CN102736404A - Lithographic platemaking imposition process - Google Patents
Lithographic platemaking imposition process Download PDFInfo
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- CN102736404A CN102736404A CN2011100913497A CN201110091349A CN102736404A CN 102736404 A CN102736404 A CN 102736404A CN 2011100913497 A CN2011100913497 A CN 2011100913497A CN 201110091349 A CN201110091349 A CN 201110091349A CN 102736404 A CN102736404 A CN 102736404A
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- plate
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- making
- silver paste
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Abstract
Belonging to the field of anti-counterfeiting technologies, the invention provides a lithographic platemaking imposition process, which is characterized by comprising the following steps of: 1) employing a normal size lithography machine for platemaking; 2) imposing two plates on a magnet, which is in contact with the fronts of the plates; 3) coating a plate imposing seam with an electroconductive silver paste; 4) covering a protective film on the silver paste after drying, and then turning over and spreading the imposed plate, coating a front plate seam with the electroconductive silver paste and drying it; and 5) putting the imposed plate into an electroforming trough for electroforming. The process of the invention is characterized by simple technology, easy operation, avoidance of the use of large size lithography machines, and cost saving. The process provided in the invention can be employed to prepare large-size templates.
Description
Technical field
The invention belongs to field of anti-counterfeit technology, be specifically related to a kind of photoetching plate-making stone-hand skill.
Background technology
The template that the photoetching platemaking machine maximum that the holographic plate-making industry is generally used can only be made 50cm * 50cm; If make the holographic product of fabric width 1m; Need to use corresponding big version; Will realize through the big version litho machine of corresponding size, and big version litho machine costs an arm and a leg, threshold is high, technical requirement is high, not easy to operate.
Summary of the invention
The present invention provides a kind of photoetching plate-making stone-hand skill, and its technology is simple, and operation avoids adopting the large scale litho machine easily, has practiced thrift cost.
The following technical scheme of the concrete employing of the present invention:
A kind of photoetching plate-making stone-hand skill is characterized in that, in turn includes the following steps:
1) adopts common size litho machine plate-making;
2) two versions are spliced on magnet, magnet contacts with the front of version;
3) at version edge joint position coating electrically conductive silver slurry;
4) covered with protective film above that after the silver slurry drying will splice version tiling conversely, coating electrically conductive silver slurry and drying in the outer former seam then;
5) will splice version and put into the electrotyping bath electroforming.
Among the present invention, said conductive silver paste is processed by the component of following weight ratio:
Wherein the mean grain size of super fine silver powder is 300-500nm.
Said epoxy resin is that epoxy-ester is the epoxy resin of 0.40-0.5, and this resin is easy to obtain on market, and for example: the trade mark is the epoxy resin of E-44 or E-50.
Said monoethylene glycol can be by monoethylene glycol and ethanol and mixture replacing, and wherein, monoethylene glycol accounts for more than 50% of mixture quality.
Said polyethers silicone defoaming agent can be selected the commercial goods, and it plays the froth breaking effect in the silver slurry, can play the also alternative foam-breaking agent of the present invention of other foam-breaking agents of this effect.
Among the present invention, polyolefin-wax plays the sludge proof effect as antisettling agent.
The method for making of the present invention's silver slurry is: earlier epoxy resin, polyethers silicone defoaming agent are mixed, add the tetrahydrofuran dissolving, add silver powder, ethylenediamine, monoethylene glycol, polyolefin-wax then, stirring gets final product.
Adopt method of the present invention repeatedly layout can obtain bigger masterplate.
Compared with prior art, the invention has the beneficial effects as follows:
1) technology of the present invention is simple, and operation avoids adopting the large scale litho machine easily, has practiced thrift cost;
2) adopt method of the present invention, can prepare large-sized template.
Embodiment
1) conductive silver paste preparation (unit: weight portion)
It is subsequent use that above-mentioned raw materials obtains conductive silver paste according to the even mixing of technology.
2) layout technology
Adopt common size litho machine plate-making, obtain the template of 50 * 50cm; Two versions are spliced on magnet, and magnet contacts with the front of version; The edge joint position coating electrically conductive silver slurry at the version back side; Covered with protective film (like pressure sensitive adhesive tape) above that after the dorsal suture silver slurry drying will splice version tiling conversely, coating electrically conductive silver slurry and drying in the outer former seam then; To splice version and put into the electrotyping bath electroforming, obtain the template of 50 * 100cm.
Claims (4)
1. a photoetching plate-making stone-hand skill is characterized in that, in turn includes the following steps:
1) adopts common size litho machine plate-making;
2) two versions are spliced on magnet, magnet contacts with the front of version;
3) at version edge joint position coating electrically conductive silver slurry;
4) covered with protective film above that after the silver slurry drying will splice version tiling conversely, coating electrically conductive silver slurry and drying in the outer former seam then;
5) will splice version and put into the electrotyping bath electroforming.
3. photoetching plate-making stone-hand skill according to claim 2 is characterized in that the mean grain size of super fine silver powder is 300-500nm.
4. photoetching plate-making stone-hand skill according to claim 2 is characterized in that said epoxy resin is that epoxy-ester is the epoxy resin of 0.40-0.5.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2011100913497A CN102736404A (en) | 2011-04-13 | 2011-04-13 | Lithographic platemaking imposition process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2011100913497A CN102736404A (en) | 2011-04-13 | 2011-04-13 | Lithographic platemaking imposition process |
Publications (1)
Publication Number | Publication Date |
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CN102736404A true CN102736404A (en) | 2012-10-17 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN2011100913497A Pending CN102736404A (en) | 2011-04-13 | 2011-04-13 | Lithographic platemaking imposition process |
Country Status (1)
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CN (1) | CN102736404A (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101215450A (en) * | 2008-01-08 | 2008-07-09 | 上海大学 | Conductive adhesive added with short rod type nano silver powder and preparation method thereof |
CN201587164U (en) * | 2009-10-20 | 2010-09-22 | 绍兴京华激光材料科技有限公司 | Large-area holographic nickel plate consisting of spliced unit nickel plates |
CN102009517A (en) * | 2010-09-20 | 2011-04-13 | 苏州苏大维格光电科技股份有限公司 | Method for making metal mother board |
-
2011
- 2011-04-13 CN CN2011100913497A patent/CN102736404A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101215450A (en) * | 2008-01-08 | 2008-07-09 | 上海大学 | Conductive adhesive added with short rod type nano silver powder and preparation method thereof |
CN201587164U (en) * | 2009-10-20 | 2010-09-22 | 绍兴京华激光材料科技有限公司 | Large-area holographic nickel plate consisting of spliced unit nickel plates |
CN102009517A (en) * | 2010-09-20 | 2011-04-13 | 苏州苏大维格光电科技股份有限公司 | Method for making metal mother board |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20121017 |
|
RJ01 | Rejection of invention patent application after publication |