CN102707585A - Photoresist recovery system - Google Patents
Photoresist recovery system Download PDFInfo
- Publication number
- CN102707585A CN102707585A CN2011103821425A CN201110382142A CN102707585A CN 102707585 A CN102707585 A CN 102707585A CN 2011103821425 A CN2011103821425 A CN 2011103821425A CN 201110382142 A CN201110382142 A CN 201110382142A CN 102707585 A CN102707585 A CN 102707585A
- Authority
- CN
- China
- Prior art keywords
- photoresist
- storage tank
- whirl coating
- substrate
- coating storage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
Abstract
The invention provides a photoresist recovery system, and belongs to the field of color film substrate and array substrate manufacture. The photoresist recovery system comprises a substrate chassis and a top cover thereof, a substrate rotating disc disposed on the substrate chassis, a substrate locking groove disposed on the substrate rotating disc and used for accommodating a substrate, and a thrown photoresist storage groove used for receiving photoresist thrown off from the substrate during the rotation of the substrate rotating disc, and also comprises: a filtering device which is connected with the thrown photoresist storage groove through a pipeline provided with a valve and is used for filtering photoresist which flows out from the thrown photoresist storage groove and flows in through the pipeline; a cleaning device which is used for cleaning the thrown photoresist storage groove; a control device which is used for controlling the valve to be open in a photoresist recovery phase and controlling the cleaning device to stop cleaning the thrown photoresist storage groove, and controlling the valve to be close in a cleaning phase and controlling the cleaning device to clean the thrown photoresist storage groove. The embodiments of the invention can recover photoresist thrown off in photolithographic technology.
Description
Technical field
The present invention relates to color membrane substrates and array base palte and make the field, be meant a kind of photoresist recovery system especially.
Background technology
In the photoetching process of making color membrane substrates and array base palte, glue (Slit+Spin) dual mode was spared in rotation after gluing mode commonly used at present generally had direct knife coating (Slit) and blade coating.Utilize the Slit+Spin mode can reach thickness homogeneity and surface smoothness preferably, more excellent on surface uniformity than independent Slit mode.
Shown in Figure 1 is the apparatus structure synoptic diagram of the spin coating photoresist of Slit+Spin mode in the prior art; Wherein substrate rotating disc 2 is arranged in substrate chassis 1; Substrate draw-in groove 4 is positioned on the substrate rotating disc 2; Drive in the process of the substrate high speed rotating in the substrate draw-in groove 4 at substrate rotating disc 2; Be coated on the above photoresist of 90% on the substrate and all in rotary course, thrown away in the whirl coating storage tank 3 between substrate chassis 1 and the substrate rotating disc 2 at a high speed, whirl coating storage tank 3 tops are provided with clean-out system (Thinner) nozzle 5, and nozzle for cleaning agent 5 is to whirl coating storage tank 3 ejection clean-out systems; Make the photoresist mixing clean-out system that throws away be discharged to together in the scrap rubber bucket 6, photoresist becomes discarded object.
In the prior art, after substrate chassis loam cake is opened in the whirl coating completion, substrate rotating disc 2 will be exposed in the air with whirl coating storage tank 3; Photoresist can receive the pollution of particle in the air; And photoresist also can be polluted in discharge process, makes photoresist to recycle, and a large amount of photoresists of discharging have not only polluted environment; But also caused the waste of photoresist, improved the cost of producing color membrane substrates and array base palte.
Summary of the invention
The technical matters that the present invention will solve provides a kind of photoresist recovery system, can the photoresist that throw away in the photoetching process be reclaimed.
For solving the problems of the technologies described above, embodiments of the invention provide technical scheme following:
On the one hand; A kind of photoresist recovery system is provided; Comprise substrate chassis and loam cake thereof, be arranged in substrate rotating disc on the substrate chassis, be positioned at the whirl coating storage tank that is used to place the substrate draw-in groove of substrate on the substrate rotating disc and is used to receive the photoresist that substrate rotating disc rotary course throws away from substrate; The loam cake on said substrate chassis is in closed condition in substrate rotating disc rotary course, can hide substrate and whirl coating storage tank, and said photoresist recovery system also comprises:
The filtration unit that is connected with said whirl coating storage tank is communicated with said whirl coating storage tank through valvular pipeline is set, and is used for the photoresist that flows out from said whirl coating storage tank and flow into through said pipeline is filtered;
Cleaning device is used for said whirl coating storage tank is cleaned;
Control device is used for controlling said valve conducting at the photoresist recovery stage, and controls said cleaning device and stop to clean the whirl coating storage tank; Control said valve closing at wash phase, and control said cleaning device and clean the whirl coating storage tank.
Further, said system also comprises:
Be arranged at the protective device on the said substrate chassis, be used for when the loam cake on said substrate chassis is opened, photoresist in the whirl coating storage tank and air is isolated, receive the pollution of particle in the air to avoid photoresist.
Wherein, said protective device comprises:
Be arranged on the stretchable layer on the outward flange on said substrate chassis;
Be arranged on the said substrate chassis, the first flexible controller of the said stretchable layer of control, be used for when the loam cake on said substrate chassis is opened, control said stretchable layer and stretch out and cover in said whirl coating storage tank; When the loam cake on said substrate chassis is closed, control said stretchable layer withdrawal and do not hide said whirl coating storage tank.
Further, said first controller is an optical inductor;
Said stretchable layer is that the difference of external diameter in is the circular layer of 10cm～15cm.
Further, said system also comprises:
With the recycling and processing device that said filtration unit is connected, be used to store the photoresist after said filtration unit filters, and the viscosity of the photoresist after will filtering is adjusted to preset value.
Wherein, said filtration unit comprises:
The filtrator that is connected with said whirl coating storage tank is communicated with said whirl coating storage tank through valvular pipeline is set, and is used to receive the photoresist that flows out and pass through said pipeline inflow from said whirl coating storage tank, filters out the impurity in the photoresist;
Second controller that is connected with said filtrator when being used for photoresist at said filtrator and reaching preset glue amount, is controlled said valve closing, makes said filtrator stop to receive the photoresist that flows out from said whirl coating storage tank; During the whole emptying of photoresist in said filtrator, control said valve conducting, make said filtrator restart to receive the photoresist that flows out from said whirl coating storage tank.
Further, said second controller is a gravity sensor.
Wherein, said cleaning device comprises:
Be arranged on the nozzle for cleaning agent of said whirl coating storage tank top, be used for when said control device is controlled said valve closing, the ejection clean-out system cleans said whirl coating storage tank under the control of said control device;
With the waste liquid barrel that said whirl coating storage tank is connected, be used for receiving the clean-out system waste liquid that cleaning process flows out from said whirl coating storage tank.
Further, said photoresist recovery system also comprises:
Air-dry apparatus is used for carrying out air-dry to the whirl coating storage tank after cleaning.
Wherein, said air-dry apparatus comprises:
Be installed in the air knife on the said stretchable layer edge, be used for the whirl coating storage tank after cleaning is dried up.
Embodiments of the invention have following beneficial effect:
In the such scheme; One filtration unit that is connected with the whirl coating storage tank is set; Can the photoresist that whirl coating is accomplished directly be filtered; Avoided in removal process photoresist and other solvents or mix particles to pollute, protected the degree of purity of photoresist, make things convenient for after photoresist reclaims the viscosity adjustment with utilize again; Simultaneously, the embodiment of the invention also is provided with cleaning device, so that in removal process, the whirl coating storage tank is cleaned, has further guaranteed the degree of purity of photoresist, has improved the recovery utilization rate of photoresist.
Description of drawings
Fig. 1 is the apparatus structure synoptic diagram of the spin coating photoresist of Slit+Spin mode in the prior art;
Fig. 2 is the device composition diagram of the photoresist recovery system of the embodiment of the invention;
Fig. 3 is the apparatus structure synoptic diagram of the photoresist recovery system of the embodiment of the invention.
Embodiment
For technical matters, technical scheme and advantage that the present invention will be solved is clearer, will combine accompanying drawing and specific embodiment to be described in detail below.
In the photoetching process of making color membrane substrates and array base palte, the problem that a large amount of photoresists of discharging can't be recycled provides a kind of photoresist recovery system to embodiments of the invention, can the photoresist that throw away in the photoetching process be reclaimed to prior art.
Fig. 2 is the device composition diagram of the photoresist recovery system of the embodiment of the invention; Present embodiment is applied in the photoetching process of color membrane substrates and array base palte; Comprise substrate chassis and loam cake thereof, be arranged in substrate rotating disc on the substrate chassis, be positioned at the whirl coating storage tank that is used to place the substrate draw-in groove of substrate on the substrate rotating disc and is used to receive the photoresist that substrate rotating disc rotary course throws away from substrate; The loam cake on substrate chassis is in closed condition in substrate rotating disc rotary course; Can hide substrate and whirl coating storage tank, as shown in Figure 2, this photoresist recovery system also comprises:
The filtration unit 201 that is connected with the whirl coating storage tank is communicated with the whirl coating storage tank through valvular pipeline is set, and is used for the photoresist that flows out from the whirl coating storage tank and flow into through pipeline is filtered;
Cleaning device 202 is used for the whirl coating storage tank is cleaned;
Control device 203 is used in the conducting of photoresist recovery stage by-pass valve control, and the control cleaning device stops to clean the whirl coating storage tank; Close at the wash phase by-pass valve control, and the control cleaning device cleans the whirl coating storage tank.
Further, this system also comprises:
Be arranged at the protective device on the substrate chassis, be used for when the loam cake on substrate chassis is opened, photoresist in the whirl coating storage tank and air is isolated, receive the pollution of particle in the air to avoid photoresist.
Wherein, protective device comprises:
Be arranged on the stretchable layer on the outward flange on substrate chassis;
First controller that be arranged on the substrate chassis, the control stretchable layer stretches is used for when the loam cake on substrate chassis is opened, and the control stretchable layer stretches out and covers in the whirl coating storage tank; When the loam cake on substrate chassis was closed, the withdrawal of control stretchable layer did not hide the whirl coating storage tank.
Further, first controller is an optical inductor;
Stretchable layer is that the difference of external diameter in is the circular layer of 10cm～15cm.
Further, system also comprises:
With the recycling and processing device that filtration unit 201 is connected, be used for the photoresist after the stored filter device filters, and the viscosity of the photoresist after will filtering is adjusted to preset value.
Wherein, filtration unit 201 comprises:
The filtrator that is connected with the whirl coating storage tank is communicated with the whirl coating storage tank through valvular pipeline is set, and is used to receive the photoresist that flows out and pass through the pipeline inflow from the whirl coating storage tank, filters out the impurity in the photoresist;
Second controller that is connected with filtrator, when being used for photoresist at filtrator and reaching preset glue amount, by-pass valve control is closed, and makes filtrator stop to receive the photoresist that flows out from the whirl coating storage tank; During the whole emptying of the photoresist in filtrator, the by-pass valve control conducting makes filtrator restart to receive the photoresist that flows out from the whirl coating storage tank.
Further, second controller is a gravity sensor.
Wherein, cleaning device 202 comprises:
Be arranged on the nozzle for cleaning agent of whirl coating storage tank top, be used for when control device 203 by-pass valve controls are closed, the ejection clean-out system cleans the whirl coating storage tank under the control of control device 203;
With the waste liquid barrel that the whirl coating storage tank is connected, be used for receiving the clean-out system waste liquid that cleaning process flows out from the whirl coating storage tank.
Further, the photoresist recovery system also comprises:
Air-dry apparatus is used for carrying out air-dry to the whirl coating storage tank after cleaning.
Wherein, air-dry apparatus comprises:
Be installed in the air knife on the stretchable layer edge, be used for the whirl coating storage tank after cleaning is dried up.
The recovery difficult of photoresist is that in the process of whirl coating, photoresist inevitably can be polluted, and in discharge process, also can be polluted, even the photoresist that is polluted reclaims, also is difficult to utilize once again.The present invention can directly filter the photoresist that throws away at a high speed; Avoided the pollution that photoresist receives in the removal process; Protected the degree of purity of photoresist; Again photoresist is readjusted viscosity after the recovery, photoresist just can continue to use after viscosity was adjusted, and can reduce the cost of producing color membrane substrates and array base palte like this.
Below in conjunction with specific embodiment shown in Figure 3 photoresist recovery system of the present invention is further specified.As shown in Figure 3; Comprise substrate chassis 11 and loam cake 22 thereof in the photoresist recovery system; Be positioned at the substrate rotating disc 12 of substrate chassis 11 middle, the whirl coating storage tank 13 between substrate chassis 11 and substrate rotating disc 12 and be positioned at the substrate draw-in groove 14 that is used to place substrate on the substrate rotating disc 12; In photoetching process; Substrate rotating disc 12 high speed rotating make the photoresist on the substrate on the substrate draw-in groove 14 be thrown in the whirl coating storage tank 13, and in the process of substrate rotating disc 12 rotations, the loam cake 22 on substrate chassis is in closed condition; Can all hide the substrate on substrate chassis 11, substrate rotating disc 12, whirl coating storage tank 13, substrate draw-in groove 14 and the substrate draw-in groove 14, isolated with extraneous contacts.
The outward flange on substrate chassis 11 is provided with a stretchable layer 17, and stretchable layer 17 can be the circular layer of 10cm～15cm for the difference in inside and outside footpath, particularly, as long as stretchable layer 17 can cover the whole of whirl coating storage tank 13 when stretching out.Stretchable layer 17 is controlled it through the spring on optical inductor driving connection substrate chassis 11 and is stretched; When whirl coating is accomplished; The moment that the loam cake 22 on substrate chassis 11 is opened, optical inductor receives the induction driving spring and upsprings, and stretchable layer 17 stretches out; Whirl coating storage tank 13 is covered in, avoid photoresist in the whirl coating storage tank 13 to contact and polluted with air; When the loam cake 22 on substrate chassis 11 was closed, the space dark was airtight, and the optical inductor control spring is regained, and stretchable layer 17 is contracted around substrate chassis 11, and whirl coating storage tank 13 can receive the glue that throws away.Can accomplish the back at whirl coating and protect photoresist in the whirl coating storage tank 13 not receive the pollution of particle in the air through stretchable layer 17 is set.
A filtrator 19 is set below substrate chassis 11; Filtrator 19 is communicated with whirl coating storage tank 13 through valvular pipeline is set; Be used for the photoresist that flows out from whirl coating storage tank 13 and flow into through pipeline is filtered; Filtrator 19 directly filters the photoresist that throws away, and has avoided the pollution in recovery.Linking to each other with filtrator 19 is connected to a gravity sensor 20, and when the photoresist in filtrator 19 reaches certain glue amount, gravity sensor 20 will suspend the recovery of photoresist, and by-pass valve control is closed, and makes filtrator 19 stop to receive the photoresist that flows out from whirl coating storage tank 13.Control setting sprays into clean-out system in the nozzle for cleaning agent above the whirl coating storage tank 13 15 in whirl coating storage tank 13 simultaneously, and whirl coating storage tank 13 is cleaned, and the clean-out system waste liquid flow in the waste liquid barrel 16 that is connected with whirl coating storage tank 13.Because in the removal process of photoresist, it is vital avoiding polluting, and is necessary so after a photoresist recovery stage is accomplished, clean, and has guaranteed the degree of purity of photoresist.
After continuously n time (n specifically can be 20 greater than 1) cleans, open and be installed in the air knife 18 on stretchable layer 17 edges, whirl coating storage tank 13 is dried up, scrap rubber and detergent mixture when preventing when next stage, photoresist reclaimed with cleaning pollute photoresist.After air knife 18 dries up whirl coating storage tank 13; Photoresist in the filtrator 19 filters good fully and all drains in the recycling and processing device 21 that is connected with filtrator 19; Gravity sensor by-pass valve control conducting 20 this moment; Make filtrator 19 restart to receive the photoresist that flows out from whirl coating storage tank 13, begin the recovery of the photoresist of next stage.
Reclaim after the photoresist; Because photoresist unavoidably contacts with air in the gluing process, can receive pollution to a certain degree, so after reclaiming the photoresist that has filtered; Also need readjust the viscosity of the photoresist in the recycling and processing device 21, just can reuse.
The invention provides a kind of photoresist recovery system corresponding to the Slit/Spin glue spreader, outward flange is provided with stretchable layer to native system on the substrate chassis, does not receive the pollution of particle in the air with the photoresist in the protection whirl coating storage tank after a whirl coating is accomplished; Below the whirl coating storage tank, filtrator is set; Can the photoresist that whirl coating is accomplished directly be filtered; And control in the photoresist removal process the cleaning of whirl coating storage tank through gravity sensor is set, guaranteed the degree of purity of photoresist, improved the recovery utilization rate of photoresist.Through technical scheme of the present invention, can be so that the recovery of photoresist reach more than 70%, saved photoresist required in the photoetching process greatly, reduced the production cost of color membrane substrates and array base palte.
The above is a preferred implementation of the present invention; Should be pointed out that for those skilled in the art, under the prerequisite that does not break away from principle according to the invention; Can also make some improvement and retouching, these improvement and retouching also should be regarded as protection scope of the present invention.
Claims (10)
1. photoresist recovery system; Comprise substrate chassis and loam cake thereof, be arranged in substrate rotating disc on the substrate chassis, be positioned at the whirl coating storage tank that is used to place the substrate draw-in groove of substrate on the substrate rotating disc and is used to receive the photoresist that substrate rotating disc rotary course throws away from substrate; The loam cake on said substrate chassis is in closed condition in substrate rotating disc rotary course; Can hide substrate and whirl coating storage tank, it is characterized in that, said photoresist recovery system also comprises:
The filtration unit that is connected with said whirl coating storage tank is communicated with said whirl coating storage tank through valvular pipeline is set, and is used for the photoresist that flows out from said whirl coating storage tank and flow into through said pipeline is filtered;
Cleaning device is used for said whirl coating storage tank is cleaned;
Control device is used for controlling said valve conducting at the photoresist recovery stage, and controls said cleaning device and stop to clean the whirl coating storage tank; Control said valve closing at wash phase, and control said cleaning device and clean the whirl coating storage tank.
2. photoresist recovery system according to claim 1 is characterized in that, said system also comprises:
Be arranged at the protective device on the said substrate chassis, be used for when the loam cake on said substrate chassis is opened, photoresist in the whirl coating storage tank and air is isolated, receive the pollution of particle in the air to avoid photoresist.
3. photoresist recovery system according to claim 2 is characterized in that, said protective device comprises:
Be arranged on the stretchable layer on the outward flange on said substrate chassis;
Be arranged on the said substrate chassis, the first flexible controller of the said stretchable layer of control, be used for when the loam cake on said substrate chassis is opened, control said stretchable layer and stretch out and cover in said whirl coating storage tank; When the loam cake on said substrate chassis is closed, control said stretchable layer withdrawal and do not hide said whirl coating storage tank.
4. photoresist recovery system according to claim 3 is characterized in that, said first controller is an optical inductor;
Said stretchable layer is that the difference of external diameter in is the circular layer of 10cm～15cm.
5. photoresist recovery system according to claim 1 is characterized in that, said system also comprises:
With the recycling and processing device that said filtration unit is connected, be used to store the photoresist after said filtration unit filters, and the viscosity of the photoresist after will filtering is adjusted to preset value.
6. photoresist recovery system according to claim 1 is characterized in that, said filtration unit comprises:
The filtrator that is connected with said whirl coating storage tank is communicated with said whirl coating storage tank through valvular pipeline is set, and is used to receive the photoresist that flows out and pass through said pipeline inflow from said whirl coating storage tank, filters out the impurity in the photoresist;
Second controller that is connected with said filtrator when being used for photoresist at said filtrator and reaching preset glue amount, is controlled said valve closing, makes said filtrator stop to receive the photoresist that flows out from said whirl coating storage tank; During the whole emptying of photoresist in said filtrator, control said valve conducting, make said filtrator restart to receive the photoresist that flows out from said whirl coating storage tank.
7. photoresist recovery system according to claim 6 is characterized in that, said second controller is a gravity sensor.
8. photoresist recovery system according to claim 1 is characterized in that, said cleaning device comprises:
Be arranged on the nozzle for cleaning agent of said whirl coating storage tank top, be used for when said control device is controlled said valve closing, the ejection clean-out system cleans said whirl coating storage tank under the control of said control device;
With the waste liquid barrel that said whirl coating storage tank is connected, be used for receiving the clean-out system waste liquid that cleaning process flows out from said whirl coating storage tank.
9. photoresist recovery system according to claim 1 is characterized in that, said photoresist recovery system also comprises:
Air-dry apparatus is used for carrying out air-dry to the whirl coating storage tank after cleaning.
10. photoresist recovery system according to claim 9 is characterized in that, said air-dry apparatus comprises:
Be installed in the air knife on the said stretchable layer edge, be used for the whirl coating storage tank after cleaning is dried up.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103821425A CN102707585A (en) | 2011-11-25 | 2011-11-25 | Photoresist recovery system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103821425A CN102707585A (en) | 2011-11-25 | 2011-11-25 | Photoresist recovery system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102707585A true CN102707585A (en) | 2012-10-03 |
Family
ID=46900486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011103821425A Pending CN102707585A (en) | 2011-11-25 | 2011-11-25 | Photoresist recovery system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102707585A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103769351A (en) * | 2014-01-20 | 2014-05-07 | 北京京东方显示技术有限公司 | Photoresist recovering system |
| CN105093835A (en) * | 2014-05-06 | 2015-11-25 | 沈阳芯源微电子设备有限公司 | Photoresist collecting cup structure for preventing front and back of wafer from being polluted |
| CN106321585A (en) * | 2016-11-22 | 2017-01-11 | 倪兆刚 | Color steel adhesive recovery device and recovery method |
| CN107340692A (en) * | 2016-05-03 | 2017-11-10 | 沈阳芯源微电子设备有限公司 | A kind of photoresistance recycle device |
| CN112974064A (en) * | 2021-02-25 | 2021-06-18 | 上海弗列加滤清器有限公司 | Whirl coating device and whirl coating method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0934121A (en) * | 1995-07-20 | 1997-02-07 | Hitachi Ltd | Recycling type resist process |
| CN1887446A (en) * | 2006-07-17 | 2007-01-03 | 友达光电股份有限公司 | Rotary spraying system and its liquid recovering method |
| CN101130185A (en) * | 2006-08-22 | 2008-02-27 | 东京应化工业株式会社 | Pre-spraying device |
| CN201156140Y (en) * | 2007-12-29 | 2008-11-26 | 华晶科技股份有限公司 | Device for protecting lens |
| US20090002823A1 (en) * | 2007-06-30 | 2009-01-01 | David Law | Permanently-Affixed Lens Cap |
-
2011
- 2011-11-25 CN CN2011103821425A patent/CN102707585A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0934121A (en) * | 1995-07-20 | 1997-02-07 | Hitachi Ltd | Recycling type resist process |
| CN1887446A (en) * | 2006-07-17 | 2007-01-03 | 友达光电股份有限公司 | Rotary spraying system and its liquid recovering method |
| CN101130185A (en) * | 2006-08-22 | 2008-02-27 | 东京应化工业株式会社 | Pre-spraying device |
| US20090002823A1 (en) * | 2007-06-30 | 2009-01-01 | David Law | Permanently-Affixed Lens Cap |
| CN201156140Y (en) * | 2007-12-29 | 2008-11-26 | 华晶科技股份有限公司 | Device for protecting lens |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103769351A (en) * | 2014-01-20 | 2014-05-07 | 北京京东方显示技术有限公司 | Photoresist recovering system |
| CN103769351B (en) * | 2014-01-20 | 2016-08-17 | 北京京东方显示技术有限公司 | A kind of photoresist recovery system |
| CN105093835A (en) * | 2014-05-06 | 2015-11-25 | 沈阳芯源微电子设备有限公司 | Photoresist collecting cup structure for preventing front and back of wafer from being polluted |
| CN105093835B (en) * | 2014-05-06 | 2019-07-05 | 沈阳芯源微电子设备股份有限公司 | Prevent the photoresist of wafer frontside and back pollution from collecting cup structure |
| CN107340692A (en) * | 2016-05-03 | 2017-11-10 | 沈阳芯源微电子设备有限公司 | A kind of photoresistance recycle device |
| CN106321585A (en) * | 2016-11-22 | 2017-01-11 | 倪兆刚 | Color steel adhesive recovery device and recovery method |
| CN112974064A (en) * | 2021-02-25 | 2021-06-18 | 上海弗列加滤清器有限公司 | Whirl coating device and whirl coating method |
| CN112974064B (en) * | 2021-02-25 | 2022-06-28 | 上海弗列加滤清器有限公司 | Whirl coating device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102707585A (en) | Photoresist recovery system | |
| CN101530691B (en) | Liquid solid separating method for regenerating filtrate medium in filter | |
| CN106890836A (en) | A kind of cleaning equipment of mobile phone camera eyeglass | |
| CN101362033B (en) | Method and device for recycling test solution in semiconductor or display screen manufacturing process | |
| KR100908399B1 (en) | Chemical liquid recycling method and apparatus for semiconductor or display manufacturing process | |
| CN102179349B (en) | Coating device, and method for replacing liquid material | |
| CN207103028U (en) | A kind of roll coating apparatus for fabric coating | |
| KR20170090727A (en) | The apparatus and method of recycling the solvent for washing paint remaining in the paint manufacturing line | |
| JP2017080893A (en) | Liquid discharge device and method for washing liquid discharge head | |
| CN214056042U (en) | Cleaning device for recycling waste plastic | |
| CN220328292U (en) | Paint gas recovery structure | |
| CN208500599U (en) | Sewage-treatment plant after a kind of processing of waste plastics | |
| CN105268717A (en) | Ferrite core waste material recycling system | |
| CN213853320U (en) | Filtering equipment for producing polyamide resin | |
| CN208842017U (en) | It is a kind of to may filter that the chromatic printing machine of ink powder convenient for changing ink | |
| CN204052343U (en) | FERRITE CORE scrap loop utilizes system | |
| CN110421967B (en) | Control system for realizing green and environment-friendly printing of books and periodicals and green production method | |
| CN208893756U (en) | A kind of processing ink filter device | |
| CN212188766U (en) | Mixing equipment for processing coating | |
| CN208032801U (en) | A kind of sand washer convenient for recycling fine sand | |
| CN202762588U (en) | Coating recovery device | |
| CN211097761U (en) | Plate filter for water-based paint | |
| CN221414367U (en) | Simple filtering device | |
| CN219440824U (en) | Polishing solution filter vat | |
| JPH02101732A (en) | Resist coater |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20121003 |