent on caster 5.Rigid structural layer potpourri prepolymer 30 comprises the free radical photo-initiation that organic diluent that mass percent is preferably 85%-90%, polyfunctionality (siliceous) sulfydryl monomer and (siliceous) olefinic monomer potpourri and mass percent that mass percent is preferably 10%-15% are preferably 0.1%-0.4% in embodiments of the present invention.Described organic diluent is preferred methyl phenyl ethers anisole in the present embodiment.Described free radical photo-initiation is preferred benzophenone in the present embodiment.
(2) ultra violet lamp solidifies rigid structural layer potpourri prepolymer 30, forms rigid structural layer 3 at caster 5.
(3) the middle layer potpourri prepolymer 20 that spin coating is diluted with organic diluent on rigid structural layer 3.Middle layer potpourri prepolymer 20 comprises the free radical photo-initiation that organic diluent that mass percent is preferably 75%-85%, polyfunctionality sulfydryl monomer that mass percent is preferably 15%-20% and olefinic monomer potpourri and mass percent are preferably 0.1%-0.2% in the present embodiment.Described organic diluent is the preferable methyl methyl acrylate in the present embodiment.Described free radical photo-initiation is preferred dibenzoyl in the present embodiment.
(4) flexible support layers 1 is covered on the middle layer potpourri prepolymer 20, and sees through flexible support layers ultraviolet light polymerization middle layer potpourri prepolymer 20, between flexible support layers 1 and rigid structural layer 3, form middle layer 2.
(5) caster 5 is separated with rigid structural layer 3, rigid structural layer 3 sticks on the flexible support layers 1 securely by middle layer 2.The oxygen gas plasma that rigid structural layer 3 is carried out the short time cleans, and forms one deck perfluor silane unimolecule adherent layer 4 on rigid structural layer 3 surfaces by the gas phase self-assembly process then.
In a word, flexible ultraviolet impressing composite shuttering of the present invention is the photocuring preparation under the common lab environment, needing no vacuum or nitrogen protection; Need not machinery when implementing the ultraviolet light polymerization impression and assist, both had the advantage of Flexible formwork assembly impression self-adaptation substrate shape, also have the advantage of the reproducible high-resolution nano-structure of rigid template.
Fig. 4 is Flexible formwork assembly photo in the present embodiment, and Flexible formwork assembly bending occurs and shows that the Flexible formwork assembly in the present embodiment has certain pliability under the gravity effect, need not the requirement that special machinery is assisted in the time of can satisfying impression.
3-mercaptopropionic acid-[2,4,6-trioxy--1 is selected in middle layer 2 for use, 3,5-triazine-1,3,5 (2H, 4H, 6H)-and inferior base] three-2, the 1-glycol ester, pentaerythritol triallyl ether, the potpourri of 1,6-hexanediyl ester is in the described potpourri, 3-mercaptopropionic acid-[2,4,6-trioxy--1,3,5-triazine-1,3,5 (2H, 4H, 6H)-and inferior base] three-2, the mass percentage content of 1-glycol ester is preferably 60%-65%, and the pentaerythritol triallyl ether mass percentage content is preferably 25%-30%, 1,6-hexanediyl ester mass percentage content is preferably 5%-15%.
Rigid structural layer 3 is selected the potpourri of (sulfydryl propyl group) polymethyl siloxane, pentaerythritol triallyl ether, pentanediol diacrylate for use, in the described potpourri, the mass percentage content of (sulfydryl propyl group) polymethyl siloxane is preferably 70%-75%, the pentaerythritol triallyl ether mass percentage content is preferably 15%-20%, and pentanediol diacrylate mass percentage content is preferably 5%-10%.
Fig. 5 is Flexible formwork assembly photo in the present embodiment, and Flexible formwork assembly produces the wide-angle bending under slight external force effect, shows that the Flexible formwork assembly in the present embodiment has good flexible, can the self-adaptation substrate shape, fit tightly.
Rigid structural layer 3 selects for use (sulfydryl propyl group) polymethyl siloxane, vinyl to replace the potpourri of cage shape siloxane, trimethylolpropane triacrylate, propylene glycol diacrylate entirely, in the described potpourri, the mass percentage content of (sulfydryl propyl group) polymethyl siloxane is preferably 40%-45%, vinyl replaces cage shape siloxane mass percentage content entirely and is preferably 10%-15%, the trimethylolpropane triacrylate mass percentage content is preferably 30%-35%, and the propylene glycol diacrylate mass percentage content is preferably 5%-10%.
Fig. 6 is Flexible formwork assembly surface water contact angle photo in the present embodiment.About 120 ° water contact angle shows that the Flexible formwork assembly surface in the present embodiment has successfully added low-surface-energy and fluoridized anti-sticking layer, can separate with impression materials at an easy rate.
Fig. 7 is Flexible formwork assembly surface scan electron micrograph in the present embodiment, and it is the porous alumina formwork of 140 nanometers that structure copies from the aperture.Body diameter is low to moderate 140 nanometers, and larger sized defective is also accurately copied, and shows that the Flexible formwork assembly in the present embodiment has the ability of copying high-resolution nano-structure.
Need to prove that according to the above embodiment of the present invention, those skilled in the art are the four corners that can realize independent claims of the present invention and appurtenance fully, implementation procedure and method are with above-mentioned embodiment; And the non-elaborated part of the present invention belongs to techniques well known.
The above; only for part embodiment of the present invention, but protection scope of the present invention is not limited thereto, and any those skilled in the art are in the technical scope that the present invention discloses; the variation that can expect easily or replacement all should be encompassed within protection scope of the present invention.
Claims (10)
1. flexible ultraviolet impressing composite shuttering, it is characterized in that: described composite shuttering is three-decker, comprises flexible support layers, middle layer and rigid structural layer; Described rigid structure laminar surface has the micro-nano embossing structure;
Described flexible support layers is a kind of of polyurethane, epoxy resin, polyester, silicon rubber, polycarbonate (PC), polymethylmethacrylate, poly terephthalic acid dimethyl ester (PET), styrene and butadiene, isoprene copolymer, neoprene-phenylethene grafted copolymer or ethylene-propylene rubber-styrene-alkene graft copolymer;
Described middle layer is polyfunctionality sulfydryl monomer and olefinic monomer potpourri ultraviolet light polymerization cross-linking agent, and mercapto functional group is 0.85-1.2 with the ratio of carbon-carbon double bond molal quantity in described polyfunctionality sulfydryl monomer and the olefinic monomer;
Described rigid structural layer is the siliceous sulfydryl monomer of polyfunctionality and not siliceous olefinic monomer, not siliceous sulfydryl monomer and siliceous olefinic monomer or siliceous sulfydryl monomer and siliceous olefinic monomer potpourri ultraviolet light polymerization cross-linking agent; Described ultraviolet light polymerization cross-linking agent elastic modulus is more than 15MPa, and mercapto functional group is 0.6-1.35 with the ratio of carbon-carbon double bond molal quantity in described siliceous sulfydryl monomer and not siliceous olefinic monomer, not siliceous sulfydryl monomer and siliceous olefinic monomer or siliceous sulfydryl monomer and the siliceous olefinic monomer potpourri.
2. flexible ultraviolet impressing composite shuttering according to claim 1, it is characterized in that: the siliceous sulfydryl monomer of described polyfunctionality, siliceous olefinic monomer, not siliceous sulfydryl monomer, not siliceous olefinic monomer all contain two or more curable crosslinking functionalities, and curable crosslinking functionality is sulfydryl or carbon carbon unsaturated double-bond.
3. flexible ultraviolet impressing composite shuttering according to claim 2, it is characterized in that: described sulfydryl comprises mercapto alkane, sulfydryl aromatic hydrocarbon, mercaptoacetate and mercaptopropionic acid ester; Described carbon carbon unsaturated double-bond comprises vinyl, vinyl ether, propenyl ether, allyl ether, acrylate, methacrylate, styrene, N-vinylamide, conjugated diolefine, vinyl cyanide, allyl isocyanuric acid ester, allyl triazine, beta-unsaturated esters, maleimide.
4. according to one of any described flexible ultraviolet impressing composite shuttering of claim 1-3, it is characterized in that: the siliceous sulfydryl monomer of described polyfunctionality is long-chain siloxane, hydrosulphonyl silane or the sulfydryl grafting cage shape siloxane that sulfydryl terminal or side chain contain sulfydryl.
5. flexible ultraviolet impressing composite shuttering according to claim 1 and 2, it is characterized in that: described not siliceous sulfydryl monomer is tri-thiol propionic ester alkane, four mercaptopropionic acid ester alkane or mercaptopropionic acid ester triazine.
6. flexible ultraviolet impressing composite shuttering according to claim 1 and 2, it is characterized in that: described siliceous olefinic monomer is long-chain siloxane, vinyl silanes or the carbon carbon unsaturated double-bond grafting cage shape siloxane that carbon carbon unsaturated double-bond terminal or side chain contain carbon carbon unsaturated double-bond.
7. flexible ultraviolet impressing composite shuttering according to claim 1 and 2, it is characterized in that: described not siliceous olefinic monomer is triallyl ether alkane, triallyl ether alkylol, allyl isocyanuric acid ester or allyl triazine.
8. flexible ultraviolet impressing composite shuttering according to claim 1, it is characterized in that: described micro-nano embossing body structure surface has a layered low-surface energy anti-sticking layer; Described low-surface-energy anti-sticking layer be perfluor trichlorosilane and silicon hydroxyl reaction form fluoridize organic supramolecular self assembly anti-sticking layer.
9. prepare the method for the described flexible ultraviolet impressing composite shuttering of claim 1, it is characterized in that: may further comprise the steps:
(1) spin coating is with rigid structural layer potpourri and the curing of organic diluent dilution on caster, and the mass percent of rigid structural layer potpourri and organic diluent is between 1%-20%;
(2) spin coating is with the middle layer potpourri of organic diluent dilution on rigid structural layer mixture solidified cross-linking agent, and the mass percent of middle layer potpourri and organic diluent is between 1%-25%;
(3) flexible substrates is covered on the potpourri of middle layer;
(4) separate caster and composite shuttering after the cured interlayer.
10. the preparation method of flexible ultraviolet impressing composite shuttering according to claim 9, it is characterized in that: described organic diluent comprises pentane, hexane, heptane, octane, chlorine benzene,toluene,xylene, acetone, MEK, methylisobutylketone, formic ether, ethyl acetate, dimethyl formamide, methyl acrylate, ethyl acrylate, butyl acrylate, methyl methacrylate, Jia Jibingxisuanyizhi, butyl methacrylate, methyl vinyl ether, ethyl vinyl ether and their potpourri.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310234429.2A CN103279009B (en) | 2013-06-14 | 2013-06-14 | A kind of flexible ultraviolet impressing composite shuttering and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310234429.2A CN103279009B (en) | 2013-06-14 | 2013-06-14 | A kind of flexible ultraviolet impressing composite shuttering and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103279009A true CN103279009A (en) | 2013-09-04 |
| CN103279009B CN103279009B (en) | 2015-09-30 |
Family
ID=49061577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310234429.2A Expired - Fee Related CN103279009B (en) | 2013-06-14 | 2013-06-14 | A kind of flexible ultraviolet impressing composite shuttering and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103279009B (en) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103631089A (en) * | 2013-12-08 | 2014-03-12 | 中国科学院光电技术研究所 | Preparation method of ultraviolet light cured nano-imprint lithography polymer template |
| CN105131218A (en) * | 2015-07-31 | 2015-12-09 | 北京化工大学 | Method for improving dielectric property of elastomer |
| CN105829967A (en) * | 2013-10-21 | 2016-08-03 | 日产化学工业株式会社 | Positive-type photosensitive resin composition |
| CN107119259A (en) * | 2017-05-18 | 2017-09-01 | 苏州光舵微纳科技股份有限公司 | A kind of vacuum deposition apparatus for impression block |
| CN109470679A (en) * | 2017-09-08 | 2019-03-15 | 清华大学 | Molecular vehicle for Molecular Detection |
| CN109470677A (en) * | 2017-09-08 | 2019-03-15 | 清华大学 | Molecular detector arrangement |
| CN109748833A (en) * | 2019-01-04 | 2019-05-14 | 北京理工大学 | A kind of modified mercaptopropionic acid ester of benzoxazine and thermosetting resin prepared therefrom |
| CN110220881A (en) * | 2019-05-08 | 2019-09-10 | 山东大学 | Flexible SERS substrate and its preparation method and application based on nanostructure and ordered nano particle |
| CN111077732A (en) * | 2019-12-20 | 2020-04-28 | 深圳市华星光电半导体显示技术有限公司 | Material composition of light coupling-out lens and manufacturing method thereof |
| US10852241B2 (en) | 2017-09-08 | 2020-12-01 | Tsinghua University | Method for detecting molecular |
| US10859501B2 (en) | 2017-09-08 | 2020-12-08 | Tsinghua University | Carrier for use in single molecule detection |
| CN112829479A (en) * | 2020-12-22 | 2021-05-25 | 中国科学院苏州纳米技术与纳米仿生研究所广东(佛山)研究院 | Stamp for fine circuit printing and printing method |
| CN112892627A (en) * | 2021-02-05 | 2021-06-04 | 浙江大学 | Photocuring micro-fluidic chip based on elastic support body and preparation method and application thereof |
| CN113189840A (en) * | 2021-04-16 | 2021-07-30 | 深圳先进技术研究院 | Micro-nano structure manufacturing method and micro-nano structure manufacturing device |
| CN115542662A (en) * | 2021-06-30 | 2022-12-30 | 镭亚电子(苏州)有限公司 | Flexible imprint template and method of manufacturing the same |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010039051A (en) * | 2008-08-01 | 2010-02-18 | Sekisui Chem Co Ltd | Photosensitive composition and method of manufacturing pattern film |
| CN102174059A (en) * | 2011-02-23 | 2011-09-07 | 上海交通大学 | Sulfydryl-containing low polysiloxane compound, ultraviolet photoresist composition thereof, and impressing process |
| US20120244245A1 (en) * | 2009-06-09 | 2012-09-27 | Hon Hai Precision Industry Co., Ltd. | Nanoimprint resist, nanoimprint mold and nanoimprint lithography |
| CN103087087A (en) * | 2011-10-27 | 2013-05-08 | 上海交通大学 | Sulfhydryl multifunctional group-containing polyhedral oligomeric silsesquioxane compound and composition thereof, and imprinted soft template |
-
2013
- 2013-06-14 CN CN201310234429.2A patent/CN103279009B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010039051A (en) * | 2008-08-01 | 2010-02-18 | Sekisui Chem Co Ltd | Photosensitive composition and method of manufacturing pattern film |
| US20120244245A1 (en) * | 2009-06-09 | 2012-09-27 | Hon Hai Precision Industry Co., Ltd. | Nanoimprint resist, nanoimprint mold and nanoimprint lithography |
| CN102174059A (en) * | 2011-02-23 | 2011-09-07 | 上海交通大学 | Sulfydryl-containing low polysiloxane compound, ultraviolet photoresist composition thereof, and impressing process |
| CN103087087A (en) * | 2011-10-27 | 2013-05-08 | 上海交通大学 | Sulfhydryl multifunctional group-containing polyhedral oligomeric silsesquioxane compound and composition thereof, and imprinted soft template |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105829967A (en) * | 2013-10-21 | 2016-08-03 | 日产化学工业株式会社 | Positive-type photosensitive resin composition |
| CN103631089A (en) * | 2013-12-08 | 2014-03-12 | 中国科学院光电技术研究所 | Preparation method of ultraviolet light cured nano-imprint lithography polymer template |
| CN103631089B (en) * | 2013-12-08 | 2016-08-17 | 中国科学院光电技术研究所 | A kind of preparation method of ultraviolet light curing nano impressing polymer template |
| CN105131218A (en) * | 2015-07-31 | 2015-12-09 | 北京化工大学 | Method for improving dielectric property of elastomer |
| CN105131218B (en) * | 2015-07-31 | 2018-06-29 | 北京化工大学 | A kind of method for improving elastomer dielectric properties |
| CN107119259A (en) * | 2017-05-18 | 2017-09-01 | 苏州光舵微纳科技股份有限公司 | A kind of vacuum deposition apparatus for impression block |
| US10859501B2 (en) | 2017-09-08 | 2020-12-08 | Tsinghua University | Carrier for use in single molecule detection |
| CN109470677A (en) * | 2017-09-08 | 2019-03-15 | 清华大学 | Molecular detector arrangement |
| US10852241B2 (en) | 2017-09-08 | 2020-12-01 | Tsinghua University | Method for detecting molecular |
| CN109470679A (en) * | 2017-09-08 | 2019-03-15 | 清华大学 | Molecular vehicle for Molecular Detection |
| US11112364B2 (en) | 2017-09-08 | 2021-09-07 | Tsinghua University | Molecular detection device |
| CN109748833A (en) * | 2019-01-04 | 2019-05-14 | 北京理工大学 | A kind of modified mercaptopropionic acid ester of benzoxazine and thermosetting resin prepared therefrom |
| CN110220881A (en) * | 2019-05-08 | 2019-09-10 | 山东大学 | Flexible SERS substrate and its preparation method and application based on nanostructure and ordered nano particle |
| CN111077732A (en) * | 2019-12-20 | 2020-04-28 | 深圳市华星光电半导体显示技术有限公司 | Material composition of light coupling-out lens and manufacturing method thereof |
| CN112829479A (en) * | 2020-12-22 | 2021-05-25 | 中国科学院苏州纳米技术与纳米仿生研究所广东(佛山)研究院 | Stamp for fine circuit printing and printing method |
| CN112892627A (en) * | 2021-02-05 | 2021-06-04 | 浙江大学 | Photocuring micro-fluidic chip based on elastic support body and preparation method and application thereof |
| CN113189840A (en) * | 2021-04-16 | 2021-07-30 | 深圳先进技术研究院 | Micro-nano structure manufacturing method and micro-nano structure manufacturing device |
| CN115542662A (en) * | 2021-06-30 | 2022-12-30 | 镭亚电子(苏州)有限公司 | Flexible imprint template and method of manufacturing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103279009B (en) | 2015-09-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103279009B (en) | A kind of flexible ultraviolet impressing composite shuttering and preparation method thereof | |
| US9120265B2 (en) | Nanoimprint resist, nanoimprint mold and nanoimprint lithography | |
| CN101477304B (en) | Stamping method for copying high-resolution nano-structure on complicated shape surface | |
| CN101923279B (en) | Nano-imprint template and preparation method thereof | |
| Pina-Hernandez et al. | High-resolution functional epoxysilsesquioxane-based patterning layers for large-area nanoimprinting | |
| WO2012070833A2 (en) | Radiation curable resin composition, and method for producing self-replicatable mold using same | |
| TW200848956A (en) | Devices and methods for pattern generation by ink lithography | |
| Lee et al. | Photocurable silsesquioxane-based formulations as versatile resins for nanoimprint lithography | |
| CN102508410A (en) | Composite nanometer impressing mold plate with sandwich structure and preparation method of composite nanometer impressing mold plate | |
| WO2013060087A1 (en) | Polyhedral oligomeric silsesquioxane compound containing mercapto polyfunctional group, its composition, and soft template for imprinting | |
| CN109311663B (en) | Layered microstructure, mold for preparing layered microstructure and preparation method of mold | |
| Lan | Soft UV nanoimprint lithography and its applications | |
| Nakamura et al. | Fabrication of micro-lens array with antireflection structure | |
| CN101410753A (en) | Method of forming nanoscale features using soft lithography | |
| JP5327221B2 (en) | Method for manufacturing wafer lens or wafer lens assembly | |
| WO2009116447A1 (en) | Method for producing wafer lens | |
| Takei et al. | Eco-friendly, water-repellent, light-transparent film derived from psicose using nanoimprint lithography | |
| KR20120020012A (en) | Organic-inorganic hybrid material and stamp for nanoimprint manufactured from the same | |
| CN103279011A (en) | Thiol-ene ultraviolet light curing nano imprinting material | |
| CN104932195B (en) | Composite nano-imprinting soft template and preparation method thereof | |
| Rodríguez et al. | Soft thermal nanoimprint and hybrid processes to produce complex structures | |
| CN205080364U (en) | Composite nanowire impression soft mode board | |
| KR101321104B1 (en) | Method of producing stamp for nano-imprint | |
| Shin et al. | Diazoketo-functionalized POSS resists for high performance replica molds of ultraviolet-nanoimprint lithography | |
| TW201100457A (en) | Nano-imprint resist and nanoimprinting lithography method using the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150930 Termination date: 20170614 |