Summary of the invention
In view of above content, but be necessary to provide a kind of etching system of uniform etching bend glass.
A kind of etching system, it comprises matrix and liquid storage spare, and liquid storage spare is installed on the matrix, and liquid storage spare offers be used to the accommodation hole of accommodating etching solution.The side of liquid storage spare also offers the jet hole that is communicated with accommodation hole, and etching solution is spouting from jet hole.Etching system comprises that also rotation is installed on the tumbler on the matrix, and the side of tumbler and liquid storage spare is oppositely arranged.
When adopting above-mentioned etching system etching bend glass, because tumbler drives bend glass and rotates, etching solution can be injected on the bend glass from all angles, make bend glass be subject to equably the etching of etching solution, thereby avoided because the bend glass surface imperfection, the flow velocity that makes etching solution is inhomogeneous and cause etching inhomogeneous.
Embodiment
See also Fig. 1, etching system 100 is used for etching is carried out on bend glass 200 surfaces, and etching system 100 comprises matrix 10, liquid storage spare 30, air compressor 40 and tumbler 50.Liquid storage spare 30 is used for holding etching solution, and it is connected with air compressor 40, so that etching solution is interior spouting from liquid storage spare 30.Tumbler 50 is installed on the matrix 10 rotationally, and contiguous liquid storage spare 30.Bend glass 200 is fixed on the tumbler 50, can be sprayed on the surface of bend glass 200 from liquid storage spare 30 interior spouting etching solutions, with etching bend glass 200.
Please consult simultaneously Fig. 2 and Fig. 3, matrix 10 is used for installing liquid storage spare 30 and tumbler 50, and in embodiment of the present invention, matrix 10 is discoid.Offer the first open holes 11 and the second open holes 13 on the matrix 10.The first open holes 11 is opened in the central position of matrix 10.The quantity of the second open holes 13 is a plurality of, and a plurality of the second open holess 13 are evenly offered around the first open holes 11, and are positioned at take the first open holes 11 on the circumferential line in the center of circle.
Liquid storage spare 30 comprises resettlement section 31 and end cap portions 33.Resettlement section 31 roughly is right cylinder, and correspondence is installed on the first open holes 11 places.Resettlement section 31 comprises the first end face 311 away from matrix 10, the second end face 312 of close matrix 10 and the side 313 that connects the first end face 311 and the second end face 312.The mid-way of the first end face 311 offers accommodation hole 3110, and extends to vertically the position of contiguous the second end face 312, makes accommodation hole 3110 form blind hole to accommodate etching solution.The second end face 312 is fixedly connected with matrix 10.Radially offer a plurality of jet holes 3130 that are communicated with accommodation hole 3110 around accommodation hole 3110 on the side 313, a plurality of jet holes 3130 are covered with side 313.In embodiment of the present invention, a plurality of jet holes 3130 are rule arranges, and makes a plurality of jet holes 3130 form vertically laminate structure, and the plane at a plurality of jet hole 3130 every one deck places is parallel with the first end face 311 or the second end face 312.Be appreciated that a plurality of jet holes 3130 also can be random and arrange in a jumble.End cap portions 33 is connected with the first end face 311 of resettlement section 31, with capping resettlement section 31.End cap portions 33 is cylindrical, and the intermediate position offers communicating aperture 330, and communicating aperture 330 is connected with the accommodation hole 3110 of resettlement section 31.
Air compressor 40 is connected with the communicating aperture 330 of liquid storage spare 30, makes the etching solution blowing perforation 3130 that is contained in resettlement section 31 spouting to produce high-pressure air.
Be appreciated that air compressor 40 also can omit, when this kind situation, liquid storage spare 30 be arranged on the matrix 10 rotationally, utilize an actuator to drive liquid storage spare 30 and rotate, make etching solution blowing perforation 3130 under the effect of centrifugal force spouting.
Tumbler 50 correspondences are installed on the second open holes 13 places of matrix 10, and its quantity is corresponding with the quantity of the second open holes 13.Tumbler 50 comprises main body 51 and rotation axis 53.Main body 51 is roughly cylindrical, and a plurality of bend glasses 200 can be installed in its side, and is oppositely arranged with the jet hole 3130 of liquid storage spare 30.In embodiment of the present invention, bend glass 200 adopts adhesive means to be fixed in the side of main body 51.Rotation axis 53 passes the second open holes 13 main body 51 is fixed on the matrix 10 rotationally.Be appreciated that tumbler 50 also can comprise a plurality of suckers that are arranged on the main body 51, with adsorption curve glass 200.Perhaps, tumbler 50 also can comprise a plurality of snap-in structures that are arranged on the main body 51, with fixing engaging bend glass 200.
Etching system 100 also comprises the actuator that rotates for driving tumbler 50.The quantity of actuator is corresponding with the quantity of tumbler 50, and each actuator links to each other with a tumbler 50.The quantity that is appreciated that actuator also can when this kind situation, can arrange gear mechanism less than the quantity of tumbler 50 between tumbler 50, to realize interlock.
During etching bend glass 200, bend glass 200 is installed on the side of the main body 51 of tumbler 50, tumbler 50 is rotated, etching solution blowing perforation 3130 is injected into the surface of bend glass 200.During etching, because tumbler 50 drives bend glass 200 and rotates, etching solution can differently be injected on the bend glass 200 from all angles height, make bend glass 200 be subject to equably the etching of etching solution, thereby avoided because the bend glass surface imperfection, the flow velocity that makes etching solution is inhomogeneous and cause etching inhomogeneous.
The etching system 100 that is appreciated that embodiment of the present invention also can be used for flat glass is carried out etching, perhaps is used to be etched that suitable etching solution also can be used for other material and carries out etching.
Be appreciated that those skilled in the art also can do other variation in spirit of the present invention, as long as it does not depart from technique effect of the present invention and all can.The variation that these are done according to spirit of the present invention all should be included within the present invention's scope required for protection.