CN103258914A - MWT solar battery and manufacturing method thereof - Google Patents
MWT solar battery and manufacturing method thereof Download PDFInfo
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- CN103258914A CN103258914A CN2013102130293A CN201310213029A CN103258914A CN 103258914 A CN103258914 A CN 103258914A CN 2013102130293 A CN2013102130293 A CN 2013102130293A CN 201310213029 A CN201310213029 A CN 201310213029A CN 103258914 A CN103258914 A CN 103258914A
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Abstract
The invention provides an MWT solar battery and a manufacturing method of the MWT solar battery. The manufacturing method of the MWT solar battery comprises the following steps that antireflection films in a designated area on the back face of a substrate of the MWT solar battery are removed through laser to form an non-antireflection film area; the substrate of the MWT solar battery is placed into a strong alkaline solution to be cleaned, and the back field of the non-antireflection film area, laser damage and material passing hole interior damage are removed. In the manufacturing method of the MWT solar battery, the antireflection films which are needed in MWT solar battery production are used as masks, therefore other masks do not need to be manufactured additionally, and extra processes, equipment and materials do not need to be added. Compared with the prior art, the MWT solar battery is high in process integration degree, simple in process and beneficial to cost controlling.
Description
Technical field
The present invention relates to solar cell and make the field, in particular to a kind of MWT solar cell and preparation method thereof.
Background technology
Have in the process of the MWT solar cell of carrying on the back the field in preparation, front gate line need be guided to the back side by the via hole slurry, and form the slurry point of a diameter 2 to 5mm overleaf, with the convenient assembly that forms.High temperature during laser drilling can form the damage layer to hole wall and laser entrance face place, and the charge carrier complex centre in the damage layer reduces the photo-generated carrier life-span and causes battery drain; Material path front gate line and back side grid line need carry out insulation processing, because the existence of back side diffusion field, via hole slurry point can cause electric leakage with the place of silicon chip contact position.Therefore remove the back of the body field of (via hole slurry point and silicon chip contact position) around the damage layer and hole that punching need be caused, to solve the problem of electric leakage.
The method of removing back of the body field at present generally adopts laser ablation or erosion removal.Laser ablation generally is after the field is carried on the back in formation, uses the silicon of laser ablation appointed area certain depth, reaches to remove the purpose of carrying on the back the field.The method is carried on the back a job of removing around can finishing punching and hole by one step of laser, and technological process is simple, is conducive to cost control.But the high temperature irradiation of laser can cause damage to silicon materials, have a large amount of charge carrier complex centres in the damage layer, the photo-generated carrier life-span reduces greatly, and can not be separated by the p-n junction electrostatic field, cause the solar cell leakage current excessive, influence the cell photoelectric conversion performance.
Erosion removal generally is to carry on the back a position silk screen printing corrosive slurry, oven dry, clean, utilize corrosive slurry to reach the purpose of removing back of the body field in the needs removal in a formation back of the body back, carries out subsequent technique again.This kind method can be controlled corrosion depth by conditions such as control slurry concentration, number to be printed and oven dry, reaches the purpose of removing back of the body field preferably.But corrosive slurry is printed in certain zone centered by material path in this kind method, needs the parameter condition of strict control corrosive slurry this moment, prevents that corrosive slurry from polluting the printing table top by material path, and the silicon chip of contaminate subsequent printing.This method has increased silk screen printing, oven dry, cleaning in addition, the technological process complexity, and cost is higher.
Summary of the invention
The present invention aims to provide a kind of MWT solar cell and preparation method thereof, to solve technological process complexity, a removal back of the body high problem of cost of removing the back of the body field of MWT solar cell in the prior art.
To achieve these goals, according to an aspect of the present invention, provide a kind of MWT preparation method of solar battery may further comprise the steps: the antireflective film of the appointed area by laser ablation MWT solar cell backside of substrate forms no antireflective film zone; Strong alkali solution is put in the substrate of MWT solar cell cleaned, remove the interior damage of back of the body field, laser damage and material path in no antireflective film zone.
Further, the step that strong alkali solution cleans is put in the substrate of MWT solar cell, strong alkali solution is potassium hydroxide solution or sodium hydroxide solution, and the concentration of potassium hydroxide solution is 5% to 50%, and the concentration of sodium hydroxide solution is 5% to 50%.
Further, the antireflective film of the appointed area by laser ablation MWT solar cell backside of substrate forms before the step in no antireflective film zone further comprising the steps of: substrate is cleaned to the MWT solar cell, making herbs into wool, diffused emitter, diffusion back field, edge insulation handles; Form antireflective film in MWT solar cell substrate upper and lower surface; Assigned address in the substrate of MWT solar cell is beaten material path.
Further, to the MWT solar cell substrate clean, in the step of making herbs into wool, diffused emitter, diffusion back field, edge etching processing, diffused emitter is to carry out in the front of MWT solar cell substrate.
Further, beat in the step of material path at MWT solar cell substrate assigned address, the diameter of material path is 50 μ m to 500 μ m.
Further, the step that strong alkali solution cleans is put in the substrate of MWT solar cell, the temperature of the sodium hydroxide solution of the potassium hydroxide solution of 5% to 50% concentration or 5% to 50% concentration is 30 degrees centigrade to 80 degrees centigrade, and the scavenging period of MWT solar cell is 30s to 300s.
Further, the concentration of potassium hydroxide solution is 30%, and temperature is 80 degrees centigrade, and scavenging period is 60s.
Further, removing the step of damaging in back of the body field, laser damage and the material path in no antireflective film zone also comprises afterwards: the aqueous solution is put in the substrate of MWT solar cell cleaned, scavenging period is greater than 1min.
Further, put into after the step that the aqueous solution cleans the substrate of MWT solar cell further comprising the steps of: at MWT solar cell backside of substrate printing via hole slurry, and oven dry; At MWT solar cell backside of substrate printed back grid line, and oven dry; At MWT solar cell substrate front surface printing front gate line, and oven dry; Sintering processes is carried out in substrate to the MWT solar cell.
According to a further aspect in the invention, provide a kind of MWT solar cell, the MWT solar cell is by above-mentioned method preparation.
Use technical scheme of the present invention, the MWT preparation method of solar battery may further comprise the steps: the antireflective film of the appointed area by laser ablation MWT solar cell backside of substrate forms no antireflective film zone; Strong alkali solution is put in the substrate of MWT solar cell cleaned, remove the interior damage of back of the body field, laser damage and material path in no antireflective film zone.This MWT preparation method of solar battery with antireflective film necessary in the MWT manufacture of solar cells as mask, thereby need not to make other mask in addition, need not to increase extra technology, equipment and material, with existing technology integrated level height, technology is simple, is conducive to cost control; Also need not to prepare again antireflective film after removing local back of the body field, further reduced technological process, more saved cost.Strong alkali solution can be good at removing the back of the body field in no antireflective film zone, can also remove the damage layer that forms because of laser drilling simultaneously, guarantees the cell photoelectric conversion efficiency.
Description of drawings
The accompanying drawing that constitutes a part of the present invention is used to provide further understanding of the present invention, and illustrative examples of the present invention and explanation thereof are used for explaining the present invention, do not constitute improper restriction of the present invention.In the accompanying drawings:
Fig. 1 shows the MWT preparation method of solar battery flow chart of embodiments of the invention.
Embodiment
Hereinafter will describe the present invention with reference to the accompanying drawings and in conjunction with the embodiments in detail.Need to prove that under the situation of not conflicting, embodiment and the feature among the embodiment among the application can make up mutually.
Terminological interpretation:
MWT: metal emitting perforation coiling technology.
Two-sided generating battery: main grid, thin grid design are all adopted in battery front side, the back side, make cell backside also can absorb light, improve light utilization.
The back of the body (diffusion back field): the silicon chip back side (one side that non-formation pn ties) by diffusion, forms a height knot, i.e. back of the body field.
Strong alkali solution: ionization and discharge the alkaline solution of hydroxide ion fully in water.
As shown in Figure 1, according to embodiments of the invention, the MWT preparation method of solar battery may further comprise the steps: the antireflective film of the appointed area by laser ablation MWT solar cell backside of substrate forms no antireflective film zone; Strong alkali solution is put in the substrate of MWT solar cell cleaned, remove the interior damage of back of the body field, laser damage and material path in no antireflective film zone.
This MWT preparation method of solar battery with antireflective film necessary in the MWT manufacture of solar cells as mask, thereby need not to make other mask in addition, need not to increase extra technology, equipment and material, with existing technology integrated level height, technology is simple, is conducive to cost control; Also need not to prepare again antireflective film after removing local back of the body field, further reduced technological process, more saved cost.Strong alkali solution can be good at removing the back of the body field in no antireflective film zone, can also remove the damage layer that forms because of laser drilling simultaneously, guarantees the cell photoelectric conversion efficiency.
Preferably, above-mentioned strong alkali solution is potassium hydroxide solution.Potassium hydroxide solution is the interior damage of back of the body field, laser damage and material path that strong alkali solution can be removed no antireflective film zone on the MWT solar cell fast, shorten the MWT time of staying of solar cell in alkaline solution, avoid alkaline solution to the damage of mask.In other embodiments, this strong alkali solution can be sodium hydroxide solution etc.
More preferably, above-mentioned potassium hydroxide solution or the concentration of sodium hydroxide solution are 5% to 50%, and the temperature of potassium hydroxide solution or sodium hydroxide solution is 30 degrees centigrade to 80 degrees centigrade, and the scavenging period of MWT solar cell substrate is 30s to 300s.The potassium hydroxide solution of this scope or sodium hydroxide solution can be removed damage in the suprabasil back of the body of MWT solar cell field, laser damage and the material path well, can guarantee production efficiency simultaneously.For example can select the potassium hydroxide solution of 5% concentration for use, 40 degrees centigrade of temperature are cleaned MWT solar cell substrate 200s, and damage in the suprabasil back of the body of MWT solar cell field, laser damage and the material path is removed.
The step of MWT preparation method of solar battery comprises:
To MWT solar cell substrate (in the present embodiment for monocrystalline silicon piece) clean, making herbs into wool, diffused emitter, diffusion back field, edge insulation handles.In this step, also being the front diffused emitter at the upper surface of monocrystalline silicon piece, also is the back side diffusion back of the body at the lower surface of monocrystalline silicon piece.Cleaning step can be removed the surface and oil contaminant of monocrystalline silicon piece and the cutting damage layer of metal impurities and monocrystalline silicon sheet surface; In monocrystalline silicon sheet surface making herbs into wool, can form antireflection structure, reduce the reflectivity of monocrystalline silicon sheet surface.
Form antireflective film in the monocrystalline silicon piece upper and lower surface.Wherein antireflective film is the SiNx film, and Heat stability is good, the compact structure of silicon nitride (SiNx) film can form one deck barrier layer, prevents strong alkali solution damage back of the body field except in designated area.
According to the requirement of MWT solar cell design, beat material path at the assigned address of MWT solar cell substrate.Wherein the diameter of material path is 50 μ m to 500 μ m.
According to the requirement of MWT solar cell design, the antireflective film of the appointed area by laser ablation MWT solar cell backside of substrate is to form no antireflective film zone.Wherein, laser can be to be sent by solid state laser or gas laser, its optical maser wavelength is from 300nm to 1600nm, its pulse length is from 10ps to 300ns, repetition rate from 100Hz to 200KHz, by collimate, expand, focus on project monocrystalline silicon sheet surface laser spot diameter from 5 μ m to 100 μ m.
Strong alkali solution is put in the substrate of MWT solar cell cleaned, remove the interior damage of back of the body field, laser damage and material path in no antireflective film zone.Wherein strong alkali solution is contained in slot type or the single face chain equipment.When adopting the single face chain equipment to hold strong alkali solution, the substrate of MWT solar cell is answered the back side to put into strong alkali solution down and is cleaned.After strong alkali solution is removed the back of the body field of no masked areas, carrying out the necessary aqueous solution after the substrate of MWT solar cell taken out from strong alkali solution cleans, with the impurity of washing the ion in the strong alkali solution residual in the substrate of MWT solar cell off and adhering to, dry afterwards, in order to carry out follow-up processing technology.Corrosion depth during back of the body field that strong alkali solution is removed no masked areas is 0.01 μ m to 1 μ m.The aqueous solution can be that deionized water also can be the hydrofluoric acid deionized water solution.
The aqueous solution is put in MWT solar cell substrate after the oven dry cleaned, scavenging period is greater than 1min.The aqueous solution can pure water also can be the hydrofluoric acid that cleans usefulness.At monocrystalline silicon piece back up via hole slurry, and oven dry; At the back up back side of monocrystalline silicon piece grid line, and oven dry; At the front of monocrystalline silicon piece printing front gate line, and oven dry, the monocrystalline silicon piece sintering is finally formed the MWT solar cell.
Select monocrystalline silicon piece as the substrate of MWT solar cell herein, the crystal face (1 of this monocrystalline silicon piece, 0,0), silicon wafer thickness 180 μ m after the step of cleaning, making herbs into wool, diffused emitter, diffusion back field, edge etching, form the SiNx film in the monocrystalline silicon piece upper and lower surface, upper surface thickness 90nm wherein, refractive index 2.2; Lower surface thickness 80nm, refractive index 2.1.
According to the MWT solar cell design, punch at the monocrystalline silicon piece assigned address; And in the one side that forms back of the body field, also be the appointed area at the back side of monocrystalline silicon piece, utilizing the SiNx rete of this appointed area of laser ablation, the area of appointed area should be greater than the area of back side slurry point.In slot type or single face chain equipment, immerse monocrystalline silicon piece in the strong alkali solution of 5% to 50% concentration, as potassium hydroxide (KOH) solution or NaOH (NaOH) solution, damage in the laser damage in technologies such as cleaning, oven dry are removed no SiNx film overlay area, back of the body field and the material path.
Preferably, potassium hydroxide (KOH) solution or NaOH (NaOH) solution concentration 30%, temperature is 80 degrees centigrade, soak time 60s, the back of the body field that both can well remove no masked areas can also guarantee not damage antireflective film.
The printing of three steps is adopted in silk screen printing, and at first monocrystalline silicon piece back of the body scene is printed the via hole slurry, back of the body scene slurry diameter 3mm, after the oven dry, the printed back grid line is after the thin grid width 100 μ m oven dry, the printing front gate line, thin grid width 80 μ m, oven dry at last, sintering form the MWT solar cell.
According to another embodiment of the present invention, provide a kind of MWT solar cell, this MWT solar cell is according to above-mentioned method, by above-mentioned step preparation.
From above description, as can be seen, the above embodiments of the present invention have realized following technique effect: the MWT preparation method of solar battery may further comprise the steps: the antireflective film of the appointed area by laser ablation MWT solar cell backside of substrate forms no antireflective film zone; Strong alkali solution is put in the substrate of MWT solar cell cleaned, remove the interior damage of back of the body field, laser damage and material path in no antireflective film zone.This MWT preparation method of solar battery with antireflective film necessary in the MWT manufacture of solar cells as mask, thereby need not to make other mask in addition, need not to increase extra technology, equipment and material, with existing technology integrated level height, technology is simple, is conducive to cost control; Also need not to prepare again antireflective film after removing local back of the body field, further reduced technological process, more saved cost.Strong alkali solution can be good at removing the back of the body field in no antireflective film zone, can also remove the damage layer that forms because of laser drilling simultaneously, guarantees the cell photoelectric conversion efficiency.
The above is the preferred embodiments of the present invention only, is not limited to the present invention, and for a person skilled in the art, the present invention can have various changes and variation.Within the spirit and principles in the present invention all, any modification of doing, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (10)
1. a MWT preparation method of solar battery is characterized in that, may further comprise the steps:
The antireflective film of the appointed area by laser ablation MWT solar cell backside of substrate forms no antireflective film zone;
Strong alkali solution is put in the substrate of MWT solar cell cleaned, remove the interior damage of back of the body field, laser damage and material path in no antireflective film zone.
2. MWT preparation method of solar battery according to claim 1, it is characterized in that, described the step that strong alkali solution cleans is put in the substrate of MWT solar cell, strong alkali solution is potassium hydroxide solution or sodium hydroxide solution, the concentration of potassium hydroxide solution is 5% to 50%, and the concentration of sodium hydroxide solution is 5% to 50%.
3. MWT preparation method of solar battery according to claim 1 and 2 is characterized in that, the described antireflective film that passes through the appointed area of laser ablation MWT solar cell backside of substrate, and the step that forms no antireflective film zone is before further comprising the steps of:
Substrate is cleaned to the MWT solar cell, making herbs into wool, diffused emitter, diffusion back field, edge insulation handles;
Form antireflective film in MWT solar cell substrate upper and lower surface;
Assigned address in the substrate of MWT solar cell is beaten material path.
4. MWT preparation method of solar battery according to claim 3, it is characterized in that, described to the MWT solar cell substrate clean, in the step of making herbs into wool, diffused emitter, diffusion back field, edge etching processing, diffused emitter is to carry out in the front of MWT solar cell substrate.
5. MWT preparation method of solar battery according to claim 3 is characterized in that, describedly beats in the step of material path at MWT solar cell substrate assigned address, and the diameter of material path is 50 μ m to 500 μ m.
6. MWT preparation method of solar battery according to claim 2, it is characterized in that, described the step that strong alkali solution cleans is put in the substrate of MWT solar cell, the temperature of the sodium hydroxide solution of the potassium hydroxide solution of 5% to 50% concentration or 5% to 50% concentration is 30 degrees centigrade to 80 degrees centigrade, and the scavenging period of MWT solar cell is 30s to 300s.
7. MWT preparation method of solar battery according to claim 6 is characterized in that, the concentration of potassium hydroxide solution is 30%, and temperature is 80 degrees centigrade, and scavenging period is 60s.
8. MWT preparation method of solar battery according to claim 1, it is characterized in that, described removal does not also comprise after having the step of damaging in back of the body field, laser damage and the material path in antireflective film zone: the aqueous solution is put in the substrate of MWT solar cell cleaned, scavenging period is greater than 1min.
9. MWT preparation method of solar battery according to claim 8 is characterized in that, describedly puts into after the step that the aqueous solution cleans the substrate of MWT solar cell further comprising the steps of:
At MWT solar cell backside of substrate printing via hole slurry, and oven dry;
At MWT solar cell backside of substrate printed back grid line, and oven dry;
At MWT solar cell substrate front surface printing front gate line, and oven dry;
Sintering processes is carried out in substrate to the MWT solar cell.
10. a MWT solar cell is characterized in that, described MWT solar cell is by each described method preparation in the claim 1 to 9.
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| CN103680990A (en) * | 2013-12-30 | 2014-03-26 | 中国科学院上海硅酸盐研究所 | Method for using alkaline liquor to clean substrate used for preparing dye-sensitized solar cell |
| CN104701417A (en) * | 2015-03-10 | 2015-06-10 | 苏州阿特斯阳光电力科技有限公司 | Printing method for back-contact solar cell |
| CN108333221A (en) * | 2018-01-29 | 2018-07-27 | 东莞隆润光学技术有限公司 | Resisting laser damage ability control methods based on thin dielectric film electric field strength characteristic |
| CN109768120A (en) * | 2018-12-29 | 2019-05-17 | 江苏日托光伏科技股份有限公司 | A kind of preparation method of the MWT without exposure mask solar battery |
| CN110416323A (en) * | 2019-07-10 | 2019-11-05 | 天津爱旭太阳能科技有限公司 | A kind of back metal contact zone has the PERC battery and preparation method thereof of passivation layer |
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Application publication date: 20130821 |