CN102790006B - 半导体结构及其制作方法 - Google Patents
半导体结构及其制作方法 Download PDFInfo
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- CN102790006B CN102790006B CN201110126832.4A CN201110126832A CN102790006B CN 102790006 B CN102790006 B CN 102790006B CN 201110126832 A CN201110126832 A CN 201110126832A CN 102790006 B CN102790006 B CN 102790006B
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CN201110126832.4A CN102790006B (zh) | 2011-05-17 | 2011-05-17 | 半导体结构及其制作方法 |
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CN201110126832.4A CN102790006B (zh) | 2011-05-17 | 2011-05-17 | 半导体结构及其制作方法 |
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CN102790006A CN102790006A (zh) | 2012-11-21 |
CN102790006B true CN102790006B (zh) | 2014-09-17 |
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CN201110126832.4A Active CN102790006B (zh) | 2011-05-17 | 2011-05-17 | 半导体结构及其制作方法 |
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Families Citing this family (1)
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CN116130405A (zh) * | 2021-11-13 | 2023-05-16 | 无锡华润上华科技有限公司 | 绝缘体上半导体结构及其制造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2010033813A2 (en) * | 2008-09-19 | 2010-03-25 | Amberwave System Corporation | Formation of devices by epitaxial layer overgrowth |
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US7777250B2 (en) * | 2006-03-24 | 2010-08-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lattice-mismatched semiconductor structures and related methods for device fabrication |
WO2008039534A2 (en) * | 2006-09-27 | 2008-04-03 | Amberwave Systems Corporation | Quantum tunneling devices and circuits with lattice- mismatched semiconductor structures |
US7799592B2 (en) * | 2006-09-27 | 2010-09-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Tri-gate field-effect transistors formed by aspect ratio trapping |
US8304805B2 (en) * | 2009-01-09 | 2012-11-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor diodes fabricated by aspect ratio trapping with coalesced films |
US9508890B2 (en) * | 2007-04-09 | 2016-11-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photovoltaics on silicon |
US8274097B2 (en) * | 2008-07-01 | 2012-09-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Reduction of edge effects from aspect ratio trapping |
US8981427B2 (en) * | 2008-07-15 | 2015-03-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Polishing of small composite semiconductor materials |
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WO2010033813A2 (en) * | 2008-09-19 | 2010-03-25 | Amberwave System Corporation | Formation of devices by epitaxial layer overgrowth |
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CN102790006A (zh) | 2012-11-21 |
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Owner name: BEIJING YANDONG MICROELECTRNIC CO.,LTD. Free format text: FORMER OWNER: INST OF MICROELECTRONICS, C. A. S Effective date: 20150717 |
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Effective date of registration: 20150717 Address after: 100015 Beijing city Chaoyang District Dongzhimen West eight room Wanhong No. 2 West Street Patentee after: Beijing Yandong Microelectronic Co., Ltd. Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee before: Institute of Microelectronics, Chinese Academy of Sciences |
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Address after: 100020 West eight rooms, dongzhimenwai, Chaoyang District, Beijing Patentee after: Beijing Yandong Microelectronic Co., Ltd. Address before: 100015 Beijing city Chaoyang District Dongzhimen West eight room Wanhong No. 2 West Street Patentee before: Beijing Yandong Microelectronic Co., Ltd. |
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