CN102877038A - Transparent conductive film reeling coating device and application method thereof - Google Patents
Transparent conductive film reeling coating device and application method thereof Download PDFInfo
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- CN102877038A CN102877038A CN2012103639291A CN201210363929A CN102877038A CN 102877038 A CN102877038 A CN 102877038A CN 2012103639291 A CN2012103639291 A CN 2012103639291A CN 201210363929 A CN201210363929 A CN 201210363929A CN 102877038 A CN102877038 A CN 102877038A
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Abstract
The invention relates to a transparent conductive film reeling coating device and an application method thereof. A transparent conductive film reeling coating device comprises an unreeling chamber, a coating chamber and a reeling chamber which are orderly connected, also comprises a control system, wherein the control system comprises: a gas analyzer disposed in the coating chamber for analyzing components and contents of gas in the coating chamber; a vacuum gauge disposed in the coating chamber for measuring the gas pressure in the coating chamber; a gas flowmeter disposed on a gas inlet pipe of the coating chamber for controlling the gas inflow of the coating chamber; a tension control system disposed in the unreeling chamber, the coating chamber and the reeling chamber for controlling the smooth running of flexible base materials; and a computer connected with the on-line gas analyzer, the vacuum gauge, the gas flowmeter, an on-line resistance meter, and an on-line transmittance tester. The transparent conductive film reeling coating device performs real-time adjustment of the gas inflow of the coating chamber through on-line monitoring of the working parameters of the coating chamber, and thus provides a high production control degree, controllable product performance, and improved production efficiency.
Description
Technical field
The present invention relates to a kind of winding film plating equipment, particularly relate to a kind of coil film coating apparatus for flexible transparent conducting film and using method thereof.
Background technology
The vacuum winding coating technique is to have the technology of the film of certain function by methods such as thermal evaporation or magnetron sputterings at flexible parent metal surface preparation one deck or multilayer in vacuum chamber.Vacuum winding filming equipment technical characteristics is: one, and being plated base material is flexible parent metal, namely has the property of coiling; Its two, coating process has continuity, namely plated film carries out continuously within a work period; Its three, coating process carries out in certain vacuum environment.Rotate so the basic structure of vacuum winding filming equipment must have to reel, unreeling and rolling of base material arranged.Unreel with wrapup procedure in base material be coated with film.The structure of plated film is exactly the operate portions of vacuum winding filming equipment.It is between the unwinding and rewinding of base material.The principle of work of plated film part can be any one in thermal resistance evaporation, induction evaporation mode, electron beam evaporation, magnetron sputtering or other vacuum coating method.
The control techniques of traditional flexible transparent conducting film production only is the control to power parameter, and is not high for the controllability of process.
Summary of the invention
Based on this, be necessary the nesa coating coil film coating apparatus and the using method thereof that provide a kind of production control degree higher.
A kind of nesa coating coil film coating apparatus, comprise successively link to each other unreel chamber, coating chamber and rolling chamber and vacuum acquiring system, the described chamber that unreels is transported to plated film in the described coating chamber with flexible parent metal, form nesa coating, described rolling chamber is used for receiving described nesa coating, and described vacuum acquiring system is installed on described coating chamber, is used for obtaining the required vacuum state of plated film, described nesa coating coil film coating apparatus also comprises Controlling System, and described Controlling System comprises:
Gas analyzer is located in the described coating chamber, is used for analyzing gaseous constituent and content in the described coating chamber, and gas wherein has Ar, O
2, H
2O, H
2, N
2, CO, CO
2Deng;
Vacuumometer is located in the described coating chamber, is used for measuring the air pressure in the described coating chamber, and the plated film operating air pressure is generally 10
-4～10
-3Torr;
Gas meter is located on the intake ducting of described coating chamber, is used for controlling the air input of described coating chamber;
Tension control system is located at that to unreel chamber, coating chamber and rolling indoor, is used for the smooth running of control flexible parent metal; And
Computer is taken into account gas meter and is linked to each other with described on-line gas analysis instrument, vacuum.
Among embodiment, described Controlling System also comprises to be located in the described coating chamber and the resistance instrument that links to each other with described computer, for detection of the resistance of nesa coating therein.
Among embodiment, described Controlling System also comprises to be located in the described coating chamber and the online transmission measurement instrument that links to each other with described computer, is used for the in real time transmitance of detection nesa coating therein.
A kind of using method of above-mentioned nesa coating coil film coating apparatus comprises the steps:
Base material enters described coating chamber from the described chamber of unreeling and carries out plated film;
Determine that according to the measuring result of described on-line gas analysis instrument and described vacuumometer foreign gas is (such as H in the described coating chamber
2O, N
2, NO
x, CO, CO
2, CH
4Deng gas) content, H under normal circumstances
2The partial pressure of O is 1 ~ 2.5 * 10
-6Torr, N
2Partial pressure 5 ~ 9 * 10
-8Torr;
When described computer judges that the content (characterizing by partial pressure) of described foreign gas increases, described gas meter reduces the air input of described coating chamber process gas, when described computer judges that the content of described foreign gas reduces, described gas meter increases the air input of described coating chamber process gas, and
The nesa coating that forms behind the plated film is sent into described rolling chamber.
Above-mentioned nesa coating coil film coating apparatus adjust in real time the air input of coating chamber, so the production control degree is higher, and then has been improved production efficiency by the working parameter of on-line monitoring coating chamber.
Description of drawings
Fig. 1 is the structural representation of the nesa coating coil film coating apparatus of an embodiment.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.A lot of details have been set forth in the following description so that fully understand the present invention.But the present invention can implement much to be different from alternate manner described here, and those skilled in the art can do similar improvement in the situation of intension of the present invention, so the present invention is not subjected to the restriction of following public implementation.
See also Fig. 1, the nesa coating coil film coating apparatus 100 of one embodiment comprise successively link to each other unreel chamber 10, coating chamber 20, rolling chamber 30 and vacuum acquiring system (figure does not show, is installed on described coating chamber 20, is used for obtaining the required vacuum state of plated film).
Unreel and be provided with unwinding device 11 in the chamber 10, be used for base material 12 is transported to coating chamber 20 interior plated films.Base material 12 is flexible parent metal, for example the PET(polyethylene terephthalate), the PEN(PEN), the PC(polycarbonate), the PI(polyimide), the PMMA(polymethylmethacrylate) etc.
Unreel and be provided with a plurality of charging guide rollers 22 in the chamber 10.Also be provided with the heating source 221 for heated substrate 12 between a plurality of charging guide rollers 22.Heating source 221 is preferably Infrared heaters, and it is positioned near the base material 12, be used for to remove the steam that is attached to substrate surface, organism etc.Owing to be that vacuum unreels the chamber, so heat the effect of adsorbents such as can reaching good removal pet sheet face steam, organism by infrared emanation with Infrared heaters.
Vacuumize in the coating chamber 20, and pass into process gas by the intake ducting 21 of being located on coating chamber 20 inwalls, for example O
2, Ar, N
2, H
2O, H
2Deng.
Be provided with main warming mill 23 and ion source 222 in the coating chamber 20.The both sides of main warming mill 23 also are respectively equipped with two targets 231.Can with bottom and conductive layer deposition at substrate surface, form nesa coating 32 during target 231 work.Bottom can be MgF
2, TiO
2, SiO
2, Al
2O
3, Nb
2O
5, Ta
2O
5, ZrO
2In one or more; Conductive layer can be ITO, AZO, a kind of in the Graphene (Graphene), two kinds.
Rolling chamber 30 comprises discharging guide roller 24 and wrap-up 31, is used for receiving the nesa coating 32 from coating chamber 20.
Also be provided with gas analyzer 25, vacuumometer 26, gas meter 27 and resistance instrument 28 and transmission measurement instrument 29 in the coating chamber 20.Nesa coating coil film coating apparatus 100 also comprises the computer (not shown), and gas analyzer 25, vacuumometer 26, gas meter 27, resistance instrument 28 and transmission measurement instrument 29 and computer consist of a Controlling System.
On the sidewall relative with gas analyzer 25 that vacuumometer 26 is located at coating chamber 20, be used for measuring the air pressure in the coating chamber 20.
During use, base material 12 enters coating chamber 20 from the unwinding device 11 that unreels chamber 10, and moves along a plurality of charging guide rollers 22, after heating source 221 heating, enters main warming mill 23.Target 231 is deposited on substrate surface with conductive layer, forms nesa coating 32.Nesa coating 32 moves along a plurality of discharging guide rollers 24, and back is transported to the wrap-up 31 interior collection rolling of rolling chamber 30.
In the process of plated film, computer is by gas analyzer 25, vacuumometer 26 and resistance instrument and transmission measurement instrument 28 Real-time Collections and monitor the working condition of coating chamber 20.For example, content by vacuumometer 26 and gas analyzer 25 analysing impurity gases (such as water vapour, nitrogen, carbon monoxide etc.) (by corresponding software with the data feedbacks such as dividing potential drop of foreign gas to computer, the content of foreign gas in the real time reaction vacuum chamber), obtain resistance and the transmitance (showing in real time on computers by corresponding software) of nesa coating 32 by resistance instrument 28 and transmission measurement instrument 29.
Dividing of general under normal circumstances aqueous vapor is pressed in 1 ~ 2.5 * 10
-6Torr, when the content of foreign gas increased, control gas meter 27 reduced the air input of coating chamber 20 process gass.For example, the dividing potential drop when aqueous vapor has increased by 0.4 ~ 1.0 * 10
-6During Torr, with feed rate reduction by the 0.1 ~ 0.3sccm of oxygen.In like manner, when the content of foreign gas reduced, control gas meter 27 increased the air input of coating chamber 20 process gass.By adjusting the feed rate of oxygen, target voltage is controlled when reaching plated film, guarantees target sputter under higher speed, realizes the efficient, controlled of production; By adjusting the feed rate of oxygen, can adjust in real time the quality of rete simultaneously, guarantee compactness and the tack of sputtered layer; By adjusting the feed rate of oxygen, guarantee the optimal light electrical property of sputtered layer.
Above-mentioned nesa coating coil film coating apparatus 100 is by the working parameter of on-line monitoring coating chamber, adjust in real time the air input of coating chamber 20, therefore the production control degree is higher, has improved the controllability of product quality (such as performances such as light, electricity), and then has improved product yield and production efficiency.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (4)
1. nesa coating coil film coating apparatus, comprise successively link to each other unreel chamber, coating chamber, rolling chamber and vacuum acquiring system, the described chamber that unreels is transported to plated film in the described coating chamber with flexible parent metal, form nesa coating, described rolling chamber is used for receiving described nesa coating, described vacuum acquiring system is installed on described coating chamber, be used for obtaining the required vacuum state of plated film, it is characterized in that, described nesa coating coil film coating apparatus also comprises Controlling System, and described Controlling System comprises:
Gas analyzer is located in the described coating chamber, is used for analyzing gaseous constituent and content in the described coating chamber;
Vacuumometer is located in the described coating chamber, is used for measuring the air pressure in the described coating chamber;
Gas meter is located on the intake ducting of described coating chamber, is used for controlling the air input of described coating chamber;
Tension control system is located at that to unreel chamber, coating chamber and rolling indoor, is used for the smooth running of control flexible parent metal; And
Computer is taken into account gas meter and is linked to each other with described on-line gas analysis instrument, vacuum.
2. nesa coating coil film coating apparatus according to claim 1 is characterized in that, described Controlling System also comprises to be located in the described coating chamber and the online resistance instrument that links to each other with described computer, is used for detecting in real time the resistance value of nesa coating.
3. nesa coating coil film coating apparatus according to claim 1 is characterized in that, described Controlling System also comprises to be located in the described coating chamber and the online transmission measurement instrument that links to each other with described computer, is used for detecting in real time the transmitance of nesa coating.
4. the using method of a nesa coating coil film coating apparatus as claimed in claim 1 is characterized in that, comprises the steps:
Base material enters described coating chamber from the described chamber of unreeling and carries out plated film;
Determine the content of foreign gas in the described coating chamber according to the measuring result of described on-line gas analysis instrument and described vacuumometer;
When described computer judges that the content of described foreign gas increases, described gas meter reduces the air input of described coating chamber process gas, when described computer judged that the content of described foreign gas reduces, described gas meter increased the air input of described coating chamber process gas; And
The nesa coating that forms behind the plated film is sent into described rolling chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210363929.1A CN102877038B (en) | 2012-09-26 | 2012-09-26 | Transparent conductive film reeling coating device and application method thereof |
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|---|---|---|---|
| CN201210363929.1A CN102877038B (en) | 2012-09-26 | 2012-09-26 | Transparent conductive film reeling coating device and application method thereof |
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| CN102877038A true CN102877038A (en) | 2013-01-16 |
| CN102877038B CN102877038B (en) | 2014-06-25 |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105349961A (en) * | 2015-11-30 | 2016-02-24 | 广东腾胜真空技术工程有限公司 | Multi-roller and multi-chamber coiling film coating device |
| CN105603380A (en) * | 2015-10-30 | 2016-05-25 | 武汉科技大学 | Vacuum coating high-speed constant coiling tension apparatus and control method thereof |
| CN108165948A (en) * | 2018-02-09 | 2018-06-15 | 旭科新能源股份有限公司 | A kind of online real-time monitoring device and method for magnetron sputtering method production transparent conductive film |
| CN110091522A (en) * | 2018-11-28 | 2019-08-06 | 平高集团有限公司 | A kind of substrate winding device |
| CN110629191A (en) * | 2019-11-01 | 2019-12-31 | 北京大学 | Graphene film roll-to-roll production device and method |
| CN113603081A (en) * | 2021-08-27 | 2021-11-05 | 辽宁分子流科技有限公司 | Preparation method of graphene composite film |
| CN114959626A (en) * | 2022-05-27 | 2022-08-30 | 九江德福科技股份有限公司 | Preparation method and device of ultrathin flexible conductive composite film |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2575891B2 (en) * | 1989-09-21 | 1997-01-29 | 三菱重工業株式会社 | Continuous vacuum deposition equipment |
| CN101033935A (en) * | 2006-03-10 | 2007-09-12 | 奈普森株式会社 | Film thickness measurement device |
| CN201610446U (en) * | 2010-02-02 | 2010-10-20 | 深圳市海森应用材料有限公司 | Winding film coating machine of ITO transparent conductive film |
| CN102304695A (en) * | 2011-10-14 | 2012-01-04 | 南昌欧菲光科技有限公司 | Method for on-line monitoring of residual gas on coiling coating machine |
-
2012
- 2012-09-26 CN CN201210363929.1A patent/CN102877038B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2575891B2 (en) * | 1989-09-21 | 1997-01-29 | 三菱重工業株式会社 | Continuous vacuum deposition equipment |
| CN101033935A (en) * | 2006-03-10 | 2007-09-12 | 奈普森株式会社 | Film thickness measurement device |
| CN201610446U (en) * | 2010-02-02 | 2010-10-20 | 深圳市海森应用材料有限公司 | Winding film coating machine of ITO transparent conductive film |
| CN102304695A (en) * | 2011-10-14 | 2012-01-04 | 南昌欧菲光科技有限公司 | Method for on-line monitoring of residual gas on coiling coating machine |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105603380A (en) * | 2015-10-30 | 2016-05-25 | 武汉科技大学 | Vacuum coating high-speed constant coiling tension apparatus and control method thereof |
| CN105603380B (en) * | 2015-10-30 | 2018-02-13 | 武汉科技大学 | A kind of vacuum coating high speed constant winding tension equipment and control method |
| CN105349961A (en) * | 2015-11-30 | 2016-02-24 | 广东腾胜真空技术工程有限公司 | Multi-roller and multi-chamber coiling film coating device |
| CN108165948A (en) * | 2018-02-09 | 2018-06-15 | 旭科新能源股份有限公司 | A kind of online real-time monitoring device and method for magnetron sputtering method production transparent conductive film |
| CN110091522A (en) * | 2018-11-28 | 2019-08-06 | 平高集团有限公司 | A kind of substrate winding device |
| CN110629191A (en) * | 2019-11-01 | 2019-12-31 | 北京大学 | Graphene film roll-to-roll production device and method |
| CN113603081A (en) * | 2021-08-27 | 2021-11-05 | 辽宁分子流科技有限公司 | Preparation method of graphene composite film |
| CN113603081B (en) * | 2021-08-27 | 2022-08-23 | 辽宁分子流科技有限公司 | Preparation method of graphene composite film |
| CN114959626A (en) * | 2022-05-27 | 2022-08-30 | 九江德福科技股份有限公司 | Preparation method and device of ultrathin flexible conductive composite film |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102877038B (en) | 2014-06-25 |
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