CN103165407B - 一种用于硅片表面制样的表面处理及腐蚀的工艺和装置 - Google Patents
一种用于硅片表面制样的表面处理及腐蚀的工艺和装置 Download PDFInfo
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- CN103165407B CN103165407B CN201110417124.6A CN201110417124A CN103165407B CN 103165407 B CN103165407 B CN 103165407B CN 201110417124 A CN201110417124 A CN 201110417124A CN 103165407 B CN103165407 B CN 103165407B
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CN201110417124.6A CN103165407B (zh) | 2011-12-14 | 2011-12-14 | 一种用于硅片表面制样的表面处理及腐蚀的工艺和装置 |
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CN103165407B true CN103165407B (zh) | 2016-04-06 |
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Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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CN106298586A (zh) * | 2015-06-04 | 2017-01-04 | 有研半导体材料有限公司 | 一种硅片表面hf酸处理*** |
CN106098597A (zh) * | 2016-07-14 | 2016-11-09 | 江苏永能光伏科技有限公司 | 一种封闭式臭氧喷淋*** |
CN107610998B (zh) * | 2017-07-21 | 2020-09-15 | 江苏鲁汶仪器有限公司 | 一种能够调节内外压差的气相腐蚀腔体及利用其进行气相腐蚀的方法 |
CN107546145B (zh) * | 2017-08-18 | 2020-12-29 | 清华大学 | 晶圆在位检测装置、晶圆托架以及晶圆在位检测方法 |
CN107799446B (zh) * | 2017-11-14 | 2023-07-14 | 扬州扬杰电子科技股份有限公司 | 一种芯片势垒前的清洗装置 |
CN113782465B (zh) * | 2021-11-11 | 2022-02-18 | 西安奕斯伟材料科技有限公司 | 用于检测晶圆表面金属的方法 |
CN117367924A (zh) * | 2022-06-29 | 2024-01-09 | 江苏鲁汶仪器股份有限公司 | 金属沾污收集***和金属沾污收集方法 |
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JP2004028787A (ja) * | 2002-06-25 | 2004-01-29 | Fujitsu Ltd | 全反射蛍光x線分析方法、全反射蛍光x線分析前処理装置及び全反射蛍光x線分析装置 |
CN1479944A (zh) * | 2000-10-06 | 2004-03-03 | Aotiӫ������˾ | 表面金属污染的检测方法 |
EP1201603B1 (en) * | 2000-10-27 | 2004-04-14 | Air Products And Chemicals, Inc. | Method to remove metal and silicon oxide during gas-phase sacrificial oxide etch |
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CN102097291A (zh) * | 2010-10-28 | 2011-06-15 | 上海申和热磁电子有限公司 | 硅片重金属污染测试参考片的修复再生方法和相关修复再生溶液 |
CN102095599A (zh) * | 2010-10-12 | 2011-06-15 | 上海宏力半导体制造有限公司 | 机械手臂表面金属污染检测方法 |
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US6492283B2 (en) * | 2000-02-22 | 2002-12-10 | Asm Microchemistry Oy | Method of forming ultrathin oxide layer |
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Patent Citations (6)
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CN1479944A (zh) * | 2000-10-06 | 2004-03-03 | Aotiӫ������˾ | 表面金属污染的检测方法 |
EP1201603B1 (en) * | 2000-10-27 | 2004-04-14 | Air Products And Chemicals, Inc. | Method to remove metal and silicon oxide during gas-phase sacrificial oxide etch |
JP2004028787A (ja) * | 2002-06-25 | 2004-01-29 | Fujitsu Ltd | 全反射蛍光x線分析方法、全反射蛍光x線分析前処理装置及び全反射蛍光x線分析装置 |
CN1540327A (zh) * | 2003-04-22 | 2004-10-27 | 旺宏电子股份有限公司 | 制程装置中金属污染与微粒子的检测方法 |
CN102095599A (zh) * | 2010-10-12 | 2011-06-15 | 上海宏力半导体制造有限公司 | 机械手臂表面金属污染检测方法 |
CN102097291A (zh) * | 2010-10-28 | 2011-06-15 | 上海申和热磁电子有限公司 | 硅片重金属污染测试参考片的修复再生方法和相关修复再生溶液 |
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