CN103091983A - Preparation method of surface-enhanced Raman scattering substrate - Google Patents
Preparation method of surface-enhanced Raman scattering substrate Download PDFInfo
- Publication number
- CN103091983A CN103091983A CN2013100322392A CN201310032239A CN103091983A CN 103091983 A CN103091983 A CN 103091983A CN 2013100322392 A CN2013100322392 A CN 2013100322392A CN 201310032239 A CN201310032239 A CN 201310032239A CN 103091983 A CN103091983 A CN 103091983A
- Authority
- CN
- China
- Prior art keywords
- preparation
- nano
- raman scattering
- substrate
- enhanced raman
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Abstract
The invention discloses a preparation method of a surface-enhanced Raman scattering substrate. The preparation method comprises the following steps of: (1) preparing a flexible nano imprinting template with patterns and in a double-layer composite structure; (2) imprinting ordered nano structure patterns; (3) carrying out vacuum evaporation; and (4) eliminating a nano imprinting gel baffle layer. The preparation method can be applied to preparation of all surface-enhanced Raman scattering substrates; the defects that the substrate is strictly required in preparing the SERS (Surface-Enhanced Raman Scattering) substrate in the conventional nano imprinting mode, and metal ordered structure SERS substrates with high resolution are hard to be prepared on complex appearance and high-curvature surfaces are overcome; and moreover the method is simple in process, can be used for producing high-performance SERS substrates with large area, large scale and low cost, can solve the preparation requirements of the SERS substrates and can meet the present practical requirements well.
Description
Technical field
The present invention relates to surface light spectral technology field, relate in particular to the preparation method that a kind of ordered structure surface strengthens Raman scattering substrate.
Background technology
From 20 century 70s, Martin Fleischmann finds Surface enhanced raman spectroscopy (Surface enhanced Raman scattering first, SERS) since phenomenon, development through decades, the SERS detection technique has been widely used in the every field such as physics, chemistry, biology, medicine, material, becomes the important tool of material molecule trace detection.The preparation of active substrate is the prerequisite that obtains the SERS signal, for using SERS as a kind of routine, online analysis tool, the characteristics such as prepared SERS substrate should have that high signal strengthens ability and homogeneity is good, be easy to preparation and storage, easy to use.Method for the preparation of the SERS active substrate mainly contains sol-gel process at present, electrochemical deposition, and the LB film forming, template etc., be difficult to control but these methods exist homogeneity, and be difficult to the shortcoming that large tracts of land is produced.In recent years, people start to attempt the SERS substrate (Chinese patent CN200710055453) of using nanometer embossing to prepare ordered structure, so both can realize in batches large tracts of land production of SERS, and can utilize again its high-sequential structure can its response sensitivity of large increase.But use traditional nanometer embossing to prepare the SERS substrate, substrate is required to extremely harshness, requiring substrate must be rigidity, plane template, and inapplicable for the substrate on some complex topography or higher curvature surface.Simultaneously traditional nanometer embossing, complex procedures, middle must could being transferred to orderly pattern on substrate thoroughly through ejection technique.
Summary of the invention
In order to overcome the above problems, the object of the present invention is to provide a kind of preparation method of surface enhanced Raman scattering substrate, the method can prepare orderly nanostructured pattern on the substrate of any pattern, and the ejection technique in the middle of simultaneously reducing, realize directly efficient large-area preparation SERS substrate.
Technical scheme of the present invention is achieved in the following ways: a kind of preparation method of surface enhanced Raman scattering substrate comprises the steps:
1), prepare the flexible nano impression block with figuratum two-layer composite: this two-layer compound template upper strata is flexible macromolecular elastomer substrate, and the Young modulus scope is at 1 ~ 5 N/mm
2, the photocuring macromolecule embossed layer that lower floor is rigidity, the Young modulus scope is at 20 N/mm
2above, its thickness is 20 ~ 500 nm, upper and lower two-layerly combine closely by bonding or chemical bond;
The photocuring macromolecule embossed layer of described lower floor rigidity, its surface bond has one deck low-surface-energy to fluoridize organic molecule or macromolecule adherent layer.
2), impress out the ordered nano-structure pattern: adopt the combined type nano-imprinting method to impress out the ordered nano-structure pattern at the substrate surface cleaned up with figuratum flexible nano impression block;
Described combined type nano-imprinting method: (1), on the substrate surface cleaned up coating ultraviolet solidified nano impression glue, form the impression glue-line; (2), the flexible nano impression block is pressed into to above-mentioned impression glue-line by pressure, the bottom of the nanostructured bossing in the flexible nano impression block is directly contacted with substrate; (3): after the typing of impression glue, remove template;
The long-pending volume that is less than flexible nano impression block protrusions part of described ultraviolet solidified nano impression colloid.
Described template is pressed into to impression during glue-line, external pressure is less than 0.01 atmospheric pressure or without atmospheric pressure.
Described nano impression glue by percentage to the quality, comprising: 2 ~ 60% polyfunctional acrylic ester prepolymer, 40 ~ 98% solvent, account for 0.5 ~ 5% ultraviolet light radical initiator of polyfunctional acrylic ester prepolymer total amount.
Described functionality acrylic ester prepolymer comprises the acrylate group of two or more addition polymerizations, the polyfunctional acrylic ester prepolymer at room temperature presents liquid condition, its viscosity is 1000 ~ 10000 centipoises, it is standard that its polarity be take the water droplet surface contact angle of its curing caudacoria, and its contact angle is 45 ~ 90 degree;
Described solvent is non-reacted solvent or reactive monomer; Described non-reacted solvent is one or more in glycol monoethyl ether, chlorine benzene,toluene,xylene, acetone, MEK, methyl isobutyl ketone, formic ether, ethyl acetate, dimethyl formamide; Described reactive monomer comprises one or more in methyl methacrylate, methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate.
Described ultraviolet light radical initiator is one or more in benzophenone, 4-methyldiphenyl ketone, styrax methyl ether.
Described ultraviolet light radical initiator accounts for 1 ~ 3% of polyfunctional acrylic ester prepolymer total amount.
3), adopt the method for vacuum evaporation impressing the substrate surface plated metal particle of ordered nano-structure pattern;
4), adopt O
2reactive ion etching process is removed nano impression glue restraining barrier, finally obtains metallics metal ordered structure surface alternately and strengthens Raman scattering substrate.
The present invention and prior art have following advantage: the flexible impression block that 1, adopts two-layer composite, can realize the high-resolution ordered nano-structure pattern of preparation on the substrate of plane and appearance structure complexity, even thereby realize also can obtaining high performance Surface enhanced raman spectroscopy substrate at the substrate of curved surface and complex topography, can save greatly the starting material of producing SERS substrate process, thereby realize low-cost large-area production.2, the present invention has used and a kind ofly without the remnant layer nanometer embossing, has prepared the SERS substrate, has saved in traditional nanometer embossing and has needed to use the reactive ion etching ion technology to remove the operation of remnant layer impression glue, not only saves cost but also save time.3, the combined type nanometer embossing that the present invention adopts prepares the SERS substrate, do not need other extreme conditions such as high pressure, the impression mild condition, can not cause damage to template and substrate, can extend the life-span of template and substrate, further reduce the cost of producing the SERS substrate.
The accompanying drawing explanation
Fig. 1 is preparation technology's schematic diagram that the implementation case ordered structure surface strengthens Raman scattering substrate.
Fig. 2 is the combined type nano-imprint process schematic diagram that the implementation case adopts.
Embodiment
A kind of preparation method of surface enhanced Raman scattering substrate, comprise the steps:
1, prepare the flexible nano impression block with figuratum two-layer composite: this two-layer compound template upper strata is flexible macromolecular elastomer substrate, and the Young modulus scope is at 1 ~ 5 N/mm
2, the photocuring macromolecule embossed layer that lower floor is rigidity, the Young modulus scope is at 20 N/mm
2above, its thickness is 20 ~ 500 nm, upper and lower two-layerly combine closely by bonding or chemical bond; The photocuring macromolecule embossed layer of lower floor's rigidity, its surface bond has one deck low-surface-energy to fluoridize organic molecule or macromolecule adherent layer.
2, impress out the ordered nano-structure pattern: adopt the combined type nano-imprinting method to impress out the ordered nano-structure pattern at the substrate surface cleaned up with figuratum flexible nano impression block;
Described combined type nano-imprinting method: (1), on the substrate surface cleaned up coating ultraviolet solidified nano impression glue, form the impression glue-line; (2), the flexible nano impression block is pressed into to above-mentioned impression glue-line by pressure, the bottom of the nanostructured bossing in the flexible nano impression block is directly contacted with substrate; (3): after the typing of impression glue, remove template; The long-pending volume that is less than flexible nano impression block protrusions part of ultraviolet solidified nano impression colloid.Template is pressed into to impression during glue-line, and external pressure is less than 0.01 atmospheric pressure or without atmospheric pressure.
Described nano impression glue by percentage to the quality, comprising: 2 ~ 60% polyfunctional acrylic ester prepolymer, 40 ~ 98% solvent, account for 0.5 ~ 5% ultraviolet light radical initiator of polyfunctional acrylic ester prepolymer total amount.The functionality acrylic ester prepolymer comprises the acrylate group of two or more addition polymerizations, the polyfunctional acrylic ester prepolymer at room temperature presents liquid condition, its viscosity is 1000 ~ 10000 centipoises, it is standard that its polarity be take the water droplet surface contact angle of its curing caudacoria, and its contact angle is 45 ~ 90 degree; Solvent is non-reacted solvent or reactive monomer; Non-reacted solvent is one or more in glycol monoethyl ether, chlorine benzene,toluene,xylene, acetone, MEK, methyl isobutyl ketone, formic ether, ethyl acetate, dimethyl formamide; Reactive monomer comprises one or more in methyl methacrylate, methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate.The ultraviolet light radical initiator is one or more in benzophenone, 4-methyldiphenyl ketone, styrax methyl ether.The ultraviolet light radical initiator accounts for 1 ~ 3% of polyfunctional acrylic ester prepolymer total amount.
3, adopt the method for vacuum evaporation impressing the substrate surface plated metal particle of ordered nano-structure pattern.
4, adopt O
2reactive ion etching process is removed nano impression glue restraining barrier, finally obtains metallics metal ordered structure surface alternately and strengthens Raman scattering substrate.
Embodiment mono-:
Choose silicon chip as substrate, polyfunctional acrylic ester prepolymer at 1 cm cleaned up * 1 cm substrate surface spin coating one deck 500 nm impresses glue as ultraviolet light curing nano, by the flexible nano impression block, (be the dot matrix type structure, each groove size is 800 nm * 800 nm, spacing is 1 μ m) be pressed into impression glue, the bossing of impression block is directly contacted with the substrate bottom, remove template after glue typing to be imprinted, utilize the combined type nano-imprinting method to construct orderly lattice structure at the bottom of silicon wafer-based, the thick gold grain of evaporation one deck 50 nm in this substrate, finally use O
2reactive ion etching process is removed nano impression glue restraining barrier, thereby obtain spacing, is 800 nm, and size is that gold grain dot matrix that 1 μ m * 1 μ m is evenly distributed is as the SERS substrate.
Claims (7)
1. the preparation method of a surface enhanced Raman scattering substrate, comprise the steps: 1), prepare the flexible nano impression block with figuratum two-layer composite; 2), impress out the ordered nano-structure pattern; 3), vacuum evaporation; 4), remove nano impression glue restraining barrier; It is characterized in that:
1), prepare the flexible nano impression block with figuratum two-layer composite: this two-layer compound template upper strata is flexible macromolecular elastomer substrate, and the Young modulus scope is at 1 ~ 5 N/mm
2, the photocuring macromolecule embossed layer that lower floor is rigidity, the Young modulus scope is at 20 N/mm
2above, its thickness is 20 ~ 500 nm, upper and lower two-layerly combine closely by bonding or chemical bond;
2), impress out the ordered nano-structure pattern: adopt the combined type nano-imprinting method to impress out the ordered nano-structure pattern at the substrate surface cleaned up with figuratum flexible nano impression block;
3), vacuum evaporation: adopt the method for vacuum evaporation impressing the substrate surface plated metal particle of ordered nano-structure pattern;
4), remove nano impression glue restraining barrier: adopt O
2reactive ion etching process is removed nano impression glue restraining barrier, finally obtains metallics metal ordered structure surface alternately and strengthens Raman scattering substrate.
2. the preparation method of a kind of surface enhanced Raman scattering substrate according to claim 1, it is characterized in that: the photocuring macromolecule embossed layer of the lower floor's rigidity in described step 1), its surface bond has one deck low-surface-energy to fluoridize organic molecule or macromolecule adherent layer.
3. the preparation method of a kind of surface enhanced Raman scattering substrate according to claim 1, it is characterized in that: the combined type nano-imprinting method described step 2) is: (1), on the substrate surface cleaned up coating ultraviolet solidified nano impression glue, form the impression glue-line; (2), the flexible nano impression block is pressed into to above-mentioned impression glue-line by pressure, the bottom of the nanostructured bossing in the flexible nano impression block is directly contacted with substrate; (3), after the typing of impression glue, remove template.
4. the preparation method of a kind of surface enhanced Raman scattering substrate according to claim 3, is characterized in that: the long-pending volume that is less than flexible nano impression block protrusions part of described ultraviolet solidified nano impression colloid.
5. the preparation method of a kind of surface enhanced Raman scattering substrate according to claim 3 is characterized in that: when described flexible nano impression block is pressed into the impression glue-line, external pressure is less than 0.01 atmospheric pressure or without atmospheric pressure.
6. the preparation method of a kind of surface enhanced Raman scattering substrate according to claim 3, it is characterized in that: described nano impression glue, by percentage to the quality, comprising: 2 ~ 60% polyfunctional acrylic ester prepolymer, 40 ~ 98% solvent, account for 0.5 ~ 5% ultraviolet light radical initiator of polyfunctional acrylic ester prepolymer total amount.
7. the preparation method of a kind of surface enhanced Raman scattering substrate according to claim 6, it is characterized in that: described functionality acrylic ester prepolymer comprises the acrylate group of two or more addition polymerizations, the polyfunctional acrylic ester prepolymer at room temperature presents liquid condition, its viscosity is 1000 ~ 10000 centipoises, it is standard that its polarity be take the water droplet surface contact angle of its curing caudacoria, and its contact angle is 45 ~ 90 degree; Described solvent is non-reacted solvent or reactive monomer; Described non-reacted solvent is one or more in glycol monoethyl ether, chlorine benzene,toluene,xylene, acetone, MEK, methyl isobutyl ketone, formic ether, ethyl acetate, dimethyl formamide; Described reactive monomer comprises one or more in methyl methacrylate, methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate; Described ultraviolet light radical initiator is one or more in benzophenone, 4-methyldiphenyl ketone, styrax methyl ether, and the ultraviolet light radical initiator accounts for 1 ~ 3% of polyfunctional acrylic ester prepolymer total amount.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013100322392A CN103091983A (en) | 2013-01-29 | 2013-01-29 | Preparation method of surface-enhanced Raman scattering substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013100322392A CN103091983A (en) | 2013-01-29 | 2013-01-29 | Preparation method of surface-enhanced Raman scattering substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103091983A true CN103091983A (en) | 2013-05-08 |
Family
ID=48204730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2013100322392A Pending CN103091983A (en) | 2013-01-29 | 2013-01-29 | Preparation method of surface-enhanced Raman scattering substrate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103091983A (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103435004A (en) * | 2013-07-25 | 2013-12-11 | 东莞上海大学纳米技术研究院 | Surface-enhanced Raman active substrate preparation method based on template replication technology |
| CN104878427A (en) * | 2015-06-16 | 2015-09-02 | 华中科技大学 | Method for preparing flexible transparent surface-enhanced Raman scattering substrate through nano-imprinting |
| CN105424676A (en) * | 2015-11-24 | 2016-03-23 | 郭秋泉 | Preparation method of flexible surface enhanced Raman spectrum substrate and application thereof |
| CN105671492A (en) * | 2016-01-18 | 2016-06-15 | 上海交通大学 | SERS substrate based on REBCO template and preparation method |
| CN107727639A (en) * | 2017-11-16 | 2018-02-23 | 江苏师范大学 | The preparation method and application of the flexible sensing film of area load noble metal nano particles |
| WO2019056586A1 (en) * | 2017-09-20 | 2019-03-28 | 南方科技大学 | Method for preparing optical metasurface |
| CN111929277A (en) * | 2020-06-03 | 2020-11-13 | 中国科学院苏州生物医学工程技术研究所 | One-dimensional assembly of noble metal nanoparticles with adjustable spacing and application of assembly in nano sensor |
| CN112345510A (en) * | 2020-10-30 | 2021-02-09 | 华中农业大学 | Manufacturing process and application of flexible Raman enhanced intelligent sensing device suitable for rape crops |
| CN113299802A (en) * | 2021-05-06 | 2021-08-24 | 深圳市思坦科技有限公司 | Preparation method of LED chip structure and prepared LED chip structure |
| CN113419400A (en) * | 2021-05-31 | 2021-09-21 | 西安电子科技大学 | Plasma flexible transparent film based on nanoimprint lithography and preparation method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102157621A (en) * | 2011-03-03 | 2011-08-17 | 郑州大学 | Square silicon nanometer hole and preparation method thereof |
| CN102285629A (en) * | 2011-05-05 | 2011-12-21 | 厦门大学 | Preparation method for surface-enhanced Raman spectrum active substrate |
| CN102508409A (en) * | 2011-10-27 | 2012-06-20 | 无锡英普林纳米科技有限公司 | Ultraviolet-light-assisted thermocuring nanoimprint lithography technology and material |
| CN102591140A (en) * | 2011-12-30 | 2012-07-18 | 苏州锦元纳米科技有限公司 | Nano-imprinting method |
| CN102621126A (en) * | 2012-03-28 | 2012-08-01 | 上海大学 | Metal nanodot array surface enhancing Raman active base and preparation method thereof |
-
2013
- 2013-01-29 CN CN2013100322392A patent/CN103091983A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102157621A (en) * | 2011-03-03 | 2011-08-17 | 郑州大学 | Square silicon nanometer hole and preparation method thereof |
| CN102285629A (en) * | 2011-05-05 | 2011-12-21 | 厦门大学 | Preparation method for surface-enhanced Raman spectrum active substrate |
| CN102508409A (en) * | 2011-10-27 | 2012-06-20 | 无锡英普林纳米科技有限公司 | Ultraviolet-light-assisted thermocuring nanoimprint lithography technology and material |
| CN102591140A (en) * | 2011-12-30 | 2012-07-18 | 苏州锦元纳米科技有限公司 | Nano-imprinting method |
| CN102621126A (en) * | 2012-03-28 | 2012-08-01 | 上海大学 | Metal nanodot array surface enhancing Raman active base and preparation method thereof |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103435004A (en) * | 2013-07-25 | 2013-12-11 | 东莞上海大学纳米技术研究院 | Surface-enhanced Raman active substrate preparation method based on template replication technology |
| CN104878427A (en) * | 2015-06-16 | 2015-09-02 | 华中科技大学 | Method for preparing flexible transparent surface-enhanced Raman scattering substrate through nano-imprinting |
| CN105424676A (en) * | 2015-11-24 | 2016-03-23 | 郭秋泉 | Preparation method of flexible surface enhanced Raman spectrum substrate and application thereof |
| CN105671492B (en) * | 2016-01-18 | 2018-07-03 | 上海交通大学 | A kind of SERS substrates and preparation method based on REBCO masterplates |
| CN105671492A (en) * | 2016-01-18 | 2016-06-15 | 上海交通大学 | SERS substrate based on REBCO template and preparation method |
| WO2019056586A1 (en) * | 2017-09-20 | 2019-03-28 | 南方科技大学 | Method for preparing optical metasurface |
| CN107727639A (en) * | 2017-11-16 | 2018-02-23 | 江苏师范大学 | The preparation method and application of the flexible sensing film of area load noble metal nano particles |
| CN111929277A (en) * | 2020-06-03 | 2020-11-13 | 中国科学院苏州生物医学工程技术研究所 | One-dimensional assembly of noble metal nanoparticles with adjustable spacing and application of assembly in nano sensor |
| CN111929277B (en) * | 2020-06-03 | 2021-06-01 | 中国科学院苏州生物医学工程技术研究所 | One-dimensional assembly of noble metal nanoparticles with adjustable spacing and application of assembly in nano sensor |
| CN112345510A (en) * | 2020-10-30 | 2021-02-09 | 华中农业大学 | Manufacturing process and application of flexible Raman enhanced intelligent sensing device suitable for rape crops |
| CN113299802A (en) * | 2021-05-06 | 2021-08-24 | 深圳市思坦科技有限公司 | Preparation method of LED chip structure and prepared LED chip structure |
| CN113299802B (en) * | 2021-05-06 | 2022-09-09 | 深圳市思坦科技有限公司 | Preparation method of LED chip structure and prepared LED chip structure |
| CN113419400A (en) * | 2021-05-31 | 2021-09-21 | 西安电子科技大学 | Plasma flexible transparent film based on nanoimprint lithography and preparation method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103091983A (en) | Preparation method of surface-enhanced Raman scattering substrate | |
| CN103868909B (en) | Mushroom-shaped array surface strengthens Raman spectrum active substrate and preparation method | |
| CN101479031B (en) | Monoparticulate-film etching mask and process for producing the same, process for producing fine structure with the monoparticulate-film etching mask, and fine structure obtained by the production pro | |
| CN103575721B (en) | A kind of sandwich construction surface enhanced Raman scattering substrate and preparation method thereof | |
| Giannakou et al. | Water-transferred, inkjet-printed supercapacitors toward conformal and epidermal energy storage | |
| CN105304164B (en) | A kind of water base nano silver wire ink and its method for manufacturing thin film easily post-processed | |
| WO2016065308A1 (en) | Nanoshape patterning techniques that allow high-speed and low-cost fabrication of nanoshape structures | |
| CN106567119A (en) | Polymer based nanometer cone structure SERS substrate and preparation method | |
| CN102897709B (en) | Manufacturing method of low-cost micronano integrated structure | |
| CN102530845B (en) | Method for preparing triangular metal nano-pore array | |
| CN103451610B (en) | Novel bionic Raman spectrum base and preparation method thereof | |
| CN103435004B (en) | Surface-enhanced Raman active substrate preparation method based on template replication technology | |
| CN101806996A (en) | Preparation method of nanoimprint hard templates | |
| CN101581878A (en) | Fabricating method of soft template with nanometer structure | |
| CN104803348A (en) | Method for preparing high depth-width ratio polymer nanorod array by sacrificing template | |
| CN102903853A (en) | Ink-jet printing preparation method of organic solar battery optical active layer film | |
| CN101837950A (en) | Device and method for assembling nanostructure directly by using two-block copolymer | |
| CN102208547A (en) | Substrate for flexible photoelectronic device and preparation method thereof | |
| DE102010044133B4 (en) | Etching process for surface structuring and etching mask | |
| CN103213938B (en) | Gold nano cap array surface strengthens Raman active substrate and preparation method thereof | |
| Zhang et al. | Fabricating patterned microstructures by embedded droplet printing on immiscible deformable surfaces | |
| CN102654458A (en) | Method for fabricating waveguide type surface plasma resonance sensor chip | |
| CN106750473A (en) | A kind of method that anti-stamping technique of use room temperature prepares high-resolution thermoplastic polymer pattern | |
| CN102654459A (en) | Method for fabricating surface plasma resonance sensor chip | |
| CN106098927B (en) | A kind of sandwich style flexible capacitance type pressure sensor and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20130508 |