CN102707356B - Method for manufacturing color filter, color filter and display device - Google Patents
Method for manufacturing color filter, color filter and display device Download PDFInfo
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- CN102707356B CN102707356B CN201110340280.7A CN201110340280A CN102707356B CN 102707356 B CN102707356 B CN 102707356B CN 201110340280 A CN201110340280 A CN 201110340280A CN 102707356 B CN102707356 B CN 102707356B
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Abstract
The invention provides a method for manufacturing a color filter, the color filter and a display device, relates to the field of displaying, and aims to solve the problem that a spacer topples over easily in a boxing process or when a liquid crystal screen is extruded in the prior art. The method for manufacturing the color filter comprises the following steps of: obtaining a color filter substrate; coating a layer of first light sensing material on the color filter substrate to form a first light sensing material coating layer; coating a second light sensing material on the first light sensing material coating layer to form a second light sensing material coating layer; and exposing and developing the first light sensing material coating layer and the second light sensing material coating layer on the color filter substrate, and forming the spacer on the color filter substrate, wherein the spacer has a step structure; and a lower step formed on the first light sensing material coating layer is wider than an upper step formed on the second light sensing material coating layer. By the method, the stability of the display effect and the display device can be improved.
Description
Technical field
The present invention relates to demonstration field, refer to especially a kind of method for making, colored filter and display device of colored filter.
Background technology
Colored filter is the important component part of LCDs, is also the key component that affects display effect.Colored filter comprises the black matrix (BM), color filter layer, flatness layer (OC), the conductive layer (public electrode) that on glass substrate, form.Generally, in order to maintain box thick (cell gap), prevent liquid crystal extrusion and cannot normally show, need to be between Array array base palte and colored filter (Color Filer) substrate, some chock insulator matters distribute.Early stage liquid crystal panel adopts a kind of spherical chock insulator matter (Ball Spacer), this chock insulator matter cannot be fixed, likely in long-time use procedure, skewness causes at a certain region clustering, cannot play the effect that box is thick that maintains, therefore, affected the display effect of display screen.
The method of main flow is to adopt photoetching process to make Post Spacer (protruding chock insulator matter) as chock insulator matter at present.Step is that PS photosensitive material is coated to colored filter surface, produces chock insulator matter through overexposure, developing process.But, due to the restriction of technique, be difficult to guarantee that all chock insulator matters can both form up-narrow and down-wide shape, like this, make part chock insulator matter to box technique or easily topple in the time that liquid crystal display is squeezed, thereby affect the display effect of display screen.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of method for making, colored filter and display device of colored filter, thereby the chock insulator matter that prevents colored filter is on box technique or topple over the display effect that affects display device in the time that liquid crystal display is squeezed.
For solving the problems of the technologies described above, embodiments of the invention provide technical scheme as follows:
On the one hand, provide a kind of method for making of colored filter, comprising:
Obtain a colored filter substrate;
On described colored filter substrate, apply one deck the first photosensitive material, form the coating of the first photosensitive material;
In the coating of described the first photosensitive material, apply the second photosensitive material, form the coating of the second photosensitive material;
Coating to described the first photosensitive material on described colored filter substrate, the coating of described the second photosensitive material are exposed, are developed, on described colored filter substrate, form chock insulator matter, described colored filter substrate and described chock insulator matter composition colored filter; Wherein, described chock insulator matter is ledge structure, and the width of getting out of a predicament or an embarrassing situation that described the first photosensitive material forms is greater than the width of topping bar that described the second photosensitive material forms.
Described the first photosensitive material and described the second photosensitive material are negative photoresist, and the ratio of the alkali soluble resin in described the second photosensitive material is higher than the ratio of the alkali soluble resin in described the first photosensitive material.
Described getting out of a predicament or an embarrassing situation as ladder-shaper structure, described in top bar as ladder-shaper structure.
Described one deck the first photosensitive material that applies on described colored filter substrate, after forming the step of coating of the first photosensitive material, described method also comprises: the colored filter substrate that applies described the first photosensitive material is toasted;
Described second photosensitive material that applies in the coating of described the first photosensitive material, after forming the step of coating of the second photosensitive material, described method also comprises: the colored filter substrate that applies described the second photosensitive material is toasted.
Describedly be specially applying the step that the colored filter substrate of described the first photosensitive material toasts: the colored filter substrate that applies described the first photosensitive material is toasted to 20s～350s at 50 ℃～150 ℃;
Describedly be specially applying the step that the colored filter substrate of described the second photosensitive material toasts: the colored filter substrate that applies described the second photosensitive material is toasted to 20s～350s at 50 ℃～150 ℃.
Described the first photosensitive material comprises: the alkali soluble resin that percentage by weight is 0.05%-50%, the unsaturated vinyl monomer that percentage by weight is 5%-35%, the epoxy resin that percentage by weight is 0.05%-10%, the solvent that percentage by weight is 20%-70%, the light initiator that percentage by weight is 0.05%-10%, the adjuvant that percentage by weight is 0.01%-2%;
Described the second photosensitive material comprises: the alkali soluble resin that percentage by weight is 10%-65%, the acrylic resin that percentage by weight is 10%～20%, the unsaturated vinyl monomer that percentage by weight is 2%-35%, the epoxy resin that percentage by weight is 0.05%-10%, the solvent that percentage by weight is 20%-75%, the light initiator that percentage by weight is 0.05%-10%, the adjuvant that percentage by weight is 0.01%-2%.
Described unsaturated vinyl monomer is multi-functional acrylate's monomer; Described adjuvant comprises: levelling agent, planarization agent and/or silane coupling agent.
Described colored filter substrate comprises: the glass-based flaggy setting gradually from top to bottom, black matrix and chromatic filter layer, flatness layer and conductive layer; The described step that applies one deck the first photosensitive material on described colored filter substrate is specially: on described conductive layer, apply one deck the first photosensitive material;
Or described colored filter substrate comprises: the conductive layer, glass-based flaggy, black matrix and chromatic filter layer and the flatness layer that set gradually from top to bottom; The described step that applies one deck the first photosensitive material on described colored filter substrate is specially: on described flatness layer, apply one deck the first photosensitive material.
On the other hand, a kind of colored filter is provided, comprise: colored filter substrate and be arranged on the chock insulator matter on described colored filter substrate, described chock insulator matter is ledge structure, and the width of getting out of a predicament or an embarrassing situation of described ledge structure is greater than the width of topping bar of described ledge structure.
On the other hand, a kind of display device is provided, comprise: colored filter substrate and be arranged on the chock insulator matter on described colored filter substrate, described chock insulator matter is ledge structure, and the width of getting out of a predicament or an embarrassing situation of described ledge structure is greater than the width of topping bar of described ledge structure.
Embodiments of the invention have following beneficial effect:
In such scheme, on colored filter, apply one deck the first photosensitive material, form the coating of the first photosensitive material; In the coating of described the first photosensitive material, apply the second photosensitive material, form the coating of the second photosensitive material; After the coating of the coating of described the first photosensitive material on described colored filter, described the second photosensitive material is exposed, is developed, the coating of the first photosensitive material, the coating of described the second photosensitive material form the chock insulator matter of ledge structure on described colored filter, described ledge structure comprises: get out of a predicament or an embarrassing situation and top bar, the coating formation of described the first photosensitive material is got out of a predicament or an embarrassing situation, and the coating formation of described the second photosensitive material is topped bar.Chock insulator matter structure of the present invention is up-narrow and down-wide, and chock insulator matter shape that should " up-narrow and down-wide " can guarantee the stability of chock insulator matter, prevents that chock insulator matter is to box technique or topple in the time that liquid crystal display is squeezed, thereby has improved the stability of liquid crystal indicator.
Accompanying drawing explanation
Fig. 1 is the schematic flow sheet of the method for making of colored filter of the present invention;
Fig. 2 is the structural representation of method for making under TN pattern that adopts the colored filter shown in Fig. 1;
Fig. 3 is the structural representation of method for making under FFS pattern that adopts the colored filter shown in Fig. 1.
Embodiment
For technical matters, technical scheme and advantage that embodiments of the invention will be solved are clearer, be described in detail below in conjunction with the accompanying drawings and the specific embodiments.
As shown in Figure 1, be the method for making of a kind of colored filter of the present invention, comprising:
Chock insulator matter structure of the present invention is up-narrow and down-wide, and chock insulator matter shape that should " up-narrow and down-wide " can guarantee the stability of chock insulator matter, prevents that chock insulator matter is to box technique or topple in the time that liquid crystal display is squeezed, thereby has improved the stability of liquid crystal display.
Wherein, described the first photosensitive material and described the second photosensitive material are negative photoresist, the ratio of the alkali soluble resin in described the second photosensitive material is higher than the ratio of the alkali soluble resin in described the first photosensitive material, making described chock insulator matter is ledge structure, and the width of getting out of a predicament or an embarrassing situation that described the first photosensitive material forms is greater than the width of topping bar that described the second photosensitive material forms.Wherein, described in get out of a predicament or an embarrassing situation can be for trapezium structure, described in top bar as trapezium structure.
Optionally, after step 12, described method also comprises: step 12A, toasts the colored filter substrate that applies described the first photosensitive material, wherein, step 12A can be: the colored filter substrate that applies described the first photosensitive material is toasted to 20s～350s at 50 ℃～150 ℃.
Optionally, after step 13, described method also comprises: step 13A, toasts the colored filter substrate that applies described the second photosensitive material.Wherein, step 13A can be: the colored filter substrate that applies described the second photosensitive material is toasted to 20s～350s at 50 ℃～150 ℃.
Described the first photosensitive material comprises: the alkali soluble resin that percentage by weight is 0.05%-50%, the unsaturated vinyl monomer that percentage by weight is 5%-35%, the epoxy resin that percentage by weight is 0.05%-10%, the solvent that percentage by weight is 20%-70%, the light initiator that percentage by weight is 0.05%-10%, the adjuvant that percentage by weight is 0.01%-2%;
Described the second photosensitive material comprises: the alkali soluble resin that percentage by weight is 10%-69%, the acrylic resin that percentage by weight is 10%～20%, the unsaturated vinyl monomer that percentage by weight is 2%-35%, the epoxy resin that percentage by weight is 0.05%-10%, the solvent that percentage by weight is 20%-75%, the light initiator that percentage by weight is 0.05%-10%, the adjuvant that percentage by weight is 0.01%-2%.
Described unsaturated vinyl monomer is multi-functional acrylate's monomer; Described adjuvant comprises: levelling agent, planarization agent and/or silane coupling agent.
For example, photosensitive material 1 (the first photosensitive material) component that is used to form chock insulator matter can be: 10g alkali soluble resin, 15g tetramethylol methane tetraacrylate, 1.5g epoxy resin, 59g solvent, 0.8g light initiator, 0.3g levelling agent, 0.3g silane coupling agent.Photosensitive material 2 (the second photosensitive material) component that is used to form chock insulator matter can be: 30g alkali soluble resin, 18g polyurethane acrylic resin, 5.8g trimethylolpropane triacrylate, 1.5g epoxy resin, 56g solvent, 0.8g light initiator, 0.3g levelling agent, 0.3g silane coupling agent.Those skilled in the art can understand, in photosensitive material, the ratio of each component can be with reference to as above, and weight is determined according to the size of colored filter.
In such scheme, on colored filter substrate, apply one deck the first photosensitive material, form the coating of the first photosensitive material; In the coating of described the first photosensitive material, apply the second photosensitive material, form the coating of the second photosensitive material; After the coating of the coating of described the first photosensitive material on described colored filter substrate, described the second photosensitive material is exposed, is developed, the coating of the first photosensitive material, the coating of described the second photosensitive material form the chock insulator matter of ledge structure on described colored filter, described ledge structure comprises: get out of a predicament or an embarrassing situation and top bar, the coating formation of described the first photosensitive material is got out of a predicament or an embarrassing situation, and the coating formation of described the second photosensitive material is topped bar.Because described the first photosensitive material and described the second photosensitive material are negative photoresist, the ratio of the alkali soluble resin in described the second photosensitive material is higher than the ratio of the alkali soluble resin in described the first photosensitive material, the dissolution velocity of described the second photosensitive material in developer solution than described the first photosensitive material the dissolution velocity in developer solution fast, therefore the width of getting out of a predicament or an embarrassing situation that, described the first photosensitive material forms is greater than the width of topping bar that described the second photosensitive material forms.That is to say, the photosensitive material that is used to form chock insulator matter is negative photoresist, comprises light-cured components and alkali soluble constituent, and wherein the effect of alkali soluble constituent is to make unexposed photosensitive material dissolve and come off in developer solution.The alkali soluble constituent content of the above-mentioned photosensitive material 1 that is used to form chock insulator matter is different with the alkali soluble constituent content of photosensitive material 2 that is used to form chock insulator matter, therefore in developer solution, dissolve the speed difference of peeling off, the alkali soluble resin content of photosensitive material 1 that the alkali soluble resin content that is used to form the photosensitive material 2 of chock insulator matter is used to form chock insulator matter is high, in developer solution, dissolution velocity is fast, therefore can form the shape of the chock insulator matter of " up-narrow and down-wide ".
In an application scenarios, as shown in Figure 2, described colored filter substrate comprises: the glass-based flaggy 10 setting gradually from top to bottom, black matrix and chromatic filter layer 20, flatness layer 30 and conductive layer 40; Accordingly, step 12 is specially: on described conductive layer 40, apply one deck the first photosensitive material.
For example, for TN pattern ((twisted nematic liquid crystal mode, using liquid crystal molecule twist angle is the liquid crystal mode of the nematic liquid crystal of 90 degree), after the ITO of the colored filter substrate that completes layer, by 1 spin coating of chock insulator matter photosensitive material or blade coating on ITO layer, through overbaking, can at 50 ℃～150 ℃, toast 20s～350s; Then will be used to form photosensitive material 2 spin coatings of chock insulator matter or blade coating in being used to form on the coating of photosensitive material 1 of chock insulator matter, again through once baking, can at 50 ℃～150 ℃, toast 20s～350s, obtain chock insulator matter 50 through single exposure, developing process afterwards.Described ledge structure comprises: get out of a predicament or an embarrassing situation 51 and top bar 52, described in top bar described in being greater than 52 the width of 51 width of getting out of a predicament or an embarrassing situation.Wherein, described in get out of a predicament or an embarrassing situation 51 can be for trapezium structure, described in top bar 52 for trapezium structure.
In Another application scene, as shown in Figure 3, described colored filter substrate comprises: conductive layer 40, glass-based flaggy 10, black matrix and the chromatic filter layer 20 and the flatness layer 30 that set gradually from top to bottom; Accordingly, step 12 is specially: on described flatness layer 30, apply one deck the first photosensitive material.
For example, for FFS (fringing field switching) pattern, after the flatness layer of colored filter substrate that completes, to be used to form photosensitive material 1 spin coating of chock insulator matter or blade coating on flatness layer, after overbaking, to be used to form photosensitive material 2 spin coatings of chock insulator matter or blade coating in being used to form on the photosensitive material 1 of chock insulator matter, then through once baking.Obtain chock insulator matter 50 through single exposure, developing process afterwards.Described ledge structure comprises: get out of a predicament or an embarrassing situation 51 and top bar 52, described in top bar described in being greater than 52 the width of 51 width of getting out of a predicament or an embarrassing situation.Wherein, described in get out of a predicament or an embarrassing situation 51 can be for trapezium structure, described in top bar 52 for trapezium structure.
The invention provides a kind of method for making of colored filter, comprise: by homemade photosensitive material 1 spin coating that is used to form chock insulator matter or blade coating in the surface of colored filter substrate, after front baking (prebake), again homemade photosensitive material 2 spin coatings or the blade coating that is used to form chock insulator matter gone up in 1 layer of photosensitive material, then toasted before once.Expose afterwards, develop, get final product to obtain chock insulator matter.That is to say, by by twice coating of two kinds of homemade photosensitive materials (spin coating or blade coating) on colored filter substrate, single exposure develop technique, prepare the chock insulator matter layer with " up-narrow and down-wide " structure.
The chock insulator matter structure of colored filter of the present invention, up-narrow and down-wide, and there is step.Shape that should " up-narrow and down-wide " can guarantee the stability of chock insulator matter, prevents that chock insulator matter from toppling in the time that box or liquid crystal display are received to extruding.In addition, in technology, spherical chock insulator matter Ball Spacer is distributed in pixel region, can reduce aperture opening ratio now.Chock insulator matter of the present invention position is fixed, and can be distributed in the top of TFT device, grid line and data line, therefore, can not reduce aperture opening ratio.
The present invention also provides a kind of colored filter, comprise: colored filter substrate and be arranged on the chock insulator matter on described colored filter substrate, described chock insulator matter is ledge structure, and the width of getting out of a predicament or an embarrassing situation of described ledge structure is greater than the width of topping bar of described ledge structure.Optionally, described in get out of a predicament or an embarrassing situation can be for ladder-shaper structure, described in to top bar can be ladder-shaper structure.
The present invention also provides a kind of display device, described display device comprises colored filter, colored filter comprises: colored filter and be arranged on the chock insulator matter on colored filter, described chock insulator matter is ledge structure, and the width of getting out of a predicament or an embarrassing situation of described ledge structure is greater than the width of topping bar of described ledge structure.Optionally, described in get out of a predicament or an embarrassing situation can be for ladder-shaper structure, described in to top bar can be ladder-shaper structure.
The above is the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, do not departing under the prerequisite of principle of the present invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (10)
1. a method for making for colored filter, is characterized in that, comprising:
Obtain a colored filter substrate;
On described colored filter substrate, apply one deck the first photosensitive material, form the coating of the first photosensitive material;
In the coating of described the first photosensitive material, apply the second photosensitive material, form the coating of the second photosensitive material;
Coating to described the first photosensitive material on described colored filter substrate, the coating of described the second photosensitive material are exposed, are developed, and on described colored filter substrate, form chock insulator matter; Wherein, described chock insulator matter is ledge structure, and the width of getting out of a predicament or an embarrassing situation that described the first photosensitive material forms is greater than the width of topping bar that described the second photosensitive material forms.
2. the method for making of colored filter according to claim 1, is characterized in that,
Described the first photosensitive material and described the second photosensitive material are negative photoresist, and the ratio of the alkali soluble resin in described the second photosensitive material is higher than the ratio of the alkali soluble resin in described the first photosensitive material.
3. the method for making of colored filter according to claim 1, is characterized in that,
Described getting out of a predicament or an embarrassing situation as ladder-shaper structure, described in top bar as ladder-shaper structure.
4. the method for making of colored filter according to claim 1, is characterized in that,
Described one deck the first photosensitive material that applies on described colored filter substrate, after forming the step of coating of the first photosensitive material, described method also comprises: the colored filter substrate that applies described the first photosensitive material is toasted;
Described second photosensitive material that applies in the coating of described the first photosensitive material, after forming the step of coating of the second photosensitive material, described method also comprises: the colored filter substrate that applies described the second photosensitive material is toasted.
5. the method for making of colored filter according to claim 4, is characterized in that,
Describedly be specially applying the step that the colored filter substrate of described the first photosensitive material toasts: the colored filter substrate that applies described the first photosensitive material is toasted to 20s～350s at 50 ℃～150 ℃;
Describedly be specially applying the step that the colored filter substrate of described the second photosensitive material toasts: the colored filter substrate that applies described the second photosensitive material is toasted to 20s～350s at 50 ℃～150 ℃.
6. the method for making of colored filter according to claim 1, is characterized in that,
Described the first photosensitive material comprises: the alkali soluble resin that percentage by weight is 0.05%-50%, the unsaturated vinyl monomer that percentage by weight is 5%-35%, the epoxy resin that percentage by weight is 0.05%-10%, the solvent that percentage by weight is 20%-70%, the light initiator that percentage by weight is 0.05%-10%, the adjuvant that percentage by weight is 0.01%-2%;
Described the second photosensitive material comprises: the alkali soluble resin that percentage by weight is 10%-65%, the acrylic resin that percentage by weight is 10%～20%, the unsaturated vinyl monomer that percentage by weight is 2%-35%, the epoxy resin that percentage by weight is 0.05%-10%, the solvent that percentage by weight is 20%-75%, the light initiator that percentage by weight is 0.05%-10%, the adjuvant that percentage by weight is 0.01%-2%.
7. the method for making of colored filter according to claim 6, is characterized in that,
Described unsaturated vinyl monomer is multi-functional acrylate's monomer; Described adjuvant comprises: levelling agent, planarization agent and/or silane coupling agent.
8. the method for making of colored filter according to claim 1, is characterized in that,
Described colored filter substrate comprises: the glass-based flaggy setting gradually from top to bottom, black matrix and chromatic filter layer, flatness layer and conductive layer; The described step that applies one deck the first photosensitive material on described colored filter substrate is specially: on described conductive layer, apply one deck the first photosensitive material;
Or described colored filter substrate comprises: the conductive layer, glass-based flaggy, black matrix and chromatic filter layer and the flatness layer that set gradually from top to bottom; The described step that applies one deck the first photosensitive material on described colored filter substrate is specially: on described flatness layer, apply one deck the first photosensitive material.
9. a colored filter, it is characterized in that, comprise: colored filter substrate and be arranged on described colored filter substrate the coating by the first photosensitive material, the coating of the second photosensitive material is exposed, the chock insulator matter forming develops, described the first photosensitive material and described the second photosensitive material are negative photoresist, the ratio of the alkali soluble resin in described the second photosensitive material is higher than the ratio of the alkali soluble resin in described the first photosensitive material, described chock insulator matter is ledge structure, and the width of getting out of a predicament or an embarrassing situation of described ledge structure is greater than the width of topping bar of described ledge structure.
10. a display device, it is characterized in that, comprise: colored filter substrate and be arranged on described colored filter substrate the coating by the first photosensitive material, the coating of the second photosensitive material is exposed, the chock insulator matter forming develops, described the first photosensitive material and described the second photosensitive material are negative photoresist, the ratio of the alkali soluble resin in described the second photosensitive material is higher than the ratio of the alkali soluble resin in described the first photosensitive material, described chock insulator matter is ledge structure, and the width of getting out of a predicament or an embarrassing situation of described ledge structure is greater than the width of topping bar of described ledge structure.
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| CN103149745B (en) * | 2013-02-20 | 2016-05-18 | 北京京东方光电科技有限公司 | Chock insulator matter manufacture method on substrate |
| CN103364989A (en) * | 2013-05-22 | 2013-10-23 | 华映视讯（吴江）有限公司 | Manufacturing method of color filter substrate |
| CN103499895A (en) * | 2013-10-12 | 2014-01-08 | 北京京东方光电科技有限公司 | Display panel, display device and manufacturing method of display panel |
| CN104658906B (en) * | 2013-11-22 | 2017-09-01 | 上海和辉光电有限公司 | A kind of preparation method of semiconductor planarization layer |
| KR101474803B1 (en) * | 2014-03-27 | 2014-12-19 | 제일모직주식회사 | Method of manufacturing black column spacer, black column spacer, and color filter |
| CN103970392B (en) | 2014-04-18 | 2019-10-01 | 京东方科技集团股份有限公司 | A kind of touch screen and display device |
| CN104062845A (en) * | 2014-05-23 | 2014-09-24 | 京东方科技集团股份有限公司 | Lower substrate, manufacturing method of lower substrate and liquid crystal lens |
| CN105974654A (en) * | 2016-07-22 | 2016-09-28 | 京东方科技集团股份有限公司 | Preparation method of display substrate, display substrate and display device |
| CN107065314B (en) * | 2017-03-03 | 2020-02-11 | 京东方科技集团股份有限公司 | Spacer, manufacturing method thereof and display panel |
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