201231295 六、發明說明： 【發明所屬之技術領域】 [0001] 本發明涉及一種殼體及其製作方法，尤其涉及一種具有 黃褐色外觀的殼體及其製作方法。 [0002] 【先前技術】 為了使電子裝置的外殼具有豐富色彩，目前主要藉由陽 極氧化、烤漆、烤瓷等工藝製備裝飾性塗層。相比該等 傳統工藝’ PVD鍍膜技術更加綠色環保，且採用PVD鍍膜 ❹ 技術可在產品外殼表面形成具有金屬質感的裝飾性色彩 層。 [0003] 然，習知技術中，利用PVD鍍膜技術於殼體表面形成的膜 層的色彩非常有限，目前能夠廣泛製備和使用的PVD膜層 主要為金育色、黑色、白色等色系，能夠穩定生產的顏 色更係少之又少。 [0004] G 【發明内容】 有鑒於此，本發明提供-種藉由鮮以鑛勝形成黃褐色外觀 的殼體。 [0005] 另外，本發明還提供一種上述殼體的製作方法。 [0006] 一種殼體’包括一色彩層’該色彩層由氮氧鋁化合物組 成’該色彩層中紹元素的品質百分含量為45%~5〇%，氧元 素品質百分含量為40%〜45%，氮元素品質百分含量為 1〇%~15% ’該色彩層呈現的色度區域於CIE LAB表色系統 的L*座標介於28至35之間，a*座標介於4至6之間，b木座 標介於9至11之間。 100103198 表單編號AG1Q1 第3頁/共12頁 1002005658-0 201231295 [0007] —種殼體的製作方法，其包括如下步驟： [0008] 提供基體； [0009] 以鋁為靶材，於基體上濺射由鋁金屬組成的打底層； [〇〇1〇] 以鋁為靶材，以氧氣和氮氣為反應氣體，於打底層上濺 射由氮氧铭化合物組成的過渡層； [0011] 以鋁為靶材，以氧氣和氮氣為反應氣體，於打底層上濺 射由氮氧铭化合物組成的色彩層，該色彩層中紹元素的 品質百分含量為45%~50%，氧元素品質百分含量為 40%〜45%，氮元素品質百分含量為10%~15%，該色彩層呈 現的色度區域於CIE LAB表色系統的L*座標介於28至35 之間，a*座標介於4至6之間，b*座標介於9至11之間。 [0012] 相較於習知技術，所述殼體的製備方法在形成所述色彩 層時，藉由對把材的選取、反應氣體氧氣和氮氣流量的 設計和濺射時間的控制，從而達到使色彩層呈現黃褐色 的目的，以該方法所製得的殼體呈現出真空鍍膜難以獲 得的黃褐色外觀，豐富了真空鍍膜層的顏色，提高了產 品的外觀競爭力。 【實施方式】 [0013] 請參閱圖1，本發明較佳實施例的殼體10包括基體11、形 成於基體11上打底層12、形成於打底層12上的過渡層13 及形成於過渡層13上的色彩層14。該色彩層14肉眼直觀 呈黃褐色。 [0014] 基體11的材質可為不銹鋼、玻璃、陶瓷及塑膠中的一種 100103198 表單編號A0101 第4頁/共12頁 1002005658-0 201231295 [0015] [0016] [0017] Ο [0018] ❹ [0019] [0020] [0021] [0022] 該打底層12為鋁金屬層’其厚度大約為0. 1〜〇. 2微米， 打底層11用於提高後續塗層的結合力。 該過渡層13由氮氧铭化合物（ΑίοΝ)組成。過渡層13中 紹元素品質百分含量為60%〜65%，氣元素品質百分含量 為30%〜35% ’氣元素品質百分含量為5%〜1〇%。過渡層 13的厚度大約為0.2〜0.6微米。該過渡層13用於更好的 提高色彩層14的結合力。 所述色於層14由氮氧銘化合物（μ⑽）組成。不同於過 渡層13的是，色彩層14中鋁元素的品質百分含量為 45%〜5〇%，氧元素品質百貪含量為4〇%~45%，氮元素品質 百分含量為10%〜15%。該色彩層14肉眼直觀呈現黃褐色 ，其呈現的色度區域於CIE LAB表色系統的L*座標介於 28至35之間’ a*座標介於4至6之間，b木座標介於9至11 之間。色彩層14的厚度可為0. 4~i. 2 jwm。 所述打底層12、過渡層13灰1_層14可分別藉由磁控濺 射方法形成。 上述殼體10的製作方法，包括以下步驟： 提供一基體11。基體11的材質可為不銹鋼、玻璃、陶竟 及塑膠中的一種。 將基體11放入無水乙醇中進行超聲波清洗，以除去基體 11表面的雜質和油污等，清洗完畢後烘乾備用。 請結合參閱圖2，提供一磁控濺射設備1，磁控濺射設備1 可為一中頻磁控濺射設備，其包括一真空室2、用以對真 100103198 表單編號A0101 第5頁/共12頁 1002005658-0 201231295 空室2抽真空的真空泵3以及與真空室2相通的氣源通道7 。該真空室2内設有轉架4及多對相對設置的鋁靶5。轉架 4帶動基體11做圓周運行，並且從每對相對設置的鋁乾5 之間穿過。基體11在隨轉架4運行的同時也進行自轉。鍍 膜時，濺射氣體與反應氣體經由氣源通道7進入真空室2 〇 [0023] 在基體11上濺射該打底層12。將經上述清洗的基體丨丨放 置於磁控濺射設備1的轉架4上，對真空室2抽真空至7 〇χ 10 3〜9. 0x1 0_3Pa後通入濺射氣體氬氣，氬氣流量為 150~200sccm (標準狀態毫升/分鐘），基體丨丨施加偏壓 至-150 — 250V，開啟鋁靶5，鋁靶5的功率〜l〇kW， 調節真空室2内溫度為1〇〇〜150T：，占空比為40%〜60%， 設置所述轉架4的轉速為〇. 5〜1. 〇rpm (revolution per minute，轉/分鐘）對基體11濺射5〜1〇分鐘，以於 基體11表面形成所述由鋁金屬形成的打底層12。 [0024] 接著在打底層12上濺射該過渡層13。該步驟中，可保持 基體11偏壓、轉架4轉速、鋁靶5功率及氬氣流量不變。 持續向真空室2通入氮氣和氧氣，控制氮氣的流量在 5〜15sccm之間，氧氣的流量在5〜15sccm之間，濺射10 〜30min，以在打底層12上沉積該過渡層13。 [0025] 然後在過渡層1 3上減;鑛該色彩層14。該步驟中，可仍然 保持基體11偏壓、轉架4轉速、鋁靶5功率及氬氣流量不 變。將氮氣流量調高至18〜2 3sccm之間，將氧氣流量調 高至18〜23sccm之間’在過渡層13上沉積該色彩層14。 濺射達20分鐘時色彩層14的顏色即可穩定在所述色度區 100103198 表單編號A0101 第6頁/共12頁 1002005658-0 201231295 [0026] [0027] [0028] Ο [0029] 〇 [0030] [0031] 域，但沉積時間過長，使得色彩層14太厚將降低色彩層 14的附著力，因此，滅射時間一般為20〜60min。 除上述較佳實施例限定的各參數範圍内，改變所述色彩 層14的沉積過程中通入氮氣和氧氣的流量來改變色彩層 14中鋁、氧及氮元素的品質百分含量，可以得到色差值 差異不大的色彩層14,具體參數參見表2。 表2 實 靶 鴿 轉架 占 1氣 氡氣 顏色層 鍍顏 色彩層色差 施 材 壓 轉速 空 流量 流量 色層 值 例 功 V r/min 比 seem scan A1 0 N 時間 L A B 率 % wt% wt% wt% min kW 1 8 -200 0.5 50 18 18 50 40 10 20 33 5 10 2 δ -200 0.5 50 20 20 46 42 12 30 32 5 9 3 8 -200 0.5 50 22 22 45 42 13 60 31 6 10 本發明殼體10可為筆記型電腦、個人數位助理等電子裝 置的殼體，或為其他裝飾類產品的殼體。 所述殼體10的製備方法在濺射形成色彩層14時，藉由對 靶材的選取，同時對反應氣體氧氣和氮氣流量的設計和 濺射時間的控制，從而達到使色彩層14呈現穩定的黃褐 色的目的。以該方法所製得的殼體10呈現出真空鍍膜難 以獲得的黃褐色的外觀，豐富了真空鍍膜層的顏色，極 大地提高了產品的外觀競爭力。 可以理解，所述打底層12及過渡層13也可以省略，此時 100103198 表單編號A0101 第7頁/共12頁 1002005658-0 201231295 ，該色彩層14可直接形成於基體11的表面上。 【圖式簡單說明】 [0032] 圖1係本發明一較佳實施例殼體的剖視圖。 [0033] 圖2係圖1所示殼體的製作過程中所用磁控濺射設備的結 構示意圖。 【主要元件符號說明】 [0034] 殼體：10 [0035] 基體：11 [0036] 打底層：12 [0037] 過渡層：13 [0038] 色彩層：14 [0039] 磁控濺射設備：1 [0040] 真空室：2 [0041] 真空泵：3 [0042] 轉架：4 [0043] 鋁靶：5 [0044] 氣源通道：7 1002005658-0 100103198 表單編號A0101 第8頁/共12頁201231295 VI. Description of the Invention: [Technical Field] [0001] The present invention relates to a housing and a method of fabricating the same, and more particularly to a housing having a yellow-brown appearance and a method of fabricating the same. [Prior Art] In order to make the outer casing of the electronic device rich in color, a decorative coating is mainly prepared by processes such as anodic oxidation, baking varnish, and porcelain. Compared to these traditional processes, PVD coating technology is more environmentally friendly, and PVD coating ❹ technology can form a metallic color decorative layer on the surface of the product casing. [0003] However, in the prior art, the color of the film layer formed on the surface of the casing by using the PVD coating technology is very limited, and the PVD film layer which can be widely prepared and used at present is mainly a color system of gold coloring, black color, white color, etc. The color that can be stably produced is less and less. [0004] In view of the above, the present invention provides a housing which is formed by a fresh-to-mine form to form a yellow-brown appearance. In addition, the present invention also provides a method of fabricating the above casing. [0006] A housing 'comprising a color layer' is composed of an aluminum oxynitride compound. The color percentage of the element in the color layer is 45% to 5%, and the oxygen element content is 40%. ~45%, the percentage of nitrogen element quality is 1〇%~15%' The color area of the color layer is between 28 and 35, and the a* coordinate is between 4 and 35 in the CIE LAB color system. Between 6 and 6, the wooden coordinates are between 9 and 11. 100103198 Form No. AG1Q1 Page 3 of 12 1002005658-0 201231295 [0007] A method of manufacturing a housing, comprising the steps of: [0008] providing a substrate; [0009] using aluminum as a target, splashing on the substrate Shooting a bottom layer composed of aluminum metal; [〇〇1〇] using aluminum as a target, using oxygen and nitrogen as reaction gases, sputtering a transition layer composed of nitrogen oxide compounds on the underlying layer; [0011] As a target material, oxygen and nitrogen are used as reaction gases, and a color layer composed of nitrogen oxide compound is sputtered on the underlying layer. The color percentage of the element in the color layer is 45% to 50%, and the oxygen element quality is 100%. The content of the fraction is 40%~45%, and the percentage of nitrogen element content is 10%~15%. The color region of the color layer is between 28 and 35 in the C* LAB color system, a* The coordinates are between 4 and 6, and the b* coordinates are between 9 and 11. [0012] Compared with the prior art, the method for preparing the casing achieves the selection of the material, the design of the reaction gas oxygen and nitrogen flow rate, and the sputtering time during the formation of the color layer. The color layer is yellow-brown, and the shell obtained by the method exhibits a yellow-brown appearance which is difficult to obtain by vacuum coating, enriches the color of the vacuum coating layer, and improves the appearance competitiveness of the product. [0013] Referring to FIG. 1 , a housing 10 according to a preferred embodiment of the present invention includes a base 11 , a base layer 12 formed on the base 11 , a transition layer 13 formed on the primer layer 12 , and a transition layer formed on the base layer 12 . The color layer 14 on 13. The color layer 14 is visually yellowish brown. [0014] The material of the base 11 may be one of stainless steel, glass, ceramic, and plastic. 100103198 Form No. A0101 Page 4 / Total 12 Pages 1002005658-0 201231295 [0016] [0017] Ο [0018] ❹ [0019] [0022] The underlayer 12 is an aluminum metal layer having a thickness of about 0.1 to 2 micrometers, and the primer layer 11 is used to improve the adhesion of the subsequent coating. The transition layer 13 is composed of a nitrogen oxide compound (ΑίοΝ). The percentage of the elemental quality in the transition layer 13 is 60% to 65%, and the percentage of the quality of the gas element is 30% to 35%. The percentage of the quality of the gas element is 5% to 1%. The thickness of the transition layer 13 is approximately 0.2 to 0.6 μm. This transition layer 13 serves to better enhance the bonding force of the color layer 14. The color layer 14 is composed of a nitroxide compound (μ(10)). Different from the transition layer 13, the color percentage of the aluminum element in the color layer 14 is 45%~5〇%, the oxygen element quality is 100% 45% to 45%, and the nitrogen element quality percentage is 10%. ~15%. The color layer 14 is visually yellowish in color and exhibits a chromaticity region between the L* coordinates of the CIE LAB color system between 28 and 35' a* coordinates between 4 and 6, with b-coordinates between Between 9 and 11. The thickness of the color layer 14 may be 0. 4~i. 2 jwm. The primer layer 12, the transition layer 13 ash 1_layer 14 can be formed by a magnetron sputtering method, respectively. The manufacturing method of the housing 10 includes the following steps: A base 11 is provided. The material of the base 11 may be one of stainless steel, glass, ceramic and plastic. The substrate 11 is placed in absolute ethanol for ultrasonic cleaning to remove impurities and oil stains on the surface of the substrate 11, and after drying, it is dried for use. Referring to FIG. 2, a magnetron sputtering apparatus 1 is provided. The magnetron sputtering apparatus 1 can be an intermediate frequency magnetron sputtering apparatus including a vacuum chamber 2 for authenticating 100103198 Form No. A0101 Page 5 / Total 12 pages 1002005658-0 201231295 Empty chamber 2 vacuum pump 3 and air source passage 7 communicating with vacuum chamber 2. The vacuum chamber 2 is provided with a turret 4 and a plurality of pairs of oppositely disposed aluminum targets 5. The turret 4 drives the base body 11 to perform circumferential operation and passes between each pair of oppositely disposed aluminum lads 5. The base body 11 also rotates while running along with the turret 4. At the time of plating, the sputtering gas and the reaction gas enter the vacuum chamber 2 via the gas source passage 7 [0023] The primer layer 12 is sputtered on the substrate 11. The substrate 丨丨 which has been cleaned above is placed on the turret 4 of the magnetron sputtering apparatus 1, and the vacuum chamber 2 is evacuated to 7 〇χ 10 3 to 9. 0x1 0_3Pa and then argon gas is sputtered, argon gas. The flow rate is 150~200sccm (standard state cc/min), the substrate 丨丨 is biased to -150-250V, the aluminum target 5 is turned on, the power of the aluminum target 5 is ~1〇kW, and the temperature in the vacuum chamber 2 is adjusted to 1〇〇. ~150T:, the duty ratio is 40%~60%, set the rotation speed of the turret 4 to 〇. 5~1. 〇rpm (revolution per minute, rpm) to the substrate 11 for 5~1〇 minutes The underlayer 12 formed of aluminum metal is formed on the surface of the substrate 11. [0024] The transition layer 13 is then sputtered on the underlying layer 12. In this step, the bias of the base 11 , the rotational speed of the turret 4, the power of the aluminum target 5, and the flow rate of the argon gas can be maintained. Nitrogen and oxygen are continuously supplied to the vacuum chamber 2, the flow rate of the nitrogen gas is controlled to be between 5 and 15 sccm, the flow rate of oxygen is between 5 and 15 sccm, and sputtering is performed for 10 to 30 minutes to deposit the transition layer 13 on the primer layer 12. [0025] Then subtracted from the transition layer 13; the color layer 14 is mined. In this step, the substrate 11 bias, the turret 4 rotational speed, the aluminum target 5 power, and the argon flow rate are maintained. The flow rate of nitrogen gas was raised to between 18 and 2 3 sccm, and the flow rate of oxygen was increased to between 18 and 23 sccm. The color layer 14 was deposited on the transition layer 13. The color of the color layer 14 can be stabilized in the chromaticity area 100103198 when sputtered for 20 minutes. Form No. A0101 Page 6 / Total 12 Page 1002005658-0 201231295 [0026] [0028] [0029] 〇 [0029] 0030] [0031] The domain, but the deposition time is too long, so that the color layer 14 is too thick to reduce the adhesion of the color layer 14, and therefore, the firing time is generally 20 to 60 min. In addition to changing the flow rate of nitrogen and oxygen during the deposition of the color layer 14 to change the mass percentage of aluminum, oxygen and nitrogen in the color layer 14 in addition to the parameters defined in the above preferred embodiment, The color layer 14 has a small difference in color difference, and the specific parameters are shown in Table 2. Table 2 Real target pigeons framed by 1 gas xenon color layer plating color layer color difference material pressure speed air flow flow color layer value example work V r / min ratio see scan A1 0 N time LAB rate % wt% wt% wt % min kW 1 8 -200 0.5 50 18 18 50 40 10 20 33 5 10 2 δ -200 0.5 50 20 20 46 42 12 30 32 5 9 3 8 -200 0.5 50 22 22 45 42 13 60 31 6 10 The housing 10 can be a housing of an electronic device such as a notebook computer or a personal digital assistant, or a housing for other decorative products. The method for preparing the casing 10 achieves the stability of the color layer 14 by selecting the target, simultaneously controlling the flow rate of the oxygen gas and the nitrogen gas of the reaction gas, and controlling the sputtering time when the color layer 14 is formed by sputtering. The purpose of the tan. The casing 10 produced by this method exhibits a yellow-brown appearance which is difficult to obtain by vacuum coating, enriches the color of the vacuum coating layer, and greatly enhances the appearance competitiveness of the product. It can be understood that the underlayer 12 and the transition layer 13 can also be omitted. In this case, the color layer 14 can be directly formed on the surface of the substrate 11 in the form of the table number A0101, page 7 / page 12, 1002005658-0 201231295. BRIEF DESCRIPTION OF THE DRAWINGS [0032] FIG. 1 is a cross-sectional view of a housing in accordance with a preferred embodiment of the present invention. 2 is a schematic view showing the structure of a magnetron sputtering apparatus used in the process of manufacturing the casing shown in FIG. 1. [Main component symbol description] [0034] Housing: 10 [0035] Base: 11 [0036] Flooring: 12 [0037] Transition layer: 13 [0038] Color layer: 14 [0039] Magnetron sputtering equipment: 1 [0040] Vacuum chamber: 2 [0041] Vacuum pump: 3 [0042] Reactor: 4 [0043] Aluminum target: 5 [0044] Air source channel: 7 1002005658-0 100103198 Form number A0101 Page 8 of 12