CN102732881A - Preparation method of coated article and coated article prepared by it - Google Patents

Preparation method of coated article and coated article prepared by it Download PDF

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Publication number
CN102732881A
CN102732881A CN2011100913571A CN201110091357A CN102732881A CN 102732881 A CN102732881 A CN 102732881A CN 2011100913571 A CN2011100913571 A CN 2011100913571A CN 201110091357 A CN201110091357 A CN 201110091357A CN 102732881 A CN102732881 A CN 102732881A
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CN
China
Prior art keywords
color layer
base material
plated film
preparation
tin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011100913571A
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Chinese (zh)
Inventor
张新倍
陈文荣
蒋焕梧
陈正士
戴龙文
林顺茂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
Original Assignee
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Hongfujin Precision Industry Shenzhen Co Ltd, Hon Hai Precision Industry Co Ltd filed Critical Hongfujin Precision Industry Shenzhen Co Ltd
Priority to CN2011100913571A priority Critical patent/CN102732881A/en
Publication of CN102732881A publication Critical patent/CN102732881A/en
Pending legal-status Critical Current

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Abstract

The invention provides a preparation method of a coated article, and the method comprises the following steps of: providing a transparent glass substrate; depositing metallic tin on the surface of the glass substrate by a sputtering method, and controlling the temperature of the glass substrate at 230-300DEG C during sputtering; conducting thermal oxidation treatment on the metallic tin at the surface of the glass substrate to form tin oxide; continuing adopting the sputtering method to deposit alumina on the surface of the treated substrate, with a composite film layer of the tin oxide and the alumina forming a color layer, which is found to present a white color by observing through the transparent substrate. The preparation method of a coated article of the invention is stable, reliable and environment friendly. The invention also provides a coated article prepared by the method.

Description

The preparation method of plated film spare and plated film spare obtained by this method
Technical field
The present invention relates to a kind of preparation method and plated film spare obtained by this method of plated film spare.
Background technology
For the shell that makes electronic installation has rich colors, main at present through prepared decorative coveringns such as anodic oxidation, baking vanish, porcelains.Compare these traditional technologys, the environmental protection more of PVD coating technique, and adopt the PVD coating technique to form decorative colour layer on the product casing surface with metal-like.
Yet in the prior art, utilize the PVD coating technique very limited in the color of the rete of case surface formation, the PVD rete that can extensively prepare and use at present is mainly colour systems such as golden yellow, black, blueness.White is as a kind of color of classics, and industry is difficult at present obtains through the PVD coating technique, thereby to utilize the PVD coating technique to obtain stable white film be the focus of industry research always.
Summary of the invention
In view of this, be necessary to provide a kind of preparation method of PVD plated film spare of white.
In addition, also be necessary to provide a kind of by the prepared plated film spare of aforesaid method.
A kind of preparation method of plated film spare, it comprises the steps:
Transparent glass baseplate is provided;
Adopt the surface deposition metallic tin of sputtering method at this glass baseplate, the glass baseplate temperature is 230 ~ 300 ℃ during sputter;
Metallic tin to the glass baseplate surface carries out thermal oxidative treatment formation White tin oxide;
Continue to adopt the surface deposition aluminum oxide of sputtering method at White tin oxide; The composite film that said White tin oxide and aluminum oxide form forms a color layer; This color layer sees through L* coordinate that said base material shows in CIE Lab colour system between 80 to 89; The a* coordinate is between-0.5 to 0.5, and the b* coordinate is between-0.5 to 0.5.
A kind of plated film spare; It comprises base material and is formed at the color layer on base material one surface; This base material is transparent glass, and this color layer is the composite film that White tin oxide and aluminum oxide are formed, and this color layer sees through L* coordinate that said base material shows in CIE Lab colour system between 80 to 89; The a* coordinate is between-0.5 to 0.5, and the b* coordinate is between-0.5 to 0.5.
The preparation method of plated film spare according to the invention earlier in the substrate surface deposit tin, carries out the White tin oxide that thermal oxidative treatment obtains into the Nano microsphere state to sedimentary tin then when forming color layer; Sputtering sedimentation aluminum oxide again, thus on transparent base material, prepare color layer, this color layer stable performance; Observe said color layer through transparent base material and present white; Make said plated film spare present white appearance, enriched the color of vacuum coating, improved the outward appearance competitive power of product; And the color of said color layer sees through transparent base material and shows, the wearing and tearing scraping of color layer can effectively be avoided usually as internal surface in the surface that is formed with color layer during use.Preparing method's technology of said color layer is simple, easy handling, environmental protection.
Description of drawings
Fig. 1 is the sectional view of the present invention's one preferred embodiment plated film spare;
Fig. 2 is the schematic top plan view of the present invention's one preferred embodiment vacuum plating unit.
The main element nomenclature
Plated film spare 10
Base material 11
Color layer 13
Vacuum plating unit 20
Coating chamber 21
The tin target 23
The aluminium target 24
Track 25
Vacuum pump 30
Following embodiment will combine above-mentioned accompanying drawing to further specify the present invention.
Embodiment
The preparation method of the plated film spare 10 (as shown in Figure 1) of the present invention's one preferred embodiments comprises the steps:
Base material 11 is provided, and this base material 11 is transparent glass.
Pre-treatment is carried out on surface to base material 11.Said pre-treatment step comprises: conventional removing oil-removing wax, re-use deionized water base material 11 sprayed, after spray finishes with base material 11 dry for standby.
In conjunction with consulting Fig. 2, a vacuum plating unit 20 is provided, this vacuum plating unit 20 comprises a coating chamber 21 and is connected in a vacuum pump 30 of coating chamber 21 that vacuum pump 30 is in order to vacuumize coating chamber 21.The two aluminium targets 24 that are provided with pivoted frame (not shown), the two tin targets 23 that are oppositely arranged in this coating chamber 21 and are oppositely arranged.Pivoted frame drives base material 11 along 25 revolution of circular track, and base material 11 also rotation along track 25 revolution the time.
Adopt sputtering method at surface deposition metallic tin through pretreated base material 11.Base material 11 is fixed on the pivoted frame in the coating chamber 21, and setting the pivoted frame rotating speed is 3 commentaries on classics/min, and coating chamber 21 is evacuated to 1 * 10 -3Pa, it is 230 ~ 300 ℃ that heating coating chamber 21 makes the temperature of base material 11; The feeding argon gas is a working gas, and the flow of argon gas is 100 ~ 500sccm; The power of opening and set tin target 23 is 5 ~ 12kW, the bias voltage that puts on base material 11 is-30 ~-50V, depositing time is 5 ~ 20min.Because the temperature of base material 11 reaches more than the fusing point of metallic tin, thereby the tin that are deposited on base material 11 surfaces are the fused liquid tin; And because liquid tin and base material 11 wetting of surfaces angles big (greater than 130 °), thereby liquid tin can not be uniform liquid tin film at the surface spreading of base material 11, but forms a lot of individual Nano microspheres at base material 11.
Stop to feed argon gas, close target and bias voltage, base material 11 surperficial metallic tins are carried out thermal oxidative treatment to form White tin oxide.Aerating oxygen in coating chamber 21, the flow 100 ~ 500sccm of oxygen, keeping the temperature of base material 11 is 230 ~ 300 ℃, the treatment time is 10 ~ 40min.This thermal oxidative treatment makes liquid tin be oxidized to White tin oxide, and this White tin oxide also is the Nano microsphere shape.
Continue to adopt sputtering method in the surface deposition aluminum oxide of said White tin oxide, the composite film that said White tin oxide and aluminum oxide constitute forms color layer 13.Setting coating chamber 21 temperature is 120 ~ 180 ℃, feeds the working gas argon gas, and the flow of argon gas is 100 ~ 500sccm; Feed reactant gases oxygen, the flow of oxygen is 50 ~ 100sccm, and the power of opening and set aluminium target 24 is 5 ~ 12kW, the bias voltage that puts on base material 11 is-50 ~-100V, depositing time is 20 ~ 40min.
After plated film finished, cooling back vacuum breaker took out said plated film spare 10.
The thickness of said color layer 13 is 0.2 ~ 1.0 μ m.This color layer 13 sees through said transparent base material 11 observations and presents white.This color layer 13 sees through L* coordinate that said base material 11 shown in CIE Lab colour system between 80 to 89; The a* coordinate is between-0.5 to 0.5, and the b* coordinate is test color difference (the surperficial alignment light source that promptly base material 11 is not formed with color layer 13 is carried out the value of chromatism test) between-0.5 to 0.5.
Please consult Fig. 1 again, comprise base material 11 and be formed at the color layer 13 on base material 11 1 surface that by the prepared plated film spare 10 of aforesaid method this color layer 13 be the composite film of White tin oxide and aluminum oxide composition.The thickness of this color layer 13 is 0.2 ~ 1.0 μ m.
This base material 11 is transparent glass.This color layer 13 sees through said base material 11 and presents white; The result that this color layer 13 sees through said base material 11 test color differences is: the L* coordinate of CIE Lab colour system is between 80 to 89; The a* coordinate is between-0.5 to 0.5, and the b* coordinate is between-0.5 to 0.5.
Come the present invention is specified through embodiment below.
Embodiment 1
The employed vacuum plating unit 20 of present embodiment is a magnetron sputtering coater.
Metal refining tin: the temperature of base material 11 is 230 ℃, and argon flow amount is 100sccm; The power of tin target 23 is 11kW, and the bias voltage that puts on base material 11 is-30V that depositing time is 20min.
The thermal oxidative treatment metallic tin is to form White tin oxide: oxygen flow 500sccm, and the temperature of base material 11 is 230 ℃, the treatment time is 20min.
Deposition of aluminium oxide: the temperature of base material 11 is 120 ℃, and the flow of argon gas is 100sccm; The flow of oxygen is 50sccm, and the power of aluminium target 24 is 5kW, and the bias voltage that puts on base material 11 is-50V that depositing time is 40min.
The thickness of color layer 13 is 500nm in the present embodiment.The result that this color layer 13 sees through said base material 11 test color differences is: the L* coordinate is 83, and the a* coordinate is-0.3, and the b* coordinate is 0.5.
Embodiment 2
Metal refining tin: the temperature of base material 11 is 300 ℃, and argon flow amount is 500sccm; The power of tin target 23 is 5kW, and the bias voltage that puts on base material 11 is-50V that depositing time is 5min.
The thermal oxidative treatment metallic tin is to form White tin oxide: oxygen flow 100sccm, and the temperature of base material 11 is 250 ℃, the treatment time is 10min.
Deposition of aluminium oxide: the temperature of base material 11 is 180 ℃, and the flow of argon gas is 500sccm; The flow of oxygen is 100sccm, and the power of aluminium target 24 is 11kW, and the bias voltage that puts on base material 11 is-100V that depositing time is 20min.
The thickness of color layer 13 is 680nm in the present embodiment.The result that this color layer 13 sees through said base material 11 test color differences is: the L* coordinate is 88, and the a* coordinate is 0.1, and the b* coordinate is-0.4.
The preparation method of plated film spare 10 according to the invention is when forming color layer 13; At base material 11 surface deposition tin, then sedimentary tin is carried out the White tin oxide that thermal oxidative treatment obtains into the Nano microsphere state, again the sputtering sedimentation aluminum oxide earlier; Thereby on transparent base material 11, prepare color layer 13; These color layer 13 stable performances see through the said color layer 13 of transparent base material 11 observations and present white, make said plated film spare 10 present white appearance; Enrich the color of vacuum coating, improved the outward appearance competitive power of product; And the color of said color layer 13 sees through transparent base material 11 and shows, the wearing and tearing scraping of color layer 13 can effectively be avoided usually as internal surface in the surface that is formed with color layer 13 during use.Preparing method's technology of said color layer 13 is simple, easy handling, environmental protection.

Claims (10)

1. the preparation method of a plated film spare, it comprises the steps:
Transparent glass baseplate is provided;
Adopt the surface deposition metallic tin of sputtering method at this glass baseplate, the glass baseplate temperature is 230 ~ 300 ℃ during sputter;
Metallic tin to the glass baseplate surface carries out thermal oxidative treatment formation White tin oxide;
Continue to adopt the surface deposition aluminum oxide of sputtering method at White tin oxide; The composite film that said White tin oxide and aluminum oxide form forms a color layer; This color layer sees through L* coordinate that said glass baseplate shows in CIE Lab colour system between 80 to 89; The a* coordinate is between-0.5 to 0.5, and the b* coordinate is between-0.5 to 0.5.
2. the preparation method of plated film spare as claimed in claim 1 is characterized in that: this color layer sees through said transparent glass baseplate observation and presents white.
3. the preparation method of plated film spare as claimed in claim 1; It is characterized in that: the concrete processing parameter of the step of said metal refining tin is: be working gas with the argon gas; Argon flow amount is 100 ~ 500sccm, uses the tin target, and the power of tin target is 5 ~ 12kW; The bias voltage that puts on glass baseplate is-30 ~-50V, sputtering time is 5 ~ 20min.
4. the preparation method of plated film spare as claimed in claim 1 is characterized in that: the concrete processing parameter of the step of said thermal oxidative treatment is: the flow 100 ~ 500sccm of oxygen, and the temperature of glass baseplate is 230 ~ 300 ℃, the treatment time is 10 ~ 40min.
5. the preparation method of plated film spare as claimed in claim 1 is characterized in that: the White tin oxide that said thermal oxidative treatment forms is the Nano microsphere shape.
6. the preparation method of plated film spare as claimed in claim 1 is characterized in that: the concrete processing parameter of the step of said deposition of aluminium oxide is: be working gas with the argon gas, argon flow amount is 100 ~ 500sccm; With oxygen is reactant gases, and oxygen flow is 50 ~ 100sccm; Use the aluminium target, the power of aluminium target is 5 ~ 12kW, the bias voltage that puts on glass baseplate is-50 ~-100V, sputter temperature is 120 ~ 180 ℃, sputtering time is 20 ~ 40min.
7. the preparation method of plated film spare as claimed in claim 1 is characterized in that: the thickness of said color layer is 0.2 ~ 1.0 μ m.
8. plated film spare; It comprises base material and is formed at the color layer on base material one surface; It is characterized in that: this base material is transparent glass, and this color layer is the composite film that White tin oxide and aluminum oxide are formed, and this color layer sees through L* coordinate that said base material shows in CIE Lab colour system between 80 to 89; The a* coordinate is between-0.5 to 0.5, and the b* coordinate is between-0.5 to 0.5.
9. plated film spare as claimed in claim 8 is characterized in that: observe said color layer through said base material and present white.
10. plated film spare as claimed in claim 8 is characterized in that: the thickness of said color layer is 0.2 ~ 1.0 μ m.
CN2011100913571A 2011-04-13 2011-04-13 Preparation method of coated article and coated article prepared by it Pending CN102732881A (en)

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Application Number Priority Date Filing Date Title
CN2011100913571A CN102732881A (en) 2011-04-13 2011-04-13 Preparation method of coated article and coated article prepared by it

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113410365A (en) * 2021-07-01 2021-09-17 山西中科潞安紫外光电科技有限公司 Deep ultraviolet LED chip of p-AlGaN epitaxial substrate and preparation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101054268A (en) * 2007-05-24 2007-10-17 卢秀强 Coating glass with function of sunlight control low radiation, ultraviolet radiation stopping and photocatalysis sterilization, and preparation method thereof
US20070287028A1 (en) * 2006-06-09 2007-12-13 Wilfried Hedderich Self-illuminating glazing panels
CN101104513A (en) * 2006-07-12 2008-01-16 清华大学 Growth method for single-wall carbon nano-tube

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070287028A1 (en) * 2006-06-09 2007-12-13 Wilfried Hedderich Self-illuminating glazing panels
CN101104513A (en) * 2006-07-12 2008-01-16 清华大学 Growth method for single-wall carbon nano-tube
CN101054268A (en) * 2007-05-24 2007-10-17 卢秀强 Coating glass with function of sunlight control low radiation, ultraviolet radiation stopping and photocatalysis sterilization, and preparation method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113410365A (en) * 2021-07-01 2021-09-17 山西中科潞安紫外光电科技有限公司 Deep ultraviolet LED chip of p-AlGaN epitaxial substrate and preparation method thereof
CN113410365B (en) * 2021-07-01 2023-11-24 山西中科潞安紫外光电科技有限公司 Deep ultraviolet LED chip of p-AlGaN epitaxial substrate and preparation method thereof

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Application publication date: 20121017