CN102943252A - High-power heater for metal-organic chemistry vapor deposition equipment - Google Patents
High-power heater for metal-organic chemistry vapor deposition equipment Download PDFInfo
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- CN102943252A CN102943252A CN2012105208613A CN201210520861A CN102943252A CN 102943252 A CN102943252 A CN 102943252A CN 2012105208613 A CN2012105208613 A CN 2012105208613A CN 201210520861 A CN201210520861 A CN 201210520861A CN 102943252 A CN102943252 A CN 102943252A
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Abstract
The invention discloses a high-power heater for metal-organic chemistry vapor deposition equipment. The high-power heater comprises a furnace body and a center hole arranged on the middle of the furnace body, wherein the periphery of the center hole is provided with a first support, the periphery of the furnace body is provided with a second support, and a third support is positioned between the first support and the second support on the furnace body; and the head of the first support is provided with multiple layers of heating coil clamping grooves which are arranged up and down, the upper side and outer side of the head of the second support are respectively provided with a plurality of heating coil clamping grooves, the head of the third support is provided with a heating coil clamping groove, and the clamping grooves are provided with heating coils. The support of the periphery of the center hole of the furnace body adopts a multi-layer heating coil clamping groove structure, and the heat loss of a center shaft is effectively prevented so as not to influence the temperature uniformity; and the upper side and outer side of the head of the periphery support of the furnace body are respectively provided with a plurality of heating coil clamping grooves, and the heat is effectively prevented from outward missing and further influencing the temperature uniformity.
Description
Technical field
The invention belongs to well heater, be specifically related to a kind of superpower well heater that can be used for metal organic chemical vapor deposition equipment.
Background technology
With metal organic chemical vapor deposition equipment (MOCVD) preparation semiconductor film material the time, the chemical reaction that occurs all is to carry out under specific temperature environment, and temperature homogeneity directly affects the quality of film.The demand that the equipment cavity diameter is constantly increased in order to adapt to market, the diameter of well heater also can increase relatively, and well heater is along with the increase of diameter, and design difficulty will increase thereupon.Existing major diameter well heater is provided with centre hole at body of heater middle part usually so that can the mounting center axle, drives the graphite high-speed rotary and obtains more uniformly heats.The problem that this well heater exists is that the heating wire heat radiation of body of heater centre hole and periphery is very fast, affects the homogeneity of Heating temperature, and the quality of converted products is brought impact.
Summary of the invention
The purpose of this invention is to provide the superpower well heater that a kind of Heating temperature can be used for metal organic chemical vapor deposition equipment uniformly.
The technical scheme that realizes the object of the invention employing is as follows:
The superpower well heater that can be used for metal organic chemical vapor deposition equipment provided by the invention, be provided with a centre hole in the middle of comprising body of heater, body of heater, be provided with the first support around the centre hole, the periphery of body of heater is provided with the second support, is provided with the 3rd support on the body of heater between the first support and the second support; The head of described the first support is provided with and is the up and down heating wire draw-in groove of multilayer arrangement, and the head top of the second support and outer side edges are respectively equipped with a plurality of heating wire draw-in grooves, and the head of the 3rd support is provided with a heating wire draw-in groove, is provided with heating wire in the described draw-in groove.
The head top of described the second support and outer side edges are respectively equipped with 3 transversely arranged heating wire draw-in grooves and 2 or 3 vertically disposed heating wire draw-in grooves.
Support adopts multilayer heating wire notch around the body of heater centre hole of well heater of the present invention, can effectively prevent the central shaft heat loss and affect temperature homogeneity, the head top of body of heater peripheral bracket and outer side edges are respectively equipped with a plurality of heating wire draw-in grooves, can prevent effectively that heat outwards scatters and disappears and affects temperature homogeneity.
Further specify technical scheme of the present invention below in conjunction with accompanying drawing.
Description of drawings
Accompanying drawing is structural representation of the present invention.
Embodiment
See accompanying drawing, the superpower well heater that can be used for metal organic chemical vapor deposition equipment, comprise the circular body of heater that is provided with leg 11, body of heater comprises negative electrode plate setting up and down 8 and positive electrode plate 10, positive electrode plate 10 and negative electrode plate 8 interfix by interconnecting piece 15 and insulate, negative electrode plate 8 is provided with negative potential 12, positive electrode plate 10 is provided with positive electrode 14, be provided with retaining plate 9 between positive electrode plate 10 and the negative electrode plate 8, negative electrode plate 8 is provided with reflector 5 by support component 13, be provided with a centre hole 1 in the middle of the body of heater, be divided into A from centre hole 1 to periphery, B, C, (less body of heater can only have A for diameter in the D district, B, C three districts), the A district around the centre hole 1 is provided with the first support 2, the D district of body of heater periphery is provided with the second support 7, the B on the body of heater between the first support 2 and the second support 7, the C district is provided with the 3rd support 4; The head of described the first support 2 is provided with and is the up and down heating wire draw-in groove of two-layer arrangement, the head top of the second support 7 and outer side edges are respectively equipped with 3 transversely arranged heating wire draw-in grooves and 2 or 3 vertically disposed heating wire draw-in grooves, the head of the 3rd support 4 is provided with a heating wire draw-in groove, be provided with heating wire 3 in the described draw-in groove, be provided with in use graphite plate (or graphite plate of carbonization silicone disc or silicon carbide parcel) 6 above the heating wire 3 of body of heater, graphite plate 6 drives rotation by the central shaft that is installed in the centre hole 1.
Claims (2)
1. superpower well heater that can be used for metal organic chemical vapor deposition equipment, be provided with a centre hole in the middle of comprising body of heater, body of heater, it is characterized in that centre hole around be provided with the first support, the periphery of body of heater is provided with the second support, is provided with the 3rd support on the body of heater between the first support and the second support; The head of described the first support is provided with and is the up and down heating wire draw-in groove of multilayer arrangement, and the head top of the second support and outer side edges are respectively equipped with a plurality of heating wire draw-in grooves, and the head of the 3rd support is provided with a heating wire draw-in groove, is provided with heating wire in the described draw-in groove.
2. the superpower well heater that can be used for metal organic chemical vapor deposition equipment according to claim 1 is characterized in that the head top of described the second support and outer side edges are respectively equipped with 3 transversely arranged heating wire draw-in grooves and 2 or 3 vertically disposed heating wire draw-in grooves.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012105208613A CN102943252A (en) | 2012-12-07 | 2012-12-07 | High-power heater for metal-organic chemistry vapor deposition equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012105208613A CN102943252A (en) | 2012-12-07 | 2012-12-07 | High-power heater for metal-organic chemistry vapor deposition equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102943252A true CN102943252A (en) | 2013-02-27 |
Family
ID=47726234
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012105208613A Pending CN102943252A (en) | 2012-12-07 | 2012-12-07 | High-power heater for metal-organic chemistry vapor deposition equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102943252A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114016003A (en) * | 2021-10-22 | 2022-02-08 | 宁波沁圆科技有限公司 | Reaction chamber of chemical vapor deposition device and chemical vapor deposition device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6340795A (en) * | 1986-08-05 | 1988-02-22 | Kyushu Denshi Kinzoku Kk | Vapor growth device |
| US5294778A (en) * | 1991-09-11 | 1994-03-15 | Lam Research Corporation | CVD platen heater system utilizing concentric electric heating elements |
| CN201793735U (en) * | 2010-09-27 | 2011-04-13 | 富强半导体有限公司 | Wafer heating device |
-
2012
- 2012-12-07 CN CN2012105208613A patent/CN102943252A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6340795A (en) * | 1986-08-05 | 1988-02-22 | Kyushu Denshi Kinzoku Kk | Vapor growth device |
| US5294778A (en) * | 1991-09-11 | 1994-03-15 | Lam Research Corporation | CVD platen heater system utilizing concentric electric heating elements |
| CN201793735U (en) * | 2010-09-27 | 2011-04-13 | 富强半导体有限公司 | Wafer heating device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114016003A (en) * | 2021-10-22 | 2022-02-08 | 宁波沁圆科技有限公司 | Reaction chamber of chemical vapor deposition device and chemical vapor deposition device |
| CN114016003B (en) * | 2021-10-22 | 2024-01-09 | 宁波沁圆科技有限公司 | Reaction chamber of chemical vapor deposition device and chemical vapor deposition device |
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20130227 |